EP2141968B1 - Vorrichtung zur Erzeugung eines Atmosphärendruck-Plasmas - Google Patents

Vorrichtung zur Erzeugung eines Atmosphärendruck-Plasmas Download PDF

Info

Publication number
EP2141968B1
EP2141968B1 EP09006430.4A EP09006430A EP2141968B1 EP 2141968 B1 EP2141968 B1 EP 2141968B1 EP 09006430 A EP09006430 A EP 09006430A EP 2141968 B1 EP2141968 B1 EP 2141968B1
Authority
EP
European Patent Office
Prior art keywords
housing
region
piezo
end cap
frequency
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Not-in-force
Application number
EP09006430.4A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP2141968A3 (de
EP2141968A2 (de
Inventor
Michael Bisges
Thorsten Krüger
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Maschinenfabrik Reinhausen GmbH
Scheubeck GmbH and Co
Original Assignee
Maschinenfabrik Reinhausen GmbH
Maschinenfabrik Reinhausen Gebrueder Scheubeck GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Maschinenfabrik Reinhausen GmbH, Maschinenfabrik Reinhausen Gebrueder Scheubeck GmbH and Co KG filed Critical Maschinenfabrik Reinhausen GmbH
Priority to PL09006430T priority Critical patent/PL2141968T3/pl
Publication of EP2141968A2 publication Critical patent/EP2141968A2/de
Publication of EP2141968A3 publication Critical patent/EP2141968A3/de
Application granted granted Critical
Publication of EP2141968B1 publication Critical patent/EP2141968B1/de
Not-in-force legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2475—Generating plasma using acoustic pressure discharges
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2475—Generating plasma using acoustic pressure discharges
    • H05H1/2481—Generating plasma using acoustic pressure discharges the plasma being activated using piezoelectric actuators

Definitions

  • the present invention relates to an apparatus for generating an atmospheric pressure plasma.
  • Plasma also known as the "fourth state of matter" is created by continuously supplying energy to a gaseous system until it independently forms large quantities of free electrons. This activates some neutral atoms or molecules of the gas in the system to develop negatively charged electrons, positively or negatively charged ions, and other species.
  • the high energy efficiency of plasmas allows to drive application processes that are difficult or even impossible during the commonly known states of matter.
  • "cold" plasma in which the neutral gas temperature is relatively low and preferably moves in the room temperature range, to treat the surfaces of thermally sensitive substrates or to change them chemically-physically.
  • Surface treatment in this context is understood to mean a process in which the surface of a substrate is conditioned by means of plasma, activated or otherwise modified or cleaned by the plasma.
  • Such surface treatment by means of plasma is required, for example, in the case of many thermoplastics, but also in other thermally sensitive substrates whose surfaces have a very low surface energy, so that wetting with a liquid having a higher surface tension is made more difficult. As a result, it comes to the beading of the liquid and thus also to a poor structure of a bond strength such.
  • B. to adhesives Decisive for a successful surface treatment is not to damage the surfaces of substrates unintentionally, such.
  • B. weaken the material strength or toughness. It must be prevented that the surface of the substrates due to excessive thermal effects on or melted or it comes to other unintentional chemical reactions.
  • "cold" plasma is suitable for this purpose.
  • a plasma reactor which comprises a piezotransformer having a primary and a perpendicular polarized secondary region.
  • a generic device for generating an atmospheric pressure plasma is made DE 10 2008 018 827 the applicant known.
  • a device is described in which within a dielectrically insulated housing wall, a piezoelectric element with a primary and at least a perpendicular polarized secondary region is arranged.
  • the primary region of the piezoelectric element is driven with low voltage and high frequency, as a result of which a plasma is formed on the surface of the secondary region due to the field elevation.
  • This generated at the secondary region of the piezoelectric element plasma is forced by an additionally provided counter electrode, which is at ground potential, to an arc discharge and blown by means of a working gas at the frontal opening of the discharge tube.
  • the polarization of the piezoceramic elements of the known devices is subject to a non-negligible aging process, which manifests itself with increasing operating time by a negative conversion efficiency. This effect is undesirable and unintentionally influences the achievable treatment results of the plasma treatment.
  • the object of the invention is to provide a device for generating an atmospheric pressure plasma of the type mentioned, in which there is no power losses in the piezoelectric element used during operation, despite occurring temperature fluctuations. Furthermore, it is an object of the invention to find a structurally simple and operationally safe solution for it, which ensures an approximately constant high conversion efficiency of the piezo elements even with increasing operating time.
  • the inventive device has for this purpose a drive board, which consists of a frequency and voltage converter and a control loop, which controls the behavior of the monitored piezoceramic element and readjust the optimum operating point in case of deviations.
  • the optimum operating point is understood to be the resonance case of the system, ie the phase equality of current and voltage, in which the piezoelectric element used has its highest conductivity.
  • the piezoelement also has the highest conversion efficiency of low voltage coupled on the primary side to the high voltage converted on the secondary side and thus the strongest field boost.
  • the strong field elevation is the decisive moment for a deliberately efficient plasma education.
  • the optimum operating point is decisively influenced by the already mentioned temperature development of the piezoelectric element during the operation of the device.
  • a drive circuit board which measures the admittance, ie the quotient of current and voltage, and adjusts the device via the control of the frequency to the resonance case. At this point, the value of the admittance assumes its maximum, so that a targeted regulation of the phase, a setting of the device in the resonance case is possible.
  • phase-locked loop the so-called phase-locked loop, hereinafter referred to as PLL proven.
  • a phase detector provides for the automatic tuning of an oscillator.
  • the control circuit with phase detector in the PLL ensures an in-phase signal.
  • the frequency of the output signal of the PLL (oscillator output) runs, unless otherwise connected, with the same frequency as the reference signal. If a division ratio "n" is established between the oscillator output and the comparator input, the output signal of the oscillator is still phase-locked, but with the n-fold frequency of the reference signal.
  • the frequency of a free-running voltage-controlled oscillator is divided down by a (usually adjustable) divider in the frequency range of the comparison frequency.
  • phase difference between the frequency derived from the oscillator and a second, mostly quartz-controlled, highly constant comparison frequency is determined in a phase comparator and fed back to the oscillator as a control voltage.
  • the frequency of the oscillator is controlled exactly to the multiple of the comparison frequency set in the divider.
  • the piezoelectric element used is arranged by means of a clamping connection detachably in a dielectric region of a housing, so that it can be easily replaced with decreasing conversion efficiency due to aging phenomena.
  • the drive board in the immediate vicinity of the piezoelectric element for example, in the housing of the device according to the invention arranged. Due to the high coupled frequency, used connecting lines act as antennas that emit electromagnetic waves and thus reduce the usable electrical power. Due to the spatial proximity of the control board to the piezoelectric element short connecting lines are possible in which only more one Negligible power loss occurs when controlling the piezoelectric element with high frequency.
  • FIG. 1 shows an assembly drawing of a device according to the invention for generating an atmospheric pressure plasma in a side sectional view with a preferably rotationally symmetrical housing 1, which has at its front end an outlet opening 2, which is formed by an electrically insulating end cap 3.
  • a connectable to a gas line 5 gas inlet opening 4 and a supply line 6 is provided for a power supply of the device, wherein both lines open in a power supply device 7.
  • the power supply device 6 is shown only schematically and shown for the sake of completeness, but is not claimed.
  • the supply line 6 is conductively connected to a control board 8 arranged in the interior of the housing 1.
  • a pushbutton 9 is additionally provided, which is contacted with the control circuit board 8 and by means of which both the gas flow and the power supply of the device can be connected via the power supply device 7.
  • the gas stream is introduced into the housing 1 via the gas inlet opening 4, such that it flows past the control board 8 positioned within the housing 1 in the direction of the arrow and cools the latter, before it is transferred to its intended state of aggregation, namely plasmas.
  • the control and regulation of the power of the device described above is inventively from the drive board 8, comprising a frequency and voltage converter and a control loop taken.
  • the components on the drive board 8 are soldered and connected to each other via interconnects.
  • a preferably cuboidal piezoelectric element 10 is arranged with a primary region and at least one secondary region polarized perpendicular thereto and connected thereto by way of non-illustrated electrical lines.
  • the piezoelectric element 10 is preferably held detachably and centrally in the interior of the dielectric end cap 3 by a clamping connection 11. Described in more detail, the clamping connection 11 in the comments too FIG.
  • the piezoelectric element 10 in the primary region is subjected to low voltage, preferably from 5 to 200 V, so that a surface discharge on the surface, which is blown out through the outlet opening 2 by means of the gas flow, subsequently develops in the secondary region.
  • low voltage preferably from 5 to 200 V
  • argon, helium or even oxygen can be used as gas types.
  • FIG. 2a shows a clamp connection 11, consisting of two half-shells 12a and b, which receive the piezoelectric element 10 releasably and centrally via connecting screws 13a and b. Via two further screws 14 a and b, the clamping connection 11 together with the centrally positioned piezoelectric element 10 can be fixed to the dielectric end cap 3. Since vibrations occur in the piezoelectric element 10 during operation of the device, it is particularly preferably fixed in a point of oscillation between the two half-shells 12a and b in such a way that the piezoelectric element 10 is held in the most stable possible position. By using screws to connect the items from FIG.
  • FIG. 2a shows the just described FIG. 2a in a built-in state in a dielectric end cap 3, releasably secured by means of the screws 14a and b.
  • the spring terminals 15a and b are made of a relatively resistant to bending and particularly preferably, made of an electrically conductive material. This ensures, on the one hand, that the piezoelectric element 10 does not move inadvertently against the fixed position between the spring terminals 15a and b and, on the other hand, that the required voltage does not have to be coupled directly via the piezoelectric element 10, but indirectly via the electrically conductive spring terminals 15a and b can.

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Acoustics & Sound (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
EP09006430.4A 2008-07-04 2009-05-13 Vorrichtung zur Erzeugung eines Atmosphärendruck-Plasmas Not-in-force EP2141968B1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PL09006430T PL2141968T3 (pl) 2008-07-04 2009-05-13 Urządzenie do wytwarzania plazmy pod ciśnieniem atmosferycznym

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE202008008980U DE202008008980U1 (de) 2008-07-04 2008-07-04 Vorrichtung zur Erzeugung eines Atmosphärendruck-Plasmas

Publications (3)

Publication Number Publication Date
EP2141968A2 EP2141968A2 (de) 2010-01-06
EP2141968A3 EP2141968A3 (de) 2014-01-22
EP2141968B1 true EP2141968B1 (de) 2016-07-13

Family

ID=39736799

Family Applications (1)

Application Number Title Priority Date Filing Date
EP09006430.4A Not-in-force EP2141968B1 (de) 2008-07-04 2009-05-13 Vorrichtung zur Erzeugung eines Atmosphärendruck-Plasmas

Country Status (3)

Country Link
EP (1) EP2141968B1 (pl)
DE (1) DE202008008980U1 (pl)
PL (1) PL2141968T3 (pl)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12120808B2 (en) 2019-08-27 2024-10-15 Tdk Electronics Ag Apparatus for generating a gas discharge

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010027795A1 (de) 2010-04-15 2011-10-20 BSH Bosch und Siemens Hausgeräte GmbH Hausgerät mit Plasmagenerator und Verfahren zu seinem Betrieb
DE102012104137A1 (de) * 2012-05-11 2013-11-14 Maschinenfabrik Reinhausen Gmbh Feldgesteuerter Verbundisolator
DE102013100617B4 (de) * 2013-01-22 2016-08-25 Epcos Ag Vorrichtung zur Erzeugung eines Plasmas und Handgerät mit der Vorrichtung
DE102013107448B4 (de) 2013-07-15 2016-11-24 Relyon Plasma Gmbh Anordnung zur Keimreduktion mittels Plasma
DE102013113941B4 (de) 2013-12-12 2015-07-23 Reinhausen Plasma Gmbh Anordnung zur Behandlung von Wunden
DE102015204753A1 (de) 2015-03-17 2016-10-20 Tesa Se Niedertemperatur-Plasma-Behandlung
DE102016102585A1 (de) * 2016-02-15 2017-08-17 Epcos Ag Vorrichtung zur Erzeugung eines Atmosphärendruck-Plasmas
DE102016104490B3 (de) * 2016-03-11 2017-05-24 Epcos Ag Vorrichtung und Verfahren zur Erzeugung eines nichtthermischen Atmosphärendruck-Plasmas
DE102017105430A1 (de) 2017-03-14 2018-09-20 Epcos Ag Vorrichtung zur Erzeugung eines nichtthermischen Atmosphärendruck-Plasmas und Wirkraum
DE102019106767A1 (de) * 2019-03-18 2020-09-24 Relyon Plasma Gmbh Anordnung zur Dekontamination einer Oberfläche von Objekten und Verfahren zur Dekontamination einer Oberfläche von Objekten
DE102020100823B4 (de) * 2020-01-15 2021-10-14 Nova Plasma Ltd Vorrichtung zur Erzeugung eines Plasmas und Verfahren zur Durchführung einer Plasmabehandlung

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004237135A (ja) * 2003-02-03 2004-08-26 Nissan Motor Co Ltd 触媒素子及びこれを用いた排気ガス浄化装置
DE102005032890B4 (de) * 2005-07-14 2009-01-29 Je Plasmaconsult Gmbh Vorrichtung zur Erzeugung von Atmosphärendruck-Plasmen
DE102008018827B4 (de) 2008-04-15 2010-05-12 Maschinenfabrik Reinhausen Gmbh Vorrichtung zur Erzeugung eines Atmosphärendruck-Plasmas

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12120808B2 (en) 2019-08-27 2024-10-15 Tdk Electronics Ag Apparatus for generating a gas discharge

Also Published As

Publication number Publication date
EP2141968A3 (de) 2014-01-22
EP2141968A2 (de) 2010-01-06
DE202008008980U1 (de) 2008-09-04
PL2141968T3 (pl) 2017-06-30

Similar Documents

Publication Publication Date Title
EP2141968B1 (de) Vorrichtung zur Erzeugung eines Atmosphärendruck-Plasmas
DE69304522T2 (de) Stabilisator fuer schalt-mode geleistet radio-frequenz plasma einrichtung
DE69829934T2 (de) Plasmaerzeugung und materialplasmabearbeitung
DE102011076404B4 (de) Verfahren zur Impedanzanpassung der Ausgangsimpedanz einer Hochfrequenzleistungsversorgungsanordnung an die Impedanz einer Plasmalast und Hochfrequenzleistungsversorgungsanordnung
DE10024883A1 (de) Plasmaätzanlage
WO2001006539A1 (de) Vorrichtung und verfahren zum ätzen eines substrates mittels eines induktiv gekoppelten plasmas
EP2020672B1 (de) Hochfrequenzgenerator für Ionen- und Elektronenquellen
WO1992022920A1 (de) Vorrichtung zur plasmaunterstützten bearbeitung von substraten
WO1993007639A1 (de) Verfahren zur generierung angeregter neutraler teilchen für ätz- und abscheideprozesse in der halbleitertechnologie
DE4110632A1 (de) Plasmabearbeitungseinrichtung
DE202017103327U1 (de) Vorrichtung zum Zünden einer Plasmalast
EP1203396B1 (de) Verfahren zum ätzen eines substrates mittels eines induktiv gekoppelten plasmas
EP0211015A1 (de) Verfahren und vorrichtung zur beseitigung von kesselstein und korrosion oder zum verhüten der bildung von kesselstein und korrosion
DE102008028166B4 (de) Vorrichtung zur Erzeugung eines Plasma-Jets
AT504487B1 (de) Vorrichtung zur erzeugung von plasma oder radikalen mittels mikrowellen
EP1872637A1 (de) Vorrichtung und verfahren zur plasmabeschichtung
DE102004055256B4 (de) Hochfrequenz-Elektronenquelle
DE112005000627B4 (de) Plasmabehandlung grossvolumiger Bauteile
WO2021037576A1 (de) Vorrichtung zur erzeugung einer gasentladung
DE2740254C3 (de) Verfahren und Anordnung zum Polarisieren von piezoelektrischen keramischen Elementen
DE102012204447B4 (de) Vorrichtung und Verfahren zur Erzeugung eines Plasmas
DE10231738B4 (de) Anpassungsvorrichtung für eine Induktions-Plasmabrennervorrichtung und Verfahren zur elektrischen Steuerung und Regelung einer Induktions-Plasmabrennervorrichtung
DE102024104009A1 (de) HF-Generator für ein Plasmabearbeitungssystem und ein solches Plasmabearbeitungssystem
DE102008046164B4 (de) Schaltungsanordnung mit zwei Reglern für einen Kraftfahrzeugscheinwerfer mit einer Gasentladungslampe
EP4091189A1 (de) Resonator und leistungsoszillator zum aufbau einer integrierten plasmaquelle sowie deren verwendung

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20090513

AK Designated contracting states

Kind code of ref document: A2

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK TR

PUAL Search report despatched

Free format text: ORIGINAL CODE: 0009013

AK Designated contracting states

Kind code of ref document: A3

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK TR

AX Request for extension of the european patent

Extension state: AL BA RS

RIC1 Information provided on ipc code assigned before grant

Ipc: H05H 1/24 20060101AFI20131219BHEP

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

INTG Intention to grant announced

Effective date: 20150521

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK TR

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

Free format text: NOT ENGLISH

REG Reference to a national code

Ref country code: AT

Ref legal event code: REF

Ref document number: 813189

Country of ref document: AT

Kind code of ref document: T

Effective date: 20160715

Ref country code: CH

Ref legal event code: EP

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

Free format text: LANGUAGE OF EP DOCUMENT: GERMAN

REG Reference to a national code

Ref country code: DE

Ref legal event code: R096

Ref document number: 502009012800

Country of ref document: DE

REG Reference to a national code

Ref country code: NL

Ref legal event code: FP

REG Reference to a national code

Ref country code: SE

Ref legal event code: TRGR

REG Reference to a national code

Ref country code: LT

Ref legal event code: MG4D

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160713

Ref country code: IS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20161113

Ref country code: HR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160713

Ref country code: NO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20161013

Ref country code: FI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160713

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: ES

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160713

Ref country code: LV

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160713

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20161014

Ref country code: PT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20161114

REG Reference to a national code

Ref country code: DE

Ref legal event code: R097

Ref document number: 502009012800

Country of ref document: DE

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: RO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160713

Ref country code: EE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160713

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 9

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160713

Ref country code: SK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160713

26N No opposition filed

Effective date: 20170418

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170531

Ref country code: SI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160713

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20170513

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MC

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160713

REG Reference to a national code

Ref country code: IE

Ref legal event code: MM4A

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170531

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170531

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170513

REG Reference to a national code

Ref country code: BE

Ref legal event code: MM

Effective date: 20170531

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170513

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170513

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 10

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170531

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160713

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: HU

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT; INVALID AB INITIO

Effective date: 20090513

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CY

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20160713

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20160713

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: NL

Payment date: 20200518

Year of fee payment: 12

Ref country code: TR

Payment date: 20200512

Year of fee payment: 12

Ref country code: CZ

Payment date: 20200506

Year of fee payment: 12

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: PL

Payment date: 20200507

Year of fee payment: 12

Ref country code: SE

Payment date: 20200525

Year of fee payment: 12

Ref country code: BG

Payment date: 20200526

Year of fee payment: 12

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20210521

Year of fee payment: 13

Ref country code: DE

Payment date: 20210525

Year of fee payment: 13

Ref country code: IT

Payment date: 20210531

Year of fee payment: 13

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: AT

Payment date: 20210518

Year of fee payment: 13

REG Reference to a national code

Ref country code: SE

Ref legal event code: EUG

REG Reference to a national code

Ref country code: NL

Ref legal event code: MM

Effective date: 20210601

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BG

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20211130

Ref country code: SE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20210514

Ref country code: CZ

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20210513

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NL

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20210601

REG Reference to a national code

Ref country code: DE

Ref legal event code: R119

Ref document number: 502009012800

Country of ref document: DE

REG Reference to a national code

Ref country code: AT

Ref legal event code: MM01

Ref document number: 813189

Country of ref document: AT

Kind code of ref document: T

Effective date: 20220513

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: AT

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20220513

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: PL

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20210513

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20220531

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20221201

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IT

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20220513

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: TR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20210513