EP2181464A4 - Solar cell having porous structure and method for fabrication thereof - Google Patents
Solar cell having porous structure and method for fabrication thereofInfo
- Publication number
- EP2181464A4 EP2181464A4 EP08793370.1A EP08793370A EP2181464A4 EP 2181464 A4 EP2181464 A4 EP 2181464A4 EP 08793370 A EP08793370 A EP 08793370A EP 2181464 A4 EP2181464 A4 EP 2181464A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- fabrication
- solar cell
- porous structure
- porous
- solar
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/02168—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells the coatings being antireflective or having enhancing optical properties for the solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0236—Special surface textures
- H01L31/02363—Special surface textures of the semiconductor body itself, e.g. textured active layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/028—Inorganic materials including, apart from doping material or other impurities, only elements of Group IV of the Periodic Table
- H01L31/0284—Inorganic materials including, apart from doping material or other impurities, only elements of Group IV of the Periodic Table comprising porous silicon as part of the active layer(s)
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/072—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN heterojunction type
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Sustainable Development (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Energy (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Photovoltaic Devices (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020070084157A KR20090019600A (en) | 2007-08-21 | 2007-08-21 | High-efficiency solar cell and manufacturing method thereof |
KR1020070106215A KR20090040728A (en) | 2007-10-22 | 2007-10-22 | Solar cell using a semiconductor wafer substrate with porous surface and fabrication thereof |
KR1020070131101A KR20090063653A (en) | 2007-12-14 | 2007-12-14 | Method of manufacturing pn junction device and solar cell comprising the said pn junction device |
KR1020080001763A KR20090076035A (en) | 2008-01-07 | 2008-01-07 | Solar cell having passivated porous surface and fabrication method thereof |
PCT/KR2008/004857 WO2009025502A2 (en) | 2007-08-21 | 2008-08-20 | Solar cell having porous structure and method for fabrication thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
EP2181464A2 EP2181464A2 (en) | 2010-05-05 |
EP2181464A4 true EP2181464A4 (en) | 2015-04-01 |
Family
ID=40378827
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP08793370.1A Withdrawn EP2181464A4 (en) | 2007-08-21 | 2008-08-20 | Solar cell having porous structure and method for fabrication thereof |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP2181464A4 (en) |
JP (1) | JP2010527163A (en) |
WO (1) | WO2009025502A2 (en) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20090236317A1 (en) * | 2008-03-21 | 2009-09-24 | Midwest Research Institute | Anti-reflection etching of silicon surfaces catalyzed with ionic metal solutions |
KR101002682B1 (en) * | 2008-08-28 | 2010-12-21 | 삼성전기주식회사 | Solar cell and manufacturing method thereof |
JP5300681B2 (en) * | 2009-09-30 | 2013-09-25 | 東京エレクトロン株式会社 | Manufacturing method of solar cell |
JP5340103B2 (en) * | 2009-09-30 | 2013-11-13 | 東京エレクトロン株式会社 | Solar cell |
WO2011060193A1 (en) * | 2009-11-11 | 2011-05-19 | Alliance For Sustainable Energy, Llc | Wet-chemical systems and methods for producing black silicon substrates |
JP5424270B2 (en) | 2010-05-11 | 2014-02-26 | 国立大学法人東京農工大学 | Semiconductor solar cell |
CN101976703B (en) * | 2010-07-28 | 2011-12-14 | 常州天合光能有限公司 | Process of antireflection coating battery capable of reducing surface recombination |
CN101964367A (en) * | 2010-08-23 | 2011-02-02 | 中国科学院微电子研究所 | Substrate with porous structure and preparation method thereof |
KR101658677B1 (en) * | 2010-12-16 | 2016-09-21 | 엘지전자 주식회사 | Solar cell and manufacturing mathod thereof |
CN103493214B (en) | 2011-01-26 | 2016-01-20 | 胜高股份有限公司 | Wafer used for solar batteries and preparation method thereof |
KR101763319B1 (en) | 2011-01-31 | 2017-08-01 | 한양대학교 산학협력단 | Method for manufacturing a solar cell by electrochemically etching |
JP2014512673A (en) * | 2011-03-08 | 2014-05-22 | アライアンス フォー サステイナブル エナジー リミテッド ライアビリティ カンパニー | Efficient black silicon photovoltaic device with improved blue sensitivity |
CN102820370B (en) * | 2011-06-08 | 2015-01-14 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Texture surface making treatment method for silicon wafer |
CN107046079A (en) * | 2016-02-05 | 2017-08-15 | 上海凯世通半导体股份有限公司 | Doping method |
CN106653939B (en) * | 2016-11-17 | 2018-03-27 | 横店集团东磁股份有限公司 | A kind of thermal oxidation technology applied to crystal silicon solar batteries |
CN114583015A (en) * | 2022-03-25 | 2022-06-03 | 安徽华晟新能源科技有限公司 | Heterojunction battery and preparation method thereof |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06104463A (en) * | 1992-09-18 | 1994-04-15 | Hitachi Ltd | Solar battery and manufacture thereof |
EP0933822A2 (en) * | 1998-01-20 | 1999-08-04 | Sharp Kabushiki Kaisha | Substrate for forming high-strenght thin semiconductor element and method for manufacturing high-strength thin semiconductor element |
US20050126627A1 (en) * | 2003-11-19 | 2005-06-16 | Sharp Kabushiki Kaisha | Solar cell and method for producing the same |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR19990016619A (en) * | 1997-08-18 | 1999-03-15 | 손욱 | Manufacturing method of electroluminescent device using porous silicon |
KR100434537B1 (en) * | 1999-03-31 | 2004-06-05 | 삼성전자주식회사 | Multi layer wafer with thick sacrificial layer and fabricating method thereof |
JP3838911B2 (en) * | 2001-12-25 | 2006-10-25 | 京セラ株式会社 | Method for manufacturing solar cell element |
KR100922346B1 (en) * | 2002-04-03 | 2009-10-21 | 삼성에스디아이 주식회사 | Solar cell and fabrication method thereof |
JP2005072388A (en) * | 2003-08-26 | 2005-03-17 | Kyocera Corp | Method for manufacturing solar battery element |
JP2005136062A (en) * | 2003-10-29 | 2005-05-26 | Sharp Corp | Manufacturing method of solar battery |
KR100677374B1 (en) * | 2005-11-14 | 2007-02-02 | 준 신 이 | Manufacturing method of porous solar cells using thin silicon wafer |
-
2008
- 2008-08-20 JP JP2010508317A patent/JP2010527163A/en active Pending
- 2008-08-20 EP EP08793370.1A patent/EP2181464A4/en not_active Withdrawn
- 2008-08-20 WO PCT/KR2008/004857 patent/WO2009025502A2/en active Application Filing
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06104463A (en) * | 1992-09-18 | 1994-04-15 | Hitachi Ltd | Solar battery and manufacture thereof |
EP0933822A2 (en) * | 1998-01-20 | 1999-08-04 | Sharp Kabushiki Kaisha | Substrate for forming high-strenght thin semiconductor element and method for manufacturing high-strength thin semiconductor element |
US20050126627A1 (en) * | 2003-11-19 | 2005-06-16 | Sharp Kabushiki Kaisha | Solar cell and method for producing the same |
Non-Patent Citations (1)
Title |
---|
KOYNOV SVETOSLAV ET AL: "Black nonreflecting silicon surfaces for solar cells", APPLIED PHYSICS LETTERS, AMERICAN INSTITUTE OF PHYSICS, US, vol. 88, no. 20, 16 May 2006 (2006-05-16), pages 203107 - 203107, XP012081745, ISSN: 0003-6951, DOI: 10.1063/1.2204573 * |
Also Published As
Publication number | Publication date |
---|---|
WO2009025502A2 (en) | 2009-02-26 |
WO2009025502A3 (en) | 2009-04-23 |
EP2181464A2 (en) | 2010-05-05 |
JP2010527163A (en) | 2010-08-05 |
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Legal Events
Date | Code | Title | Description |
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PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
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Effective date: 20100122 |
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AX | Request for extension of the european patent |
Extension state: AL BA MK RS |
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DAX | Request for extension of the european patent (deleted) | ||
A4 | Supplementary search report drawn up and despatched |
Effective date: 20150226 |
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RIC1 | Information provided on ipc code assigned before grant |
Ipc: H01L 31/0236 20060101AFI20150220BHEP Ipc: H01L 31/028 20060101ALI20150220BHEP Ipc: H01L 31/072 20120101ALI20150220BHEP Ipc: H01L 31/0216 20140101ALI20150220BHEP |
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STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
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18D | Application deemed to be withdrawn |
Effective date: 20150929 |