EP2702085A1 - Semiconductor materials based on dithienopyridone copolymers - Google Patents
Semiconductor materials based on dithienopyridone copolymersInfo
- Publication number
- EP2702085A1 EP2702085A1 EP12714013.5A EP12714013A EP2702085A1 EP 2702085 A1 EP2702085 A1 EP 2702085A1 EP 12714013 A EP12714013 A EP 12714013A EP 2702085 A1 EP2702085 A1 EP 2702085A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- alkyl
- monovalent
- cor
- heterocyclic residue
- substituents
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 24
- 239000000463 material Substances 0.000 title description 5
- 229920001577 copolymer Polymers 0.000 title description 2
- 229920000642 polymer Polymers 0.000 claims abstract description 41
- 125000001424 substituent group Chemical group 0.000 claims description 212
- 125000006615 aromatic heterocyclic group Chemical group 0.000 claims description 199
- 229910052736 halogen Inorganic materials 0.000 claims description 90
- 150000002367 halogens Chemical class 0.000 claims description 90
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 84
- 125000002950 monocyclic group Chemical group 0.000 claims description 43
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 26
- 230000005669 field effect Effects 0.000 claims description 9
- 229910052757 nitrogen Inorganic materials 0.000 claims description 6
- 238000013086 organic photovoltaic Methods 0.000 claims description 3
- 125000006376 (C3-C10) cycloalkyl group Chemical group 0.000 claims description 2
- -1 ferf-butyl Chemical group 0.000 description 77
- 125000005842 heteroatom Chemical group 0.000 description 50
- 125000002619 bicyclic group Chemical group 0.000 description 28
- 239000010410 layer Substances 0.000 description 21
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 18
- 150000001875 compounds Chemical class 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 14
- 239000000758 substrate Substances 0.000 description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 12
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 10
- 239000011541 reaction mixture Substances 0.000 description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 239000012043 crude product Substances 0.000 description 8
- LIIXXKLYZGSZPG-UHFFFAOYSA-N n-dodecylthiophen-3-amine Chemical compound CCCCCCCCCCCCNC=1C=CSC=1 LIIXXKLYZGSZPG-UHFFFAOYSA-N 0.000 description 8
- 238000002360 preparation method Methods 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- CYPYTURSJDMMMP-WVCUSYJESA-N (1e,4e)-1,5-diphenylpenta-1,4-dien-3-one;palladium Chemical compound [Pd].[Pd].C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1.C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1.C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1 CYPYTURSJDMMMP-WVCUSYJESA-N 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 125000003367 polycyclic group Chemical group 0.000 description 6
- QTWBEVAYYDZLQL-UHFFFAOYSA-N thiophene-3-carbonyl chloride Chemical compound ClC(=O)C=1C=CSC=1 QTWBEVAYYDZLQL-UHFFFAOYSA-N 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- YLEIFZAVNWDOBM-ZTNXSLBXSA-N ac1l9hc7 Chemical compound C([C@H]12)C[C@@H](C([C@@H](O)CC3)(C)C)[C@@]43C[C@@]14CC[C@@]1(C)[C@@]2(C)C[C@@H]2O[C@]3(O)[C@H](O)C(C)(C)O[C@@H]3[C@@H](C)[C@H]12 YLEIFZAVNWDOBM-ZTNXSLBXSA-N 0.000 description 5
- 239000003054 catalyst Substances 0.000 description 5
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- 229920003023 plastic Polymers 0.000 description 5
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- 239000000243 solution Substances 0.000 description 5
- 238000004528 spin coating Methods 0.000 description 5
- COIOYMYWGDAQPM-UHFFFAOYSA-N tris(2-methylphenyl)phosphane Chemical compound CC1=CC=CC=C1P(C=1C(=CC=CC=1)C)C1=CC=CC=C1C COIOYMYWGDAQPM-UHFFFAOYSA-N 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- ASQOQJYHIYYTEJ-GBESFXJTSA-N (1r,7s,9as)-7-decyl-2,3,4,6,7,8,9,9a-octahydro-1h-quinolizin-1-ol Chemical compound O[C@@H]1CCCN2C[C@@H](CCCCCCCCCC)CC[C@H]21 ASQOQJYHIYYTEJ-GBESFXJTSA-N 0.000 description 4
- 238000005160 1H NMR spectroscopy Methods 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- PCLIMKBDDGJMGD-UHFFFAOYSA-N N-bromosuccinimide Chemical compound BrN1C(=O)CCC1=O PCLIMKBDDGJMGD-UHFFFAOYSA-N 0.000 description 4
- 238000004440 column chromatography Methods 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 239000003989 dielectric material Substances 0.000 description 4
- 239000003480 eluent Substances 0.000 description 4
- 239000012044 organic layer Substances 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 239000000741 silica gel Substances 0.000 description 4
- 229910002027 silica gel Inorganic materials 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 229910052723 transition metal Inorganic materials 0.000 description 4
- 150000003624 transition metals Chemical class 0.000 description 4
- SHAHPWSYJFYMRX-GDLCADMTSA-N (2S)-2-(4-{[(1R,2S)-2-hydroxycyclopentyl]methyl}phenyl)propanoic acid Chemical compound C1=CC([C@@H](C(O)=O)C)=CC=C1C[C@@H]1[C@@H](O)CCC1 SHAHPWSYJFYMRX-GDLCADMTSA-N 0.000 description 3
- TUCRZHGAIRVWTI-UHFFFAOYSA-N 2-bromothiophene Chemical compound BrC1=CC=CS1 TUCRZHGAIRVWTI-UHFFFAOYSA-N 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 3
- 229960004132 diethyl ether Drugs 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- UKTDFYOZPFNQOQ-UHFFFAOYSA-N tributyl(thiophen-2-yl)stannane Chemical compound CCCC[Sn](CCCC)(CCCC)C1=CC=CS1 UKTDFYOZPFNQOQ-UHFFFAOYSA-N 0.000 description 3
- 125000001399 1,2,3-triazolyl group Chemical group N1N=NC(=C1)* 0.000 description 2
- 125000001376 1,2,4-triazolyl group Chemical group N1N=C(N=C1)* 0.000 description 2
- 125000003846 1,2-diazepinyl group Chemical group 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical group C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- 238000000944 Soxhlet extraction Methods 0.000 description 2
- 125000002785 azepinyl group Chemical group 0.000 description 2
- 239000002800 charge carrier Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000000921 elemental analysis Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 230000002140 halogenating effect Effects 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- CTSLXHKWHWQRSH-UHFFFAOYSA-N oxalyl chloride Chemical compound ClC(=O)C(Cl)=O CTSLXHKWHWQRSH-UHFFFAOYSA-N 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 238000002207 thermal evaporation Methods 0.000 description 2
- 238000004809 thin layer chromatography Methods 0.000 description 2
- UKSZBOKPHAQOMP-SVLSSHOZSA-N (1e,4e)-1,5-diphenylpenta-1,4-dien-3-one;palladium Chemical compound [Pd].C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1.C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1 UKSZBOKPHAQOMP-SVLSSHOZSA-N 0.000 description 1
- FANCTJAFZSYTIS-IQUVVAJASA-N (1r,3s,5z)-5-[(2e)-2-[(1r,3as,7ar)-7a-methyl-1-[(2r)-4-(phenylsulfonimidoyl)butan-2-yl]-2,3,3a,5,6,7-hexahydro-1h-inden-4-ylidene]ethylidene]-4-methylidenecyclohexane-1,3-diol Chemical compound C([C@@H](C)[C@@H]1[C@]2(CCCC(/[C@@H]2CC1)=C\C=C\1C([C@@H](O)C[C@H](O)C/1)=C)C)CS(=N)(=O)C1=CC=CC=C1 FANCTJAFZSYTIS-IQUVVAJASA-N 0.000 description 1
- NRQHBNNTBIDSRK-YRNVUSSQSA-N (4e)-4-[(4-methoxyphenyl)methylidene]-2-methyl-1,3-oxazol-5-one Chemical compound C1=CC(OC)=CC=C1\C=C\1C(=O)OC(C)=N/1 NRQHBNNTBIDSRK-YRNVUSSQSA-N 0.000 description 1
- 125000004529 1,2,3-triazinyl group Chemical group N1=NN=C(C=C1)* 0.000 description 1
- 125000004530 1,2,4-triazinyl group Chemical group N1=NC(=NC=C1)* 0.000 description 1
- 125000003363 1,3,5-triazinyl group Chemical group N1=C(N=CN=C1)* 0.000 description 1
- 125000001637 1-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C(*)=C([H])C([H])=C([H])C2=C1[H] 0.000 description 1
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Natural products C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 1
- 125000000069 2-butynyl group Chemical group [H]C([H])([H])C#CC([H])([H])* 0.000 description 1
- 125000006031 2-methyl-3-butenyl group Chemical group 0.000 description 1
- 125000004838 2-methylpentylene group Chemical group [H]C([H])([H])C([H])(C([H])([H])[*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 125000001622 2-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C(*)C([H])=C([H])C2=C1[H] 0.000 description 1
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 1
- XCMISAPCWHTVNG-UHFFFAOYSA-N 3-bromothiophene Chemical compound BrC=1C=CSC=1 XCMISAPCWHTVNG-UHFFFAOYSA-N 0.000 description 1
- 125000004975 3-butenyl group Chemical group C(CC=C)* 0.000 description 1
- 125000000474 3-butynyl group Chemical group [H]C#CC([H])([H])C([H])([H])* 0.000 description 1
- 125000004364 3-pyrrolinyl group Chemical group [H]C1=C([H])C([H])([H])N(*)C1([H])[H] 0.000 description 1
- CSDQQAQKBAQLLE-UHFFFAOYSA-N 4-(4-chlorophenyl)-4,5,6,7-tetrahydrothieno[3,2-c]pyridine Chemical compound C1=CC(Cl)=CC=C1C1C(C=CS2)=C2CCN1 CSDQQAQKBAQLLE-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 238000004639 Schlenk technique Methods 0.000 description 1
- 125000000641 acridinyl group Chemical group C1(=CC=CC2=NC3=CC=CC=C3C=C12)* 0.000 description 1
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 239000005030 aluminium foil Substances 0.000 description 1
- 125000004653 anthracenylene group Chemical group 0.000 description 1
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 1
- 125000004097 arachidonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])/C([H])=C([H])\C([H])([H])/C([H])=C([H])\C([H])([H])/C([H])=C([H])\C([H])([H])/C([H])=C([H])\C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000003725 azepanyl group Chemical group 0.000 description 1
- 125000003785 benzimidazolyl group Chemical group N1=C(NC2=C1C=CC=C2)* 0.000 description 1
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- 239000012267 brine Substances 0.000 description 1
- OSVHLUXLWQLPIY-KBAYOESNSA-N butyl 2-[(6aR,9R,10aR)-1-hydroxy-9-(hydroxymethyl)-6,6-dimethyl-6a,7,8,9,10,10a-hexahydrobenzo[c]chromen-3-yl]-2-methylpropanoate Chemical compound C(CCC)OC(C(C)(C)C1=CC(=C2[C@H]3[C@H](C(OC2=C1)(C)C)CC[C@H](C3)CO)O)=O OSVHLUXLWQLPIY-KBAYOESNSA-N 0.000 description 1
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- 229910052802 copper Inorganic materials 0.000 description 1
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- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000002433 cyclopentenyl group Chemical group C1(=CCCC1)* 0.000 description 1
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- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 125000004365 octenyl group Chemical group C(=CCCCCCC)* 0.000 description 1
- 125000005069 octynyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C#C* 0.000 description 1
- 125000001117 oleyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])/C([H])=C([H])\C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 125000001715 oxadiazolyl group Chemical group 0.000 description 1
- 125000005565 oxadiazolylene group Chemical group 0.000 description 1
- 125000000160 oxazolidinyl group Chemical group 0.000 description 1
- 125000005968 oxazolinyl group Chemical group 0.000 description 1
- 125000002971 oxazolyl group Chemical group 0.000 description 1
- 125000005564 oxazolylene group Chemical group 0.000 description 1
- 125000003551 oxepanyl group Chemical group 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000005981 pentynyl group Chemical group 0.000 description 1
- 125000005563 perylenylene group Chemical group 0.000 description 1
- 125000005561 phenanthryl group Chemical group 0.000 description 1
- 125000005562 phenanthrylene group Chemical group 0.000 description 1
- 125000001644 phenoxazinyl group Chemical group C1(=CC=CC=2OC3=CC=CC=C3NC12)* 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 125000004592 phthalazinyl group Chemical group C1(=NN=CC2=CC=CC=C12)* 0.000 description 1
- 125000004193 piperazinyl group Chemical group 0.000 description 1
- 125000005936 piperidyl group Chemical group 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001042 pteridinyl group Chemical group N1=C(N=CC2=NC=CN=C12)* 0.000 description 1
- 125000000561 purinyl group Chemical group N1=C(N=C2N=CNC2=C1)* 0.000 description 1
- 125000004309 pyranyl group Chemical group O1C(C=CC=C1)* 0.000 description 1
- 125000003373 pyrazinyl group Chemical group 0.000 description 1
- 125000005550 pyrazinylene group Chemical group 0.000 description 1
- 125000003072 pyrazolidinyl group Chemical group 0.000 description 1
- 125000002755 pyrazolinyl group Chemical group 0.000 description 1
- 125000003226 pyrazolyl group Chemical group 0.000 description 1
- 125000005548 pyrenylene group Chemical group 0.000 description 1
- 125000002098 pyridazinyl group Chemical group 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 125000000714 pyrimidinyl group Chemical group 0.000 description 1
- 125000005576 pyrimidinylene group Chemical group 0.000 description 1
- 125000000719 pyrrolidinyl group Chemical group 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 125000002294 quinazolinyl group Chemical group N1=C(N=CC2=CC=CC=C12)* 0.000 description 1
- 125000005493 quinolyl group Chemical group 0.000 description 1
- 125000001567 quinoxalinyl group Chemical group N1=C(C=NC2=CC=CC=C12)* 0.000 description 1
- 230000036647 reaction Effects 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 125000003718 tetrahydrofuranyl group Chemical group 0.000 description 1
- 125000001712 tetrahydronaphthyl group Chemical group C1(CCCC2=CC=CC=C12)* 0.000 description 1
- 125000003507 tetrahydrothiofenyl group Chemical group 0.000 description 1
- 125000003831 tetrazolyl group Chemical group 0.000 description 1
- 125000005458 thianyl group Chemical group 0.000 description 1
- 125000004305 thiazinyl group Chemical group S1NC(=CC=C1)* 0.000 description 1
- 125000001984 thiazolidinyl group Chemical group 0.000 description 1
- 125000002769 thiazolinyl group Chemical group 0.000 description 1
- 125000000335 thiazolyl group Chemical group 0.000 description 1
- 125000005557 thiazolylene group Chemical group 0.000 description 1
- 125000004588 thienopyridyl group Chemical group S1C(=CC2=C1C=CC=N2)* 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- 125000001583 thiepanyl group Chemical group 0.000 description 1
- 125000003777 thiepinyl group Chemical group 0.000 description 1
- 125000005730 thiophenylene group Chemical group 0.000 description 1
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 1
- 229910000404 tripotassium phosphate Inorganic materials 0.000 description 1
- 235000019798 tripotassium phosphate Nutrition 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
- C08G61/122—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides
- C08G61/123—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds
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- C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
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- C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
- C08G61/122—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides
- C08G61/123—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds
- C08G61/126—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds with a five-membered ring containing one sulfur atom in the ring
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- C08L65/00—Compositions of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Compositions of derivatives of such polymers
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- H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
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- C08G2261/30—Monomer units or repeat units incorporating structural elements in the main chain
- C08G2261/32—Monomer units or repeat units incorporating structural elements in the main chain incorporating heteroaromatic structural elements in the main chain
- C08G2261/324—Monomer units or repeat units incorporating structural elements in the main chain incorporating heteroaromatic structural elements in the main chain condensed
- C08G2261/3243—Monomer units or repeat units incorporating structural elements in the main chain incorporating heteroaromatic structural elements in the main chain condensed containing one or more sulfur atoms as the only heteroatom, e.g. benzothiophene
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- C08G2261/324—Monomer units or repeat units incorporating structural elements in the main chain incorporating heteroaromatic structural elements in the main chain condensed
- C08G2261/3246—Monomer units or repeat units incorporating structural elements in the main chain incorporating heteroaromatic structural elements in the main chain condensed containing nitrogen and sulfur as heteroatoms
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- C08G2261/30—Monomer units or repeat units incorporating structural elements in the main chain
- C08G2261/34—Monomer units or repeat units incorporating structural elements in the main chain incorporating partially-aromatic structural elements in the main chain
- C08G2261/342—Monomer units or repeat units incorporating structural elements in the main chain incorporating partially-aromatic structural elements in the main chain containing only carbon atoms
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- C08G2261/30—Monomer units or repeat units incorporating structural elements in the main chain
- C08G2261/34—Monomer units or repeat units incorporating structural elements in the main chain incorporating partially-aromatic structural elements in the main chain
- C08G2261/344—Monomer units or repeat units incorporating structural elements in the main chain incorporating partially-aromatic structural elements in the main chain containing heteroatoms
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- C08G2261/50—Physical properties
- C08G2261/51—Charge transport
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- C08G2261/90—Applications
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- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/484—Insulated gate field-effect transistors [IGFETs] characterised by the channel regions
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
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- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
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Definitions
- Organic semiconducting materials can be used in electronic devices such as organic photo- voltaic devices (OPVs), organic field-effect transistors (OFETs), organic light emitting diodes (OLEDs), and organic electrochromic devices (ECDs).
- OCVs organic photo- voltaic devices
- OFETs organic field-effect transistors
- OLEDs organic light emitting diodes
- ECDs organic electrochromic devices
- the organic semiconducting material-based devices show high charge carrier mobility as well as high stability, in particular to- wards oxidation by air, under ambient environmental conditions.
- the organic semiconducting materials are compatible with liquid processing techniques such as spin coating as liquid processing techniques are convenient from the point of processability, and thus allow the production of low cost organic semiconduct- ing material-based electronic devices.
- liquid processing techniques are also compatible with plastic substrates, and thus allow the production of light weight and mechanically flexible organic semiconducting material-based electronic devices.
- OFETs organic field effect transistors
- OFET organic field-effect transistor
- OFET organic field-effect transistor
- R 1 -octylnonyl
- R n-decyl or n-dodecyl
- R n-decyl or n-dodecyl for use in organic field-effect transistor (OFET).
- Monomeric dithienopyridone is also known in the art.
- the semiconducting material of the present invention is a polymer comprising a unit of formula
- R 4 is H, Ci-3o-alkyl optionally substituted with 1 to 6 substituents R f , C 2 -3o-alkenyl optionally substituted with 1 to 6 substituents R f , C 2 -3o-alkynyl optionally substituted with 1 to 6 substituents R f , C3-io-cycloalkyl optionally substituted with 1 to 6 substituents Ra, Cs-io-cyclo- alkenyl optionally substituted with 1 to 6 substituents Ra, monovalent 3 to 14 membered aliphatic heterocyclic residue optionally substituted with 1 to 6 substituents Ra, C6-i4-aryl optionally substituted with 1 to 6 substituents R h or monovalent 5 to14 membered aromatic heterocyclic residue optionally substituted with 1 to 6 substituents R h , wherein
- R 8 and R 9 at each occurrence are independently from each other selected from the group consisting of Ci- 3 o-alkyl, C 2 - 3 o-alkenyl, C 2 - 3 o-alkynyl, C 3 -io-cycloalkyl, Cs-io-cyclo- alkenyl, monovalent 3 to 14 membered aliphatic heterocyclic residue, C6-i4-aryl and monovalent 5 to14 membered aromatic heterocyclic residue,
- G 1 and G 2 are independently from each other
- R 18 and R 19 are independently from each other H or Ci-30-alkyl
- L is C6-24-arylene optionally substituted with 1 to 6 substituents R b or bivalent 5 to 24 membered aromatic heterocyclic residue optionally substituted with 1 to 6 substituents R b , wherein
- R 12 and R 13 at each occurrence are independently from each other selected from the group consisting of Ci- 3 o-alkyl, C 2 - 3 o-alkenyl, C 2 - 3 o-alkynyl, C 3 -io-cycloalkyl, Cs-io-cyclo- alkenyl, monovalent 3 to 14 membered aliphatic heterocyclic residue, C6-i4-aryl and monovalent 5 to14 membered aromatic heterocyclic residue,
- R 16 and R 17 are independently from each other H , Ci-30-alkyl, -CN or halogen,
- q and s are independently from each other 0, 1 , 2, 3, 4 or 5, r is 0, 1 or 2, and n is an integer from 2 to 10 ⁇ 00.
- the semiconducting material of the present invention is a polymer consisting essentially of a unit formula and/or a unit of formula
- R 1 is H, Ci-3o-alkyl optionally substituted with 1 to 6 substituents R c , C 2 -3o-alkenyl optionally sub- stituted with 1 to 6 substituents R c , C 2 -3o-alkynyl optionally substituted with 1 to 6 substituents R c , C3-io-cycloalkyl optionally substituted with 1 to 6 substituents R d , Cs-io-cycloalkenyl optionally substituted with 1 to 6 substituents R d , monovalent 3 to 14 membered aliphatic heterocyclic residue optionally substituted with 1 to 6 substituents R d , C6-i4-aryl optionally substituted with 1 to 6 substituents R e or monovalent 5 to14 membered aromatic heterocyclic resi- due optionally substituted with 1 to 6 substituents R e , wherein
- R 4 is H, Ci-3o-alkyl optionally substituted with 1 to 6 substituents R f , C2-3o-alkenyl optionally substituted with 1 to 6 substituents R f , C2-3o-alkynyl optionally substituted with 1 to 6 sub- stituents R f , C3-io-cycloalkyl optionally substituted with 1 to 6 substituents Ra, Cs-io-cycloalkenyl optionally substituted with 1 to 6 substituents Rs, monovalent 3 to 14 membered aliphatic heterocyclic residue optionally substituted with 1 to 6 substituents Ra, C6-i4-aryl optionally substituted with 1 to 6 substituents R h or monovalent 5 to14 membered aromatic heterocyclic residue optionally substituted with 1 to 6 substituents R h , wherein
- G 1 and G 2 are independently from each other C6-i4-arylene optionally substituted with 1 to 6 substituents R a or bivalent 5 to 14 membered aromatic heterocyclic residue optionally substituted with 1 to 6 substituents R a , wherein
- R 10 and R 11 at each occurrence are independently from each other selected from the group consisting of Ci-10-alkyl, C 2 -io-alkenyl, C 2 -io-alkynyl, C3-io-cycloalkyl, Cs-io-cycloalkenyl, monovalent 3 to 14 membered aliphatic hetero- cyclic residue, C6-i4-aryl and monovalent 5 to14 membered aromatic heterocyclic residue,
- G 1 and G 2 are independently from each other
- R 18 and R 19 are independently from each other H or Ci-30-alkyl
- L is C6-24-arylene optionally substituted with 1 to 6 substituents R b or bivalent 5 to 24 membered aromatic heterocyclic residue optionally substituted with 1 to 6 substituents R b , wherein
- R 16 and R 17 are independently from each other H, Ci- 3 o-alkyl, -CN or halogen,
- q and s are independently from each other 0, 1 , 2, 3, 4 or 5, r is 0, 1 or 2, and n is an integer from 2 to 10 ⁇ 00.
- the term "essentially consisting of means that at least 80% by weight, more preferably at least 90% by weight, of the polymer consists of the sum of units of formula (1 ) and (1 ') based on the weight of the polymer. More preferably, the semiconducting material of the present invention is a polymer consisting of a unit of formula
- R 1 is H, Ci-3o-alkyl optionally substituted with 1 to 6 substituents R c , C 2 -3o-alkenyl optionally substituted with 1 to 6 substituents R c , C 2 -3o-alkynyl optionally substituted with 1 to 6 substituents R c , C3-io-cycloalkyl optionally substituted with 1 to 6 substituents R d , Cs-io-cycloalkenyl optionally substituted with 1 to 6 substituents R d , monovalent 3 to 14 membered aliphatic het- erocyclic residue optionally substituted with 1 to 6 substituents R d , C6-i4-aryl optionally substituted with 1 to 6 substituents R e or monovalent 5 to14 membered aromatic heterocyclic residue optionally substituted with 1 to 6 substituents R e , wherein
- X is N or C-R 4 , wherein
- R 5 and R 6 at each occurrence are independently from each other selected from the group consisting of Ci-10-alkyl, C 2 -io-alkenyl, C 2 -io-alkynyl, C 3 -io-cycloalkyl, Cs-io-cycloalkenyl and monovalent 3 to 14 membered aliphatic heterocyclic residue, wherein R 5 and R 6 at each occurrence are independently from each other selected from the group consisting of Ci-10-alkyl, C 2 -io-alkenyl, C 2 -io-alkynyl, C 3 -io-cycloalkyl,
- G 1 and G 2 are independently from each other C6-i4-arylene optionally substituted with 1 to 6 substituents R a or bivalent 5 to 14 membered aromatic heterocyclic residue optionally substituted with 1 to 6 substituents R a , wherein
- R 8 and R 9 at each occurrence are independently from each other selected from the group consisting of Ci- 3 o-alkyl, C 2 - 3 o-alkenyl, C 2 - 3 o-alkynyl, C 3 -io-cycloalkyl, Cs-io-cycloalkenyl, monovalent 3 to 14 membered aliphatic heterocyclic residue, C6-i4-aryl and monovalent 5 to14 membered aromatic heterocyclic residue,
- R 10 and R 11 at each occurrence are independently from each other se- lected from the group consisting of Ci-10-alkyl, C 2 -io-alkenyl, C 2 -io-alkynyl,
- G 1 and G 2 are independently from each other
- R 18 and R 19 are independently from each other H or Ci-30-alkyl
- L is C6- 24 -arylene optionally substituted with 1 to 6 substituents R b or bivalent 5 to 24 membered aromatic heterocyclic residue optionally substituted with 1 to 6 substituents R b , wherein
- R 12 and R 13 at each occurrence are independently from each other selected from the group consisting of Ci-30-alkyl, C 2 -3o-alkenyl, C 2 -3o-alkynyl, C3-io-cycloalkyl, Cs-io-cyclo- alkenyl, monovalent 3 to 14 membered aliphatic heterocyclic residue, C6-i4-aryl and monovalent 5 to14 membered aromatic heterocyclic residue,
- R 16 and R 17 are independently from each other H, Ci-30-alkyl, -CN or halogen,
- q and s are independently from each other 0, 1 , 2, 3, 4 or 5, r is 0, 1 or 2, and n is an integer from 2 to 10 ⁇ 00.
- Ci-io-alkyl and Ci-30-alkyl can be branched or unbranched.
- Examples of Ci-10-alkyl are methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, isobutyl, ferf-butyl, n-pentyl, neopentyl, isopentyl, n-(1 -ethyl)propyl, n-hexyl, n-heptyl, n-octyl, n-(2-ethyl)hexyl, n-nonyl and n-decyl.
- Ci-3o-alkyl examples are Ci-10-alkyl, and n-undecyl, n-dodecyl, n-undecyl, n-dodecyl, n-tridecyl, n-tetra- decyl, n-pentadecyl, n-hexadecyl, n-heptadecyl, n-octadecyl, n-nonadecyl and n-icosyl (C20), n-docosyl (C22), n-tetracosyl (C24), n-hexacosyl (C26), n-octacosyl (C28) and n-triacontyl (C30).
- C2-io-alkenyl and C2-3o-alkenyl can be branched or unbranched.
- Examples of C2-io-alkenyl are vinyl, propenyl, c/s-2-butenyl, frans-2-butenyl, 3-butenyl, c/s-2-pentenyl, frans-2-pentenyl, c/s-3-pentenyl, frans-3-pentenyl, 4-pentenyl, 2-methyl-3-butenyl, hexenyl, heptenyl, octenyl, nonenyl and docenyl.
- C2-3o-alkenyl examples include C2-io-alkenyl, and linoleyl (Cie), linolenyl (Cie), oleyl (Cie), arachidonyl (C20), and erucyl (C22).
- C2-io-alkynyl and C2-3o-alkynyl can be branched or unbranched.
- Examples of C2-io-alkynyl are ethynyl, 2-propynyl, 2-butynyl, 3-butynyl, pentynyl, hexynyl, heptynyl, octynyl, nonynyl and de- cynyl.
- C2-3o-alkynyl examples include C2-io-alkynyl, and undecynyl, dodecynyl, undecynyl, dode- cynyl, tridecynyl, tetradecynyl, pentadecynyl, hexadecynyl, heptadecynyl, octadecynyl, nonade- cynyl and icosynyl (C20).
- C3-io-cycloalkyl are preferably monocyclic C3-io-cycloalkyls such as cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl and cyclooctyl, but include also polycyclic
- C3-io-cycloalkyls such as decalinyl, norbornyl and adamantyl.
- Cs-io-cycloalkenyl are preferably monocyclic Cs-io-cycloalkenyls such as cyclopen- tenyl, cyclohexenyl, cyclohexadienyl and cycloheptatrienyl, but include also polycyclic
- Cs-io-cycloalkenyls examples include monovalent 3 to 14 membered aliphatic heterocyclic residues.
- monovalent 3 to 14 membered aliphatic heterocyclic residues are monocyclic monovalent 3 to 8 membered aliphatic cyclic residues and polycyclic, for example bicyclic monovalent 7 to 12 membered aliphatic heterocyclic residues.
- Examples of monocyclic monovalent 3 to 8 membered aliphatic heterocyclic residues are mon- ocyclic monovalent 5 membered aliphatic heterocyclic residues containing one heteroatom such as pyrrolidinyl, 1 -pyrrolinyl, 2-pyrrolinyl, 3-pyrrolinyl, tetrahydrofuryl, 2,3-dihydrofuryl, tetrahy- drothiophenyl and 2,3-dihydrothiophenyl, monocyclic monovalent 5 membered aliphatic hetero- cyclic residues containing two heteroatoms such as imidazolidinyl, imidazolinyl, pyrazolidinyl, pyrazolinyl, oxazolidinyl, oxazolinyl, isoxazolidinyl, isoxazolinyl, thiazolidinyl, thiazolinyl, isothia- zolidinyl
- bicyclic monovalent 7-12 membered aliphatic heterocyclic residue is decahy- dronaphthyl.
- C6-i4-aryl can be monocyclic or polycyclic.
- Examples of C6-i4-aryl are monocyclic C6-aryl such as phenyl, bicyclic Cg-io-aryl such as 1 -naphthyl, 2-naphthyl, indenyl, indanyl and tetrahy- dronaphthyl, and tricyclic Ci2-i4-aryl such as anthryl, phenanthryl, fluorenyl and s-indacenyl.
- the monovalent 5 to 14 membered aromatic heterocyclic residues can be monocyclic monovalent 5 to 8 membered aromatic heterocyclic residues, or polycyclic, for example bicyclic monovalent 7 to 12 membered, tricyclic monovalent 9 to 14 membered aromatic heterocyclic residue, or tetracyclic monovalent 9 to 14 membered aromatic heterocyclic residues.
- monocyclic monovalent 5 to 8 membered aromatic heterocyclic residues are monocyclic monovalent 5 membered aromatic heterocyclic residues containing one heteroatom such as pyrrolyl, furyl and thiophenyl, monocyclic monovalent 5 membered aromatic heterocyclic residues containing two heteroatoms such as imidazolyl, pyrazolyl, oxazolyl, isoxazolyl, thia- zolyl, isothiazolyl, monocyclic monovalent s membered aromatic heterocyclic residues containing three heteroatoms such as 1 ,2,3-triazolyl, 1 ,2,4-triazolyl and oxadiazolyl, monocyclic monovalent 5 membered aromatic heterocyclic residues containing four heteroatoms such as tetra- zolyl, monocyclic monovalent 6 membered aromatic heterocyclic residues containing one heteroatom such as pyridyl, monocyclic monovalent 6 membered aromatic heterocyclic residues containing
- bicyclic monovalent 7 membered aromatic heterocyclic residues containing one heteroatom such as azepinyl
- monocyclic monovalent 7 membered aromatic heterocyclic residues containing two heteroatoms such as 1 ,2-diazepinyl
- bicyclic monovalent 7 to 12 membered aromatic heterocyclic residues are bicyclic monovalent 8 membered aromatic heterocyclic residues containing two heteroatoms such as thieno[3,2-b]thiophenyl, bicyclic 9 membered aromatic heterocyclic residues containing one heteroatom such as indolyl, isoindolyl, indolizinyl, indolinyl, benzofuryl, isobenzofuryl, ben- zothiophenyl and isobenzothiophenyl, bicyclic monovalent 9 membered aromatic heterocyclic residue
- bicyclic monovalent 10 membered aromatic heterocyclic residues containing three heteroatoms such as pyridopyrazinyl, pyridopyrimidinyl and pyridopyridazinyl
- bicyclic monovalent 10 membered aromatic heterocyclic residues containing four heteroatoms such as pteridinyl.
- tricyclic monovalent 9 to 14 membered aromatic heterocyclic residues examples include dibenzo- furyl, acridinyl, phenoxazinyl, 7H-cyclopenta[1 ,2-b:3,4-b']dithiophenyl and 4H-cyclopenta- [2,1 -b:3,4-b']dithiophenyl.
- An example of a tricyclic monovalent 9 to 14 membered aromatic heterocyclic residue containing three heteroatoms is dithienothiophenyl of formula
- halogen examples are -F, -CI, -Br and -I.
- Ci-10-alkoxy examples are methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, sec-butoxy, isobutoxy, ferf-butoxy, n-pentoxy, neopentoxy, isopentoxy, hexoxy, n-heptoxy, n-octoxy, n-nonoxy and n-decoxy.
- Ci-30-alkoxy examples are Ci-10-alkoxy, and n-undecoxy, n-dodecoxy, n-undecoxy, n-dodecoxy, n-tridecoxy, n-tetradecoxy, n-pentadecoxy, n-hexa- decoxy, n-heptadecoxy, n-octadecoxy, n-nonadecoxy and n-icosoxy (C20), n-docosoxy (C22), n-tetracosoxy (C24), n-hexacosoxy (C26), n-octacosoxy (C28) and n-triacontoxy (C30).
- Examples of C2-6-alkylene are ethylene, butylene, pentylene, hexylene and 2-methylpentylene.
- C6-i4-arylene examples include monocyclic C6-arylene such as phenylene, bicyclic Cg-io-arylene such as naphthylene, for example indenylene, for example
- Ci2-i4-arylene such as anthrylene
- fluorenylene for example and
- C6-24-arylene examples include C6-i4-arylene and pyrenylene, for example
- perylenylene for example
- the bivalent 5 to 14 membered aromatic heterocyclic residues can be monocyclic bivalent 5 to 8 membered aromatic heterocyclic residues, or polycyclic, for example bicyclic bivalent 7 to 14 membered, tricyclic bivalent 9 to 14 membered aromatic heterocyclic residues, or tetracyclic bivalent 9 to 14 membered aromatic heterocyclic residues.
- monocyclic bivalent 5 to 8 membered aromatic heterocyclic residues are monocyc- lie bivalent 5 membered aromatic heterocyclic residues containing one heteroatom such as pyr- rolylene, furylene and thiophenylene, monocyclic bivalent 5 membered aromatic heterocyclic residues containing two heteroatoms such as imidazolylene, pyrazolylene, oxazolylene, isoxa- zolylene, thiazolylene, isothiazolylene, monocyclic bivalent 5 membered aromatic heterocyclic residues containing three heteroatoms such as 1 ,2,3-triazolylene, 1 ,2,4-triazolylene and oxadia- zolylene, monocyclic bivalent 5 membered aromatic heterocyclic residues containing four heteroatoms such as tetrazolylene, monocyclic bivalent 6 membered aromatic heterocyclic residues containing one heteroatom such as pyhdylene, monocyclic bivalent 6 membered aromatic aromatic
- bicyclic bivalent 8 membered aromatic heterocyclic residues containing three heteroatoms such as as thienothiazolylene for example bicyclic bivalent 8 membered aromatic heterocyclic residues containing four heteroatoms such as thiazothiazolylene, for example bicyclic bivalent 9 membered aromatic heterocyclic residues containing one heteroatom such as indolylene, isoindolylene, indolizinylene, indolinylene, isoindolinylene, for example
- bicyclic bivalent 9 membered aromatic heterocyclic residues containing four heteroatoms such as purinylene, bicyclic bivalent 10 membered aromatic heterocyclic residues containing one heteroatom such as quinolylene, isoquinolylene, chromenylene and chromanylene, bicyclic bivalent 10 membered aromatic heterocyclic residues containing two heteroatoms such as quinoxalinylene, for example
- bicyclic bivalent 10 membered aromatic heterocyclic residues containing three heteroatoms such as pyridopyrazinylene, pyridopyrimidinylene and pyridopyridazinylene
- bicyclic bivalent 10 membered aromatic heterocyclic residues containing four heteroatoms such as pterid- inylene.
- tricyclic bivalent 9 to 14 membered aromatic heterocyclic residues containing one heteroatom are dibenzofurylene, acridinylene, dibenzosilacyclopentadienylene, for example
- Examples of a tricyclic bivalent 9 to 14 membered aromatic heterocyclic residues containing two heteroatoms are phenoxazinylene, and the following compounds
- tricyclic bivalent 9 to 14 membered aromatic heterocyclic residue containing three heteroatoms are the following compounds
- tricyclic bivalent 9 to 14 membered aromatic heterocyclic residue containing four- heteroatoms examples are the following compounds
- An example of a tricyclic bivalent 9 to 14 membered aromatic heterocyclic residue containing heteroatoms is the following compound
- bivalent 5 to 24 membered aromatic heterocyclic residues are bivalent 5 to 14 membered aromatic heterocyclic residues, and the following compounds
- Examples of L are:
- R 1 is H, Ci-3o-alkyl optionally substituted with 1 to 6 substituents R c , C 2 -3o-alkenyl optionally sub- stituted with 1 to 6 substituents R c , C 2 -3o-alkynyl optionally substituted with 1 to 6 substituents R c , C3-io-cycloalkyl optionally substituted with 1 to 6 substituents R d , Cs-io-cycloalkenyl optionally substituted with 1 to 6 substituents R d or monovalent 3 to 14 membered aliphatic heterocyclic residue optionally substituted with 1 to 6 substituents R d , wherein
- R 2 and R 3 at each occurrence are independently from each other selected from the group consisting of Ci-10-alkyl, C2-io-alkenyl, C2-io-alkynyl, C3-io-cycloalkyl,
- X is C-R 4 , wherein
- R 5 and R 6 at each occurrence are independently from each other selected from the group consisting of Ci-10-alkyl, C2-io-alkenyl, C2-io-alkynyl, C3-io-cycloalkyl,
- G 1 and G 2 are independently from each other C6-i4-arylene optionally substituted with 1 to 6 substituents R a or bivalent 5 to 14 membered aromatic heterocyclic residue optionally substituted with 1 to 6 substituents R a , wherein
- R 8 and R 9 at each occurrence are independently from each other selected from the group consisting of Ci- 3 o-alkyl, C 2 - 3 o-alkenyl, C 2 - 3 o-alkynyl, C 3 -io-cycloalkyl, Cs-io-cyclo- alkenyl, monovalent 3 to 14 membered aliphatic heterocyclic residue, C6-i4-aryl and monovalent 5 to14 membered aromatic heterocyclic residue,
- G 1 and G 2 are independently from each other wherein
- R 18 and R 19 are independently from each other H or Ci-30-alkyl
- L is C6-24-arylene optionally substituted with 1 to 6 substituents R b or bivalent 5 to 24 membered aromatic heterocyclic residue optionally substituted with 1 to 6 substituents R b , wherein
- R 12 and R 13 at each occurrence are independently from each other selected from the group consisting of Ci- 3 o-alkyl, C 2 - 3 o-alkenyl, C 2 - 3 o-alkynyl, C 3 -io-cycloalkyl, Cs-io-cyclo- alkenyl, monovalent 3 to 14 membered aliphatic heterocyclic residue, C6-i4-aryl and monovalent 5 to14 membered aromatic heterocyclic residue,
- R 16 and R 17 are independently from each other H or Ci-30-alkyl
- q and s are independently from each other 0, 1 , 2, 3, 4 or 5, r is 0, 1 or 2, and n is an integer from 5 to 10 ⁇ 00.
- R 1 is H or Ci-30-alkyl optionally substituted with 1 to 6 substituents R c , wherein
- X is C-R 4 , wherein
- R 4 is H or Ci-30-alkyl optionally substituted with 1 to 6 substituents R f , wherein
- G 1 and G 2 are independently from each other C6-i4-arylene optionally substituted with 1 to 6 substituents R a or bivalent 5 to 14 membered aromatic heterocyclic residue optionally substituted with 1 to 6 substituents R a , wherein
- G 1 and G 2 are independently from each other
- R 18 and R 19 are independently from each other H or Ci-30-alkyl
- L is C6- 2 4-arylene optionally substituted with 1 to 6 substituents R b or bivalent 5 to 24 membered aromatic heterocyclic residue optionally substituted with 1 to 6 substituents R b , wherein
- R 12 and R 13 at each occurrence are independently from each other selected from the group consisting of Ci- 3 o-alkyl, C 2 - 3 o-alkenyl, C 2 - 3 o-alkynyl, C 3 -io-cycloalkyl, Cs-io-cyclo- alkenyl, monovalent 3 to 14 membered aliphatic heterocyclic residue, C6-i4-aryl and monovalent 5 to14 membered aromatic heterocyclic residue,
- R 16 and R 17 are independently from each other H or Ci-30-alkyl, q and s are independently from each other 0, 1 , 2, 3, 4 or 5, r is 0, 1 or 2, and n is an integer from 5 to 10 ⁇ 00.
- X is C-R 4 , wherein
- G 1 and G 2 are independently from each other monocyclic bivalent 5 to 8 membered aromatic heterocyclic residue optionally substituted with 1 to 4 substituents R a , wherein
- R 8 and R 9 at each occurrence are independently from each other selected from the group consisting of Ci- 3 o-alkyl, C 2 - 3 o-alkenyl, C 2 - 3 o-alkynyl, C 3 -io-cycloalkyl, Cs-io-cyclo- alkenyl, monovalent 3 to 14 membered aliphatic heterocyclic residue, C6-i4-aryl and monovalent 5 to14 membered aromatic heterocyclic residue,
- L is monocyclic bivalent 5 to 8 membered aromatic heterocyclic residue optionally substituted with 1 to 4 substituents R b , wherein
- R 12 and R 13 at each occurrence are independently from each other selected from the group consisting of Ci- 3 o-alkyl, C2- 3 o-alkenyl, C2- 3 o-alkynyl, C 3 -io-cycloalkyl, Cs-io-cycloalkenyl, monovalent 3 to 14 membered aliphatic heterocyclic residue, C6-i4-aryl and monovalent 5 to14 membered aromatic heterocyclic residue,
- R 16 and R 17 are independently from each other H or Ci-30-alkyl
- q and s are independently from each other 0, 1 , 2, 3, 4 or 5, r is 0, 1 or 2, and n is an integer from 5 to 10 ⁇ 00.
- R 1 is Ci-M-alkyl
- X is C-R 4 , wherein
- R 4 is H
- G 1 and G 2 are independently from each other monocyclic bivalent 5 to 8 membered aromatic heterocyclic residue optionally substituted with 1 to 4 substituents R a , wherein
- R a at each occurrence are independently from each other Ci-30-alkyl
- L is monocyclic bivalent 5 to 8 membered aromatic heterocyclic residue optionally substituted with 1 to 4 substituents R b , wherein
- R b at each occurrence are independently from each other Ci-30-alkyl
- R 16 and R 17 are both H, q and s are both 1 , r is 1 , and n is an integer from 5 to 10 ⁇ 00.
- a particular preferred unit of formula (1 ) is the unit of formula
- R 1 , X, R a , L and n are as defined above.
- a particular preferred unit of formula (V) is the unit of formula
- R 1 , X, R a , L and n are as defined above.
- n is an integer from 5 to 5 ⁇ 00, more preferably from 5 to 1 '000, even more bly from 5 to 100, and most preferably from 10 to 100.
- n is an integer from 10 to 1000, preferably from 10 to 100, and wherein n is an integer from 10 to 1000, preferably from 10 to 100.
- n is an integer from 10 to 1000, preferably from 10 to 100.
- the semiconducting material of the present invention can be a polymer comprising preferably at least 80% by weight, more preferably at least 90% by weight, of a unit of formula (1 ) and/or (1 '), respectively, (1a) and/or (1 'a) based on the weight of the polymer.
- the semiconducting material of the present invention is a polymer consisting essentially of a unit of formula (1 ) and/or (1 '), respectively, (1a) and/or (1 'a).
- the polymer comprising a unit of formula (1 ) and/or (1 ') can be prepared by methods known in the art.
- the polymer comprising a unit of formula (1 ) and/or (1 ') can, for example, be prepared by treating a compound of formula
- R 1 and X are as defined above, and Hal is halogen, preferably -Br, with a compound of formula
- R 102/ - (G 1 ), ⁇ (G 2 ). - R 102 wherein G 1 , G 2 , L, q, r and s are as defined above, and R 100 , R 101 and R 102 are independently from each other Ci-10-alkyl, preferably methyl, in the presence of transition metal catalyst 1 .
- Transition metal catalyst 1 is preferably a palladium catalyst such tris(dibenzylideneacetone)- dipalladium(O), preferably in combination with a phosphine such as tri-o-tolylphosphine.
- the reaction is preferably performed at elevated temperatures such 80 to 200 °C, preferably 90 to 150 °C.
- the reaction can be performed in an inert organic solvent such as chlorobenzene.
- the reaction can be stopped by the addition of end cappers such as 2-bromothiophene and 2-tributylstannylthiophene.
- the crude product may be worked up by conventional methods, for example by extracting the crude product with an appropriate solvent, for example with acetone.
- the compound of formula (2) can be prepared by treating a compound of formula
- Transition metal catalyst 2 is preferably copper.
- the reaction is preferably performed at elevated temperatures such 80 to 150 °C, preferably 100 to 120 °C.
- the reaction can be performed in an inert organic solvent such as dimethylformamide.
- the crude product may be worked up by conventional methods, for example by extracting the crude product with an appropriate solvent, for example with diethylether.
- the compound of formula (4) can be prepared by treating a compound of formula wherein R 1 and X are as defined above, with a halogenating agent
- the halogenating agent is preferably /V-bromosuccinimide.
- the reaction is preferably performed at slightly elevated temperatures such 35 to 80 °C, preferably 40 to 60 °C.
- the reaction can be performed in an organic solvent such chloroform/acetic acid.
- the crude product may be worked up by conventional methods, for example by extracting the crude product with an appropriate solvent, for example with dichloromethane.
- the compound of formula (5) can be prepared by reacting a compound of formula
- R 1 and X are as defined above, with a compound of formula wherein X is as defined above, and LG 1 is a leaving group, preferably -CI, in the presence of a base.
- the base is preferably a tertiary amine such as triethylamine.
- the reaction is preferably performed at slightly elevated temperatures such 35 to 80 °C, preferably at 40 to 60 °C.
- the reac- tion can be performed in an organic solvent such chloroform/acetic acid.
- the crude product may be worked up by conventional methods, for example by extracting the crude product with an appropriate solvent, for example with dichloromethane.
- an electronic device comprising the polymer comprising a unit of formula (1 ) and/or (V) as semiconducting material.
- the electronic device is an organic field effect transistor (OFET), and in particular a thin film transistor (TFT).
- the electronic device is an organic photovoltaic device (OPV).
- an organic field effect transistor comprises a dielectric layer, a semiconducting layer and a substrate.
- an organic field effect transistor usually comprises a gate electrode and source/drain electrodes.
- An organic field effect transistor can have various designs.
- BGTC Bottom-Gate Top-Contact
- TGBC Top-Gate Bottom-Contact
- the semiconducting layer comprises the semiconducting material of the present invention.
- the semiconducting layer can have a thickness of 5 to 500 nm, preferably of 10 to 100 nm, more preferably of 20 to 50 nm.
- the dielectric layer comprises a dielectric material.
- the dielectric material can be silici- um/silicium dioxide, or, preferably, an organic polymer such as polystyrene (PS), poly(methyl- methacrylate) (PMMA), poly(4-vinylphenol) (PVP), polyvinyl alcohol) (PVA), anzocyclobutene (BCB), or polyimide (PI).
- PS polystyrene
- PMMA poly(methyl- methacrylate)
- PVP poly(4-vinylphenol)
- PVA polyvinyl alcohol
- BCB anzocyclobutene
- PI polyimide
- the dielectric layer can have a thickness of 10 to 2000 nm, preferably of 50 to 1000 nm, more preferably of 100 to 800 nm.
- the source/drain contacts and the gate contact can be made from any suitable material, for example Au.
- the substrate can be any suitable substrate such as glass, or a plastic substrate.
- the substrate is a plastic substrate such as polyethersulfone, polycarbonate, polysulfone, polyethylene terephthalate (PET) and polyethylene naphthalate (PEN).
- PET polyethylene terephthalate
- PEN polyethylene naphthalate
- the plastic sub- strate is a plastic foil.
- the organic field effect transistor can be prepared by methods known in the art.
- a top-gate bottom-contact (TGBC) thin film transistors (TFTs) can be prepared as follows: first: the source/drain contacts are placed on the substrate, for example by thermal evaporation of the source/drain material; second: the substrate is coated with the semiconducting layer, for example by spin-coating a solution of the semiconducting material in a suitable solvent and drying the semiconducting layer at elevated temperatures, for example at 80 to 100 °C; third: the semiconducting layer is coated with a solution of the dielectric material in a suitable solvent, for example by spin-coating a solution of the dielectric material and drying the dielectric layer at elevated temperatures, for example at 80 to 100 °C; fourth: the gate contact is placed on top of the dielectric layer, for example by thermal evaporation of the gate material.
- TGBC top-gate bottom-contact
- TFTs thin film transistors
- Also part of the present invention is the use of the polymer comprising the unit of formula (1 ) and/or (1 ') as semiconducting material.
- Electronic devices comprising the semiconducting materials of the present invention show high charge carrier mobility as well as high stability, in particular towards oxidation by air, under ambient environmental conditions.
- the semiconducting materials of the present invention are compatible with liquid processing techniques such as spin coating and thus allow the production of low cost, light weight and flexible electronic devices.
- the crude compound is purified by column chromatography on silica gel with 0-5% ethyl acetate in hexane as eluent to give 3-dodecylaminothiophene (6a) as a brown solid (5.75 g, 49%).
- 3-thiophenecarboxylic acid (3.50 g, 27.31 mmol) and toluene (80 ml.) are added to a round- bottom-flask.
- Oxalyl chloride (3.57 ml_, 40.97 mmol) and DMF (1 drop) are then added to the mixture.
- the reaction mixture is heated at 80 °C overnight.
- the solvent is removed under vac- uum and the remaining crude solid is dissolved in toluene and dried over calcium hydride followed by evaporation of solvent.
- 3-thiophenecarbonylchloride (7a) is a brown solid (3.02 g, 75.43%) and is directly used in example 3 without further purification.
- 3-dodecylaminothiophene (6a) (5.62 g, 21 .01 mmol), THF (40 ml_), and triethylamine (3.87 g, 38.20 mmol) are added to a round-bottom-flask under nitrogen.
- 3-thiophenecarbonylchloride (7a) (2.80 g, 19.10 mmol) in THF (20 ml.) is then added drop wise.
- the reaction mixture is then allowed to warm to room temperature and is stirred overnight.
- the mixture is poured into water and extracted with dichloromethane.
- the organic layer is dried over Na2S0 4 .
- N-bromosuccinimide (1 1.31 g, 63.56 mmol) is added, and the reaction mixture is stirred for 2 hours at room temperature followed by stirring at 50 °C. The reaction is monitored by thin layer chromatography. Additional amount of NBS is added till the reaction is completed. Water is added to quench the reaction mixture and the reaction mixture is extracted with dichloro- methane. The organic layer is dried over Na2S0 4 . Crude compound 4a is purified by column chromatography on silica gel with 0-60% dichloromethane in hexane as eluent to give compound 4a as a green liquid. (4.8 g, 42.7%).
- polymer P1 essentially consisting of the unit of formula 1 b and/or 1 'b is dissolved in chlorobenzene and reprecipitated in methanol.
- the final polymer P1 essentially consisting of the unit of formula 1 b and/or 1 'b is a brown solid (105 mg).
- poly- mer P2 essentially consisting of the unit of formula 1 c and/or 1 'c is dissolved in chlorobenzene and reprecipitated in methanol.
- the final polymer P2 essentially consisting of the unit of formula 1 c and/or 1 'c is a brown solid (150 mg).
- Top-gate bottom-contact (TGBC) thin film transistors TFTs are fabricated on glass (PGO glass used as received).
- Au source-drain contacts (30 nm-thick) are thermally-evaporated.
- the substrates are then coated with the semiconductor layer (thickness: 30 to 40 nm) by spin-coating (1500 rpm) a solution of polymer P1 , respectively, P2 in toluene (concentration ⁇ 10 mg/mL), and drying the film at 90 °C for 30 seconds.
- a 4 weight% polystyrene solution in isopropylace- tate is spin-coated (3600 rpm) and the dielectric film formed is dried at 90 °C for 30 seconds to yield a dielectric layer (thickness: 500 to 600 nm).
- top-gate, bottom-contact (TGBC) thin film transistors of example 8 show the following mo- bility:
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CN104478900B (zh) * | 2014-12-02 | 2017-05-31 | 国家纳米科学中心 | 一种内酰胺类受体单元及其制备方法和用途 |
GB2593130A (en) * | 2019-10-24 | 2021-09-22 | Sumitomo Chemical Co | Photoactive materials |
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CA1202072A (en) * | 1981-12-28 | 1986-03-18 | Yoram S. Papir | Batteries fabricated with electroactive polymers |
US4522745A (en) * | 1982-11-17 | 1985-06-11 | Chevron Research Company | Fused 5,6,5-membered heterocyclic electroactive polymers |
GB8627698D0 (en) * | 1986-11-20 | 1986-12-17 | Boots Co Plc | Therapeutic agents |
CN103254083B (zh) * | 2007-09-03 | 2016-02-03 | 默克专利股份有限公司 | 芴衍生物 |
WO2010052287A1 (en) * | 2008-11-07 | 2010-05-14 | Basf Se | Organic semiconducting polymers |
EP2435497B1 (en) * | 2009-05-27 | 2023-07-05 | CLAP Co., Ltd. | Polycyclic dithiophenes |
US8466460B2 (en) * | 2009-06-05 | 2013-06-18 | Basf Se | Fused bithiophene-vinylene polymers |
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- 2012-04-16 CN CN201280018847.1A patent/CN103517936A/zh active Pending
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JP2014518904A (ja) | 2014-08-07 |
CN103517936A (zh) | 2014-01-15 |
KR101486693B1 (ko) | 2015-01-26 |
WO2012146504A1 (en) | 2012-11-01 |
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