ATE520289T1 - Extrem ultraviolette lichtquellenvorrichtung - Google Patents

Extrem ultraviolette lichtquellenvorrichtung

Info

Publication number
ATE520289T1
ATE520289T1 AT10000408T AT10000408T ATE520289T1 AT E520289 T1 ATE520289 T1 AT E520289T1 AT 10000408 T AT10000408 T AT 10000408T AT 10000408 T AT10000408 T AT 10000408T AT E520289 T1 ATE520289 T1 AT E520289T1
Authority
AT
Austria
Prior art keywords
raw material
extreme ultraviolet
energy beam
electrodes
light source
Prior art date
Application number
AT10000408T
Other languages
English (en)
Inventor
Takuma Yokoyama
Original Assignee
Ushio Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Electric Inc filed Critical Ushio Electric Inc
Application granted granted Critical
Publication of ATE520289T1 publication Critical patent/ATE520289T1/de

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AT10000408T 2009-01-21 2010-01-18 Extrem ultraviolette lichtquellenvorrichtung ATE520289T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009010691A JP5245857B2 (ja) 2009-01-21 2009-01-21 極端紫外光光源装置

Publications (1)

Publication Number Publication Date
ATE520289T1 true ATE520289T1 (de) 2011-08-15

Family

ID=42017302

Family Applications (1)

Application Number Title Priority Date Filing Date
AT10000408T ATE520289T1 (de) 2009-01-21 2010-01-18 Extrem ultraviolette lichtquellenvorrichtung

Country Status (3)

Country Link
EP (1) EP2211594B1 (de)
JP (1) JP5245857B2 (de)
AT (1) ATE520289T1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5659711B2 (ja) * 2010-11-10 2015-01-28 ウシオ電機株式会社 極端紫外光光源装置における照度分布の検出方法および極端紫外光光源装置
WO2013072154A1 (en) 2011-11-15 2013-05-23 Asml Netherlands B.V. Radiation source and method for operating the same, lithographic apparatus comprising the radiation source, and device manufacturing method
DE102013204444A1 (de) * 2013-03-14 2014-09-18 Carl Zeiss Smt Gmbh Beleuchtungsoptik für ein Maskeninspektionssystem sowie Maskeninspektionssystem mit einer derartigen Beleuchtungsoptik
WO2015097820A1 (ja) * 2013-12-26 2015-07-02 ギガフォトン株式会社 ターゲット生成装置
JP2023149175A (ja) * 2022-03-30 2023-10-13 ウシオ電機株式会社 光源装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4052155B2 (ja) 2003-03-17 2008-02-27 ウシオ電機株式会社 極端紫外光放射源及び半導体露光装置
DE10342239B4 (de) 2003-09-11 2018-06-07 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Erzeugen von Extrem-Ultraviolettstrahlung oder weicher Röntgenstrahlung
JP2005294087A (ja) * 2004-04-01 2005-10-20 Nikon Corp 光源ユニット、照明光学装置、露光装置および露光方法
DE102005023060B4 (de) * 2005-05-19 2011-01-27 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Gasentladungs-Strahlungsquelle, insbesondere für EUV-Strahlung
DE602007010765D1 (de) * 2006-05-16 2011-01-05 Philips Intellectual Property Verfahren zur erhöhung der umwandlungseffizienz einer euv- und/oder weichen röntgenstrahlenlampe und entsprechendes gerät
JP2008270149A (ja) * 2007-03-28 2008-11-06 Tokyo Institute Of Technology 極端紫外光光源装置および極端紫外光発生方法
US7615767B2 (en) * 2007-05-09 2009-11-10 Asml Netherlands B.V. Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby

Also Published As

Publication number Publication date
EP2211594B1 (de) 2011-08-10
EP2211594A2 (de) 2010-07-28
EP2211594A3 (de) 2011-02-02
JP2010170772A (ja) 2010-08-05
JP5245857B2 (ja) 2013-07-24

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Legal Events

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