EP2766192B1 - Élément de sécurité - Google Patents

Élément de sécurité Download PDF

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Publication number
EP2766192B1
EP2766192B1 EP12773222.0A EP12773222A EP2766192B1 EP 2766192 B1 EP2766192 B1 EP 2766192B1 EP 12773222 A EP12773222 A EP 12773222A EP 2766192 B1 EP2766192 B1 EP 2766192B1
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EP
European Patent Office
Prior art keywords
grid
bars
security element
line
grid bars
Prior art date
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EP12773222.0A
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German (de)
English (en)
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EP2766192A1 (fr
Inventor
Hans Lochbihler
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Giesecke and Devrient Currency Technology GmbH
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Giesecke and Devrient Currency Technology GmbH
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/20—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof characterised by a particular use or purpose
    • B42D25/29—Securities; Bank notes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/373—Metallic materials
    • B42D2035/16—
    • B42D2035/24—
    • B42D2035/36—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/378—Special inks
    • B42D25/391—Special inks absorbing or reflecting polarised light

Definitions

  • the invention relates to a security element for the production of value documents, such as banknotes, checks or the like, which has a line grid structure.
  • Security elements of value documents with periodic line grids are known, for example from the DE 102009012299 A1 . DE 102009012300 A1 . US 2010/0307705 A1 or the DE 102009056933 A1 , which discloses a security element according to the preamble of claim 1.
  • Such color filter properties are known for both reflective and transmissive subwavelength structures. These structures have a strong polarizing influence on the reflection or the transmission of an incident light beam. The color is relatively strongly dependent on the angle in reflection or transmission of such subwavelength gratings. However, the color saturation for these gratings weakens significantly when the incident light is unpolarized.
  • a line grating with subwavelength structures which has angle-dependent, color-filtering properties.
  • the line grid has a rectangular profile made of a dielectric material. The horizontal surfaces are covered with a high refractive dielectric. Above this structure is also a dielectric material, wherein preferably the refractive indices of the grating substrate and the cover material are identical.
  • an optically active structure is formed, which consists of two gratings of the high refractive index material, which are spaced apart by the height of the original rectangular profile.
  • the the line grid forming lattice webs are for example made of ZnS.
  • the DE 102006052413 A1 discloses a security element with a grid polarizer.
  • the WO 2005/071444 A2 describes a grid pattern with several grid fields.
  • the invention is therefore based on the object to provide a security element that shows a good color also when viewed, which changes preferably when tilting.
  • the security element for producing value documents such as banknotes, checks or the like comprises a dielectric substrate, a first grid structure embedded in the substrate of a plurality of longitudinally extending and arranged in a plane first grid bars of metal or semiconductor and a in the substrate embedded second line grid structure of longitudinally extending second metal or semiconductor grid bars located above the first line grid structure with respect to the plane.
  • the first grid bars have each have a width and are adjacent to each other at a distance, so that extending between the first grid bars along the longitudinal direction extending first grid column with the distance corresponding width.
  • the second line lattice structure is inverted to the first line lattice structure, wherein in plan view of the plane the second lattice webs over the first lattice columns and second lattice gaps, which exist between the second lattice webs, lie over the first lattice webs, and the width of the first lattice webs and the second lattice gaps the width of the second grid bars and the first grid column is below 300 nm.
  • These grids are at a distance from each other, so that there is no closed half or half metal film.
  • the thickness of the grid webs may be below 300 nm.
  • phase shift corresponds to half a period.
  • a double-line grating which consists of two superimposed complementary to one another, ie mutually shifted line grating structures.
  • a phase shift of 90 ° is the ideal value, which of course can be seen in the context of manufacturing accuracy.
  • 90 ° phase shift arise, since usually a rectangular profile is not perfect, but can be approximated only by a trapezoidal profile whose upper parallel edge is shorter than the lower parallel edge.
  • the line grid structures are made of metal or semiconductor or of a multilayer structure.
  • the layer thickness of the lattice webs is less than the modulation depth, that is, the spacing of the lattice planes of the line lattice structures.
  • the security element according to the invention can be produced by a layer construction by first providing a base layer on which the first line grid structure is formed. Then, a dielectric intermediate layer is applied, which covers the first line grid structure and is thicker than the grid bars of the first line grid structure. The displaced second line grid structure can then be formed thereon, and a dielectric cover layer forms the termination of the substrate embedding the line grid structure.
  • a particularly good color effect is obtained when the distance between the first and the second lattice webs, ie the modulation depth of the structure, is between 50 nm and 500 nm, preferably between 100 nm and 300 nm.
  • the distance is to be dimensioned by respective equivalent surfaces of the first and second line grid structure, i. for example, from the bottom of the first grid webs to the bottom of the second grid bars or from the top of the first grid bars to the top of the second grid bars.
  • the distance is of course to measure perpendicular to the plane, so called the height difference between the rectified surfaces of the grid bars.
  • Suitable materials for the grid bars metals come into question, for example, aluminum, silver, copper, gold, chromium, platinum and alloys of these materials.
  • the desired color effect is also evident when using semiconductors, such as silicon or germanium.
  • the first lattice webs of the first line lattice structure and / or the second lattice webs of the second line lattice structure may be provided with a multilayer coating, e.g. as a trilayer of two superimposed metal or semiconductor coatings with an intervening dielectric layer can be constructed.
  • the security element can be configured approximately color-neutral in the reflection even at approximately vertical angle of incidence. This has the advantage that the transmitted hue is not changed by the reflection.
  • Preferred for the grid structures of the security element is a fill factor of 0.5, i. same width for the grid bars as for the grid column. Such a fill factor is not mandatory. With a deviation from this, one can make the hue of the reflection for reflection from the front different for a reflection hue, which occurs in the reflection at the back of the security element.
  • the security element with the double-line grid shows angle-dependent color filtering for reflection and transmission. This angle dependence is particularly striking when the grid lines are perpendicular to the light incidence plane.
  • Color filtering can be used to make motifs multicolored so that they change color when tilted or twisted. It is therefore preferred that, in plan view of the plane, at least two regions are provided whose longitudinal directions of the line grid structures are oblique to one another, in particular at right angles. When viewed vertically, such a motif can be designed so that it has a uniform color in transmission and no other structure. If you rotate this motif around the vertical axis, the color of one area, for example of the background, changes differently than the color of the other area, for example a motif. Turning perpendicular to the viewing direction changes the colors of the subject as well as the subject Background to a complete color change. Because the grid area, whose grid lines are parallel to the plane of incidence, hardly changes its color when tilted.
  • the lattice structure has polarizing properties in transmission.
  • polarizing properties in transmission.
  • the security element shows different polarization properties depending on the orientation of the grating structures. It is therefore preferable to provide a security element which has at least two regions whose line grid structures extend along differently extending longitudinal directions. When viewed with polarized light, these areas show large differences in contrast, which facilitates machine reading.
  • a machine readout for example with a bright field camera and a polarizing filter, provides a contrast between these two areas, which serves to authenticate the security element.
  • the line grids in the individual areas may also have different geometry parameters in terms of width and spacing. In this case, however, the subject does not disappear when viewed vertically.
  • Fig. 1 shows in sectional view a security element S, which has a embedded in a substrate 1 double-line grid.
  • a first line grid structure 2 is incorporated, which is arranged in a plane L.
  • the first line grid structure consists of first grid bars 9 with the width a, which extend along a longitudinal direction perpendicular to the plane of the drawing. Between the first grid bars 3 there are first grid gaps 4, which have a width b.
  • the thickness of the first grid bars 3 is indicated by t.
  • the second line grid structure 6 is phase-shifted with respect to the first line grid structure 2 in such a way that the second grid bars 7 come to lie as exactly as possible (within the manufacturing accuracy) over the first grid columns 4.
  • second grid gaps 8, which exist between the second grid bars 7, lie over the first grid bars 3.
  • the thickness t is smaller than the height h, so that no continuous film of the grid bars 3 and 7 is formed.
  • the thickness t of the first lattice webs 2 is equal to the thickness t of the second lattice webs 7. This is for a simpler production benefit, but is not absolutely necessary. It is essential, however, that the modulation depth h, ie the height difference between the first line grid structure 2 and the second line grid structure 6, is greater than the sum of the thicknesses of the first grid bars 3 and the second grid bars 7, since otherwise there is no separation between the two line grid structures 2 and 6 would be given.
  • the security element S of Fig. 1 Reflects incident radiation E as reflected radiation R. Further, a radiation component is transmitted as transmitted radiation T.
  • the reflection and transmission properties depend on the angle of incidence ⁇ , as will be explained below.
  • the production of the security element S can take place, for example, by first applying the first line grid structure 2 and then an intermediate layer 5 to a base layer 9.
  • the second line grid structure with the second grid webs 7 can then be introduced into the grid column 4 depicted at the top.
  • a cover layer 10 covers the security element.
  • the refractive indices of the layers 9, 5 and 10 are substantially the same and may be, for example, about 1.5, in particular 1.56.
  • the measures b, a and t are in the sub-wavelength range, i. less than 300 nm.
  • the modulation depth is preferably between 50 nm and 500 nm.
  • Fig. 2b Analog shows the reflection and the Fig. 2c the absorption of the security element.
  • the angle of incidence ⁇ is in Fig. 1 Are defined.
  • the structure of the underlying security element essentially corresponds to that of Fig. 1 however, the first and second line grating structures are not made of metal but of ZnS with a layer thickness of 70 nm. As can be seen, no spectrally selective absorptions occur. The color properties in transmission are significantly worse. The chroma is only about a quarter and the brightness is also modulated with respect to the angle of incidence. Therefore, the color contrast in transmission is drastically deteriorated with a variation of the incident angle. Such a grating can at best be used in reflective operation, ie on a black background layer.
  • Fig. 3 and 4 show how the modulation depth ( Fig. 3 ) or the layer thickness ( Fig. 4 ) on the color properties of the security element of Fig. 1 or 2.
  • the representation takes place in the LCh color space.
  • the top line shows the brightness L *, the middle line the chroma C *, and the bottom line the hue h °.
  • the material for the line grid structure is aluminum, the substrate, and regions 4 and 5 of FIG Fig. 1 have a refractive index of 1.56. This value corresponds approximately to the refractive index of PET films and UV varnishes.
  • the brightness and the chroma in transmission increase with increasing modulation depth h.
  • a well-perceived color contrast is given in transmission when the transmitted brightness and chroma are higher than the reflected brightness and chroma. This is the case at modulation depths between 150 nm and 280 nm. It shows a much improved color property in transmission over the security element with ZnS grid bars.
  • Fig. 4 shows the influence of the layer thickness.
  • the material is again aluminum, and the geometric parameters d, b, h correspond to those of Fig. 2 , It turns out that a layer thickness in the range of 20 nm and 30 nm produces favorable color properties in transmission.
  • the brightness of the transmission is in the same order of magnitude of the brightness in reflection.
  • the chroma in transmission is significantly higher.
  • the angle-dependent color effect in transmission is not limited to only a line grid structure having a single metal layer or semiconductor layer in the grid bars.
  • the effects described are also obtained for double-line gratings whose lattice webs consist of several layers.
  • the total thickness of the layers is always smaller than the modulation depth h.
  • At least one of the layers consists of a metal or a semiconductor. Trilayers are particularly preferred for the layer structure. A larger number of layers hardly improves the angle-dependent color effect, but increases the manufacturing cost.
  • Fig. 6 shows by way of example a security element, in which the first and second lattice webs 3 and 7 are each realized by a trilayer coating. They have a metallic layer 11, a dielectric intermediate layer 12 and a further metallic layer 13. Preferably, but not necessarily, the thickness of the two metal layers is identical.
  • Fig. 7 shows the color values in the LCh color space for the security element S with the layer structure according to FIG Fig. 6 wherein the metal layers 11 and 13 are each 10 nm thick aluminum layers and the dielectric layer 12 is a silicon dioxide layer.
  • Fig. 7 shows the color effect as a function of the thickness of the silicon dioxide layer.
  • the substrate 1 and the regions 4 and 5 have, as in other embodiments, a refractive index of 1.56.
  • the security element shows a slightly lower brightness in transmission, but a higher chroma than in reflection. Silicon dioxide layer thicknesses above 60 nm cause a strong hue in transmission when tilted. In reflection, the security element appears green. At 70 nm layer thickness of silicon dioxide, the security element is approximately neutral in reflection at approximately vertical angles of incidence. This has the advantage that the transmitted hue is not changed by the reflection.
  • angle-dependent color filtering of the security elements described can now be used to make multi-colored motifs that change their color when tilted or twisted.
  • the simple embodiment of a multicolor motif with a double-line grid is an arrangement in which different areas are formed whose longitudinal direction of the line grid structures is rotated relative to one another, preferably by 90 °.
  • the spectral transmission or reflection characteristics hardly changes.
  • Fig. 8a and 8b show a security element in which areas of a background 14 of a motif 15 with vertically extending longitudinal direction and the motif 15 are formed with a horizontally extending longitudinal direction. In the presentation of the Fig. 8b you can see these line directions indicated schematically.
  • the motif 15 shows a butterfly and two numerical values.
  • Fig. 8a shows the motif 15 schematically in white on a black background.
  • the motif 15 as the background 14 are exemplary with the parameters of the embodiment according to Fig. 1 designed.
  • the Fig. 9a and 9b show different lighting conditions when the security element S the Fig. 8 in front of a backlight 16 is viewed in transmitted light.
  • the security element When viewed vertically (upper part of the figure Fig. 9a ), the security element appears uniform yellow in transmission. Now when the security element is rotated about the vertical axis, the color of the background 14 changes from yellow to blue. If tilted around the horizontal axis instead, the motif 15 will appear blue (lower illustration of the Fig. 9a ).
  • the situation for different azimuth angles shows the Fig. 9b , Here, the colors of the motif 15 and the background 14 change to a complete inversion.
  • the security element S also has polarization-filtering properties in transmission.
  • Fig. 10 shows the color behavior of a security element S with a line grid structure whose grid bars are made of aluminum, as a function of the modulation depth h in reflection (left column) and in transmission (right column) for TE and TM polarization at a normal angle of incidence.
  • the application otherwise corresponds to that of Fig. 3 ,
  • the security element has a good brightness contrast for the two polarization directions in transmission at a modulation depth above 150 nm. Furthermore, the change in chroma is particularly large for modulation depths between 200 nm and 260 nm. The color change has a maximum at a modulation depth of 270 nm.
  • Fig. 11 shows the influence of the layer thickness t for the grid of Fig. 10 at a modulation depth of 250 nm.
  • the security element has good polarization filter properties in transmission at layer thicknesses above 20 nm.
  • the chroma and the color contrast are particularly high at layer thicknesses between 20 nm and 30 nm.
  • a color change from blue to yellow is observed as the polarization of the illumination changes from TM polarization to TE polarization.
  • d 360 nm
  • b 180 nm
  • h 300 nm
  • Fig. 13 shows the color behavior when crystalline silicon is used instead of amorphous silicon. Otherwise the parameters correspond to those of the Fig. 12 ,
  • This security element shows clear brightness differences even for layer thicknesses above 40 nm.
  • the layer thickness of 100 nm is particularly well suited as a polarizing filter.
  • the orange / blue color contrast is strongest for a silicon layer thickness of 120 nm.
  • the line grid structure of the security element has polarization-filtering (so-called polarizing) properties in transmission.
  • Fig. 15 shows the color values in the LCh color space of a lattice damped with aluminum as a function the modulation depth h in reflection and in transmission for TM and TE polarization at normal angle of incidence. In the left column of the Fig. 15 are the color values in reflection, in the right column in transmission.
  • the structure of the grid corresponds to that of Fig.
  • Fig. 16 shows a representation similar to the Fig. 3 for a grid in which the grid bars 3.7 consist of a 40 nm copper layer. Otherwise, the parameters correspond to those of the security element of the Fig. 15 , Here, too, results in a modulation depth of 260 nm, a significant difference in color, which is approximately the basis of Fig. 15 corresponds described. If the layer thickness of the copper of the grid bars 3,7 is varied, the recognizable colors can be adjusted slightly differently.
  • the plot is made here as a function of the illumination wavelength in the near infrared.
  • the solid line shows the TM polarization, the dashed line the TE polarization of the illumination radiation. It can be seen clearly that for certain wavelengths a clearer Transmission and reflection difference between the two polarization directions exists.
  • Fig. 18 shows the transmission of the lattice of the Fig. 17a, b as a function of the wavelength in the visible spectral range. Again, there is a significant difference for the two polarization directions.
  • Fig. 19a shows the transmission and Fig. 19b the reflection of a grid with the parameters of the security element of the Fig. 15
  • the grid bars 3, 7 are formed here by a 100 nm thick silicon layer.
  • the solid and long dashed lines represent the TM polarization of the incident radiation.
  • the short-dashed and the dot-dash line the TE polarization.
  • the polarization filter properties of the security element allow authenticity checking by considering the transmission in linearly polarized illumination.
  • illumination is provided, for example, by LCD screens.
  • Even the blue sky is partially linearly polarized (in contrast to the cloudy sky) and may be suitable as a source of radiation for the investigation of the security element.
  • the polarization filter properties of the security element also allow a machine authenticity check by examining the contrast, for example in a specific spectral range. Contrast is to be understood as the different transmission and / or reflection in mutually orthogonal polarization directions.
  • the checking device thus illuminates the security element successively in two different polarization directions and detects the contrast between the two images obtained thereby. This procedure allows a simple machine check of the security element, which is much more expensive or not possible with other security elements.
  • Fig. 20 shows by way of example a rectangular area 16 which has ten partial areas 16.1 to 16.10 that differ with respect to the longitudinal direction of their line grid structure in such a way that the longitudinal direction changes in 10 ° steps from the vertical orientation (partial area 16.1) into a horizontal orientation (partial area 16.10) , If this structure is rotated in front of a polarized light source, the colors which are recognizable in TE or TM polarization interchange approximately continuously with increasing rotation angle over the partial regions 16.1 to 16.10 due to the polarization-filtering properties of the line grid structure.
  • the security element can serve in particular as a see-through window of banknotes or other documents. It may also be partially overprinted in color or the grid areas may be partially demetallized. Combinations with diffractive grating structures, such as holograms, are also conceivable.
  • the authenticity check of the security element can of course be made without tools. With the help of a polarizer, additional authentication can be performed without additional devices.

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  • Business, Economics & Management (AREA)
  • Accounting & Taxation (AREA)
  • Finance (AREA)
  • Credit Cards Or The Like (AREA)
  • Polarising Elements (AREA)

Claims (10)

  1. Élément de sécurité destiné à la fabrication de documents de valeur, tels que des billets de banques, des chèques ou similaires, lequel présente :
    - un substrat diélectrique (1) ;
    - une première structure de grille en lignes (2), laquelle est incorporée dans le substrat (1) et laquelle est constituée de plusieurs premières traverses en grilles (3) qui sont disposées dans un plan (L) et qui courent le long d'une direction longitudinale, ainsi qu'une deuxième structure de grille en lignes (6), laquelle est incorporée dans le substrat (1) et laquelle est constituée de deuxièmes traverses en grilles (7) qui courent le long de la direction longitudinale ; dans lequel
    - les premières traverses en grilles (3) possèdent respectivement une largeur et sont positionnées à une certaine distance les unes à côté des autres, de telle sorte que de premiers intervalles de grille (4), lesquels courent entre les premières traverses en grilles (3) le long de la direction longitudinale, sont formés avec une largeur qui correspond à la distance ;
    - la deuxième structure de grille en lignes (6) est inversée par rapport à la première structure de grille en lignes (2) ; dans lequel, dans une vue de dessus sur le plan, les deuxièmes traverses en grilles (7) sont positionnées au-dessus des premiers intervalles de grille (4) et les deuxièmes intervalles de grille (8), lesquels se trouvent entre les deuxièmes traverses en grilles (7), sont positionnés au-dessus des premières traverses en grilles (3) ; et
    - la largeur des premières traverses en grilles (3) et des deuxièmes intervalles de grille (8), la largeur des deuxièmes traverses en grilles (7) et des premiers intervalles de grille (4), ainsi qu'une épaisseur (t) des premières traverses en grilles (3) et des deuxièmes traverses en grilles (7) sont respectivement inférieures à 300 nm ;
    - les premières et deuxièmes traverses en grilles (3, 7) sont constituées respectivement de métal ou de semiconducteurs ou d'un revêtement à plusieurs couches ; et
    - les deuxièmes traverses en grilles (7) se trouvent entièrement au-dessus des premières traverses en grilles (3), vis-à-vis du plan (L), de telle sorte que les premières et deuxièmes structures de grille en lignes (2,6) ne forment pas un film cohérent ;
    dans lequel
    le substrat diélectrique (1) qui incorpore les structures de grille en lignes (2, 6) présente une couche de base (9), une couche intermédiaire diélectrique (5) et une couche de revêtement diélectrique (10) ; et dans lequel
    - la première structure de grille en lignes (2) est formée sur la couche de base (9) ;
    - la couche intermédiaire diélectrique (5) est mise en place au-dessus, laquelle recouvre aussi bien les premières traverses en grilles (3) que les premiers intervalles de grille (4) et laquelle est plus épaisse que les premières traverses en grilles (3) ;
    - la deuxième structure de grille en lignes (6) est formée au-dessus ; et
    - la couche de revêtement diélectrique (10) est disposée au-dessus de la deuxième structure de grille en lignes (6) ;
    caractérisé en ce que
    la couche intermédiaire (5), la couche de revêtement (10) et la couche de base (9) possèdent pour l'essentiel un indice de réfraction identique.
  2. Élément de sécurité selon la revendication 1, dans lequel l'indice de réfraction est de 1,5 ou de 1,52 ou de 1,56.
  3. Élément de sécurité selon l'une des revendications ci-dessus, dans lequel il existe une certaine distance (h) entre les premières traverses en grilles (3) et les deuxièmes traverses en grilles (7), mesurée à la perpendiculaire par rapport au plan, laquelle distance est comprise entre 50 nm et 500 nm, de préférence entre 100 nm et 300 nm.
  4. Élément de sécurité selon l'une des revendications ci-dessus, dans lequel les premières et les deuxièmes traverses en grilles (3, 7) présentent un revêtement constitué d'un ou de plusieurs des matériaux suivants : Al, Ag, Cu, Au, Cr, Pt, Si, Ge, ainsi que des alliages de ces matériaux.
  5. Élément de sécurité selon l'une des revendications ci-dessus, dans lequel les premières et/ou les deuxièmes traverses en grilles (3, 7) présentent un revêtement à trois couches, lequel est constitué de deux couches de revêtement en métal ou de semiconducteurs (11, 13), lesquelles sont superposées avec une couche diélectrique (12) qui est mise en place entre ces deux couches précédentes.
  6. Élément de sécurité selon l'une des revendications ci-dessus, pour lequel la largeur (a) est égale à la distance (b).
  7. Élément de sécurité selon l'une des revendications ci-dessus, lequel présente, dans une vue de dessus sur le plan (L), au moins deux zones (14, 15 ; 16.1 - 16.10), dont les directions longitudinales sont positionnées de manière inclinée l'une par rapport à l'autre, en particulier sont positionnées à angle droit.
  8. Élément de sécurité selon la revendication 7, dans lequel les directions longitudinales des deux zones (16.1, 16.10) forment un angle entre elles et l'élément de sécurité présente au moins une troisième zone (16.2 - 16.9), dont la ou les directions longitudinales se trouve ou se trouvent à l'intérieur de cet angle.
  9. Élément de sécurité selon la revendication 8, dans lequel plusieurs troisièmes zones (16.2 - 16.9) sont présentes, lesquelles sont disposées selon un certain schéma de configuration (16) et dont les directions longitudinales sont différentes.
  10. Procédé destiné à la fabrication d'un élément de sécurité en vue de la fabrication de documents de valeur, tels que des billets de banque, des chèques ou similaires, lequel procédé présente :
    - un substrat diélectrique (1) ;
    - une première structure de grille en lignes (2), laquelle est incorporée dans le substrat (1) et laquelle est constituée de plusieurs premières traverses en grilles (3) qui sont disposées dans un plan (L) et qui courent le long d'une direction longitudinale, ainsi qu'une deuxième structure de grille en lignes (6), laquelle est incorporée dans le substrat (1) et laquelle est constituée de deuxièmes traverses en grilles (7) qui courent le long de la direction longitudinale ; dans lequel
    - les premières traverses en grilles (3) possèdent respectivement une largeur et sont positionnées à une certaine distance les unes à côté des autres, de telle sorte que de premiers intervalles de grille (4), lesquels courent entre les premières traverses en grilles (3) le long de la direction longitudinale, sont formés avec une largeur qui correspond à la distance ;
    - la deuxième structure de grille en lignes (6) est inversée par rapport à la première structure de grille en lignes (2) ; dans lequel, dans une vue de dessus sur le plan, les deuxièmes traverses en grilles (7) sont positionnées au-dessus des premiers intervalles de grille (4) et les deuxièmes intervalles de grille (8), lesquels se trouvent entre les deuxièmes traverses en grilles (7), sont positionnés au-dessus des premières traverses en grilles (3) ; et
    - la largeur des premières traverses en grilles (3) et des deuxièmes intervalles de grille (8), la largeur des deuxièmes traverses en grilles (7) et des premiers intervalles de grille (4), ainsi qu'une épaisseur (t) des premières traverses en grilles (3) et des deuxièmes traverses en grilles (7) sont respectivement inférieures à 300 nm ;
    - les premières et deuxièmes traverses en grilles (3, 7) sont constituées respectivement de métal ou de semiconducteurs ou d'un revêtement à plusieurs couches ; et
    - les deuxièmes traverses en grilles (7) se trouvent entièrement au-dessus des premières traverses en grilles (3), vis-à-vis du plan (L), de telle sorte que les premières et deuxièmes structures de grille en lignes (2, 6) ne forment pas un film cohérent ;
    caractérisé en ce que
    une structure en couches est fabriquée en mettant en place une couche de base (9) dans un premier temps, sur laquelle la première structure de grille en lignes (2) est formée, et sur laquelle est mise en place une couche intermédiaire diélectrique (5) qui recouvre la première structure de grille en lignes (2) et qui est plus épaisse que les premières traverses en grilles (3) de la première structure de grille en lignes (2), et sur laquelle la deuxième structure de grille en lignes (6) est ensuite formée et une couche de revêtement diélectrique (10) est mise en place, laquelle forme la terminaison du substrat (1) qui incorpore les structures de grille en lignes (2, 6) ;
    dans lequel la couche intermédiaire (5), la couche de revêtement (10) et la couche de revêtement (9) possèdent un indice de réfraction identique.
EP12773222.0A 2011-10-11 2012-09-26 Élément de sécurité Active EP2766192B1 (fr)

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DE102011115589A DE102011115589A1 (de) 2011-10-11 2011-10-11 Sicherheitselement
PCT/EP2012/004032 WO2013053435A1 (fr) 2011-10-11 2012-09-26 Élément de sécurité

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EP2766192B1 true EP2766192B1 (fr) 2017-12-13

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CN (1) CN103874585B (fr)
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US11198314B2 (en) 2013-05-10 2021-12-14 Nanotech Security Corp. Nanostructure array diffractive optics for RGB and CMYK color displays
DE102013105246B4 (de) 2013-05-22 2017-03-23 Leonhard Kurz Stiftung & Co. Kg Optisch variables Element
DE102014010751A1 (de) 2014-07-21 2016-01-21 Giesecke & Devrient Gmbh Sicherheitselement mit Subwellenlängengitter
DE102014011425A1 (de) * 2014-07-31 2016-02-04 Giesecke & Devrient Gmbh Sicherheitselement zur Herstellung von Wertdokumenten
DE102014018551A1 (de) 2014-12-15 2016-06-16 Giesecke & Devrient Gmbh Wertdokument
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US11143794B2 (en) 2015-07-08 2021-10-12 Shine Optoelectronics (Kunshan) Co., Ltd Optical film
WO2017005206A1 (fr) 2015-07-08 2017-01-12 昇印光电（昆山）股份有限公司 Film optique
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DE102016013690A1 (de) * 2016-11-16 2018-05-17 Giesecke+Devrient Currency Technology Gmbh Sicherheitselement mit Subwellenlängengitter
DE102016013683A1 (de) * 2016-11-16 2018-05-17 Giesecke+Devrient Currency Technology Gmbh Sicherheitselement mit Subwellenlängengitter
DE102016015335A1 (de) 2016-12-21 2018-06-21 Giesecke+Devrient Currency Technology Gmbh Holographisches Sicherheitselement und Verfahren zu dessen Herstellung
DE102017003281A1 (de) * 2017-04-04 2018-10-04 Giesecke+Devrient Currency Technology Gmbh Sicherheitselement mit Reliefstruktur und Herstellungsverfahren hierfür
DE102017003532A1 (de) 2017-04-11 2018-10-11 Giesecke+Devrient Currency Technology Gmbh Sicherheitselement und Herstellungsverfahren hierfür
CN107364252B (zh) * 2017-08-26 2019-06-04 上海速元信息技术有限公司 一种金融防伪票据
CN109291685B (zh) * 2017-09-09 2020-06-23 擎雷(上海)防伪科技有限公司 一种金融防伪票据
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DE102018132516A1 (de) * 2018-12-17 2020-06-18 Giesecke+Devrient Currency Technology Gmbh Im THz-Bereich wirkendes Sicherheitselement und Verfahren zu dessen Herstellung
CN111221065A (zh) * 2020-01-16 2020-06-02 集美大学 一种基于双层不对称金属微纳光栅的双波长滤波器
AT523690B1 (de) * 2020-03-16 2022-03-15 Hueck Folien Gmbh Flächiges Sicherheitselement mit optischen Sicherheitsmerkmalen

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EP2766192A1 (fr) 2014-08-20
DE102011115589A1 (de) 2013-04-11
CN103874585A (zh) 2014-06-18
CN103874585B (zh) 2016-05-04

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