EP2609232B1 - Electrolytic bath for electroplating and process thereof - Google Patents

Electrolytic bath for electroplating and process thereof Download PDF

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Publication number
EP2609232B1
EP2609232B1 EP11754998.0A EP11754998A EP2609232B1 EP 2609232 B1 EP2609232 B1 EP 2609232B1 EP 11754998 A EP11754998 A EP 11754998A EP 2609232 B1 EP2609232 B1 EP 2609232B1
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EP
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Prior art keywords
nickel
electrolytic bath
concentration
bath
acid
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German (de)
French (fr)
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EP2609232A1 (en
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Matthias Kurrle
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IPT - International Plating Technologies GmbH
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IPT - International Plating Technologies GmbH
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/12Electroplating: Baths therefor from solutions of nickel or cobalt
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/562Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt

Definitions

  • the invention relates to an electrolytic bath for the electrodeposition and a process for its production, in particular for a galvanic deposition of a nickel-phosphorus layer.
  • NiP nickel-phosphorus
  • An electrolytic bath preferably allows a high quality coating at a high current density and deposition rate, and it is as cost effective as possible.
  • the WO 99/02765 A1 shows an electrolytic bath for NiP coating.
  • the bath contains nickel carbonate, phosphoric acid, hypophosphorous acid (H 3 PO 2 ) or phosphorous acid (H 3 PO 3 ), and methanesulfonic acid.
  • an electrolytic bath according to claim 1 a method according to claim 10 and a use according to claim 12.
  • Such an electrolytic bath is stable, allows a high current density, a high deposition rate, the generation of a good nickel-phosphorus Layer, and it is inexpensive.
  • saccharin is added in the process.
  • a typical electroplating plant has a bath in which there is a bath (electrolyte, galvanic bath).
  • the substrate to be coated eg cylinder liner of an engine block
  • the substrate to be coated is surrounded in the electrolyte and by a dimensionally stable, insoluble anode or a soluble anode.
  • a DC power source is connected to the anode with the plus terminal and the substrate (cathode) with the minus terminal, and the current is used to electrodeposit the layer on the substrate.
  • a circulation pump ensures a uniform distribution of the bath, and there may be a rotation of the substrate in the electrolyte. This is only an illustrative example, and other electroplating equipment may be used.
  • the composition of the bath determines what current densities and thus deposition rates are possible in the coating, and baths are available on the market for many applications.
  • NiP bath It is proposed a bath that is well suited for the galvanic coating with a layer of nickel and phosphorus and possibly other constituents, which is why the bath is referred to below as NiP bath.
  • a nickel-phosphor coating has a higher hardness compared to a pure nickel coating and thus opens up additional fields of application.
  • the nickel content in the nickel-phosphorus layer also affects the anti-wear properties and the corrosion properties of the alloy.
  • the phosphorus content in the layer determines the hardness, and a common mass fraction is e.g. 6-8% by weight of phosphorus, but depending on the requirements, higher mass fractions of e.g. 12 wt .-% may be required.
  • the nickel or more precisely the nickel ions are present in the solution predominantly as nickel (II) or Ni 2+ , but other oxidation states may also occur.
  • NiP bath may also contain saccharin and / or other additives.
  • H 3 PO 2 phosphinic acid
  • the combination of the constituents phosphoric acid, phosphonic acid and boric acid has proved to be advantageous, since the finished bath with this combination has proved to be relatively stable, in particular with regard to the pH.
  • the combination also allows a high current density and thus a high deposition rate.
  • the ingredients are relatively cheap.
  • the pH of the final bath preparation is preferably in the range of 1.6 to 2.3, more preferably in the range of 1.8 to 2.2.
  • a bath according to the above boric acid concentration range contains boron (partly as a constituent of borate and partly as a constituent of boric acid) at a concentration in the range of 5.2 to 7.0 g / l.
  • NiP bath it is possible to coat different substrates.
  • substrates e.g. Copper, steel or stainless steel to be coated.
  • degreasing, activation and pickling of the substrate preferably takes place, as is known to the person skilled in the art.
  • NiP layer could be produced by electrodeposition.
  • the deposited NiP layer was nonporous, homogeneous, charcoal gray shiny and amorphous, whereby a recrystallization by annealing is possible.
  • the substrate used was a copper stud which had been pretreated (degreasing, activation and pickling).
  • the temperature was about 65 ° C, and the current density was up to 30 A / dm 2 .
  • the deposition rate is Depending on the current density, typical deposition rates of 0.5 ⁇ m / min to more than 2 ⁇ m / min were achieved, these values representing no technical limits.
  • Successful tests were carried out with layer thicknesses of up to 100 ⁇ m.
  • the NiP bath was composed as follows: attempt Nickel (II) phosphoric acid phosphonic boric acid saccharin I 100 g / l 75 g / l 30 g / l 35 g / l 2.6 g / l II 100 g / l 75 g / l 30 g / l 35 g / l 0g / l III 100 g / l 75 g / l 40 g / l 30 g / l 2.6 g / l IV 100 g / l 60 g / l 30 g / l 30 g / l 2.6 g / l V 100 g / l 45 g / l 10 g / l 30 g / l 2.6 g / l
  • the concentration of phosphoric acid or phosphonic acid can also be specified by the concentration of the phosphate (PO 4 3- ) or phosphite (PO 3 3- ).
  • concentration of the phosphate (PO 4 3- ) or phosphite (PO 3 3- ) For example, 75 g / l phosphoric acid corresponds to 73 g / l phosphate and 30 g / l phosphonic acid corresponds to 29 g / l phosphite.
  • saccharin is at NiP layer thicknesses of e.g. 5 - 10 microns not required, but has proved particularly at layer thicknesses of more than 40 microns as advantageous.
  • the electrodeposition works e.g. good at a temperature of about 65 ° C. There are also higher temperatures of e.g. 80-90 ° C possible, wherein when using organic additives such. Saccharin whose temperature sensitivity is to be considered.
  • a layer of NiP is a binary alloy with the components Ni and P.
  • other components to be deposited can also be added to the NiP bath.
  • a ternary (Ni-XP, eg Ni-Co-P) or quaternary alloy or it is also possible to deposit a dispersion layer in which additional particles are embedded in the NiP layer, eg silicon carbide (SiC ), Boron nitride (BN), boron carbide (B 4 C), titanium nitride (TiN), silicon nitride (Si 3 N 4 ), titanium carbide (TiC), tungsten carbide (WC) and / or alumina (Al 2 O 3 ).
  • a prerequisite for commercial electrodeposition is the ability to analyze the bath composition. While the nickel (II) concentration is measurable by titration, and the concentration of phosphoric acid and the phosphonic acid by measuring the concentration of the phosphate (PO 4 3- ) or phosphite (PO 3 3- ) is possible by means of ion chromatography, the Determination of the concentration of boric acid in the specified NiP bath more difficult or expensive.
  • nickel carbonate (NiCO 3 ) is added until the pH is increased to about 1.8.
  • This can be done, for example, by continuously measuring the pH during the addition of the nickel carbonate and stopping the addition as soon as the desired pH is reached.
  • additional nickel is supplied (about 5 g / l Ni 2+ )
  • the current efficiency is significantly increased by the increased pH.
  • Increasing the pH by adding nickel carbonate works well up to a pH of about 2.2. At a higher pH, saturation may occur in the bath.
  • the carbon dioxide (CO 2 ) escapes as gas.
  • the increase in the pH can e.g. also by adding alkalis (e.g., sodium hydroxide (NaOH)).
  • alkalis e.g., sodium hydroxide (NaOH)
  • NiOH sodium hydroxide
  • the use of nickel carbonate to increase the pH has the advantage that no cations of additional elements enter the bath, but the concentration of the nickel (II), which may have been lowered by the electrodeposition, is increased again.
  • the electrolytic bath is filled with demineralised water (deionized water) to the desired volume.
  • the preparation of the NiP bath works e.g. good at a temperature of about 40-65 ° C, which are not absolute limits.
  • nickel salts or combinations of nickel salts are possible (eg nickel sulfate and nickel chloride (NiCl 2 )), preferably at least 50% of the nickel (II) comes from the nickel sulfate in the preparation of the bath, more preferably at least 70%.
  • NiCl 2 nickel chloride

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Abstract

An electrolytic bath for electrodeposition includes nickel salt, phosphoric acid, phosphonic acid, and boric acid in solution. A method for producing an electrolytic bath includes the steps of mixing a nickel salt, phosphoric acid, phosphonic acid, and boric acid, and adding nickel carbonate in order to increase the pH value.

Description

Die Erfindung betrifft ein elektrolytisches Bad für die galvanische Abscheidung und ein Verfahren zu dessen Herstellung, insbesondere für eine galvanische Abscheidung einer Nickel-Phosphor-Schicht.The invention relates to an electrolytic bath for the electrodeposition and a process for its production, in particular for a galvanic deposition of a nickel-phosphorus layer.

Die galvanische Abscheidung einer Nickel-Phosphor-Schicht (NiP-Schicht) auf Substraten ist für viele Anwendungsfälle interessant, da eine NiP-Schicht eine hohe Härte und gute Verschleißschutzeigenschaften hat. Neben der galvanischen Vernickelung ist auch die chemische Vernickelung bekannt.The galvanic deposition of a nickel-phosphorus (NiP) layer on substrates is interesting for many applications, since a NiP layer has a high hardness and good anti-wear properties. In addition to galvanic nickel plating, chemical nickel plating is also known.

Ein elektrolytisches Bad ermöglicht bevorzugt eine hochqualitative Beschichtung bei einer hohe Stromdichte und Abscheiderate, und sie ist dabei möglichst kostengünstig.An electrolytic bath preferably allows a high quality coating at a high current density and deposition rate, and it is as cost effective as possible.

DieThe WO 99/02765 A1 WO 99/02765 A1 zeigt ein elektrolytisches Bad zur NiP-Beschichtung. Das Bad enthält Nickelcarbonat, Phosphorsäure, Hypophosphorsäure (H3PO2) oder phosphorige Säure (H3PO3), und Methansulfonsäure.shows an electrolytic bath for NiP coating. The bath contains nickel carbonate, phosphoric acid, hypophosphorous acid (H 3 PO 2 ) or phosphorous acid (H 3 PO 3 ), and methanesulfonic acid.

Es ist eine Aufgabe der Erfindung, ein neues elektrolytisches Bad für die galvanische Abscheidung und ein Verfahren zu dessen Herstellung bereit zu stellen.It is an object of the invention to provide a novel electrolytic bath for electrodeposition and a process for its production.

Nach der Erfindung wird die Aufgabe gelöst durch ein elektrolytisches Bad gemäß Anspruch 1, ein Verfahren gemäß Anspruch 10 und eine Verwendung gemäß Anspruch 12. Ein solches elektrolytisches Bad ist stabil, ermöglicht eine hohe Stromdichte, eine hohe Abscheiderate, die Erzeugung einer guten Nickel-Phosphor-Schicht, und sie ist kostengünstig. Bevorzugt wird bei dem Verfahren Saccharin zugesetzt.According to the invention, the object is achieved by an electrolytic bath according to claim 1, a method according to claim 10 and a use according to claim 12. Such an electrolytic bath is stable, allows a high current density, a high deposition rate, the generation of a good nickel-phosphorus Layer, and it is inexpensive. Preferably, saccharin is added in the process.

Weitere Einzelheiten und vorteilhafte Weiterbildungen der Erfindung ergeben sich aus den im Folgenden beschriebenen, in keiner Weise als Einschränkung der Erfindung zu verstehenden Ausführungsbeispielen, sowie aus den Unteransprüchen. Eine typische Galvanisieranlage hat eine Wanne, in der sich ein Bad (Elektrolyt, galvanisches Bad) befindet. Das zu beschichtende Substrat (z.B. Zylinderliner eines Motorblocks) ist in dem Elektrolyten und von einer formstabilen, unlöslichen Anode oder einer löslichen Anode umgeben. Eine Gleichstromquelle wird mit dem Plus-Anschluss an die Anode und mit dem Minus-Anschluss an das Substrat (Kathode) angeschlossen, und durch den Strom erfolgt die galvanische Abscheidung der Schicht auf dem Substrat. Eine Umwälzpumpe sorgt für eine gleichmäßige Verteilung des Bads, und es kann eine Drehung des Substrats im Elektrolyten erfolgen. Dies ist nur ein erläuterndes Beispiel, und es können auch andere Galvanisieranlagen verwendet werden.Further details and advantageous developments of the invention will become apparent from the hereinafter described, in no way as a limitation of the invention to be understood embodiments, and from the dependent claims. A typical electroplating plant has a bath in which there is a bath (electrolyte, galvanic bath). The substrate to be coated (eg cylinder liner of an engine block) is surrounded in the electrolyte and by a dimensionally stable, insoluble anode or a soluble anode. A DC power source is connected to the anode with the plus terminal and the substrate (cathode) with the minus terminal, and the current is used to electrodeposit the layer on the substrate. A circulation pump ensures a uniform distribution of the bath, and there may be a rotation of the substrate in the electrolyte. This is only an illustrative example, and other electroplating equipment may be used.

Die Zusammensetzung des Bads bestimmt u.a., welche Stromdichten und damit Abscheideraten bei der Beschichtung möglich sind, und Bäder sind für viele Einsatzzwecke am Markt erhältlich.Among other things, the composition of the bath determines what current densities and thus deposition rates are possible in the coating, and baths are available on the market for many applications.

Zusammensetzung des NiP-BadsComposition of the NiP bath

Es wird ein Bad vorgeschlagen, das gut für die galvanische Beschichtung mit einer Schicht aus Nickel und Phosphor und ggf. weiteren Bestandteilen geeignet ist, weshalb das Bad im Folgenden NiP-Bad genannt wird. Eine Nickel-Phosphor-Beschichtung hat gegenüber einer reinen Nickel-Beschichtung eine höhere Härte und eröffnet somit zusätzliche Anwendungsbereiche. Der Nickel-Anteil in der Nickel-Phosphor-Schicht hat auch Einfluss auf die Verschleißschutzeigenschaften und die Korrosionseigenschaften der Legierung. Der Phosphor-Gehalt in der Schicht bestimmt die Härte, und ein üblicher Massenanteil ist z.B. 6 - 8 Gew.-% Phosphor, es können jedoch in Abhängigkeit von den Anforderungen auch höhere Massenanteile von z.B. 12 Gew.-% erforderlich sein.It is proposed a bath that is well suited for the galvanic coating with a layer of nickel and phosphorus and possibly other constituents, which is why the bath is referred to below as NiP bath. A nickel-phosphor coating has a higher hardness compared to a pure nickel coating and thus opens up additional fields of application. The nickel content in the nickel-phosphorus layer also affects the anti-wear properties and the corrosion properties of the alloy. The phosphorus content in the layer determines the hardness, and a common mass fraction is e.g. 6-8% by weight of phosphorus, but depending on the requirements, higher mass fractions of e.g. 12 wt .-% may be required.

Bevorzugt wird ein NiP-Bad mit einer Zusammensetzung verwendet, welche in Lösung enthält:

  • Nickelsalz
  • Phosphorsäure (H3PO4)
  • Phosphonsäure (H3PO3)
  • Borsäure (H3BO3)
Preferably, a NiP bath is used with a composition containing in solution:
  • nickel salt
  • Phosphoric acid (H 3 PO 4 )
  • Phosphonic acid (H 3 PO 3 )
  • Boric acid (H 3 BO 3 )

Das Nickel bzw. genauer die Nickelionen liegen in der Lösung überwiegend als Nickel(II) bzw. Ni2+ vor, es können jedoch auch andere Oxidationszustände vorkommen.The nickel or more precisely the nickel ions are present in the solution predominantly as nickel (II) or Ni 2+ , but other oxidation states may also occur.

Zusätzlich kann das NiP-Bad auch Saccharin und/oder weitere Additive enthalten. Ein Zusatz von H3PO2 (Phosphinsäure) ist ebenfalls möglich, hat jedoch in den Versuchen nicht zu einem besseren Ergebnis geführt.In addition, the NiP bath may also contain saccharin and / or other additives. An addition of H 3 PO 2 (phosphinic acid) is also possible, but has not led to a better result in the experiments.

Die Kombination der Bestandteile Phosphorsäure, Phosphonsäure und Borsäure hat sich als vorteilhaft erwiesen, da sich das fertige Bad mit dieser Kombination als relativ stabil erwiesen hat, insbesondere im Hinblick auf den pH-Wert. Die Kombination ermöglicht auch eine hohe Stromdichte und damit eine hohe Abscheiderate. Außerdem sind die Bestandteile relativ günstig.The combination of the constituents phosphoric acid, phosphonic acid and boric acid has proved to be advantageous, since the finished bath with this combination has proved to be relatively stable, in particular with regard to the pH. The combination also allows a high current density and thus a high deposition rate. In addition, the ingredients are relatively cheap.

Der pH-Wert der fertigen Bad-Zubereitung liegt bevorzugt im Bereich von 1,6 bis 2,3, weiter bevorzugt im Bereich von 1,8 bis 2,2.The pH of the final bath preparation is preferably in the range of 1.6 to 2.3, more preferably in the range of 1.8 to 2.2.

Im Folgenden werden bevorzugte Bereichsangaben für die einzelnen Bestandteile der Zusammensetzung angegeben, mit denen die elektrolytische Abscheidung gut (hohe Abscheiderate und qualitativ gute Nickel-Phosphor-Schicht) funktioniert, und bei denen der Phosphorgehalt in der abgeschiedenen Schicht den Anforderungen entspricht:

  • Nickel(II): 90 - 130 g/l
  • Phosphorsäure: 60 - 90 g/l
  • Phosphonsäure: 20 - 40 g/l
  • Borsäure: 30 - 40 g/l
  • Saccharin: 0 - 4 g/l
In the following, preferred ranges are given for the individual constituents of the composition with which the electrodeposition works well (high deposition rate and good quality nickel-phosphorus layer) and in which the phosphorus content in the deposited layer meets the requirements:
  • Nickel (II): 90-130 g / l
  • Phosphoric acid: 60-90 g / l
  • Phosphonic acid: 20-40 g / l
  • Boric acid: 30 - 40 g / l
  • Saccharin: 0-4 g / l

Da die Bestandteile in der (wässrigen) Lösung zum Teil dissoziiert sind, sind für die Messung der Konzentration der Bestandteile andere Bereichsangaben besser nachzuprüfen.Since the constituents in the (aqueous) solution are partially dissociated, it is better to verify other ranges for measuring the concentration of the constituents.

Das Nickelsalz wird bevorzugt in Form von Nickelsulfat in wässriger Lösung (NiSO4 · 6 H2O bzw. Nickel(II)-sulfat-Hexahydrat) zugefügt. Die Konzentration des Sulfats (SO4 2-) beträgt in diesem Fall für die obere Bereichsangabe des Nickel(II):

  • Sulfat: 147 - 213 g/l
Dieser Bereich der Konzentration des Sulfats kann z.B. auch durch Zugabe von Schwefelsäure erreicht bzw. beeinflusst werden.The nickel salt is preferably added in the form of nickel sulfate in aqueous solution (NiSO 4 .6H 2 O or nickel (II) sulfate hexahydrate). The concentration of sulphate (SO 4 2- ) in this case is for the upper range of nickel (II):
  • Sulfate: 147 - 213 g / l
This range of the concentration of the sulfate can be achieved or influenced, for example, by adding sulfuric acid.

Die Phosphorsäure und Phosphonsäure sind in der Lösung im Wesentlichen vollständig dissoziiert, so dass die Konzentration der Phosphorsäure bzw. Phosphonsäure gemäß den obigen Bereichsangaben auch über die Konzentration des Phosphats (PO4 3-) bzw. Phosphits (PO3 3-) angegeben werden kann:

  • Phosphat: 58 - 88 g/l
  • Phosphit: 19 - 39 g/l
The phosphoric acid and phosphonic acid are substantially completely dissociated in the solution, so that the concentration of the phosphoric acid or phosphonic acid according to the above ranges can also be indicated by the concentration of the phosphate (PO 4 3- ) or phosphite (PO 3 3- ) :
  • Phosphate: 58-88 g / l
  • Phosphite: 19 - 39 g / l

Die Borsäure ist in der Lösung unvollständig dissoziiert. Gelöste Moleküle (H3BO3) stehen somit in einem Gleichgewicht mit Ionen (3 H+ + BO3 3-). Ein Bad gemäß den obigen Bereichsangaben für die Konzentration der Borsäure enthält Bor (teilweise als Bestandteil des Borats und teilweise als Bestandteil der Borsäure) mit einer Konzentration im Bereich von 5,2 bis 7,0 g/l.The boric acid is incompletely dissociated in the solution. Dissolved molecules (H 3 BO 3 ) are thus in equilibrium with ions (3 H + + BO 3 3- ). A bath according to the above boric acid concentration range contains boron (partly as a constituent of borate and partly as a constituent of boric acid) at a concentration in the range of 5.2 to 7.0 g / l.

Mit dem NiP-Bad ist die Beschichtung verschiedener Substrate möglich. So kann z.B. Kupfer, Stahl oder Edelstahl beschichtet werden. Vor der Beschichtung erfolgt bevorzugt eine Entfettung, Aktivierung und Dekapierung des Substrats, wie dies dem Fachmann bekannt ist.With the NiP bath it is possible to coat different substrates. Thus, e.g. Copper, steel or stainless steel to be coated. Prior to coating, degreasing, activation and pickling of the substrate preferably takes place, as is known to the person skilled in the art.

Durchgeführte VersuchePerformed experiments

Es wurde eine Vielzahl von Versuchen mit unterschiedlichen Bad-Zusammensetzungen zur Abscheidung von NiP durchgeführt. Bei den im Folgenden beispielhaft aufgeführten Versuchen konnte durch galvanische Abscheidung eine NiP-Schicht erzeugt werden. Die abgeschiedene NiP-Schicht war porenfrei, homogen, anthrazitgrau glänzend und amorph, wobei eine Rekristallisierung durch Tempern möglich ist. Als Substrat wurde ein Kupferbolzen verwendet, der vorbehandelt wurde (Entfettung, Aktivierung und Dekapierung). Die Temperatur betrug ca. 65 °C, und die Stromdichte betrug bis zu 30 A/dm2. Die Abscheiderate ist abhängig von der Stromdichte, und es wurden typische Abscheideraten von 0,5 µm/min bis über 2 µm/min erzielt, wobei diese Werte keine technischen Grenzen darstellen. Es wurden erfolgreiche Versuche mit Schichtdicken von bis zu 100 µm durchgeführt.A variety of experiments were carried out with different bath compositions for the deposition of NiP. In the experiments exemplified below, a NiP layer could be produced by electrodeposition. The deposited NiP layer was nonporous, homogeneous, charcoal gray shiny and amorphous, whereby a recrystallization by annealing is possible. The substrate used was a copper stud which had been pretreated (degreasing, activation and pickling). The temperature was about 65 ° C, and the current density was up to 30 A / dm 2 . The deposition rate is Depending on the current density, typical deposition rates of 0.5 μm / min to more than 2 μm / min were achieved, these values representing no technical limits. Successful tests were carried out with layer thicknesses of up to 100 μm.

Beispiele I bis VExamples I to V

Das NiP-Bad war wie folgt zusammengesetzt: Versuch Nickel(II) Phosphorsäure Phosphonsäure Borsäure Saccharin I 100 g/l 75 g/l 30 g/l 35 g/l 2,6 g/l II 100 g/l 75 g/l 30 g/l 35 g/l 0 g/l III 100 g/l 75 g/l 40 g/l 30 g/l 2,6 g/l IV 100 g/l 60 g/l 30 g/l 30 g/l 2,6 g/l V 100 g/l 45 g/l 10 g/l 30 g/l 2,6 g/l The NiP bath was composed as follows: attempt Nickel (II) phosphoric acid phosphonic boric acid saccharin I 100 g / l 75 g / l 30 g / l 35 g / l 2.6 g / l II 100 g / l 75 g / l 30 g / l 35 g / l 0g / l III 100 g / l 75 g / l 40 g / l 30 g / l 2.6 g / l IV 100 g / l 60 g / l 30 g / l 30 g / l 2.6 g / l V 100 g / l 45 g / l 10 g / l 30 g / l 2.6 g / l

Die Konzentration der Phosphorsäure bzw. Phosphonsäure kann auch über die Konzentration des Phosphats (PO4 3-) bzw. Phosphits (PO3 3-) angegeben werden. So entspricht z.B. 75 g/l Phosphorsäure dem Wert 73 g/l Phosphat, und 30 g/l Phosphonsäure entspricht dem Wert 29 g/l Phosphit.The concentration of phosphoric acid or phosphonic acid can also be specified by the concentration of the phosphate (PO 4 3- ) or phosphite (PO 3 3- ). For example, 75 g / l phosphoric acid corresponds to 73 g / l phosphate and 30 g / l phosphonic acid corresponds to 29 g / l phosphite.

Die Verwendung von Saccharin ist bei NiP-Schichtstärken von z.B. 5 - 10 µm nicht erforderlich, hat sich jedoch insbesondere bei Schichtstärken von mehr als 40 µm als vorteilhaft erwiesen.The use of saccharin is at NiP layer thicknesses of e.g. 5 - 10 microns not required, but has proved particularly at layer thicknesses of more than 40 microns as advantageous.

Die galvanische Abscheidung funktioniert z.B. gut bei einer Temperatur von ca. 65 °C. Es sind auch höhere Temperaturen von z.B. 80 - 90 °C möglich, wobei bei der Verwendung von organischen Zusätzen wie z.B. Saccharin deren Temperaturempfindlichkeit zu berücksichtigen ist.The electrodeposition works e.g. good at a temperature of about 65 ° C. There are also higher temperatures of e.g. 80-90 ° C possible, wherein when using organic additives such. Saccharin whose temperature sensitivity is to be considered.

Es wurde reproduzierbar bei Stromdichten bis 30 A/dm2 beschichtet. Die gemessene Stromausbeute betrug ca. 50 - 55 %. Bei einer Stromdichte von 10 A/dm2 wurde eine Abscheiderate von ca. 1 µm/min erzielt.It was reproducibly coated at current densities up to 30 A / dm 2 . The measured current efficiency was about 50-55%. At a current density of 10 A / dm 2 , a deposition rate of about 1 μm / min was achieved.

Bei den durchgeführten Versuchen wurde als Massenanteil des Phosphors in der Nickel-Phosphor-Schicht bis zu 12 Gew.-% gemessen.In the experiments carried out as mass fraction of phosphorus in the nickel-phosphorus layer up to 12 wt .-% was measured.

Die Versuche haben ergeben, dass eine höherer Nickel(II)-Konzentration im Bad eine höhere Stromdichte ermöglicht, wobei die Konzentration durch die Sättigungsgrenze begrenzt ist.The experiments have shown that a higher nickel (II) concentration in the bath allows a higher current density, the concentration being limited by the saturation limit.

Bei einer Schicht aus NiP handelt es sich um eine binäre Legierung mit den Bestandteilen Ni und P. Dem NiP-Bad können jedoch auch weitere abzuscheidende Bestandteile zugesetzt werden. So kann z.B. auch eine ternäre (Ni-X-P, z.B. Ni-Co-P) oder quaternäre Legierung abgeschieden werden, oder es ist auch die Abscheidung einer Dispersionsschicht möglich, bei der zusätzliche Partikel in die NiP-Schicht eingebettet sind, z.B. Siliciumcarbid (SiC), Bornitrid (BN), Borcarbid (B4C), Titannitrid (TiN), Siliciumnitrid (Si3N4), Titancarbid (TiC), Wolframcarbid (WC) und/oder Aluminiumoxid (Al2O3).A layer of NiP is a binary alloy with the components Ni and P. However, other components to be deposited can also be added to the NiP bath. For example, it is also possible to deposit a ternary (Ni-XP, eg Ni-Co-P) or quaternary alloy, or it is also possible to deposit a dispersion layer in which additional particles are embedded in the NiP layer, eg silicon carbide (SiC ), Boron nitride (BN), boron carbide (B 4 C), titanium nitride (TiN), silicon nitride (Si 3 N 4 ), titanium carbide (TiC), tungsten carbide (WC) and / or alumina (Al 2 O 3 ).

Analyse des NiP-BadsAnalysis of the NiP bath

Eine Voraussetzung für die kommerzielle galvanische Beschichtung ist die Möglichkeit der Analyse der Badzusammensetzung. Während die Nickel(II)-Konzentration über Titration messbar ist, und die Konzentration der Phosphorsäure und der Phosphonsäure über die Messung der Konzentration des Phosphats (PO4 3-) bzw. Phosphits (PO3 3-) mittels Ionenchromatographie möglich ist, ist die Bestimmung der Konzentration der Borsäure in dem angegebenen NiP-Bad schwieriger bzw. aufwändiger. Da eine Titration zur Bestimmung der Konzentration der Borsäure auf Grund der ähnlichen pks-Werte der Borsäure, Phosphorsäure und Phosphonsäure nicht bzw. nur schwierig möglich ist, muss die Bestimmung der Konzentration der Borsäure über andere Verfahren wie z.B. über AAS (Atomabsorptionsspektrometrie) oder für genaue Messungen über das teurere ICP-OES (Optische Emissionsspektrometrie mit induktiv gekoppeltem Plasma) erfolgen.A prerequisite for commercial electrodeposition is the ability to analyze the bath composition. While the nickel (II) concentration is measurable by titration, and the concentration of phosphoric acid and the phosphonic acid by measuring the concentration of the phosphate (PO 4 3- ) or phosphite (PO 3 3- ) is possible by means of ion chromatography, the Determination of the concentration of boric acid in the specified NiP bath more difficult or expensive. Since a titration to determine the concentration of boric acid due to the similar pks values of boric acid, phosphoric acid and phosphonic acid is difficult or impossible, the determination of the concentration of boric acid by other methods such as AAS (atomic absorption spectrometry) or for accurate Measurements are made using the more expensive ICP-OES (Inductively Coupled Plasma Optical Emission Spectrometry).

Herstellung des NiP-BadsProduction of the NiP bath Beispiel VIExample VI

Als Beispiel wird die Herstellung eines NiP-Bads mit der folgenden Zusammensetzung beschrieben:

  • 100 g/l Ni2+
  • 64 g/l H3PO4
  • 30 g/l H3PO3
  • 35 g/l H3BO3
  • 2,6 g/l Saccharin
pH-Wert = 1,8As an example, the preparation of a NiP bath having the following composition is described:
  • 100 g / l Ni 2+
  • 64 g / l H 3 PO 4
  • 30 g / l H 3 PO 3
  • 35 g / l H 3 BO 3
  • 2.6 g / l saccharin
pH = 1.8

Schritt 1Step 1

Im ersten Schritt werden im Falle der optionalen Zugabe von Saccharin gemischt:

  • 425,4 g/l Nickel(II)-sulfat-Hexahydrat in wässriger Lösung
  • 2,6 g/l Saccharin
Das Nickel(II)-sulfat-Hexahydrat (NiSO4 · 6 H2O) in wässriger Lösung wird z.B. von der Fa. IPT International Plating Technologies GmbH, Stuttgart, als NDC Make Up & Maintenance angeboten. Dies ist eine Nickel(II)-sulfat-Hexahydrat-Lösung mit einer Konzentration von 114,5 g/l Nickel. Für die oben angegebene Menge des Nickel(II)-sulfat-Hexahydrats muss 0,675 I NDC Make Up & Maintenance zugegeben werden. Die angegebene Menge führt zu einer Konzentration von ca. 95 g/l Nickel(II).In the first step, in the case of the optional addition of saccharin, mixed:
  • 425.4 g / l nickel (II) sulfate hexahydrate in aqueous solution
  • 2.6 g / l saccharin
The nickel (II) sulfate hexahydrate (NiSO 4 .6H 2 O) in aqueous solution is offered, for example, by IPT International Plating Technologies GmbH, Stuttgart, as NDC Make Up & Maintenance. This is a nickel (II) sulfate hexahydrate solution with a concentration of 114.5 g / l nickel. For the above amount of nickel (II) sulfate hexahydrate, 0.675 I NDC Make Up & Maintenance must be added. The stated amount leads to a concentration of about 95 g / l nickel (II).

Schritt 2step 2

Im zweiten Schritt werden dem Bad zugefügt:

  • 44 ml/l Phosphorsäure 85%ig
  • 30 g/l Phosphonsäure
  • 35 g/l Borsäure
Die Phosphonsäure und die Borsäure sind Feststoffe, die als solche oder aber auch in Lösung zugesetzt werden können. Das Bad hat in diesem Zustand einen pH-Wert im Bereich von unter 1. Im Falle der Zugabe von Saccharin erfolgt diese bevorzugt in die Nickelsalzlösung und vor der Zugabe der Säuren.In the second step are added to the bath:
  • 44 ml / l phosphoric acid 85%
  • 30 g / l phosphonic acid
  • 35 g / l boric acid
The phosphonic acid and the boric acid are solids which can be added as such or else in solution. The bath in this state has a pH in the range of below 1. In the case of the addition of saccharin, this is preferably carried out in the nickel salt solution and before the addition of the acids.

Schritt 3step 3

Anschließend wird im dritten Schritt oder im ersten und/oder zweiten Schritt Nickelcarbonat (NiCO3) hinzugefügt, bis der pH-Wert ungefähr auf 1,8 erhöht ist. Dies kann z.B. dadurch erfolgen, dass der pH-Wert während der Zugabe des Nickelcarbonats fortlaufend gemessen wird und die Zugabe gestoppt wird, sobald der gewünschte pH-Wert erreicht ist. Hierdurch wird zum einen zusätzliches Nickel zugeführt (ca. 5 g/l Ni2+), und zum anderen wird durch den erhöhten pH-Wert die Stromausbeute deutlich erhöht. Die Erhöhung des pH-Werts durch Hinzugabe von Nickelcarbonat funktioniert gut bis zu einem pH-Wert von ca. 2,2. Bei einem höheren pH-Wert kann im Bad Sättigung eintreten.Subsequently, in the third step or in the first and / or second step, nickel carbonate (NiCO 3 ) is added until the pH is increased to about 1.8. This can be done, for example, by continuously measuring the pH during the addition of the nickel carbonate and stopping the addition as soon as the desired pH is reached. As a result, on the one hand additional nickel is supplied (about 5 g / l Ni 2+ ), and on the other hand, the current efficiency is significantly increased by the increased pH. Increasing the pH by adding nickel carbonate works well up to a pH of about 2.2. At a higher pH, saturation may occur in the bath.

Die Erhöhung des pH-Werts erfolgt gemäß folgender Reaktionsgleichung:

        2 H+ + NiCO3 → CO2 ↑ + H2O + Ni2+

The increase in the pH takes place according to the following reaction equation:

2 H + + NiCO 3 → CO 2 ↑ + H 2 O + Ni 2+

Das Kohlendioxid (CO2) entweicht als Gas.The carbon dioxide (CO 2 ) escapes as gas.

Die Erhöhung des pH-Werts kann z.B. auch durch Zugabe von Laugen (z.B. Natriumhydroxid (NaOH)) erfolgen. Die Verwendung von Nickelcarbonat zur Erhöhung des pH-Werts hat den Vorteil, dass keine Kationen zusätzlicher Elemente ins Bad kommen, sondern die ggf. durch die galvanische Abscheidung erniedrigte Konzentration des Nickel(II) wieder erhöht wird.The increase in the pH can e.g. also by adding alkalis (e.g., sodium hydroxide (NaOH)). The use of nickel carbonate to increase the pH has the advantage that no cations of additional elements enter the bath, but the concentration of the nickel (II), which may have been lowered by the electrodeposition, is increased again.

Schritt 4Step 4

Im vierten Schritt oder im ersten, zweiten und/oder dritten Schritt wird das elektrolytische Bad mit VE-Wasser (vollentsalztem Wasser) bis zum gewünschten Volumen aufgefüllt.In the fourth step or in the first, second and / or third step, the electrolytic bath is filled with demineralised water (deionized water) to the desired volume.

Die Herstellung des NiP-Bads funktioniert z.B. gut bei einer Temperatur von ca. 40-65 °C, wobei dies keine absoluten Grenzen sind.The preparation of the NiP bath works e.g. good at a temperature of about 40-65 ° C, which are not absolute limits.

Naturgemäß sind im Rahmen der vorliegenden Erfindung vielfältige Abwandlungen und Modifikationen möglich.Naturally, various modifications and modifications are possible within the scope of the present invention.

Es sind z.B. auch andere Nickelsalze bzw. Kombinationen von Nickelsalzen möglich (z.B. Nickelsulfat und Nickelchlorid (NiCl2)), wobei bevorzugt mindestens 50 % des Nickel(II) bei der Herstellung des Bads aus dem Nickelsulfat kommt, weiter bevorzugt mindestens 70 %.For example, other nickel salts or combinations of nickel salts are possible (eg nickel sulfate and nickel chloride (NiCl 2 )), preferably at least 50% of the nickel (II) comes from the nickel sulfate in the preparation of the bath, more preferably at least 70%.

Durch Wärmebehandlung des beschichteten Substrats (Tempern) kann eine weitere Erhöhung der Härte erreicht werden.By heat treatment of the coated substrate (tempering), a further increase in hardness can be achieved.

Claims (12)

  1. An electrolytic bath for electrodeposition, comprising in solution:
    a) nickel salt
    b) phosphoric acid
    c) phosphonic acid
    d) boric acid.
  2. The electrolytic bath according to claim 1,
    comprising in solution phosphoric acid with a concentration in the range of 60-90 g/l.
  3. The electrolytic bath according to claim 1 or 2,
    further comprising in solution phosphonic acid with a concentration in the range of 20-40 g/l.
  4. The electrolytic bath according to one of the preceding claims,
    further comprising in solution boric acid with a concentration in the range of 30-40 g/l.
  5. The electrolytic bath according to one of the preceding claims,
    further comprising in solution nickel(II) with a concentration in the range of 90-130 g/l.
  6. The electrolytic bath according to one of the preceding claims,
    further comprising in solution 0-4 g/l saccharine.
  7. The electrolytic bath according to one of the preceding claims,
    having a pH in the range from 1.6 to 2.3.
  8. The electrolytic bath according to one of the preceding claims,
    wherein the nickel salt comprises nickel sulfate and wherein more than 50% of the nickel(II) in the bath comes from the nickel sulfate.
  9. The electrolytic bath according to one of the preceding claims,
    further comprising in solution sulfate with a concentration in the range of 147-213 g/l.
  10. A method for producing an electrolytic bath, the method comprising the steps of:
    A) mixing a nickel salt, phosphoric acid, phosphonic acid, and boric acid; and
    B) adding nickel carbonate to raise the pH.
  11. The method according to claim 10,
    wherein the pH of the bath is measured and wherein nickel carbonate is added to raise the pH until a predetermined pH is reached, the predetermined pH being situated preferably in the range from 1.6 to 2.3.
  12. A use of an electrolytic bath according to one of claims 1 to 9 for electrodeposition of a nickel-containing layer onto a workpiece.
EP11754998.0A 2010-08-27 2011-08-24 Electrolytic bath for electroplating and process thereof Not-in-force EP2609232B1 (en)

Applications Claiming Priority (2)

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DE102010035661A DE102010035661A1 (en) 2010-08-27 2010-08-27 Electrolytic bath for electrodeposition and process for its preparation
PCT/EP2011/004244 WO2012025226A1 (en) 2010-08-27 2011-08-24 Electrolytic bath for electrodeposition and method for producing same

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DE102015209887A1 (en) * 2015-05-29 2016-12-01 Mahle International Gmbh Piston for a cylinder of an internal combustion engine

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WO2017102661A1 (en) * 2015-12-18 2017-06-22 Rolex Sa Method for producing a timepiece component
IT201700079843A1 (en) * 2017-07-14 2019-01-14 Metalcoating S R L ELECTROLYTIC PROCESS FOR THE COATING OF METALLIC SURFACES IN THE PURPOSE OF PROVIDING HIGH RESISTANCE TO CORROSION AND ABRASION.

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US2643221A (en) * 1950-11-30 1953-06-23 Us Army Electrodeposition of phosphorusnickel and phosphorus-cobalt alloys
US3355267A (en) * 1964-02-12 1967-11-28 Kewanee Oil Co Corrosion resistant coated articles and processes of production thereof
US4673468A (en) * 1985-05-09 1987-06-16 Burlington Industries, Inc. Commercial nickel phosphorus electroplating
US4767509A (en) * 1983-02-04 1988-08-30 Burlington Industries, Inc. Nickel-phosphorus electroplating and bath therefor
US6099624A (en) * 1997-07-09 2000-08-08 Elf Atochem North America, Inc. Nickel-phosphorus alloy coatings
WO2002063070A1 (en) * 2001-02-08 2002-08-15 The University Of Alabama In Huntsville Nickel cobalt phosphorous low stress electroplating
JP4217778B2 (en) * 2003-04-11 2009-02-04 古河電気工業株式会社 Conductive substrate with resistance layer, circuit board with resistance layer, and resistance circuit wiring board
KR100546212B1 (en) * 2003-09-18 2006-01-24 한국원자력연구소 Ni-P-B alloy electroplating method and its plating solution

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102015209887A1 (en) * 2015-05-29 2016-12-01 Mahle International Gmbh Piston for a cylinder of an internal combustion engine

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US20130168259A1 (en) 2013-07-04
US9340888B2 (en) 2016-05-17

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