EP2622947B1 - Procédé et dispositif pour la formation d'un faisceau plasma neutre - Google Patents
Procédé et dispositif pour la formation d'un faisceau plasma neutre Download PDFInfo
- Publication number
- EP2622947B1 EP2622947B1 EP11773074.7A EP11773074A EP2622947B1 EP 2622947 B1 EP2622947 B1 EP 2622947B1 EP 11773074 A EP11773074 A EP 11773074A EP 2622947 B1 EP2622947 B1 EP 2622947B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- plasma
- positive
- negative
- grid
- plasma beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims description 21
- 230000007935 neutral effect Effects 0.000 title claims description 13
- 150000002500 ions Chemical class 0.000 claims description 32
- 238000000605 extraction Methods 0.000 claims description 24
- 230000001133 acceleration Effects 0.000 claims description 18
- 239000002245 particle Substances 0.000 claims description 13
- 238000005513 bias potential Methods 0.000 claims description 6
- 230000006698 induction Effects 0.000 claims description 4
- 230000001360 synchronised effect Effects 0.000 claims description 3
- 230000010287 polarization Effects 0.000 description 31
- 238000010586 diagram Methods 0.000 description 6
- 230000010349 pulsation Effects 0.000 description 6
- 239000000523 sample Substances 0.000 description 5
- 230000005684 electric field Effects 0.000 description 4
- 230000003902 lesion Effects 0.000 description 4
- 238000012544 monitoring process Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F03—MACHINES OR ENGINES FOR LIQUIDS; WIND, SPRING, OR WEIGHT MOTORS; PRODUCING MECHANICAL POWER OR A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
- F03H—PRODUCING A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
- F03H1/00—Using plasma to produce a reactive propulsive thrust
- F03H1/0006—Details applicable to different types of plasma thrusters
- F03H1/0025—Neutralisers, i.e. means for keeping electrical neutrality
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/022—Details
- H01J27/024—Extraction optics, e.g. grids
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/54—Plasma accelerators
Definitions
- the present invention relates to a method and a device for forming a plasma beam.
- Another method is that which is the subject of the documents WO 2007/065915 and WO 2010/060887 and which comprises extracting and accelerating positive ions and negative ions out of a plasma by means of at least two grids respectively negatively polarized and positively and combining the flow of said positive ions and the flow of said negative ions to form a electrically neutral plasma beam.
- This method has the advantage of an extremely fast recombination of positive ions and negative ions (of the order of 5x10 -8 cm 3 / s), especially if they come from the same source, but can be tricky to implement as a result of the simultaneous presence of grids having opposite polarizations.
- Yet another method consists in extracting and accelerating the positive ions and the negatively charged particles out of the plasma by subjecting an extraction and acceleration grid to alternately positive and negative polarization potentials.
- said grid extracts plasma and alternately accelerates the positive particles (that is to say the positive ions) and the negative particles (which may be negative ions or electrons), said positive and negative particles being combined then to neutralize their charges.
- the quality of electrical neutrality of the plasma beam thus obtained was not optimal.
- the object of the present invention is to improve this last known method, in order to obtain a better electrical neutrality for the plasma beam.
- the present invention takes advantage of the fact that the number of positive and negative particles extracted and accelerated depends on the duration and amplitude of the positive and negative potentials applied to said extraction and acceleration grid.
- the quality of the electrical neutrality of the plasma beam is acted upon according to the invention.
- Such an adjustment can be performed in real time, for example by analyzing grid currents or by means of an external probe observing said plasma beam.
- the frequency of the alternation of the positive and negative polarization potentials is advantageous for the frequency of the alternation of the positive and negative polarization potentials to be a radio frequency between a few kHz and a few MHz, that is to say that the duration of application of a positive potential or a negative potential on said extraction and acceleration gate is between a few ms and a few ⁇ s. Indeed, experience has shown that such a frequency favors the combination of positive and negative particles.
- this alternating sequence of positive and negative polarization potentials is synchronized with the pulsations of the plasma and that the positive ions are extracted from the plasma during the pulsations thereof, whereas the negative particles are extracted in the intervals between said pulsations.
- the alternating sequence of positive and negative polarization potentials may have any suitable continuous shape, for example sinusoidal. Preferably, however, it is in the form of a series of steep rectangular slots in which the rise time is of the order of the transit time of the ions, or faster.
- the positive and negative potentials used for the polarization of said extraction and acceleration grid amount to several hundred volts, for example 400 volts.
- the present invention further relates to a device for carrying out the method described above.
- a device according to the invention which comprises a plasma generator provided with at least one gate for the extraction and acceleration of electrically charged particles outside said plasma, as well as electrical biasing means of said gate, generating alternately positive and negative polarization potentials, is remarkable in that it comprises a sensor delivering a signal representative of the quality of the electrical neutrality of said plasma beam and in that said electric polarization means are controlled by said sensor so that said plasma beam is at least approximately electrically neutral.
- said electric biasing means comprises a MOSFET-type fast switch, alternately switching two opposite polarities.
- the plasma generator device may furthermore comprise means for synchronizing the electrical polarization means with the pulsations of the plasma.
- the plasma generator device I comprises a plasma core 1 supplied with ionizable gas A2 by a feed 2, said gas A2 being ionized under the action of a continuous radiofrequency electric field RF schematized at 3.
- a continuous plasma comprising positive ions A + , negative ions A - and electrons e - .
- the plasma generator device I has a gate 4 in contact with the plasma to be adapted to extract and accelerate the positive ions A + and negative ions A - of the plasma in the adjacent area 5, after removal of electrons e -, for example by a magnetic filter 6. Downstream of the extraction and acceleration grid 4 is disposed a gate 7 grounded or a slightly negative potential (for example of the order of -10V). Between the grids 4 and 7 could be arranged an intermediate grid 8 polarized negatively. The grid 4 could be replaced by an internal electrode in the plasma core 1, the potentials of polarization then being applied to this internal electrode and grids 8 and 7 being used as before.
- the extraction and acceleration grid 4 is positively and negatively polarized alternately by an electric polarization device 9, comprising, for example, a MOSFET-type fast switch capable of rapidly switching two opposite electrical polarities, without potential overruns. important, "rapidly" meaning of the order of transit time of the ions.
- a known example of a high-voltage polarization signal B + HT, -HT (for example of the order of 400 V), which can be applied to the gate 4, is represented in the diagram of FIG. figure 2 , which represents the voltage V (ordinates) as a function of time t (as abscissa).
- the polarization signal B consists of an alternating series of positive rectangular crenels with steep edges b + (between 0 and + HT) and negative rectangular crenels with steep edges b- (between 0 and -HT).
- all the positive polarization slots b + have equal amplitudes a and durations d, and the same is true for negative slots b-, which, moreover, are identical to said positive niches, to the polarity near.
- the electric polarization device 9 is controllable and is capable of generating a polarization signal B 'consisting of a sequence of positive rectangular b' + and negative b'- amplitude slots. a 'and duration of variables.
- the device I comprises a probe 12, for example of the induction type, able to detect an electrical neutrality defect of the beam PB and to act on the controllable electrical polarization device 9 so that it varies the amplitude. a 'and / or the duration of positive slots b' + and / or negative slots b'-, in order to remove this lack of neutrality.
- the electrical neutrality of the plasma beam PB can be ensured in real time.
- the probe 12 may be replaced by an electric current detector 13, monitoring, for example, the presence of a possible current in the gate 7.
- the RF ionization electric field is pulsed at a much lower frequency than the ignition frequency and, as is symbolized by the line 10 of the figure 1 , the operation of the electric polarization device 9, that is to say the emission of the polarization signal B ', is synchronized with said pulsed electric ionisation field RF, so that the positive ions A + are extracted from the plasma during the pulsations thereof and that the negative ions A - are extracted in the intervals between said pulsations, the electrons e - in the zone 5 being rapidly lost during these intervals.
- the plasma generator device II comprises a plasma core 21 supplied with electropositive gas X by a power supply 22.
- This electropositive gas X is ionized by an RF radiofrequency electric field schematized at 23 and produces positive ions X + and electrons e - .
- the charged particles, ie the positive ions X + and the electrons e - are extracted and accelerated by a gate 24, in contact with the plasma.
- a grid (or set of grids) 25 grounded or at a slightly negative potential, cooperates with gate 24.
- This extraction and acceleration grid 24 is polarized by an electric polarization device 26, of the type of the device 9 described above, able to emit a signal B "consisting of a sequence of positive b + crenellations and crenellations. negatives b "- of amplitude a" and duration of variables.
- the device II comprises a probe 27, for example of the induction type (or a detector 28 monitoring the presence of electric current in the gate 25), able to detect a lack of electrical neutrality of the beam PB and to act on the controllable electric polarization device 26 for the latter to vary the amplitude a "and / or the duration of positive slots b" + and / or negative slots b "-, in order to eliminate any lack of electrical neutrality of the plasma beam PB.
- a probe 27 for example of the induction type (or a detector 28 monitoring the presence of electric current in the gate 25)
- the controllable electric polarization device 26 for the latter to vary the amplitude a "and / or the duration of positive slots b" + and / or negative slots b "-, in order to eliminate any lack of electrical neutrality of the plasma beam PB.
- a line 10 can synchronize the signal B "with the RF pulsed ionisation electric field.
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Particle Accelerators (AREA)
- Plasma Technology (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1057890A FR2965697B1 (fr) | 2010-09-30 | 2010-09-30 | Procede et dispositif pour la formation d'un faisceau plasma. |
PCT/FR2011/052090 WO2012042143A1 (fr) | 2010-09-30 | 2011-09-14 | Procédé et dispositif pour la formation d'un faisceau plasma |
Publications (2)
Publication Number | Publication Date |
---|---|
EP2622947A1 EP2622947A1 (fr) | 2013-08-07 |
EP2622947B1 true EP2622947B1 (fr) | 2014-11-12 |
Family
ID=43920129
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP11773074.7A Active EP2622947B1 (fr) | 2010-09-30 | 2011-09-14 | Procédé et dispositif pour la formation d'un faisceau plasma neutre |
Country Status (5)
Country | Link |
---|---|
US (1) | US9398678B2 (ja) |
EP (1) | EP2622947B1 (ja) |
JP (1) | JP5926267B2 (ja) |
FR (1) | FR2965697B1 (ja) |
WO (1) | WO2012042143A1 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102013217059B3 (de) * | 2013-08-27 | 2014-11-20 | Pascal Koch | Elektrisches Triebwerk und Verfahren zu dessen Betrieb |
FR3020235B1 (fr) | 2014-04-17 | 2016-05-27 | Ecole Polytech | Dispositif de formation d'un faisceau quasi-neutre de particules de charges opposees. |
FR3046520B1 (fr) | 2015-12-30 | 2018-06-22 | Centre National De La Recherche Scientifique - Cnrs | Systeme de generation de faisceau plasma a derive d'electrons fermee et propulseur comprenant un tel systeme |
JP7186234B2 (ja) * | 2018-02-07 | 2022-12-08 | アプライド マテリアルズ インコーポレイテッド | 堆積装置、フレキシブル基板をコーティングする方法、及びコーティングを有するフレキシブル基板 |
CN111526654A (zh) * | 2020-05-09 | 2020-08-11 | 航宇动力技术(深圳)有限公司 | 一种准中性等离子体束流引出装置 |
GB2599933B (en) * | 2020-10-15 | 2023-02-22 | Iceye Oy | Spacecraft propulsion system and method of operation |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3708717A1 (de) * | 1987-03-18 | 1988-09-29 | Hans Prof Dr Rer Nat Oechsner | Verfahren und vorrichtung zur bearbeitung von festkoerperoberflaechen durch teilchenbeschuss |
JPH01100923A (ja) * | 1987-10-14 | 1989-04-19 | Hitachi Ltd | イオン処理装置 |
US5192393A (en) * | 1989-05-24 | 1993-03-09 | Hitachi, Ltd. | Method for growing thin film by beam deposition and apparatus for practicing the same |
US7332345B2 (en) * | 1998-01-22 | 2008-02-19 | California Institute Of Technology | Chemical sensor system |
JPH11298303A (ja) * | 1998-03-16 | 1999-10-29 | Hitachi Ltd | パルスバイアス電源装置 |
JP3948857B2 (ja) * | 1999-07-14 | 2007-07-25 | 株式会社荏原製作所 | ビーム源 |
JP2002289585A (ja) * | 2001-03-26 | 2002-10-04 | Ebara Corp | 中性粒子ビーム処理装置 |
JP4073174B2 (ja) * | 2001-03-26 | 2008-04-09 | 株式会社荏原製作所 | 中性粒子ビーム処理装置 |
JP4073204B2 (ja) * | 2001-11-19 | 2008-04-09 | 株式会社荏原製作所 | エッチング方法 |
AUPS303302A0 (en) | 2002-06-19 | 2002-07-11 | Australian National University, The | A plasma beam generator |
JP2006049817A (ja) * | 2004-07-07 | 2006-02-16 | Showa Denko Kk | プラズマ処理方法およびプラズマエッチング方法 |
US7767561B2 (en) * | 2004-07-20 | 2010-08-03 | Applied Materials, Inc. | Plasma immersion ion implantation reactor having an ion shower grid |
US7183515B2 (en) * | 2004-12-20 | 2007-02-27 | Lockhead-Martin Corporation | Systems and methods for plasma jets |
KR100653073B1 (ko) * | 2005-09-28 | 2006-12-01 | 삼성전자주식회사 | 기판처리장치와 기판처리방법 |
FR2894301B1 (fr) | 2005-12-07 | 2011-11-18 | Ecole Polytech | Propulseur a plasma electronegatif |
JP2007204324A (ja) * | 2006-02-02 | 2007-08-16 | Tokyo Denpa Co Ltd | 高純度酸化亜鉛単結晶の製造方法および高純度酸化亜鉛単結晶 |
FR2939173B1 (fr) | 2008-11-28 | 2010-12-17 | Ecole Polytech | Propulseur a plasma electronegatif a injection optimisee. |
-
2010
- 2010-09-30 FR FR1057890A patent/FR2965697B1/fr not_active Expired - Fee Related
-
2011
- 2011-09-14 JP JP2013530777A patent/JP5926267B2/ja active Active
- 2011-09-14 WO PCT/FR2011/052090 patent/WO2012042143A1/fr active Application Filing
- 2011-09-14 US US13/825,913 patent/US9398678B2/en active Active
- 2011-09-14 EP EP11773074.7A patent/EP2622947B1/fr active Active
Also Published As
Publication number | Publication date |
---|---|
FR2965697B1 (fr) | 2014-01-03 |
US9398678B2 (en) | 2016-07-19 |
WO2012042143A1 (fr) | 2012-04-05 |
US20130300288A1 (en) | 2013-11-14 |
EP2622947A1 (fr) | 2013-08-07 |
FR2965697A1 (fr) | 2012-04-06 |
JP5926267B2 (ja) | 2016-05-25 |
JP2013539185A (ja) | 2013-10-17 |
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