EP2344282A1 - Verfahren zum reinigen einer vakuumpumpe - Google Patents
Verfahren zum reinigen einer vakuumpumpeInfo
- Publication number
- EP2344282A1 EP2344282A1 EP09740158A EP09740158A EP2344282A1 EP 2344282 A1 EP2344282 A1 EP 2344282A1 EP 09740158 A EP09740158 A EP 09740158A EP 09740158 A EP09740158 A EP 09740158A EP 2344282 A1 EP2344282 A1 EP 2344282A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- pump chamber
- pump
- cleaning liquid
- cleaning
- rotor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C29/00—Component parts, details or accessories of pumps or pumping installations, not provided for in groups F04C18/00 - F04C28/00
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C18/00—Rotary-piston pumps specially adapted for elastic fluids
- F04C18/08—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing
- F04C18/12—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type
- F04C18/14—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with toothed rotary pistons
- F04C18/16—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with toothed rotary pistons with helical teeth, e.g. chevron-shaped, screw type
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C2220/00—Application
- F04C2220/10—Vacuum
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C2280/00—Arrangements for preventing or removing deposits or corrosion
- F04C2280/02—Preventing solid deposits in pumps, e.g. in vacuum pumps with chemical vapour deposition [CVD] processes
Definitions
- the invention relates to a method for cleaning a vacuum pump having a pump chamber with at least one pump rotor.
- TCO layers transparent conductive oxide layers
- TCO layers are made by combining water and diethylzinc. Water and diethylzinc can react violently at atmospheric pressure. At low pressure of a few millibar, the reaction is much slower.
- the two materials are therefore reacted in process chambers under vacuum in order to force a slow reaction.
- the reaction of water with diethyl zinc as a by-product impurities in the form of dust particles which lead to deposits in the pump housing and on the rotor. These reactions can also take place in the pump. These deposits reduce the maximum operating life of the pump.
- the cleaning of a vacuum pump is cumbersome and time consuming and usually requires a complete disassembly of the pump.
- DE 10 2004 063 058 A1 discloses a rinsing method for cleaning a vacuum screw pump, in which the pump is purged with a cleaning fluid during operation at rated speed, the cleaning fluid being a mixture of a rinsing fluid and a rinsing gas.
- the invention has for its object to provide a simple method for cleaning a vacuum pump without the pump has to be dismantled or removed from the plant.
- a cleaning liquid for example in the form of an acid, a lye, a solvent or a plasticizer, is introduced into the pump chamber.
- the cleaning solution is distributed in the pump chamber, so that the cleaning solution also reaches hard to reach areas in the pump chamber.
- Moving the rotor creates a mixture of cleaning fluid and dissolved impurities. This mixture is then drained from the pump chamber.
- a simple cleaning process is created with which the maximum operating time of the vacuum pump can be increased. Clogging the pump with the contaminant deposits and thus potentially damaging or even destroying the pump can be avoided by using the cleaning process.
- the cleaning process is more efficient than traditional simple rinsing procedures.
- the duration of the cleaning process is shortened compared to conventional methods, whereby the available usage time of the pump is increased.
- the advantage is that by filling a cleaning fluid into the pump chamber and distributing the cleaning fluid within the pump chamber regardless of the actual rinsing process impurities can be solved better. This is especially the case if the cleaning process does not take place during pump operation at rated speed.
- the pump chamber inlet and the pump chamber outlet should be closed and the pump chamber should be completely flooded with the cleaning fluid.
- the vacuum pump may e.g. be rinsed by applying the known rinsing method.
- the pump chamber is rinsed with a rinsing liquid, for example water, and then dried before the pump is put back into operation.
- the Cleaning fluid may be an acidic cleaning solution.
- the acidic cleaning solution dissolves zinc-containing deposits.
- cleaning liquid is advantageously replenished into the pump chamber and distributed by moving the rotor again in the pump chamber, so that fresh cleaning liquid reaches the still remaining deposits for releasing the same. Since the dissolved deposits consume the cleaning liquid, a multiple refilling and moving the rotor may be necessary to increase the effectiveness.
- a secondary gas is, for example, nitrogen, which is used as a seal shaft purge between the pump chamber and the adjacent gear housing of the pump rotor or as a gas ballast intended to prevent condensing of the compressed gas.
- the supply of the gas ballast is stopped and the sealing gas flow is reduced.
- a degassing opening can be produced in the upper region of the pump chamber, through which the secondary gas can escape upwards out of the pump chamber to the atmosphere. Secondary gases can prevent a uniform distribution of the cleaning liquid and thus reduce the effectiveness of the cleaning process.
- the vent may be provided with a removable plug.
- a degasification pipe can be placed on the degassing opening, through which the escaping secondary gas is led to the atmosphere.
- the degassing pipe is connected to an exhaust pipe for the pump chamber outlet.
- the acid content of the cleaning solution should be high enough for effective cleaning and low enough to avoid unnecessary attack on the pump components. These properties are fulfilled with an acid content of between 2% and 15%. A particularly advantageous acid content is about 10%.
- a beneficial acid for the cleaning solution is citric acid.
- FIG. 1 shows a section through a vacuum pump with a pump chamber and with a pump rotor
- FIG. 2 shows an enlarged detail from FIG. 1.
- the illustrated vacuum pump 10 has a pump chamber 12 (pump chamber), in which a rotor 14 is mounted axially compressing.
- the rotor 14 is driven by a gear arranged outside the pump chamber 12, which is contained in a gear chamber 16.
- the pump chamber 12 is surrounded by a housing 18.
- the housing 18 has a pump chamber inlet 20 and a pump chamber outlet 22.
- the shaft 15 of the rotor 14 is guided by a passage 17 between the housing 18 and the gear chamber 16 of the pump chamber 12 in the gear chamber 16.
- the bushing 17 is shown in detail in FIG.
- a degassing opening 24 is formed, on which a degassing pipe 26 is placed.
- the degassing pipe 26 is connected to an exhaust pipe 30 connected to the pump chamber outlet 22.
- the cleaning liquid 28 is evenly distributed and thereby reaches all internal surfaces in the pump chamber 12 and in particular in hard to reach areas of the pump chamber and rotors.
- the cleaning fluid dissolves the deposits and forms a solution with them.
- degassing opening 24 In order to prevent accumulations of secondary gas to keep the cleaning solution away from deposits, secondary gases are discharged through the degassing opening 24. Since the degassing opening 24 is formed in the upper region of the housing 18, secondary gas in the form of gas bubbles rising upwards in the cleaning solution can escape through the degassing opening 24. On the vent 24, a degassing 26 is placed, which dissipates the leaked secondary gas to the atmosphere. In the exemplary embodiment shown in FIG. 1, the degassing pipeline 26 is guided into the exhaust gas line 30 of the pump chamber outlet 22.
- a typical secondary gas is nitrogen.
- nitrogen is used as a gas ballast to prevent water vapor from condensing during pump operation.
- Nitrogen is also used as D ⁇ chtgas to the Carrying out 17 seal the rotor shaft from the gear chamber 16 in the pump chamber 12, so that no impurities from the pump into the gear chamber and thus the cleaning fluid can not escape into the transmission.
- the sealing gas is supplied via a Dichtgaszumoltechnisch 32 the gap 34 of the shaft seal 36 and flows from the gap 34 into the pump chamber 12.
- a discharge is required. This discharge is created by the degassing opening 24 being formed above the outlet 38 of the passage 17, because the sealing gas emerging from the gap 34 rises in the cleaning liquid 28 within the pump chamber 12 and accumulates in the area above the passage outlet 38. Through the degassing opening 24, the sealing gas is discharged.
- the cleaning liquid 28 is discharged from the pump chamber 12 along with the dissolved impurities. Subsequently, the pump chamber 12 is rinsed with clear water and then dried. In this case, in particular, a rinsing method known from the prior art can be used. After drying, the cleaning process is completed and the vacuum pump 10 can be put back into operation.
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Applications Or Details Of Rotary Compressors (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Non-Positive Displacement Air Blowers (AREA)
- Cleaning In General (AREA)
Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102008053522A DE102008053522A1 (de) | 2008-10-28 | 2008-10-28 | Verfahren zum Reinigen einer Vakuumpumpe |
PCT/EP2009/064122 WO2010049407A1 (de) | 2008-10-28 | 2009-10-27 | Verfahren zum reinigen einer vakuumpumpe |
Publications (2)
Publication Number | Publication Date |
---|---|
EP2344282A1 true EP2344282A1 (de) | 2011-07-20 |
EP2344282B1 EP2344282B1 (de) | 2012-08-08 |
Family
ID=41565980
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP09740158A Not-in-force EP2344282B1 (de) | 2008-10-28 | 2009-10-27 | Verfahren zum reinigen einer vakuumpumpe |
Country Status (9)
Country | Link |
---|---|
US (1) | US20110232689A1 (de) |
EP (1) | EP2344282B1 (de) |
JP (1) | JP2012506765A (de) |
KR (1) | KR20110084519A (de) |
CN (1) | CN102202805A (de) |
DE (1) | DE102008053522A1 (de) |
RU (1) | RU2011120977A (de) |
TW (1) | TW201024547A (de) |
WO (1) | WO2010049407A1 (de) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102010021240A1 (de) * | 2010-05-21 | 2011-11-24 | Oerlikon Leybold Vacuum Gmbh | Verfahren zur Oberflächenbehandlung |
EP2752559A1 (de) * | 2013-01-08 | 2014-07-09 | Siemens Aktiengesellschaft | Verfahren zur Reinigung eines Rotors einer Gasturbine innerhalb eines Gehäuses |
DE102013206526A1 (de) * | 2013-04-12 | 2014-10-16 | Oerlikon Leybold Vacuum Gmbh | Verfahren zur Reinigung einer Vakuumpumpe |
DE102013013543B4 (de) * | 2013-08-13 | 2023-11-02 | Wilo Se | Desinfektion in einer Kreiselpumpe oder in einem mindestens eine Kreiselpumpe enthaltenen Pumpensystem |
CN108240319B (zh) * | 2017-12-30 | 2024-07-16 | 河南永煤碳纤维有限公司 | 停车盘泵装置及计量泵维护方法 |
CN108714587A (zh) * | 2018-06-06 | 2018-10-30 | 南京采孚汽车零部件有限公司 | 一种泵类产品内部清洗装置 |
CN111500309A (zh) * | 2020-04-27 | 2020-08-07 | 中山凯旋真空科技股份有限公司 | 干式真空泵及原油真空闪蒸处理装置 |
CN113385471B (zh) * | 2021-08-16 | 2021-10-29 | 南通银河水泵有限公司 | 一种自动化真空泵清洗装备 |
KR102718476B1 (ko) | 2022-03-13 | 2024-10-15 | 한국표준과학연구원 | 진공펌프 성능 유지 장치, 이를 구비하는 진공펌프 및 플라즈마 공정 시스템 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3013652B2 (ja) * | 1993-06-01 | 2000-02-28 | 富士通株式会社 | 排気装置とその清浄化方法 |
EP0834017B1 (de) * | 1995-06-21 | 1999-10-27 | Sterling Industry Consult GmbH | Vakuumpumpe |
DE19522554A1 (de) * | 1995-06-21 | 1997-01-02 | Sihi Ind Consult Gmbh | Verfahren zum Reinigen der Schöpfraumoberflächen eines Rotationskolbenverdichters |
WO2004036047A1 (en) * | 2002-10-14 | 2004-04-29 | The Boc Group Plc | Rotary piston vacuum pump with washing installation |
US7107775B2 (en) * | 2003-06-27 | 2006-09-19 | Mid-South Products Engineering, Inc. | Cold control damper assembly |
WO2005028871A1 (en) * | 2003-09-23 | 2005-03-31 | The Boc Group Plc | Cleaning method of a rotary piston vacuum pump |
DE102004063058A1 (de) * | 2004-12-22 | 2006-07-13 | Leybold Vacuum Gmbh | Verfahren zum Reinigen einer Vakuum-Schraubenpumpe |
US20070203041A1 (en) * | 2006-02-24 | 2007-08-30 | Ki-Jeong Lee | Cleaning composition for removing impurities and method of removing impurities using the same |
DE102006039529A1 (de) * | 2006-08-23 | 2008-03-06 | Oerlikon Leybold Vacuum Gmbh | Verfahren zur Abreaktion selbstentzündlicher Stäube in einer Vakuumpumpvorrichtung |
-
2008
- 2008-10-28 DE DE102008053522A patent/DE102008053522A1/de not_active Withdrawn
-
2009
- 2009-10-26 TW TW098136122A patent/TW201024547A/zh unknown
- 2009-10-27 US US13/126,265 patent/US20110232689A1/en not_active Abandoned
- 2009-10-27 RU RU2011120977/05A patent/RU2011120977A/ru unknown
- 2009-10-27 JP JP2011532664A patent/JP2012506765A/ja not_active Withdrawn
- 2009-10-27 WO PCT/EP2009/064122 patent/WO2010049407A1/de active Application Filing
- 2009-10-27 CN CN2009801424342A patent/CN102202805A/zh active Pending
- 2009-10-27 EP EP09740158A patent/EP2344282B1/de not_active Not-in-force
- 2009-10-27 KR KR1020117012203A patent/KR20110084519A/ko not_active Application Discontinuation
Non-Patent Citations (1)
Title |
---|
See references of WO2010049407A1 * |
Also Published As
Publication number | Publication date |
---|---|
TW201024547A (en) | 2010-07-01 |
KR20110084519A (ko) | 2011-07-25 |
WO2010049407A1 (de) | 2010-05-06 |
DE102008053522A1 (de) | 2010-04-29 |
US20110232689A1 (en) | 2011-09-29 |
EP2344282B1 (de) | 2012-08-08 |
CN102202805A (zh) | 2011-09-28 |
RU2011120977A (ru) | 2012-12-10 |
JP2012506765A (ja) | 2012-03-22 |
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