EP3609718B1 - Élément de sécurité et son procédé de fabrication - Google Patents

Élément de sécurité et son procédé de fabrication Download PDF

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Publication number
EP3609718B1
EP3609718B1 EP18719439.4A EP18719439A EP3609718B1 EP 3609718 B1 EP3609718 B1 EP 3609718B1 EP 18719439 A EP18719439 A EP 18719439A EP 3609718 B1 EP3609718 B1 EP 3609718B1
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EP
European Patent Office
Prior art keywords
grid
grid bars
bars
security element
line
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
EP18719439.4A
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German (de)
English (en)
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EP3609718A1 (fr
Inventor
Hans Lochbihler
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Giesecke and Devrient Currency Technology GmbH
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Giesecke and Devrient Currency Technology GmbH
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/20—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof characterised by a particular use or purpose
    • B42D25/29—Securities; Bank notes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/20—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof characterised by a particular use or purpose
    • B42D25/23—Identity cards
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/20—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof characterised by a particular use or purpose
    • B42D25/24—Passports
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/324—Reliefs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/328—Diffraction gratings; Holograms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/351—Translucent or partly translucent parts, e.g. windows
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/373—Metallic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/378—Special inks
    • B42D25/391—Special inks absorbing or reflecting polarised light
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/405—Marking
    • B42D25/425—Marking by deformation, e.g. embossing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/45—Associating two or more layers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1809—Diffraction gratings with pitch less than or comparable to the wavelength
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1814—Diffraction gratings structurally combined with one or more further optical elements, e.g. lenses, mirrors, prisms or other diffraction gratings
    • G02B5/1819—Plural gratings positioned on the same surface, e.g. array of gratings

Definitions

  • the invention relates to a security element for the production of documents of value, such as bank notes, checks or the like, comprising: a dielectric substrate, a line grid, the first grid webs embedded in the substrate, extending in a longitudinal direction and arranged in a first plane, and in the Has second lattice bars embedded in the substrate, running along the longitudinal direction and arranged in a second plane parallel to the first plane, wherein the first and second lattice bars each consist of a high-index material, the second grid bars are located completely above the first lattice bars in relation to the first level so that the first and second lattice bars do not form a coherent film and the first lattice bars each have a width and are spaced apart, so that between the first grid bars along the longitudinal direction first grid gaps with the spacing of the corresponding width are formed, the arrangement of the second grid bars is inverted to that of the first grid bars, so that in plan view of the first or second level, the second grid bars are above the first grid columns and second grid columns that exist between the second
  • the invention further relates to a value document with a security element.
  • the invention finally also relates to manufacturing methods for a security element for manufacturing documents of value, such as bank notes, checks or the like, wherein: a dielectric substrate is provided, a line grid is embedded in the substrate, the grid running along a longitudinal direction and arranged in a first plane has first grid bars and second grid bars running along the longitudinal direction and arranged in a second plane parallel to the first plane, the first and second grid bars each consisting of a high-index dielectric material, the second grid bars referring to the first level completely above the first Lattice bars are located so that the first and second grid bars do not form a coherent film and the first grid bars each have a width and are spaced apart so that first grids running between the first grid bars along the longitudinal direction Columns are formed with the spacing of the corresponding width, the arrangement of the second grid bars is inverted to that of the first grid bars, so that in a plan view of the first or second level, the second grid bars above the first grid columns and second grid gaps that exist between the second grid bars, lie under the first grid bars, the width
  • the invention is based on the object of specifying a security element which is further improved in terms of security against forgery.
  • the security element has a line grid that is embedded in a substrate. It has first and second lattice bars which each run parallel to one another and along a longitudinal direction. Both lattice bars are embedded in the substrate.
  • the grid bars are located in planes that are parallel to one another, so that there are first grid bars that are arranged in a first plane, and second grid bars that lie in a second plane parallel thereto.
  • the first and the second lattice bars each consist of a high-index layer and preferably have a rectangular cross section.
  • the planes or the grid bars are arranged in such a way that the second grid bars are located completely above the first grid bars. As a result, the first and second lattice bars do not form a coherent film.
  • the first grid bars have a width and are spaced apart from one another, so that there are first grid gaps between the first grid bars, the width of which corresponds to the distance at which the first grid bars are adjacent to one another.
  • the second lattice bars the arrangement of which is inverted with respect to the first lattice bars.
  • the second are located Grid bars exactly above the first grid gaps and the second grid gaps, which are formed between the second grid bars, lie under the first grid bars.
  • the width of the grating bars and the grating gaps and the thickness of the grating bars which are preferably rectangular in cross section, are each less than 300 nm, so that the line grating is to be understood as a subwavelength structure.
  • Such line grids have a color filter effect that depends on the angle of the incident light, the angle generally being related to the longitudinal direction of the line grid.
  • a change in color occurs with a variation in the angle of incidence. If the grating is tilted perpendicular to the plane of incidence, the color remains approximately constant.
  • the structure of the line grid eg geometry or choice of material, especially the orientation of the longitudinal direction, influences the color effect.
  • Different areas are therefore formed in the security element which differ with regard to the structure of the line grid.
  • the different areas encode at least one motif that is visible in a plan view of the security element. For example, the areas of the foreground and the background of a motif can be contrasted with one another in terms of color.
  • a metallized relief structure is arranged below the line grid. It has different sections. With regard to the relief, these therefore differ in terms of the radiation reflection. For example, the sections have a different degree of absorption.
  • the different sections of the metallized relief structure are assigned to the different areas of the line
  • metallized relief structures below the line grating that are different in sections with regard to the reflection or absorption properties facilitates the production of the security element considerably, since one can limit oneself to embossing processes for producing the line grating and the relief structure. By doing this you will be Registration requirements, which would arise, for example, in the conventional printing of an absorbent layer, are avoided.
  • the metallized relief structure allows a more high-contrast structuring than would be possible, for example, with printing processes. Reflective sections can now also be realized.
  • the metallized relief structure allows the background, which is arranged under the line grid, to be provided with additional structures that additionally structure the motif that is generated by the line grid or add additional content and thus allow a further design. This increases the variety of designs for the security feature. Since embossing processes are difficult to replicate or imitate, the protection against forgery is also significantly increased.
  • the different areas of the grid of lines produce a color effect which differs when viewed in one and the same direction, whereby the at least one motif is coded.
  • the different color effect is determined by the structure of the line grid. It can be, for example, the orientation of the longitudinal direction and / or profile parameters and / or the choice of material for the line grid.
  • the highly refractive material of the lattice bars has a refractive index that is higher than that of the surrounding substrate.
  • the substrate does not have to have the same refractive index in all areas, for example above and below the first or second grating bars. It is sufficient if the refractive indices are approximately the same, as long as the condition is met that the high-index material of the lattice bars has a significantly higher refractive index.
  • Particularly suitable materials for the lattice bars are: ZnS, ZnO, ZnSe, SiN x , SiOx, Cr 2 O 3 , Nb 2 O 5 , Ta 2 O 5 , Ti x O x SiOx and ZrO 2 . They can vary between the areas.
  • the relief structure arranged below the line grid varies the reflection properties in the sections. It is particularly preferred if the degree of absorption and thereby the degree of reflection varies. This is particularly possible if the relief structure contains a moth's eye structure with an average period of 150 nm to 500 nm. Such moth-eye structures are known in the art as highly absorbent relief structures. If one changes in the sections between moth-eye structures and comparatively less absorbent, e.g. smooth and reflective areas, a good additional structuring of the motif can be achieved through the relief structure.
  • the relief structure can also create an additional color effect.
  • micro-cavity structures with an average period of 500 nm to 2,000 nm are known.
  • Relief structures with micromirrors for example, are known from the prior art (cf. DE 102010049617 A1 ). These micromirrors can be arranged in pixels which each have micromirrors oriented in the same way. Fresnel structures (cf. EP 1562758 B1 ) can be used or combined with micromirrors. Relief heights of a maximum of 5 ⁇ m to a maximum of 100 ⁇ m and lateral dimensions of less than 15 ⁇ m to less than 100 ⁇ m are known for micromirrors.
  • Another known relief structure for generating a motif is a hologram grating in the form of relief holograms. They consist of metallized relief structures with grating periods of 500 nm to 2 ⁇ m and are arranged in such a way that a viewer perceives a motif or a true color image in the first order of diffraction.
  • the US 9188716 B1 uses relief structures in the form of retroreflective structures to create colored motifs. Through the pixel-by-pixel arrangement of relief structures with different profile parameters, images in the zeroth diffraction order can be generated, which are also used can. It is also possible to create movement effects in an image by lining up certain relief structures, for example microstructures (cf. DE 102010047250 A1 ). All of these different relief structures can be used.
  • Another example of sub-wave structures are so-called moth-eye structures (cf. WO 2006/026975 A2 and EP 2453269 A1 ).
  • the color effect of the line grid can be intensified (as is the case, for example, with a highly absorbent relief structure) or weakened by sections of the relief structure arranged underneath.
  • the relief structure contains at least one smooth section or micromirror elements. The line grid is then irradiated twice in these sections, so that the color effect of the line grid structure has a changed effect.
  • the relief structure can be coated, for example, with aluminum, silver, copper, palladium, gold, chromium, nickel or an alloy thereof.
  • a multilayer construction with at least one metallic layer can also be used.
  • the line grid consists of two superimposed, complementary structures, that is, mutually displaced line grid structures.
  • a phase shift of 90 ° is the ideal value, which of course has to be seen in the context of manufacturing accuracy. Manufacturing tolerances can result in deviations from the complementarity, i.e. 90 ° phase shift, since a rectangular profile is usually not perfectly formed, but can only be approximated by a trapezoidal profile whose upper parallel edge is shorter than the lower parallel edge.
  • the fat the lattice bars is less than the modulation depth, i.e. than the distance between the levels.
  • the security element can be produced simply by a layer structure in that a base layer is first provided on which the first structure for the first lattice webs is formed. A dielectric intermediate layer is applied thereon, which covers the first lattice bars and is preferably thicker than the first lattice bars. The displaced second lattice webs can then be formed thereon and a dielectric cover layer forms the end of the embedding substrate.
  • a sub-wave grating can also first be formed in the dielectric substrate which has a rectangular profile in cross section. If this is vaporized vertically with the high-index material, a layer is created on the plateaus and in the trenches, which form the first and second lattice bars. The desired, non-contiguous high-index layer of the first and second grating bars is thus obtained in different planes if the layer thickness of the grating bars is less than the modulation depth of the rectangular profile of the previously structured dielectric substrate.
  • a particularly good color effect is obtained when the distance between the first and the second grating bars, that is to say the modulation depth of the structure, is between 50 nm and 500 nm, preferably between 100 nm and 300 nm.
  • the distance is to be measured by the same facing surfaces of the first and second line grid structure, ie for example from the bottom of the first grid bars to the bottom of the second grid bars or from the top of the first grid bars to the top of the second grid bars.
  • the distance is of course to be measured perpendicular to the plane, i.e. the height difference between the rectilinear surfaces of the lattice bars.
  • a security element with several differently arranged areas is also conceivable, which differ from one another with regard to the longitudinal direction along which the lattice webs run.
  • This allows motifs with multiple colors to be produced.
  • the longitudinal direction is varied gradually from one area to the next in certain angular steps, for example in 5 °, 10 ° or 15 ° steps, between several such areas that are adjacent to one another. If you twist such a structure of adjacent areas in front of a pulverized light source, the colors interchange almost continuously as the angle of rotation of the structure increases. For an observer, for example, this results in a kind of movement effect for a corresponding motif when the grid is tilted around the horizontal axis. A color change occurs in the areas with increasingly inclined grid lines with a delay compared to the areas with the more horizontal grid lines.
  • FIG. 8 shows, in a sectional illustration, part of a security element S which has a line grid embedded in a substrate 1.
  • the sectional view of the Fig. 1 is simplified to the effect that a metallized relief structure which is arranged below the line grid and which absorbs radiation at least in sections is shown without any further structure.
  • the relief structure 11 is structured in sections, as will be shown later on the basis of FIG Figures 12a and b is explained in more detail. Until then, the description assumes, for the sake of simplicity, that the relief structure 11 is absorbed over the entire area, that is, is not divided into sections. This is used exclusively for a better understanding of the effect of the line grid and represents a simplification compared to the embodiments of the invention.
  • the first lattice structure consists of first lattice webs 3 with the width a, which are located along a perpendicular to the plane of the drawing Extend longitudinally.
  • the thickness of the first lattice webs 3 (measured perpendicular to the plane L1) is indicated by t.
  • a second lattice structure 6 with second lattice bars 7. have the width b.
  • the second lattice structure 6 is phase-shifted with respect to the first line lattice structure 2 in such a way that the second lattice webs 7 come to lie over the first lattice gaps 4 as precisely as possible (within the scope of the manufacturing accuracy).
  • second grid gaps 8, which exist between the second grid bars 7, lie above the first grid bars 3.
  • the thickness t is smaller than the height h, so that no cohesive film is formed from the grid bars 3 and 7.
  • the width a of the first grid bars 3 is equal to the width b of the second grid bars 7.
  • the fill factor in each line grid structure is thus 50%. However, this is not mandatory.
  • any variation can be made according to the formula b + a d.
  • the schematic sectional illustration of FIG Fig. 1 the thickness t of the first lattice webs 2 is equal to the thickness t of the second lattice webs 7. This benefits a simpler production, but is not absolutely necessary. However, it is essential that the modulation depth h, ie the height difference between the first lattice structure 2 and the second lattice structure 6, is greater than the sum of the thicknesses of the first lattice bars 3 and the second lattice bars 7, since otherwise there is no separation between the two lattice structures 2 and 6 would be given.
  • the reflection properties depend on the angle of incidence ⁇ , as will be explained below.
  • the dimensions b, a and t are in the sub-wavelength range, ie smaller than 300 nm.
  • the modulation depth is preferably between 50 nm and 500 nm.
  • the security element S can be produced, for example, by first lattice structure 2 and an intermediate layer 5 is applied thereon.
  • the second lattice structure with the second lattice webs 7 can then be introduced into the lattice gap 4, which is shown upwards.
  • a cover layer 10 covers the security element.
  • the refractive indices of the layers 9, 5 and 10 are essentially the same and can be, for example, approximately 1.5, in particular 1.52.
  • a production method is also possible in which a rectangular grid with a profile depth h is first produced on an upper side of the substrate 1.
  • the substrate 1 is structured in such a way that trenches of width a alternate with webs of width b.
  • the structured substrate is then vaporized vertically from above with the desired coating, so that the lattice structures are created. After the vapor deposition, the structure is finally covered with a top layer. This gives a layer structure in which the top and bottom have essentially the same refractive index.
  • the relief structure can be created before or after. It can be applied either on the same side or on the opposite side of a carrier film.
  • the structured substrate can be obtained in various ways. One option is reproduction with a master. The master form can now be replicated, for example, in UV varnish on foil, eg PET foil. The substrate 1 is then used as the dielectric material. Alternatively, hot stamping processes are also possible.
  • the master or the substrate itself can be produced using an e-beam system, a focused ion beam or interference lithography, with the structure being written in a photoresist and then developed.
  • the structure of a photolithographically produced master can be etched into a quartz substrate in order to create the most perpendicular flanks of the profile.
  • the quartz wafer then serves as a preform and can, for example, be copied in Ormocer or reproduced by galvanic molding.
  • the photolithographically produced original can be molded in Ormocer or nickel in a galvanic process.
  • a motif with different lattice structures can also be put together in a nanoimprint process based on homogeneous lattice masters. Such manufacturing processes for subwavelength grating structures are known to the person skilled in the art.
  • the following are the optical properties of the grating of the Fig. 1 described by way of example for the high-index materials ZnO, Ta 2 O 5 or ZnS in a surrounding substrate with a refractive index n 1.52 in the visible wavelength range.
  • ZnS is considered a dielectric, but has a clear absorption content in the blue.
  • a rectangular profile is assumed for the lattice bars 3, 7. Small deviations from this rectangular shape, e.g. a production-related trapezoidal shape, lead to similar results in terms of the optical effect.
  • FIG. 2a shows a grid with ZnO as the material of the grid bars.
  • Figure 2b is the material of the bars Ta 2 O 5 , and in Figure 2c it is ZnS.
  • the TM polarization In the spectra of the TE polarization, three distinct maxima can be seen in each case.
  • the reflection is significantly lower and there are only relatively weak maxima in the spectra.
  • the TM polarization appears red, the TE polarization green.
  • the TE polarization is about three times as bright as the TM polarization.
  • the TM polarization can be seen in orange, the TE polarization in green; the latter twice as bright as the first.
  • ZnS coating the TM polarization appears in blue, the TE polarization in orange and is also twice that bright.
  • Figures 3a to 3c show the spectral reflection for the materials TiO 2 ( Fig. 3a ), Ta 2 O 5 ( Figure 3b ) and ZnS ( Figure 3c ) the bars.
  • Fig. 4 shows the lightness L *, the middle one the chroma or color saturation C *, and the lower one the hue h °.
  • the color is also much more pronounced. It is maximum at an angle of 30 °.
  • the color values x, y are used for the grid of the Fig. 4 calculated and displayed in the CIE 1931 color space (cf. Fig. 5 ).
  • the white point is marked with the symbol "o".
  • the triangle drawn further delimits the color range that can usually be displayed on screens.
  • the x, ⁇ color coordinates that result when tilting from 0 ° to 45 ° are shown as trajectories.
  • the modulation depth h was varied.
  • Fig. 7 shows the corresponding representation in the CIE 1931 color space. The trajectories are assigned to the different modulation depths here.
  • the starting point ⁇ 0 ° is again marked with an asterisk.
  • the color diagram shows a good color contrast. The color changes from red on vertical incidence through green and blue to magenta when tilted from 0 ° to 45 °.
  • the chroma and the hue can be adjusted by choosing the modulation depth. For example, a shade of blue is achieved for an increasing h and an increasing smaller angle.
  • Fig. 8 illustrates the influence of the period d on the color properties of the line grid.
  • periods of 320 nm 360 nm and 400 nm are shown with regard to their effects in the LCh color space. It can be seen that the characteristic of the brightness values shifts towards larger angles of incidence for increasing periods. This also applies to the sparkleness and hue.
  • Fig. 10 shows the influence of the material of the lattice bars 3, 7 on the color characteristics.
  • the materials Ta 2 O 5 , ZnS, TiO 2 are shown with regard to their effect in the LCh color space. Essentially, the different refractive indices have a relatively small influence on the color characteristics of the line grating when tilted.
  • Fig. 11 shows the corresponding representation in the CIE 1931 color space. This shows that the coatings Ta 2 O 5 and TiO 2 deliver somewhat more saturated colors than ZnS. When tilting from 0 ° to 45 °, the entire color palette is run through for the three different materials. For TiO 2 , the color intensity is somewhat weaker than for the other materials.
  • the described optical properties of the line grid are used to design a security element with optically variable colors in reflection.
  • the security element S consists of the explained line grid on a metallized relief background 11. This is structured, as shown by way of example Figures 10a and 10b is explained.
  • Figure 10a shows the relief structure 11 with sections that differ with regard to the reflection properties.
  • a moth's eye structure 12 alternates with a reflective, because smooth, section 13.
  • other known light-absorbing structures such as, for example, microcavities, can also be used.
  • the line grating appears colored in reflection to a viewer, since a double passage of the incident radiation E through the line grating is only possible where the smooth areas 13 are formed due to the absorbing properties of the moth eye structure 12 .
  • Figure 12b shows schematically a security element, the relief structure 11 of which is provided with three different sections, the moth's eye structure 12, a smooth section 15 and a micromirror arrangement 14.
  • Such micromirror arrangements are particularly suitable for conveying movement effects or, as an arrangement in a Fresnel structure, spatial impressions.
  • the micromirror structure results in different light paths that shape the visual appearance of the micromirror surfaces.
  • the line grating structure is formed with a constant profile, constant period and constant longitudinal direction.
  • this constancy can also be replaced by a variation of one, both or all three parameters.
  • purely reflective or completely transparent areas are also possible.
  • Transparent areas can be created using laser ablation or washing color technology, for example.
  • the technically completely freely selectable design of the relief structure 11 and the line grid allows different motifs to be implemented in these two embossing planes, i.e. to design very complex images as a result, which are designed on the one hand by the structuring of the relief structure 11 and on the other hand by the structuring of the line grid are.
  • the azimuth angle i.e. the longitudinal direction along which the grating webs 3, 7 run, can be selected to be different in areas.
  • Fig. 13 shows an example of how the colored appearance of tilted micromirror surfaces is represented in the relief structure 11. This appearance is particularly effective in daylight conditions and diffuse lighting, since the illuminating light then falls on the security element from a wide variety of directions.
  • Fig. 13 shows the spectral reflection of the line grating and compares that of a micromirror surface tilted by 15 °. Since part of the radiation traverses the grating twice, this curve is labeled "R + T", whereas the reflective component is labeled "R” in FIG Fig. 13 is marked. It turns out that the micromirrors are not neutral in color like smooth metallic areas, but are somewhat colored. The micromirror area appears reddish to an observer.
  • Fig. 14 shows an example of a security thread 16 for a bank note with a motif 1, which has an optically variable color, and a motif 2, which is color-invariant when tilted about the axis drawn in dashed lines in the direction of the arrow.
  • a first motif 17 is designed as a butterfly, a second motif 18 as a value number. Both stand out a background 19.
  • the longitudinal direction of the lattice webs runs in the background 19 and the second motif 18 along the security thread 16, in the motif 17 horizontally, i.e. perpendicular to the longitudinal direction of the security thread 16.
  • the relief structure 11 is designed to be reflective and otherwise light-absorbing below the motif 2.
  • the motif 2 is smooth in the area of the motif 2 and designed as a moth's eye structure in the rest of the area.
  • this security element is rotated by an azimuth angle, the color of the motif 17 is swapped with respect to the background 19.
  • the motif 18 appears independently of this in terms of color.
  • Fig. 15 shows an element with a motif 17 in the form of a star and a motif 18 in the form of a value number.
  • the relief structure 11 is smooth, that is, it is designed to be highly reflective. Otherwise, it is again designed to be light-absorbing, for example as a moth's eye structure.
  • the longitudinal direction of the line grid is oriented horizontally in the area of the motif 17, but vertically in the background 19.
  • the star is filled in five interleaved star-shaped areas with line grids of different periods.
  • the motif shows a continuous color gradient from the outside to the inside when the lattice period increases or decreases from the outer to the inner area of the star.
  • Fig. 9 shows, by choosing the grating periods in the range from 320 nm to 400 nm, a color range from yellow to blue can be observed, for example at an angle of 15 °. When tilted, the colors run from the outside to the inside. At a tilt angle of 45 °, the entire motif is red.
  • the arrangement of the longitudinal direction of the line grid is not limited to a position at right angles to one another in different areas. It is an embodiment is also possible in which the longitudinal direction changes in gradations between areas. The observer then perceives a kind of movement effect. This can of course be used when designing motifs.

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Business, Economics & Management (AREA)
  • Accounting & Taxation (AREA)
  • Finance (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Claims (11)

  1. Elément de sécurité pour la fabrication de documents de valeur, tels que des billets de banque, des chèques ou similaires, présentant :
    - un substrat diélectrique (1),
    - une grille de lignes qui présente des premières rangées de grille (3) incorporées dans le substrat (1), s'étendant le long d'une direction longitudinale et disposées dans un premier plan (L1), et des deuxièmes rangées de grille (7) incorporées dans le substrat (1), s'étendant le long de la direction longitudinale et disposées dans un deuxième plan (L2) parallèle au premier plan (L1), dans lequel
    - les premières et deuxièmes rangées de grille (3, 7) sont respectivement composées d'un matériau fortement réfringent,
    - les deuxièmes rangées de grille (7) se trouvent entièrement au-dessus des premières rangées de grille (3) par rapport au premier plan (L1) de sorte que les premières et deuxièmes rangées de grille (3, 7) ne forment pas de film cohérent, et
    - les premières rangées de grille (3) présentent respectivement une largeur et sont adjacentes avec un espacement tel qu'entre les premières rangées de grille (3), des premières colonnes de grille (4) s'étendant le long de la direction longitudinale sont formées avec une largeur correspondant à l'espacement,
    - la disposition des deuxièmes rangées de grille (7) est inversée par rapport à celle des premières rangées de grille (3) de sorte qu'en vue de dessus sur le premier ou le deuxième plan, les deuxièmes rangées de grille (7) sont situées au-dessus des premières colonnes de grille (4), et des deuxièmes colonnes de grille (8) qui existent entre les deuxièmes rangées de grille (7) sont situées au-dessous des premières rangées de grille (3),
    - la largeur des premières rangées de grille (3) et des deuxièmes colonnes de grille (8), la largeur des deuxièmes rangées de grille (7) et de la première colonne de grille (4), et une épaisseur des premières rangées de grille (3) et des deuxièmes rangées de grille (7) sont respectivement inférieures à 300 nm,
    - dans l'élément de sécurité (S), différentes zones (17 à 19) sont formées qui se distinguent par une structure de la grille de lignes, les différentes zones codant au moins un motif qui est visible en vue de dessus sur l'élément de sécurité,
    caractérisé en ce que
    - en vue de dessus au-dessous de la grille de lignes, une structure en relief métallisée (11) est disposée qui présente différentes parties (12 à 15) qui se distinguent par le relief et la réflexion de rayonnement, les différentes parties (12 à 15) de la structure en relief métallisée (11) étant associées aux différentes zones (17 à 19) de la grille de lignes et poursuivant la structuration du motif.
  2. Elément de sécurité selon la revendication 1, dans lequel les zones (17 à 19) se distinguent au moins en partie aussi par des paramètres de profil de la grille de lignes.
  3. Elément de sécurité selon l'une quelconque des revendications précédentes, dans lequel la couche fortement réfringente est formée en ZnS, ZnO, ZnSe, SiNx, SiOx, Cr2O3, Nb2O5, Ta2O5, TixOx, SiOx et ZrO2.
  4. Elément de sécurité selon l'une quelconque des revendications précédentes, dans lequel la structure en relief (11) contient une structure en forme d'œil de mite (12) ayant une période moyenne de 150 nm à 500 nm.
  5. Elément de sécurité selon l'une quelconque des revendications précédentes, dans lequel la structure en relief (11) contient une structure de microcavités ayant une période moyenne de 500 nm à 2000 nm.
  6. Elément de sécurité selon l'une quelconque des revendications précédentes, dans lequel la structure en relief (11) contient un agencement de micro-miroirs (14) ayant une dimension horizontale moyenne dans une direction spatiale de 2 µm à 20 µm.
  7. Elément de sécurité selon l'une quelconque des revendications précédentes, dans lequel la structure en relief (11) contient au moins une partie lisse et/ ou transparente (13,15).
  8. Elément de sécurité selon l'une quelconque des revendications précédentes, dans lequel la structure en relief (11) est recouverte d'une couche métallique, comme par exemple l'aluminium, l'argent, le cuivre, le palladium, l'or, le chrome, le nickel ainsi que leurs alliages.
  9. Elément de sécurité selon l'une quelconque des revendications précédentes, dans lequel la structure en relief (11) est recouverte de couches multiples comprenant au moins une couche métallique.
  10. Document de valeur comprenant un élément de sécurité selon l'une quelconque des revendications 1 à 9.
  11. Procédé de fabrication pour un élément de sécurité permettant de fabriquer des documents de valeur, tels que des billets de banque, des chèques ou similaires, dans lequel :
    - un substrat diélectrique (1) est prévu,
    - une grille de lignes est incorporée dans le substrat (1) qui présente des premières rangées de grille (3) s'étendant dans une direction longitudinale et disposées dans un premier plan (L1), et des deuxièmes rangées de grille (7) s'étendant le long de la direction longitudinale et disposées dans un deuxième plan (L2) parallèle au premier plan (L1), dans lequel
    - les premières et deuxièmes rangées de grille (3, 7) sont respectivement composées d'un matériau fortement réfringent,
    - les deuxièmes rangées de grille (7) se trouvent entièrement au-dessus des premières rangées de grille (3) par rapport au premier plan (L1) de sorte que les premières et deuxièmes rangées de grille (3, 7) ne forment pas de film cohérent, et
    - les premières rangées de grille (3) présentent respectivement une largeur et sont adjacentes avec un espacement tel qu'entre les premières rangées de grille (3) des premières colonnes de grille (4) s'étendant le long de la direction longitudinale sont formées avec une largeur correspondant à l'espacement,
    - la disposition des deuxièmes rangées de grille (7) est inversée par rapport à celle des premières rangées de grille (3) est inversée de sorte qu'en vue de dessus sur le premier ou le deuxième plan, les deuxièmes rangées de grille (7) sont situées au-dessus des premières colonnes de grille (4), et les deuxièmes colonnes de grille (8) qui existent entre les deuxièmes rangées de grille (7) sont situées au-dessous des premières rangées de grille (3),
    - la largeur des premières rangées de grille (3) et des deuxièmes colonnes de grille (8), la largeur des deuxièmes rangées de grille (7) et de la première colonne de grille (4), et une épaisseur des premières rangées de grille (3) et des deuxièmes rangées de grille (7) sont respectivement inférieures à 300 nm,
    - dans l'élément de sécurité (S), différentes zones (17 à 19) sont réalisées qui se distinguent par une structure de la grille de lignes, les différentes zones codant au moins un motif qui est visible en vue de dessus sur l'élément de sécurité,
    caractérisé en ce que
    - en vue de dessus au-dessous de la grille de lignes, une structure en relief métallisée (11) est disposée qui présente différentes parties (12 à 15) qui se distinguent par le relief et la réflexion de rayonnement, les différentes parties (12 à 15) de la structure en relief métallisée (11) étant associées aux différentes zones (17 à 19) de la grille de lignes et poursuivant la structuration du motif.
EP18719439.4A 2017-04-11 2018-04-10 Élément de sécurité et son procédé de fabrication Active EP3609718B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102017003532.6A DE102017003532A1 (de) 2017-04-11 2017-04-11 Sicherheitselement und Herstellungsverfahren hierfür
PCT/EP2018/000179 WO2018188787A1 (fr) 2017-04-11 2018-04-10 Élément de sécurité et son procédé de fabrication

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EP3609718A1 EP3609718A1 (fr) 2020-02-19
EP3609718B1 true EP3609718B1 (fr) 2021-06-09

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Publication number Priority date Publication date Assignee Title
US694392A (en) 1901-03-21 1902-03-04 Edwin C Lane Tuning device for stringed instruments.
DE10254500B4 (de) 2002-11-22 2006-03-16 Ovd Kinegram Ag Optisch variables Element und dessen Verwendung
DE102004043871A1 (de) 2004-09-10 2006-03-30 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Herstellung eines strahlungsabsorbierenden optischen Elements und strahlungsabsorbierendes optisches Element
DE102009012300A1 (de) 2009-03-11 2010-09-16 Giesecke & Devrient Gmbh Sicherheitselement mit mehrfarbigem Bild
DE102009012299A1 (de) 2009-03-11 2010-09-16 Giesecke & Devrient Gmbh Sicherheitselement
DE102009056933A1 (de) 2009-12-04 2011-06-09 Giesecke & Devrient Gmbh Sicherheitselement mit Farbfilter, Wertdokument mit so einem solchen Sicherheitselement sowie Herstellungsverfahren eines solchen Sicherheitselementes
DE102010047250A1 (de) 2009-12-04 2011-06-09 Giesecke & Devrient Gmbh Sicherheitselement, Wertdokument mit einem solchen Sicherheitselement sowie Herstellungsverfahren eines Sicherheitselementes
DE102010049617A1 (de) 2010-10-26 2012-04-26 Giesecke & Devrient Gmbh Sicherheitselement mit optisch variablem Flächenmuster
DE102010050895A1 (de) 2010-11-10 2012-05-10 Giesecke & Devrient Gmbh Dünnschichtelement mit Mehrschichtstruktur
DE102010052665A1 (de) * 2010-11-26 2012-05-31 Giesecke & Devrient Gmbh Reflektierendes Sicherheitselement für Sicherheitspapier, Wertdokumente oder dergleichen
DE102011115589A1 (de) 2011-10-11 2013-04-11 Giesecke & Devrient Gmbh Sicherheitselement
FR2996338B1 (fr) 2012-09-28 2020-10-16 Hologram Ind Composant optique de securite a effet reflectif, fabrication d'un tel composant et document securise equipe d'un tel composant
DE102014010751A1 (de) * 2014-07-21 2016-01-21 Giesecke & Devrient Gmbh Sicherheitselement mit Subwellenlängengitter
DE102015010191A1 (de) * 2015-08-06 2017-02-09 Giesecke & Devrient Gmbh Sicherheitselement mit Subwellenlängengitter

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EP3609718A1 (fr) 2020-02-19
DE102017003532A1 (de) 2018-10-11

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