EP2359386A1 - Dispositif émetteur à infrarouge pour traitement sous vide à haute température - Google Patents

Dispositif émetteur à infrarouge pour traitement sous vide à haute température

Info

Publication number
EP2359386A1
EP2359386A1 EP09760728A EP09760728A EP2359386A1 EP 2359386 A1 EP2359386 A1 EP 2359386A1 EP 09760728 A EP09760728 A EP 09760728A EP 09760728 A EP09760728 A EP 09760728A EP 2359386 A1 EP2359386 A1 EP 2359386A1
Authority
EP
European Patent Office
Prior art keywords
tube
infrared radiator
radiator
opaque
radiator according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP09760728A
Other languages
German (de)
English (en)
Inventor
Sven Linow
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Heraeus Noblelight GmbH
Original Assignee
Heraeus Noblelight GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Heraeus Noblelight GmbH filed Critical Heraeus Noblelight GmbH
Publication of EP2359386A1 publication Critical patent/EP2359386A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01K—ELECTRIC INCANDESCENT LAMPS
    • H01K1/00—Details
    • H01K1/18—Mountings or supports for the incandescent body
    • H01K1/24—Mounts for lamps with connections at opposite ends, e.g. for tubular lamp
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01K—ELECTRIC INCANDESCENT LAMPS
    • H01K1/00—Details
    • H01K1/58—Cooling arrangements
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/0033—Heating devices using lamps
    • H05B3/0038—Heating devices using lamps for industrial applications
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/40—Heating elements having the shape of rods or tubes
    • H05B3/42—Heating elements having the shape of rods or tubes non-flexible
    • H05B3/44—Heating elements having the shape of rods or tubes non-flexible heating conductor arranged within rods or tubes of insulating material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/40—Heating elements having the shape of rods or tubes
    • H05B3/42—Heating elements having the shape of rods or tubes non-flexible
    • H05B3/48—Heating elements having the shape of rods or tubes non-flexible heating conductor embedded in insulating material

Definitions

  • the invention relates to an arrangement for infrared radiators with at least one radiator tube.
  • infrared radiation elements in vacuum, in vacuum processes with reactive atmospheres, or in corrosive or reactive atmospheres, such as coating processes, chemical vapor deposition, physical vapor deposition, etching in the gas phase, the production of thin-film solar cells in CIS technology, RTP Processes in which a significant amount of heat is to be introduced into a substrate in a very short time and thus a combination of vacuum or an atmosphere of hot corrosive gases with high amounts of heat released and cyclic stress, pose a particular challenge to the components and materials used.
  • IR heating elements which consist of the quartz tube type, in which therefore the outer shell of the radiator consists of a tube made of heat-resistant and almost all atmospheres resistant quartz glass, almost all technical hurdles remain. Among other things, these are the corrosion of the electrical supply lines to the radiators when they are carried out in a corrosive atmosphere or in a vacuum.
  • Flashovers between the electrical leads to each other or to the chamber wall occur in certain pressure ranges when the leads are made in the chamber.
  • radiant heaters in cladding tubes wherein the cladding tubes represent parts of the wall of the process chamber, a heat accumulation problem is quickly generated, which leads to the destruction of the radiator or at least limits the maximum power of the radiator used.
  • maximum power is limited both thermally by the heat accumulation in the cladding tube, as well as geometrically by the forced large distances between the cladding tubes.
  • EP 1 228 668 B1 describes an arrangement in which at least one infrared radiator is arranged in a cladding tube.
  • the cladding tube is sealed against the vacuum chamber and also protects the radiator against the possibly occurring reactive gases in the chamber.
  • the disadvantage is that the radiators can quickly overheat and be destroyed in such a cladding tube, since the cladding tube must already have a considerable temperature in order to be able to release heat to the environment via radiation.
  • the wall temperature of the radiator is considerably higher than that of a radiator that is directly in vacuum or that of a radiator, which is cooled by convection.
  • water is used as coolant, then the problem of the temperature gradient in the cladding tube can be avoided.
  • the use of water can only be done in a separate pipe, since the electrical leads should not be carried out lying in the water.
  • water which is usually arranged in the gap between the radiator and the cladding tube or at a comparable position, absorbs a minimum of about 50% of the total radiator output.
  • water can only be used in cases where the wall temperature of the cladding tube may be low and where the additional heating of the cladding tube is not required for the process.
  • flanges directly on the radiator tube are therefore extremely expensive.
  • Such flanges must also be movably mounted in the direction of the radiator axis against the chamber wall in order not to convert small thermal expansions into a destructive for the radiator tube tension: Since the thermal expansion of the quartz glass is about an order of magnitude lower than that of the metallic chamber wall, already small Variations in the temperature of the chamber wall lead to destructive tensile stress on quartz glass.
  • the object of the invention is therefore to provide an arrangement of infrared radiators in process chambers or vacuum chambers, in which the above-mentioned disadvantages are avoided and a structurally simple solution is provided which also enables a long service life of the radiator.
  • the infrared radiator according to the invention comprises at least one radiator tube which has bruises at its respective ends, wherein at least one opaque tube section is welded in alignment with the at least one radiator tube and is located between pinch and radiator tube.
  • Such an infrared radiator allows it to be installed directly in a chamber for vacuum processes with reactive atmospheres or in vacuum without an additional cladding tube.
  • the infrared radiator according to the invention has opaque tube sections in front of the bruises, which at the same time serve as a vacuum feedthrough against which is sealed.
  • the opaque tube sections reduce the radiant power in the tube towards the ends (squeezing) so that the seals can not overheat.
  • a radiator guided only on one side into the vacuum chamber twin tube, one-sided Final
  • only one side of such an opaque pipe section are used, while in radiators with double-sided electrical connection and vacuum on both sides are required.
  • the invention provides that the opaque pipe sections are round outside.
  • the opaque pipe sections have at least one bore inside.
  • the invention provides that a disk is arranged between the opaque pipe sections and the radiator pipe.
  • the disk contains quartz glass.
  • the diameter of the two sealing surfaces can additionally be designed differently. During assembly, the first sealing surface still slides easily through the provided for the second seal flange, as it has a slightly smaller diameter.
  • FIG. 1 shows a round tube radiator according to the invention
  • Figure 2 shows the seal of a round tube emitter according to the invention
  • FIGa, 3b, 3c, 3d different variants of the round tube emitter according to the invention.
  • the round tube emitter for the use of a vacuum chamber consisting of a central radiator tube 10, which is made of transparent quartz glass.
  • the round tube emitter has a diameter of 1, 5 x 14 mm and is about 2 to 5 cm shorter in length than the free width of the vacuum chamber in which it is installed.
  • the central radiator tube 10 is in each case an opaque tube section 12, which are recognized, for example by means of a glass lathe frontally aligned can.
  • the dimensions of the opaque pipe section 12 are in this case 3 x 16 mm.
  • the length of the sections results from the section to be bridged in the chamber of 10 mm to 25 mm and the thickness of the chamber wall including the seal of typically about 50 mm for a simple chamber wall without thermal shields or insulation. So that a typical length of 60 mm to 100 mm occurs.
  • the round tube emitter comprises two transparent pipe sections 14, which are also attached by means of a glass lathe axially aligned outside the opaque pipe sections 12.
  • the transparent pipe sections 14 have a diameter of 1, 5 x 14 mm, with their length resulting from manufacturing parameters. In these pipe sections 14, the pinch is introduced and depending on the squeezing additional dimensions to be separated after squeezing outside the pinch (not shown here) are needed.
  • the round tube emitter thus constructed also has a helix 16 within the emitter tube.
  • the coil 16 is contacted with long rods 18 to a molybdenum foil 20, which later squeezed used to carry out the electric current.
  • On the rods 18 additional support rings 22 are applied, which support the rod 18 in the tubes 10 and 14.
  • a stranded wire 26 can be posted for the power supply to the outside rods 24 after crushing.
  • Such a manufactured emitter 1 can then be mounted parallel to other emitters 1, for example in a vacuum chamber.
  • the assembly takes place in such a way that the radiators 1 are transversely mounted to the direction in which the substrate is transported.
  • the radiators are either sealed on both sides with O-rings or on one side by means of an O-ring and on the other side with a sliding stuffing box.
  • On both sides is located in the press ring, a bead which prevents the radiator from slipping out of its sealing position and thus fixes it in the vacuum chamber.
  • a radiator distance of 40 mm or even up to 30 mm can thus be achieved in a vacuum chamber. As a result, a larger number of radiators can be easily mounted within the vacuum chamber.
  • Figure 2 shows schematically the attachment of such emitters with the seal.
  • Another embodiment provides that on a twin pipe with a diameter of 33 x 14 mm and a length resulting from the transverse dimension of the vacuum chamber, on one side an opaque pipe section 12 with a diameter of 5 x 40 mm, aligned by means of a glass lathe becomes.
  • the transition from the opaque pipe section 12 the twin pipe can either be freely formed or, in an advantageous embodiment, a flat quartz glass disk can be placed beforehand on the twin pipe, which serves for the transition from the twin pipe to the opaque round pipe and is correspondingly shaped.
  • another piece of twin tube 10 with a diameter of 33 ⁇ 14 mm is attached to the other end of the opaque tube section 12. From such a radiator tube, a radiator is manufactured with one-sided connection.
  • Such a manufactured spotlight can be mounted in a vacuum chamber, wherein the seal on the opaque pipe section 12 by means of an O-ring and the radiator 1 is mechanically fixed on the opposite side of the chamber, for example by means of a simple fork clamp.
  • the distance between the radiator axes is a minimum of approx. 60 mm if all seals are located on one side of the chamber.
  • the radiators are introduced alternately on both sides in the chamber, whereby the distance between the axes of the radiator 1 can be reduced to about 35 mm.
  • 3a to 3d show various embodiments of the special sealing surfaces, wherein only one tube side is shown. To simplify the figure was on spirals, rods, molybdenum foils, etc., omitted.
  • FIG. 3a shows a round tube radiator 1, as already illustrated in FIG. 1 and explained in greater detail.
  • An emitter tube 40 has both sides in the finished state squashes 41 and ceramic base 42 and strands 43.
  • opaque pipe sections 45 have been welded by means of a glass lathe parallel to the pipes as future sealing surfaces.
  • the cross section of the opaque tube section 44 is shown on the radiator tube 40.
  • FIG. 3b shows a twin tube radiator, as already explained above.
  • opaque tube sections are welded by means of a glass lathe parallel to the tubes 54 as future sealing surfaces.
  • either a laser-cut disk of quartz glass is used as transition piece either for the transition from twin pipe 32 to the opaque pipe section 54 on both sides or the opaque pipe 54 is formed by a strong flame directly on the twin pipe 32 out.
  • the cross section of the opaque pipe section 54 is shown mounted on the twin tube 32.
  • FIG. 3c shows a twin tube radiator with a matched, opaque tube section.
  • the emitter tube 50 has crimps 51 on both sides, ceramic sockets 52 and also strands 53.
  • opaque tube sections are welded parallel to the tubes 54 by means of a glass lathe as future sealing surfaces. These pipe sections are round on the outside for optimum sealing of the vacuum chamber and inside they have two holes, which are similar to the dimensions of the two channels of the twin pipe. Such an opaque tube piece can be easily cast and sintered, so that only the outer surfaces must be ground. Thus, the opaque pipe section can be attached directly to the twin pipe 55 without complex glass-blowing deformation or without washers. The cross section of the opaque tube section 12 is shown on the twin tube 55.
  • FIG. 3d shows a twin tube radiator with a twin tube 60 and an externally placed opaque tube section.
  • the emitter tube 60 has crushed portions 61, ceramic bases 62 and strands 63 on both sides in the finished state.
  • opaque tube sections are welded parallel to the tubes 64 by means of a glass lathe.
  • These pipe sections are now connected at one position annular with the twin tube radiator. Preference is given to using a laser-cut disk of appropriate dimensions made of quartz glass. As a result, only at one position, a pipe section must be used, which provides a certain savings in the production and causes, however, that the diameter of the opaque pipe section is slightly larger. As a result, the radiator distances within the vacuum chamber also become larger.
  • the disclosed variants allow, in a particularly simple and elegant manner, the application of an additional reflector made of opaque quartz glass, as described in DE 10 2004 051 846.
  • a reflector is particularly well suited for vacuum but has typical thicknesses of 0.5 mm to 1.5 mm.
  • a coated emitter can usually no longer be sealed off against the emitter tube, since it no longer fits through the hole provided in the vacuum chamber for receiving the emitter tube.
  • the sealing piece (34, 44, 54, 64) should have a slightly larger diameter than the radiator tube. This diameter can be easily adapted to the need for an applied coating, so that the radiator pipe with coating in any case still has a smaller diameter than the sealing piece and so in any case can be easily mounted and replaced.

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Vessels And Coating Films For Discharge Lamps (AREA)
  • Resistance Heating (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

L'invention concerne un émetteur à infrarouge, comprenant au moins un tube émetteur qui présente des sertissages à ses extrémités respectives, caractérisé en ce qu'au moins une section opaque (12) du tube est disposée, de manière à être raccordée, soudée de niveau avec au moins un tube émetteur. L'invention concerne en outre l'utilisation d'un émetteur infrarouge destiné à être monté dans une chambre de traitement (21).
EP09760728A 2008-12-19 2009-11-13 Dispositif émetteur à infrarouge pour traitement sous vide à haute température Withdrawn EP2359386A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102008063677A DE102008063677B4 (de) 2008-12-19 2008-12-19 Infrarotstrahler und Verwendung des Infrarotstrahlers in einer Prozesskammer
PCT/EP2009/008076 WO2010069438A1 (fr) 2008-12-19 2009-11-13 Dispositif émetteur à infrarouge pour traitement sous vide à haute température

Publications (1)

Publication Number Publication Date
EP2359386A1 true EP2359386A1 (fr) 2011-08-24

Family

ID=42084614

Family Applications (1)

Application Number Title Priority Date Filing Date
EP09760728A Withdrawn EP2359386A1 (fr) 2008-12-19 2009-11-13 Dispositif émetteur à infrarouge pour traitement sous vide à haute température

Country Status (7)

Country Link
US (1) US8436523B2 (fr)
EP (1) EP2359386A1 (fr)
KR (1) KR101285528B1 (fr)
CN (1) CN102257598B (fr)
BR (1) BRPI0923019A2 (fr)
DE (1) DE102008063677B4 (fr)
WO (1) WO2010069438A1 (fr)

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DE102011115841A1 (de) 2010-11-19 2012-05-24 Heraeus Noblelight Gmbh Bestrahlungsvorrichtung
DE102010064141A1 (de) 2010-12-23 2012-06-28 Von Ardenne Anlagentechnik Gmbh Heizeinrichtung für Substratbehandlungsanlagen und Substratbehandlungsanlage
DE102011009284B4 (de) 2011-01-24 2014-09-11 Von Ardenne Gmbh Elektrische Durchführung in ein Vakuumgehäuse
UA111631C2 (uk) * 2011-10-06 2016-05-25 Санофі Пастер Са Нагрівальний пристрій для роторної барабанної ліофільної сушарки
DE102012025142A1 (de) 2012-12-21 2014-06-26 Heraeus Noblelight Gmbh Infrarotstrahler mit hoher Strahlungsleistung
JP6217251B2 (ja) * 2013-09-05 2017-10-25 岩崎電気株式会社 ハロゲンランプ
DE102015102665A1 (de) 2015-02-25 2016-08-25 Heraeus Noblelight Gmbh Bestrahlungsvorrichtung zur Einkopplung von Infrarot-Strahlung in eine Vakuum-Prozesskammer mit einem einseitig gesockelten Infrarotstrahler
CN108476560B (zh) * 2015-09-09 2020-11-03 沃特洛电气制造公司 高温管状加热器
USD771219S1 (en) * 2015-09-15 2016-11-08 Cutting Edge Products, Inc Electric stun gun having an electric cigarette-shaped mouthpiece
USD783117S1 (en) * 2015-09-15 2017-04-04 Cutting Edge Products, Inc. Electric stun gun
DE102016111234B4 (de) * 2016-06-20 2018-01-25 Heraeus Noblelight Gmbh Vorrichtung für die thermische Behandlung eines Substrats sowie Trägerhorde und Substrat-Trägerelement dafür
US10707067B2 (en) 2016-09-22 2020-07-07 Heraeus Noblelight Gmbh Infrared radiating element
CN108863028A (zh) * 2017-05-10 2018-11-23 张忠恕 一种新型石英管加工方法
US11589966B2 (en) * 2018-10-29 2023-02-28 Vita Zahnfabrik H. Rauter Gmbh & Co. Kg Heating element for a dental-ceramic furnace and dental sintering furnace
US11370213B2 (en) 2020-10-23 2022-06-28 Darcy Wallace Apparatus and method for removing paint from a surface

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Also Published As

Publication number Publication date
KR20110086710A (ko) 2011-07-29
DE102008063677A1 (de) 2010-07-08
US8436523B2 (en) 2013-05-07
BRPI0923019A2 (pt) 2015-12-15
US20110248621A1 (en) 2011-10-13
CN102257598A (zh) 2011-11-23
CN102257598B (zh) 2015-05-20
DE102008063677B4 (de) 2012-10-04
KR101285528B1 (ko) 2013-07-17
WO2010069438A1 (fr) 2010-06-24

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