EP2569541A2 - Système de pompage à vide - Google Patents

Système de pompage à vide

Info

Publication number
EP2569541A2
EP2569541A2 EP11712316A EP11712316A EP2569541A2 EP 2569541 A2 EP2569541 A2 EP 2569541A2 EP 11712316 A EP11712316 A EP 11712316A EP 11712316 A EP11712316 A EP 11712316A EP 2569541 A2 EP2569541 A2 EP 2569541A2
Authority
EP
European Patent Office
Prior art keywords
foreline
vacuum
arrangement
pumping system
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP11712316A
Other languages
German (de)
English (en)
Other versions
EP2569541B1 (fr
Inventor
Michael Andrew Galtry
David Alan Turrell
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Edwards Ltd
Original Assignee
Edwards Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Edwards Ltd filed Critical Edwards Ltd
Publication of EP2569541A2 publication Critical patent/EP2569541A2/fr
Application granted granted Critical
Publication of EP2569541B1 publication Critical patent/EP2569541B1/fr
Not-in-force legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2/00—Rotary-piston machines or pumps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C25/00—Adaptations of pumps for special use of pumps for elastic fluids
    • F04C25/02—Adaptations of pumps for special use of pumps for elastic fluids for producing high vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
    • F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C14/00—Control of, monitoring of, or safety arrangements for, machines, pumps or pumping installations
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C29/00—Component parts, details or accessories of pumps or pumping installations, not provided for in groups F04C18/00 - F04C28/00
    • F04C29/0021—Systems for the equilibration of forces acting on the pump
    • F04C29/0035—Equalization of pressure pulses
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C29/00—Component parts, details or accessories of pumps or pumping installations, not provided for in groups F04C18/00 - F04C28/00
    • F04C29/12—Arrangements for admission or discharge of the working fluid, e.g. constructional features of the inlet or outlet
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2220/00—Application
    • F04C2220/30—Use in a chemical vapor deposition [CVD] process or in a similar process
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2270/00—Control; Monitoring or safety arrangements
    • F04C2270/18—Pressure

Definitions

  • the present invention relates to a vacuum pumping system for evacuating a vacuum chamber.
  • the manufacture of many articles requires the use of a vacuum chamber.
  • processing of silicon wafers takes place in at high vacuum.
  • such apparatus as flat panel displays and solar cells require processing in vacuum chambers.
  • the vacuum chamber may be required to have a relatively large volume for processing relatively large articles.
  • the pressure in a vacuum chamber is required to cycle between atmosphere (1 bar) and a processing pressure (e.g. 0.01 mbar).
  • a vacuum pumping system In order to improve manufacturing speed and efficiency, it is desirable to increase the rate at which gas can be evacuated from a vacuum chamber by a vacuum pumping system.
  • a vacuum pumping system may comprise a vacuum pump and a foreline connecting an inlet of the vacuum pump to a vacuum chamber so that the pump can evacuate gas from the chamber.
  • the rate at which gas can be evacuated depends on for example the compression and capacity of the pump and also conductance of the foreline. It is therefore desirable to provide a foreline with a large conductance so that it provides relatively little resistance to evacuation of the vacuum chamber. If foreline conductance is small the rate at which pressure can be reduced, particularly at low pressures, can become very slow. Moreover, a high vacuum target pressure may be unattainable if the conductance is too low.
  • a large conductance may be provided using a pipe with a large cross-section or diameter.
  • a large cross-section increases the internal volume of the foreline, and if the vacuum pump is spaced some distance away from the chamber, for example in a basement pumping system, the internal volume of the foreline may become relatively large. If the volume of the chamber is comparable with the volume of the foreline, pump-down time may be adversely affected due to the large overall volume of the vacuum chamber and the foreline. In this regard, it will be appreciated that the volume of the foreline requires evacuation to the desired pressure in addition to evacuation of the vacuum chamber.
  • the rate at which a vacuum chamber can be evacuated has been increased by providing a vacuum pump or pumps with greater pumping speed or compression.
  • such pumps are generally larger and consume more power.
  • the present invention provides a vacuum pumping system for evacuating a vacuum chamber, the system comprising: a vacuum pump; and a plurality of forelines for conveying gas to the vacuum pump from said vacuum chamber wherein in a first low vacuum stage of chamber evacuation a first foreline arrangement can be connected for conveying gas to the vacuum pump and in a second higher vacuum, i.e. lower pressure, stage of chamber evacuation a second foreline arrangement comprising one or more of said forelines can be connected for conveying gas to the vacuum pump, wherein the second foreline arrangement has a total cross-sectional area for conveying fluid which is larger than a total cross-sectional area of the first foreline arrangement.
  • the present invention also provides a method of evacuating a vacuum chamber, the method comprising: connecting a first foreline arrangement for conveying fluid to a vacuum pump and evacuating gas from said vacuum chamber through the first foreline arrangement in a first relatively low vacuum stage of chamber evacuation; and connecting a second foreline arrangement for conveying gas to the vacuum pump and evacuating gas through the second foreline arrangement in a second higher vacuum stage of chamber evacuation, wherein the second foreline arrangement is configured to have a total cross- sectional area which is larger than the total cross-sectional area of the first foreline arrangement.
  • the present invention provides a vacuum chamber evacuation apparatus comprising a plurality of foreline arrangements for connecting a vacuum pump to a vacuum chamber for evacuation thereof; the foreline arrangements comprising a plurality of conduits and valves configurable to form a first and a second foreline arrangement between a vacuum chamber and a vacuum pump; said second foreline arrangement being of a higher conductance than said first foreline arrangement; and wherein said apparatus is configured, in use, to switch from the first arrangement to the second arrangement when the pressure in the vacuum chamber drops below a threshold pressure.
  • Figure 1 is a schematic diagram of a first vacuum pumping system and vacuum chamber
  • Figure 2 shows a graph plotting chamber pressure against elapsed time for four vacuum pumping systems
  • FIG 3 is a schematic diagram of a second vacuum pumping system and vacuum chamber.
  • a vacuum pumping system 10 for evacuating a vacuum chamber 12.
  • the vacuum pumping system comprises a vacuum pump 16, such as a roots, claw or scroll pump, for evacuating the vacuum chamber 12 to between around 1 mbar to 0.01 mbar. Two or more such pumps may be provided in series or parallel and the term vacuum pump is to be construed accordingly.
  • a plurality of forelines 20, or conduits connects the vacuum pump 16 to the vacuum chamber 12 for conveying fluid from the chamber to the vacuum pump.
  • a first foreline arrangement comprises one or more of the forelines and has a first total cross-sectional area for conveying fluid.
  • the first foreline arrangement can be connected for conveying gas to the vacuum pump during a low vacuum stage of chamber evacuation.
  • a second foreline arrangement comprises one or more forelines and has a second total cross-sectional area.
  • the second foreline arrangement can be connected for conveying gas to the vacuum pump during a higher vacuum stage of chamber evacuation.
  • the total cross-sectional area of the first foreline arrangement is sized
  • the foreline conductance is high and therefore a smaller cross-sectional area is adequate to prevent restriction of the pumping speed.
  • a relatively small total cross-sectional area of the first foreline arrangement reduces the total volume of the vacuum chamber and the foreline arrangement.
  • the vacuum pumping system comprises valves 26, 28 30.
  • Main valve 26 is operable for connecting the vacuum chamber 12 to the vacuum pumping system 10 along the first foreline 22 or the second foreline 24.
  • Valves 28 and 30 are upstream and downstream respectively of the second foreline 24.
  • valves 28 and 30 are closed to isolate the second foreline 24 from the first foreline valve 22 and therefore when main valve 26 is open fluid is conveyed to the pump along foreline 22 only.
  • valves 28, 30 are opened so that fluid is conveyed to the vacuum pump along both the first foreline 22 and the second foreline 24.
  • the first foreline 22 has a cross-sectional area which is less than that of the second foreline 24.
  • the first foreline may have a cross-sectional area in the range of 10 4 to 10 5 mm 2 and the second foreline may have a cross-sectional area in the range of 10 5 to 10 6 mm 2 .
  • the forelines may be circular in cross-section and the first foreline may have a diameter of 100 mm and a cross-sectional area of around 8,000 mm 2 and the second foreline may have a diameter of 320 mm and a cross-sectional area of around 80,000 mm 2 .
  • the lengths of the forelines 22, 24 are approximately the same and therefore the first foreline has a conductance and a volume which is less than the conductance and volume of the second foreline. Accordingly, in the second foreline arrangement, the second foreline only may be connected for conveying gas to the vacuum pump. However, it is preferable that foreline 22 is used in addition to foreline 24 so that gas can be conveyed through both forelines to increase the total cross-sectional area and the conductance of the second foreline arrangement. Alternatively, two forelines of comparable size can be adopted such that in the first foreline arrangement a single foreline conveys gas to the vacuum pump and in the second foreline arrangement both forelines convey gas to the vacuum pump.
  • many forelines may be provided and a first plurality of forelines can be selected for conveying gas to the vacuum pump in the first foreline arrangement and a second plurality of forelines can be selected for conveying gas to the vacuum pump in the second foreline arrangement.
  • the second foreline arrangement may comprise one or more of the forelines of the first foreline arrangement.
  • the vacuum pump may be spaced some distance away from the vacuum chamber, for example in a semiconductor fabrication plant where the vacuum pump may be located in a basement and connected to a vacuum chamber which is located in a clean room on a floor above. It may be necessary that the paths of the forelines turn a number of times in order to connect the pump to the chamber. Each turn, and the angle through which the forelines turn, affects conductance since a large number of turns decreases conductance. Therefore, the distance and number of turns are taken into account when determining conductance of the first and second foreline arrangements.
  • the graph plots chamber pressure in mbar on the y-axis against elapsed time from commencement of chamber evacuation in seconds on the x-axis.
  • the graph shows curves for 160mm, 250mm, 320mm and 320/100 mm forelines, the last of which is an example of the system shown in Figure 1.
  • the vacuum chamber tested is lm 3 and each of the forelines is 15m in length having 5 bends between the vacuum chamber and the pump.
  • the plot is initially relatively steep showing that a relatively low conductance and low volume foreline allows an increased rate of chamber evacuation during a low vacuum stage. In this regard, there is less volume in a 160 mm foreline and therefore the total volume of the chamber and foreline that is required to be evacuated is reduced.
  • the plot shallows as the relatively low conductance of the 160 mm foreline restricts the amount of gas that can be evacuated from the chamber.
  • the limited conductance prevents the vacuum pumping system from evacuating the chamber to the target pressure of 0.01 mbar. Instead the plot plateaus at around 0.03 mbar.
  • the plot is initially shallower compared to the 160 mm foreline because the 250 mm foreline has greater volume to evacuate.
  • the vacuum pumping system comprising a 250 mm is capable of obtaining the target pressure of 0.01 mbar after 60 seconds.
  • a vacuum pumping system comprising a 320 mm foreline is capable of obtaining the target pressure of 0.01 mbar after only 48 seconds.
  • valve 26 On commencement of pump down at time 0, the valve 26 is operated to convey gas to the vacuum pump along the 100 mm foreline 22 only. Valves 28, 30 are closed to isolate the 320 mm foreline 24. Accordingly, in the first foreline arrangement during a low vacuum stage of chamber evacuation, gas is evacuated relatively quickly from the chamber through the relatively small cross-sectional area 100 mm foreline 22. When the chamber reaches a predetermined pressure, which in this example is 1 mbar, or after a
  • valves 28, 30 are opened to allow gas along foreline 24 and thus gas is conveyed from the chamber (12) to the pump (10) along both the 100 mm foreline 22 and the 320 mm foreline 24. Accordingly, in the second foreline arrangement during a higher vacuum, i.e. lower pressure, stage of chamber evacuation, gas is still evacuated relatively quickly from the chamber through the high total conductance forelines 22, 24. Therefore, the target pressure of 0.01 mbar is reached after only 42 seconds. Given that in some
  • vacuum pumping system 10 allows a
  • valves 28, 30 are closed to isolate the foreline 24 from the rest of the system. Accordingly, foreline 24 remains at a higher vacuum. It is preferable that the 320 mm foreline (24) has already been evacuated to a desired low pressure at the start of the chamber pumpdown. If the 320 mm foreline isn't already evacuated, the initial pumpdown will be slightly slower than a standard pumpdown, but subsequent pumpdowns will be faster.
  • a control unit 32 is connected by control lines (shown in broken lines) to the main isolation valve 26, the upstream secondary valve 28 and the downstream secondary valve 30.
  • the control unit 32 may be a suitable programmed computer or bespoke processing unit.
  • the control unit is configured to control the valves in order to select the first foreline arrangement or the second foreline arrangement according to a pressure in the vacuum chamber or elapsed time. If the chamber pressure has a pressure gauge capable of outputting a pressure signal to the control unit then such a pressure gauge may be used and does not form part of the vacuum pumping system 10.
  • the vacuum pumping system 10 may comprises a pressure gauge or sensor 34 for sensing a pressure and outputting a pressure signal to the control unit 32.
  • the pressure can be measured for example in foreline 22.
  • a clock circuit may be provided for outputting a signal to the processing unit after a predetermined elapsed time so that the processing unit can switch between the first foreline arrangement and the second foreline arrangement.
  • the elapsed time may be between 20 and 30 seconds or 24 seconds as shown in Figure 2.
  • the predetermined pressure at which the system changes from the first to the second foreline arrangement is 1 mbar although may be in the range of 0.1 mbar to 10 mbar.
  • the system switches at a point where the gradient of the first low conductance foreline arrangement begins to shallow and chamber evacuation slows.
  • a second vacuum pumping system 40 is shown in Figure 3 and is adapted for evacuating a vacuum chamber to a pressure in the region of 10 "3 to 10 "7 mbar.
  • the second vacuum system comprises a vacuum pump 14, such as a turbomolecular pump, connected for conveying fluid from the vacuum chamber through at least one of the foreline arrangements to a vacuum pump 16 as described with reference to Figure 1 above.
  • vacuum pump 16 serves as a backing pump for the turbomolecular pump 14.
  • vacuum pump 16 is initially operated to lower the pressure in the chamber and the turbomolecular pump to a pressure at which the turbomolecular pump can be operated safely.
  • a suitable safe pressure may be in the region of 1 mbar to 10 "3 mbar.
  • vacuum pump 16 is connected to vacuum pump 14 with forelines similar to those described with reference to Figure 1 and for brevity the full description of the Figures 1 and 2 arrangement with respect to the forelines will not repeated.
  • the vacuum pump 14 is connected to the vacuum chamber through a main valve 18 which can be closed to isolate the vacuum pump 14 from the chamber and opened to allow gas to flow to the vacuum pump 14.
  • a line 42 connects the exhaust of vacuum pump 14 to the foreline 24.
  • a plurality of forelines 20 connects the vacuum pump 16 to chamber 12 for conveying gas evacuated from the chamber 12 to the vacuum pump 16.
  • a first foreline arrangement comprises one or more of the forelines and has a first total cross-sectional area.
  • the first foreline arrangement can be connected for conveying gas to the vacuum pump 16 during a low vacuum stage of chamber evacuation (e.g. to a pressure of 1 mbar). That is, chamber 12 is initially evacuated through foreline 22.
  • a second foreline arrangement comprises one or more forelines and has a second total cross-sectional area which is larger than the first cross-sectional area.
  • the second foreline arrangement can be connected for conveying gas to the vacuum pump 16 during a higher vacuum stage of chamber evacuation (e.g.
  • chamber 12 is evacuated through both forelines 22, 24 during a second stage of evacuation.
  • vacuum line 42 need be connected only to foreline 24 since the vacuum pumping system switches to the second foreline arrangement at a pressure above the safe operating pressure of pump 14. If the safe operating pressure of the vacuum pump 14 were above the switch pressure (e.g. above 1 mbar) the vacuum line could be connected to both forelines 22, 24.

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Applications Or Details Of Rotary Compressors (AREA)

Abstract

L'invention concerne un système de pompage à vide (10) pour vider une chambre à vide (12). Le système comprend : une pompe à vide (16); et une pluralité de conduites de refoulement primaire (22, 24) pour transporter un gaz vers la pompe à vide dans un premier étage de faible dépression (22) d'évacuation de chambre, un premier agencement de conduite de refoulement primaire pouvant être connecté pour transporter un gaz vers la pompe à vide, et dans un second étage à dépression élevée de l'évacuation de la chambre, un second agencement de conduite de refoulement primaire (22, 24) qui comprend une ou plusieurs conduites de refoulement primaire pouvant être connecté pour transporter un gaz vers la pompe à vide. Le second agencement de conduite de refoulement primaire présente une zone transversale totale pour transporter un fluide qui est plus grande que la zone transversale totale du premier agencement de conduite de refoulement primaire.
EP11712316.6A 2010-05-11 2011-03-30 Système de pompage à vide Not-in-force EP2569541B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB1007814.5A GB201007814D0 (en) 2010-05-11 2010-05-11 Vacuum pumping system
PCT/GB2011/050651 WO2011141725A2 (fr) 2010-05-11 2011-03-30 Système de pompage à vide

Publications (2)

Publication Number Publication Date
EP2569541A2 true EP2569541A2 (fr) 2013-03-20
EP2569541B1 EP2569541B1 (fr) 2014-11-19

Family

ID=42315109

Family Applications (1)

Application Number Title Priority Date Filing Date
EP11712316.6A Not-in-force EP2569541B1 (fr) 2010-05-11 2011-03-30 Système de pompage à vide

Country Status (8)

Country Link
US (1) US20130071274A1 (fr)
EP (1) EP2569541B1 (fr)
JP (1) JP5822213B2 (fr)
KR (1) KR101825237B1 (fr)
CN (1) CN103228922B (fr)
GB (1) GB201007814D0 (fr)
RU (1) RU2562899C2 (fr)
WO (1) WO2011141725A2 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9366560B2 (en) 2013-08-01 2016-06-14 John Cacciola Detector for detecting a change in a fluid level and generating a digital signal

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RU2666379C2 (ru) * 2014-05-01 2018-09-07 Ателье Буш Са Способ откачки в насосной системе и система вакуумных насосов
CA2961977A1 (fr) * 2014-09-26 2016-03-31 Ateliers Busch Sa Systeme de pompage pour generer un vide et procede de pompage au moyen de ce systeme de pompage
DE202015004596U1 (de) * 2015-06-26 2015-09-21 Oerlikon Leybold Vacuum Gmbh Vakuumpumpensystem
JP2020090940A (ja) * 2018-12-07 2020-06-11 株式会社テクノス ドライ真空ポンプが真空チャンバーから放出される粉体により停止又は故障することを回避又は防止する方法及び加振装置
TWI684707B (zh) * 2019-02-27 2020-02-11 亞台富士精機股份有限公司 尾氣真空節能幫浦系統

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JPH01161836A (ja) * 1987-12-18 1989-06-26 Nec Corp 真空処理装置
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Cited By (1)

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Publication number Priority date Publication date Assignee Title
US9366560B2 (en) 2013-08-01 2016-06-14 John Cacciola Detector for detecting a change in a fluid level and generating a digital signal

Also Published As

Publication number Publication date
JP5822213B2 (ja) 2015-11-24
GB201007814D0 (en) 2010-06-23
US20130071274A1 (en) 2013-03-21
RU2562899C2 (ru) 2015-09-10
WO2011141725A3 (fr) 2013-07-11
RU2012153250A (ru) 2014-06-20
CN103228922A (zh) 2013-07-31
KR101825237B1 (ko) 2018-02-02
CN103228922B (zh) 2016-10-26
EP2569541B1 (fr) 2014-11-19
KR20130092967A (ko) 2013-08-21
JP2013534987A (ja) 2013-09-09
WO2011141725A2 (fr) 2011-11-17

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