EP2257856A1 - Integral adjusting member and method for making same - Google Patents

Integral adjusting member and method for making same

Info

Publication number
EP2257856A1
EP2257856A1 EP09722049A EP09722049A EP2257856A1 EP 2257856 A1 EP2257856 A1 EP 2257856A1 EP 09722049 A EP09722049 A EP 09722049A EP 09722049 A EP09722049 A EP 09722049A EP 2257856 A1 EP2257856 A1 EP 2257856A1
Authority
EP
European Patent Office
Prior art keywords
balance
silicon
layer
pattern
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP09722049A
Other languages
German (de)
French (fr)
Other versions
EP2257856B1 (en
Inventor
Pierre-André Bühler
Marco Verardo
Thierry Conus
Jean-Philippe Thiébaud
Jean-Bernard Peters
Pierre Cusin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nivarox Far SA
Nivarox SA
Original Assignee
Nivarox Far SA
Nivarox SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nivarox Far SA, Nivarox SA filed Critical Nivarox Far SA
Priority to EP09722049.5A priority Critical patent/EP2257856B1/en
Publication of EP2257856A1 publication Critical patent/EP2257856A1/en
Application granted granted Critical
Publication of EP2257856B1 publication Critical patent/EP2257856B1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G04HOROLOGY
    • G04DAPPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
    • G04D3/00Watchmakers' or watch-repairers' machines or tools for working materials
    • G04D3/0002Watchmakers' or watch-repairers' machines or tools for working materials for mechanical working other than with a lathe
    • G04D3/0035Watchmakers' or watch-repairers' machines or tools for working materials for mechanical working other than with a lathe for components of the regulating mechanism
    • G04D3/0038Watchmakers' or watch-repairers' machines or tools for working materials for mechanical working other than with a lathe for components of the regulating mechanism for balances
    • GPHYSICS
    • G04HOROLOGY
    • G04BMECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00Mechanisms for stabilising frequency
    • G04B17/04Oscillators acting by spring tension
    • G04B17/06Oscillators with hairsprings, e.g. balance
    • G04B17/063Balance construction
    • GPHYSICS
    • G04HOROLOGY
    • G04BMECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00Mechanisms for stabilising frequency
    • G04B17/04Oscillators acting by spring tension
    • G04B17/06Oscillators with hairsprings, e.g. balance
    • G04B17/066Manufacture of the spiral spring

Definitions

  • the invention relates to a regulating member and its method of manufacture and, more particularly, to a regulating member of the spring-balance type.
  • the regulating member of a timepiece generally comprises an inertia flywheel called a balance wheel and a resonator called a spiral. These pieces are decisive for the running quality of the timepiece. Indeed, they regulate the movement, that is to say they control the frequency of the movement.
  • the balance and the hairspring are different in nature, which makes it extremely difficult to perfect the regulating organ, which includes the own fabrications of the balance and the hairspring and their assembly substantially in resonance.
  • the balance and the hairspring have each been manufactured in various materials, in particular in order to limit the influence of a change in temperature without the resonance assembly difficulties disappearing.
  • the object of the present invention is to overcome all or part of the aforementioned drawbacks by proposing a monobloc regulator which remains insensitive to temperature changes and which is obtained by means of a manufacturing process which minimizes the difficulties of assembly.
  • the invention relates to a monobloc regulating member comprising a balance cooperating with a spiral made in a layer of silicon-based material and comprising a spiral spring coaxially mounted on a ferrule, the ferrule comprising an extension part. protruding from said spiral spring and which is made in a second layer of silicon-based material characterized in that the extension portion of the shell of the spiral is fixed on the balance.
  • the balance has a hole extending the inner diameter of the ferrule to receive a balance shaft
  • the balance shaft is fixed on the balance by driving against a metal coating made at said hole; the cross-section of the inside diameter of the ferrule is greater than that of the balance beam hole in order to avoid greasy contacts between the balance shaft and the inside diameter of the ferrule;
  • the serge of the balance is continuous and comprises an adaptation device able to modify the moment of inertia of the balance; -
  • the serge is connected to the hub of the balance by at least one arm which is slender to allow its axial deformation and / or radial in case of shock transmitted on the balance;
  • the adaptation device comprises recesses made on the balance rod so as to adjust the inertia of said balance; the recesses comprise a material of greater density than that of the strut of the balance to increase the inertia of said balance;
  • the adaptation device comprises bosses made on the balance rod and having a material of greater density than the serge to increase the inertia of said balance;
  • said material of greater density is distributed at the level of the serge in the form of a crenellated ring comprising a succession studs spaced at regular intervals to compensate for the thermal expansion of said material;
  • the balance is made in a third layer of silicon-based material; the inner coil of the spiral spring has a curve of the type
  • the spiral spring comprises at least one portion based on silicon dioxide to make it more mechanically resistant and adjust its thermo-elastic coefficient.
  • the invention also relates to a timepiece characterized in that it comprises a one-piece regulating member according to one of the preceding variants.
  • the invention relates to a method of manufacturing a regulator member comprising the following steps: a) providing a substrate comprising an upper layer and a lower layer of silicon-based materials; b) selectively etching at least one cavity in the upper layer to define the pattern of a first portion of a shell and a first portion of a rocker made of silicon-based material of said member; c) attaching, on the etched upper layer of the substrate, an additional layer of silicon-based material; d) selectively etching at least one cavity in the additional layer to continue the pattern of said first parts of the ferrule and the balance, and define the pattern of a spiral spring made of silicon-based material of said member; characterized in that it further comprises the following steps: e) selectively etching at least one cavity in the lower layer to define the last portion of the rocker made of silicon-based material of said member; - AT -
  • step g) is carried out: oxidation of the second part made of silicon-based material of said member in order to adjust its thermoelastic coefficient but also to make it mechanically more resistant;
  • step h) is carried out: selectively depositing at least one metal layer on the lower layer to define the pattern of at least one metal part of said member and / or a second metal part intended to to receive by driving an axis;
  • step h) comprises step i): growing said deposition by successive metallic layers at least partially on the surface of the lower layer in order to form a metal part intended to increase the mass of the rocker made of silicon-based material; and / or a second metal part intended to receive by driving an axis;
  • step h) comprises steps j): selectively etching at least one cavity in the lower layer intended to receive said at least one metal part and k): growing said deposition by successive metal layers at least partially in said at least one at least one cavity for forming a metal part intended to increase the mass of the rocker made of silicon-based material and / or a second metal part intended to receive a shaft by driving;
  • step h) comprises the last step I): polishing the metallic deposit; -
  • step I) polishing the metallic deposit; -
  • organs are made on the same substrate which allows a series production.
  • FIGS. 6 to 8 show views of the successive steps of alternative embodiments
  • FIG. 9 shows a block diagram of the method according to the invention.
  • FIGS. 10 and 1 1 are perspective representations of a monobloc regulator member according to a first embodiment
  • FIGS. 12 and 13 are perspective views of a monobloc regulator member according to a second embodiment
  • FIGS. 14 and 15 are perspective views of a one-piece regulator member according to a third embodiment
  • FIG. 16 is a perspective representation of a monobloc spiral according to the invention.
  • the invention relates to a generally annotated method 1 intended to manufacture a regulating member 41, 41 ', 41 "for a timepiece movement.As illustrated in FIGS. 1 to 9, the method 1 comprises successive steps intended to forming at least one type of integral member (51 '', 41, 41 ', 41' ') which can be integrally formed of silicon-based materials.
  • the first step 100 consists in providing a substrate 3 of the silicon-on-insulator type (also known by the acronym SOI).
  • the substrate 3 comprises an upper layer 5 and a lower layer 7 each composed of a material based on silicon. Between the upper 5 and lower 7 layers, may extend an intermediate layer 9 composed of silicon dioxide (SiO 2 ).
  • the substrate 3 is chosen so that the height of the lower layer 7 corresponds to the height of a portion of the final regulator member 41, 41 ', 41 ". have a thickness sufficient to withstand the forces induced by the method 1.
  • a thickness may be for example between 300 and 400 microns.
  • the upper layer 5 is used as spacing means with respect to the lower layer 7. Therefore, the height of the upper layer 5 will be adapted according to the configuration of the regulating member 41, 41 ', 41 " According to said configuration, the thickness of the upper layer 5 can thus oscillate, for example, between 10 and 200 ⁇ m
  • a second step 101 as can be seen in FIG. 2, cavities 10, 11, 12, 13, 14 and 15 are selectively etched, for example by a deep reactive ion etching process (also known by the acronym DRIE), in the upper layer 5 of silicon-based material, preferably said cavities 10, 11, 12 , 13, 14 and 15 form two patterns 17, 19 defining the inner and outer contours of silicon parts of the regulating member 41, 41 ', 41 ".
  • DRIE deep reactive ion etching process
  • the patterns 17 and 19 are substantially in the form of coaxial cylinders with a circular section, the pattern 17 having a larger diameter than that of the pattern 19.
  • etching on the upper layer 5 leaves full freedom on the geometry of the patterns 17 and 19.
  • the patterns 17 and 19 are not necessarily circular but, for example, elliptical or have a non-circular inner diameter.
  • bridges of material 18 are left in order to maintain the substrate 3 the regulator member 41, 41 ', 41 "during its manufacturing.
  • an additional layer 21 made of silicon-based material is added to the substrate 3.
  • the additional layer 21 is fixed on the upper layer 5 by means of a fusion welding of the silicon (also known under the acronym SFB).
  • Step 102 advantageously allows the upper layer 5 to be covered by bonding with a very strong adhesion, in particular the upper faces of the patterns 17 and 19 on the lower face of the additional layer 21.
  • the additional layer 21 may, for example, comprise a thickness between 100 and 150 ⁇ m.
  • cavities 20, 22 and 24 are selectively etched, for example, by a method of the DRIE type similar to that of step 101, in the additional layer 21 made of material silicon base. These cavities 20, 22 and 24 make it possible to form three patterns 23, 25 and 27 defining the inner and outer contours of silicon parts of the regulating member 41, 41 ', 41 ".
  • the patterns 23 and 25 are substantially in the form of coaxial cylinders with a circular section and, the pattern 27, substantially in the form of a spiral.
  • the etching on the additional layer 21 leaves complete freedom on the geometry of the patterns 23, 25 and 27.
  • the patterns 23 and 25 are not necessarily circular but, for example, elliptical or have a non-circular inner diameter. It is the same, in particular, for the inner diameters 10 and 24 which are not necessarily circular but, for example, polygonal which could make it possible to improve the transmission of rotational force with an axis 49 of corresponding form.
  • each diameter 10, 24 may not be of identical shape.
  • the pattern 23 made in the additional layer is the pattern 23 made in the additional layer
  • the 21 is of similar shape and substantially perpendicular to the pattern 19 made in the upper layer 5. This means that the cavities 10 and 24 respectively forming the inner diameter of the patterns 19 and 23 communicate together and are substantially one above the other.
  • the units 23 and 19 form the collar 55, 55 ', 55 "of the regulating member 41, 41', 41" which extends in height on the layers 5 and 21. .
  • the pattern 25 made in the additional layer 21 is of similar shape and substantially perpendicular to the pattern 17 made in the upper layer 5.
  • the patterns 25 and 17 form part of the serge 47, 47 ', 47 "of the balance 43, 43', 43" of the regulating member 41, 41 ', 41 "which extends in height in particular on the layers 5 and 21.
  • the material bridges 18 are not reproduced and that the cavity 22 in the additional layer 21 forms a continuous ring, unlike the cavities 12, 13, 14 and 15 which open out under it in FIG. 4.
  • the patterns 23 and 27 are etched at the same time and form a one-piece piece in the additional layer 21. In the example illustrated in FIGS.
  • the patterns 23 and 27 form the spiral spring 53, 53 ', 53 "and the upper part of the shell 55, 55 ', 55 “of the regulating member 41, 41 ', 41 ".
  • the outer curve of the pattern 27 shown in Figure 4 is open. This last characteristic associated with the spacing with respect to the lower layer 7 produced by the pattern 19 makes it possible to embellish said external curve by means of a raquet.
  • the etching on the additional layer 21 leaves all freedom on the geometry of the pattern 27.
  • the pattern 27 may not have an external curve open but, for example, have on the end of the outer curve a bead adapted to serve as a fixed attachment point, that is to say without the need for raquetry.
  • the pattern 27 may also comprise an internal turn comprising a Grossmann type curve making it possible to improve its concentricity of development as explained in the document EP 1 612 627 incorporated with reference to the present description.
  • the patterns 23 and 27 etched in the additional layer 21 are only connected by the underside of the pattern 23, with a very strong adhesion, above the etched pattern 19 of the upper layer. 5 (the pattern 19 is itself connected, with a very strong adhesion, to the lower layer 7).
  • the patterns 23 and 27 are therefore no longer in direct contact with the additional layer 21.
  • the pattern 25 is no longer in direct contact with the additional layer 21 but only connected, with a very strong adhesion, to the pattern 17 etched of the upper layer 5.
  • the method 1 may comprise a fifth step 104 which consists in oxidizing at least the pattern 27, that is to say the spiral spring 53, 53 ', 53 “of the regulating member 41, 41 ', 41 “in order to adjust its thermoelastic coefficient but also to make it mechanically more resistant.
  • a fifth step 104 which consists in oxidizing at least the pattern 27, that is to say the spiral spring 53, 53 ', 53 “of the regulating member 41, 41 ', 41 "in order to adjust its thermoelastic coefficient but also to make it mechanically more resistant.
  • the method 1 advantageously allows to produce only the spiral 51 '"as visible in Figure 16. Indeed, one of the advantages of Method 1 is to be able to adapt the height of the pattern 19 of the ferrule 55, 55 ', 55 “, 55'” projecting from the spiral spring 53, 53 ', 53 “, 53'” directly by choosing the thickness of the upper layer 5.
  • step 103 When such a product 51 '", visible in FIG. 16, is desired, it is therefore sufficient to stop the process 1 at step 103 or 104 by providing at the intermediate stage of formation of material bridges.
  • material bridges may in particular be formed either on the pattern 19 during step 101 or on the pattern 27 at the end, for example, of the last turn in step 103.
  • the penultimate step of method 1 could then consist of removing the lower layer 7, for example, by etching and / or mechanical.
  • step 106 the hairspring 51 '' thus obtained would be released.
  • the method 1 may comprise three embodiments A, B and C as illustrated in FIG. However, each of the three embodiments A, B and C ends with the same final step 106 of freeing the substrate 3 the regulating member 41, 41 ', 41 "manufactured.
  • the release step 106 can then be simply performed by providing a force to the regulating member 41, 41 ', 41 "capable of breaking its material bridges 18.
  • This effort can, for example, be generated manually by a operator or by machining.
  • cavities 26, 28, 29, 30, 31 and 32 are selectively etched, for example, by a method of the DRIE type similar to that of the steps 101 and 103, in the lower layer 7 made of silicon-based material. These cavities 26, 28, 29, 30, 31 and 32 make it possible to form a pattern 34 defining the inner and outer contours of a silicon part of the regulating member 41.
  • the pattern 34 is substantially in the form of a four-armed rim 40, 42, 44, 46.
  • the etching on the lower layer 7 leaves all the freedom on the pattern geometry 34.
  • the number and the geometry of the arms can be different just as the rim is not necessarily circular but, for example, elliptical.
  • the arms 40, 42, 44, 46 may be slender in order to allow their axial and / or radial deformation in the event of shock transmitted to the regulating member.
  • part of the pattern 34 made in the lower layer 7 is of similar shape and substantially vertically above the patterns 17 and 25 made respectively in the upper and additional layers 5 and 21.
  • the serge 47 therefore extends in height over all of the layers 5, 7 and 21.
  • the cavity 26 of the pattern 34 is substantially in extension of the cavities 10 and 24 forming the inner diameter of the patterns 19 and 23.
  • the successive cavities 24, 10 and 26 thus form a suitable internal diameter. receiving the balance shaft 49 of the regulating member 41.
  • the latter comprises a balance 43 of which the hub 45 is connected on the one hand radially to the serge 47 by four arms 40, 42, 44 and 46 and, on the other hand, axially to the spiral 51 which comprises a spiral spring 53 and a ferrule 55.
  • the serge 47 is formed by the peripheral ring of the pattern 34 of the lower layer 7 but also by the patterns 17 and 25 of the respective upper and additional layers 21.
  • the ferrule 55 is formed by the pattern 23 of the additional layer 21 and the pattern 19 of the upper layer 5.
  • this pattern 19 is used as spacing means between the spiral 51 and the balance 43 to be able to for example, punctuating the spiral spring 53 with a raquet.
  • the pattern 19 is also useful as a guide means of the hairspring 51 by increasing the height of the shell 55.
  • the etching on the additional layer 21 leaves complete freedom on the geometry of the spiral spring 53.
  • the spiral spring 53 may not have an open external curve but, for example, comprise on the end of the outer curve a bead adapted to serve as a fixed attachment point, that is to say without the need for raquetry.
  • the regulating member 41 is adapted to receive a balance shaft 49 through the cavities 24, 10 and 26.
  • the regulating member 41 being in one piece, it is not necessary to fix the axis balance 49 to the ferrule 55 and balance 43 but only to one of them.
  • the balance shaft 49 is fixed on the inner diameter 26 of the rocker arm 43, for example by means of elastic means 48 etched into the silicon-based hub 45 during the step 105.
  • elastic means 48 can for example, take the form of those disclosed in Figures 1 OA to 1 OE of EP 1 655 642 or those disclosed in Figures 1, 3 and 5 of EP 1 584 994, which patents are incorporated by reference to the this description.
  • the cavities 24 and 10 have sections of larger dimensions than that of the cavity 26 to prevent the balance shaft 49 is in bold contact with the ferrule 55.
  • the method 1 comprises, after the step 103 or 104, a sixth step 107, as visible in FIG.
  • the deposited metal may be, for example, gold or nickel or one of their alloys.
  • step 107 can consist in depositing a crenellated ring 61 and / or a cylinder 63.
  • the ring 61 comprises a series of pads 65 substantially in an arc and is intended to advantageously increase the mass of the future beam 43 '.
  • one of the advantages of silicon is its low sensitivity to temperature variations. However, it has the disadvantage of having a low density.
  • a first characteristic of the invention is therefore to increase the mass of the balance 43 'with the aid of metal obtained by electroplating in order to increase the inertia of the future balance 43'.
  • the metal deposited on the lower layer 7 has a spacing between each pad 65 able to compensate for the thermal expansion of the ring 61.
  • the cylinder 63 is intended to receive, advantageously, by driving a balance shaft 49.
  • another disadvantage of silicon lies in its very weak elastic and plastic zones, which makes it very brittle.
  • Another feature of the invention is thus to achieve the clamping of the balance shaft 49 not against the silicon-based material of the balance 43 'but on the inner diameter 67 of the metal cylinder 63 electrodeposited during step 107
  • the cylinder 63 obtained by electroplating leaves full freedom as to its geometry. So, in particular, the internal diameter 67 is not necessarily circular but, for example, polygonal which could improve the transmission of rotational force with an axis 49 of corresponding shape.
  • a seventh step 108 similar to the step 105 visible in FIG. 5, cavities are selectively etched, for example by a DRIE method, in the lower layer 7 made of silicon-based material. These cavities make it possible to form a rocker pattern similar to the pattern 34 of the embodiment A. As illustrated in the example of FIGS. 12 and 13, the pattern obtained can be substantially in the form of a four-armed rim 40 ', 42'. 44 ', 46'.
  • the etching on the lower layer 7 leaves all freedom on the geometry of the pattern 34.
  • the number and the geometry of the arms can be different just as the rim is not necessarily circular but for example, elliptical.
  • the arms 40 ', 42', 44 ', 46' may be slender in order to allow their axial and / or radial deformation in the event of shock transmitted to the regulating member.
  • a part of the rocker pattern produced in the lower layer 7 is of similar shape and substantially vertically above the patterns 17 and 25 made respectively during the steps 101 and 103 in the upper and additional layers 5 and 21.
  • the pendulum pattern forms, with the patterns 17 and 25 and the metal parts 61 and / or 63, the balance 43 'of the regulating member 41' whose serge 47 'therefore extends into height over all the layers 5, 7 and 21 and the metal parts 61 and / or 63.
  • the successive cavities thus form an inner diameter adapted to receive the balance shaft 49 of the regulator 41 '.
  • material bridges 18 may also not be reproduced in the lower layer 7.
  • the serge 47 ' is formed by the peripheral ring of the balance pattern of the lower layer 7 but also by the patterns 25 and 17 of the respective upper and additional layers 21 and, optionally, the metal part 61.
  • the shell 55 ' is formed by the pattern 23 of the additional layer 21 and the pattern 19 of the upper layer 5.
  • this pattern 19 is used as spacing means between the spiral 51' and the balance 43 'so as to pit the spiral spring 53' with a raquetetterie.
  • the pattern 19 is also useful as a guiding means of the hairspring 51 'by increasing the height of the shell 55'.
  • the etching on the additional layer 21 leaves complete freedom on the geometry of the spiral spring 53 '.
  • the spiral spring 53 ' may not have an open external curve but, for example, have on the end of the outer curve a bead suitable for serving as a fixed attachment point, that is to say say without the need for snowshoeing.
  • the regulating member 41 ' is able to receive a balance shaft 49 in its inside diameter.
  • the regulating member 41 ' being integral, it is not necessary to fix the balance shaft 49 to the shell 55 'and the balance 43' but only to one of the two.
  • the balance shaft 49 is preferably fixed to the inner diameter 67 of the metal portion 63 for example by driving.
  • the cavities 24 and 10 have sections of larger dimensions than the inner diameter 67 of the metal portion 63 to prevent the balance shaft 49 is in bold contact with the ferrule 55 '.
  • the balance shaft 49 thus receives force from the regulating member 41 'only, preferably, via the metal portion 63 of the hub 45' of the balance 43 '.
  • the inertia of the balance 43 ' is advantageously amplified. Indeed, the density of a metal being much greater than that of silicon, the mass of the balance 43 'is increased and, incidentally, also its inertia.
  • the method 1 comprises, after step 103 or 104, in a sixth step 109, as visible in FIG. 7, consisting of selectively etching cavities 60 and / or 62, for example, by a method of the DRIE type, with a limited depth in the lower layer 7 of silicon-based material.
  • These cavities 60, 62 make it possible to form recesses able to serve as containers for at least one metal part.
  • the cavities 60 and 62 obtained can be respectively in the form of a ring and a disc.
  • the etching on the lower layer 7 leaves complete freedom on the geometry of the cavities 60 and 62.
  • the method 1 comprises the implementation of a growth-type process galvanic or LIGA type to fill cavities 60 and / or 62 in a particular metal form.
  • the deposited metal may be, for example, gold or nickel or one of their alloys.
  • step 1 may consist in depositing a crenellated ring 64 in the cavity 60 and / or a cylinder 66 in the cavity 62.
  • the ring 64 comprises a series of pads 69 substantially in a circular arc and is intended to advantageously increase the mass of the future beam 43.
  • a characteristic of the invention therefore consists in increasing the weight of the rocker arm 43 "with the aid of metal obtained by electroplating in order to increase the inertia of the future rocker arm 43".
  • the metal deposited on the lower layer 7 has a spacing between each stud 69 able to compensate for the thermal expansions of the ring 64.
  • the cylinder 66 is intended to receive, advantageously, by driving a balance shaft 49.
  • an advantageous characteristic according to the invention consists in making the clamping of the balance shaft 49 not against the silicon-based material but on the inside diameter 70 of the metal cylinder 66 electrodeposited during step 1 10.
  • the cylinder 66 obtained by electroplating leaves all freedom as for its geometry.
  • the inner diameter 70 is not necessarily circular but, for example, polygonal which could improve the transmission of rotational force with an axis 49 of corresponding shape.
  • the method 1 may comprise, in an eighth step 1 1 1, polishing the metal deposit or deposits 64, 66 made during step 1 10 in order to make them planar.
  • a ninth step 1 12 similar to steps 105 or 108, particularly visible in FIG. 5, cavities are selectively etched, for example by a method of the DRIE type, in the lower layer 7 made of silicon-based material. These cavities make it possible to form a rocker pattern similar to the pattern 34 of the embodiment A.
  • the pattern obtained can be substantially in the form of a four-armed rim 40 ", 42". 44 ", 46".
  • the etching on the lower layer 7 leaves all freedom on the geometry of the pattern 34.
  • the number and the geometry of the arms 40 ", 42", 44 “, 46" can be different just as the rim is not necessarily circular but, for example, elliptical.
  • the arms may be slender to allow their axial deformation and / or radial in case of shock transmitted to the regulating member.
  • the rocker pattern produced in the lower layer 7 is of similar shape and substantially perpendicular to the patterns 17 and 25 made respectively during the steps 101 and 103 in the upper and additional layers 5 and 21.
  • the pendulum pattern forms, with the patterns 17 and 25 and the metal parts 64 and / or 66, the balance 43 "of the regulating member 41" whose serge 47 "therefore extends in height over all the layers 5 , 7 and 21.
  • the successive cavities thus form an inside diameter capable of receiving the balance shaft 49 of the regulating member 41.
  • the latter comprises a rocker arm 43 "whose hub 45" is connected on the one hand radially to the serge 47 “by four arms 40", 42 “, 44” and 46 “and, on the other hand, axially to the spiral 51 "which includes a spiral spring 53" and a ferrule 55 ".
  • the serge 47 is formed by the peripheral ring of the pendent pattern of the lower layer 7, but also by the patterns 25 and 17 of the respective upper and additional layers 21 and, optionally, of the metallic part. 64.
  • the shell 55 is formed by the pattern 23 of the additional layer 21 and the pattern 19 of the upper layer 5.
  • this pattern 19 is used as spacing means between the spiral 51" and the balance 43 "in order to be able, for example, to pit the spiral spring 53" by means of a racket.
  • the pattern 19 is also useful as a guide means of the spiral 51 "by increasing the height of the ferrule 55".
  • the etching on the additional layer 21 leaves complete freedom on the geometry of the spiral spring 53 ".
  • the spiral spring 53 may not have an open outer curve but, for example, have on the end of the outer curve a bead adapted to serve as a fixed attachment point, that is to say say without the need for snowshoeing.
  • the regulating member 41 " is adapted to receive a balance pin 49 in its inside diameter
  • the regulating member 41" being in one piece, it is not necessary to fix the balance shaft 49 to the 55 "ferrule and the 43" balance but only to one of the two.
  • the balance shaft 49 is fixed on the inner diameter 70 of the metal part 66 for example by driving.
  • the cavities 24 and 10 have sections of larger dimensions than the inner diameter 70 of the metal portion 66 to prevent the balance shaft 49 is in bold contact with the ferrule 55 " .
  • the balance shaft 49 thus receives force from the regulating member 41 "only, preferably, via the metal portion 66 of the hub 45" of the balance 43 ".
  • the inertia of the balance 43 is advantageously amplified, since the density of a metal being much greater than that of silicon, the mass of the balance 43" is increased and, incidentally, also its inertia.
  • the final regulating member 41, 41 'and 41 is thus assembled before being structured, that is to say before being etched and / or or modified by electrodeposition. This advantageously allows to minimize the dispersions caused by the current assemblies of a balance with a spiral.
  • regulating members 41, 41 'and 41 to be able to be produced on the same substrate 3, which allows mass production.
  • the present invention is not limited to the illustrated example but is susceptible of various variations and modifications that will occur to those skilled in the art.
  • the patterns 17 and 25 etched in steps 101 and 103 in the layers 5 and 21 may not be limited to a plane surface state but may incorporate at least one ornament in said steps for decorating at least one of the faces.
  • serge 47, 47 ', 47 which can be useful especially in the case of timepieces of the skeleton type.
  • the metal parts 63, 66 electrodeposited according to the embodiments B and C are interchanged, that is to say that the projecting portion 63 of the mode B is replaced by the integrated part 66 of the mode C or conversely (which requires only a minimal adaptation of the method 1) or even that the portion 66 integrated in the hub protrudes from the lower layer 7.
  • the metal parts 61, 64 electrodeposited in Embodiments B and C are interchanged, i.e. the projecting portion 61 of the B mode is replaced by the integrated portion 64 of the C mode or vice versa or even that the portion 64 integrated in the serge makes protrusion of the lower layer 7.
  • the method 1 can furthermore provide, a posteriori of the release step 106, a step of adapting the frequency of the regulating member 41, 41 ', 41 ". to engrave, for example by laser, recesses 68 able to modify the operating frequency of said regulator member
  • recesses 68 as illustrated in the example of FIGS. 10 and 11, could, for example, be made on one of the peripheral walls of the pattern 34 belonging to the serge 47, 47 ', 47 "and / or one of the metal parts 61, 64 electrodeposited.
  • regulating structures of the flyweight type can also be considered in order to increase the inertia and adjust the frequency.
  • a conductive layer is deposited on at least a portion of the regulator member 41, 41 ', 41 "in order to avoid isochronism problems, Such a layer may be of the type disclosed in the document EP 1 837 722 incorporated by reference in this specification.
  • a polishing step of the type of step 1 1 1 can also be carried out between step 107 and step 108. It can also be envisaged that a step of producing a metal deposit 63, 66, of the type obtained by the embodiments B or C, is not carried out on the balance but, in the case of the manufacture of the single spiral 51 '", on the additional layer 21 so as to be able to drive an axis not against the silicon-based material of the inner diameter of the shell 55 '"but against said metal deposit.

Abstract

The invention relates to a integral adjusting member (41, 41', 41") that comprises a pendulum (43, 43', 43") being in engagement with a hairspring (51, 51', 51") made in a layer of a silicon-based material (21) and including a spiral-spring (53, 53', 53") coaxially mounted on a collet. According to the invention, the collet (55, 55', 55") includes a portion (19) defining an extension protruding from said spiral-spring, made in a second layer of the silicon-based material (5) and attached to the pendulum (43, 43', 43"). The invention also relates to a timepiece including such an adjustment member, and to a related manufacture method. The invention pertains to the field of clock movement.

Description

Organe régulateur monobloc et son procédé de fabrication Monobloc regulator and method of manufacture
DOMAINE DE L'INVENTIONFIELD OF THE INVENTION
L'invention se rapporte à un organe régulateur et son procédé de fabrication et, plus particulièrement, à un organe régulateur du type balancier-spiral.The invention relates to a regulating member and its method of manufacture and, more particularly, to a regulating member of the spring-balance type.
ARRIERE PLAN DE L'INVENTIONBACKGROUND OF THE INVENTION
L'organe régulateur d'une pièce d'horlogerie comporte généralement un volant d'inertie appelé balancier et un résonateur appelé spiral. Ces pièces sont déterminantes pour la qualité de marche de la pièce d'horlogerie. En effet, elles régulent le mouvement, c'est-à-dire qu'elles contrôlent la fréquence du mouvement.The regulating member of a timepiece generally comprises an inertia flywheel called a balance wheel and a resonator called a spiral. These pieces are decisive for the running quality of the timepiece. Indeed, they regulate the movement, that is to say they control the frequency of the movement.
Le balancier et le spiral sont de nature différente ce qui rend extrêmement complexe la mise au point de l'organe régulateur, qui comprend les fabrications propres du balancier et du spiral ainsi que leur assemblage sensiblement en résonance.The balance and the hairspring are different in nature, which makes it extremely difficult to perfect the regulating organ, which includes the own fabrications of the balance and the hairspring and their assembly substantially in resonance.
Le balancier et le spiral ont ainsi été fabriqués chacun dans divers matériaux notamment afin de limiter l'influence d'un changement de température sans que les difficultés d'assemblage en résonance ne disparaissent.The balance and the hairspring have each been manufactured in various materials, in particular in order to limit the influence of a change in temperature without the resonance assembly difficulties disappearing.
RESUME DE L'INVENTIONSUMMARY OF THE INVENTION
Le but de la présente invention est de pallier tout ou partie les inconvénients cités précédemment en proposant un organe régulateur monobloc qui reste peu sensible aux changements de température et qui est obtenu à l'aide d'un procédé de fabrication qui minimise les difficultés d'assemblage. A cet effet, l'invention se rapporte à un organe régulateur monobloc comportant un balancier coopérant avec un spiral réalisé dans une couche de matériau à base de silicium et comprenant un ressort-spiral monté coaxialement sur une virole, la virole comportant une partie en prolongement faisant saillie dudit ressort-spiral et qui est réalisée dans une deuxième couche de matériau à base de silicium caractérisé en ce que la partie en prolongement de la virole du spiral est fixée sur le balancier.The object of the present invention is to overcome all or part of the aforementioned drawbacks by proposing a monobloc regulator which remains insensitive to temperature changes and which is obtained by means of a manufacturing process which minimizes the difficulties of assembly. For this purpose, the invention relates to a monobloc regulating member comprising a balance cooperating with a spiral made in a layer of silicon-based material and comprising a spiral spring coaxially mounted on a ferrule, the ferrule comprising an extension part. protruding from said spiral spring and which is made in a second layer of silicon-based material characterized in that the extension portion of the shell of the spiral is fixed on the balance.
Conformément à d'autres caractéristiques avantageuses de l'invention : - le balancier comporte un trou prolongeant le diamètre intérieur de la virole afin d'y recevoir un axe de balancier ;According to other advantageous features of the invention: - the balance has a hole extending the inner diameter of the ferrule to receive a balance shaft;
- l'axe de balancier est fixé sur le balancier ;- The axis of balance is fixed on the balance;
- l'axe de balancier est fixé sur le balancier par chassage contre un revêtement métallique réalisé au niveau dudit trou ; - la section du diamètre intérieur de la virole est plus grande que celle du trou du balancier afin d'éviter les contacts gras entre l'axe de balancier et le diamètre intérieur de la virole ;- The balance shaft is fixed on the balance by driving against a metal coating made at said hole; the cross-section of the inside diameter of the ferrule is greater than that of the balance beam hole in order to avoid greasy contacts between the balance shaft and the inside diameter of the ferrule;
- la serge du balancier est continue et comporte un dispositif d'adaptation apte à modifier le moment d'inertie du balancier ; - la serge est reliée au moyeu du balancier par au moins un bras qui est élancé afin d'autoriser sa déformation axiale et/ou radiale en cas de choc transmis sur le balancier ;the serge of the balance is continuous and comprises an adaptation device able to modify the moment of inertia of the balance; - The serge is connected to the hub of the balance by at least one arm which is slender to allow its axial deformation and / or radial in case of shock transmitted on the balance;
- le dispositif d'adaptation comporte des évidements réalisés sur la serge du balancier afin de pouvoir ajuster l'inertie dudit balancier ; - les évidements comportent un matériau de plus grande densité que celui de la serge du balancier afin d'augmenter l'inertie dudit balancier ;- The adaptation device comprises recesses made on the balance rod so as to adjust the inertia of said balance; the recesses comprise a material of greater density than that of the strut of the balance to increase the inertia of said balance;
- le dispositif d'adaptation comporte des bossages réalisés sur la serge du balancier et comportant un matériau de plus grande densité que la serge afin d'augmenter l'inertie dudit balancier ;- The adaptation device comprises bosses made on the balance rod and having a material of greater density than the serge to increase the inertia of said balance;
- ledit matériau de plus grande densité est distribué au niveau de la serge sous forme d'un anneau crénelé comportant une succession de plots écartés à intervalle régulier pour compenser la dilatation thermique dudit matériau ;said material of greater density is distributed at the level of the serge in the form of a crenellated ring comprising a succession studs spaced at regular intervals to compensate for the thermal expansion of said material;
- le balancier est réalisé dans une troisième couche de matériau à base de silicium ; - la spire interne du ressort-spiral comporte une courbe du typethe balance is made in a third layer of silicon-based material; the inner coil of the spiral spring has a curve of the type
Grossmann afin d'améliorer la concentricité du développement dudit spiral ;Grossmann to improve the concentricity of the development of said hairspring;
- le ressort-spiral comporte au moins une partie à base de dioxyde de silicium afin de le rendre plus résistant mécaniquement et d'ajuster son coefficient thermo-élastique.- The spiral spring comprises at least one portion based on silicon dioxide to make it more mechanically resistant and adjust its thermo-elastic coefficient.
Plus généralement, l'invention se rapporte également à une pièce d'horlogerie caractérisée en ce qu'elle comporte un organe régulateur monobloc conforme à l'une des variantes précédentes.More generally, the invention also relates to a timepiece characterized in that it comprises a one-piece regulating member according to one of the preceding variants.
Enfin l'invention se rapporte à un procédé de fabrication d'un organe régulateur comportant les étapes suivantes : a) se munir d'un substrat comportant une couche supérieure et une couche inférieure en matériaux à base de silicium ; b) graver sélectivement au moins une cavité dans la couche supérieure pour définir le motif d'une première partie d'une virole et d'une première partie d'un balancier en matériau à base de silicium dudit organe ; c) solidariser, sur la couche supérieure gravée du substrat, une couche supplémentaire de matériau à base de silicium ; d) graver sélectivement au moins une cavité dans la couche supplémentaire pour continuer le motif desdites premières parties de la virole et du balancier, et définir le motif d'un ressort-spiral en matériau à base de silicium dudit organe ; caractérisé en ce qu'il comporte en outre les étapes suivantes : e) graver sélectivement au moins une cavité dans la couche inférieure pour définir la dernière partie du balancier en matériau à base de silicium dudit organe ; - A -Finally, the invention relates to a method of manufacturing a regulator member comprising the following steps: a) providing a substrate comprising an upper layer and a lower layer of silicon-based materials; b) selectively etching at least one cavity in the upper layer to define the pattern of a first portion of a shell and a first portion of a rocker made of silicon-based material of said member; c) attaching, on the etched upper layer of the substrate, an additional layer of silicon-based material; d) selectively etching at least one cavity in the additional layer to continue the pattern of said first parts of the ferrule and the balance, and define the pattern of a spiral spring made of silicon-based material of said member; characterized in that it further comprises the following steps: e) selectively etching at least one cavity in the lower layer to define the last portion of the rocker made of silicon-based material of said member; - AT -
f) libérer l'organe régulateur du substrat ce qui permet d'obtenir un organe sur trois niveaux de matériaux à base de silicium.f) release the regulator member of the substrate which provides a member on three levels of silicon-based materials.
Conformément à d'autres caractéristiques avantageuses de l'invention : - après l'étape d) on réalise l'étape g) : oxyder la deuxième partie en matériau à base de silicium dudit organe afin d'ajuster son coefficient thermo-élastique mais également de la rendre mécaniquement plus résistant ;According to other advantageous features of the invention: after step d) step g) is carried out: oxidation of the second part made of silicon-based material of said member in order to adjust its thermoelastic coefficient but also to make it mechanically more resistant;
- avant l'étape e), on réalise l'étape h) : déposer sélectivement au moins une couche de métal sur la couche inférieure pour définir le motif d'au moins une partie en métal dudit organe et/ou une deuxième partie métallique destinée à recevoir par chassage un axe ;before step e), step h) is carried out: selectively depositing at least one metal layer on the lower layer to define the pattern of at least one metal part of said member and / or a second metal part intended to to receive by driving an axis;
- l'étape h) comporte l'étape i) : faire croître ledit dépôt par couches successives métalliques au moins partiellement sur la surface de la couche inférieure afin de former une partie métallique destinée à augmenter la masse du balancier en matériau à base de silicium et/ou une deuxième partie métallique destinée à recevoir par chassage un axe ; - l'étape h) comporte les étapes j) : graver sélectivement au moins une cavité dans la couche inférieure destinée à recevoir ladite au moins une partie en métal et k) : faire croître ledit dépôt par couches successives métalliques au moins partiellement dans ladite au moins une cavité afin de former une partie métallique destinée à augmenter la masse du balancier en matériau à base de silicium et/ou une deuxième partie métallique destinée à recevoir par chassage un axe ;step h) comprises step i): growing said deposition by successive metallic layers at least partially on the surface of the lower layer in order to form a metal part intended to increase the mass of the rocker made of silicon-based material; and / or a second metal part intended to receive by driving an axis; step h) comprises steps j): selectively etching at least one cavity in the lower layer intended to receive said at least one metal part and k): growing said deposition by successive metal layers at least partially in said at least one at least one cavity for forming a metal part intended to increase the mass of the rocker made of silicon-based material and / or a second metal part intended to receive a shaft by driving;
- que l'étape h) comporte la dernière étape I) : polir le dépôt métallique ; - plusieurs organes sont réalisés sur un même substrat ce qui permet une production en série. DESCRIPTION SOMMAIRE DES DESSINSthat step h) comprises the last step I): polishing the metallic deposit; - Several organs are made on the same substrate which allows a series production. SUMMARY DESCRIPTION OF THE DRAWINGS
D'autres particularités et avantages ressortiront clairement de la description qui en est faite ci-après, à titre indicatif et nullement limitatif, en référence aux dessins annexés, dans lesquels : - les figures 1 à 5 représentent des vues successives du procédé de fabrication selon l'invention ;Other features and advantages will become clear from the description which is given below, for information only and in no way limitative, with reference to the accompanying drawings, in which: - Figures 1 to 5 show successive views of the manufacturing process according to the invention;
- les figures 6 à 8 représentent des vues des étapes successives de modes de réalisation alternatifs ;FIGS. 6 to 8 show views of the successive steps of alternative embodiments;
- la figure 9 représente un schéma fonctionnel du procédé selon l'invention.- Figure 9 shows a block diagram of the method according to the invention.
- les figures 10 et 1 1 sont des représentations en perspective d'un organe régulateur monobloc selon un premier mode de réalisation ;- Figures 10 and 1 1 are perspective representations of a monobloc regulator member according to a first embodiment;
- les figures 12 et 13 sont des représentations en perspective d'un organe régulateur monobloc selon un deuxième mode de réalisation ;- Figures 12 and 13 are perspective views of a monobloc regulator member according to a second embodiment;
- les figures 14 et 15 sont des représentations en perspective d'un organe régulateur monobloc selon un troisième mode de réalisation ;FIGS. 14 and 15 are perspective views of a one-piece regulator member according to a third embodiment;
- la figure 16 est une représentation en perspective d'un spiral monobloc selon l'invention. DESCRIPTION DETAILLEE DES MODES DE REALISATION PREFERES- Figure 16 is a perspective representation of a monobloc spiral according to the invention. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
L'invention se rapporte à un procédé généralement annoté 1 destiné à fabriquer un organe régulateur 41 , 41 ', 41 " pour un mouvement de pièce d'horlogerie. Comme illustré aux figures 1 à 9, le procédé 1 comporte des étapes successives destinées à former au moins un type d'organe (51 '", 41 , 41 ', 41 ") monobloc qui peut être formé intégralement en matériaux à base de silicium.The invention relates to a generally annotated method 1 intended to manufacture a regulating member 41, 41 ', 41 "for a timepiece movement.As illustrated in FIGS. 1 to 9, the method 1 comprises successive steps intended to forming at least one type of integral member (51 '', 41, 41 ', 41' ') which can be integrally formed of silicon-based materials.
En référence aux figures 1 et 9, la première étape 100 consiste à se munir d'un substrat 3 du type silicium sur isolant (également connu sous l'acronyme anglais SOI). Le substrat 3 comporte une couche supérieure 5 et une couche inférieure 7 composées chacune d'un matériau à base de silicium. Entre les couches supérieure 5 et inférieure 7, peut s'étendre une couche intermédiaire 9 composée de dioxyde de silicium (SiO2).With reference to FIGS. 1 and 9, the first step 100 consists in providing a substrate 3 of the silicon-on-insulator type (also known by the acronym SOI). The substrate 3 comprises an upper layer 5 and a lower layer 7 each composed of a material based on silicon. Between the upper 5 and lower 7 layers, may extend an intermediate layer 9 composed of silicon dioxide (SiO 2 ).
Préférentiellement dans cette étape 100, le substrat 3 est choisi afin que la hauteur de la couche inférieure 7 corresponde à la hauteur d'une partie de l'organe régulateur final 41 , 41 ', 41 ". De plus, la couche inférieure 7 doit comporter une épaisseur suffisante afin de supporter les efforts induits par le procédé 1. Une telle épaisseur peut être par exemple comprise entre 300 et 400 μm.Preferably in this step 100, the substrate 3 is chosen so that the height of the lower layer 7 corresponds to the height of a portion of the final regulator member 41, 41 ', 41 ". have a thickness sufficient to withstand the forces induced by the method 1. Such a thickness may be for example between 300 and 400 microns.
Préférentiellement, la couche supérieure 5 est utilisée comme moyen d'espacement par rapport à la couche inférieure 7. Par conséquent, la hauteur de la couche supérieure 5 sera adaptée en fonction de la configuration de l'organe régulateur 41 , 41 ', 41 ". Selon ladite configuration, l'épaisseur de la couche supérieure 5 peut ainsi osciller, par exemple, entre 10 et 200 μm. Dans une deuxième étape 101 , comme visible à la figure 2, des cavités 10, 1 1 , 12, 13, 14 et 15 sont sélectivement gravées, par exemple par un procédé de gravure ionique réactive profonde (également connu sous l'acronyme anglais DRIE), dans la couche supérieure 5 en matériau à base de silicium. Préférentiellement, ces cavités 10, 1 1 , 12, 13, 14 et 15 permettent de former deux motifs 17, 19 définissants les contours intérieur et extérieur de parties en silicium de l'organe régulateur 41 , 41 ', 41 ".Preferably, the upper layer 5 is used as spacing means with respect to the lower layer 7. Therefore, the height of the upper layer 5 will be adapted according to the configuration of the regulating member 41, 41 ', 41 " According to said configuration, the thickness of the upper layer 5 can thus oscillate, for example, between 10 and 200 μm In a second step 101, as can be seen in FIG. 2, cavities 10, 11, 12, 13, 14 and 15 are selectively etched, for example by a deep reactive ion etching process (also known by the acronym DRIE), in the upper layer 5 of silicon-based material, preferably said cavities 10, 11, 12 , 13, 14 and 15 form two patterns 17, 19 defining the inner and outer contours of silicon parts of the regulating member 41, 41 ', 41 ".
Dans l'exemple illustré à la figure 2, les motifs 17 et 19 sont sensiblement en forme de cylindres coaxiaux à section circulaire, le motif 17 comportant un diamètre plus grand que celui du motif 19. Cependant, avantageusement selon le procédé 1 , la gravure sur la couche supérieure 5 laisse toute liberté sur la géométrie des motifs 17 et 19. Ainsi, notamment, les motifs 17 et 19 ne sont pas forcément circulaires mais, par exemple, elliptiques ou comporter un diamètre intérieur non circulaire.In the example illustrated in FIG. 2, the patterns 17 and 19 are substantially in the form of coaxial cylinders with a circular section, the pattern 17 having a larger diameter than that of the pattern 19. However, advantageously according to the method 1, etching on the upper layer 5 leaves full freedom on the geometry of the patterns 17 and 19. Thus, in particular, the patterns 17 and 19 are not necessarily circular but, for example, elliptical or have a non-circular inner diameter.
Préférentiellement, des ponts de matière 18 sont laissés afin de maintenir au substrat 3 l'organe régulateur 41 , 41 ', 41 " lors de sa fabrication. Dans l'exemple illustré à la figure 2, il y a quatre ponts de matière 18 qui subsistent respectivement entre chacune des cavités consécutives 12, 13, 14 et 15 distribuées en arc de cercle à la périphérie du motif 17. Dans une troisième étape 102, comme visible à la figure 3, une couche supplémentaire 21 en matériau à base de silicium est ajoutée au substrat 3. Préférentiellement, la couche supplémentaire 21 est fixée sur la couche supérieure 5 au moyen d'un soudage par fusion du silicium (également connu sous l'acronyme anglais SFB). L'étape 102 permet avantageusement de recouvrir la couche supérieure 5 en liant avec une très forte adhérence notamment les faces supérieures des motifs 17 et 19 sur la face inférieure de la couche supplémentaire 21. La couche supplémentaire 21 peut, par exemple, comporter une épaisseur comprise entre 100 et 150 μm. Dans une quatrième étape 103, comme visible à la figure 4, des cavités 20, 22 et 24 sont sélectivement gravées, par exemple, par un procédé du type DRIE semblable à celui de l'étape 101 , dans la couche supplémentaire 21 en matériau à base de silicium. Ces cavités 20, 22 et 24 permettent de former trois motifs 23, 25 et 27 définissants les contours intérieur et extérieur de parties en silicium de l'organe régulateur 41 , 41 ', 41 ".Preferably, bridges of material 18 are left in order to maintain the substrate 3 the regulator member 41, 41 ', 41 "during its manufacturing. In the example illustrated in FIG. 2, there are four material bridges 18 which remain respectively between each of the consecutive cavities 12, 13, 14 and 15 distributed in an arc of circle at the periphery of the pattern 17. In a third step 102 as can be seen in FIG. 3, an additional layer 21 made of silicon-based material is added to the substrate 3. Preferably, the additional layer 21 is fixed on the upper layer 5 by means of a fusion welding of the silicon (also known under the acronym SFB). Step 102 advantageously allows the upper layer 5 to be covered by bonding with a very strong adhesion, in particular the upper faces of the patterns 17 and 19 on the lower face of the additional layer 21. The additional layer 21 may, for example, comprise a thickness between 100 and 150 μm. In a fourth step 103, as visible in FIG. 4, cavities 20, 22 and 24 are selectively etched, for example, by a method of the DRIE type similar to that of step 101, in the additional layer 21 made of material silicon base. These cavities 20, 22 and 24 make it possible to form three patterns 23, 25 and 27 defining the inner and outer contours of silicon parts of the regulating member 41, 41 ', 41 ".
Dans l'exemple illustré à la figure 4, les motifs 23 et 25 sont sensiblement en forme de cylindres coaxiaux à section circulaire et, le motif 27, sensiblement en forme de spirale. Cependant, avantageusement selon le procédé 1 , la gravure sur la couche supplémentaire 21 laisse toute liberté sur la géométrie des motifs 23, 25 et 27. Ainsi, notamment, les motifs 23 et 25 ne sont pas forcément circulaires mais, par exemple, elliptiques ou comporter un diamètre intérieur non circulaire. Il en est de même, notamment, pour les diamètres intérieurs 10 et 24 qui ne sont pas forcément circulaires mais, par exemple, polygonaux ce qui pourrait permettre d'améliorer la transmission d'effort en rotation avec un axe 49 de forme correspondante. Enfin, chaque diamètre 10, 24 peut ne pas être de forme identique.In the example illustrated in FIG. 4, the patterns 23 and 25 are substantially in the form of coaxial cylinders with a circular section and, the pattern 27, substantially in the form of a spiral. However, advantageously according to the method 1, the etching on the additional layer 21 leaves complete freedom on the geometry of the patterns 23, 25 and 27. Thus, in particular, the patterns 23 and 25 are not necessarily circular but, for example, elliptical or have a non-circular inner diameter. It is the same, in particular, for the inner diameters 10 and 24 which are not necessarily circular but, for example, polygonal which could make it possible to improve the transmission of rotational force with an axis 49 of corresponding form. Finally, each diameter 10, 24 may not be of identical shape.
Préférentiellement, le motif 23 réalisé dans la couche supplémentairePreferably, the pattern 23 made in the additional layer
21 est de forme similaire et sensiblement à l'aplomb du motif 19 réalisé dans la couche supérieure 5. Cela signifie que les cavités 10 et 24 formant respectivement le diamètre intérieur des motifs 19 et 23 communiquent ensemble et sont sensiblement l'une au-dessus de l'autre. Dans l'exemple illustré aux figures 10 à 15, les motifs 23 et 19 forment la virole 55, 55', 55" de l'organe régulateur 41 , 41 ', 41 " qui s'étend en hauteur sur les couches 5 et 21.21 is of similar shape and substantially perpendicular to the pattern 19 made in the upper layer 5. This means that the cavities 10 and 24 respectively forming the inner diameter of the patterns 19 and 23 communicate together and are substantially one above the other. In the example illustrated in FIGS. 10 to 15, the units 23 and 19 form the collar 55, 55 ', 55 "of the regulating member 41, 41', 41" which extends in height on the layers 5 and 21. .
Préférentiellement, le motif 25 réalisé dans la couche supplémentaire 21 est de forme similaire et sensiblement à l'aplomb du motif 17 réalisé dans la couche supérieure 5. Dans l'exemple illustré, les motifs 25 et 17 forment une partie de la serge 47, 47', 47" du balancier 43, 43', 43" de l'organe régulateur 41 , 41 ', 41 " qui s'étend en hauteur notamment sur les couches 5 et 21. On note cependant que, dans l'exemple illustré à la figure 4, les ponts de matières 18 ne sont pas reproduits et que la cavité 22 dans la couche supplémentaire 21 forme un anneau continu au contraire des cavités 12, 13, 14 et 15 situées débouchantes sous elle à la figure 4. Préférentiellement, les motifs 23 et 27 sont gravés en même temps et forment une pièce monobloc dans la couche supplémentaire 21. Dans l'exemple illustré aux figures 10 à 15, les motifs 23 et 27 forment le ressort- spiral 53, 53', 53" et la partie haute de la virole 55, 55', 55" de l'organe régulateur 41 , 41 ', 41 ". On voit également que la courbe externe du motif 27 illustré à la figure 4 est ouverte. Cette dernière caractéristique associée à l'espacement par rapport à la couche inférieure 7 réalisé par le motif 19 permet la réalisation d'un pitonnage de ladite courbe externe à l'aide d'une raquetterie.Preferably, the pattern 25 made in the additional layer 21 is of similar shape and substantially perpendicular to the pattern 17 made in the upper layer 5. In the example illustrated, the patterns 25 and 17 form part of the serge 47, 47 ', 47 "of the balance 43, 43', 43" of the regulating member 41, 41 ', 41 "which extends in height in particular on the layers 5 and 21. Note, however, that in the illustrated example in FIG. 4, the material bridges 18 are not reproduced and that the cavity 22 in the additional layer 21 forms a continuous ring, unlike the cavities 12, 13, 14 and 15 which open out under it in FIG. 4. Preferably, the patterns 23 and 27 are etched at the same time and form a one-piece piece in the additional layer 21. In the example illustrated in FIGS. 10 to 15, the patterns 23 and 27 form the spiral spring 53, 53 ', 53 "and the upper part of the shell 55, 55 ', 55 "of the regulating member 41, 41 ', 41 ". We also see that the outer curve of the pattern 27 shown in Figure 4 is open. This last characteristic associated with the spacing with respect to the lower layer 7 produced by the pattern 19 makes it possible to embellish said external curve by means of a raquet.
Cependant, avantageusement selon le procédé 1 , la gravure sur la couche supplémentaire 21 laisse toute liberté sur la géométrie du motif 27.However, advantageously according to the method 1, the etching on the additional layer 21 leaves all freedom on the geometry of the pattern 27.
Ainsi, notamment, le motif 27 peut ne pas comporter de courbe externe ouverte mais, par exemple, comporter sur l'extrémité de la courbe externe un bourrelet apte à servir de point d'attache fixe, c'est-à-dire sans nécessité de raquetterie. Le motif 27 peut également comprendre une spire interne comportant une courbe du type Grossmann permettant d'améliorer sa concentricité de développement comme expliqué dans le document EP 1 612 627 incorporé par référence à la présente descriptionThus, in particular, the pattern 27 may not have an external curve open but, for example, have on the end of the outer curve a bead adapted to serve as a fixed attachment point, that is to say without the need for raquetry. The pattern 27 may also comprise an internal turn comprising a Grossmann type curve making it possible to improve its concentricity of development as explained in the document EP 1 612 627 incorporated with reference to the present description.
A la suite de cette quatrième étape 103, on comprend que les motifs 23 et 27 gravés dans la couche supplémentaire 21 sont uniquement reliés par le dessous du motif 23, avec une très forte adhérence, au-dessus du motif 19 gravé de la couche supérieure 5 (le motif 19 étant lui-même relié, avec une très forte adhérence, à la couche inférieure 7). Les motifs 23 et 27 ne sont donc plus en contact direct avec la couche supplémentaire 21. De même, le motif 25 n'est plus en contact direct avec la couche supplémentaire 21 mais uniquement relié, avec une très forte adhérence, au motif 17 gravé de la couche supérieure 5.Following this fourth step 103, it is understood that the patterns 23 and 27 etched in the additional layer 21 are only connected by the underside of the pattern 23, with a very strong adhesion, above the etched pattern 19 of the upper layer. 5 (the pattern 19 is itself connected, with a very strong adhesion, to the lower layer 7). The patterns 23 and 27 are therefore no longer in direct contact with the additional layer 21. Similarly, the pattern 25 is no longer in direct contact with the additional layer 21 but only connected, with a very strong adhesion, to the pattern 17 etched of the upper layer 5.
Préférentiellement comme représenté en traits interrompus à la figure 9, le procédé 1 peut comporter une cinquième étape 104 qui consiste à oxyder au moins le motif 27, c'est-à-dire le ressort-spiral 53, 53', 53" de l'organe de régulation 41 , 41 ', 41 " afin d'ajuster son coefficient thermo- élastique mais également de le rendre mécaniquement plus résistant. Une telle étape d'oxydation est expliquée notamment dans le brevet EP 1 422 436 qui est incorporé par référence à la présente description.Preferably, as represented by dashed lines in FIG. 9, the method 1 may comprise a fifth step 104 which consists in oxidizing at least the pattern 27, that is to say the spiral spring 53, 53 ', 53 "of the regulating member 41, 41 ', 41 "in order to adjust its thermoelastic coefficient but also to make it mechanically more resistant. Such an oxidation step is explained in particular in patent EP 1 422 436 which is incorporated by reference in the present description.
A ce stade, c'est-à-dire après l'étape 103 ou 104, on comprend que le procédé 1 permet avantageusement de pourvoir produire uniquement le spiral 51 '" comme visible à la figure 16. En effet, un des avantages du procédé 1 est de pouvoir adapter la hauteur du motif 19 de la virole 55, 55', 55", 55'" faisant saillie du ressort-spiral 53, 53', 53", 53'" directement en choisissant l'épaisseur de la couche supérieure 5.At this stage, that is to say after step 103 or 104, it is understood that the method 1 advantageously allows to produce only the spiral 51 '"as visible in Figure 16. Indeed, one of the advantages of Method 1 is to be able to adapt the height of the pattern 19 of the ferrule 55, 55 ', 55 ", 55'" projecting from the spiral spring 53, 53 ', 53 ", 53'" directly by choosing the thickness of the upper layer 5.
Lorsqu'un tel produit 51 '", visible à la figure 16, est souhaité, il suffit donc d'arrêter le procédé 1 à l'étape 103 ou 104 en prévoyant à l'étape intermédiaire de formation des ponts de matière. De tels ponts de matière peuvent notamment être formés soit sur le motif 19 lors de l'étape 101 ou soit sur le motif 27 à l'extrémité, par exemple, de la dernière spire lors de l'étape 103. La pénultième étape du procédé 1 pourrait alors consister à retirer la couche inférieure 7, par exemple, par attaque chimique et/ou mécanique. Enfin, dans l'étape 106, le spiral 51 '" ainsi obtenu serait libéré.When such a product 51 '", visible in FIG. 16, is desired, it is therefore sufficient to stop the process 1 at step 103 or 104 by providing at the intermediate stage of formation of material bridges. material bridges may in particular be formed either on the pattern 19 during step 101 or on the pattern 27 at the end, for example, of the last turn in step 103. The penultimate step of method 1 could then consist of removing the lower layer 7, for example, by etching and / or mechanical. Finally, in step 106, the hairspring 51 '' thus obtained would be released.
Avantageusement selon l'invention, si un organe régulateur 41 , 41 ', 41 " est préféré, après la quatrième étape 103 ou préférentiellement après la cinquième étape 104, le procédé 1 peut comporter trois modes de réalisations A, B et C comme illustré à la figure 9. Cependant, chacun des trois modes de réalisation A, B et C se termine par la même étape finale 106 consistant à libérer du substrat 3 l'organe régulateur 41 , 41 ', 41 " fabriqué.Advantageously according to the invention, if a regulating member 41, 41 ', 41 "is preferred, after the fourth step 103 or preferentially after the fifth step 104, the method 1 may comprise three embodiments A, B and C as illustrated in FIG. However, each of the three embodiments A, B and C ends with the same final step 106 of freeing the substrate 3 the regulating member 41, 41 ', 41 "manufactured.
Avantageusement, l'étape 106 de libération peut alors être simplement réalisée en fournissant un effort à l'organe régulateur 41 , 41 ', 41 " apte à casser ses ponts de matière 18. Cet effort peut, par exemple, être généré manuellement par un opérateur ou par usinage.Advantageously, the release step 106 can then be simply performed by providing a force to the regulating member 41, 41 ', 41 "capable of breaking its material bridges 18. This effort can, for example, be generated manually by a operator or by machining.
Selon le mode de réalisation A, dans une sixième étape 105, comme visible à la figure 5, des cavités 26, 28, 29, 30, 31 et 32 sont sélectivement gravées, par exemple, par un procédé du type DRIE semblable à celui des étapes 101 et 103, dans la couche inférieure 7 en matériau à base de silicium. Ces cavités 26, 28, 29, 30, 31 et 32 permettent de former un motif 34 définissant les contours intérieur et extérieur d'une partie en silicium de l'organe régulateur 41.According to the embodiment A, in a sixth step 105, as visible in FIG. 5, cavities 26, 28, 29, 30, 31 and 32 are selectively etched, for example, by a method of the DRIE type similar to that of the steps 101 and 103, in the lower layer 7 made of silicon-based material. These cavities 26, 28, 29, 30, 31 and 32 make it possible to form a pattern 34 defining the inner and outer contours of a silicon part of the regulating member 41.
Dans l'exemple illustré à la figure 5, le motif 34 est sensiblement en forme de jante à quatre bras 40, 42, 44, 46. Cependant, avantageusement selon le procédé 1 , la gravure sur la couche inférieure 7 laisse toute liberté sur la géométrie du motif 34. Ainsi, notamment, le nombre et la géométrie des bras peuvent être différents tout comme la jante n'est pas forcément circulaire mais, par exemple, elliptique. De plus, les bras 40, 42, 44, 46 peuvent être plus élancés afin d'autoriser leur déformation axiale et/ou radiale en cas de choc transmis sur l'organe régulateur. Préférentiellement, une partie du motif 34 réalisé dans la couche inférieure 7 est de forme similaire et sensiblement à l'aplomb des motifs 17 et 25 réalisés respectivement dans les couches supérieure 5 et supplémentaire 21. Dans l'exemple illustré à la figure 5, le motif 34 forme, avec les motifs 17 et 25, le balancier 43 de l'organe régulateur 41 dont la serge 47 s'étend donc en hauteur sur la totalité des couches 5, 7 et 21.In the example illustrated in FIG. 5, the pattern 34 is substantially in the form of a four-armed rim 40, 42, 44, 46. However, advantageously according to the method 1, the etching on the lower layer 7 leaves all the freedom on the pattern geometry 34. Thus, in particular, the number and the geometry of the arms can be different just as the rim is not necessarily circular but, for example, elliptical. In addition, the arms 40, 42, 44, 46 may be slender in order to allow their axial and / or radial deformation in the event of shock transmitted to the regulating member. Preferably, part of the pattern 34 made in the lower layer 7 is of similar shape and substantially vertically above the patterns 17 and 25 made respectively in the upper and additional layers 5 and 21. In the example illustrated in FIG. pattern 34 forms, with the patterns 17 and 25, the balance 43 of the regulating member 41, the serge 47 therefore extends in height over all of the layers 5, 7 and 21.
De plus, préférentiellement, la cavité 26 du motif 34 est sensiblement en prolongement des cavités 10 et 24 formant le diamètre intérieur des motifs 19 et 23. Dans l'exemple illustré, les cavités successives 24, 10 et 26 forment ainsi un diamètre intérieur apte à recevoir l'axe de balancier 49 de l'organe régulateur 41. On note enfin que, dans l'exemple illustré à la figure 5, les ponts de matières 18 ne sont pas reproduits dans la couche inférieure 7 et que la cavité 28, à la manière de la cavité 22, forme un anneau continu au contraire des cavités 12, 13, 14 et 15 situées débouchantes sous elle à la figure 5.In addition, preferably, the cavity 26 of the pattern 34 is substantially in extension of the cavities 10 and 24 forming the inner diameter of the patterns 19 and 23. In the illustrated example, the successive cavities 24, 10 and 26 thus form a suitable internal diameter. receiving the balance shaft 49 of the regulating member 41. Finally, it is noted that, in the example illustrated in FIG. 5, the material bridges 18 are not reproduced in the lower layer 7 and that the cavity 28, in the manner of the cavity 22, forms a continuous ring in contrast to the cavities 12, 13, 14 and 15 which open out beneath it in FIG.
A la suite de cette sixième étape 105, on comprend que le motif 34 gravé dans la couche inférieure 7 est uniquement relié, avec une très forte adhérence, aux motifs 17 et 19 gravés de la couche supérieure 5. Le motif 34 n'est donc plus en contact direct avec la couche inférieure 7. A la suite de l'étape finale 106 expliquée ci-dessus, on obtient donc, à l'aide du premier mode de réalisation A, un organe régulateur 41 monobloc formé intégralement en matériaux à base de silicium, comme visible aux figures 10 et 1 1. On comprend donc qu'il n'y a plus de problème d'assemblage car il est directement réalisé pendant la fabrication de l'organe régulateur 41. Ce dernier comprend un balancier 43 dont le moyeu 45 est raccordé d'une part radialement à la serge 47 par quatre bras 40, 42, 44 et 46 et, d'autre part, axialement, au spiral 51 qui comprend un ressort- spiral 53 et une virole 55.As a result of this sixth step 105, it is understood that the pattern 34 etched in the lower layer 7 is only connected, with a very strong adhesion, to the patterns 17 and 19 etched from the upper layer 5. The pattern 34 is therefore more in direct contact with the lower layer 7. As a result of the final step 106 explained above, therefore, using the first embodiment A, a monoblock regulator 41 formed integrally of of silicon, as can be seen in FIGS. 10 and 1 1. It is thus clear that there is no longer any problem of assembly because it is directly carried out during the manufacture of the regulating member 41. The latter comprises a balance 43 of which the hub 45 is connected on the one hand radially to the serge 47 by four arms 40, 42, 44 and 46 and, on the other hand, axially to the spiral 51 which comprises a spiral spring 53 and a ferrule 55.
Comme expliqué ci-dessus, la serge 47 est formée par l'anneau périphérique du motif 34 de la couche inférieure 7 mais également par les motifs 17 et 25 des couches respectives supérieure 5 et supplémentaire 21. De plus, la virole 55 est formée par le motif 23 de la couche supplémentaire 21 et du motif 19 de la couche supérieure 5. Préférentiellement, ce motif 19 est utilisé comme moyen d'espacement entre le spiral 51 et le balancier 43 afin de pouvoir, par exemple, pitonner le ressort-spiral 53 à l'aide d'une raquetterie. Le motif 19 est également utile comme moyen de guidage du spiral 51 en augmentant la hauteur de la virole 55.As explained above, the serge 47 is formed by the peripheral ring of the pattern 34 of the lower layer 7 but also by the patterns 17 and 25 of the respective upper and additional layers 21. In addition, the ferrule 55 is formed by the pattern 23 of the additional layer 21 and the pattern 19 of the upper layer 5. Preferably, this pattern 19 is used as spacing means between the spiral 51 and the balance 43 to be able to for example, punctuating the spiral spring 53 with a raquet. The pattern 19 is also useful as a guide means of the hairspring 51 by increasing the height of the shell 55.
Cependant, avantageusement selon le procédé 1 , la gravure sur la couche supplémentaire 21 laisse toute liberté sur la géométrie du ressort- spiral 53. Ainsi, notamment, le ressort-spiral 53 peut ne pas comporter de courbe externe ouverte mais, par exemple, comporter sur l'extrémité de la courbe externe un bourrelet apte à servir de point d'attache fixe, c'est-à-dire sans nécessité de raquetterie.However, advantageously according to the method 1, the etching on the additional layer 21 leaves complete freedom on the geometry of the spiral spring 53. Thus, in particular, the spiral spring 53 may not have an open external curve but, for example, comprise on the end of the outer curve a bead adapted to serve as a fixed attachment point, that is to say without the need for raquetry.
Préférentiellement, l'organe régulateur 41 est apte à recevoir un axe de balancier 49 par les cavités 24, 10 et 26. Avantageusement selon l'invention, l'organe régulateur 41 étant monobloc, il n'est pas nécessaire de fixer l'axe de balancier 49 à la virole 55 et au balancier 43 mais uniquement à l'un des deux.Preferably, the regulating member 41 is adapted to receive a balance shaft 49 through the cavities 24, 10 and 26. Advantageously according to the invention, the regulating member 41 being in one piece, it is not necessary to fix the axis balance 49 to the ferrule 55 and balance 43 but only to one of them.
Préférentiellement, l'axe de balancier 49 est fixé sur le diamètre intérieur 26 du balancier 43 par exemple à l'aide de moyens élastiques 48 gravés dans le moyeu 45 à base de silicium lors de l'étape 105. De tels moyens élastiques 48 peuvent, par exemple, prendre la forme de ceux divulgués dans les figures 1 OA à 1 OE du brevet EP 1 655 642 ou ceux divulgués dans les figures 1 , 3 et 5 du brevet EP 1 584 994, lesquels brevets sont incorporés par référence à la présente description. De plus, de manière préférée, les cavités 24 et 10 comportent des sections de plus grandes dimensions que celle de la cavité 26 afin d'éviter que l'axe de balancier 49 soit en contact gras avec la virole 55.Preferably, the balance shaft 49 is fixed on the inner diameter 26 of the rocker arm 43, for example by means of elastic means 48 etched into the silicon-based hub 45 during the step 105. Such elastic means 48 can for example, take the form of those disclosed in Figures 1 OA to 1 OE of EP 1 655 642 or those disclosed in Figures 1, 3 and 5 of EP 1 584 994, which patents are incorporated by reference to the this description. In addition, preferably, the cavities 24 and 10 have sections of larger dimensions than that of the cavity 26 to prevent the balance shaft 49 is in bold contact with the ferrule 55.
On comprend donc que l'effort du spiral 51 est soumis au balancier 43 uniquement par la virole 55 et inversement car ils sont tous trois formés de manière monobloc. L'axe de balancier 49 ne reçoit donc d'effort de l'organe régulateur 41 que par l'intermédiaire du moyeu 45 du balancier 43. Selon un second mode de réalisation B, le procédé 1 comporte, après l'étape 103 ou 104, une sixième étape 107, comme visible à la figureIt is therefore understood that the force of the spiral 51 is subjected to the rocker 43 only by the ferrule 55 and vice versa because they are all three integrally formed. The balance shaft 49 thus receives force from the regulating member 41 only through the hub 45 of the balance 43. According to a second embodiment B, the method 1 comprises, after the step 103 or 104, a sixth step 107, as visible in FIG.
6, consistant à mettre en œuvre un processus du type LIGA (acronyme très connu provenant de l'allemand « rόntgenLIthographie, Galvanoformung & Abformung »). Un tel processus comporte une succession d'étapes permettant d'électrodéposer selon une forme particulière un métal sur la couche inférieure 7 du substrat 3 à l'aide d'une résine photostructurée. Ce processus du type LIGA étant très connu, il ne sera pas d'avantage détaillé ci-après. Préférentiellement, le métal déposé peut être, par exemple, de l'or ou du nickel ou bien encore un de leurs alliages.6, consisting in implementing a process of the LIGA type (a well-known acronym derived from the German "rόntgenLIthographie, Galvanoformung & Abformung"). Such a process comprises a succession of steps making it possible to electrodeposit in a particular form a metal on the lower layer 7 of the substrate 3 with the aid of a photostructured resin. As this process of the LIGA type is well known, it will not be more detailed below. Preferably, the deposited metal may be, for example, gold or nickel or one of their alloys.
Dans l'exemple illustré à la figure 6, l'étape 107 peut consister à déposer un anneau crénelé 61 et/ou un cylindre 63. Dans l'exemple illustré à la figure 6, l'anneau 61 comporte une série de plots 65 sensiblement en arc de cercle et est destiné à, avantageusement, augmenter la masse du futur balancier 43'. En effet, un des avantages du silicium est sa faible sensibilité aux variations de température. Cependant, il possède l'inconvénient d'avoir une faible densité. Une première caractéristique de l'invention consiste donc à augmenter la masse du balancier 43' à l'aide de métal obtenu par électrodéposition afin d'augmenter l'inertie du futur balancier 43'. Toutefois, afin de garder les avantages du silicium, le métal déposé sur la couche inférieure 7 comporte un écartement entre chaque plot 65 apte à compenser les dilatations thermiques de l'anneau 61.In the example illustrated in FIG. 6, step 107 can consist in depositing a crenellated ring 61 and / or a cylinder 63. In the example illustrated in FIG. 6, the ring 61 comprises a series of pads 65 substantially in an arc and is intended to advantageously increase the mass of the future beam 43 '. Indeed, one of the advantages of silicon is its low sensitivity to temperature variations. However, it has the disadvantage of having a low density. A first characteristic of the invention is therefore to increase the mass of the balance 43 'with the aid of metal obtained by electroplating in order to increase the inertia of the future balance 43'. However, in order to keep the advantages of silicon, the metal deposited on the lower layer 7 has a spacing between each pad 65 able to compensate for the thermal expansion of the ring 61.
Dans l'exemple illustré à la figure 6, le cylindre 63 est destiné à recevoir, avantageusement, par chassage un axe de balancier 49. En effet, un autre inconvénient du silicium réside dans ses très faibles zones élastique et plastique ce qui le rend très cassant. Une autre caractéristique de l'invention consiste donc à réaliser le serrage de l'axe de balancier 49 non pas contre le matériau à base de silicium du balancier 43' mais sur le diamètre intérieur 67 du cylindre métallique 63 électrodéposé lors de l'étape 107. Avantageusement selon le procédé 1 , le cylindre 63 obtenu par électrodéposition laisse toute liberté quant à sa géométrie. Ainsi, notamment, le diamètre intérieur 67 n'est pas forcément circulaire mais, par exemple, polygonal ce qui pourrait permettre d'améliorer la transmission d'effort en rotation avec un axe 49 de forme correspondante.In the example illustrated in FIG. 6, the cylinder 63 is intended to receive, advantageously, by driving a balance shaft 49. Indeed, another disadvantage of silicon lies in its very weak elastic and plastic zones, which makes it very brittle. Another feature of the invention is thus to achieve the clamping of the balance shaft 49 not against the silicon-based material of the balance 43 'but on the inner diameter 67 of the metal cylinder 63 electrodeposited during step 107 Advantageously according to method 1, the cylinder 63 obtained by electroplating leaves full freedom as to its geometry. So, in particular, the internal diameter 67 is not necessarily circular but, for example, polygonal which could improve the transmission of rotational force with an axis 49 of corresponding shape.
Dans une septième étape 108, similaire à l'étape 105 visible à la figure 5, des cavités sont sélectivement gravées, par exemple, par un procédé du type DRIE, dans la couche inférieure 7 en matériau à base de silicium. Ces cavités permettent de former un motif de balancier semblable au motif 34 du mode de réalisation A. Comme illustré dans l'exemple des figures 12 et 13, le motif obtenu peut être sensiblement en forme de jante à quatre bras 40', 42', 44', 46'. Cependant, avantageusement selon le procédé 1 , la gravure sur la couche inférieure 7 laisse toute liberté sur la géométrie du motif 34. Ainsi, notamment, le nombre et la géométrie des bras peuvent être différents tout comme la jante n'est pas forcément circulaire mais, par exemple, elliptique. De plus, les bras 40', 42', 44', 46' peuvent être plus élancés afin d'autoriser leur déformation axiale et/ou radiale en cas de choc transmis sur l'organe régulateur.In a seventh step 108, similar to the step 105 visible in FIG. 5, cavities are selectively etched, for example by a DRIE method, in the lower layer 7 made of silicon-based material. These cavities make it possible to form a rocker pattern similar to the pattern 34 of the embodiment A. As illustrated in the example of FIGS. 12 and 13, the pattern obtained can be substantially in the form of a four-armed rim 40 ', 42'. 44 ', 46'. However, advantageously according to the method 1, the etching on the lower layer 7 leaves all freedom on the geometry of the pattern 34. Thus, in particular, the number and the geometry of the arms can be different just as the rim is not necessarily circular but for example, elliptical. In addition, the arms 40 ', 42', 44 ', 46' may be slender in order to allow their axial and / or radial deformation in the event of shock transmitted to the regulating member.
Préférentiellement, une partie du motif de balancier réalisé dans la couche inférieure 7 est de forme similaire et sensiblement à l'aplomb des motifs 17 et 25 réalisés respectivement lors des étapes 101 et 103 dans les couches supérieure 5 et supplémentaire 21. Dans l'exemple illustré aux figures 12 et 13, le motif de balancier forme, avec les motifs 17 et 25 et les parties métalliques 61 et/ou 63, le balancier 43' de l'organe régulateur 41 ' dont la serge 47' s'étend donc en hauteur sur la totalité des couches 5, 7 et 21 et des parties métalliques 61 et/ou 63. De plus, préférentiellement, comme dans le mode de réalisation A, les cavités successives forment ainsi un diamètre intérieur apte à recevoir l'axe de balancier 49 de l'organe régulateur 41 '. On note enfin que les ponts de matières 18 peuvent ne pas être non plus reproduits dans la couche inférieure 7. A la suite de cette septième étape 108, on comprend que le motif de balancier gravé dans la couche inférieure 7 est uniquement relié, avec une très forte adhérence, aux motifs 17 et 19 de la couche supérieure 5 gravés lors de l'étape 101. Le motif de balancier n'est donc plus en contact direct avec la couche inférieure 7.Preferably, a part of the rocker pattern produced in the lower layer 7 is of similar shape and substantially vertically above the patterns 17 and 25 made respectively during the steps 101 and 103 in the upper and additional layers 5 and 21. In the example illustrated in Figures 12 and 13, the pendulum pattern forms, with the patterns 17 and 25 and the metal parts 61 and / or 63, the balance 43 'of the regulating member 41' whose serge 47 'therefore extends into height over all the layers 5, 7 and 21 and the metal parts 61 and / or 63. In addition, preferably, as in embodiment A, the successive cavities thus form an inner diameter adapted to receive the balance shaft 49 of the regulator 41 '. Finally, it can be noted that material bridges 18 may also not be reproduced in the lower layer 7. As a result of this seventh step 108, it will be understood that the rocker pattern engraved in the lower layer 7 is only connected with a very strong adhesion to the patterns 17 and 19 of the upper layer 5 etched in step 101. The pendulum pattern is no longer in direct contact with the lower layer 7.
A la suite de l'étape finale 106 expliquée ci-dessus, on obtient donc, à l'aide du second mode de réalisation B, un organe régulateur 41 ' monobloc formé en matériaux à base de silicium avec une ou deux partiesAs a result of the final step 106 explained above, therefore, using the second embodiment B, a one-piece regulating member 41 'formed of silicon-based materials with one or two parts is obtained.
61 , 63 en métal comme visible aux figures 12 et 13. On comprend donc qu'il n'y a plus de problème d'assemblage car il est directement réalisé pendant la fabrication de l'organe régulateur 41 '. Ce dernier comprend un balancier 43' dont le moyeu 45' est raccordé d'une part radialement à la serge 47' par quatre bras 40', 42', 44' et 46' et, d'autre part, axialement, au spiral 51 ' qui comprend un ressort-spiral 53' et une virole 55'.61, 63 metal as shown in Figures 12 and 13. It is therefore understood that there is more assembly problem because it is directly achieved during the manufacture of the regulating member 41 '. The latter comprises a rocker arm 43 'whose hub 45' is connected on the one hand radially to the serge 47 'by four arms 40', 42 ', 44' and 46 'and, on the other hand, axially to the spiral 51 which comprises a spiral spring 53 'and a ferrule 55'.
Comme expliqué ci-dessus, la serge 47' est formée par l'anneau périphérique du motif de balancier de la couche inférieure 7 mais également par les motifs 25 et 17 des couches respectives supérieure 5 et supplémentaire 21 et, éventuellement, de la partie métallique 61. De plus, la virole 55' est formée par le motif 23 de la couche supplémentaire 21 et du motif 19 de la couche supérieure 5. Préférentiellement, ce motif 19 est utilisé comme moyen d'espacement entre le spiral 51 ' et le balancier 43' afin de pouvoir pitonner le ressort-spiral 53' à l'aide d'une raquetterie. Le motif 19 est également utile comme moyen de guidage du spiral 51 ' en augmentant la hauteur de la virole 55'.As explained above, the serge 47 'is formed by the peripheral ring of the balance pattern of the lower layer 7 but also by the patterns 25 and 17 of the respective upper and additional layers 21 and, optionally, the metal part 61. In addition, the shell 55 'is formed by the pattern 23 of the additional layer 21 and the pattern 19 of the upper layer 5. Preferably, this pattern 19 is used as spacing means between the spiral 51' and the balance 43 'so as to pit the spiral spring 53' with a raquetetterie. The pattern 19 is also useful as a guiding means of the hairspring 51 'by increasing the height of the shell 55'.
Cependant, avantageusement selon le procédé 1 , la gravure sur la couche supplémentaire 21 laisse toute liberté sur la géométrie du ressort- spiral 53'. Ainsi, notamment, le ressort-spiral 53' peut ne pas comporter de courbe externe ouverte mais, par exemple, comporter sur l'extrémité de la courbe externe un bourrelet apte à servir de point d'attache fixe, c'est-à-dire sans nécessité de raquetterie.However, advantageously according to the method 1, the etching on the additional layer 21 leaves complete freedom on the geometry of the spiral spring 53 '. Thus, in particular, the spiral spring 53 'may not have an open external curve but, for example, have on the end of the outer curve a bead suitable for serving as a fixed attachment point, that is to say say without the need for snowshoeing.
Préférentiellement, l'organe régulateur 41 ' est apte à recevoir un axe de balancier 49 dans son diamètre intérieur. Avantageusement selon l'invention, l'organe régulateur 41 ' étant monobloc, il n'est pas nécessaire de fixer l'axe de balancier 49 à la virole 55' et au balancier 43' mais uniquement à l'un des deux.Preferably, the regulating member 41 'is able to receive a balance shaft 49 in its inside diameter. Advantageously according to the invention, the regulating member 41 'being integral, it is not necessary to fix the balance shaft 49 to the shell 55 'and the balance 43' but only to one of the two.
Dans l'exemple illustré aux figures 12 et 13, l'axe de balancier 49 est fixé, de manière préférée, sur le diamètre intérieur 67 de la partie métallique 63 par exemple par chassage. De plus, préférentiellement, les cavités 24 et 10 comportent des sections de plus grandes dimensions que celle du diamètre intérieur 67 de la partie métallique 63 afin d'éviter que l'axe de balancier 49 soit en contact gras avec la virole 55'.In the example illustrated in Figures 12 and 13, the balance shaft 49 is preferably fixed to the inner diameter 67 of the metal portion 63 for example by driving. In addition, preferably, the cavities 24 and 10 have sections of larger dimensions than the inner diameter 67 of the metal portion 63 to prevent the balance shaft 49 is in bold contact with the ferrule 55 '.
On comprend donc que l'effort du spiral 51 ' est soumis au balancier 43' uniquement par la virole 55' et inversement car ils sont tous trois formés de manière monobloc. L'axe de balancier 49 ne reçoit donc d'effort de l'organe régulateur 41 ' que, préférentiellement, par l'intermédiaire de la partie métallique 63 du moyeu 45' du balancier 43'.It is therefore understood that the force of the spiral 51 'is subjected to the balance 43' only by the ferrule 55 'and vice versa because they are all three integrally formed. The balance shaft 49 thus receives force from the regulating member 41 'only, preferably, via the metal portion 63 of the hub 45' of the balance 43 '.
De plus, dans la mesure où une partie métallique 61 a été déposée, l'inertie du balancier 43' est avantageusement amplifiée. En effet, la densité d'un métal étant beaucoup plus grande que celle du silicium, la masse du balancier 43' est augmentée et, incidemment, également son inertie.In addition, insofar as a metal part 61 has been deposited, the inertia of the balance 43 'is advantageously amplified. Indeed, the density of a metal being much greater than that of silicon, the mass of the balance 43 'is increased and, incidentally, also its inertia.
Selon un troisième mode de réalisation C, le procédé 1 comporte, après l'étape 103 ou 104, dans une sixième étape 109, comme visible à la figure 7, consistant à sélectivement graver des cavités 60 et/ou 62, par exemple, par un procédé du type DRIE, selon une profondeur limitée dans la couche inférieure 7 en matériau à base de silicium. Ces cavités 60, 62 permettent de former des évidements aptes à servir de contenant pour au moins une partie métallique. Comme dans l'exemple illustré à la figure 7, les cavités 60 et 62 obtenues peuvent être respectivement en forme d'anneau et de disque. Cependant, avantageusement selon le procédé 1 , la gravure sur la couche inférieure 7 laisse toute liberté sur la géométrie des cavités 60 et 62.According to a third embodiment C, the method 1 comprises, after step 103 or 104, in a sixth step 109, as visible in FIG. 7, consisting of selectively etching cavities 60 and / or 62, for example, by a method of the DRIE type, with a limited depth in the lower layer 7 of silicon-based material. These cavities 60, 62 make it possible to form recesses able to serve as containers for at least one metal part. As in the example illustrated in FIG. 7, the cavities 60 and 62 obtained can be respectively in the form of a ring and a disc. However, advantageously according to the method 1, the etching on the lower layer 7 leaves complete freedom on the geometry of the cavities 60 and 62.
Dans une septième étape 1 10, comme illustré à la figure 8, le procédé 1 comporte la mise en œuvre d'un processus du type croissance galvanique ou du type LIGA permettant de combler les cavités 60 et/ou 62 selon une forme métallique particulière. Préférentiellement, le métal déposé peut être, par exemple, de l'or ou du nickel ou bien encore un de leurs alliages. Dans l'exemple illustré à la figure 8, l'étape 1 10 peut consister à déposer un anneau crénelé 64 dans la cavité 60 et/ou un cylindre 66 dans la cavité 62. De plus, dans l'exemple illustré à la figure 8, l'anneau 64 comporte une série de plots 69 sensiblement en arc de cercle et est destinée à, avantageusement, augmenter la masse du futur balancier 43". En effet, comme déjà expliqué ci-dessus, un inconvénient du silicium réside dans sa faible densité. Ainsi comme pour le mode de réalisation B, une caractéristique de l'invention consiste donc à augmenter la masse du balancier 43" à l'aide de métal obtenu par électrodéposition afin d'augmenter l'inertie du futur balancier 43". Toutefois, afin de garder les avantages du silicium, le métal déposé sur la couche inférieure 7 comporte un écartement entre chaque plot 69 apte à compenser les dilatations thermiques de l'anneau 64.In a seventh step 1 10, as illustrated in FIG. 8, the method 1 comprises the implementation of a growth-type process galvanic or LIGA type to fill cavities 60 and / or 62 in a particular metal form. Preferably, the deposited metal may be, for example, gold or nickel or one of their alloys. In the example illustrated in FIG. 8, step 1 may consist in depositing a crenellated ring 64 in the cavity 60 and / or a cylinder 66 in the cavity 62. In addition, in the example illustrated in FIG. , the ring 64 comprises a series of pads 69 substantially in a circular arc and is intended to advantageously increase the mass of the future beam 43. Indeed, as already explained above, a disadvantage of silicon lies in its low Thus, as for embodiment B, a characteristic of the invention therefore consists in increasing the weight of the rocker arm 43 "with the aid of metal obtained by electroplating in order to increase the inertia of the future rocker arm 43". , in order to keep the advantages of silicon, the metal deposited on the lower layer 7 has a spacing between each stud 69 able to compensate for the thermal expansions of the ring 64.
Dans l'exemple illustré à la figure 8, le cylindre 66 est destiné à recevoir, avantageusement, par chassage un axe de balancier 49. En effet, comme déjà expliqué ci-dessus, une caractéristique avantageuse selon l'invention consiste à réaliser le serrage de l'axe de balancier 49 non pas contre le matériau à base de silicium mais sur le diamètre intérieur 70 du cylindre métallique 66 électrodéposé lors de l'étape 1 10. Avantageusement selon le procédé 1 , le cylindre 66 obtenu par électrodéposition laisse toute liberté quant à sa géométrie. Ainsi, notamment, le diamètre intérieur 70 n'est pas forcément circulaire mais, par exemple, polygonal ce qui pourrait permettre d'améliorer la transmission d'effort en rotation avec un axe 49 de forme correspondante.In the example illustrated in FIG. 8, the cylinder 66 is intended to receive, advantageously, by driving a balance shaft 49. Indeed, as already explained above, an advantageous characteristic according to the invention consists in making the clamping of the balance shaft 49 not against the silicon-based material but on the inside diameter 70 of the metal cylinder 66 electrodeposited during step 1 10. Advantageously according to method 1, the cylinder 66 obtained by electroplating leaves all freedom as for its geometry. Thus, in particular, the inner diameter 70 is not necessarily circular but, for example, polygonal which could improve the transmission of rotational force with an axis 49 of corresponding shape.
Préférentiellement, le procédé 1 peut comporter, dans une huitième étape 1 1 1 , consistant à polir le ou les dépôts métalliques 64, 66 réalisés lors de l'étape 1 10 afin de les rendre plans. Dans une neuvième étape 1 12, similaire aux étapes 105 ou 108 notamment visible à la figure 5, des cavités sont sélectivement gravées, par exemple, par un procédé du type DRIE, dans la couche inférieure 7 en matériau à base de silicium. Ces cavités permettent de former un motif de balancier semblable au motif 34 du mode de réalisation A. Comme illustré dans l'exemple des figures 14 et 15, le motif obtenu peut être sensiblement en forme de jante à quatre bras 40", 42", 44", 46". Cependant, avantageusement selon le procédé 1 , la gravure sur la couche inférieure 7 laisse toute liberté sur la géométrie du motif 34. Ainsi, notamment, le nombre et la géométrie des bras 40", 42", 44", 46" peuvent être différents tout comme la jante n'est pas forcément circulaire mais, par exemple, elliptique. De plus, les bras peuvent être plus élancés afin d'autoriser leur déformation axiale et/ou radiale en cas de choc transmis sur l'organe régulateur. Préférentiellement, le motif de balancier réalisé dans la couche inférieure 7 est de forme similaire et sensiblement à l'aplomb des motifs 17 et 25 réalisés respectivement lors des étapes 101 et 103 dans les couches supérieure 5 et supplémentaire 21. Dans l'exemple illustré, le motif de balancier forme, avec les motifs 17 et 25 et les parties métalliques 64 et/ou 66, le balancier 43" de l'organe régulateur 41 " dont la serge 47" s'étend donc en hauteur sur la totalité des couches 5, 7 et 21.Preferably, the method 1 may comprise, in an eighth step 1 1 1, polishing the metal deposit or deposits 64, 66 made during step 1 10 in order to make them planar. In a ninth step 1 12, similar to steps 105 or 108, particularly visible in FIG. 5, cavities are selectively etched, for example by a method of the DRIE type, in the lower layer 7 made of silicon-based material. These cavities make it possible to form a rocker pattern similar to the pattern 34 of the embodiment A. As illustrated in the example of FIGS. 14 and 15, the pattern obtained can be substantially in the form of a four-armed rim 40 ", 42". 44 ", 46". However, advantageously according to the method 1, the etching on the lower layer 7 leaves all freedom on the geometry of the pattern 34. Thus, in particular, the number and the geometry of the arms 40 ", 42", 44 ", 46" can be different just as the rim is not necessarily circular but, for example, elliptical. In addition, the arms may be slender to allow their axial deformation and / or radial in case of shock transmitted to the regulating member. Preferably, the rocker pattern produced in the lower layer 7 is of similar shape and substantially perpendicular to the patterns 17 and 25 made respectively during the steps 101 and 103 in the upper and additional layers 5 and 21. In the illustrated example, the pendulum pattern forms, with the patterns 17 and 25 and the metal parts 64 and / or 66, the balance 43 "of the regulating member 41" whose serge 47 "therefore extends in height over all the layers 5 , 7 and 21.
De plus, préférentiellement, comme dans les modes de réalisation A et B, les cavités successives forment ainsi un diamètre intérieur apte à recevoir l'axe de balancier 49 de l'organe régulateur 41 ". On note enfin que les ponts de matières 18 ne sont pas non plus reproduits dans la couche inférieure 7.In addition, preferentially, as in embodiments A and B, the successive cavities thus form an inside diameter capable of receiving the balance shaft 49 of the regulating member 41. Finally, it is noted that the material bridges 18 are also not reproduced in the lower layer 7.
A la suite de cette neuvième étape 1 12, on comprend que le motif de balancier gravé dans la couche inférieure 7 est uniquement relié, avec une très forte adhérence, aux motifs 17 et 19 de la couche supérieure 5 gravés lors de l'étape 101. Le motif de balancier n'est donc plus en contact direct avec la couche inférieure 7. A la suite de l'étape finale 106 expliquée ci-dessus, on obtient donc un organe régulateur 41 " monobloc formé en matériaux à base de silicium avec une ou deux parties 64, 66 en métal comme visible aux figures 14 et 15. On comprend donc qu'il n'y a plus de problème d'assemblage car il est directement réalisé pendant la fabrication de l'organe régulateur 41 ". Ce dernier comprend un balancier 43" dont le moyeu 45" est raccordé d'une part radialement à la serge 47" par quatre bras 40", 42", 44" et 46" et, d'autre part, axialement, au spiral 51 " qui comprend un ressort-spiral 53" et une virole 55". Comme expliqué ci-dessus, la serge 47" est formée par l'anneau périphérique du motif de balancier de la couche inférieure 7 mais également par les motifs 25 et 17 des couches respectives supérieure 5 et supplémentaire 21 et, éventuellement, de la partie métallique 64. De plus, la virole 55" est formée par le motif 23 de la couche supplémentaire 21 et du motif 19 de la couche supérieure 5. Préférentiellement, ce motif 19 est utilisé comme moyen d'espacement entre le spiral 51 " et le balancier 43" afin de pouvoir, par exemple, pitonner le ressort-spiral 53" à l'aide d'une raquetterie. Le motif 19 est également utile comme moyen de guidage du spiral 51 " en augmentant la hauteur de la virole 55". Cependant, avantageusement selon le procédé 1 , la gravure sur la couche supplémentaire 21 laisse toute liberté sur la géométrie du ressort- spiral 53". Ainsi, notamment, le ressort-spiral 53" peut ne pas comporter de courbe externe ouverte mais, par exemple, comporter sur l'extrémité de la courbe externe un bourrelet apte à servir de point d'attache fixe, c'est-à-dire sans nécessité de raquetterie.Following this ninth step January 12, it is understood that the rocker pattern etched in the lower layer 7 is only connected, with a very strong adhesion, to the patterns 17 and 19 of the top layer 5 etched in step 101 The pendulum pattern is therefore no longer in direct contact with the lower layer 7. As a result of the final step 106 explained above, a one-piece regulating member 41 formed of silicon-based materials with one or two metal parts 64, 66 as shown in FIGS. so that there is more assembly problem because it is directly achieved during the manufacture of the regulator 41 ". The latter comprises a rocker arm 43 "whose hub 45" is connected on the one hand radially to the serge 47 "by four arms 40", 42 ", 44" and 46 "and, on the other hand, axially to the spiral 51 "which includes a spiral spring 53" and a ferrule 55 ". As explained above, the serge 47 "is formed by the peripheral ring of the pendent pattern of the lower layer 7, but also by the patterns 25 and 17 of the respective upper and additional layers 21 and, optionally, of the metallic part. 64. In addition, the shell 55 "is formed by the pattern 23 of the additional layer 21 and the pattern 19 of the upper layer 5. Preferably, this pattern 19 is used as spacing means between the spiral 51" and the balance 43 "in order to be able, for example, to pit the spiral spring 53" by means of a racket.The pattern 19 is also useful as a guide means of the spiral 51 "by increasing the height of the ferrule 55". , advantageously according to the method 1, the etching on the additional layer 21 leaves complete freedom on the geometry of the spiral spring 53 ". Thus, in particular, the spiral spring 53 "may not have an open outer curve but, for example, have on the end of the outer curve a bead adapted to serve as a fixed attachment point, that is to say say without the need for snowshoeing.
Préférentiellement, l'organe régulateur 41 " est apte à recevoir un axe de balancier 49 dans son diamètre intérieur. Avantageusement selon l'invention, l'organe régulateur 41 " étant monobloc, il n'est pas nécessaire de fixer l'axe de balancier 49 à la virole 55" et au balancier 43" mais uniquement à l'un des deux. Préférentiellement, dans l'exemple illustré aux figures 14 et 15, l'axe de balancier 49 est fixé sur le diamètre intérieur 70 de la partie métallique 66 par exemple par chassage. De plus, de manière préférée, les cavités 24 et 10 comportent des sections de plus grandes dimensions que celle du diamètre intérieur 70 de la partie métallique 66 afin d'éviter que l'axe de balancier 49 soit en contact gras avec la virole 55".Preferably, the regulating member 41 "is adapted to receive a balance pin 49 in its inside diameter Advantageously according to the invention, the regulating member 41" being in one piece, it is not necessary to fix the balance shaft 49 to the 55 "ferrule and the 43" balance but only to one of the two. Preferably, in the example illustrated in Figures 14 and 15, the balance shaft 49 is fixed on the inner diameter 70 of the metal part 66 for example by driving. In addition, preferably, the cavities 24 and 10 have sections of larger dimensions than the inner diameter 70 of the metal portion 66 to prevent the balance shaft 49 is in bold contact with the ferrule 55 " .
On comprend donc que l'effort du spiral 51 " est soumis au balancierWe understand that the force of the spiral 51 "is subject to the balance
43" uniquement par la virole 55" et inversement car ils sont tous trois formés de manière monobloc. L'axe de balancier 49 ne reçoit donc d'effort de l'organe régulateur 41 " que, préférentiellement, par l'intermédiaire de la partie métallique 66 du moyeu 45" du balancier 43".43 "only by the shell 55" and conversely because they are all three integrally formed. The balance shaft 49 thus receives force from the regulating member 41 "only, preferably, via the metal portion 66 of the hub 45" of the balance 43 ".
De plus, dans la mesure où une partie métallique 64 a été déposée, l'inertie du balancier 43" est avantageusement amplifiée. En effet, la densité d'un métal étant beaucoup plus grande que celle du silicium, la masse du balancier 43" est augmentée et, incidemment, également son inertie.In addition, insofar as a metallic part 64 has been deposited, the inertia of the balance 43 "is advantageously amplified, since the density of a metal being much greater than that of silicon, the mass of the balance 43" is increased and, incidentally, also its inertia.
Selon les trois modes de réalisation A, B et C, on comprend que l'organe régulateur final 41 , 41 ' et 41 " est ainsi assemblé avant d'être structuré, c'est-à-dire avant d'être gravé et/ou modifié par électrodéposition. Cela permet avantageusement de minimiser les dispersions engendrées par les assemblages actuels d'un balancier avec un spiral.According to the three embodiments A, B and C, it is understood that the final regulating member 41, 41 'and 41 "is thus assembled before being structured, that is to say before being etched and / or or modified by electrodeposition.This advantageously allows to minimize the dispersions caused by the current assemblies of a balance with a spiral.
Il faut également noter que la très bonne précision structurelle d'une gravure ionique réactive profonde permet de diminuer le rayon de départ de chacun du ressort-spiraux 53, 53', 53", 53'", c'est-à-dire que le diamètre extérieur de leur virole 55, 55', 55", 55'", ce qui autorise la miniaturisation des diamètres intérieurs et extérieurs de la virole 55, 55', 55", 55'".It should also be noted that the very good structural accuracy of a deep reactive ion etching makes it possible to reduce the starting radius of each of the spiral spring 53, 53 ', 53 ", 53'", that is to say that the outer diameter of their shell 55, 55 ', 55 ", 55'", which allows the miniaturization of the inner and outer diameters of the shell 55, 55 ', 55 ", 55'".
Avantageusement selon l'invention, on comprend également qu'il est possible que plusieurs organes régulateur 41 , 41 ' et 41 " puissent être réalisés sur le même substrat 3 ce qui autorise une production en série. Bien entendu, la présente invention ne se limite pas à l'exemple illustré mais est susceptible de diverses variantes et modifications qui apparaîtront à l'homme de l'art. En particulier, les motifs 17 et 25 gravés lors de étapes 101 et 103 dans les couches 5 et 21 peuvent ne pas se limiter à un état de surface plan mais peuvent intégrer lors desdites étapes au moins un ornement permettant de décorer au moins une des faces de la serge 47, 47', 47" ce qui peut être utile notamment dans le cas des pièces d'horlogerie du type squelette.Advantageously according to the invention, it is also understood that it is possible for several regulating members 41, 41 'and 41 "to be able to be produced on the same substrate 3, which allows mass production. Of course, the present invention is not limited to the illustrated example but is susceptible of various variations and modifications that will occur to those skilled in the art. In particular, the patterns 17 and 25 etched in steps 101 and 103 in the layers 5 and 21 may not be limited to a plane surface state but may incorporate at least one ornament in said steps for decorating at least one of the faces. serge 47, 47 ', 47 "which can be useful especially in the case of timepieces of the skeleton type.
Il est également possible que les parties métalliques 63, 66 électrodéposées selon les modes de réalisation B et C soient interverties, c'est-à-dire que la partie en saillie 63 du mode B soit remplacée par la partie intégrée 66 du mode C ou inversement (ce qui ne nécessite qu'une adaptation minime du procédé 1 ) ou même que la partie 66 intégrée dans le moyeu fasse saillie de la couche inférieure 7. Selon un raisonnement similaire, II est également possible que les parties métalliques 61 , 64 électrodéposées dans les modes de réalisation B et C soient interverties, c'est-à-dire que la partie en saillie 61 du mode B soit remplacée par la partie intégrée 64 du mode C ou inversement ou même que la partie 64 intégrée dans la serge fasse saillie de la couche inférieure 7.It is also possible that the metal parts 63, 66 electrodeposited according to the embodiments B and C are interchanged, that is to say that the projecting portion 63 of the mode B is replaced by the integrated part 66 of the mode C or conversely (which requires only a minimal adaptation of the method 1) or even that the portion 66 integrated in the hub protrudes from the lower layer 7. According to similar reasoning, it is also possible that the metal parts 61, 64 electrodeposited in Embodiments B and C are interchanged, i.e. the projecting portion 61 of the B mode is replaced by the integrated portion 64 of the C mode or vice versa or even that the portion 64 integrated in the serge makes protrusion of the lower layer 7.
De plus, avantageusement, le procédé 1 peut prévoir en outre, a posteriori de l'étape de libération 106, une étape d'adaptation de la fréquence de l'organe régulateur 41 , 41 ', 41 ". Une telle étape pourrait alors consister à graver, par exemple par laser, des évidements 68 aptes à modifier la fréquence de fonctionnement dudit organe régulateur. De tels évidements 68, comme illustrés dans l'exemple des figures 10 et 1 1 , pourraient, par exemple, être réalisés sur une des parois périphériques du motif 34 appartenant à la serge 47, 47', 47" et/ou sur une des parties métalliques 61 , 64 électrodéposées. De manière inverse, des structures réglantes du type masselotte peuvent également être envisagées afin d'augmenter l'inertie et régler de la fréquence. Il peut également être prévu qu'une couche conductrice soit déposée sur au moins une partie de l'organe régulateur 41 , 41 ', 41 " afin d'éviter des problèmes d'isochronisme. Une telle couche peut être du type divulgué dans le document EP 1 837 722 incorporé par référence dans la présente description.In addition, advantageously, the method 1 can furthermore provide, a posteriori of the release step 106, a step of adapting the frequency of the regulating member 41, 41 ', 41 ". to engrave, for example by laser, recesses 68 able to modify the operating frequency of said regulator member Such recesses 68, as illustrated in the example of FIGS. 10 and 11, could, for example, be made on one of the peripheral walls of the pattern 34 belonging to the serge 47, 47 ', 47 "and / or one of the metal parts 61, 64 electrodeposited. Conversely, regulating structures of the flyweight type can also be considered in order to increase the inertia and adjust the frequency. It can also be provided that a conductive layer is deposited on at least a portion of the regulator member 41, 41 ', 41 "in order to avoid isochronism problems, Such a layer may be of the type disclosed in the document EP 1 837 722 incorporated by reference in this specification.
Enfin, une étape de polissage du type de l'étape 1 1 1 peut également être réalisée entre l'étape 107 et l'étape 108. Il peut également être envisagé qu'une étape de réalisation d'un dépôt métallique 63, 66, du type obtenu par les modes de réalisation B ou C, soit réalisée non pas sur le balancier mais, dans le cas de la fabrication seule du spiral 51 '", sur la couche supplémentaire 21 de sorte à pourvoir chasser un axe non pas contre le matériau à base de silicium du diamètre intérieure de la virole 55'" mais contre ledit dépôt métallique. Finally, a polishing step of the type of step 1 1 1 can also be carried out between step 107 and step 108. It can also be envisaged that a step of producing a metal deposit 63, 66, of the type obtained by the embodiments B or C, is not carried out on the balance but, in the case of the manufacture of the single spiral 51 '", on the additional layer 21 so as to be able to drive an axis not against the silicon-based material of the inner diameter of the shell 55 '"but against said metal deposit.

Claims

REVEN D I CATIONS REVEN DI CATIONS
1. Organe régulateur monobloc (41 , 41 ', 41 ") comportant un balancier (43, 43', 43") coopérant avec un spiral (51 , 51 ', 51 ") réalisé dans une couche de matériau à base de silicium (21 ) et comprenant un ressort- spiral (53, 53', 53") monté coaxialement sur une virole caractérisé en ce que la virole (55, 55', 55") comporte une partie (19), en prolongement faisant saillie dudit ressort-spiral, qui est réalisée dans une deuxième couche de matériau à base de silicium (5) et qui est fixée sur le balancier (43, 43', 43").Monobloc regulating organ (41, 41 ', 41 ") comprising a balance (43, 43', 43") cooperating with a spiral (51, 51 ', 51 ") made in a layer of silicon-based material ( 21) and comprising a spiral spring (53, 53 ', 53 ") mounted coaxially on a ferrule, characterized in that the ferrule (55, 55', 55") comprises a portion (19) extending from said spring -spiral, which is made in a second layer of silicon-based material (5) and which is fixed on the balance (43, 43 ', 43 ").
2. Organe régulateur selon la revendication 1 , caractérisé en ce que le balancier (43, 43', 43") comporte un trou (26) prolongeant le diamètre intérieur (24, 10) de la virole (55, 55', 55") afin d'y recevoir un axe de balancier (49). 2. Control member according to claim 1, characterized in that the rocker (43, 43 ', 43 ") has a hole (26) extending the inner diameter (24, 10) of the shell (55, 55', 55" ) to receive a balance shaft (49).
3. Organe régulateur selon la revendication 2, caractérisé en ce que l'axe de balancier (49) est fixé sur le balancier (43, 43', 43").3. Control member according to claim 2, characterized in that the balance shaft (49) is fixed on the balance (43, 43 ', 43 ").
4. Organe régulateur selon la revendication 3, caractérisé en ce que l'axe de balancier (49) est fixé sur le balancier (43', 43") par chassage contre un revêtement métallique (63, 66) réalisé au niveau dudit trou. 4. Control member according to claim 3, characterized in that the balance shaft (49) is fixed on the rocker (43 ', 43 ") by driving against a metal coating (63, 66) made at said hole.
5. Organe régulateur selon l'une des revendications 2 à 4, caractérisé en ce que la section du diamètre intérieur (24, 10) de la virole (55, 55', 55") est plus grande que celle du trou (26, 63, 66) du balancier (43, 43', 43") afin d'éviter les contacts gras entre l'axe de balancier (49) et le diamètre intérieur (24, 10) de la virole (55, 55', 55"). 5. Regulator according to one of claims 2 to 4, characterized in that the section of the inner diameter (24, 10) of the shell (55, 55 ', 55 ") is larger than that of the hole (26, 63, 66) of the balance (43, 43 ', 43 ") in order to avoid the fatty contacts between the balance shaft (49) and the inner diameter (24, 10) of the ferrule (55, 55', 55 ").
6. Organe régulateur selon l'une des revendications précédentes, caractérisé en ce que la serge (47, 47', 47") du balancier (43, 43', 43") est continue et comporte un dispositif d'adaptation (61 , 64, 68) apte à modifier le moment d'inertie du balancier. 6. Regulating body according to one of the preceding claims, characterized in that the serge (47, 47 ', 47 ") of the balance (43, 43', 43") is continuous and comprises an adaptation device (61, 64, 68) capable of modifying the moment of inertia of the balance.
7. Organe régulateur selon la revendication 6, caractérisé en ce que la serge (47, 47', 47") est reliée au moyeu (45, 45', 45") du balancier (43, 43', 43") par au moins un bras (40, 42, 44, 46, 40', 42', 44', 46', 40", 42", 44", 46") qui est élancé afin d'autoriser sa déformation axiale et/ou radiale en cas de choc transmis sur le balancier (41 , 41 ', 41 ").7. Regulating body according to claim 6, characterized in that the serge (47, 47 ', 47 ") is connected to the hub (45, 45', 45") of the balance (43, 43 ', 43 ") by the minus one arm (40, 42, 44, 46, 40 ', 42', 44 ', 46', 40 ", 42", 44 ", 46") which is slender to allow axial and / or radial deformation thereof in the event of shock transmitted on the balance (41, 41 ', 41 ").
8. Organe régulateur selon la revendication 6 ou 7, caractérisé en ce que le dispositif d'adaptation comporte des évidements (60, 68) réalisés sur la serge (47, 47") du balancier (43, 43") afin de pouvoir ajuster l'inertie dudit balancier. 8. Control member according to claim 6 or 7, characterized in that the adaptation device comprises recesses (60, 68) made on the serge (47, 47 ") of the balance (43, 43") in order to be able to adjust the inertia of said balance.
9. Organe régulateur selon la revendication 8, caractérisé en ce que les évidements (60) comportent un matériau de plus grande densité que celui de la serge (47") du balancier (43") afin d'augmenter l'inertie dudit balancier.9. Control member according to claim 8, characterized in that the recesses (60) comprise a material of greater density than that of the serge (47 ") of the balance (43") to increase the inertia of said balance.
10. Organe régulateur selon la revendication 6 ou 7, caractérisé en ce que le dispositif d'adaptation comporte des bossages (61 ) réalisés sur la serge (47') du balancier (43') et comportant un matériau de plus grande densité que la serge (47') afin d'augmenter l'inertie dudit balancier.10. Control organ according to claim 6 or 7, characterized in that the adaptation device comprises bosses (61) made on the serge (47 ') of the balance (43') and comprising a material of greater density than the serge (47 ') to increase the inertia of said balance.
11. Organe régulateur selon la revendication 9 ou 10, caractérisé en ce que ledit matériau de plus grande densité est distribué au niveau de la serge (47', 47") sous forme d'un anneau crénelé (61 , 64) comportant une succession de plots (65, 69) écartés à intervalle régulier pour compenser la dilatation thermique dudit matériau.11. Regulating body according to claim 9 or 10, characterized in that said material of greater density is distributed at the level of the serge (47 ', 47 ") in the form of a crenellated ring (61, 64) comprising a succession studs (65, 69) spaced at regular intervals to compensate for thermal expansion of said material.
12. Organe régulateur selon l'une des revendications précédentes, caractérisé en ce que le balancier (43, 43', 43") est réalisé dans une troisième couche (7) de matériau à base de silicium.12. Regulating body according to one of the preceding claims, characterized in that the rocker (43, 43 ', 43 ") is made in a third layer (7) of silicon-based material.
13. Organe régulateur selon l'une des revendications précédentes, caractérisé en ce que la spire interne du ressort-spiral (53, 53', 53") comporte une courbe du type Grossmann afin d'améliorer la concentricité du développement dudit spiral. 13. Control member according to one of the preceding claims, characterized in that the inner coil of the spiral spring (53, 53 ', 53 ") comprises a Grossmann type curve to improve the concentricity of the development of said spiral.
14. Organe régulateur selon l'une des revendications précédentes, caractérisé en ce que le ressort-spiral (53, 53', 53") comporte au moins une partie à base de dioxyde de silicium afin de le rendre plus résistant mécaniquement et d'ajuster son coefficient thermo-élastique. 14. Regulating body according to one of the preceding claims, characterized in that the spiral spring (53, 53 ', 53 ") comprises at least one part based on silicon dioxide to make it more mechanically resistant and adjust its thermo-elastic coefficient.
15. Pièce d'horlogerie caractérisée en ce qu'elle comporte un organe régulateur (41 , 41 ', 41 ") conforme à l'une des revendications précédentes.15. Timepiece characterized in that it comprises a regulating member (41, 41 ', 41 ") according to one of the preceding claims.
16. Procédé de fabrication (1 ) d'un organe régulateur monobloc (41 , 41 ', 41 ") comportant les étapes suivantes : a) se munir (100) d'un substrat (3) comportant une couche supérieure16. A method of manufacturing (1) a one-piece regulating member (41, 41 ', 41 ") comprising the following steps: a) providing (100) a substrate (3) comprising an upper layer
(5) et une couche inférieure (7) en matériaux à base de silicium ; b) graver (101 ) sélectivement au moins une cavité (10, 1 1 ) dans la couche supérieure (5) pour définir le motif d'une première partie (19) d'une virole (55, 55', 55") et d'une première partie (17) d'un balancier (43, 43', 43") en matériau à base de silicium dudit organe ; caractérisé en ce qu'il comporte en outre les étapes suivantes : c) solidariser (102), sur la couche supérieure (5) gravée du substrat (3), une couche supplémentaire (21 ) de matériau à base de silicium; d) graver (103) sélectivement au moins une cavité (20, 24) dans la couche supplémentaire (21 ) pour continuer le motif (19, 23) desdites premières parties de la virole (55, 55', 55") et du balancier (43, 43', 43"), et définir le motif (27) d'un ressort-spiral (53, 53', 53") en matériaux à base de silicium dudit organe ; e) graver (105, 108, 1 12) sélectivement au moins une cavité (26, 28, 29, 30, 31 , 32) dans la couche inférieure (7) pour définir la dernière partie (34) du balancier (43, 43', 43") en matériaux à base de silicium dudit organe ; f) libérer l'organe régulateur (41 , 41 ', 41 ") du substrat (3).(5) and a lower layer (7) of silicon-based materials; b) selectively (101) etching at least one cavity (10, 1 1) in the upper layer (5) to define the pattern of a first portion (19) of a ferrule (55, 55 ', 55 ") and a first portion (17) of a rocker (43, 43 ', 43 ") made of silicon-based material of said member; characterized in that it further comprises the steps of: c) securing (102), on the top layer (5) etched of the substrate (3), an additional layer (21) of silicon-based material; d) selectively (103) etching at least one cavity (20, 24) in the additional layer (21) to continue the pattern (19, 23) of said first parts of the ferrule (55, 55 ', 55 ") and the balance (43, 43 ', 43 "), and defining the pattern (27) of a spiral spring (53, 53', 53") made of silicon-based materials of said member; e) etching (105, 108, 1 12) selectively at least one cavity (26, 28, 29, 30, 31, 32) in the lower layer (7) to define the last portion (34) of the rocker arm (43, 43 ', 43 ") made from silicon of said organ; f) releasing the regulating member (41, 41 ', 41 ") from the substrate (3).
17. Procédé de fabrication selon la revendication 16, caractérisé en ce qu'il comporte en outre après l'étape d) l'étape suivante : g) oxyder le ressort-spiral (53, 53', 53") en matériau à base de silicium dudit organe afin d'ajuster son coefficient thermo-élastique mais également de le rendre mécaniquement plus résistant.17. The manufacturing method according to claim 16, characterized in that it further comprises after step d) the following step: g) oxidizing the spiral spring (53, 53 ', 53 ") of silicon-based material of said member to adjust its thermo-elastic coefficient but also to make it mechanically more resistant.
18. Procédé de fabrication selon la revendication 16 ou 17 caractérisé en ce qu'il comporte en outre avant l'étape e) l'étape suivante : h) déposer (107, 1 10) sélectivement au moins une couche de métal (61 , 63, 64, 66) sur la couche inférieure (7) pour définir le motif d'au moins une partie en métal dudit organe.18. The manufacturing method according to claim 16 or 17, characterized in that it further comprises, before step e) the following step: h) depositing (107, 1 10) selectively at least one metal layer (61, 63, 64, 66) on the lower layer (7) to define the pattern of at least a metal part of said member.
19. Procédé de fabrication selon la revendication 18 caractérisé en ce que l'étape h) comporte la phase suivante : i) faire croître (107) ledit dépôt par couches successives métalliques au moins partiellement sur la surface de la couche inférieure (7) afin de former une partie métallique (61 ) destinée à augmenter la masse du balancier (43') en matériaux à base de silicium. 19. The manufacturing method according to claim 18 characterized in that step h) comprises the following step: i) growing (107) said deposition in successive metal layers at least partially on the surface of the lower layer (7) so forming a metal portion (61) for increasing the mass of the balance (43 ') of silicon-based materials.
20. Procédé de fabrication selon la revendication 18 ou 19 caractérisé en ce que l'étape h) comporte la phase suivante : i') faire croître (107) ledit dépôt par couches successives métalliques au moins partiellement sur la surface de la couche inférieure (7) afin de former une deuxième partie métallique (63) destinée à recevoir par chassage un axe (49).20. Manufacturing method according to claim 18 or 19 characterized in that step h) comprises the following step: i ') to grow (107) said deposition in successive metallic layers at least partially on the surface of the lower layer ( 7) to form a second metal portion (63) for driving a shaft (49).
21. Procédé de fabrication selon la revendication 18 caractérisé en ce que l'étape h) comporte les phases suivantes : j) graver (109) sélectivement au moins une cavité (60) dans la couche inférieure (7) destinée à recevoir ladite au moins une partie en métal ; k) faire croître (1 10) ledit dépôt par couches successives métalliques au moins partiellement dans ladite au moins une cavité afin de former une partie métallique (64) destinée à augmenter la masse du balancier (43") en matériaux à base de silicium. 21. Manufacturing method according to claim 18 characterized in that step h) comprises the following steps: j) selectively etching (109) at least one cavity (60) in the lower layer (7) intended to receive said at least one a metal part; k) growing (1 10) said deposition in successive metal layers at least partially in said at least one cavity to form a metal portion (64) for increasing the mass of the balance (43 ") of silicon-based materials.
22. Procédé de fabrication selon la revendication 18 ou 21 caractérisé en ce que l'étape h) comporte les phases suivantes : j') graver (109) sélectivement au moins une cavité (62) dans la couche inférieure (7) destinée à recevoir ladite au moins une partie en métal ; k') faire croître (1 10) ledit dépôt par couches successives métalliques au moins partiellement dans ladite au moins une cavité afin de former une deuxième partie métallique (63) destinée à recevoir par chassage un axe (49). 22. The manufacturing method according to claim 18 or 21, characterized in that step h) comprises the following steps: (i) selectively etching (109) at least one cavity (62) in the lower layer (7) intended to receive said at least one metal part; k ') growing (1 10) said deposition in successive metal layers at least partially in said at least one cavity to form a second metal portion (63) for receiving by driving a shaft (49).
23. Procédé de fabrication selon l'une des revendications 18 à 22, caractérisé en ce que l'étape h) est suivie de l'étape suivante : I) polir (1 1 1 ) le dépôt métallique (61 , 63, 64, 66).23. The manufacturing method according to one of claims 18 to 22, characterized in that step h) is followed by the following step: I) polishing (1 1 1) the metal deposit (61, 63, 64, 66).
24. Procédé de fabrication selon l'une des revendications 16 à 23, caractérisé en ce que plusieurs organes régulateur (41 , 41 ', 41 ") sont réalisés sur un même substrat (3). 24. Manufacturing process according to one of claims 16 to 23, characterized in that several regulating members (41, 41 ', 41 ") are formed on the same substrate (3).
EP09722049.5A 2008-03-20 2009-03-13 Integral adjusting member and method for making same Active EP2257856B1 (en)

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EP08153101A EP2104008A1 (en) 2008-03-20 2008-03-20 Single-body regulating organ and method for manufacturing same
PCT/EP2009/053000 WO2009115463A1 (en) 2008-03-20 2009-03-13 Integral adjusting member and method for making same
EP09722049.5A EP2257856B1 (en) 2008-03-20 2009-03-13 Integral adjusting member and method for making same

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EP (2) EP2104008A1 (en)
JP (1) JP5134137B2 (en)
KR (1) KR20100135735A (en)
CN (1) CN101978326B (en)
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JP2011526676A (en) 2011-10-13
US20110103197A1 (en) 2011-05-05
US8523426B2 (en) 2013-09-03
TWI474138B (en) 2015-02-21
EP2104008A1 (en) 2009-09-23
RU2473947C2 (en) 2013-01-27
JP5134137B2 (en) 2013-01-30
TW201001106A (en) 2010-01-01
WO2009115463A1 (en) 2009-09-24
CN101978326A (en) 2011-02-16
RU2010142920A (en) 2012-04-27
CN101978326B (en) 2013-01-02
HK1154086A1 (en) 2012-04-20
EP2257856B1 (en) 2016-11-23
KR20100135735A (en) 2010-12-27

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