EP1967606A1 - Creuset d'évaporation et appareil d'évaporation à propriété d'évaporation adaptée - Google Patents

Creuset d'évaporation et appareil d'évaporation à propriété d'évaporation adaptée Download PDF

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Publication number
EP1967606A1
EP1967606A1 EP07004794A EP07004794A EP1967606A1 EP 1967606 A1 EP1967606 A1 EP 1967606A1 EP 07004794 A EP07004794 A EP 07004794A EP 07004794 A EP07004794 A EP 07004794A EP 1967606 A1 EP1967606 A1 EP 1967606A1
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EP
European Patent Office
Prior art keywords
evaporation
chamber
electrical connection
evaporation crucible
axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP07004794A
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German (de)
English (en)
Inventor
Holger Aulbach
Helmut Grimm
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Priority to EP07004794A priority Critical patent/EP1967606A1/fr
Priority to KR1020080020654A priority patent/KR20080082484A/ko
Priority to CNA2008100065477A priority patent/CN101265567A/zh
Priority to JP2008056825A priority patent/JP2008231573A/ja
Priority to US12/043,894 priority patent/US20090196584A9/en
Priority to TW097107867A priority patent/TW200904999A/zh
Publication of EP1967606A1 publication Critical patent/EP1967606A1/fr
Withdrawn legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source

Definitions

  • the invention generally relates to thin-film forming apparatuses and crucibles used in apparatuses for thin film forming. Particularly, it relates to crucibles for evaporation of alloys or metals. Specifically it relates to an evaporation crucible and to an evaporation apparatus.
  • an evaporator For thin-film coating of a material on a substrate, an evaporator can be used.
  • coatings with metal films which e.g. provide a capacitor of a large panel display or a protective layer on a web, can be applied with evaporators.
  • a substrate which can be provided as a large and relatively thin glass plate, might be vertically positioned in a coating process and coated with a vertical evaporator.
  • a source for a material vapor to be deposited on a substrate is commonly provided with a vertical nozzle pipe, which defines a linear vertically extending source for coating a virtually aligned substrate.
  • linear sources provided thereby have a high complexity and are expensive to manufacture and to maintain. Additionally, the vertically extending nozzle pipe provides a substantial thermal irradiation towards the substrate.
  • the present invention provides an evaporation crucible according to independent claims 1 and 3, and an evaporation apparatus according to claim 19.
  • an evaporation crucible includes: an electrically conductive body and a cover; the body having a first electrical connection and a second electrical connection for applying a heating current through the body, the body includes a chamber providing a melting-evaporation area, the chamber including a chamber bottom and a chamber wall, wherein the cover forms an enclosure with the chamber.
  • the evaporation crucible further includes: a feeding opening for feeding a material; and a distributor orifice providing a vapor outlet of the enclosure.
  • an evaporation crucible includes: an electrically conductive body having a first electrical connection and a second electrical connection for applying a heating current through the body, the body includes a chamber providing a melting-evaporation area, the chamber including a chamber bottom and a chamber wall.
  • the evaporation crucible further includes: a first and a second heating portion provided adjacent to the chamber and between the chamber and the first and second electrical connection, respectively; and a feeding opening for feeding a material.
  • an evaporation apparatus including at least one evaporation crucible.
  • the evaporation crucible includes: an electrically conductive body and a cover; the body having a first electrical connection and a second electrical connection for applying a heating current through the body, the body includes a chamber providing a melting-evaporation area, the chamber including a chamber bottom and a chamber wall, wherein the cover forms an enclosure with the chamber.
  • the evaporation crucible further includes: a feeding opening for feeding a material; and a distributor orifice providing a vapor outlet of the enclosure.
  • Embodiments are also directed to apparatuses for carrying out the disclosed methods and including apparatus parts for performing the described method steps. These method steps may be performed by way of hardware components, a computer programmed by appropriate software, by any combination of the two or in any other manner. Furthermore, embodiments are also directed to methods by which the described apparatus operates or by which the described apparatus is manufactured. It includes method steps for carrying out functions of the apparatus or manufacturing parts of the apparatus.
  • Fig. 1a shows a schematic view of the body of an evaporation crucible including a pot-shaped chamber according to embodiments described herein;
  • Fig. 1b shows a further schematic view of the evaporation crucible of Fig. 1a including a cover;
  • Figs. 2A to 2D show cross-sections of a body of an evaporation crucible according to embodiments described herein;
  • Fig. 3 shows a schematic view of a further evaporation crucible including a body and a feeding bushing according to embodiments described herein;
  • Fig. 4a shows a schematic side view of an even further evaporation crucible including the body and a feeding opening according to embodiments described herein;
  • Fig. 4b shows a schematic top view of the evaporation crucible shown in Fig. 4a ;
  • Fig. 5 shows a schematic view of an evaporation crucible including a body, a cover and several vapor distributor orifices according to embodiments described herein;
  • Fig. 6 shows a schematic view of components of an evaporation apparatus for vapor deposition of a thin film on a substrate according to embodiments described herein;
  • Fig. 7 shows a schematic view of components of a further evaporation apparatus according to embodiments described herein.
  • aluminum is mainly described as a material to be deposited on a substrate.
  • the invention is also directed to metals, alloys or other materials to be evaporated and, e.g., used for the coating of a substrate.
  • a substrate is typically referred to as a glass substrate as often used for display technology, e.g., TFT displays.
  • Embodiments of the present invention can be applied to thin-film vapor deposition on other substrates and for other technologies.
  • Fig. 1a shows the body 120 of an evaporation crucible 100.
  • the body 120 includes a first electrical connection 162 and a second electrical connection 164. Between the two electrical connections a chamber 130 is provided.
  • the chamber 130 is pot-shaped and can, for example, have a substantially cylindrical form including chamber wall 132.
  • the chamber further includes a chamber bottom (not shown). Further, different body regions 122 and 124 can be provided between chamber 130 and the electrical connections, through which a current is provided for heating the evaporation crucible.
  • the regions which will be described in more detail with respect to Figs. 2A to 2D , are shaped to control the current flow and, thereby, the heat generation of the body 120 of the evaporation crucible 100.
  • the material to be deposited is melted and evaporated by heating the evaporator crucible 100.
  • Heating can be conducted by providing a power source (not shown) connected to the first electrical connection 162 and the second electrical connection 164. Thereby, heating is conducted by the current flowing through the body 120 of the crucible 100.
  • the resistance of the body is increased.
  • P is the power
  • R is the resistance
  • I the current.
  • the temperature in the melting-evaporation area in the chamber 130 can be in the range of 700°C to 1600°C or 1300°C-1600°C.
  • the resistance of different areas of the evaporator crucible 100 can further be controlled by changing the material composition of the evaporator crucible body 120
  • the materials of the crucible should be conductive, temperature resistant to the temperatures used for melting and evaporating the materials, and should be resistant with regard to the liquid materials or the material vapor, respectively.
  • liquid aluminum is highly reactive and can provide significant damage to crucibles for melting aluminum.
  • materials selected from the group consisting of a metallic boride, a metallic nitride, a metallic carbide, a non-metallic boride, a non-metallic nitride, a non-metallic carbide, nitrides, borides, graphite, and combinations thereof can be used (e.g., TiB 2 , a combination of TiB 2 and AIN, a combination of TiB 2 and BN, or a combination of TiB 2 , BN and AIN).
  • the difference in electrical resistivity of these materials can be used to further adapt the heat generation in the crucible.
  • the material composition in the different regions of the body can be chosen to have a corresponding resistivity depending on the desired heat generation in the respective regions.
  • the chamber 130 has an opening 130 for feeding a wire of the material to be evaporated.
  • the opening 130 is provided in a chamber wall.
  • the opening 130 is provided on an axis of the body 120 that is substantially perpendicular to the axis 2 of the body defined by the positions of the first electrical connection 162 and the second electrical connection 164.
  • the opening 130 for feeding the wire in the chamber 130 can also be provided close to or on an axis 2 defined by the positions of the first electrical connection and a second electrical connections (see, e.g. Figs. 4a and 4b ).
  • a feeding of the material can be provided by a wire. Additionally or alternatively, the material can be fed in the evaporation crucible by pellets or the like.
  • the opening 134 feeding the wire of the material to be evaporated and deposited on a substrate may also be provided in the cover 150.
  • the cover 150 which is shown in Fig. 1b , and the chamber 130 provide an enclosure with a melting-evaporation area.
  • the melting-evaporation area is closed to a maximum degree.
  • the amount of vapor leaving the chamber in an undesired direction e.g., in direction of the opening for feeding the material
  • the temperature in the melting-heating area of the chamber 130 is above the evaporation temperature of the material to be deposited.
  • a wire provided for feeding the material results in a local decrease in the temperature in a small portion of the melting-evaporation area.
  • the temperature is at least 200°C above the evaporation temperature, e.g., 200°C to 900 °C or 600°C to 870 °C above the evaporation temperature.
  • the temperature can be above 900°C or above 1150 °C.
  • a lower limit of the temperature depends on the melting temperature of the material to be deposited and the chamber pressure.
  • an upper limit of the temperature can be given by the temperature stability of the evaporation crucible.
  • chamber wall 132 of chamber 130 can have a distributor orifice 170 through which the material vapor may leave the enclosure with a defined evaporation direction.
  • Vapor deposition of thin films may, for example, be applied for organic light emitted diodes (OLED), for other display devices (e.g. TFT), or generally for thin-film coating on glass substrates or foils.
  • OLED organic light emitted diodes
  • TFT display devices
  • thin metal films are provided for display applications in order to control individual pixels of a display.
  • a linear evaporator unit with a nozzle pipe which redirects vapor emitted by an evaporation area of an elongated crucible.
  • the vertically arranged substrate can be transported past the linear evaporation apparatus in a horizontal direction for thin film coating of the substrate.
  • the nozzle pipe for redirecting the material vapor along horizontal evaporation axes and the commonly used crucibles are complex and difficult to maintain. Since vertical substrate arrangement is desired in light of particle contamination and bending of the substrates, it is desirable to have simplified evaporation sources for vertical evaporation applications.
  • Embodiments of evaporation crucibles described herein can be used as a point source for a vertical evaporation apparatus.
  • substrate size may be as follows.
  • a typical glass substrate and, thereby, also a coating area can have dimensions of about 0.7 mm x 370 mm x 470 mm.
  • next generation substrates can have a size of about 1100 mm x 1300 mm or larger.
  • applications described herein refer typically to large substrates.
  • a large substrate can have a height and length of 500 mm or above. This can typically be 680 mm x 880 mm, 1100 mm x 1300 mm or larger in the case of glass substrates.
  • Typical large flexible substrates, e.g., foils can have a width of at least 500 mm.
  • a cover 150 is provided on the chamber 130.
  • an enclosure including a melting-evaporation area is provided.
  • the material to be evaporated for example aluminum, is provided in the chamber through opening 130 and contacts a heated surface within the chamber.
  • the material may be provided at the bottom of the chamber.
  • the distributor orifice includes an evaporation axis, which is defined by the direction of the opening or the bore in the enclosure. For example, if a horizontal bore is provided in the wall of a pot-shaped chamber - the bore defining the distributor orifice - a horizontal evaporation axis is provided.
  • a distributor orifice can be provided with a channel length of 2 to 10 mm along the evaporation axis.
  • the diameter of the orifice is in the range of 3 to 20 mm.
  • the chamber can be pot-shaped.
  • the chamber has substantially the same dimension along axis 2 and an axis perpendicular thereto and/or the same dimensions along two perpendicular directions along the bottom of the chamber, a dimension can, according to even further embodiments, be in the range of 20 mm to 150 mm or typically 30 mm to 50 mm.
  • the height can be in the range of 20 mm to 50 mm or typically 25 mm to 40 mm.
  • the chamber is a circular or elliptical cylinder. This shape can provide an improved stability and/or volume-surface ratio.
  • the melting-evaporation area is to be understood as an area in which the material to be evaporated is melted and evaporated.
  • a one chamber system with similar pressure conditions within the chamber can be provided.
  • other separation means for separating a melting area and an evaporation area within the chamber might, according to embodiments described herein, be omitted. Accordingly, problems with migration of the very thin liquid material films or problems with a timely variation of customized temperature profiles in light of dissolving of portions of the evaporation crucible can be prevented.
  • the melting zone e.g., a surface of the melting evaporation area is within the evaporation zone.
  • a melting zone within the evaporation zone can e.g., be understood as having a reduced gas pressure region within the evaporation zone, for example in the range of 10% or 20%, in the melting-evaporation-area.
  • a melting zone within the evaporation zone can, as another example, be understood as having the melting zone (e.g., a surface) within the main evaporation zone, that is, for example, the zone in which at least 50% or 75% of the evaporation is conducted.
  • the melting zone e.g., a surface
  • the main evaporation zone that is, for example, the zone in which at least 50% or 75% of the evaporation is conducted.
  • the evaporation crucible 100 includes a body 120 and a cover 150. If the material, for example aluminum, is provided by continuously feeding the material to be deposited with a feeding wire 102, an equilibrium can be maintained such that the amount of material in the system is substantially constant. Thereby, the amount of material inserted in the system is provided by the diameter and the feeding speed of the feeding wire 102. In order to provide an equilibrium, the amount of material which is evaporated from the evaporator crucible 100, and the amount of material fed in the system should be similar.
  • a cover 150 is provided on an upper portion of the chamber wall 132. According to one embodiment, it is possible to provide the cover 150 such that the cover is centered with respect to the chamber 130 at an inner portion of the chamber wall 132. According to further embodiments, the cover 150 can, thereby, have a lid extending outwardly upon the upper edge of the chamber 130 or can be provided within a recess of the chamber wall. According to an even further embodiment, the cover 150 may be centered with respect to the chamber 130 by an outer portion of the chamber wall 132.
  • the cover 150 can be made of the non-conductive material. Thereby, it may include BN, or the like. A non-conductive cover is passively heated by the adjacent portion of the body.
  • the cover 150 can be sufficiently heated such that there is hardly any condensation of vapor at the cover. Thereby, migration of liquid material in the contact region of the chamber and the cover can be prevented. Further, the sufficiently heated cover 152 together with the distributor orifice 170 provides a melting-evaporation area such that the evaporated material is mainly influenced by the distributor orifice. The vapor leaves the chamber via the orifice. The presence of the cover is hardly experienced by the material vapor.
  • the cover 150 allows a vertical arrangement of a plurality of evaporation crucibles 100, whereby a vertical evaporation apparatus including several point source units can be realized.
  • the shape of the body of an evaporation crucible can be designed to have different cross-sections as shown in Figs. 2A to 2D.
  • Fig. 2A shows a cross-section in the area of the electrical connections 162 or 164.
  • the cross-section is indicated by section A-A in Fig. 1a .
  • Fig. 2B shows a cross-section at the section B-B in Fig. 1a .
  • the cross-sectional area at the region 122 can be similar to the cross-sectional area at the electrical connection 162.
  • the cross-section 122 has been converted from a horizontally flat shape to a vertical shape.
  • a cross-section shape transforming portion can be provided as a portion of the body on one or both sides of the chamber.
  • the cross-section shape transforming portion is an intermediate electrically conductive area with a modified cross-section.
  • the current flow of a heating current through the body 120 is transformed such that the current flows substantially at the entire height of the body and, thus, the chamber 130.
  • the cross-section shape of a cross-section shape transforming portion can be at least 80 % or 90 % of the chamber height.
  • the cross-section shape transforming area of the body can be provided between an electrical connection of the body and a heating portion of the body, which is described below, or a chamber of the body.
  • the cross-section shape transforming portion and/or the transition from the electrical connection to the cross-section shape transforming portion can be cross-section area conserving.
  • a heating of the chamber 130 mainly along the entire height of the chamber reduces temperature gradients that may result in cracking of the evaporation crucible. Further, the cover provided on the top portion of the chamber can be heated to substantially the same temperature as the chamber itself. Thereby, condensation and resulting migration of resulting liquid material can be prevented.
  • Fig. 2C shows the cross-section at the portion 124.
  • the portion 124 is a heating portion which is provided between the electrical connection and the chamber. This heating portion is adjacent to the chamber.
  • the heating portion 124 can be provided by reducing the cross-sectional area and/or the resistivity in this region of the body by about 5 % to 20%.
  • the heating portion can be provided at a higher temperature as compared to the electrical connection by cooling the area of the electrical connection.
  • the electrical connection provides a heat sink in light of, e.g., cooled connecting elements of an evaporation apparatus.
  • the connection elements of the evaporation apparatus can for example be a clamp unit.
  • the heating portion 124 can be provided by having a heat sink at the electrical connection 162 and by the slightly reduced cross-sectional area.
  • the cross-section shown in Fig. 2C also has a vertical elongation to continue the current flow provided by a cross-section of Fig. 2B towards the chamber of the body.
  • a heating portion 124 of the body can be provided on one or both sides of the chamber, adjacent to the chamber and located between the chamber and a respective one of the electrical connections. Additionally or alternatively, the heating portion can have a higher resistance than the electrical connection, e.g., due to the cross-sectional area and/or the material resistivity.
  • the cross-section of the chamber 130 including the chamber wall 132 and the chamber bottom 133 is shown in Fig. 2D.
  • Fig. 2D illustrates an opening for feeding a material to be evaporated and a distributor orifice 170.
  • the cross-sectional area of the chamber is similarly or slightly smaller than the cross-section of the heating portion 124.
  • the cross-sectional area and/or the resistivity of the chamber can be 0% to 20% smaller than the cross-sectional area and/or the resistivity of the heating portion 124 shown in Fig. 2C .
  • the heating portions on both sides and adjacent to the chamber provide an improved symmetric heating as compared to only locally heating the chamber.
  • the electrical connections 162, the region 122 and the region 124 together have a length in the range of 80 mm to 220 mm. Thereby, a transition from comparably cold regions at the electrical connections to the comparable high temperature regions in and adjacent to the chamber can be provided.
  • the electrical connections may be provided at the body by protrusions of the main body.
  • the protrusions can be formed to be contacted by contact elements of the evaporation apparatus.
  • the contact elements of the evaporation apparatus can be cooled.
  • the electrical contacts are provided for applying a heating current through the body. The current is thereby applied by a power source of the evaporation apparatus.
  • a further evaporation crucible 300 which can also be used as a point source for vertical evaporation apparatuses, is shown in Fig. 3 .
  • the crucible 300 includes a first electrical connection 162 and a second electrical connection 164.
  • the chamber of the body 120 is covered by the cover 150.
  • an opening for introducing a wire for feeding the material to be evaporated is provided within one chamber wall 132.
  • a bushing 330 is provided to insert the wire in the chamber through the bushing.
  • the opening in the chamber wall 132 is inclined with respect to the chamber wall. Thereby, the wire can be inserted towards the bottom of the chamber.
  • the opening in the chamber wall is provided with a chamfered edge.
  • an opening 430 may also be provided in a portion of the body that is adjacent to the chamber. Thereby, and opening in the chamber wall which is at or near axis 2 is provided.
  • an opening for introducing the feeding wire may be provided in a cover.
  • Fig. 4a shows the body 120 of crucible 400.
  • the material wire for feeding the material to be evaporated can be provided at or close to axis 2.
  • the body 120 includes chamber 130 having a chamber wall 132 and a chamber bottom 133.
  • a distributor orifice 170 is provided in a wall 132 of the chamber 130.
  • the arrangement shown in Fig. 4 can also be provided with a bushing described with respect to Fig. 3 .
  • the distributor orifice 170 provided in the wall of the chamber 130 provides a vapor orifice with a directional evaporation axis.
  • the distributor orifice includes an evaporation axis, which is defined by the by the direction of the opening or the bore in the enclosure. For example, if a horizontal bore is provided in the wall of a pot-shaped chamber - the bore defining the distributor orifice - a horizontal evaporation axis is provided.
  • an evaporation distribution is provided by the distributor orifice.
  • the distribution of evaporation can be defined by the bore or the opening in the chamber. Accordingly, the distribution can be adapted by the shape, the diameter, and by the length of the distributor orifice.
  • the wall thickness can define a length of the distributor orifice along the directional evaporation axis of the orifice.
  • the shape of the distributor orifice can be round, oval, elliptical, angular, cylindrical, slit shaped, or formed in another way.
  • the direction of the evaporation axis can be horizontal or inclined with respect to the chamber wall surface.
  • an evaporation crucible 500 can be provided with a first distributor orifice 571 and the second distributor orifice 572.
  • the distributor orifices have an elongated oval shape with the elongated axis being vertical.
  • the chamber of the body 120 having the first electrical connection and the second electrical connection 164 can be covered with a cover 550 that is centered by outer portion of the chamber wall 132.
  • a distributor orifice can be provided with a channel length of 2 to 10 mm along the evaporation axis.
  • the diameter of the orifice is in the range of 3 to 20 mm.
  • a method of forming a thin film with an evaporation crucible described herein can be carried out by using an apparatus which is entirely placed in a vacuum atmosphere of 10 -2 -10 -6 mbar. Thereby, the thin film can be vapor deposited on a substrate or a carrier foil without contamination of particles from ambient atmosphere.
  • a method of evaporating a material includes: providing a chamber with a melting-evaporation area, and inserting a solid material to be evaporated in the melting-evaporation area.
  • evaporation crucibles 100 are vertically arranged one above the other. This is, for example, possible in light of the covers provided on the evaporation crucible.
  • the electrical connections 162 a portion 122 of the body and a portion of the chamber wall 132 can be seen.
  • the wires 102 for feeding the material to be evaporated are inserted in the chamber for melting and evaporating the wire material.
  • the evaporation crucibles 100 are arranged such that the vapor distributions of the individual crucibles overlap such that a substantially homogenous vapor deposition on the substrate 10 is provided.
  • the shape of the distributor orifices may be optimized for the combined vapor distribution of neighboring evaporation crucibles.
  • a vertical evaporation apparatus with several point sources for a material paper can be provided with evaporation crucibles according to the embodiments described herein.
  • FIG. 7 A further evaporation apparatus that can be realized with an evaporation crucible 400 according to embodiments described herein is shown in Fig. 7 .
  • a material film is to be vapor deposited on a vertically arranged substrate 10. Therefore, an evaporation crucible 400 is provided in a lower portion of the evaporation apparatus.
  • Fig. 7 shows a material wire 102 for feeding the material to be evaporated in the evaporation crucible. Within the chamber 130, the material is melted and evaporated in the melting-evaporation area. The material vapor can leave the chamber at the top of the chamber and passes through the insulation element 720 in the nozzle pipe 710.
  • the nozzle pipe 710 includes a plurality of openings 712 and redirects the material vapor along horizontal axes towards the substrate 10.
  • the nozzle pipe 710 may be made of a high melting material such as titanium, niobium, tungsten, or an alloy including one of these materials and can be manufactured as commonly known in the art. According thereto, different embodiments of evaporation crucible as described herein can be used for a linear evaporation apparatus with a nozzle pipe. Thereby, the improved melting-heating chamber according to embodiments described herein can be provided for existing systems.
EP07004794A 2007-03-08 2007-03-08 Creuset d'évaporation et appareil d'évaporation à propriété d'évaporation adaptée Withdrawn EP1967606A1 (fr)

Priority Applications (6)

Application Number Priority Date Filing Date Title
EP07004794A EP1967606A1 (fr) 2007-03-08 2007-03-08 Creuset d'évaporation et appareil d'évaporation à propriété d'évaporation adaptée
KR1020080020654A KR20080082484A (ko) 2007-03-08 2008-03-05 적응된 증발 특성을 가진 증발 도가니 및 증발 장치
CNA2008100065477A CN101265567A (zh) 2007-03-08 2008-03-06 蒸发坩埚和具有合适的蒸发特性的蒸发设备
JP2008056825A JP2008231573A (ja) 2007-03-08 2008-03-06 気化るつぼ、および気化特徴を適合した気化装置
US12/043,894 US20090196584A9 (en) 2007-03-08 2008-03-06 Evaporation crucible and evaporation apparatus with adapted evaporation characteristic
TW097107867A TW200904999A (en) 2007-03-08 2008-03-06 Evaporation crucible and evaporation apparatus with adapted evaporation characteristic

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP07004794A EP1967606A1 (fr) 2007-03-08 2007-03-08 Creuset d'évaporation et appareil d'évaporation à propriété d'évaporation adaptée

Publications (1)

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EP1967606A1 true EP1967606A1 (fr) 2008-09-10

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EP07004794A Withdrawn EP1967606A1 (fr) 2007-03-08 2007-03-08 Creuset d'évaporation et appareil d'évaporation à propriété d'évaporation adaptée

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US (1) US20090196584A9 (fr)
EP (1) EP1967606A1 (fr)
JP (1) JP2008231573A (fr)
KR (1) KR20080082484A (fr)
CN (1) CN101265567A (fr)
TW (1) TW200904999A (fr)

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CN102732836A (zh) * 2011-03-31 2012-10-17 株式会社日立高新技术 真空蒸镀装置及有机el显示装置的制造方法
CN103305796A (zh) * 2012-03-12 2013-09-18 株式会社日立高新技术 蒸发源装置及真空蒸镀装置、以及有机el显示装置的制造方法

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TWI477623B (zh) * 2010-08-24 2015-03-21 Hon Hai Prec Ind Co Ltd 坩堝及具有該坩堝的蒸鍍設備
KR20120061394A (ko) * 2010-12-03 2012-06-13 삼성모바일디스플레이주식회사 증발원 및 유기물 증착 방법
KR101233460B1 (ko) * 2012-07-21 2013-02-18 주식회사 야스 직접 가열 방식을 적용한 선형 증착원
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CN101265567A (zh) 2008-09-17
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US20080226271A1 (en) 2008-09-18
KR20080082484A (ko) 2008-09-11
JP2008231573A (ja) 2008-10-02

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