EP2424818A1 - Verfahren zur herstellung eines kohlenstoff, silicium und bor enthaltenden pulvers - Google Patents
Verfahren zur herstellung eines kohlenstoff, silicium und bor enthaltenden pulversInfo
- Publication number
- EP2424818A1 EP2424818A1 EP10719750A EP10719750A EP2424818A1 EP 2424818 A1 EP2424818 A1 EP 2424818A1 EP 10719750 A EP10719750 A EP 10719750A EP 10719750 A EP10719750 A EP 10719750A EP 2424818 A1 EP2424818 A1 EP 2424818A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- boron
- precursor
- silicon
- carbon
- powder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 229910052796 boron Inorganic materials 0.000 title claims abstract description 76
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 title claims abstract description 75
- 239000000843 powder Substances 0.000 title claims abstract description 67
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 35
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 35
- 239000010703 silicon Substances 0.000 title claims abstract description 35
- 229910052799 carbon Inorganic materials 0.000 title claims abstract description 33
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 32
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 6
- 239000002243 precursor Substances 0.000 claims abstract description 91
- 239000000203 mixture Substances 0.000 claims abstract description 21
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 claims abstract description 18
- 229910052580 B4C Inorganic materials 0.000 claims abstract description 16
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910010271 silicon carbide Inorganic materials 0.000 claims abstract description 14
- 238000001725 laser pyrolysis Methods 0.000 claims abstract description 12
- 238000009833 condensation Methods 0.000 claims abstract description 11
- 230000005494 condensation Effects 0.000 claims abstract description 11
- 125000005843 halogen group Chemical group 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 45
- 230000008569 process Effects 0.000 claims description 21
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims description 10
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical group O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 8
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical group ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 claims description 8
- -1 silane compound Chemical class 0.000 claims description 6
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 4
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims description 4
- 239000012686 silicon precursor Substances 0.000 claims description 4
- 150000001345 alkine derivatives Chemical class 0.000 claims description 3
- 150000001335 aliphatic alkanes Chemical group 0.000 claims description 2
- 150000001336 alkenes Chemical class 0.000 claims description 2
- 239000001569 carbon dioxide Substances 0.000 claims description 2
- 229910000077 silane Inorganic materials 0.000 claims description 2
- 239000007833 carbon precursor Substances 0.000 claims 3
- 238000002347 injection Methods 0.000 description 20
- 239000007924 injection Substances 0.000 description 20
- 238000002156 mixing Methods 0.000 description 10
- 238000000197 pyrolysis Methods 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 8
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000004438 BET method Methods 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000133 mechanosynthesis reaction Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- CZMRCDWAGMRECN-UGDNZRGBSA-N Sucrose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 CZMRCDWAGMRECN-UGDNZRGBSA-N 0.000 description 1
- 229930006000 Sucrose Natural products 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052729 chemical element Inorganic materials 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000000295 emission spectrum Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000386 microscopy Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 238000001812 pycnometry Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000005720 sucrose Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000004627 transmission electron microscopy Methods 0.000 description 1
- LGQXXHMEBUOXRP-UHFFFAOYSA-N tributyl borate Chemical compound CCCCOB(OCCCC)OCCCC LGQXXHMEBUOXRP-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
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- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/90—Carbides
- C01B32/914—Carbides of single elements
- C01B32/956—Silicon carbide
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
- C04B35/62605—Treating the starting powders individually or as mixtures
- C04B35/62645—Thermal treatment of powders or mixtures thereof other than sintering
- C04B35/6267—Pyrolysis, carbonisation or auto-combustion reactions
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
- B01J19/121—Coherent waves, e.g. laser beams
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J6/00—Heat treatments such as Calcining; Fusing ; Pyrolysis
- B01J6/008—Pyrolysis reactions
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/90—Carbides
- C01B32/914—Carbides of single elements
- C01B32/956—Silicon carbide
- C01B32/963—Preparation from compounds containing silicon
-
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- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/90—Carbides
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- C01B32/991—Boron carbide
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/56—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides
- C04B35/563—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides based on boron carbide
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/56—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides
- C04B35/565—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides based on silicon carbide
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- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
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- C01P2004/80—Particles consisting of a mixture of two or more inorganic phases
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/38—Non-oxide ceramic constituents or additives
- C04B2235/3817—Carbides
- C04B2235/3821—Boron carbides
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- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/38—Non-oxide ceramic constituents or additives
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/38—Non-oxide ceramic constituents or additives
- C04B2235/3817—Carbides
- C04B2235/3826—Silicon carbides
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/42—Non metallic elements added as constituents or additives, e.g. sulfur, phosphor, selenium or tellurium
- C04B2235/421—Boron
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/50—Constituents or additives of the starting mixture chosen for their shape or used because of their shape or their physical appearance
- C04B2235/54—Particle size related information
- C04B2235/5409—Particle size related information expressed by specific surface values
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/50—Constituents or additives of the starting mixture chosen for their shape or used because of their shape or their physical appearance
- C04B2235/54—Particle size related information
- C04B2235/5418—Particle size related information expressed by the size of the particles or aggregates thereof
- C04B2235/5454—Particle size related information expressed by the size of the particles or aggregates thereof nanometer sized, i.e. below 100 nm
Definitions
- the present invention relates to a process for producing a powder comprising carbon, silicon and boron, the silicon being in the form of silicon carbide and the boron being in the form of boron carbide and / or boron alone.
- Such powders especially because they comprise boron, such as powders comprising less than 5% by weight of boron, are powders which lend themselves easily to sintering and thus to the design of consolidated parts from said powders. .
- the powders obtained by the process of the invention can find their application in the design of parts obtained by sintering.
- the powders obtained by the process of the invention can also be used for the design of self-healing matrices, especially when they comprise boron at a content greater than 5% by weight of boron.
- the self-healing phase of said matrices must have a contact surface with the highest possible oxygen. Due to the surface / volume ratio, the reactivity towards oxygen is increased and boron carbide oxidizes as B2O3 at lower temperatures and kinetically faster.
- the technique of mechanosynthesis consists of a mechanical grinding, in a device of the grinder or attritor type, of submicron-sized silicon carbide (SiC) and boron carbide (B 4 C) powders for a sufficient time.
- powders comprising carbon, silicon and boron have been synthesized by sol-gel using silicon-based precursors, carbon-based precursors and boron-based precursors.
- sol-gel using silicon-based precursors, carbon-based precursors and boron-based precursors.
- the powders comprising carbon, silicon and boron can be prepared from gaseous precursors using different heat sources such as a laser (in which case we will speak of laser pyrolysis) or a plasma.
- Vassen et al. (Journal of Materials Science 31 (1996) 3623-3637) have synthesized, by laser pyrolysis, powders comprising both carbon, silicon and boron, from a mixture of precursors: SiH 4 -C 2 H 4 -B 2 H6 with a boron content not exceeding 4% by mass.
- This method of synthesis has, among others, the disadvantage of using diborane B 2 H 6 , which is an unstable gas with a high cost, and therefore difficult to use for the production of powders having higher levels of boron than the above-mentioned content.
- Guo et al. (Journal of Materials Science,
- the powders obtained by this process have a submicron size.
- a boron content which may be high (for example up to 30% by weight relative to the total mass of the other elements present in the powder);
- the invention relates to a process for producing a powder comprising carbon, silicon and boron, the silicon being in the form of silicon carbide and the boron being in the form of boron carbide and or boron alone comprising the following steps:
- a step of subjecting the resulting mixture to laser pyrolysis the boron precursor BX 3 being heated, prior to the contacting step and / or simultaneously with the contacting step, at a temperature above its condensation temperature.
- the invention comprises a step of heating the boron precursor BX 3 , X being a halogen atom, at a temperature above its condensation temperature before the contacting step. and / or during said contacting step, for example, at a temperature ranging from 40 to 60 ° C.
- a condensation of the precursor is prevented, before being subjected to pyrolysis, and thus to have a quantity of precursor that can not be incorporated in the powder due to this condensation. Thanks to this step, all the boron resulting from the precursor used in the context of this process will enter into the constitution of the powders.
- This heating step in that it excludes the condensation of the boron precursor, also prevents the apparatus, in which the process is implemented, from being damaged, for example by clogging of the injection nozzles by the product resulting from the condensation of the boron precursor.
- the heating step can take place before the contacting step, for example, before contacting the boron precursor with the other precursors (ie, the silicon-based precursor and the precursor-based of carbon), this heating step can be carried out in an enclosure comprising the boron precursor (this chamber may be a bottle having, for example, an outlet pressure of at least 0.4 bar) and / or in the injection pipe of said precursor for conveying said precursor into the chamber where it will be brought into contact with the other precursors.
- this chamber may be a bottle having, for example, an outlet pressure of at least 0.4 bar
- the heating step may make it possible, in addition to avoiding the condensation of BX 3 , to increase the flow rate of BX 3 , and in particular to have access to a flow rate sufficient to obtain large quantities of powder (for example, a rate of at least 100 g / h).
- the heating step can also take place during the contacting step in which case the heating step will concern all the precursors contacted during this step. It is not excluded within the meaning of the invention that the heating step can take place at a time before the contacting step and during the contacting step, so that there is no condensation of the boron precursor before the pyrolysis step.
- the boron precursor may be BCI3 boron trichloride.
- the boron precursor is boron trichloride BCI3
- the latter may be heated prior to the contacting step and / or simultaneously with the contacting step at a temperature ranging from 40 ° C. to 50 ° C. 0 C.
- the method of the invention comprises a step of contacting, prior to laser pyrolysis, a boron precursor BX 3 , X being a halogen atom, a precursor based on carbon and a precursor based on silicon.
- the boron precursor is boron trichloride.
- the carbon-based precursor may be a compound selected from alkanes, such as methane, alkenes, such as ethylene and alkynes, such as acetylene.
- the carbon-based precursor may be a gaseous alkyne, such as acetylene C2H2, which has the particularity of being very reactive during the pyrolysis step, because it decomposes more rapidly than the methane CH 4 and ethylene C2H4 and at lower temperature.
- acetylene C2H2 gaseous alkyne
- the silicon-based precursor is preferably a silane compound, such as SiH 4 .
- the boron-based precursor is BCI3
- the carbon-based precursor is C2H2 acetylene
- the silicon-based precursor is SiH 4 , this precursor mixture being advantageous from a cost point of view and having also thermokinetic properties particularly suited to the process of the invention, in particular to obtain homogeneous powders in terms of size and composition.
- the carbon-based precursor, the silicon precursor and the boron precursor are conventionally contacted in a mixing chamber, which can be heated to a temperature above the condensation temperature of the precursor based on silicon. boron.
- the introduction of the carbon-based precursor, the silicon-based precursor and the boron-based precursor is advantageously carried out separately in the enclosure, so that there is no contact precursors before contacting in the enclosure. This also makes it possible to avoid chemical reactions between the precursors before they are introduced into the mixing chamber.
- the mixing chamber can be provided with three separate injection ports.
- the injection of the precursors into the chamber takes place vertically, which means, in other words, that the precursors are injected into a vertical enclosure in the upper part thereof and are concentrated by the effect of gravity in the lower part of the enclosure after introduction.
- the precursors are introduced at predetermined flow rates according to the desired powder characteristics (in terms in particular of boron content, carbon content and silicon content).
- the resulting mixture is then subjected to a laser pyrolysis step.
- Laser pyrolysis is based on the interaction between gaseous precursors (in this case, the carbon-based precursor, the boron precursor, and the silicon-based precursor) and a laser , generally a CO2 laser, which interaction results in a resonance between the emission spectrum of the laser and the absorption spectrum of the precursors.
- Absorption is the excitation of the vibrational levels of the precursor molecules, which absorb the energy of the laser radiation.
- the energy of the excited precursor molecules propagates from molecules to molecules, causing the dissociation thereof to form a supersaturated vapor, in which the nucleation and growth of the constituent particles of the powder occur.
- a so-called "incandescent" flame can then be observed.
- the particles formed undergo a quenching effect at the flame outlet, which has the effect of stopping the growth of the particles.
- the mixture obtained during the aforementioned mixing step is conventionally injected via an injection nozzle into a laser pyrolysis chamber, where a laser beam is emitted.
- the pressure in the pyrolysis chamber can range from 100 mbar to 900 mbar.
- the laser used may be a gas laser, in particular a carbon dioxide laser capable of emitting in the infrared (their main wavelength band being centered between 9.4 and 10.6 ⁇ m).
- the power of such a laser can be up to 20000 W, for example ranging from 200 to 700 W.
- Each fraction of the mixture i.e., the mixing fraction passing through the laser beam
- a short residence time for example from 1 to 10 ms and at a temperature ranging from 1000 ° C. to more than 2500 ° C. .
- nanoscale powders comprising carbon, silicon and boron, the silicon being in the form of silicon carbide, the boron being in the form of boron carbide and / or free boron, the carbon in addition to its presence in the form of carbide (s) may also be in the form of free carbon.
- the powders obtained have a narrow size distribution and may have a boron content ranging from 1 to 30% by weight relative to the total mass of the other elements present in the powder.
- the powder obtained advantageously consists of nanometric grains, themselves advantageously constituted by B 4 C boron carbide and silicon carbide SiC phases.
- the powders obtained by this process can then be collected in a collection device.
- These powders can be used to produce parts by sintering having advantageous mechanical characteristics due to the fact that nanometric nature of the powders or to make self-healing matrices.
- the method of the invention can be implemented in a device comprising respectively: an injection chamber, in which the precursors are injected, which chamber can consist of a heated mixing chamber, a rod of injection connected to the upper part of the chamber, two injection rods connected to the lateral part of the chamber, which allow the separate injection of the various precursors, an injection nozzle for injection into a pyrolysis chamber;
- a pyrolysis chamber in which a laser beam is emitted which will interact with the precursor mixture to form the aforementioned powder.
- FIG. 1 relates to a schematic representation of a reactor capable of enabling the implementation of the method of the invention.
- FIG. 2 is an X-ray diffractogram (the abscissa representing the angle 2 ⁇ and the ordinate the intensity I (in arbitrary units ua)) of the powder obtained according to the example given below.
- the present example illustrates the preparation of a powder comprising both a silicon carbide phase and a boron carbide phase by laser pyrolysis implemented in a reactor 1 shown in FIG. 1 comprising the following elements:
- an injection chamber into which the precursors are injected and then mixed before being subjected to laser pyrolysis, which chamber consists of a heated mixing chamber 5, an injection rod 7 connected to the part upper chamber, two injection rods 9, 11 connected to the side portion of the chamber, an injection nozzle 13 for injecting the mixture in a pyrolysis chamber; a containment chimney 15 disposed around the injection nozzle;
- a pyrolysis chamber 17 in which a laser beam 19 is emitted from a laser emission device 21 which will interact with the precursor mixture to form the aforementioned powder.
- the confinement chimney makes it possible on the one hand to keep the powders produced in a laminar flow and, on the other hand, it prevents any contact with the metal walls of the reaction chamber and thus to avoid any pollution.
- the operating protocol is as follows.
- a silicon-based precursor SiH 4
- a precursor based on carbon acetylene C2H2;
- boron precursor BCI3 at the following flow rates: 3.6, 1.8 and 0.14 L / min, the flow rates being controlled by mass flow controllers, which precursors are mixed in said heated enclosure at a temperature of 45 ° C.
- BCI3 boron trichloride is injected into the chamber by the injection rod 7, while the acetylene and SiH 4 are injected into the chamber by the injection rods 9 and 11.
- BCI3 boron precursor is preheated before being injected into the reactor at 45 ° C both before and during its passage in the injection rod.
- BCI3 boron precursor is derived from a bottle containing it, this bottle having an outlet pressure of at least 0.4 bar, this bottle being heated to 45 ° C and stirred to accelerate the diffusion of heat inside and thus BCI3 boron precursor transfer.
- the mixture of precursors obtained in the mixing chamber is then injected through the injection nozzle into the pyrolysis chamber at a flow rate of 7.2 L.min -1 where it is subjected to an infrared laser beam (IR), more precisely a CO2 laser used at a working power of 5000 W for a residence time of 2.8 ms.
- IR infrared laser beam
- the rate of production of powder at the outlet of the pyrolysis chamber is of the order of 391 g / h.
- the powder obtained was analyzed by the following techniques: X-ray diffraction, the diffractogram of which is represented in FIG. 2;
- a crystalline boron carbide phase and an amorphous boron carbide phase the presence of which is indicated by two distinct arrows, the amorphous boron carbide phase being a minority.
- the powder obtained was also the subject of elementary chemical analysis, so as to determine the percentage by mass of each of the chemical elements present in it.
- Silicon 36% by weight; Carbon: 28% by weight; Oxygen: 8% by mass measurement errors can be of the order of 2 to 3% by mass depending on the elements.
- the average size of the constituent grains of the powder ie the average diameter of the latter has also been measured by two methods:
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Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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FR0952842A FR2945035B1 (fr) | 2009-04-29 | 2009-04-29 | Procede d'elaboration d'une poudre comprenant du carbone, du silicium et du bore, le silicium se presentant sous forme de carbure de silicium et le bore se presentant sous forme de carbure de bore et/ou de bore seul |
PCT/EP2010/055829 WO2010125149A1 (fr) | 2009-04-29 | 2010-04-29 | Procede d'elaboration d'une poudre comprenant du carbone, du silicium et du bore |
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EP2424818A1 true EP2424818A1 (de) | 2012-03-07 |
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EP10719750A Ceased EP2424818A1 (de) | 2009-04-29 | 2010-04-29 | Verfahren zur herstellung eines kohlenstoff, silicium und bor enthaltenden pulvers |
Country Status (7)
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US (1) | US9139478B2 (de) |
EP (1) | EP2424818A1 (de) |
JP (1) | JP5645925B2 (de) |
KR (1) | KR101841558B1 (de) |
CN (1) | CN102414126B (de) |
FR (1) | FR2945035B1 (de) |
WO (1) | WO2010125149A1 (de) |
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RU2460689C1 (ru) * | 2011-06-21 | 2012-09-10 | Закрытое акционерное общество "Институт прикладной нанотехнологии" | Способ получения бор-кремнийсодержащих наночастиц |
FR3000210B1 (fr) * | 2012-12-21 | 2015-03-13 | Commissariat Energie Atomique | Procede pour le controle de la production de nanopoudre de diametre donne a partir d'au moins d'acetylene contenu dans une bouteille pressurisee |
US20160036045A1 (en) * | 2014-07-30 | 2016-02-04 | StoreDot Ltd. | Anodes for lithium-ion devices |
CN105568263B (zh) * | 2016-03-11 | 2018-06-08 | 中国人民解放军装甲兵工程学院 | 一种利用CO2激光裂解聚硅氧烷材料制备SiOC陶瓷涂层的方法 |
DE102017116141A1 (de) * | 2017-07-18 | 2019-01-24 | Arianegroup Gmbh | Faserverbundwerkstoff und Verfahren zu dessen Herstellung |
EP4081150A4 (de) * | 2019-12-24 | 2024-01-31 | Battelle Energy Alliance, LLC | Laserablationsverfahren und -systeme zur herstellung von für laserbasierte generative fertigung geeigneten ausgangspulver |
JP7518593B2 (ja) * | 2020-01-29 | 2024-07-18 | 太平洋セメント株式会社 | 炭化ケイ素粉末の製造方法 |
CN111944331A (zh) * | 2020-08-04 | 2020-11-17 | 上海核工程研究设计院有限公司 | 一种抗沉降碳化硼粉体的表面改性处理方法 |
CN112897528B (zh) * | 2021-03-24 | 2022-11-22 | 云南华谱量子材料有限公司 | 一种激光烧结合成碳化硼/碳粉体材料的方法 |
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GB1194415A (en) * | 1967-07-03 | 1970-06-10 | United States Borax Chem | High Temperature Chemical Reaction and Apparatus therefor |
US4162301A (en) * | 1968-06-18 | 1979-07-24 | Union Carbide Corporation | Flexible microcrystalline zirconium carbide fabric |
US4295890A (en) * | 1975-12-03 | 1981-10-20 | Ppg Industries, Inc. | Submicron beta silicon carbide powder and sintered articles of high density prepared therefrom |
JPS59206042A (ja) * | 1983-05-07 | 1984-11-21 | Sumitomo Electric Ind Ltd | 微粉末の製造方法及び製造装置 |
US4895628A (en) * | 1985-02-12 | 1990-01-23 | The Dow Chemical Company | Process for the preparation of submicron-sized boron carbide powders |
JPS62501838A (ja) * | 1985-02-12 | 1987-07-23 | ザ・ダウ・ケミカル・カンパニ− | 1ミクロンより小さい炭化ホウ素粉末を製造する方法 |
EP0434667B1 (de) * | 1985-04-04 | 1996-07-03 | Nippon Steel Corporation | Verfahren zum Erzeugen von Siliciumkarbid-Teilchen und von einem Siliciumkarbid-Sinterkörper |
US4689129A (en) * | 1985-07-16 | 1987-08-25 | The Dow Chemical Company | Process for the preparation of submicron-sized titanium diboride |
JPS63230514A (ja) * | 1987-03-19 | 1988-09-27 | Toshiba Corp | SiC粉体の製造方法 |
WO1988008328A1 (en) * | 1987-04-27 | 1988-11-03 | The Dow Chemical Company | Titanium diboride/boron carbide composites with high hardness and toughness |
US4957884A (en) * | 1987-04-27 | 1990-09-18 | The Dow Chemical Company | Titanium diboride/boron carbide composites with high hardness and toughness |
US8568684B2 (en) * | 2000-10-17 | 2013-10-29 | Nanogram Corporation | Methods for synthesizing submicron doped silicon particles |
US6692660B2 (en) * | 2001-04-26 | 2004-02-17 | Nanogram Corporation | High luminescence phosphor particles and related particle compositions |
US8128861B1 (en) * | 2000-07-21 | 2012-03-06 | M Cubed Technologies, Inc. | Composite materials and methods for making same |
US20050026769A1 (en) * | 2003-08-01 | 2005-02-03 | Jongsang Lee | Process for SiBCN based preceramic polymers and products derivable therefrom |
FR2865671B1 (fr) * | 2004-01-30 | 2007-03-16 | Commissariat Energie Atomique | Nanopoudre ceramique apte au frittage et son procede de synthese |
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- 2009-04-29 FR FR0952842A patent/FR2945035B1/fr not_active Expired - Fee Related
-
2010
- 2010-04-29 US US13/318,067 patent/US9139478B2/en not_active Expired - Fee Related
- 2010-04-29 EP EP10719750A patent/EP2424818A1/de not_active Ceased
- 2010-04-29 CN CN201080018819.0A patent/CN102414126B/zh not_active Expired - Fee Related
- 2010-04-29 JP JP2012507768A patent/JP5645925B2/ja not_active Expired - Fee Related
- 2010-04-29 KR KR1020117024370A patent/KR101841558B1/ko active IP Right Grant
- 2010-04-29 WO PCT/EP2010/055829 patent/WO2010125149A1/fr active Application Filing
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Also Published As
Publication number | Publication date |
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FR2945035B1 (fr) | 2011-07-01 |
CN102414126A (zh) | 2012-04-11 |
KR20120024545A (ko) | 2012-03-14 |
JP2012525313A (ja) | 2012-10-22 |
US9139478B2 (en) | 2015-09-22 |
US20120152724A1 (en) | 2012-06-21 |
JP5645925B2 (ja) | 2014-12-24 |
CN102414126B (zh) | 2015-05-13 |
FR2945035A1 (fr) | 2010-11-05 |
WO2010125149A1 (fr) | 2010-11-04 |
KR101841558B1 (ko) | 2018-03-23 |
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