Classifications

• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05C19/00—Apparatus specially adapted for applying particulate materials to surfaces
  • B05C19/04—Apparatus specially adapted for applying particulate materials to surfaces the particulate material being projected, poured or allowed to flow onto the surface of the work
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05C19/00—Apparatus specially adapted for applying particulate materials to surfaces
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
  • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
  • B05C11/1002—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
  • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
  • B05C11/1036—Means for supplying a selected one of a plurality of liquids or other fluent materials, or several in selected proportions, to the applying apparatus
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05C19/00—Apparatus specially adapted for applying particulate materials to surfaces
  • B05C19/008—Accessories or implements for use in connection with applying particulate materials to surfaces; not provided elsewhere in B05C19/00
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05C19/00—Apparatus specially adapted for applying particulate materials to surfaces
  • B05C19/06—Storage, supply or control of the application of particulate material; Recovery of excess particulate material
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05D1/00—Processes for applying liquids or other fluent materials
  • B05D1/02—Processes for applying liquids or other fluent materials performed by spraying
  • B05D1/12—Applying particulate materials
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05D1/00—Processes for applying liquids or other fluent materials
  • B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
  • B05D1/20—Processes for applying liquids or other fluent materials performed by dipping substances to be applied floating on a fluid
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
  • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
  • B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
  • B05D3/12—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by mechanical means
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
  • B05D3/20—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by magnetic fields
  • B05D3/203—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by magnetic fields pre-treatment by magnetic fields

Definitions

• the invention relates to the field of installations and methods for depositing a film of ordered particles on a moving substrate.
• the particle size may be between a few nanometers and several hundred micrometers.
• the particles, preferably spherical in shape, may for example be silica particles, or polymer such as polystyrene.
• the invention has many applications, in particular in the field of fuel cells, optics, photonics, polymer coating, chips, MEMs, surface structuring for organic electronics and photovoltaic, etc.
• the particles are kept ordered thanks in particular to the pressure exerted upstream by the moving particles intended to later reach this transfer zone.
• the cohesion of the particle scheduling is further ensured by weak forces of capillary or electrostatic type.
• the particle transfer zone is connected upstream to an inclined ramp on which the particles coming from a dispensing device run past, it is these same particles present on the inclined ramp which exert an pressure on the particles contained in the transfer zone, and which thus make it possible, in cooperation with the capillary forces of proximity, to preserve the ordering of the particles in this zone, until deposit on the substrate, by capillarity or direct contact.
• the kinetic energy required for the ordering of the particles is here brought by the inclined ramp carrying the carrier liquid and the particles.
• Other solutions are nevertheless possible, such as the setting in motion, with the aid of a pump, of the carrier liquid on a horizontal plane, the downstream part of which constitutes the zone of transfer of the particles.
• Another solution is to replace said pump by a blower for applying a flow of air to the surface of the carrier liquid, on which the particles float.
• the film deposited on the substrate has a determined width, corresponding to the full width of the exit of the transfer zone through which the particles escape.
• Deposits of films of different widths are only envisaged by means of separate installations with appropriate dimensions. This generates disadvantages in terms of space, manufacturing costs and development costs of the facilities.
• the delicate determination of the position of the particle front on the inclined ramp is a function of a multitude of parameters, some of which are specific to the installation concerned. This involves determining the position of the front for each different design facility.
• the object of the invention is therefore to remedy at least partially the disadvantages mentioned above, relating to the embodiments of the prior art.
• the invention firstly relates to an installation for depositing a film of ordered particles on a substrate, preferably in scrolling, the installation comprising:
• a transfer zone comprising a particle inlet and an outlet of particles spaced from each other by two opposite lateral edges, retaining a carrier liquid on which the particles float,
• the installation being designed to allow the deposition, on the substrate, of a film of ordered particles escaping by said output of particles having a first width (L1), the deposit being effected for example by contact or with the aid of a capillary bridge providing the connection between the carrier liquid contained in the transfer zone and said substrate on which the ordered particle film is intended to be deposited.
• the installation further comprises an accessory device in the form of a deposition head, intended to close said particle outlet and designed to allow the deposition on the substrate of a film of ordered particles escaping through one end of a particle transfer channel of said deposition head, said end having a second width (L2) strictly smaller than said first width (L1).
• the invention thus cleverly provides an accessory device that can be mounted on the installation so as to obtain the deposition of a film of smaller width.
• This solution therefore provides a satisfactory answer to the problems of space, manufacturing costs and development costs encountered in the embodiments of the prior art.
• the position of the front can be preserved, whether or not the installation is equipped with the accessory device.
• the same accessory device has a plurality of particle transfer channels, in order to simultaneously deposit several films on the same substrate, these films can then of course be of identical or different widths.
• the second width may optionally be adjustable.
• the installation according to the invention is remarkable in that it makes it possible to present a common base for a multitude of deposits of different shapes, only the accessory device forming a deposition head being adapted to the desired film size, or even removed when the deposit should have a maximum width corresponding to the first width of the particle outlet of the transfer zone.
• the installation also comprises one or more suction nozzles capable of attracting the ordered particles present in the transfer zone to the particle transfer channel of said deposition head, when it is mounted on the installation.
• the suction created makes it possible to promote the introduction, into the transfer channel, of the particles initially present in the transfer zone. This aspiration is preferably performed at the liquid / air interface in the particle transfer channel.
• said one or more suction nozzles are arranged in said particle transfer channel near said end.
• the installation also comprises means for acting on the particles before they enter the transfer channel and / or within the latter.
• These means preferably make it possible to act on the orientation of the particles and / or on the properties physicochemical of these. To do this, these means may be laser, magnetic, electrical, thermal, ultrasonic, or any other design deemed appropriate by those skilled in the art.
• the bottom of said transfer channel has a coating of hydrophilic material, interrupting before said end, made of hydrophobic material.
• the coating of hydrophilic material promotes the advancement and withdrawal of the carrier liquid within the transfer channel.
• the bottom of the portion of the deposition head located upstream of the transfer channel may also be provided with such a coating.
• the hydrophobic character of the end of the channel designed to cooperate with the substrate, for its part, effectively breaks the contact between the liquid and the substrate during a removal operation of the carrier liquid from the depositing head, the end of a step of depositing a film on this substrate.
• the ratio between the first and second widths (L1, L2) is between 2000 and 2, and preferably between 100 and 10.
• the installation comprises an inclined ramp of particle circulation, attached to said inlet of the transfer zone, and on which said carrier liquid is also intended to circulate.
• the kinetic energy required for the ordering of the particles in the normal regime is here brought by the inclined ramp carrying the carrier liquid and the particles.
• Other solutions are nevertheless possible, such as the setting in motion, with the aid of a pump, the carrier liquid on a horizontal plane whose downstream part constitutes the particle transfer zone.
• Another solution is to replace the pump by a blower for applying a flow of air to the surface of the carrier liquid, on which the particles float.
• Other solutions are nevertheless conceivable, without departing from the scope of the invention, as a work of particle compression via a technique called "Langmuir-Blodgett".
• said deposition head accessory device is designed to allow the deposition, on the substrate, of a film of ordered particles escaping from the end of the particle transfer channel, with the aid of a direct contact provided between the end of the depositing head and the substrate.
• a capillary bridge providing the connection between the carrier liquid contained in the particle transfer channel, and said substrate on which the ordered particle film is intended to be deposited.
• the invention also relates to a method of depositing a film of ordered particles on a substrate, preferably in scrolling, using an installation as described above.
• said deposition head accessory device is mounted or not on said installation, prior to said deposition.
• FIG. 1 shows a deposition installation according to a preferred embodiment of the present invention, in schematic section taken along the line I-I of FIG. 2, the installation shown being in a first configuration;
• FIG. 2 represents a schematic view from above of the depot installation shown in FIG. 1;
• Figures 3 to 6 show different stages of a deposition process implemented using the installation shown in the previous figures
• FIG. 7 represents a perspective view of an accessory device forming a deposition head intended to equip the installation shown in the preceding figures;
• Figure 8 shows the deposition facility in a second configuration, this view being a schematic section taken along the line VIII-VIII of Figure 9;
• Figure 9 is a schematic top view of the depot installation shown in Figure 8;
• Figures 10 to 14 show different stages of a deposition process implemented using the installation shown in Figures 8 to 14; and
• FIGS. 15 and 16 show perspective views of an accessory device forming a deposition head, according to an alternative embodiment.
• FIG. 1 we can see a facility 1 for the deposition of a film of ordered particles on a moving substrate.
• the installation is in a first configuration, in which it is not equipped with its accessory device deposit head, specific to the present invention and will be described below.
• the installation 1 comprises a device 2 for dispensing particles 4, whose size may be between a few nanometers and several hundred micrometers.
• the particles preferably of spherical shape, may for example be silica particles.
• Other particles of interest can be made of metal or metal oxide such as platinum, TiO 2, polymer such as polystyrene or PMMA, carbon, etc.
• the particles are silica spheres of about 1 ⁇ in diameter, stored in solution in the dispensing device 2.
• the proportion of the medium is about 7 g of particles per 200 ml solution, here butanol.
• the particles shown in the figures adopt a diameter greater than their actual diameter.
• the dispensing device 2 has a controllable injection nozzle 6, about 500 ⁇ in diameter.
• the installation also comprises a liquid conveyor 10, incorporating an inclined ramp 12 of particle circulation, and a substantially horizontal transfer zone 14, or even having a slight inclination so as to promote the emptying of the installation, if necessary.
• the upper end of the inclined ramp is designed to receive the particles injected from the dispensing device 2.
• This ramp is straight, inclined at an angle between 5 and 60 °, preferably between 10 and 30 °, allowing the particles to be conveyed to the transfer zone 14.
• a carrier liquid 16 flows on this ramp 12, into the transfer zone.
• This liquid 16 can also be re-circulated using one or two pumps 18, between the transfer zone 14 and the upper end of the ramp.
• This is preferably a deionized water, on which the particles 4 can float. Nevertheless, it is possible to favor a new liquid via an open circulation circuit.
• the lower end of this same ramp is connected to an inlet of the particle transfer zone 14.
• This inlet 22 is located at an inflection line 24 showing the junction between the surface of the carrier liquid present on the plane inclined of the ramp 12, and the surface of the carrier liquid present on the horizontal part of the transfer zone 14.
• the particle inlet 22 is spaced apart from a particle outlet 26 by means of two lateral flanges 28 holding the carrier liquid 16 in the zone 14. These flanges 28, opposite and at a distance from one another , extend parallel to a main direction of flow of the carrier liquid and particles in the installation, this direction being shown schematically by the arrow 30 in Figures 1 and 2.
• the zone 14 therefore takes the form of a corridor or an open path at its entrance and exit.
• the bottom of the downstream portion of the transfer zone has a plate 27 slightly inclined upstream relative to the horizontal direction, for example a value of the order of 5 to 10 °. It is the downstream end of this same plate 27, also called “blade”, which partly defines the output of particles 26.
• the installation 1 is also provided with a substrate conveyor 36, for putting the substrate 38 in motion.
• This substrate can be rigid or flexible. In the latter case, it can be set in motion on a roll 40 whose axis is parallel to the outlet 26 of the zone 14, near which it is located. Indeed, the substrate 38 is intended to scroll very closely to the outlet 26, so that the particles escaping from this outlet can be easily deposited on this substrate, via a capillary bridge 42, also called meniscus, which connects to the carrier liquid 16. Even more preferably, the substrate may be in direct contact with the transfer zone, without departing from the scope of the invention. The capillary bridge mentioned above is then no longer required.
• the width of the substrate corresponds to the width of the zone 14 and its outlet 26.
• This is a first width L1 which also corresponds to the width of the particle film to be deposited. on the substrate.
• This first width may be of the order of 25 to 30 cm.
• the capillary bridge 42 is provided between the carrier liquid 16 which is located at the outlet 26, and a portion of the substrate 38 conforming to the guide / driving roller 40.
• the axis of rotation of the latter roller can be located in the plane of the upper surface of the carrier liquid retained in zone 14.
• the substrate 38 may be in a vertical direction, substantially orthogonal to the direction 30.
• the injection nozzle 6 is activated to begin dispensing the particles 4 on the ramp 12. This involves implementing an initial step of filling the transfer zone 14 with the particles 4, with the carrier liquid 16 already at the required level in the zone 14. During this priming phase, the particles dispensed by the device 2 circulate on the ramp 12, then enter the zone 14 in which they disperse, as shown schematically in Figures 3 and 4.
• the upstream front of these particles tends to shift upstream, in the direction of the inflection line 24.
• the injection of particles is continued even after this upstream front has passed the line 24, so that it rises on the inclined ramp 12.
• the upstream front of particles 54 rises on the ramp 12 so that it is situated at a given horizontal distance "d" from the inflection line 24, as shown in FIG.
• the distance "d” can be of the order of 30 mm.
• the particles 4 are ordered in the transfer zone and on the ramp 12, on which they are automatically arranged, without assistance, thanks in particular to their kinetic energy put to use at the moment of the impact on the front 54
• the scheduling is such that the film obtained has a so-called "compact hexagonal" structure, in which each particle 4 is surrounded and contacted by six other particles 4 in contact with each other, as shown schematically in FIG.
• This figure 6 shows the state of the installation after the triggering of the movement of the substrate 38, initiated as soon as the front 54 has reached the required level shown in FIG. 5.
• the film of particles is then deposited on the same substrate 38, by taking the capillary bridge 42, in the manner of that described in document CA 2 695 449.
• the width of this film 4 'corresponds to the first width L1 of the outlet 26.
• the particle injection and the rate of travel of the substrate are adjusted so that the particle front remains in a substantially identical position.
• the flow rate of the particles may be of the order of 0.1 ml / min to several ml / min, while the linear speed of the substrate 38, also called the drawing speed, may be of the order of a few mm / min to several hundred mm / min.
• an accessory device of the present invention represented in FIG. 7, is used.
• This accessory device 100 takes the form of a particle deposition head, intended to be mounted at the front end of the transfer zone 14, on the inclined plate 27. It comprises indeed a flat platform 50, intended to rest on the board 27 by marrying him.
• a vertical wall 52 extends from a front end of the platform 50. It has a through opening which is extended forward by a remote structure 54, these elements jointly defining a transfer channel. particles 56 whose bottom is in the continuity before the platform 50. The length of this channel 56 is minimized so as to facilitate the circulation of the liquid and the passage of the particles.
• the remote structure 54 has a bottom, two lateral flanks 58 corresponding to the edges of the channel 56, as well as a stop 60 extending downwards with respect to the platform 50, so as to be able to bear against the outlet 26 of the transfer zone and prevent the device 100 from sliding downwards in this same zone 14.
• the front end 62 of the transfer channel 56 has a second width L2 less than the first width L1, a ratio between 100 and 10 can be retained.
• the platform 50 and the bottom of said transfer channel have a coating 66 of hydrophilic material, interrupting before the end 62, which is made of a hydrophobic material, such as preferably the entire structure of the accessory device 100.
• This hydrophobic material is preferably Teflon (PTFE), retained for its hydrophobicity properties among which a surface tension of 73 mN.m- 1 and a contact angle to water of 112 °, as well as for its mechanical properties as its Young's modulus between 300 and 800 MPa, a Poisson's ratio of the order of 0.46, and a coefficient of friction of 0.05 to 0.2 Moreover, its physicochemical properties are also interesting, especially in because of its insensitivity to the usual solvents.
• PTFE Teflon
• the hydrophobicity of the vertical walls limits the risk of depositing particles on these walls, constituted by the vertical faces of the wall 52 and the flanks 58 of the transfer channel 56.
• the mechanical properties mentioned above allow to confer a relatively rigid and relatively elastic material, allowing contact of the deposit head with the substrate without risk of collateral damage.
• the physicochemical properties of Teflon imply that the device remains insensitive to most chemicals.
• the hydrophobic nature of the end 62 of the channel makes it possible to effectively break the contact between the carrier liquid and the substrate, during a carrier liquid evacuation operation. outside the deposition head, at the end of a step of depositing a film on this substrate, as will be detailed below.
• the accessory device is also equipped with two suction nozzles 70 capable of attracting the particles towards the transfer channel 56.
• the suction is preferably provided at the end 62, at the liquid / air interface, at the end. proximity of the sidewalls 58 and the substrate, as has been shown schematically in Figure 7.
• Each nozzle may have an inner diameter of the order of a few tens of ⁇ to a few mm.
• the device also comprises means for acting on the particles, before entering the transfer channel 56, and / or within the latter.
• These means 72 shown schematically in FIG. 7, preferentially make it possible to act on the orientation, and possibly the ordering of the particles and / or on the physicochemical properties thereof.
• these means can be laser, magnetic, thermal, ultrasonic, or electrical.
• it is possible to promote the disappearance of any gaps in the scheduling of the particles via the application of ultrasound to the carrier liquid. This allows, thanks to the agitation of the particles on the surface, to improve the scheduling.
• the Functionalization of the transfer head is also possible thanks to the application of a normal external electric field to the surface of the carrier liquid.
• the application of a normal electric field makes it possible to space the particles in a controlled manner and then arrange them in a compact and organized manner when the electric field is progressively reduced.
• a normal electric field makes it possible to space the particles in a controlled manner and then arrange them in a compact and organized manner when the electric field is progressively reduced.
• another method is to use a laser beam to capture, move the particles. This means can be used to increase the initial scheduling.
• the accessory device 100 is first placed at the downstream end of the transfer zone 14, with the platform 50 in plane support against the inclined plate 27, and with the stop 60 in support against the free end of the same plate, to prohibit the sliding of the device 100 downstream.
• the vertical wall 52 extends over the entire first width L1 of the particle outlet 26, so as to prevent the passage of the latter other than through the transfer channel 56, of lower width L2 .
• the setting up of the device 100 is preferably carried out dry, that is to say with the level of carrier liquid sufficiently low in the zone of transfer so as not to wet the device 100 when put in position. It is only after the positioning of the device 100 that the level of the carrier liquid 16 is increased, until it covers the end 62 of the channel 56, without exceeding the high end of the flanks 58.
• the injection nozzle 6 is then activated to begin dispensing the particles 4 on the ramp 12. It is to implement a step of filling the transfer zone 14 and the deposition head 100, by the particles 4.
• the particles dispensed by the device 2 circulate on the ramp 12, then enter the zone 14 in which they disperse. Then they arrive near the wall 52 of the device 100 and enter the transfer channel 56.
• the suction nozzles shown in FIG. activated, the flow rate being of the order of a few ml / min to several hundred ml / min. This suction is preferably short, for example exercised for half a second. It is preferably initiated after contact of the particles with the wall 52, when the film is already well ordered.
• FIGS. 10 and 11 show a capillary bridge between the substrate 38 and the end 62 of the deposition head 100, or, preferably, a contact is established between the same substrate 38 and the edge vertical 64 of the end 62.
• the contact pressure is preferably of the order of a few N / mm 2 .
• the particles 4 are ordered in the transfer channel 56, in the transfer zone 14 and on the ramp 12, on which these particles are automatically ordered, without assistance, thanks in particular to their kinetic energy put to use at the moment of the impact on the front 54. Moreover, as shown in FIG. 12, in the transfer channel 56, the particles 4 and the liquid 16 do not project beyond the lateral flanks 58, which ensures a subsequent quality deposit .
• FIG. 13 shows the state of the installation after the triggering of the vertical movement of the substrate 38, initiated as soon as the front 54 has The particles 4 are then deposited on the same substrate 38, to obtain a film 4 '' of smaller width corresponding to the second width L2 of the end 62.
• the injection of particles is stopped, and the level of carrier liquid is lowered so that the liquid is no longer in contact with the substrate.
• the device 100 can then be dried before being removed from the installation, according to any means deemed appropriate by those skilled in the art, these means being of the conduction, convection, radiation, etc. type.
• the installation 1 may comprise several accessory devices of the type just described, each dedicated to the deposition of one or more films of particles of determined width (s).
• Figures 15 and 16 show an accessory device 100 according to an alternative embodiment, wherein several channels 56 are provided, spaced from each other in the width direction, so as to deposit several films simultaneously.

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• 2011
  • 2011-07-13 FR FR1156430A patent/FR2977810A1/fr not_active Withdrawn
• 2012
  • 2012-07-10 US US14/131,082 patent/US9751105B2/en not_active Expired - Fee Related
  • 2012-07-10 KR KR1020147000740A patent/KR20140050008A/ko not_active Application Discontinuation
  • 2012-07-10 JP JP2014519524A patent/JP6427416B2/ja not_active Expired - Fee Related
  • 2012-07-10 EP EP12733713.7A patent/EP2731731B1/de not_active Not-in-force
  • 2012-07-10 WO PCT/EP2012/063466 patent/WO2013007719A1/fr active Application Filing

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