EP2118005A2 - Installation d'affinage de silicium - Google Patents
Installation d'affinage de siliciumInfo
- Publication number
- EP2118005A2 EP2118005A2 EP08762072A EP08762072A EP2118005A2 EP 2118005 A2 EP2118005 A2 EP 2118005A2 EP 08762072 A EP08762072 A EP 08762072A EP 08762072 A EP08762072 A EP 08762072A EP 2118005 A2 EP2118005 A2 EP 2118005A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- crucible
- silicon
- refractory material
- sole
- installation according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 86
- 239000010703 silicon Substances 0.000 title claims abstract description 86
- 238000007670 refining Methods 0.000 title claims abstract description 17
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims description 84
- 239000011819 refractory material Substances 0.000 claims abstract description 28
- 238000004804 winding Methods 0.000 claims abstract description 23
- 238000001816 cooling Methods 0.000 claims abstract description 14
- 238000010438 heat treatment Methods 0.000 claims abstract description 12
- 230000006698 induction Effects 0.000 claims abstract description 7
- 230000001681 protective effect Effects 0.000 claims description 29
- 238000009434 installation Methods 0.000 claims description 23
- 239000000843 powder Substances 0.000 claims description 18
- 239000004020 conductor Substances 0.000 claims description 14
- 239000012809 cooling fluid Substances 0.000 claims description 12
- 230000001939 inductive effect Effects 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 11
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 5
- 150000001768 cations Chemical class 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 15
- 239000007789 gas Substances 0.000 description 15
- 239000012535 impurity Substances 0.000 description 12
- 239000000377 silicon dioxide Substances 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 238000005266 casting Methods 0.000 description 6
- 239000010410 layer Substances 0.000 description 5
- 238000002844 melting Methods 0.000 description 5
- 230000008018 melting Effects 0.000 description 5
- 239000012071 phase Substances 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 238000000746 purification Methods 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000005672 electromagnetic field Effects 0.000 description 3
- 230000005284 excitation Effects 0.000 description 3
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 3
- 229910010271 silicon carbide Inorganic materials 0.000 description 3
- 238000007711 solidification Methods 0.000 description 3
- 230000008023 solidification Effects 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004377 microelectronic Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- NSMXQKNUPPXBRG-SECBINFHSA-N (R)-lisofylline Chemical compound O=C1N(CCCC[C@H](O)C)C(=O)N(C)C2=C1N(C)C=N2 NSMXQKNUPPXBRG-SECBINFHSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000004320 controlled atmosphere Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000010339 dilation Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 229910001338 liquidmetal Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000005272 metallurgy Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000013082 photovoltaic technology Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/225—Refining
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/037—Purification
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/02—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture in electric furnaces, e.g. by dielectric heating
- C03B5/021—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture in electric furnaces, e.g. by dielectric heating by induction heating
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B14/00—Crucible or pot furnaces
- F27B14/06—Crucible or pot furnaces heated electrically, e.g. induction crucible furnaces with or without any other source of heat
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B14/00—Crucible or pot furnaces
- F27B14/08—Details peculiar to crucible or pot furnaces
- F27B14/10—Crucibles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic System
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0753256A FR2912397B1 (fr) | 2007-02-14 | 2007-02-14 | Installation d'affinage de silicium. |
PCT/FR2008/050220 WO2008104702A2 (fr) | 2007-02-14 | 2008-02-12 | Installation d'affinage de silicium |
Publications (1)
Publication Number | Publication Date |
---|---|
EP2118005A2 true EP2118005A2 (fr) | 2009-11-18 |
Family
ID=38543853
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP08762072A Withdrawn EP2118005A2 (fr) | 2007-02-14 | 2008-02-12 | Installation d'affinage de silicium |
Country Status (8)
Country | Link |
---|---|
US (1) | US20130133373A1 (fr) |
EP (1) | EP2118005A2 (fr) |
JP (1) | JP5415285B2 (fr) |
CN (1) | CN101646621B (fr) |
AU (1) | AU2008220638B2 (fr) |
FR (1) | FR2912397B1 (fr) |
WO (1) | WO2008104702A2 (fr) |
ZA (1) | ZA200906337B (fr) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2981740B1 (fr) * | 2011-10-20 | 2018-03-23 | Francewafer | Installation de purification d'un materiau |
CN105276980B (zh) * | 2014-05-28 | 2017-11-03 | 国核华清(北京)核电技术研发中心有限公司 | 陶瓷坩埚 |
US10069535B2 (en) | 2016-12-08 | 2018-09-04 | At&T Intellectual Property I, L.P. | Apparatus and methods for launching electromagnetic waves having a certain electric field structure |
US11912608B2 (en) | 2019-10-01 | 2024-02-27 | Owens-Brockway Glass Container Inc. | Glass manufacturing |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0459421A1 (fr) * | 1990-05-30 | 1991-12-04 | Kawasaki Steel Corporation | Méthode et appareil pour purifier le silicium |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2009459A1 (de) * | 1970-02-28 | 1971-09-09 | Consortium Elektrochem Ind | Verfahren zur Herstellung von Sihciumformkorpern |
DE3732073A1 (de) * | 1987-09-23 | 1989-04-06 | Siemens Ag | Hochreine innenauskleidung fuer einen elektroniederschachtofen |
JPH09142823A (ja) * | 1995-11-29 | 1997-06-03 | Kawasaki Steel Corp | 金属シリコンの精製方法および精製装置 |
FR2751738B1 (fr) * | 1996-07-25 | 1998-08-28 | Commissariat Energie Atomique | Four de fusion par induction directe en creuset froid |
JPH10182133A (ja) * | 1996-12-26 | 1998-07-07 | Kawasaki Steel Corp | シリコン精製方法 |
DE19962449C2 (de) * | 1999-12-22 | 2003-09-25 | Heraeus Quarzglas | Quarzglastiegel und Verfahren für seine Herstellung |
FR2871151B1 (fr) * | 2004-06-07 | 2006-08-11 | Centre Nat Rech Scient Cnrse | Installation d'affinage de silicium |
-
2007
- 2007-02-14 FR FR0753256A patent/FR2912397B1/fr not_active Expired - Fee Related
-
2008
- 2008-02-12 US US12/527,036 patent/US20130133373A1/en not_active Abandoned
- 2008-02-12 CN CN2008800050944A patent/CN101646621B/zh not_active Expired - Fee Related
- 2008-02-12 AU AU2008220638A patent/AU2008220638B2/en not_active Ceased
- 2008-02-12 WO PCT/FR2008/050220 patent/WO2008104702A2/fr active Application Filing
- 2008-02-12 JP JP2009549842A patent/JP5415285B2/ja not_active Expired - Fee Related
- 2008-02-12 EP EP08762072A patent/EP2118005A2/fr not_active Withdrawn
-
2009
- 2009-09-11 ZA ZA2009/06337A patent/ZA200906337B/en unknown
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0459421A1 (fr) * | 1990-05-30 | 1991-12-04 | Kawasaki Steel Corporation | Méthode et appareil pour purifier le silicium |
Also Published As
Publication number | Publication date |
---|---|
AU2008220638B2 (en) | 2012-10-25 |
FR2912397B1 (fr) | 2009-05-08 |
CN101646621B (zh) | 2013-11-06 |
ZA200906337B (en) | 2010-11-24 |
JP2010517924A (ja) | 2010-05-27 |
JP5415285B2 (ja) | 2014-02-12 |
FR2912397A1 (fr) | 2008-08-15 |
CN101646621A (zh) | 2010-02-10 |
AU2008220638A1 (en) | 2008-09-04 |
WO2008104702A3 (fr) | 2008-11-06 |
US20130133373A1 (en) | 2013-05-30 |
WO2008104702A2 (fr) | 2008-09-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP1042224B1 (fr) | Procede et installation d'affinage du silicium | |
EP1753695B1 (fr) | Installation d'affinage de silicium | |
EP2118005A2 (fr) | Installation d'affinage de silicium | |
FR2853913A1 (fr) | Creuset pour un dispositif de fabrication d'un bloc de materiau cristallin et procede de fabrication | |
EP1742870B1 (fr) | Procede et installation de fabrication de blocs d'un materiau semiconducteur | |
FR3002314A1 (fr) | Four a induction et procede de traitement des dechets metalliques a entreposer | |
EP2419380A1 (fr) | Procédé et installation de purification d'une charge à base de silicium | |
US20190203377A1 (en) | Synthetic lined crucible assembly for czochralski crystal growth | |
FR2909990A1 (fr) | Procede et installation de fabrication de blocs d'un materiau semiconducteur | |
FR2566805A1 (fr) | Procede et dispositif pour le revetement de creusets de quartz avec des couches protectrices | |
FR2485414A1 (fr) | Installation pour fabriquer des poudres metalliques, notamment par atomisation d'un jet de metal, avec utilisation d'un panier de coulee | |
FR2482078A1 (fr) | Procede et dispositif pour la production de corps en verre de quartz, plats, transparents et pauvres en bulles | |
EP0082073B1 (fr) | Procédé et dispositif de frittage de parois réfractaires | |
EP0349405B1 (fr) | Procédé et installation de fusion par micro-ondes d'un matériau corrosif à chaud | |
EP0158563B1 (fr) | Procédé de fabrication non polluant de silicium massif à partir de silicium divisé | |
BE894795A (fr) | Procede de fusion et d'affinage electrique de verre | |
JP2010254534A (ja) | 坩堝、該坩堝を用いた精製装置および精製方法 | |
BE1010710A3 (fr) | Procede de production d'acier a partir d'eponges de fer. | |
WO2021038163A1 (fr) | Four a induction comprenant un circuit resonant additionnel | |
FR2488245A1 (fr) | Procede et dispositif de fusion par induction directe avec coulee en continu eventuelle d'un melange de deux ou plusieurs oxydes refractaires | |
FR2814971A1 (fr) | Procede et dispositif de spheroidisation par refusion de particules metalliques | |
EP3047053A1 (fr) | Procede de fabrication d'un lingot de silicium presentant une concentration homogene en phosphore | |
FR2749524A1 (fr) | Procede de fusion des fibres de l'amiante et dispositif pour sa mise en oeuvre | |
BE421950A (fr) |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20090908 |
|
AK | Designated contracting states |
Kind code of ref document: A2 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR |
|
17Q | First examination report despatched |
Effective date: 20091222 |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: EFD INDUCTION SA Owner name: COMMISSARIAT A L'ENERGIE ATOMIQUE |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: EFD INDUCTION SA Owner name: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES |
|
DAX | Request for extension of the european patent (deleted) | ||
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 20151014 |