EP2211594A3 - Extrem ultraviolette Lichtquellenvorrichtung - Google Patents

Extrem ultraviolette Lichtquellenvorrichtung Download PDF

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Publication number
EP2211594A3
EP2211594A3 EP10000408A EP10000408A EP2211594A3 EP 2211594 A3 EP2211594 A3 EP 2211594A3 EP 10000408 A EP10000408 A EP 10000408A EP 10000408 A EP10000408 A EP 10000408A EP 2211594 A3 EP2211594 A3 EP 2211594A3
Authority
EP
European Patent Office
Prior art keywords
raw material
extreme ultraviolet
energy beam
electrodes
light source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP10000408A
Other languages
English (en)
French (fr)
Other versions
EP2211594B1 (de
EP2211594A2 (de
Inventor
Takuma Yokohama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Original Assignee
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Publication of EP2211594A2 publication Critical patent/EP2211594A2/de
Publication of EP2211594A3 publication Critical patent/EP2211594A3/de
Application granted granted Critical
Publication of EP2211594B1 publication Critical patent/EP2211594B1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
    • H05G2/005—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state containing a metal as principal radiation generating component

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • X-Ray Techniques (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
EP10000408A 2009-01-21 2010-01-18 Extrem ultraviolette Lichtquellenvorrichtung Active EP2211594B1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009010691A JP5245857B2 (ja) 2009-01-21 2009-01-21 極端紫外光光源装置

Publications (3)

Publication Number Publication Date
EP2211594A2 EP2211594A2 (de) 2010-07-28
EP2211594A3 true EP2211594A3 (de) 2011-02-02
EP2211594B1 EP2211594B1 (de) 2011-08-10

Family

ID=42017302

Family Applications (1)

Application Number Title Priority Date Filing Date
EP10000408A Active EP2211594B1 (de) 2009-01-21 2010-01-18 Extrem ultraviolette Lichtquellenvorrichtung

Country Status (3)

Country Link
EP (1) EP2211594B1 (de)
JP (1) JP5245857B2 (de)
AT (1) ATE520289T1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5659711B2 (ja) * 2010-11-10 2015-01-28 ウシオ電機株式会社 極端紫外光光源装置における照度分布の検出方法および極端紫外光光源装置
WO2013072154A1 (en) 2011-11-15 2013-05-23 Asml Netherlands B.V. Radiation source and method for operating the same, lithographic apparatus comprising the radiation source, and device manufacturing method
DE102013204444A1 (de) * 2013-03-14 2014-09-18 Carl Zeiss Smt Gmbh Beleuchtungsoptik für ein Maskeninspektionssystem sowie Maskeninspektionssystem mit einer derartigen Beleuchtungsoptik
WO2015097820A1 (ja) 2013-12-26 2015-07-02 ギガフォトン株式会社 ターゲット生成装置
JP2023149175A (ja) * 2022-03-30 2023-10-13 ウシオ電機株式会社 光源装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070090304A1 (en) * 2003-09-11 2007-04-26 Koninklijke Philips Electronics N.V. Method and apparatus for producing extreme ultraviolet radiation or soft x-ray radiation
US20080187105A1 (en) * 2005-05-19 2008-08-07 Koninklijke Philips Electronics, N.V. Gas Discharge Source, in Particular for Euv Radiation

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4052155B2 (ja) 2003-03-17 2008-02-27 ウシオ電機株式会社 極端紫外光放射源及び半導体露光装置
JP2005294087A (ja) * 2004-04-01 2005-10-20 Nikon Corp 光源ユニット、照明光学装置、露光装置および露光方法
EP2020165B1 (de) * 2006-05-16 2010-11-24 Philips Intellectual Property & Standards GmbH Verfahren zur erhöhung der umwandlungseffizienz einer euv- und/oder weichen röntgenstrahlenlampe und entsprechendes gerät
JP2008270149A (ja) * 2007-03-28 2008-11-06 Tokyo Institute Of Technology 極端紫外光光源装置および極端紫外光発生方法
US7615767B2 (en) * 2007-05-09 2009-11-10 Asml Netherlands B.V. Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070090304A1 (en) * 2003-09-11 2007-04-26 Koninklijke Philips Electronics N.V. Method and apparatus for producing extreme ultraviolet radiation or soft x-ray radiation
US20080187105A1 (en) * 2005-05-19 2008-08-07 Koninklijke Philips Electronics, N.V. Gas Discharge Source, in Particular for Euv Radiation

Also Published As

Publication number Publication date
EP2211594B1 (de) 2011-08-10
JP5245857B2 (ja) 2013-07-24
EP2211594A2 (de) 2010-07-28
ATE520289T1 (de) 2011-08-15
JP2010170772A (ja) 2010-08-05

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