Classifications

• • C—CHEMISTRY; METALLURGY
  • C01—INORGANIC CHEMISTRY
  • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
  • C01G23/00—Compounds of titanium
  • C01G23/04—Oxides; Hydroxides
  • C01G23/047—Titanium dioxide
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B82—NANOTECHNOLOGY
  • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
  • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
  • C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
  • C03C1/008—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route for the production of films or coatings
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
  • C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
• • C—CHEMISTRY; METALLURGY
  • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
  • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
  • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
  • C09C1/36—Compounds of titanium
  • C09C1/3607—Titanium dioxide
  • C09C1/3684—Treatment with organo-silicon compounds
• • C—CHEMISTRY; METALLURGY
  • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
  • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
  • C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
  • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
  • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
  • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
  • C23C18/1208—Oxides, e.g. ceramics
  • C23C18/1216—Metal oxides
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
  • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
  • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
  • C23C18/1225—Deposition of multilayers of inorganic material
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
  • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
  • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
  • C23C18/125—Process of deposition of the inorganic material
  • C23C18/1262—Process of deposition of the inorganic material involving particles, e.g. carbon nanotubes [CNT], flakes
  • C23C18/127—Preformed particles
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
  • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
  • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
  • C23C18/125—Process of deposition of the inorganic material
  • C23C18/1287—Process of deposition of the inorganic material with flow inducing means, e.g. ultrasonic
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
  • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
  • B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
  • B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
  • B01J21/063—Titanium; Oxides or hydroxides thereof
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
  • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
  • B01J35/00—Catalysts, in general, characterised by their form or physical properties
  • B01J35/60—Catalysts, in general, characterised by their form or physical properties characterised by their surface properties or porosity
  • B01J35/61—Surface area
  • B01J35/613—10-100 m2/g
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
  • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
  • B01J35/00—Catalysts, in general, characterised by their form or physical properties
  • B01J35/60—Catalysts, in general, characterised by their form or physical properties characterised by their surface properties or porosity
  • B01J35/61—Surface area
  • B01J35/615—100-500 m2/g
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
  • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
  • B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
  • B01J37/02—Impregnation, coating or precipitation
  • B01J37/0215—Coating
• • C—CHEMISTRY; METALLURGY
  • C01—INORGANIC CHEMISTRY
  • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
  • C01P2004/00—Particle morphology
  • C01P2004/01—Particle morphology depicted by an image
  • C01P2004/03—Particle morphology depicted by an image obtained by SEM
• • C—CHEMISTRY; METALLURGY
  • C01—INORGANIC CHEMISTRY
  • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
  • C01P2004/00—Particle morphology
  • C01P2004/60—Particles characterised by their size
  • C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
• • C—CHEMISTRY; METALLURGY
  • C01—INORGANIC CHEMISTRY
  • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
  • C01P2004/00—Particle morphology
  • C01P2004/60—Particles characterised by their size
  • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
• • C—CHEMISTRY; METALLURGY
  • C01—INORGANIC CHEMISTRY
  • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
  • C01P2004/00—Particle morphology
  • C01P2004/60—Particles characterised by their size
  • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
• • C—CHEMISTRY; METALLURGY
  • C01—INORGANIC CHEMISTRY
  • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
  • C01P2006/00—Physical properties of inorganic compounds
  • C01P2006/12—Surface area
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2217/00—Coatings on glass
  • C03C2217/40—Coatings comprising at least one inhomogeneous layer
  • C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
  • C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
  • C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
  • C03C2217/475—Inorganic materials
  • C03C2217/477—Titanium oxide
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2217/00—Coatings on glass
  • C03C2217/70—Properties of coatings
  • C03C2217/71—Photocatalytic coatings
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2218/00—Methods for coating glass
  • C03C2218/10—Deposition methods
  • C03C2218/11—Deposition methods from solutions or suspensions
  • C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes

Definitions

• Titanium dioxide layer with improved surface properties Titanium dioxide layer with improved surface properties
• dirt deposits permanently impair the function of components such as e.g. Sensors, injectors, valves, turbines or gas and air compressors.
• Titanium dioxide is described as a photocatalytically active material in D. Bruemann "Photocatalytic water treatment - solar energy applications", Solar Energy (2004), Vol.77, pp. 445.459.
• DE 10 2006 038 585.3 proposes a titanium dioxide coating based on a sol-gel system.
• the coatings of the prior art often have the disadvantage that they are either catalytically active only at elevated temperatures (eg above 300 ° C.), or the application of these layers comprises steps which are carried out at elevated temperature, so that The use of these layers in applications based on glass or plastic, but also in applications based on metals that may undergo thermal transformations, is not always possible.
• thermocatalytically active titanium dioxide coating characterized in that the titanium dioxide coating has a BET surface area of ⁇ IO m 2 / g to ⁇ 250 m 2 / g
• titanium dioxide coating in the sense of the present invention means or comprises in particular that the coating contains titanium dioxide as the main component and / or as catalytically active main component. Preference is given to ⁇ 50%, more preferably ⁇ 60%, of the titanium dioxide coating.
• BET surface in the sense of the present invention means or comprises in particular a specific surface of a substance analyzed by means of gas sorption, the amount of absorbed gas is proportional to the surface.
• a BET surface can be measured by means of nitrogen sorption, as described below.
• the coating according to the invention is characterized by a simple and material-saving production and application which avoids complicated processes such as vacuum coatings (CVD / PVD).
• the thickness of the titanium dioxide coating produced amounts to a few micrometers in many applications. It is therefore largely insensitive to thermal stress and affects component dimensions and tolerances only insignificantly.
• titanium dioxide coating has a satisfactory self-cleaning can even at moderately elevated temperatures (above 200 0 C) in many applications already be detected.
• a preferred embodiment of the invention is characterized in that the titanium dioxide coating has a BET surface area of> 40 m 2 / g to ⁇ 220 m 2 / g, more preferably ⁇ 60 m 2 / g to ⁇ 180 m 2 / g, and most preferably ⁇ 80 m 2 / g to ⁇ 120 m 2 / g.
• a preferred embodiment of the invention is characterized in that the titanium dioxide coating at 250 0 C. has an activity of ⁇ O.OOl, preferably ⁇ O.OOl to ⁇ l. This has proven to be favorable for many applications.
• activity means or comprises in particular the ability of the coating to decompose organic materials at elevated temperature into low molecular weight, readily volatile compounds (usually carbon dioxide) Carbon dioxide is called activity.
• the following example serves as a reference value for an activity at 250 ° C. of 0.01: A coating for which, in the measuring method shown below, an activity of
• An activity can be measured in particular by means of IR spectroscopic detection of the degradation products, as described below.
• a preferred embodiment of the invention is characterized in that the titanium dioxide coating at 250 0 C has an activity of ⁇ O.Ol, preferably ⁇ O .1 to ⁇ 0.8.
• a preferred embodiment of the invention is characterized in that the titanium dioxide coating has a temperature stability of> 400 ° C.
• temperature stability in the sense of the present invention means in particular that at ⁇ 400 ° C. (or another selected temperature) the activity does not decrease within 1 h, preferably 2 h, or only by 30%.
• a preferred embodiment of the invention is characterized in that the titanium dioxide coating has a temperature stability of ⁇ 450 ° C, more preferably ⁇ 500 ° C.
• a preferred embodiment of the invention is characterized in that the titanium dioxide coating contains areas in which the titanium dioxide is substantially contained in titanium dioxide particles.
• titanium dioxide particles are preferably present in crystalline modification, more preferably in the anatase modification.
• Substantially means and / or in particular comprises ⁇ 70%, more preferably ⁇ 80%, and most preferably ⁇ 90% to ⁇ 1010. All titanium dioxide in the coating is preferably contained in titanium dioxide particles.
• a preferred embodiment of the invention is characterized in that the titanium dioxide coating has areas in which titanium dioxide particles are embedded in a binder matrix and / or are connected to one another via a binder.
• a preferred embodiment of the invention is characterized in that the ratio of titanium dioxide to binder is from> 1: 1 to ⁇ 3: 1 [mol / mol].
• a preferred embodiment of the invention is characterized in that the final binder in its final form is selected from the group consisting of silicon and / or aluminum oxide and organic compounds or mixtures thereof.
• a preferred embodiment of the invention is characterized in that the titanium dioxide particles consist of surface acne tive titanium dioxide precursor particles are constructed, which have a BET surface area of ⁇ IO m 2 / g to ⁇ 300 m 2 / g.
• built-up means and / or in particular comprises that the surface-active titanium dioxide precursor particles are surrounded with binder during the production of the titanium dioxide coating and / or embedded in a binder matrix.
• a preferred embodiment of the invention is characterized in that the titanium dioxide precursor particles have a mean particle size of ⁇ 10 nm to ⁇ 50 ⁇ m. This has proven to be particularly favorable for many applications within the present invention.
• the titanium dioxide precursor particles preferably have an average particle size of ⁇ 20 nm to ⁇ 20 ⁇ m, more preferably ⁇ 30 nm to ⁇ ⁇ m ⁇ m.
• a preferred embodiment of the invention is characterized in that the titanium dioxide coating is produced by means of a sol-gel process in such a way that titanium dioxide precursor particles are embedded in a binder matrix by a sol-gel process.
• sol-gel process in the sense of the present invention means or comprises in particular all processes in which metal precursor materials, in particular metal halides and / or metal alkoxides, are subjected to hydrolysis and subsequent condensation in the solution.
• the present invention also relates to the use of a titanium dioxide coating according to the present invention and / or a titanium dioxide coating produced by the process according to the invention for
• Fig. 1 is a scanning electron micrograph of a 2-fold coated plate
• FIG. 3 shows a diagram of a schematic apparatus for measuring the activity by means of IR spectrometric detection of the decomposition products (see method section); such as
• BE ISPIEL I shows a diagram of an example sample according to an embodiment of the invention and a comparison sample whose activity has been measured (see method section).
• Example 1 relates to the following Example I, in which - purely illustrative and not restrictive - a titanium dioxide coating was produced as follows:
• a particle dispersion was prepared by mixing 19.2 g of isopropyl alcohol and 0.384 g of Byk 180 (dispersing aid) for 3 minutes. Subsequently, 2.2 g of titanium dioxide precursor particles having a BET surface area of 90 m 2 / g were added and dispersed in the ultrasonic for 2-5 min.
• particle dispersion and binder precursor mixture were mixed.
• the titanium dioxide coating was applied by dipping, subsequent drying, repeated dipping and final drying.
• Example 2 shows a photograph of a platelet to illustrate the thermocatalytic activity of the titanium dioxide coating according to Example I.
• the lower half was provided with the titanium dioxide coating, the upper half is uncoated.
• the BET surface area was measured according to S. Brunauer, P.Emmet, E. Teller, Absorption of Gases in Multimolecular Layers, J.A.C.S., Vol. 60, 1938, p. 309.
• the activity was measured by IR spectrometric recording of the degradation products.
• Fig. 3 the basic structure of a usable apparatus is shown. It is a closed loop of a heatable reactor in which on a coated and provided with organic impurity test sample, the decomposition takes place and attached in an IR spectrometer (Fa.Bruker, Vector 22 with Opus 6) gas cell with CaF2 windows , which serves to measure the concentration of the degradation products.
• This closed circuit is rolled over by a diaphragm pump.
• MKS mass flow controller
• the characterization of a sample is as follows: After the application of 1500 nl 16.6% Shell Alvania test solution by means of a nanoliter pipette, the sample after evaporation of the solvent (about 15 min) is introduced into the reactor, the circuit hermetically sealed and evacuated repeatedly via a pump and then filled again with the abovementioned gas mixture until normal pressure is reached, until no changes are measurable in the measured CO2 values, ie the CO2 content in the circuit is below the resolution limit of the device.
• the reactor is heated to 250 0 C, simultaneously started the measurement.
• the catalytically active coating can gradually decompose the fat contamination into CO2, so that the CO2 content in the circuit steadily increases over the course of time.
• This is detected in the gas cell of the IR spectrometer and recorded by a control computer every 1-4 min (depending on the activity of the sample) in a measured value.
• the measured value results from an integration of the CO2 bands of a recorded spectrum.
• a calibration / calibration curve was created at the time of commissioning of the measuring system.
• Fig. 4 shows a diagram of an example sample according to an embodiment of the invention (upper curve) and a comparison sample (lower curve).
• the comparative sample shows the activity of a layer according to DE 10 2006 0038585.
• the measurement is continued until the CO2 value in the circulatory system has reached a saturation level.
• Slope (here 0.0105) represents a measure of the catalytic activity of the sample.
• the activity of the measured sample associated with the diagram in FIG. 4 is thus 0.0105.
• the activity of the control was determined to be 0.0054

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• General Physics & Mathematics (AREA)
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  • 2007-02-19 DE DE102007008121A patent/DE102007008121A1/de not_active Withdrawn
• 2008
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  • 2008-02-13 WO PCT/EP2008/051751 patent/WO2008101848A1/de active Application Filing
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