EP1935599B1 - Device and method for the separation and the transport of substrates - Google Patents

Device and method for the separation and the transport of substrates Download PDF

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Publication number
EP1935599B1
EP1935599B1 EP06026054A EP06026054A EP1935599B1 EP 1935599 B1 EP1935599 B1 EP 1935599B1 EP 06026054 A EP06026054 A EP 06026054A EP 06026054 A EP06026054 A EP 06026054A EP 1935599 B1 EP1935599 B1 EP 1935599B1
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EP
European Patent Office
Prior art keywords
substrate
substrates
gripper
separated
stack
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Not-in-force
Application number
EP06026054A
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German (de)
French (fr)
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EP1935599A1 (en
Inventor
Richard Herter
Konrad Kaltenbach
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rena Sondermaschinen GmbH
Original Assignee
Rena Sondermaschinen GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to PL06026054T priority Critical patent/PL1935599T3/en
Application filed by Rena Sondermaschinen GmbH filed Critical Rena Sondermaschinen GmbH
Priority to ES06026054T priority patent/ES2313535T3/en
Priority to EP06026054A priority patent/EP1935599B1/en
Priority to DE502006001352T priority patent/DE502006001352D1/en
Priority to AT06026054T priority patent/ATE404341T1/en
Priority to RU2008115260/11A priority patent/RU2380305C2/en
Priority to KR1020087004916A priority patent/KR100992108B1/en
Priority to US12/064,451 priority patent/US20080213079A1/en
Priority to CN2007800011343A priority patent/CN101356047B/en
Priority to PCT/EP2007/005968 priority patent/WO2008003502A1/en
Priority to JP2008532810A priority patent/JP5006880B2/en
Priority to TW096148137A priority patent/TW200842014A/en
Priority to NO20080795A priority patent/NO20080795L/en
Priority to MYPI20080302A priority patent/MY142778A/en
Publication of EP1935599A1 publication Critical patent/EP1935599A1/en
Application granted granted Critical
Publication of EP1935599B1 publication Critical patent/EP1935599B1/en
Not-in-force legal-status Critical Current
Anticipated expiration legal-status Critical

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0082Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0082Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
    • B28D5/0088Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work the supporting or holding device being angularly adjustable

Definitions

  • the invention relates to a device for separating and transporting substrates.
  • the substrates are disc-shaped and susceptible to breakage.
  • a carrier device For separating a carrier device is provided, which receives the individual substrates in the formation of a substrate stack and holds ready for the separation.
  • a removal device carries out the process of separating and transporting.
  • the invention relates to a method for separating and transporting substrates provided in a substrate stack.
  • the "substrates” are disc-shaped or surface-shaped and generally rectangular. They are obtained after a sawing process from a substrate block. They have circumferential edges, which are substantially straight, wherein the corners can be configured rectangular, rounded or bevelled.
  • substrate stack Several substrates stacked on top of each other or side by side or behind one another result in a "substrate stack ". If the substrate surfaces run horizontally, then according to the invention, a "lying" stack of superimposed substrates is used; If the substrate surfaces run vertically, this corresponds to a "standing" stack of adjacent substrates.
  • the individual substrates are already detached from a holding device necessary for the sawing process and stacked freely and independently of one another. Frequently, the individual substrates adhere due to the previous sawing process but unintentionally together areally. For the further processing, it is normally necessary to separate these stacked substrates. This means that the substrate provided at the end of an upright substrate stack is to be removed from the substrate stack by means of a device and transferred to the further processing process.
  • the "stacking direction" of the substrates in a substrate stack is predetermined by the position of the substrate to be separated.
  • the individual substrates are aligned so that they are substantially contiguous with their surfaces.
  • the stacking direction corresponds exactly to the direction of the surface normal of the substrate or of the substrates, the positive direction pointing to that end of the stack from which the substrate to be separated is to be removed. Unless this substrate is on the right side of the in one
  • Carrier device arranged "standing" substrate stack is arranged, thus showing the stacking direction in the direction of arrow right.
  • the "feed direction" of a stack essentially corresponds to the stacking direction.
  • the "stack start” designates that end of the substrate stack at which the next substrate to be singulated is located. This is the end that points in the feed direction. However, if it is generally spoken of "stack end", it is not specified whether it is the beginning of the stack or the opposite end of the stack.
  • the substantially vertically or upright positioned substrate stacks are provided in a "carrier device " .
  • a carrier device picks up the substrate stack, for example, after sawing and / or removal of the adhesive often used to secure the initially ungagged substrates to a holding plate and transports this to a removal device in which the separation is to take place.
  • the carrier device is preferably designed such that it receives the substrate stack as a whole, ie, the individual substrates are substantially flat against each other or behind each other.
  • the carrier device can enable or force a certain tilting of the substrates which contact one another in a planar manner against the original stacking direction, resulting in a structurally predetermined "angle of inclination" of the substrates relative to the original stacking direction, which is designated ⁇ in the context of the present invention.
  • angle of inclination
  • This is enclosed between the surface normal of a substrate and the feed direction, wherein the surface normal of that substrate side is to be selected which points more in the feed direction, so that tilt angles between -90 ° and + 90 ° can result.
  • Positive angles indicate a tilting of the substrates to the rear (opposite to the feed direction), negative angles indicate a tilting of the substrates forward (in the feed direction).
  • Preferred inclination angles are in the range of + 5 ° to + 35 °; Particularly preferred are inclination angles of + 15 ° to + 20 °.
  • the "removal device” is used for separating and removing a substrate from the substrate stack.
  • the substrate arranged at the one end of the substrate stack to be separated is picked up by the removal device, For example, via suction, detached from the substrate stack and thus isolated, and fed to a further processing or transport process.
  • the removal device serves to remove the substrate to be separated from the substrate stack.
  • the "removal” can take place in several directions. On the one hand, the removal can take place in the stacking direction, ie the substrate to be separated is picked up by the removal device and pulled away parallel to the planar formation of the following substrate in the stacking direction, so that between the substrate to be separated and the subsequent substrate tensile or compressive forces due to existing adhesion arise.
  • the substrate is removed by displacement relative to the following substrate, so that only shearing forces arise between the two substrates.
  • the substrate to be separated in the direction of the planar extension of the respective substrate preferably approximately perpendicular to the plane of the carrier device, moved up or removed.
  • a fluid which in this case essentially liquid media are to be understood.
  • flow means which flow the substrate stack from the side and / or from below or above with fluid in such a way that a flow is achieved which aims at the substrate stack and causes the individual substrates to be " fan out “and in the Distance from each other. This means that between the individual substrates creates a gap which is filled with fluid.
  • This fanning may, according to a preferred embodiment, still be effected by further suitable means, e.g. be supported with positioned in particular in the fan area ultrasonic emitters. This is particularly advantageous if the adhesion forces between the substrates touching each other are so high that penetration of the fluid otherwise takes place only very slowly.
  • a "position determination device” is used to determine the position and / or the position of the substrate to be separated and / or the substrate stack. If a correspondingly arranged electronics with a sensor receives a corresponding signal, which is synonymous with the fact that the substrate to be removed is arranged in position and position, the operation of the removal device is released for separating. If the substrate to be separated is not in positional and positional position on the position-determining device, then another signal is output which must then be correspondingly interpreted.
  • the position determination device can also serve to move the substrate to be separated by means of suitable, for example geometric, constraints into the desired position, which is necessary to release the signal for the removal device, and / or to hold the substrate there.
  • substrate blocks in the present case silicon blocks or silicon columns
  • substrates in the present case thin, fragile discs
  • the substrates produced in this way typically have thicknesses of a few tens to 300 ⁇ m and are generally square or rectangular. You then preferred a respective edge length up to 210 mm.
  • the substrate blocks are usually glued to a holding device for sawing.
  • This holding device typically consists of a metal carrier, on which in turn a glass plate is applied as an intermediate carrier, wherein the substrate block to be processed is glued to the glass plate.
  • a glass plate is applied as an intermediate carrier, wherein the substrate block to be processed is glued to the glass plate.
  • other materials for the formation of the holding device may be provided according to the prior art.
  • a medium which essentially comprises glycol and optionally further chemical additives and a release agent such as silicon carbide granules.
  • This medium is called "slurry" and serves to carry out the sawing process. Normally, a certain amount of slurry always remains in the space between the individual sawn ones Substrates. In the worst case, the slurry during the processing process or subsequently to a pasty structure, since it mixes with the silicon particles formed from the substrate block and with the abrasion of the saw wire used for the sawing process and the release agent or certain components of the batch together react. Due to their consistency, the slurry adheres to the surface of the wafer. Despite a subsequent to the sawing of the substrate blocks in the normal case pre-cleaning are still very often residues of the mixture between the substrates.
  • the EP 0 762 483 A1 shows a device with which, inter alia, the separation of flat substrates can be done.
  • the substrates are already isolated in a carrying device ready, where they initially touch evenly.
  • the substrates are transported away from the stack by means of a slide and possibly with the aid of rollers and / or liquid jets, wherein the substrates must necessarily be in a horizontal, ie lying position.
  • the substrates are thus arranged in the form of a "lying" stack of superimposed substrates.
  • the document shows a separation by using a suction gripper, which is to be supplied during the entire gripping and transporting process with gas vacuum and the substrate directly touched, ie without a protective fluid film between gripper and substrate surface.
  • WO 01/28745 A1 describes methods and devices for detaching disc-shaped substrates.
  • a robot-like device engages the substrate to be detached via suction devices (active generation of a negative pressure via, for example, a vacuum pump), whereby the substrate is released from the holding device by an oscillating movement of the device.
  • suction devices active generation of a negative pressure via, for example, a vacuum pump
  • oscillating movements are provided in different directions.
  • the gripping of the substrate to be separated takes place with the aid of a suction device arranged above the surface of the substrate and attached to the device.
  • a certain overpressure is generated within the suction device, so that the detached substrate is removable from the device again.
  • a device for detaching individual thin, fragile and disc-like substrates is known.
  • the substrate block with the already sawn substrates is in a container filled with a fluid.
  • the holding device is vertically aligned together with the still fixed to the holding device substrates, so that the substrate to be separated is arranged parallel to the fluid surface.
  • a wedge device ensures that a separation between the glass plate and the substrate to be separated takes place.
  • An arranged in close proximity to the substrate conveyor belt ensures that the detached and floating substrates are removed.
  • a sliding device provides that the holding device is repeatedly brought into the same position and moved horizontally against the wedge device for detachment of the respective substrate.
  • a device On the other side of the conveyor belt, a device is provided with which the separated substrates are automatically inserted into a stand.
  • the aim of the replacement is that the separated, disc-like substrates stacked after their removal from the holding device and in a predetermined Institutions are inserted or placed directly on schedule.
  • a hand carried out singling involves the risk that the very thin and fragile and disk-shaped substrates break, especially due to the increased adhesive forces.
  • the object of the invention is therefore to provide devices and methods with which a virtually damage-free removal of thin, fracture-sensitive and stacked substrates is made possible.
  • the solution of the problem is to propose a device according to claim 1 and a method according to the features of claim 16.
  • One of the significant advantages of the invention is that the substrates can be shatter-proofed in a fast cycle completely and automatically singulated.
  • the solution is that the substantially perpendicular to the feed direction, but slightly inclined at an angle aligned substrates within the substrate stack are fanned by a flow device.
  • the first five to ten substrates flow around flows generated by flow nozzles, so that the individual substrates are kept at a distance from each other and so-called fluid damping pads between the individual substrates arise.
  • the individual substrates of the method according to the invention are not further compressed; Rather, an opposing force is generated completely over the entire surface, which, however, allows, within certain limits, a residual mobility, in particular of the substrate at the beginning of the stack. This counterforce is utilized together with the residual mobility, so that the gripper of the removal device can press against the substrate to be separated. Without indirect damping by means of the fluid damping pads between the fanned-out substrates, the substrate would likely break.
  • the gripper is preferably introduced from above, ie parallel to the longitudinal extent of the respective substrates and thus approximately transversely to the stacking direction and then guided against the substrate to be separated.
  • the holes provided in the gripper serve to suck the fluid out of the space between the gripper and the substrate to be separated.
  • a negative pressure is necessary, which can be generated both by means of dynamic methods (eg pump), static method (vacuum tank) or other methods inside or outside the device.
  • adhesion forces build up, which automatically adhere or adhere the substrate to the substrate Enable gripper.
  • adhesion forces are in particular greater than those for the following substrate, so that the removal of the substrate to be separated with the gripper can take place parallel to the surface direction of the following substrate. At most only slight shearing forces act on the substrate to be separated, as a result of which the breakage rate is considerably reduced. Tensile and compressive forces are avoided. Fast removal from the substrate stack is possible in a timely manner.
  • the adhesion forces are furthermore so great that, depending on the geometrical configuration of the gripper and substrate weight, they allow substrate to adhere to the gripper even without active underpressure generation, especially when the substrate is outside the fluid surrounding the substrate stack. It should be noted that the functional relationship between the bore diameter and number in the gripper surface, the size of the gripper surface, as well as the size of the vacuum necessary for the suction of the fluid and for sucking the substrate is taken into account.
  • the gripper itself is preferably designed such that it consists exclusively of a beam.
  • Alternative embodiments can provide that bar-shaped, O-shaped, U-shaped, triangular and in the gripper movement direction tapered (V-shaped), or are also designed surface gripper provided. Particularly preferred are those designs which have a low flow resistance in gripper movement direction and / or generate the least possible turbulence when removing the substrate from the substrate stack and the subsequent separation movement.
  • the grippers of all embodiments furthermore have the advantage that only one gripper has to be used for different formats of substrates, and that the principle of gripping the substrate to be separated can be carried out functionally even for those substrates which are already broken and therefore no longer have the usual dimensions.
  • Another advantage is that different formats of substrates can be accommodated with a gripper design. This is due to the fact that not a suction, but an adhesion force is achieved, which is areally extending over the contact surface between gripper and substrate.
  • the negative pressure is generated at the beginning of the extraction phase. Even if this negative pressure only has to be maintained until the above-mentioned fluid film is obtained between the substrate and the contact surface of the gripper, the negative pressure can also be maintained until the substrate has been deposited on the transport device.
  • the carrier device itself is constructed so that it can accommodate at least one of a plurality of substrates or wafers existing substrate stack. Furthermore, the carrier device has means by which it is ensured that the individual substrates have a certain inclination, the inclination being such that the angle of inclination ⁇ , formed between the feed direction of the stack and the surface directional normal of a substrate pointing in the feed direction, is greater 0 degrees, so positive. In the case of a standing stack, this means that the edge of the substrate lying on the carrier device is arranged in the feed direction in front of the upper edge. This has the advantage that the gripper can dip into the fluid parallel to this orientation and thus remove the substrate again in this direction. This also avoids that the stationary stack tilts forward in a further transport of the support means within the fluid and thus loses its positional orientation.
  • the carrier device is displaceable at least in one direction.
  • it is displaceable in the feed direction, namely initially so far, until the first to be separated substrate of the substrate stack reaches the orientation device. Then she is in eg Slidable steps whose step size preferably corresponds to the respective, in the normal case over the stack towards constant substrate thickness, and indeed until, finally, the last substrate of the stack is brought to the removal device.
  • the carrier device may be stationary. In this case, suitable means would be provided with which the substrate stack can be moved on the carrier device in the feed direction.
  • the gripping device and the position-determining device can have correspondingly greater degrees of freedom, so that they can be moved counter to the feed direction in the direction of the stack beginning.
  • the position determining device is a device with which the position and position of the substrate to be separated is detected.
  • the position-determining device comprises pressure pins, which are aligned in the direction of the substrate stack. By reducing the distance between the position-determining device and the substrate stack, the fanned-out beginning of the substrate stack is aligned until the substrate to be separated rests against all provided pressure pins.
  • An additional sensor element for example in the form of a touch sensor, emits a corresponding signal, as a result of which the gripper can now preferably dip between the pressure pins and singulate and transport the substrate to be separated.
  • the substrate stack comprises substrates whose thickness exceeds the average thickness set for adjusting the pressure elements and thus the resulting step size, this state is detected by the position determining device, so that the substrate stack is moved correspondingly in the feed direction until the next substrate to be separated contacts the pressure elements ,
  • the position-determining device can be supplemented by a protractor. In this way, the position of the substrate to be separated can be determined exactly and, if desired, used as a parameter for checking the quality of the substrate to be separated.
  • the advantage of the device thus lies in the fact that an apparatus, in particular for separating and transporting substrates, has been created by the interaction of carrier device, removal device, flow device and position determining device, by means of which the method steps are automated and with an extremely low breakage rate compared with the prior art can be executed. This advantage is aided by the fluid damping pad provided by the flow means.
  • this removal device itself as well as the hereby predetermined removal of the substrate transversely to the stacking direction causes no or only slight tensile or compressive forces act on the substrate to be separated.
  • this removal device is designed such that the removal takes place parallel to the surface extension of the respective substrate, so that as little tensile, compressive or bending forces act on the corresponding substrate.
  • the further transport preferably takes place within the fluid.
  • a conveying means such as a conveyor belt such that fluid is expelled via the holes provided in the gripper in the direction of the substrate, so that the flat formed substrate of the gripper can solve easily and without effect by externally attacking tensile and / or compressive forces.
  • the cycle can be repeated as often as desired.
  • the intended gripping arm can have a certain tolerance in its approach to the substrate. It is not necessary that the gripper arm stops exactly in front of the substrate to be separated and is positioned there. Rather, the damping, which arises due to the arrangement of the substrates within the fluid and by the flow device can be advantageously exploited by the gripper moves against the feed direction against the substrate stack with little force and so produces a surface contact with the substrate to be separated, which is resiliently supported due to the underlying fluid damping cushion.
  • a further advantage of the invention relates to the provision of a device with which the adhesive forces between the gripper arm and the substrate are automatically and thus automatically utilized so that each individual substrate is removed in a relatively simple manner without fracture, regardless of its size and outer contour, by the transport partially even pre-cleaned within the fluid and can be transferred to a specific device such as a transport device.
  • a further alternative embodiment of the removal device shows a device which has a defined degree of flexibility, so that tolerances in the positioning region are compensated with regard to the planar arrangement of the receptacle to the substrate to be separated.
  • the gripper, the handling device and / or the connection between the two components is designed to be flexible and correspondingly deformable.
  • a further means for taking over the isolated substrate from the removal device is provided.
  • the removal device can already pick up a further substrate from the substrate stack.
  • two substantially identical removal devices may be provided, which are connected in phase shift.
  • FIG. 1 Representations AF, is shown schematically the inventive device 101 and the inventive method.
  • This device 101 is suitable for separating and transporting disk-shaped substrates 102.
  • the substrates 102 are arranged in a substrate stack 103, wherein the substrate stack 103 is mounted in a carrier device 104.
  • the individual substrates 102 are already released from a holding device.
  • the surface normals of the surfaces of the individual substrates 102 pointing in the direction of advance are at an angle ⁇ (inclination angle) (in FIG FIG. 2 shown) arranged to the feed direction.
  • this oblique position prevents the individual substrates 102 from floating or unintentionally leaving the carrier device 104. Also let the individual substrates 102 are easier to receive through the removal device 107, which will be described later.
  • the individual flat-shaped substrates 102 are lined up in such a way that touch their surfaces. Adhesive forces acting thereon from the very small gap between the substrates on the one hand and possibly impurities, for example, act between them. resulting from a previous sawing step. As a result of this arrangement, the substrates 102 predefine a defined feed direction 105.
  • the substrates are shown schematically.
  • the block diagram shown schematically means that the substrates in this area are very close to each other.
  • the substrates are fanned out and have a gap.
  • the adhesion forces between the fanned-out substrates are preferably zero.
  • a removal device 107 is provided according to the invention, which is designed like a claw. It is shown schematically in the embodiment shown here and essentially shows a gripper 108. On the gripper 108 is a handling device (in FIG. 1 [A] shown), which allows the gripper 108 to move in different directions and / or to pivot. Preferably, the gripper 108 is pivotable in the direction of arrow 110 and about an axis in the direction of arrow 112.
  • This transport device 113 consists of a conveyor belt 114, which is driven via an axis 115 in the direction of arrow 116.
  • the device 101 namely the carrier device 104, the Substrate stack 103, and parts of the removal device 107 are disposed within a fluid. This ensures that the substrates do not fall dry over the duration of the entire process, at least until they are deposited on the transport device.
  • the remaining parts of the removal device 107 and the transport device 113 may also be arranged within the fluid, wherein the transport device may alternatively also have their own means for moistening the substrates.
  • At least one flow device 117 with flow nozzles 118 is arranged, through which fluid is introduced into intermediate spaces 119, this intermediate space 119 being located between the substrate 102 to be separated and the following substrate 102.
  • the respective intermediate space 119 preferably remains as long as fluid flows out of the flow nozzles 118 into the intermediate spaces 119.
  • 102 spaces 119 between each two substrates in a defined area, in which a plurality of substrates 102 are arranged.
  • a pressure element 122 is provided which substantially comprises pressure pins 123 in the exemplary embodiment shown in the figures.
  • the substrate to be separated presses against the pressure pins 123, whereby a counter force to the force is generated, which is generated by the inflow of the fluid into the spaces 119.
  • fluid pillows In the spaces 119 arise so-called fluid pillows, can be ensured by the fact that the individual to the respective fluid pad adjacent substrates 102 are kept at a distance from each other. Furthermore, these fluid pads have the property that due to the exertion of the counterforce on the one hand by the pressure element 122, but also by the start of the gripper 108 to the substrate 102 to be separated a damping effect arises.
  • the gripper 108 of the device 107 is already arranged parallel to the surface of the substrate 102.
  • the gripper 108 moves parallel in the direction of the arrow 110 and in a further subsequent step on the surface of the substrate 102, and as far as until this, as in FIG. 1 [C] is shown, the substrate 102 to be separated has contacted. Due to the starting pressure generated by the gripper 108 when it contacts the substrate 102, the respective gap between two substrates 102 is reduced. Due to the arrangement of the fluid within the interstices 119 between substrates 102 to be separated in each case, a damping effect is created.
  • the holes not shown in the drawing are activated within the gripper 108 by a negative pressure is generated in accordance with the above illustration.
  • the negative pressure causes the gripper 108 to suck the substrate 102 to be separated so far that the gap between the substrate 102 and the gripper 108 is greatly reduced and an adhesion force is formed between the contact surfaces.
  • the fanning is assisted by the outflow of fluid from the flow nozzles 118.
  • the gripper 108 moves with the adhering substrate 102 as shown [D] until it can deposit the substrate 102 on the transport device 113.
  • the unit of substrate and gripper must be moved a piece against the feed direction 105, so that it in the subsequent removal movement to no contacting of the pressure pins 123 comes with the substrate surface.
  • the position-determining device can be moved a little bit in the feed direction.
  • the adhesion forces that are created when aspirating the substrate 102 to be separated are dimensioned such that they are sufficient to transport the substrate 102 accommodated by the gripper 108 within the fluid.
  • FIG. 2 and 3 schematically a device 201 is shown, in comparison to Fig. 1 represents a development of the basic idea.
  • the device 201 is particularly suitable for separating and transporting disk-shaped substrates 202.
  • the substrates 202 are arranged in a substrate stack 203, wherein the substrate stack 203 is mounted in a carrier device 204 and the individual substrates 202 are already detached from a holding device.
  • the individual substrates 202 are at an angle of inclination ⁇ ( Fig. 2 ) is arranged between the feed direction 205 and the surface normal of the substrate which points more in the feed direction. This inclination prevents the arrangement of the device within a fluid and in a standing position of the substrate stack 203 that the Float individual substrates 202 and leave the carrier 204 unintentionally.
  • the substrates 202 are arranged such that their surfaces touch. The individual substrates 202 thereby form a juxtaposition, which results in a defined feed direction 205.
  • a removal device 207 is provided according to the invention, which is designed like a claw. It is shown schematically in the embodiment shown here and essentially shows a gripper 208. On the gripper 208, a handling device 209 is arranged, which makes it possible to move the gripper 208 in different directions (arrow directions 210, 211, 212) and to pivot , The gripper 208 and the handling device 209 together form a gripping arm.
  • This transport device 213 consists of a conveyor belt 214 which is driven via an axis 15 in the direction of arrow 216.
  • the entire device 201 namely the carrier device 204, the substrate stack 203, and parts of the removal device 207, are arranged within a fluid. This ensures that the substrates do not fall dry over the duration of the entire process, at least until they are deposited on the transport device.
  • the remaining parts of the removal device 207 and the transport device 213 may be arranged in the fluid, wherein the transport device may alternatively also have their own means for moistening the substrates.
  • At least one flow device 217 with flow nozzles 218 is arranged, is introduced by the fluid in a gap 219, wherein the gap 219 is formed between each of the substrate 202 to be separated and the subsequent substrate 202.
  • the flow nozzles 218 are arranged in particular in the region of the substrate stack 203, which is intended directly for the fanning. Typically, this will affect at least the first four to nine substrates 202 following the substrate 202 being singulated. This results in a plurality of gaps 219, each gap 219 is bounded to the left and right of a substrate 202. Within the space 219, a fluid cushion is formed, which has damping properties.
  • a position determining device 220 is shown.
  • This position-determining device 220 consists essentially of a further handling device 221 and a pressure element 222 arranged at a free end of the handling device 221.
  • the pressure element 222 further comprises pressure pins 223 which correspond to the surface of the respective substrates 202 Fig. 2 and 3 touch in a defined position or bring it by touch in a defined position and hold there.
  • the further handling device 221 is displaceably mounted in and opposite to the direction of arrow 230.
  • the position-determining device 220 is assigned a sensor element 224.
  • This sensor element 224 has the task of detecting whether there is a planar contact of the substrate 202 to be separated on the pressure element 222 and / or on the pressure pins 223.
  • this sensor element 224 mechanically scans the presence of the substrate 202 to be singulated. For this purpose, different positions are provided, the be detected via a proximity switch 229.
  • the sensor element 224 has a knee-lever-like design, wherein this is mounted on a hinge 225 pivotally in and against the arrow 226 direction.
  • the one free end 227 serves to rest on the surface of the substrate 202 to be detected.
  • the other end 228 is provided for arrangement in the region of the proximity switch 229.
  • the basic position of the sensor element 224 is assumed when no substrate 202 is detected at the free end 227.
  • the free end 227 is an imaginary line between the free ends of the pressure pins 223, and the other free end 228 is configured such that the distance of the free end 228 to the proximity switch is almost zero. As soon as the free end 227 experiences pressure, the sensor element 224 pivots, and the distance between the free end 228 and the proximity switch increases. If the latter has assumed a previously calibrated position, it can be determined automatically whether a substrate 202 rests against the free ends of the pressure pins 223. Without pressure at the free end 227, the sensor element 224 returns to its normal position.
  • the pressure element 222 is preferably arranged at an angle to the handling device 221, which corresponds to the inclination angle ⁇ .
  • the individual pressure pins 223 preferably have the same length.
  • the pressure element 222 is arranged perpendicular to the handling device 221, and the pressure pins 223 have different lengths, so that always touch the free ends of the pressure pins 223, the surface of the substrate 202 in the position shown.
  • the mode of operation of the position-determining device 220 is such that the substrate stack 203 is moved in the feed direction 205 until the surface of the substrate 202 to be separated contacts the free ends of the pressure pins 223 of the pressure device 222. If the substrate 202 to be separated is aligned in position and position, the sensor element 224 is moved in one of the arrow directions 226, and the proximity switch 229 detects the correct position.
  • the removal device 207 can dip into the intermediate space formed by the pressure pins 223 and receive the substrate 202 to be singulated.
  • Fig. 4 A and B the so-called loading situation of the device 201 according to the invention is shown.
  • the carrier device 204 is ready for receiving a substrate stack not shown in detail.
  • the desired inclination angle ⁇ of the substrate stack is already predetermined.
  • the removal device 207 and the position determination device 220 are in their initial situation and can be moved in the direction of the arrow 210 or the direction of the arrow 230.
  • the sensor element 224 disposed on the pressing member 222 is also in FIG its initial position and detects no voltage applied to the pressure pins 223 substrate.
  • the gripper 208 of the removal device 207 is also in an initial situation, so that it can dive between the pressure pins 223 of the pressure element 222.
  • the transport device 213 is ready to receive substrates.
  • the flow nozzles 218 of the flow device 217 are still switched off.
  • Fig. 5 A and B show that the carrier 204 is now loaded by the substrate stack 203.
  • This carrier device 204 or the substrate stack 203 is moved in the advancing direction 205, namely until the position determining device 220 positioned by movement in the direction of the arrow 230 has assumed a defined position. In this position, the pressure element 222 or its pressure pins 223 touch the surface of the substrate 202 to be separated.
  • the flow nozzles 218 of the flow device 217 guide fluid onto the substrate stack 203, so that at least part of the substrate stack 203 fancles and gap-like intermediate spaces 219 arise. Due to the pressing of the pressure element 222 prevents the individual substrates 202 fanned on. It is thereby also achieved that the substrates 202 remain on the carrier device 204. If the corresponding position of the substrate 202 to be separated 202 is reached by fanning, the exact position is detected by the sensor unit 224.
  • either the position-determining device 220 proceeds further in the direction of arrow 230, and / or it is further effected that the substrate stack 203 is further fanned out. Both measures do not reach that the sensor unit 224 outputs a corresponding signal for releasing the removal device 207, a fault message is signaled.
  • the removal device 207 now moves in the direction of arrow 210 in such a way that the gripper 208 dips between the pressure pins 223 of the pressure element 222 of the position-determining device 220 and reaches the region of contact of the surface of the substrate 202 to be separated.
  • an abutment of the gripper 208 is effected on the surface of the substrate 202.
  • the gripper in the direction of arrow 212 ( Fig. 7 A ) to pivot until a flat contact with the surface of the substrate 202 takes place.
  • the substrate to be separated is released and can, as in Fig. 7 A and B shown, are taken in the direction of arrow 210 to then store it on the conveyor 213.
  • the storage of the substrate 202 by the removal device 207 is in the Fig. 9A and B shown.
  • the substrate 202 is deposited on the conveyor belt 214 of the transport device 213 and transported away by a drive on the axis 215 in the direction of arrow 216.
  • fluid is again conducted through the flow device 217 or its flow nozzles 218 into the interspaces 219 of the substrate stack 203, so that a corresponding fanning takes place, namely, until the substrate 202 to be separated again in contact with the pressure pins 223 of the pressure element 222 of the orientation device 220 passes.
  • the sensor unit 224 generates the signal for enabling the picking up of the substrate 202 to be separated by the removal device 207.
  • the adhesion forces that are created when aspirating the substrate 202 to be separated are dimensioned such that they are just sufficient to transport the substrate 202 accommodated by the gripper 208 within the fluid.
  • the present invention has been presented with regard to the treatment of silicon wafers.
  • disc-shaped substrates of other materials such as plastic can be processed according to the invention.

Abstract

The device has a support device (104) arranged within a fluid, where an individual substrate (102) is arranged in transverse direction (105) sequentially staying behind one another in form of a stack of the substrate. A removing device (107) is for separating and transporting of the substrate. The removing device has a gripper (108) with units, where the substrate is held and is drive away from the support device. A flow device (117) for fan out of a part of a stack substrate (103), and a contact pressure element (122) that counteracts the fan out substrates. An independent claim is also included for a method for fanning out, separating and transporting disk-shaped formed substrates, which involves arranging a support device within a fluid.

Description

Technisches GebietTechnical area

Die Erfindung bezieht sich auf eine Vorrichtung zum Vereinzeln und Transportieren von Substraten. Die Substrate sind scheibenförmig ausgebildet und bruchempfindlich. Zum Vereinzeln ist eine Trägereinrichtung vorgesehen, die die einzelnen Substrate in der Ausbildung eines Substratstapels aufnimmt und für das Vereinzeln bereithält. Eine Entnahmeeinrichtung führt den Prozess des Vereinzelns und Transportierens durch.The invention relates to a device for separating and transporting substrates. The substrates are disc-shaped and susceptible to breakage. For separating a carrier device is provided, which receives the individual substrates in the formation of a substrate stack and holds ready for the separation. A removal device carries out the process of separating and transporting.

Ferner bezieht sich die Erfindung auf ein Verfahren zum Vereinzeln und Transportieren von in einem Substratstapel bereitgestellten Substraten.Furthermore, the invention relates to a method for separating and transporting substrates provided in a substrate stack.

Definitionendefinitions

Die "Substrate" sind scheiben- bzw. flächenförmig ausgebildet und in der Regel rechteckig. Sie werden nach einem Sägeprozess aus einem Substratblock gewonnen. Sie weisen umlaufende Kanten auf, die im Wesentlichen gerade ausgebildet sind, wobei die Ecken rechtwinklig, abgerundet oder abgeschrägt ausgestaltet sein können.The "substrates" are disc-shaped or surface-shaped and generally rectangular. They are obtained after a sawing process from a substrate block. They have circumferential edges, which are substantially straight, wherein the corners can be configured rectangular, rounded or bevelled.

Mehrere aufeinander gestapelte oder nebeneinander bzw. hintereinander gestellte Substrate ergeben einen "Substratstapel". Verlaufen die Substratflächen horizontal, so wird erfindungsgemäß von einem "liegenden" Stapel übereinander liegender Substrate gesprochen; verlaufen die Substratflächen vertikal, so entspricht dies einem "stehenden" Stapel nebeneinander stehender Substrate. Die einzelnen Substrate sind bereits von einer für den Sägeprozess notwendigen Halteeinrichtung abgelöst und frei und unabhängig voneinander gestapelt. Häufig haften die einzelnen Substrate aufgrund des vorangegangenen Sägeprozesses jedoch noch ungewollt flächenartig zusammen. Für den Weiterbearbeitungsprozess ist es im Normalfall notwendig, diese so gestapelten Substrate zu vereinzeln. Dies bedeutet, dass das jeweils am Ende eines aufrecht positionierten Substratstapels bereitgestellte Substrat mittels einer Einrichtung von dem Substratstapel entnommen und in den weiteren Bearbeitungsprozess übergeben werden soll.Several substrates stacked on top of each other or side by side or behind one another result in a "substrate stack ". If the substrate surfaces run horizontally, then according to the invention, a "lying" stack of superimposed substrates is used; If the substrate surfaces run vertically, this corresponds to a "standing" stack of adjacent substrates. The individual substrates are already detached from a holding device necessary for the sawing process and stacked freely and independently of one another. Frequently, the individual substrates adhere due to the previous sawing process but unintentionally together areally. For the further processing, it is normally necessary to separate these stacked substrates. This means that the substrate provided at the end of an upright substrate stack is to be removed from the substrate stack by means of a device and transferred to the further processing process.

Die "Stapelrichtung" der Substrate in einem Substratstapel wird durch die Position des zu vereinzelnden Substrats vorgegeben. Die einzelnen Substrate sind derart ausgerichtet, dass sie mit ihren Flächen im Wesentlichen aneinanderliegend stehen. Die Stapelrichtung entspricht im Spezialfall exakt und vollständig einander anliegender Substratflächen genau der Richtung der Flächennormalen des Substrats bzw. der Substrate, wobei die positive Richtung auf dasjenige Ende des Stapels weist, von welchem das jeweils zu vereinzelnde Substrat abgenommen werden soll. Sofern dieses Substrat auf der rechten Seite des in einerThe "stacking direction" of the substrates in a substrate stack is predetermined by the position of the substrate to be separated. The individual substrates are aligned so that they are substantially contiguous with their surfaces. In the special case of exactly and completely abutting substrate surfaces, the stacking direction corresponds exactly to the direction of the surface normal of the substrate or of the substrates, the positive direction pointing to that end of the stack from which the substrate to be separated is to be removed. Unless this substrate is on the right side of the in one

Trägereinrichtung angeordneten "stehenden" Substratstapels angeordnet ist, zeigt die Stapelrichtung demnach in Pfeilrichtung rechts.Carrier device arranged "standing" substrate stack is arranged, thus showing the stacking direction in the direction of arrow right.

Die "Vorschubrichtung" eines Stapels entspricht im Wesentlichen der Stapelrichtung.The "feed direction" of a stack essentially corresponds to the stacking direction.

Der "Stapelanfang" bezeichnet dasjenige Ende des Substratstapels, an welchem sich das nächste zu vereinzelnde Substrat befindet. Das ist dasjenige Ende, welches in Vorschubrichtung zeigt. Wird jedoch allgemein von "Stapelende" gesprochen, so ist nicht näher bezeichnet, ob es sich um den Stapelanfang oder das entgegengesetzte Ende des Stapels handelt.The "stack start" designates that end of the substrate stack at which the next substrate to be singulated is located. This is the end that points in the feed direction. However, if it is generally spoken of "stack end", it is not specified whether it is the beginning of the stack or the opposite end of the stack.

Die im Wesentlichen senkrecht bzw. aufrecht positionierten Substratstapel werden in einer "Trägereinrichtung" bereitgestellt. Dabei liegt eine Kante des jeweiligen Substrats auf der Trägereinrichtung auf. Die Trägereinrichtung nimmt den Substratstapel beispielsweise nach dem Sägen und/oder dem Entfernen des häufig zum Befestigen der zunächst ungesägten Substrate auf eine Halteplatte benutzten Klebers auf und transportiert diesen zu einer Entnahmeeinrichtung, in welcher die Vereinzelung erfolgen soll. Die Trägereinrichtung ist bevorzugt derart ausgebildet, dass sie den Substratstapel als Ganzes aufnimmt, d. h. die einzelnen Substrate stehen im Wesentlichen flächig aneinander- bzw. hintereinanderliegend.The substantially vertically or upright positioned substrate stacks are provided in a "carrier device " . In this case, an edge of the respective substrate rests on the carrier device. The carrier device picks up the substrate stack, for example, after sawing and / or removal of the adhesive often used to secure the initially ungagged substrates to a holding plate and transports this to a removal device in which the separation is to take place. The carrier device is preferably designed such that it receives the substrate stack as a whole, ie, the individual substrates are substantially flat against each other or behind each other.

Die Trägereinrichtung kann gewünschtenfalls ein gewisses Verkippen der flächig einander berührenden Substrate gegen die ursprüngliche Stapelrichtung ermöglichen oder erzwingen, so dass sich ein konstruktiv vorherbestimmter "Neigungswinkel" der Substrate gegenüber der ursprünglichen Stapelrichtung ergibt, der im Rahmen der vorliegenden Erfindung mit α bezeichnet wird. Dieser wird zwischen der Flächennormalen eines Substrats und der Vorschubrichtung eingeschlossen, wobei die Flächennormale derjenigen Substratseite zu wählen ist, welche eher in Vorschubrichtung weist, so dass sich Neigungswinkel zwischen -90° und +90° ergeben können. Positive Winkel deuten ein Kippen der Substrate nach hinten (entgegen der Vorschubrichtung) an, negative Winkel ein Kippen der Substrate nach vorn (in Vorschubrichtung). Bevorzugte Neigungswinkel liegen im Bereich von +5° bis +35°; besonders bevorzugt sind Neigungswinkel von +15° bis +20°.If desired, the carrier device can enable or force a certain tilting of the substrates which contact one another in a planar manner against the original stacking direction, resulting in a structurally predetermined "angle of inclination" of the substrates relative to the original stacking direction, which is designated α in the context of the present invention. This is enclosed between the surface normal of a substrate and the feed direction, wherein the surface normal of that substrate side is to be selected which points more in the feed direction, so that tilt angles between -90 ° and + 90 ° can result. Positive angles indicate a tilting of the substrates to the rear (opposite to the feed direction), negative angles indicate a tilting of the substrates forward (in the feed direction). Preferred inclination angles are in the range of + 5 ° to + 35 °; Particularly preferred are inclination angles of + 15 ° to + 20 °.

Die "Entnahmeeinrichtung" dient zum Vereinzeln und Abtransportieren eines Substrats vom Substratstapel. Dabei wird das an dem einen Ende des zu vereinzelnden Substratstapels angeordnete Substrat von der Entnahmeeinrichtung aufgegriffen, beispielsweise über Saugeinrichtungen, von dem Substratstapel abgelöst und damit vereinzelt, und einem weiteren Bearbeitungs- oder Transportprozess zugeführt. Die Entnahmeeinrichtung dient dazu, das zu vereinzelnde Substrat aus dem Substratstapel zu entfernen. Dabei kann die "Entnahme" in mehrere Richtungen erfolgen. Zum einen kann die Entnahme in Stapelrichtung erfolgen, d. h. durch die Entnahmeeinrichtung wird das zu vereinzelnde Substrat aufgegriffen und parallel zur flächigen Ausbildung des nachfolgenden Substrats in Stapelrichtung weggezogen, so dass zwischen dem zu vereinzelnden Substrat und dem nachfolgenden Substrat Zug- bzw. Druckkräfte aufgrund bestehender Adhäsion entstehen. Zum anderen kann vorgesehen werden, dass das Substrat durch Verschieben gegenüber dem nachfolgenden Substrat entfernt wird, so dass zwischen den beiden Substraten lediglich Scherkräfte entstehen. Dabei wird das zu vereinzelnde Substrat in Richtung der flächigen Erstreckung des jeweiligen Substrats, vorzugsweise ungefähr senkrecht zur Ebene der Trägereinrichtung, nach oben verschoben bzw. entfernt.The "removal device " is used for separating and removing a substrate from the substrate stack. In this case, the substrate arranged at the one end of the substrate stack to be separated is picked up by the removal device, For example, via suction, detached from the substrate stack and thus isolated, and fed to a further processing or transport process. The removal device serves to remove the substrate to be separated from the substrate stack. The "removal" can take place in several directions. On the one hand, the removal can take place in the stacking direction, ie the substrate to be separated is picked up by the removal device and pulled away parallel to the planar formation of the following substrate in the stacking direction, so that between the substrate to be separated and the subsequent substrate tensile or compressive forces due to existing adhesion arise. On the other hand, it can be provided that the substrate is removed by displacement relative to the following substrate, so that only shearing forces arise between the two substrates. In this case, the substrate to be separated in the direction of the planar extension of the respective substrate, preferably approximately perpendicular to the plane of the carrier device, moved up or removed.

Je nach Entnahmerichtung wirken daher unterschiedliche Kräfte unterschiedlicher Stärke auf das zu vereinzelnde Substrat und die noch im Stapel befindlichen Substrate ein, wobei diesen Kräften vor allem das dem gerade zu entnehmenden Substrat folgende Substrat ausgesetzt ist.Depending on the removal direction, therefore, different forces of different magnitude act on the substrate to be separated and the substrates still in the stack, wherein these forces are exposed to the substrate following the substrate being removed.

Zum Vereinzeln des Substratstapels ist vorgesehen, diesen zusammen mit der Trägereinrichtung in einem Fluid anzuordnen, worunter hierbei im Wesentlichen flüssige Medien zu verstehen sind. Innerhalb des Fluids sind "Strömungseinrichtungen" vorgesehen, die den Substratstapel von der bzw. den Seiten und/oder von unten bzw. oben mit Fluid derart beströmen, dass eine Strömung erzielt wird, die auf den Substratstapel zielt und bewirkt, dass die einzelnen Substrate "auffächern" und im Abstand zueinander gehalten werden. Dies bedeutet, dass zwischen den einzelnen Substraten ein Zwischenraum entsteht, der mit Fluid gefüllt ist.For separating the substrate stack is provided to arrange this together with the support means in a fluid, which in this case essentially liquid media are to be understood. Within the fluid are provided "flow means" which flow the substrate stack from the side and / or from below or above with fluid in such a way that a flow is achieved which aims at the substrate stack and causes the individual substrates to be " fan out "and in the Distance from each other. This means that between the individual substrates creates a gap which is filled with fluid.

Dieses Auffächern kann nach einer bevorzugten Ausführungsform noch mit weiteren geeigneten Mitteln wie z.B. mit insbesondere im Auffächerungsbereich positionierten Ultraschallstrahlern unterstützt werden. Dies ist insbesondere dann vorteilhaft, wenn die Adhäsionskräfte zwischen den einander berührenden Substraten derart hoch sind, dass ein Eindringen des Fluids ansonsten nur sehr langsam erfolgt.This fanning may, according to a preferred embodiment, still be effected by further suitable means, e.g. be supported with positioned in particular in the fan area ultrasonic emitters. This is particularly advantageous if the adhesion forces between the substrates touching each other are so high that penetration of the fluid otherwise takes place only very slowly.

Eine "Lagebestimmungseinrichtung" dient dazu, die Lage und/oder die Position des zu vereinzelnden Substrats und/oder des Substratstapels festzustellen. Sofern eine entsprechend angeordnete Elektronik mit einem Sensor ein entsprechendes Signal erhält, was gleichbedeutend damit ist, dass das zu entnehmende Substrat lage- und positionsgerecht angeordnet ist, wird der Betrieb der Entnahmeeinrichtung zum Vereinzeln freigegeben. Liegt das zu vereinzelnde Substrat nicht lage- und positionsgerecht an der Lagebestimmungseinrichtung an, so wird ein anderes Signal ausgegeben, dass dann entsprechend zu interpretieren ist. Die Lagebestimmungseinrichtung kann außerdem dazu dienen, das zu vereinzelnde Substrat mittels geeigneter, z.B. geometrischer, Zwangsbedingungen in die gewünschte Lage zu bewegen, die zur Freigabe des Signals für die Entnahmeeinrichtung notwendig ist, und/oder das Substrat dort zu halten.A "position determination device " is used to determine the position and / or the position of the substrate to be separated and / or the substrate stack. If a correspondingly arranged electronics with a sensor receives a corresponding signal, which is synonymous with the fact that the substrate to be removed is arranged in position and position, the operation of the removal device is released for separating. If the substrate to be separated is not in positional and positional position on the position-determining device, then another signal is output which must then be correspondingly interpreted. The position determination device can also serve to move the substrate to be separated by means of suitable, for example geometric, constraints into the desired position, which is necessary to release the signal for the removal device, and / or to hold the substrate there.

Stand der TechnikState of the art

Bei einem der bekannten Herstellungsverfahren für Substrate, wie sie beispielsweise zur Herstellung von Solar- oder Halbleiterwafern angewendet werden, werden Siliziumblöcke oder Siliziumsäulen (vorliegend Substratblöcke genannt) verwendet, die in dünne, bruchempfindliche Scheiben (vorliegend Substrate genannt) zersägt werden. Die auf diese Weise hergestellten Substrate weisen typischerweise Dicken von einigen 10 bis zu 300 µm auf und sind in der Regel quadratisch oder rechteckig ausgebildet. Sie haben dann bevorzugt eine jeweilige Kantenlänge bis 210 mm.In one of the known production processes for substrates, as used for example for the production of solar or semiconductor wafers, silicon blocks or silicon columns (called substrate blocks in the present case) are used, which are sawed into thin, fragile discs (called substrates in the present case). The substrates produced in this way typically have thicknesses of a few tens to 300 μm and are generally square or rectangular. You then preferred a respective edge length up to 210 mm.

Die Substratblöcke werden zum Sägen gewöhnlich auf eine Halteeinrichtung aufgeklebt. Diese Halteeinrichtung besteht typischerweise aus einem Metallträger, auf dem wiederum eine Glasplatte als Zwischenträger aufgebracht ist, wobei der zu bearbeitende Substratblock auf der Glasplatte aufgeklebt ist. Alternativ hierzu können nach dem Stand der Technik auch andere Materialien für die Ausbildung der Halteeinrichtung vorgesehen sein.The substrate blocks are usually glued to a holding device for sawing. This holding device typically consists of a metal carrier, on which in turn a glass plate is applied as an intermediate carrier, wherein the substrate block to be processed is glued to the glass plate. Alternatively, other materials for the formation of the holding device may be provided according to the prior art.

Zur Herstellung der zuvor genannten Substrate ist es notwendig, den Substratblock scheibenartig vollständig durchzusägen, so dass der Sägeschnitt selbst über den Substratblock hinaus bis in die Glasplatte hineinreicht. Nach dem Sägen haftet das auf diese Weise hergestellte Substrat mit seiner einen Kante über eine Klebeverbindung weiterhin an der Glasplatte. Nachdem der Substratblock vollständig in einzelne Substrate zerteilt worden ist, entsteht ein kammartiges Gebilde.To produce the substrates mentioned above, it is necessary to completely saw through the substrate block in the manner of a disk, so that the saw cut itself extends beyond the substrate block into the glass plate. After sawing, the substrate produced in this way continues to adhere to the glass plate with its one edge via an adhesive bond. After the substrate block has been completely divided into individual substrates, a comb-like structure is formed.

Bevor die einzelnen Substrate, die nun eine scheibenförmige Ausbildung aufweisen, von der Halteeinrichtung abgelöst werden, findet in der Regel eine Vorreinigung statt.Before the individual substrates, which now have a disc-shaped design, are detached from the holding device, a pre-cleaning usually takes place.

Zur Durchführung des Sägeprozesses wird ein Medium benötigt, das im Wesentlichen Glykol und ggfs. weitere chemische Zusätze sowie ein Trennmittel wie z.B. Siliziumcarbidkörnchen umfasst. Dieses Medium wird als "Slurry" bezeichnet und dient der Durchführung des Sägeprozesses. Im Normalfall verbleibt immer ein gewisser Rest an Slurry im Raum zwischen den einzelnen, gesägten Substraten. Im ungünstigsten Fall wird die Slurry während des Bearbeitungsprozesses bzw. im Anschluss daran zu einem pastösen Gebilde, da es sich mit den aus dem Substratblock entstandenen Siliziumpartikeln sowie mit dem Abrieb des für den Sägeprozess angewandten Sägedrahts und dem Trennmittel vermischt bzw. gewisse Bestandteile des Gemenges miteinander reagieren. Aufgrund ihrer Konsistenz haftet die Slurry an der Oberfläche des Wafers. Trotz einer sich an das Sägen der Substratblöcke im Normalfall anschließenden Vorreinigung finden sich sehr häufig noch Reste des Gemenges zwischen den Substraten.To carry out the sawing process, a medium is needed which essentially comprises glycol and optionally further chemical additives and a release agent such as silicon carbide granules. This medium is called "slurry" and serves to carry out the sawing process. Normally, a certain amount of slurry always remains in the space between the individual sawn ones Substrates. In the worst case, the slurry during the processing process or subsequently to a pasty structure, since it mixes with the silicon particles formed from the substrate block and with the abrasion of the saw wire used for the sawing process and the release agent or certain components of the batch together react. Due to their consistency, the slurry adheres to the surface of the wafer. Despite a subsequent to the sawing of the substrate blocks in the normal case pre-cleaning are still very often residues of the mixture between the substrates.

Die EP 0 762 483 A1 zeigt eine Vorrichtung, mit welcher unter anderem die Vereinzelung von flächigen Substraten erfolgen kann. Die Substrate liegen bereits vereinzelt in einer Trageeinrichtung bereit, wo sie sich zunächst noch flächig berühren. Zur Vereinzelung und Überführung in einen Behälter werden die Substrate mittels eines Schiebers und ggf. unter Zuhilfenahme von Walzen und/oder Flüssigkeitsstrahlen vom Stapel wegtransportiert, wobei sich die Substrate zwingend in einer horizontalen, also liegenden Position befinden müssen. Entsprechend der zuvor erfolgten Klarstellung sind die Substrate also in Form eines "liegenden" Stapels übereinander liegender Substrate angeordnet. Alternativ zeigt die Druckschrift eine Vereinzelung durch Verwendung eines Sauggreifers, welcher während des gesamten Greif- und Transportvorgangs mit Gas-Vakuum zu versorgen ist und das Substrat direkt berührt, also ohne einen schützenden Fluidfilm zwischen Greifer und Substratfläche.The EP 0 762 483 A1 shows a device with which, inter alia, the separation of flat substrates can be done. The substrates are already isolated in a carrying device ready, where they initially touch evenly. For separation and transfer into a container, the substrates are transported away from the stack by means of a slide and possibly with the aid of rollers and / or liquid jets, wherein the substrates must necessarily be in a horizontal, ie lying position. In accordance with the above clarification, the substrates are thus arranged in the form of a "lying" stack of superimposed substrates. Alternatively, the document shows a separation by using a suction gripper, which is to be supplied during the entire gripping and transporting process with gas vacuum and the substrate directly touched, ie without a protective fluid film between gripper and substrate surface.

In der WO 01/28745 A1 werden Verfahren und Einrichtungen zum Ablösen von scheibenförmigen Substraten beschrieben. Eine roboterartige Einrichtung greift das abzulösende Substrat über Saugeinrichtungen (aktive Erzeugung eines Unterdruckes über z.B. eine Vakuumpumpe), wodurch das Substrat durch eine oszillierende Bewegung der Einrichtung von der Halteeinrichtung gelöst wird. Dabei sind oszillierende Bewegungen in unterschiedliche Richtungen vorgesehen. Das Greifen des zu vereinzelnden Substrats erfolgt mit Hilfe einer über der Fläche des Substrats angeordneten und an der Einrichtung befestigten Saugeinrichtung. Zur Freigabe des Substrats wird innerhalb der Saugeinrichtung ein gewisser Überdruck erzeugt, so dass das abgelöste Substrat wieder von der Einrichtung entfernbar ist.In the WO 01/28745 A1 describes methods and devices for detaching disc-shaped substrates. A robot-like device engages the substrate to be detached via suction devices (active generation of a negative pressure via, for example, a vacuum pump), whereby the substrate is released from the holding device by an oscillating movement of the device. In this case, oscillating movements are provided in different directions. The gripping of the substrate to be separated takes place with the aid of a suction device arranged above the surface of the substrate and attached to the device. To release the substrate, a certain overpressure is generated within the suction device, so that the detached substrate is removable from the device again.

Aus der DE 199 00 671 A1 sind Verfahren und Vorrichtungen zum Ablösen von scheibenförmigen Substraten wie insbesondere von Wafern bekannt. Es wird vorgeschlagen, die unmittelbar nach dem Sägevorgang aneinander haftenden Substrate, die mit ihrer einen Seite (Kante) noch an der Halteeinrichtung befestigt sind, durch einen gezielten Fluidstrahl voneinander im Abstand zu halten. Eine Keileinrichtung sorgt dafür, dass eine Trennung des abzulösenden Substrats von der Halteeinrichtung erfolgt. Gleichzeitig wird das vereinzelte Substrat mittels einer Saugeinrichtungen aufweisenden greifarmähnlichen Einrichtung aus der Halteeinrichtung entnommen.From the DE 199 00 671 A1 Methods and devices for detaching disc-shaped substrates, in particular wafers, are known. It is proposed that the substrates adhering to each other immediately after the sawing process, which are still fastened with their one side (edge) on the holding device, by a targeted fluid jet from each other at a distance. A wedge device ensures that a separation of the substrate to be detached takes place from the holding device. At the same time the isolated substrate by means of a Suction devices having grasping arm-like device removed from the holding device.

Aus der DE 697 22 071 T2 ist eine Vorrichtung für das Einlegen von durch Zersägen eines Substratblocks erhaltenen Wafern in ein Aufbewahrungselement bekannt. Es werden Handhabungsvorrichtungen vorgeschlagen, die es erlauben, im Querschnitt runde oder ovale Substrate zu ergreifen und diese in ein ständerartiges Gebilde zu überführen. Dabei werden mehrere Substrate gleichzeitig aufgenommen und auf eine Stellfläche überführt, welche die vereinzelten Substrate aufnimmt.From the DE 697 22 071 T2 For example, an apparatus for loading wafers obtained by sawing a substrate block into a storage element is known. There are proposed handling devices that allow to take round or oval substrates in cross-section and to convert them into a stand-like structure. In this case, a plurality of substrates are recorded simultaneously and transferred to a footprint, which receives the isolated substrates.

Aus der DE 199 04 834 A1 ist eine Vorrichtung zum Ablösen von einzelnen dünnen, bruchempfindlichen und scheibenartigen Substraten bekannt. Der Substratblock mit den bereits gesägten Substraten befindet sich in einem mit einem Fluid gefüllten Behälter. Im Gegensatz zum bisher bekannten Stand der Technik ist die Halteeinrichtung zusammen mit den noch an der Halteeinrichtung fixierten Substraten senkrecht ausgerichtet, so dass das zu vereinzelnde Substrat parallel zur Fluidoberfläche angeordnet ist. Eine Keileinrichtung sorgt dafür, dass eine Trennung zwischen der Glasplatte und dem zu vereinzelnden Substrat stattfindet. Ein in unmittelbarer Nähe zum Substrat angeordnetes Transportband sorgt dafür, dass die abgelösten und aufschwimmenden Substrate abtransportiert werden. Eine Schiebeeinrichtung sieht vor, dass die Halteeinrichtung immer wieder in die gleiche Position gebracht und horizontal gegen die Keileinrichtung zur Ablösung des jeweiligen Substrats gefahren wird. Auf der anderen Seite des Förderbandes ist eine Einrichtung vorgesehen, mit der die vereinzelten Substrate automatisch in einen Ständer eingefügt werden. Ziel der Ablösung ist es, dass die abgetrennten, scheibenartig ausgebildeten Substrate nach ihrer Entfernung von der Halteeinrichtung gestapelt und in vorbestimmte Einrichtungen eingefügt oder unmittelbar planmäßig aufeinander gelegt werden.From the DE 199 04 834 A1 a device for detaching individual thin, fragile and disc-like substrates is known. The substrate block with the already sawn substrates is in a container filled with a fluid. In contrast to the previously known prior art, the holding device is vertically aligned together with the still fixed to the holding device substrates, so that the substrate to be separated is arranged parallel to the fluid surface. A wedge device ensures that a separation between the glass plate and the substrate to be separated takes place. An arranged in close proximity to the substrate conveyor belt ensures that the detached and floating substrates are removed. A sliding device provides that the holding device is repeatedly brought into the same position and moved horizontally against the wedge device for detachment of the respective substrate. On the other side of the conveyor belt, a device is provided with which the separated substrates are automatically inserted into a stand. The aim of the replacement is that the separated, disc-like substrates stacked after their removal from the holding device and in a predetermined Institutions are inserted or placed directly on schedule.

Nachteile des Standes der TechnikDisadvantages of the prior art

Die Vereinzelung der jeweiligen Substrate gestaltet sich schwierig.The separation of the respective substrates is difficult.

Für das Vereinzeln sind Bewegungen notwendig, die komplexe Einrichtungen erfordern, sofern man auf eine manuelle Bedienung verzichten möchte. Da es sich jedoch bei den Substraten um sehr bruchempfindliche und dünne, plattenartig ausgestaltete Substrate handelt, können diese nicht ohne weiteres über herkömmliche greifarmähnliche Systeme aufgenommen werden. Hierzu ist es notwendig, sehr präzise und feinfühlige Einrichtungen vorzusehen.For the singling movements are necessary, which require complex facilities, if you want to do without manual operation. Since, however, the substrates are very fragile and thin, plate-like designed substrates, they can not be easily taken over conventional gripper arm-like systems. For this it is necessary to provide very precise and sensitive devices.

Aus dem Stand der Technik sind somit ausschließlich solche Einrichtungen bekannt, die das jeweilige Substrat mittels einer Saugeinrichtung ergreifen. Unmittelbar nach dem Anfahren der Saugeinrichtung an die flächige Ausgestaltung des zu vereinzelnden Substrats wird zwischen Saugeinrichtung und zu vereinzelndem Substrat über eine Vakuumpumpe ein Vakuum erzeugt, so dass ein Anhaften des Substrats an einer Handhabungseinrichtung möglich ist. Es ist jedoch Vorsicht geboten, da das zu vereinzelnde Substrat durch zu hohen Unterdruck zu Bruch gehen kann.From the prior art, therefore, only those devices are known which take the respective substrate by means of a suction device. Immediately after starting the suction device to the planar configuration of the substrate to be separated, a vacuum is generated between the suction device and substrate to be separated via a vacuum pump, so that the substrate can adhere to a handling device. However, care should be taken because the substrate to be separated may break due to excessive negative pressure.

Ein weiterer kritischer Punkt hierbei besteht darin, dass das jeweilige Substrat von der Handhabungseinrichtung angefahren, d.h. berührt werden muss. Da das Substrat von der Einrichtung in keinem Fall weggedrückt werden darf, ist eine exakte Positionierung notwendig. Dies gestaltet sich doch schwierig, da zum einen eine Relativbewegung der Halteeinrichtung zur Positionierung des zu vereinzelnden Substrats im Bereich der Halteeinrichtung vorgesehen ist, und die Halteeinrichtung selbst damit entsprechende Freiheitsgrade aufweist. Daher sind Toleranzen möglich, die zur möglichen Beschädigung des zu vereinzelnden Substrats führen. Zum anderen finden solche Bewegungen in der Regel in einem Fluid statt, so dass Gefahr besteht, dass durch die einzelnen Bewegungen der Einrichtungen ein Strömungsdruck, insbesondere in Richtung der Substrate, entsteht, der zu Positionsverschiebungen der Substrate oder sogar zu Bruch führen kann.Another critical point here is that the respective substrate has to be approached by the handling device, ie it has to be touched. Since the substrate must not be pushed away from the device in any case, an exact positioning is necessary. This is difficult, since on the one hand a relative movement of the holding device for positioning the substrate to be separated in the region of Holding device is provided, and the holding device itself thus has corresponding degrees of freedom. Therefore, tolerances are possible, which lead to possible damage to the substrate to be separated. On the other hand, such movements generally take place in a fluid, so that there is a risk that a flow pressure, in particular in the direction of the substrates, is created by the individual movements of the devices, which can lead to positional displacements of the substrates or even to breakage.

Eine von Hand durchgeführte Vereinzelung birgt die Gefahr, dass die sehr dünnen und bruchempfindlichen sowie scheibenförmig ausgebildeten Substrate insbesondere aufgrund der erhöhten Adhäsionskräfte zerbrechen.A hand carried out singling involves the risk that the very thin and fragile and disk-shaped substrates break, especially due to the increased adhesive forces.

Aufgabe der ErfindungObject of the invention

Die Aufgabe der Erfindung besteht daher in der Bereitstellung von Vorrichtungen und Verfahren, mit denen ein nahezu beschädigungsfreies Entnehmen von dünnen, bruchempfindlichen und gestapelten Substraten ermöglicht wird.The object of the invention is therefore to provide devices and methods with which a virtually damage-free removal of thin, fracture-sensitive and stacked substrates is made possible.

Lösung der AufgabeSolution of the task

Die Lösung der Aufgabe besteht darin, eine Vorrichtung gemäß Anspruch 1 und ein Verfahren gemäß den Merkmalen des Anspruchs 16 vorzuschlagen.The solution of the problem is to propose a device according to claim 1 and a method according to the features of claim 16.

Vorteile der ErfindungAdvantages of the invention

Einer der wesentlichen Vorteile der Erfindung besteht darin, dass die Substrate bruchsicher in einem schnellen Zyklus vollständig und automatisiert vereinzelt werden können.One of the significant advantages of the invention is that the substrates can be shatter-proofed in a fast cycle completely and automatically singulated.

Die Lösung besteht darin, dass die im Wesentlichen senkrecht zur Vorschubrichtung, jedoch leicht unter einem Winkel geneigt ausgerichteten Substrate innerhalb des Substratstapels durch eine Strömungseinrichtung aufgefächert werden. Vorzugsweise werden die ersten fünf bis zehn Substrate von durch Strömungsdüsen erzeugten Strömungen umströmt, so dass die einzelnen Substrate im Abstand zueinander gehalten werden und sogenannte fluide Dämpfungskissen zwischen den einzelnen Substraten entstehen. Sofern gegen die Stapel- bzw. Vorschubrichtung eine Kraft auf die Substrate wirkt, werden die einzelnen Substrate des erfindungsgemäßen Verfahrens nicht weiter zusammengedrückt; vielmehr wird vollständig über die gesamte Fläche eine Gegenkraft erzeugt, die jedoch in gewissen Grenzen eine Restbeweglichkeit insbesondere des am Stapelanfang befindlichen Substrats ermöglicht. Diese Gegenkraft wird zusammen mit der Restbeweglichkeit ausgenutzt, damit der Greifer der Entnahmeeinrichtung gegen das zu vereinzelnde Substrat drücken kann. Ohne indirekte Dämpfung mittels der zwischen den aufgefächerten Substraten befindlichen fluiden Dämpfungskissen würde das Substrat mit hoher Wahrscheinlichkeit brechen.The solution is that the substantially perpendicular to the feed direction, but slightly inclined at an angle aligned substrates within the substrate stack are fanned by a flow device. Preferably, the first five to ten substrates flow around flows generated by flow nozzles, so that the individual substrates are kept at a distance from each other and so-called fluid damping pads between the individual substrates arise. If a force acts on the substrates against the stacking or feed direction, the individual substrates of the method according to the invention are not further compressed; Rather, an opposing force is generated completely over the entire surface, which, however, allows, within certain limits, a residual mobility, in particular of the substrate at the beginning of the stack. This counterforce is utilized together with the residual mobility, so that the gripper of the removal device can press against the substrate to be separated. Without indirect damping by means of the fluid damping pads between the fanned-out substrates, the substrate would likely break.

Handelt es sich um einen stehenden Stapel, so wird der Greifer bevorzugt von oben, d. h. parallel zur Längserstreckung der jeweiligen Substrate und damit ungefähr quer zur Stapelrichtung eingeführt und dann gegen das zu vereinzelnde Substrat geführt. Die in dem Greifer vorgesehenen Bohrungen dienen dazu, das Fluid aus dem Zwischenraum zwischen dem Greifer und dem zu vereinzelnden Substrat abzusaugen. Hierzu ist ein Unterdruck notwendig, der sowohl mittels dynamischer Verfahren (z.B. Pumpe), statischer Verfahren (Unterdrucktank) oder sonstiger Verfahren innerhalb oder außerhalb der Vorrichtung erzeugt werden kann. Befinden sich schließlich Greifer und Substrat in unmittelbarem Kontakt, bzw. befindet sich nur noch ein sehr dünner Fluidfilm (wenige Nanometer bis zu 50 Mikrometer) zwischen Greifer und Substrat, so bauen sich Adhäsionskräfte auf, die ein selbsttätiges Festhalten bzw. Anhaften des Substrats an dem Greifer ermöglichen. Diese Adhäsionskräfte sind insbesondere größer als diejenigen zum nachfolgenden Substrat, so dass die Entnahme des zu vereinzelnden Substrats mit dem Greifer parallel zur Flächenrichtung des nachfolgenden Substrats erfolgen kann. Dabei wirken allenfalls nur geringe Scherkräfte auf das zu vereinzelnde Substrat, wodurch die Bruchrate erheblich verringert wird. Zug- und Druckkräfte werden vermieden. Ein im Zeittakt schnelles Entnehmen aus dem Substratstapel ist möglich. Die Adhäsionskräfte sind ferner so groß, dass sie, je nach geometrischer Ausgestaltung des Greifers und Substratgewicht, insbesondere dann ein Anhaften von Substrat am Greifer auch ohne aktive Unterdruckerzeugung ermöglichen, wenn sich das Substrat außerhalb des den Substratstapel umgebenden Fluids befindet. Hierbei ist zu beachten, dass der funktionelle Zusammenhang von Bohrungsdurchmesser und -anzahl in der Greiferfläche, die Größe der Greiferfläche, sowie die Größe des zum Absaugen des Fluids und zum Ansaugen des Substrats notwendigen Unterdrucks berücksichtigt wird.If it is a standing stack, the gripper is preferably introduced from above, ie parallel to the longitudinal extent of the respective substrates and thus approximately transversely to the stacking direction and then guided against the substrate to be separated. The holes provided in the gripper serve to suck the fluid out of the space between the gripper and the substrate to be separated. For this purpose, a negative pressure is necessary, which can be generated both by means of dynamic methods (eg pump), static method (vacuum tank) or other methods inside or outside the device. Finally, if the gripper and the substrate are in direct contact, or if only a very thin fluid film (a few nanometers up to 50 micrometers) is present between the gripper and the substrate, adhesion forces build up, which automatically adhere or adhere the substrate to the substrate Enable gripper. These adhesion forces are in particular greater than those for the following substrate, so that the removal of the substrate to be separated with the gripper can take place parallel to the surface direction of the following substrate. At most only slight shearing forces act on the substrate to be separated, as a result of which the breakage rate is considerably reduced. Tensile and compressive forces are avoided. Fast removal from the substrate stack is possible in a timely manner. The adhesion forces are furthermore so great that, depending on the geometrical configuration of the gripper and substrate weight, they allow substrate to adhere to the gripper even without active underpressure generation, especially when the substrate is outside the fluid surrounding the substrate stack. It should be noted that the functional relationship between the bore diameter and number in the gripper surface, the size of the gripper surface, as well as the size of the vacuum necessary for the suction of the fluid and for sucking the substrate is taken into account.

Der Greifer selbst ist vorzugsweise derart ausgestaltet, dass er ausschließlich aus einem Balken besteht. Alternative Ausführungen können vorsehen, dass balkenförmige, O-förmige, U-förmige, dreieckige und in Greiferbewegungsrichtung spitz zulaufende (V-förmig), oder aber auch flächenmäßig ausgestaltete Greifer vorgesehen sind. Besonders bevorzugt sind solche Ausführungen, die einen geringen Strömungswiderstand in Greiferbewegungsrichtung aufweisen und/oder möglichst geringe Turbulenzen beim Entfernen des Substrats vom Substratstapel und der nachfolgenden Vereinzelungsbewegung erzeugen. Die Greifer aller Ausführungen weisen weiterhin den Vorteil auf, dass nur ein Greifer für unterschiedliche Formate von Substraten verwendet werden muss, und dass das Prinzip des Greifens des zu vereinzelnden Substrats auch bei solchen Substraten funktionsgerecht ausgeführt werden kann, die bereits gebrochen sind und daher nicht mehr die üblichen Abmaße aufweisen. Ein weiterer Vorzug liegt darin, dass mit einer Greiferausführung unterschiedliche Formate von Substraten aufgenommen werden können. Dies liegt darin begründet, dass nicht eine Saugwirkung, sondern eine Adhäsionskraft erzielt wird, die sich flächenmäßig über die Kontaktfläche zwischen Greifer und Substrat erstreckt.The gripper itself is preferably designed such that it consists exclusively of a beam. Alternative embodiments can provide that bar-shaped, O-shaped, U-shaped, triangular and in the gripper movement direction tapered (V-shaped), or are also designed surface gripper provided. Particularly preferred are those designs which have a low flow resistance in gripper movement direction and / or generate the least possible turbulence when removing the substrate from the substrate stack and the subsequent separation movement. The grippers of all embodiments furthermore have the advantage that only one gripper has to be used for different formats of substrates, and that the principle of gripping the substrate to be separated can be carried out functionally even for those substrates which are already broken and therefore no longer have the usual dimensions. Another advantage is that different formats of substrates can be accommodated with a gripper design. This is due to the fact that not a suction, but an adhesion force is achieved, which is areally extending over the contact surface between gripper and substrate.

Erfindungsgemäß wird der Unterdruck zu Beginn der Entnahmephase erzeugt. Auch wenn dieser Unterdruck nur bis zum Erhalt des oben genannten Fluidfilms zwischen Substrat und Kontaktfläche des Greifers aufrechterhalten bleiben muss, kann der Unterdruck auch bis zum Ablegen des Substrates auf die Transportvorrichtung aufrechterhalten bleiben.According to the invention, the negative pressure is generated at the beginning of the extraction phase. Even if this negative pressure only has to be maintained until the above-mentioned fluid film is obtained between the substrate and the contact surface of the gripper, the negative pressure can also be maintained until the substrate has been deposited on the transport device.

Die Trägereinrichtung selbst ist derart aufgebaut, dass sie mindestens einen aus einer Vielzahl von Substraten bzw. Wafern bestehenden Substratstapel aufnehmen kann. Ferner weist die Trägereinrichtung Mittel auf, durch welche sichergestellt wird, dass die einzelnen Substrate eine gewisse Neigung aufweisen, wobei die Neigung derart ausgebildet ist, dass der Neigungswinkel α, gebildet zwischen der Vorschubrichtung des Stapels und der eher in Vorschubrichtung weisenden Flächennormalen eines Substrats, größer 0 Grad, also positiv ist. Im Falle eines stehenden Stapels bedeutet dies, dass die auf der Trägereinrichtung liegende Kante des Substrats in Vorschubrichtung vor der oberen Kante angeordnet ist. Dies bringt den Vorteil mit sich, dass der Greifer parallel zu dieser Ausrichtung in das Fluid eintauchen und das Substrat so in dieser Richtung auch wieder entnehmen kann. Dadurch wird auch vermieden, dass der stehende Stapel bei einem Weitertransport der Trägereinrichtung innerhalb des Fluids nach vorne kippt und damit seine Lageorientierung verliert.The carrier device itself is constructed so that it can accommodate at least one of a plurality of substrates or wafers existing substrate stack. Furthermore, the carrier device has means by which it is ensured that the individual substrates have a certain inclination, the inclination being such that the angle of inclination α, formed between the feed direction of the stack and the surface directional normal of a substrate pointing in the feed direction, is greater 0 degrees, so positive. In the case of a standing stack, this means that the edge of the substrate lying on the carrier device is arranged in the feed direction in front of the upper edge. This has the advantage that the gripper can dip into the fluid parallel to this orientation and thus remove the substrate again in this direction. This also avoids that the stationary stack tilts forward in a further transport of the support means within the fluid and thus loses its positional orientation.

Somit ist die Trägereinrichtung zumindest in eine Richtung verschiebbar. Vorzugsweise ist sie in Vorschubrichtung verschiebbar, und zwar zunächst soweit, bis das erste zu vereinzelnde Substrat des Substratstapels an die Lagebestimmungseinrichtung gelangt. Anschließend ist sie z.B. in Schritten verschiebbar, deren Schrittweite vorzugsweise der jeweiligen, im Normalfall über den Stapel hin konstanten Substratdicke entspricht, und zwar soweit, bis schließlich das letzte Substrat des Stapels an die Entnahmeeinrichtung herangeführt ist. Alternativ kann die Trägereinrichtung stationär ausgebildet sein. In diesem Falle würden geeignete Mittel bereitgestellt werden, mit denen der Substratstapel auf der Trägereinrichtung in Vorschubrichtung bewegt werden kann. Alternativ oder zusätzlich können die Greifeinrichtung sowie die Lagebestimmungseinrichtung über entsprechend größere Freiheitsgrade verfügen, damit sie entgegen der Vorschubrichtung in Richtung des Stapelanfangs bewegbar sind.Thus, the carrier device is displaceable at least in one direction. Preferably, it is displaceable in the feed direction, namely initially so far, until the first to be separated substrate of the substrate stack reaches the orientation device. Then she is in eg Slidable steps whose step size preferably corresponds to the respective, in the normal case over the stack towards constant substrate thickness, and indeed until, finally, the last substrate of the stack is brought to the removal device. Alternatively, the carrier device may be stationary. In this case, suitable means would be provided with which the substrate stack can be moved on the carrier device in the feed direction. Alternatively or additionally, the gripping device and the position-determining device can have correspondingly greater degrees of freedom, so that they can be moved counter to the feed direction in the direction of the stack beginning.

Die Lagebestimmungseinrichtung ist eine Einrichtung, mit der die Lage und Position des zu vereinzelnden Substrats detektiert wird. Hierzu ist vorgesehen, dass die Lagebestimmungseinrichtung Andruckstifte umfasst, die in Richtung des Substratstapels ausgerichtet sind. Durch Verringern des Abstandes zwischen der Lagebestimmungseinrichtung und dem Substratstapel wird der aufgefächerte Anfang des Substratstapels solange ausgerichtet, bis das zu vereinzelnde Substrat an allen vorgesehenen Andruckstiften anliegt. Ein zusätzliches Sensorelement, beispielsweise in Form eines Berührungssensors, gibt ein entsprechendes Signal aus, wodurch der Greifer nun vorzugsweise zwischen die Andruckstifte eintauchen und das zu vereinzelnde Substrat vereinzeln und wegtransportieren kann.The position determining device is a device with which the position and position of the substrate to be separated is detected. For this purpose, it is provided that the position-determining device comprises pressure pins, which are aligned in the direction of the substrate stack. By reducing the distance between the position-determining device and the substrate stack, the fanned-out beginning of the substrate stack is aligned until the substrate to be separated rests against all provided pressure pins. An additional sensor element, for example in the form of a touch sensor, emits a corresponding signal, as a result of which the gripper can now preferably dip between the pressure pins and singulate and transport the substrate to be separated.

Sofern der Substratstapel Substrate umfasst, deren Dicke die für das Justieren der Andruckelemente eingestellte Durchschnittsdicke und damit die resultierende Schrittweite übersteigt, wird dieser Zustand von der Lagebestimmungseinrichtung detektiert, so dass der Substratstapel entsprechend in Vorschubrichtung verfahren wird, bis das nächste zu vereinzelnde Substrat die Andruckelemente kontaktiert.If the substrate stack comprises substrates whose thickness exceeds the average thickness set for adjusting the pressure elements and thus the resulting step size, this state is detected by the position determining device, so that the substrate stack is moved correspondingly in the feed direction until the next substrate to be separated contacts the pressure elements ,

Alternativ oder zusätzlich kann die Lagebestimmungseinrichtung durch einen Winkelmesser ergänzt werden. Auf diese Weise kann die Lage des zu vereinzelnden Substrats exakt bestimmt und gewünschtenfalls als Messgröße zur Überprüfung der Qualität des zu vereinzelnden Substrats herangezogen werden.Alternatively or additionally, the position-determining device can be supplemented by a protractor. In this way, the position of the substrate to be separated can be determined exactly and, if desired, used as a parameter for checking the quality of the substrate to be separated.

Der Vorteil der Vorrichtung liegt somit darin, dass durch das zusammenspiel von Trägereinrichtung, Entnahmeeinrichtung, Strömungseinrichtung sowie Lagebestimmungseinrichtung eine Vorrichtung insbesondere zum Vereinzeln und Transportieren von Substraten geschaffen worden ist, mittels der die Verfahrensschritte automatisiert und mit einer im Vergleich zum Stand der Technik äußerst geringen Bruchrate ausgeführt werden können. Dieser Vorteil wird durch das aufgrund der Strömungseinrichtung vorgesehene fluide Dämpfungskissen unterstützt.The advantage of the device thus lies in the fact that an apparatus, in particular for separating and transporting substrates, has been created by the interaction of carrier device, removal device, flow device and position determining device, by means of which the method steps are automated and with an extremely low breakage rate compared with the prior art can be executed. This advantage is aided by the fluid damping pad provided by the flow means.

Auch die Ausgestaltung der Entnahmeeinrichtung selbst sowie die hierdurch vorgegebene Entnahme des Substrats quer zur Stapelrichtung bewirkt, dass auf das zu vereinzelnde Substrat keine oder nur geringe Zug- oder Druckkräfte wirken. Vorteilhafterweise ist diese Entnahmeeinrichtung derart ausgebildet, dass die Entnahme parallel zur flächenmäßigen Erstreckung des jeweiligen Substrats erfolgt, damit möglichst wenig Zug-, Druck- oder Biegekräfte auf das entsprechende Substrat wirken.The design of the removal device itself as well as the hereby predetermined removal of the substrate transversely to the stacking direction causes no or only slight tensile or compressive forces act on the substrate to be separated. Advantageously, this removal device is designed such that the removal takes place parallel to the surface extension of the respective substrate, so that as little tensile, compressive or bending forces act on the corresponding substrate.

Der Weitertransport erfolgt vorzugsweise innerhalb des Fluids. Es ist jedoch auch vorgesehen, den Greifer aus dem Fluid herauszuführen und das über Adhäsion anhaftende Substrat von dem Greifer auf ein Fördermittel wie z.B. ein Transportband derart abzulegen, dass Fluid über die im Greifer vorgesehenen Bohrungen in Richtung des Substrates ausgestoßen wird, so dass sich das flächig ausgebildete Substrat von dem Greifer einfach und ohne Wirkung durch von außen angreifender Zug- und/oder Druckkräfte lösen kann.The further transport preferably takes place within the fluid. However, it is also envisaged to lead the gripper out of the fluid and deposit the adhesion-adhering substrate from the gripper onto a conveying means such as a conveyor belt such that fluid is expelled via the holes provided in the gripper in the direction of the substrate, so that the flat formed substrate of the gripper can solve easily and without effect by externally attacking tensile and / or compressive forces.

Der Zyklus ist beliebig oft wiederholbar.The cycle can be repeated as often as desired.

Einer der wesentlichen Vorteile einer weiteren Ausbildung der Erfindung besteht darin, dass der vorgesehene Greifarm in seiner Annäherung an das Substrat eine gewisse Toleranz aufweisen kann. Es ist nicht erforderlich, dass der Greifarm exakt vor dem zu vereinzelnden Substrat anhält und dort positioniert wird. Vielmehr kann die Dämpfung, die aufgrund der Anordnung der Substrate innerhalb des Fluids sowie durch die Strömungseinrichtung entsteht, vorteilhaft ausgenutzt werden, indem der Greifer mit geringer Kraft entgegen der Vorschubrichtung gegen den Substratstapel fährt und so einen flächigen Kontakt zu dem zu vereinzelnden Substrat herstellt, welches aufgrund des dahinter liegenden fluiden Dämpfungskissens nachgiebig gelagert ist.One of the significant advantages of a further embodiment of the invention is that the intended gripping arm can have a certain tolerance in its approach to the substrate. It is not necessary that the gripper arm stops exactly in front of the substrate to be separated and is positioned there. Rather, the damping, which arises due to the arrangement of the substrates within the fluid and by the flow device can be advantageously exploited by the gripper moves against the feed direction against the substrate stack with little force and so produces a surface contact with the substrate to be separated, which is resiliently supported due to the underlying fluid damping cushion.

Ein weiterer Vorteil der Erfindung betrifft die Bereitstellung einer Vorrichtung, mit der die zwischen Greifarm und Substrat vorhandenen Adhäsionskräfte maschinell und damit selbsttätig ausgenutzt werden, so dass jedes einzelne Substrat relativ unabhängig von seiner Größe und Außenkontur auf einfache Art und Weise bruchfrei entnommen, durch den Transport innerhalb des Fluids teilweise sogar vorgereinigt und in eine bestimmte Einrichtung wie beispielsweise auf eine Transportvorrichtung überführt werden kann.A further advantage of the invention relates to the provision of a device with which the adhesive forces between the gripper arm and the substrate are automatically and thus automatically utilized so that each individual substrate is removed in a relatively simple manner without fracture, regardless of its size and outer contour, by the transport partially even pre-cleaned within the fluid and can be transferred to a specific device such as a transport device.

Eine weitere alternative Ausführungsform der Entnahmeeinrichtung zeigt eine Einrichtung, die einen definierten Flexibilitätsgrad aufweist, so dass Toleranzen im Positionierungsbereich im Hinblick auf die flächige Anordnung der Aufnahme zu dem zu vereinzelnden Substrat ausgeglichen werden. Dabei ist der Greifer, die Handhabungseinrichtung und/oder die Verbindung zwischen beiden Bauteilen in sich biegsam ausgestaltet und entsprechend verformbar.A further alternative embodiment of the removal device shows a device which has a defined degree of flexibility, so that tolerances in the positioning region are compensated with regard to the planar arrangement of the receptacle to the substrate to be separated. In this case, the gripper, the handling device and / or the connection between the two components is designed to be flexible and correspondingly deformable.

Um die Taktzeiten für die Vereinzelung zu erhöhen, ist nach einer besonders bevorzugten Ausführungsform ein weiteres Mittel zur Übernahme des vereinzelten Substrats von der Entnahmeeinrichtung vorgesehen. Innerhalb der Zeitspanne, in der das Substrat durch dieses weitere Mittel auf ein Förderband abgelegt wird, kann die Entnahmeeinrichtung bereits ein weiteres Substrat vom Substratstapel aufnehmen. Alternativ oder zusätzlich können zwei im Wesentlichen baugleiche Entnahmeeinrichtungen vorgesehen sein, die phasenverschoben geschaltet sind.In order to increase the cycle times for the separation, according to a particularly preferred embodiment, a further means for taking over the isolated substrate from the removal device is provided. Within the time span in which the substrate is deposited on a conveyor belt by this further means, the removal device can already pick up a further substrate from the substrate stack. Alternatively or additionally, two substantially identical removal devices may be provided, which are connected in phase shift.

Weitere vorteilhafte Ausgestaltungen gehen aus der nachfolgenden Beschreibung, den Ansprüchen sowie den Zeichnungen hervor.Further advantageous embodiments will become apparent from the following description, the claims and the drawings.

Zeichnungendrawings

Es zeigen:

Fig. 1 [A-F]
eine schematische Darstellung der erfindungsgemäßen Vorrichtung, insbesondere des Ablaufs eines Vereinzelungs- und Transportprozesses eines zu vereinzelnden Substrats;
Fig. 2
eine schematische Darstellung eines Ausführungsbeispiels der erfindungsgemäßen Vorrichtung gemäß Fig. 1 in Seitenansicht;
Fig. 3
eine schematische Darstellung der in Fig. 2 gezeigten Ausführungsform in perspektivischer Ansicht;
Fig. 4 [A]
eine schematische Darstellung eines ersten Verfahrensschritts der erfindungsgemäßen Vorrichtung gemäß Fig. 2 in Seitenansicht;
Fig. 4 [B]
eine schematische Darstellung eines ersten Verfahrensschritts der erfindungsgemäßen Vorrichtung gemäß Fig. 2 in perspektivischer Ansicht;
Fig. 5 [A]
eine schematische Darstellung eines zweiten Verfahrensschritts der erfindungsgemäßen Vorrichtung gemäß Fig. 2 in Seitenansicht;
Fig. 5 [B]
eine schematische Darstellung eines zweiten Verfahrensschritts der erfindungsgemäßen Vorrichtung gemäß Fig. 2 in perspektivischer Ansicht;
Fig. 6 [A]
eine schematische Darstellung eines dritten Verfahrensschritts der erfindungsgemäßen Vorrichtung gemäß Fig. 2 in Seitenansicht;
Fig. 6 [B]
eine schematische Darstellung eines dritten Verfahrensschritts der erfindungsgemäßen Vorrichtung gemäß Fig. 2 in perspektivischer Ansicht;
Fig. 7 [A]
eine schematische Darstellung eines vierten Verfahrensschritts der erfindungsgemäßen Vorrichtung gemäß Fig. 2 in Seitenansicht;
Fig. 7 [B]
eine schematische Darstellung eines vierten Verfahrensschritts der erfindungsgemäßen Vorrichtung gemäß Fig. 2 in perspektivischer Ansicht;
Fig. 8 [A]
eine schematische Darstellung eines fünften Verfahrensschritts der erfindungsgemäßen Vorrichtung gemäß Fig. 2 in Seitenansicht;
Fig. 8 [B]
eine schematische Darstellung eines fünften Verfahrensschritts der erfindungsgemäßen Vorrichtung gemäß Fig. 2 in perspektivischer Ansicht;
Fig. 9 [A]
eine schematische Darstellung eines sechsten Verfahrensschritts der erfindungsgemäßen Vorrichtung gemäß Fig. 2 in Seitenansicht;
Fig. 9 [B]
eine schematische Darstellung eines sechsten Verfahrensschritts der erfindungsgemäßen Vorrichtung gemäß Fig. 2 in perspektivischer Ansicht.
Show it:
Fig. 1 [AF]
a schematic representation of the device according to the invention, in particular the sequence of a separation and transport process of a substrate to be separated;
Fig. 2
a schematic representation of an embodiment of the device according to the invention according to Fig. 1 in side view;
Fig. 3
a schematic representation of in Fig. 2 embodiment shown in a perspective view;
Fig. 4 [A]
a schematic representation of a first process step of the device according to the invention according to Fig. 2 in side view;
Fig. 4 [B]
a schematic representation of a first process step of the device according to the invention according to Fig. 2 in perspective view;
Fig. 5 [A]
a schematic representation of a second process step of the device according to the invention according to Fig. 2 in side view;
Fig. 5 [B]
a schematic representation of a second process step of the device according to the invention according to Fig. 2 in perspective view;
Fig. 6 [A]
a schematic representation of a third process step of the device according to the invention according to Fig. 2 in side view;
Fig. 6 [B]
a schematic representation of a third process step of the device according to the invention according to Fig. 2 in perspective view;
Fig. 7 [A]
a schematic representation of a fourth process step of the device according to the invention Fig. 2 in side view;
Fig. 7 [B]
a schematic representation of a fourth process step of the device according to the invention Fig. 2 in perspective view;
Fig. 8 [A]
a schematic representation of a fifth method step of the device according to the invention according to Fig. 2 in side view;
Fig. 8 [B]
a schematic representation of a fifth method step of the device according to the invention according to Fig. 2 in perspective view;
Fig. 9 [A]
a schematic representation of a sixth method step of the device according to the invention according to Fig. 2 in side view;
Fig. 9 [B]
a schematic representation of a sixth method step of the device according to the invention according to Fig. 2 in perspective view.

Beschreibungdescription

In Figur 1, Darstellungen A-F, ist schematisch die erfinderische Vorrichtung 101 sowie das erfindungsgemäße Verfahren dargestellt. Diese Vorrichtung 101 ist geeignet zum Vereinzeln und Transportieren von scheibenförmig ausgebildeten Substraten 102.In FIG. 1 , Representations AF, is shown schematically the inventive device 101 and the inventive method. This device 101 is suitable for separating and transporting disk-shaped substrates 102.

Bei dem dargestellten Ausführungsbeispiel sind die Substrate 102 in einem Substratstapel 103 angeordnet, wobei der Substratstapel 103 in einer Trägereinrichtung 104 gelagert ist. Die einzelnen Substrate 102 sind bereits von einer Halteeinrichtung gelöst. Bevorzugt sind die Flächennormalen der eher in Vorschubrichtung weisenden Flächen der einzelnen Substrate 102 in einem Winkel α (Neigungswinkel)(in Figur 2 dargestellt) zur Vorschubrichtung angeordnet. Bei der Anordnung der Vorrichtung innerhalb eines Fluids wird im Falle eines stehenden Substratstapels 103 durch diese Schrägstellung verhindert, dass die einzelnen Substrate 102 aufschwimmen oder die Trägereinrichtung 104 ungewollt verlassen. Zudem lassen sich die einzelnen Substrate 102 durch die noch näher zu beschreibende Entnahmeeinrichtung 107 einfacher aufnehmen.In the illustrated embodiment, the substrates 102 are arranged in a substrate stack 103, wherein the substrate stack 103 is mounted in a carrier device 104. The individual substrates 102 are already released from a holding device. Preferably, the surface normals of the surfaces of the individual substrates 102 pointing in the direction of advance are at an angle α (inclination angle) (in FIG FIG. 2 shown) arranged to the feed direction. In the case of the arrangement of the device within a fluid, in the case of a stationary substrate stack 103, this oblique position prevents the individual substrates 102 from floating or unintentionally leaving the carrier device 104. Also let the individual substrates 102 are easier to receive through the removal device 107, which will be described later.

Die einzelnen flächig ausgebildeten Substrate 102 sind derart aneinandergereiht, dass sich deren Oberflächen berühren. Zwischen ihnen wirken Adhäsionskräfte, die von dem sehr kleinen Spalt zwischen den Substraten einerseits und ggf. von Verunreinigungen z.B. durch einen vorangegangenen Sägeschritt herrühren. Durch diese Anordnung geben die Substrate 102 eine definierte Vorschubrichtung 105 vor.The individual flat-shaped substrates 102 are lined up in such a way that touch their surfaces. Adhesive forces acting thereon from the very small gap between the substrates on the one hand and possibly impurities, for example, act between them. resulting from a previous sawing step. As a result of this arrangement, the substrates 102 predefine a defined feed direction 105.

In den dargestellten Zeichnungen sind die Substrate schematisch dargestellt. Dabei bedeutet die schematisch dargestellte Blockansicht, dass die Substrate in diesem Bereich sehr eng aneinander liegen. In dem weiteren Bereich, nämlich dem Entnahmebereich, sind die Substrate aufgefächert und weisen einen Zwischenraum auf. Die Adhäsionskräfte zwischen den aufgefächerten Substraten betragen vorzugsweise null.In the illustrated drawings, the substrates are shown schematically. The block diagram shown schematically means that the substrates in this area are very close to each other. In the wider area, namely the removal area, the substrates are fanned out and have a gap. The adhesion forces between the fanned-out substrates are preferably zero.

Ferner ist erfindungsgemäß eine Entnahmeeinrichtung 107 vorgesehen, die greiferartig ausgestaltet ist. Sie ist bei dem hier dargestellten Ausführungsbeispiel schematisch dargestellt und zeigt im Wesentlichen einen Greifer 108. An dem Greifer 108 ist eine Handhabungseinrichtung (in Figur 1 [A] dargestellt) angeordnet, die es erlaubt, den Greifer 108 in verschiedene Richtungen zu bewegen und/oder zu verschwenken. Vorzugsweise ist der Greifer 108 in Pfeilrichtung 110 und um eine Achse in Pfeilrichtung 112 verschwenkbar.Furthermore, a removal device 107 is provided according to the invention, which is designed like a claw. It is shown schematically in the embodiment shown here and essentially shows a gripper 108. On the gripper 108 is a handling device (in FIG. 1 [A] shown), which allows the gripper 108 to move in different directions and / or to pivot. Preferably, the gripper 108 is pivotable in the direction of arrow 110 and about an axis in the direction of arrow 112.

Ferner ist eine Transporteinrichtung 113 vorgesehen. Diese Transportvorrichtung 113 besteht aus einem Förderband 114, das über eine Achse 115 in Pfeilrichtung 116 angetrieben wird.Furthermore, a transport device 113 is provided. This transport device 113 consists of a conveyor belt 114, which is driven via an axis 115 in the direction of arrow 116.

Bevorzugt ist vorgesehen, dass zumindest bestimmte Teile der Vorrichtung 101, nämlich die Trägereinrichtung 104, der Substratstapel 103, sowie Teile der Entnahmeeinrichtung 107 innerhalb eines Fluids angeordnet sind. Hierdurch wird erreicht, dass die Substrate über die Dauer des gesamten Verfahrens, zumindest bis zu ihrer Ablage auf die Transporteinrichtung nicht trockenfallen. Optional können die restlichen Teile der Entnahmeeinrichtung 107 sowie die Transporteinrichtung 113 ebenfalls innerhalb des Fluids angeordnet sein, wobei die Transporteinrichtung alternativ auch eigene Mittel zur Befeuchtung der Substrate aufweisen kann.It is preferably provided that at least certain parts of the device 101, namely the carrier device 104, the Substrate stack 103, and parts of the removal device 107 are disposed within a fluid. This ensures that the substrates do not fall dry over the duration of the entire process, at least until they are deposited on the transport device. Optionally, the remaining parts of the removal device 107 and the transport device 113 may also be arranged within the fluid, wherein the transport device may alternatively also have their own means for moistening the substrates.

Ferner ist zur Verbesserung der Vereinzelung der jeweiligen Substrate 102 mindestens eine Strömungseinrichtung 117 mit Strömungsdüsen 118 angeordnet, durch die Fluid in Zwischenräume 119 eingebracht wird, wobei sich dieser Zwischenraum 119 jeweils zwischen dem zu vereinzelnden Substrat 102 und dem nachfolgenden Substrat 102 befindet. Vorzugsweise bleibt der jeweilige Zwischenraum 119 bestehen, solange von den Strömungsdüsen 118 Fluid in die Zwischenräume 119 ausströmt. Vorteilhafterweise bilden sich in einem definierten Bereich, in dem mehrere Substrate 102 angeordnet sind, zwischen jeweils zwei Substraten 102 Zwischenräume 119 aus.Furthermore, to improve the separation of the respective substrates 102, at least one flow device 117 with flow nozzles 118 is arranged, through which fluid is introduced into intermediate spaces 119, this intermediate space 119 being located between the substrate 102 to be separated and the following substrate 102. The respective intermediate space 119 preferably remains as long as fluid flows out of the flow nozzles 118 into the intermediate spaces 119. Advantageously, in a defined area, in which a plurality of substrates 102 are arranged, 102 spaces 119 between each two substrates.

Um zu verhindern, dass die einzelnen Substrate 102 durch die Strömung die Trägereinrichtung 104 verlassen, ist ein Andruckelement 122 vorgesehen, das bei dem in den Figuren dargestellten Ausführungsbeispiel im wesentlichen Andruckstifte 123 umfasst. Beim Verfahren des Substratstapels in Vorschubrichtung drückt das zu vereinzelnde Substrat gegen die Andruckstifte 123, wodurch eine Gegenkraft zu der Kraft ausgeübt wird, die durch das Einströmen des Fluids in die Zwischenräume 119 erzeugt wird.In order to prevent the individual substrates 102 from leaving the carrier device 104 as a result of the flow, a pressure element 122 is provided which substantially comprises pressure pins 123 in the exemplary embodiment shown in the figures. When moving the substrate stack in the feed direction, the substrate to be separated presses against the pressure pins 123, whereby a counter force to the force is generated, which is generated by the inflow of the fluid into the spaces 119.

In den Zwischenräumen 119 entstehen sogenannte Fluidkissen, durch die sichergestellt werden kann, dass die einzelnen an das jeweilige Fluidkissen anliegenden Substrate 102 im Abstand zueinander gehalten werden. Ferner weisen diese Fluidkissen die Eigenschaft auf, dass aufgrund des Ausübens der Gegenkraft zum einen durch das Andruckelement 122, aber auch durch das Anfahren des Greifes 108 an das zu vereinzelnde Substrat 102 eine Dämpfungswirkung entsteht.In the spaces 119 arise so-called fluid pillows, can be ensured by the fact that the individual to the respective fluid pad adjacent substrates 102 are kept at a distance from each other. Furthermore, these fluid pads have the property that due to the exertion of the counterforce on the one hand by the pressure element 122, but also by the start of the gripper 108 to the substrate 102 to be separated a damping effect arises.

In der Darstellung Figur 1 [B] ist der Greifer 108 der Einrichtung 107 bereits parallel zur Oberfläche des Substrats 102 angeordnet. Der Greifer 108 verfährt parallel in Pfeilrichtung 110 und in einem weiteren anschließenden Schritt auf die Fläche des Substrats 102 zu, und zwar soweit, bis dieser, wie es in Figur 1 [C] dargestellt ist, das zu vereinzelnde Substrat 102 kontaktiert hat. Aufgrund des Anfahrdruckes, der durch den Greifer 108 erzeugt wird, wenn er das Substrat 102 berührt, wird der jeweilige Zwischenraum zwischen zwei Substraten 102 verkleinert. Aufgrund der Anordnung des Fluids innerhalb der Zwischenräume 119 zwischen jeweils zu vereinzelnden Substraten 102 entsteht ein Dämpfungseffekt. In dieser Darstellung [C] werden die in der Zeichnung nicht näher dargestellten Bohrungen innerhalb des Greifers 108 aktiviert, indem gemäß obiger Darstellung ein Unterdruck erzeugt wird. Der Unterdruck führt dazu, dass der Greifer 108 das zu vereinzelnde Substrat 102 soweit ansaugt, dass sich der Spalt zwischen dem Substrat 102 und dem Greifer 108 sehr stark verkleinert und sich zwischen den Kontaktflächen eine Adhäsionskraft ausbildet. Das Auffächern wird durch das Ausströmen des Fluids aus den Strömungsdüsen 118 unterstützt.In the presentation Figure 1 [B] For example, the gripper 108 of the device 107 is already arranged parallel to the surface of the substrate 102. The gripper 108 moves parallel in the direction of the arrow 110 and in a further subsequent step on the surface of the substrate 102, and as far as until this, as in FIG. 1 [C] is shown, the substrate 102 to be separated has contacted. Due to the starting pressure generated by the gripper 108 when it contacts the substrate 102, the respective gap between two substrates 102 is reduced. Due to the arrangement of the fluid within the interstices 119 between substrates 102 to be separated in each case, a damping effect is created. In this illustration [C], the holes not shown in the drawing are activated within the gripper 108 by a negative pressure is generated in accordance with the above illustration. The negative pressure causes the gripper 108 to suck the substrate 102 to be separated so far that the gap between the substrate 102 and the gripper 108 is greatly reduced and an adhesion force is formed between the contact surfaces. The fanning is assisted by the outflow of fluid from the flow nozzles 118.

Der Greifer 108 bewegt sich mit dem anhaftenden Substrat 102 gemäß Darstellung [D] soweit, bis er das Substrat 102 auf die Transporteinrichtung 113 ablegen kann. Bei diesem Vorgang muss die Einheit aus Substrat und Greifer ein Stück entgegen der Vorschubrichtung 105 verfahren werden, so dass es bei der anschließenden Entnahmebewegung zu keiner Kontaktierung der Andruckstifte 123 mit der Substratfläche kommt. Zur Freigabe des Wafers kann alternativ auch die Lagebestimmungseinrichtung ein Stück in Vorschubrichtung verfahren werden. Diese beiden Bewegungen können erfindungsgemäß auch kombiniert werden. Gemäß Darstellung [E] wird das Substrat 102 flächig auf das Förderband 114 positioniert. Für das Vereinzeln des nächsten Substrats 102 wird gemäß Darstellung [F] der Greifer 108 wieder in die gemäß Darstellung [B] gezeigte Position verfahren.The gripper 108 moves with the adhering substrate 102 as shown [D] until it can deposit the substrate 102 on the transport device 113. In this process, the unit of substrate and gripper must be moved a piece against the feed direction 105, so that it in the subsequent removal movement to no contacting of the pressure pins 123 comes with the substrate surface. To release the wafer, alternatively, the position-determining device can be moved a little bit in the feed direction. These two movements can also be combined according to the invention. As shown in [E], the substrate 102 is positioned flat on the conveyor 114. For separating the next substrate 102, as shown in Fig. [F], the gripper 108 is again moved to the position shown in Fig. [B].

Die Adhäsionskräfte, die beim Ansaugen des zu vereinzelnden Substrats 102 entstehen, sind derart bemessen, dass diese ausreichen, das durch den Greifer 108 aufgenommene Substrat 102 innerhalb des Fluids zu transportieren.The adhesion forces that are created when aspirating the substrate 102 to be separated are dimensioned such that they are sufficient to transport the substrate 102 accommodated by the gripper 108 within the fluid.

In den Figuren 2 und 3 ist schematisch eine Vorrichtung 201 dargestellt, die im Vergleich zu Fig. 1 eine Weiterbildung des Grundgedankens darstellt.In the Figures 2 and 3 schematically a device 201 is shown, in comparison to Fig. 1 represents a development of the basic idea.

Die Vorrichtung 201 ist insbesondere zum Vereinzeln und Transportieren von scheibenförmig ausgebildeten Substraten 202 geeignet.The device 201 is particularly suitable for separating and transporting disk-shaped substrates 202.

Bei dem hier dargestellten Ausführungsbeispiel sind die Substrate 202 in einem Substratstapel 203 angeordnet, wobei der Substratstapel 203 in einer Trägereinrichtung 204 gelagert ist und die einzelnen Substrate 202 bereits von einer Halteeinrichtung gelöst sind.In the exemplary embodiment illustrated here, the substrates 202 are arranged in a substrate stack 203, wherein the substrate stack 203 is mounted in a carrier device 204 and the individual substrates 202 are already detached from a holding device.

Bevorzugt sind die einzelnen Substrate 202 in einem Neigungswinkel α (Fig. 2) zwischen der Vorschubrichtung 205 und der eher in Vorschubrichtung weisenden Flächennormalen des Substrats angeordnet. Durch diese Schrägstellung wird bei Anordnung der Vorrichtung innerhalb eines Fluids und bei einer stehenden Position des Substratstapels 203 verhindert, dass die einzelnen Substrate 202 aufschwimmen und die Trägereinrichtung 204 ungewollt verlassen. Die Substrate 202 sind derart angeordnet, dass sich deren Oberflächen berühren. Die einzelnen Substrate 202 bilden dadurch eine Aneinanderreihung, die eine definierte Vorschubrichtung 205 ergibt.Preferably, the individual substrates 202 are at an angle of inclination α ( Fig. 2 ) is arranged between the feed direction 205 and the surface normal of the substrate which points more in the feed direction. This inclination prevents the arrangement of the device within a fluid and in a standing position of the substrate stack 203 that the Float individual substrates 202 and leave the carrier 204 unintentionally. The substrates 202 are arranged such that their surfaces touch. The individual substrates 202 thereby form a juxtaposition, which results in a defined feed direction 205.

Ferner ist erfindungsgemäß eine Entnahmeeinrichtung 207 vorgesehen, die greiferartig ausgestaltet ist. Sie ist bei dem hier dargestellten Ausführungsbeispiel schematisch dargestellt und zeigt im Wesentlichen einen Greifer 208. An dem Greifer 208 ist eine Handhabungseinrichtung 209 angeordnet, die es erlaubt, den Greifer 208 in verschiedene Richtungen (Pfeilrichtungen 210, 211, 212) zu verschieben und zu verschwenken. Der Greifer 208 und die Handhabungseinrichtung 209 bilden zusammen einen Greifarm.Furthermore, a removal device 207 is provided according to the invention, which is designed like a claw. It is shown schematically in the embodiment shown here and essentially shows a gripper 208. On the gripper 208, a handling device 209 is arranged, which makes it possible to move the gripper 208 in different directions (arrow directions 210, 211, 212) and to pivot , The gripper 208 and the handling device 209 together form a gripping arm.

Ferner ist eine Transporteinrichtung 213 vorgesehen. Diese Transporteinrichtung 213 besteht aus einem Förderband 214, das über eine Achse 15 in Pfeilrichtung 216 angetrieben wird.Furthermore, a transport device 213 is provided. This transport device 213 consists of a conveyor belt 214 which is driven via an axis 15 in the direction of arrow 216.

In der bevorzugten Ausführungsform ist vorgesehen, dass zumindest bestimmte Teile der gesamten Vorrichtung 201, nämlich die Trägereinrichtung 204, der Substratstapel 203, und Teile der Entnahmeeinrichtung 207, innerhalb eines Fluids angeordnet sind. Hierdurch wird erreicht, dass die Substrate über die Dauer des gesamten Verfahrens, zumindest bis zu ihrer Ablage auf die Transporteinrichtung nicht trockenfallen. Optional können auch die restlichen Teile der Entnahmeeinrichtung 207 sowie die Transporteinrichtung 213 in dem Fluid angeordnet sein, wobei die Transporteinrichtung alternativ auch eigene Mittel zur Befeuchtung der Substrate aufweisen kann.In the preferred embodiment, it is provided that at least certain parts of the entire device 201, namely the carrier device 204, the substrate stack 203, and parts of the removal device 207, are arranged within a fluid. This ensures that the substrates do not fall dry over the duration of the entire process, at least until they are deposited on the transport device. Optionally, the remaining parts of the removal device 207 and the transport device 213 may be arranged in the fluid, wherein the transport device may alternatively also have their own means for moistening the substrates.

Ferner ist zur Verbesserung der Vereinzelung der jeweiligen Substrate 202 in der Nähe des Stapelanfangs mindestens eine Strömungseinrichtung 217 mit Strömungsdüsen 218 angeordnet, durch die Fluid in einen Zwischenraum 219 eingebracht wird, wobei der Zwischenraum 219 jeweils zwischen dem zu vereinzelnden Substrat 202 und dem nachfolgenden Substrat 202 entsteht. Die Strömungsdüsen 218 sind insbesondere in dem Bereich des Substratstapels 203 angeordnet, der unmittelbar für die Auffächerung bestimmt ist. In der Regel betrifft dies mindestens die ersten vier bis neun Substrate 202, die dem gerade zu vereinzelnden Substrat 202 folgen. Dadurch entstehen mehrere Zwischenräume 219, wobei jeder Zwischenraum 219 links und rechts von einem Substrat 202 begrenzt ist. Innerhalb des Zwischenraums 219 bildet sich ein Fluidkissen aus, das dämpfende Eigenschaften besitzt.Furthermore, in order to improve the separation of the respective substrates 202 in the vicinity of the beginning of the stack, at least one flow device 217 with flow nozzles 218 is arranged, is introduced by the fluid in a gap 219, wherein the gap 219 is formed between each of the substrate 202 to be separated and the subsequent substrate 202. The flow nozzles 218 are arranged in particular in the region of the substrate stack 203, which is intended directly for the fanning. Typically, this will affect at least the first four to nine substrates 202 following the substrate 202 being singulated. This results in a plurality of gaps 219, each gap 219 is bounded to the left and right of a substrate 202. Within the space 219, a fluid cushion is formed, which has damping properties.

Ferner ist in Fig. 2 und Fig. 3 eine Lagebestimmungseinrichtung 220 dargestellt. Diese Lagebestimmungseinrichtung 220 besteht im Wesentlichen aus einer weiteren Handhabungseinrichtung 221 sowie einem an einem freien Ende der Handhabungseinrichtung 221 angeordneten Andruckelement 222. Das Andruckelement 222 umfasst ferner Andruckstifte 223, die die Oberfläche der jeweiligen Substrate 202 gemäß Fig. 2 und 3 in einer definierten Lage berühren bzw. es mittels der Berührung in eine definierte Lage bringen und dort halten. Die weitere Handhabungseinrichtung 221 ist in und entgegen Pfeilrichtung 230 verschiebbar gelagert.Furthermore, in Fig. 2 and Fig. 3 a position determining device 220 is shown. This position-determining device 220 consists essentially of a further handling device 221 and a pressure element 222 arranged at a free end of the handling device 221. The pressure element 222 further comprises pressure pins 223 which correspond to the surface of the respective substrates 202 Fig. 2 and 3 touch in a defined position or bring it by touch in a defined position and hold there. The further handling device 221 is displaceably mounted in and opposite to the direction of arrow 230.

Ferner ist der Lagebestimmungseinrichtung 220 ein Sensorelement 224 zugeordnet. Dieses Sensorelement 224 hat die Aufgabe, zu detektieren, ob an dem Andruckelement 222 und/oder an den Andruckstiften 223 eine flächige Anlage des zu vereinzelnden Substrats 202 vorliegt.Furthermore, the position-determining device 220 is assigned a sensor element 224. This sensor element 224 has the task of detecting whether there is a planar contact of the substrate 202 to be separated on the pressure element 222 and / or on the pressure pins 223.

Eine besondere Ausbildung dieses Sensorelements 224 ist in den Fig. 2 und 3 dargestellt. Dieses Sensorelement 224 tastet mechanisch das Vorhandensein des zu vereinzelnden Substrats 202 ab. Hierfür sind unterschiedliche Stellungen vorgesehen, die über einen Näherungsschalter 229 detektiert werden. Das Sensorelement 224 weist eine kniehebelartige Ausbildung auf, wobei diese an einem Gelenk 225 schwenkbar in und gegen die Pfeilrichtung 226 gelagert ist. Das eine freie Ende 227 dient zur Auflage an der Oberfläche des zu detektierenden Substrats 202. Das andere Ende 228 ist zur Anordnung im Bereich des Näherungsschalters 229 vorgesehen. Die Grundstellung des Sensorelements 224 wird dann eingenommen, wenn an dem freien Ende 227 kein Substrat 202 detektiert wird. Das freie Ende 227 steht über eine gedachte Linie zwischen den freien Enden der Andruckstifte 223, und das andere freie Ende 228 ist derart gestaltet, dass der Abstand des freien Endes 228 zum Näherungsschalter nahezu Null ist. Sobald das freie Ende 227 Druck erfährt, verschwenkt das Sensorelement 224, und der Abstand des freien Endes 228 zum Näherungsschalter vergrößert sich. Hat dieser eine zuvor kalibrierte Stellung eingenommen, kann selbsttätig festgestellt werden, ob an den freien Enden der Andruckstifte 223 ein Substrat 202 anliegt. Ohne Druck an dem freien Ende 227 geht das Sensorelement 224 wieder in seine Grundstellung über. In alternativen, nicht näher erläuterten Ausführungsformen des Sensorelementes 224 kann die Detektion des Vorhandenseins des Substrates und seiner Position auch mittels anderer, geeigneter Vorrichtungen, wie mittels z.B. optischer oder akustischer Näherungsschalter, erfolgen, wobei ggf. auf die mechanische Weiterleitung der Berührungsinformation mittels Kniehebel und Gelenk 225 verzichtet werden kann.A particular embodiment of this sensor element 224 is in the Fig. 2 and 3 shown. This sensor element 224 mechanically scans the presence of the substrate 202 to be singulated. For this purpose, different positions are provided, the be detected via a proximity switch 229. The sensor element 224 has a knee-lever-like design, wherein this is mounted on a hinge 225 pivotally in and against the arrow 226 direction. The one free end 227 serves to rest on the surface of the substrate 202 to be detected. The other end 228 is provided for arrangement in the region of the proximity switch 229. The basic position of the sensor element 224 is assumed when no substrate 202 is detected at the free end 227. The free end 227 is an imaginary line between the free ends of the pressure pins 223, and the other free end 228 is configured such that the distance of the free end 228 to the proximity switch is almost zero. As soon as the free end 227 experiences pressure, the sensor element 224 pivots, and the distance between the free end 228 and the proximity switch increases. If the latter has assumed a previously calibrated position, it can be determined automatically whether a substrate 202 rests against the free ends of the pressure pins 223. Without pressure at the free end 227, the sensor element 224 returns to its normal position. In alternative, unspecified embodiments of the sensor element 224, the detection of the presence of the substrate and its position by other suitable devices, such as by means of optical or acoustic proximity switches, where appropriate, on the mechanical transmission of the touch information by toggle and joint 225 can be waived.

Das Andruckelement 222 ist vorzugsweise in einem Winkel zur Handhabungseinrichtung 221 angeordnet, der dem Neigungswinkel α entspricht. So weisen die einzelnen Andruckstifte 223 vorzugsweise dieselbe Länge auf.The pressure element 222 is preferably arranged at an angle to the handling device 221, which corresponds to the inclination angle α. Thus, the individual pressure pins 223 preferably have the same length.

Alternativ hierzu kann vorgesehen sein, dass das Andruckelement 222 senkrecht zur Handhabungseinrichtung 221 angeordnet ist, und die Andruckstifte 223 unterschiedliche Längen aufweisen, so dass in der dargestellten Position immer die freien Enden der Andruckstifte 223 die Oberfläche des Substrats 202 berühren.Alternatively, it can be provided that the pressure element 222 is arranged perpendicular to the handling device 221, and the pressure pins 223 have different lengths, so that always touch the free ends of the pressure pins 223, the surface of the substrate 202 in the position shown.

Die Funktionsweise der Lagebestimmungseinrichtung 220 ist derart, dass der Substratstapel 203 in Vorschubrichtung 205 gefahren wird, und zwar soweit, bis die Oberfläche des zu vereinzelnden Substrats 202 die freien Enden der Andruckstifte 223 der Andruckeinrichtung 222 kontaktiert. Bei lage- und positionsgerechter Ausrichtung des zu vereinzelnden Substrats 202 wird das Sensorelement 224 in eine der Pfeilrichtungen 226 bewegt, und der Näherungsschalter 229 detektiert die korrekte Lage.The mode of operation of the position-determining device 220 is such that the substrate stack 203 is moved in the feed direction 205 until the surface of the substrate 202 to be separated contacts the free ends of the pressure pins 223 of the pressure device 222. If the substrate 202 to be separated is aligned in position and position, the sensor element 224 is moved in one of the arrow directions 226, and the proximity switch 229 detects the correct position.

Ist die Lage des zu vereinzelnden Substrats 202 positionsgerecht, so kann die Entnahmeeinrichtung 207 in den von den Andruckstiften 223 gebildeten Zwischenraum eintauchen und das zu vereinzelnde Substrat 202 aufnehmen.If the position of the substrate 202 to be separated is correct, the removal device 207 can dip into the intermediate space formed by the pressure pins 223 and receive the substrate 202 to be singulated.

Im nachfolgenden werden die einzelnen Verfahrensschritte anhand der Fig. 4 bis 9 näher erläutert.In the following, the individual process steps are based on the Fig. 4 to 9 explained in more detail.

In Fig. 4 A und B ist die sogenannte Beladesituation der erfindungsgemäßen Vorrichtung 201 dargestellt. Die Trägereinrichtung 204 ist zur Aufnahme eines noch nicht näher dargestellten Substratstapels bereit.In Fig. 4 A and B the so-called loading situation of the device 201 according to the invention is shown. The carrier device 204 is ready for receiving a substrate stack not shown in detail.

Durch entsprechende Mittel ist bereits der gewünschte Neigungswinkel α des Substratstapels vorgegeben. Die Entnahmeeinrichtung 207 und die Lagebestimmungseinrichtung 220 befinden sich in ihrer Ausgangssituation und können in Pfeilrichtung 210 bzw. Pfeilrichtung 230 verfahren werden. Das Sensorelement 224, das an dem Andruckelement 222 angeordnet ist, ist ebenfalls in seiner Ausgangsstellung und detektiert kein an den Andruckstiften 223 anliegendes Substrat.By appropriate means, the desired inclination angle α of the substrate stack is already predetermined. The removal device 207 and the position determination device 220 are in their initial situation and can be moved in the direction of the arrow 210 or the direction of the arrow 230. The sensor element 224 disposed on the pressing member 222 is also in FIG its initial position and detects no voltage applied to the pressure pins 223 substrate.

Der Greifer 208 der Entnahmeeinrichtung 207 befindet sich ebenfalls in einer Ausgangssituation, so dass er zwischen die Andruckstifte 223 des Andruckelements 222 eintauchen kann.The gripper 208 of the removal device 207 is also in an initial situation, so that it can dive between the pressure pins 223 of the pressure element 222.

Die Transporteinrichtung 213 ist für die Aufnahme von Substraten bereit. Die Strömungsdüsen 218 der Strömungseinrichtung 217 sind noch ausgeschaltet.The transport device 213 is ready to receive substrates. The flow nozzles 218 of the flow device 217 are still switched off.

Fig. 5 A und B zeigen, dass die Trägereinrichtung 204 nun durch den Substratstapel 203 beladen ist. Diese Trägereinrichtung 204 bzw. der Substratstapel 203 wird in Vorschubrichtung 205 verfahren und zwar soweit, bis die durch Bewegung in Pfeilrichtung 230 positionierte Lagebestimmungseinrichtung 220 eine definierte Position eingenommen hat. In dieser Position berühren das Andruckelement 222 bzw. dessen Andruckstifte 223 die Oberfläche des zu vereinzelnden Substrats 202. Fig. 5 A and B show that the carrier 204 is now loaded by the substrate stack 203. This carrier device 204 or the substrate stack 203 is moved in the advancing direction 205, namely until the position determining device 220 positioned by movement in the direction of the arrow 230 has assumed a defined position. In this position, the pressure element 222 or its pressure pins 223 touch the surface of the substrate 202 to be separated.

Um eine bestimmte lage- und formgerechte Ausrichtung der Substrate 202 zu bewirken, führen die Strömungsdüsen 218 der Strömungseinrichtung 217 Fluid auf den Substratstapel 203, so dass zumindest ein Teil des Substratstapels 203 auffächert und spaltartige Zwischenräume 219 entstehen. Aufgrund des Andrückens des Andruckelements 222 wird verhindert, dass die einzelnen Substrate 202 weiter auffächern. Es wird dadurch auch erreicht, dass die Substrate 202 auf der Trägereinrichtung 204 verbleiben. Sofern durch das Auffächern die entsprechende Position des zu vereinzelnden Substrats 202 erreicht ist, wird durch die Sensoreinheit 224 die exakte Lage detektiert. Ist diese nicht erreicht, so verfährt entweder die Lagebestimmungseinrichtung 220 weiter in Pfeilrichtung 230, und/oder es wird weiter bewirkt, dass der Substratstapel 203 weiter aufgefächert wird. Erreichen beide Maßnahmen nicht, dass die Sensoreinheit 224 ein entsprechendes Signal zur Freigabe der Entnahmeeinrichtung 207 ausgibt, so wird eine Störungsmeldung signalisiert.In order to effect a specific positional and conformal alignment of the substrates 202, the flow nozzles 218 of the flow device 217 guide fluid onto the substrate stack 203, so that at least part of the substrate stack 203 fancles and gap-like intermediate spaces 219 arise. Due to the pressing of the pressure element 222 prevents the individual substrates 202 fanned on. It is thereby also achieved that the substrates 202 remain on the carrier device 204. If the corresponding position of the substrate 202 to be separated 202 is reached by fanning, the exact position is detected by the sensor unit 224. If this is not achieved, then either the position-determining device 220 proceeds further in the direction of arrow 230, and / or it is further effected that the substrate stack 203 is further fanned out. Both measures do not reach that the sensor unit 224 outputs a corresponding signal for releasing the removal device 207, a fault message is signaled.

In Fig. 6 A und B strömen die Strömungsdüsen 218 weiter Fluid in den Zwischenraum 219, um insbesondere zu erreichen, dass in den Zwischenräumen 219 ein sogenanntes Fluidkissen entsteht. Dieses Fluidkissen dient dazu, eine entsprechende Dämpfungswirkung zwischen den einzelnen Substraten zu erreichen. Nun erfolgt die Freigabe aufgrund der lagegerechten Position der Substrate 202, da das Sensorelement 224 derart verschwenkt ist, dass der Näherungsschalter 229 betätigt worden ist.In Fig. 6 A and B The flow nozzles 218 continue to flow fluid into the gap 219 to, in particular, to achieve a so-called fluid cushion in the spaces 219. This fluid cushion serves to achieve a corresponding damping effect between the individual substrates. Now, the release takes place due to the positional position of the substrates 202, since the sensor element 224 is pivoted such that the proximity switch 229 has been actuated.

Die Entnahmeeinrichtung 207 bewegt sich nun in Pfeilrichtung 210 derart, dass der Greifer 208 zwischen den Andruckstiften 223 des Andruckelements 222 der Lagebestimmungseinrichtung 220 hindurchtaucht und in den Bereich der Anlage der Oberfläche des zu vereinzelnden Substrats 202 gelangt. Durch Verschwenken der Entnahmeeinrichtung 207 in Pfeilrichtung 211 wird eine Anlage des Greifers 208 an die Oberfläche des Substrats 202 bewirkt. Durch auftretende Adhäsionskräfte, die insbesondere dadurch verstärkt werden, dass zwischen dem Greifer 208 und der Oberfläche des zu vereinzelnden Substrats 202 ein Unterdruck ausgebildet wird, kann das Substrat entgegen der Pfeilrichtung 210 wie in Fig. 7 A und B dargestellt entnommen werden. Alternativ oder zusätzlich ist vorgesehen, den Greifer in Pfeilrichtung 212 (Fig. 7 A) zu verschwenken, bis eine flächige Anlage an der Oberfläche des Substrats 202 erfolgt. Dadurch ist das zu vereinzelnde Substrat freigegeben und kann, wie in Fig. 7 A und B dargestellt, in Pfeilrichtung 210 entnommen werden, um es anschließend auf der Transporteinrichtung 213 abzulegen.The removal device 207 now moves in the direction of arrow 210 in such a way that the gripper 208 dips between the pressure pins 223 of the pressure element 222 of the position-determining device 220 and reaches the region of contact of the surface of the substrate 202 to be separated. By pivoting the removal device 207 in the direction of arrow 211, an abutment of the gripper 208 is effected on the surface of the substrate 202. By occurring adhesion forces, which are reinforced in particular by the fact that between the gripper 208 and the surface of the substrate 202 to be separated a negative pressure is formed, the substrate can be against the direction of the arrow 210 as in Fig. 7 A and B shown removed. Alternatively or additionally, it is provided that the gripper in the direction of arrow 212 ( Fig. 7 A ) to pivot until a flat contact with the surface of the substrate 202 takes place. As a result, the substrate to be separated is released and can, as in Fig. 7 A and B shown, are taken in the direction of arrow 210 to then store it on the conveyor 213.

Um jedoch zu verhindern, dass die Oberfläche des zu vereinzelnden Substrats 202 beschädigt wird, wird, wie in Fig. 7 A und B dargestellt, entweder das Andruckelement 222 ein Stück zurückgefahren, oder die Trägereinrichtung 204 bzw. der Substratstapel 203 fährt gegen die Vorschubrichtung 205 ein Stück zurück. Das Sensorelement 224 verschwenkt wieder in seine Ausgangslage und der Näherungsschalter detektiert, dass das zu vereinzelnde Substrat 202 nicht mehr an den Andruckstiften 223 anliegt.However, in order to prevent the surface of the substrate 202 to be separated from being damaged, as shown in FIG Fig. 7 A and B shown, either the pressure element 222 a piece moved back, or the support means 204 and the substrate stack 203 moves against the feed direction 205 a piece back. The sensor element 224 pivots back into its initial position and the proximity switch detects that the substrate 202 to be separated no longer abuts against the pressure pins 223.

In der Zeitspanne (Fig. 8 A und B), in der die Entnahmeeinrichtung 207 bzw. ihr Greifer 208 in Pfeilrichtung 212 verschwenkt, um das zu vereinzelnde Substrat 202 auf der Transportvorrichtung 213 bzw. auf ihr Transportband 214 abzulegen, verfährt die Trägereinrichtung 204 bzw. der Substratstapel 203 wiederum in Vorschubrichtung 205 gegen die Lagebestimmungseinrichtung 220, bis wieder eine Anlage des zu vereinzelnden Substrats 202 an dem Andruckelement 222 bzw. an seinen Andruckstiften 223 erfolgt.In the period ( Fig. 8A and B ), in which the removal device 207 or its gripper 208 is pivoted in the direction of arrow 212 in order to deposit the substrate 202 to be separated on the transport device 213 or on its conveyor belt 214, the carrier device 204 or the substrate stack 203 again moves in the direction of advance 205 against the Orientation device 220, until again a plant of the substrate 202 to be separated takes place on the pressure element 222 and on its Andruckstiften 223.

Die Ablage des Substrats 202 durch die Entnahmeeinrichtung 207 ist in den Fig. 9 A und B dargestellt. Das Substrat 202 wird auf dem Transportband 214 der Transportvorrichtung 213 abgelegt und durch einen Antrieb an der Achse 215 in Pfeilrichtung 216 wegtransportiert.The storage of the substrate 202 by the removal device 207 is in the Fig. 9A and B shown. The substrate 202 is deposited on the conveyor belt 214 of the transport device 213 and transported away by a drive on the axis 215 in the direction of arrow 216.

Entweder während dieses Prozesses oder darauffolgend wird durch die Strömungseinrichtung 217 bzw. ihren Strömungsdüsen 218 wiederum Fluid in die Zwischenräume 219 des Substratstapels 203 geführt, so dass eine entsprechende Auffächerung stattfindet, und zwar soweit, bis das zu vereinzelnde Substrat 202 wiederum zur Anlage an die Andruckstifte 223 des Andruckelements 222 der Lagebestimmungseinrichtung 220 gelangt. Dabei erzeugt die Sensoreinheit 224 das Signal zur Freigabe der Abholung des zu vereinzelnden Substrats 202 durch die Entnahmeeinrichtung 207.Either during this process or subsequently, fluid is again conducted through the flow device 217 or its flow nozzles 218 into the interspaces 219 of the substrate stack 203, so that a corresponding fanning takes place, namely, until the substrate 202 to be separated again in contact with the pressure pins 223 of the pressure element 222 of the orientation device 220 passes. In this case, the sensor unit 224 generates the signal for enabling the picking up of the substrate 202 to be separated by the removal device 207.

Auf diese Weise wird der entsprechende Prozess wiederholt, so oft es nötig ist.In this way, the corresponding process is repeated as often as necessary.

Sobald kein Substrat 202 mehr im Substratstapel 203 vorhanden ist, wird das Fehlen von Substraten 202 durch das Andruckelement 222 bzw. das Sensorelement 224 detektiert, und eine entsprechende Fehlermeldung wird ausgegeben.As soon as no substrate 202 is present in the substrate stack 203, the absence of substrates 202 is detected by the pressure element 222 or the sensor element 224, and a corresponding error message is output.

Die Adhäsionskräfte, die beim Ansaugen des zu vereinzelnden Substrats 202 entstehen, sind derart bemessen, dass diese gerade ausreichen, das durch den Greifer 208 aufgenommene Substrat 202 innerhalb des Fluids zu transportieren.The adhesion forces that are created when aspirating the substrate 202 to be separated are dimensioned such that they are just sufficient to transport the substrate 202 accommodated by the gripper 208 within the fluid.

Die vorliegende Erfindung wurde im Hinblick auf die Behandlung von Siliziumwafern dargelegt. Selbstverständlich können auch scheibenförmige Substrate aus anderen Materialien wie z.B. Kunststoff erfindungsgemäß bearbeitet werden.The present invention has been presented with regard to the treatment of silicon wafers. Of course, disc-shaped substrates of other materials such as plastic can be processed according to the invention.

BezugszeichenlisteLIST OF REFERENCE NUMBERS

101101 201201 Vorrichtungcontraption 102102 202202 Substratsubstratum 103103 203203 Substratstapelsubstrate stack 104104 204204 Trägereinrichtungsupport means 105105 205205 Vorschubrichtungfeed direction 206206 Bohrungendrilling 107107 207207 Entnahmeeinrichtungremoval device 108108 208208 Greifergrab 209209 Handhabungseinrichtunghandling device 110110 210210 Pfeilrichtungarrow 211211 Pfeilrichtungarrow 112112 212212 Pfeilrichtungarrow 113113 213213 Transporteinrichtungtransport means 114114 214214 Förderbandconveyor belt 115115 215215 Achseaxis 116116 216216 Pfeilrichtungarrow 117117 217217 Strömungseinrichtungflow device 118118 218218 Strömungsdüsenflow nozzles 119119 219219 Zwischenraumgap 220220 LagebestimmungseinrichtungPosition detection device 221221 weitere Handhabungseinrichtungfurther handling device 122122 222222 Andruckelementpresser 123123 223223 Andruckstiftepressing pins 224224 Sensorelementsensor element 225225 Gelenkjoint 226226 Pfeilarrow 227227 freies Endefree end 228228 anderes freies Endeanother free end 229229 Näherungsschalterproximity switch 230230 Pfeilrichtungarrow αα αα Neigungswinkeltilt angle

Claims (17)

  1. Apparatus for the separation and transportation of disc shaped substrates, wherein the apparatus comprises the following assembly groups:
    - a carrying device (104; 204) arranged within a fluid, in which the individual substrates (102; 202), in feed direction (105; 205), are sequentially arranged standing one after another in the form of a substrate stack (103; 203),
    - an unloading device (107; 207) for the separation and transportation of at least one substrate (102; 202), wherein the unloading device (107; 207) comprises a gripper (108; 208) with means by the aid of which the substrate (102; 202) can be taken up and guided away from the carrying device (104; 204),
    - a flow device (117; 217) for fanning of at least a part of the substrate stack (103; 203), and
    - a pressing element (122; 222) that acts against the fanned substrates (102; 202).
  2. Apparatus according to claim 1, characterized in that the pressing element (122; 222) comprises a plurality of pressing pins (123; 223) that press against the surface of the substrate to be separated (102; 202).
  3. Apparatus according to claim 1 or 2, characterized in that a position detection device (220) is provided for the detection of the position and/or location of at least the substrate to be separated (202).
  4. Apparatus according to claim 1, characterized in that the gripper (108; 208) is designed such that the removal of the substrate to be separated (102; 202) takes place perpendicular or at least approximately vertical to the feed direction (105; 205).
  5. Apparatus according to claim 4, characterized in that the removal takes place in parallel to the surface plane of the substrate to be separated (102; 202).
  6. Apparatus according to claim 1 or 4, characterized in that the gripper (108; 208) has openings, through which fluid can be suctioned or emitted.
  7. Apparatus according to claim 1 or claim 4, characterized in that the gripper (108; 208), in a top view, is formed bar shaped, o-shaped, u-shaped, v-shaped, or has a flat shape.
  8. Apparatus according to claim 1, characterized in that the carrying device (104; 204) has means through which the substrates to be separated (102; 202) can be oriented along a tilt angle α.
  9. Apparatus according to claim 8, characterized in that the tilt angle α is chosen in such a manner that the angle between the feed direction (105; 205) and that surface normal of the substrate surface of the individual substrates (102; 202) that points more in the feed direction is positive, being equivalent with a backward inclination of the substrates.
  10. Apparatus according to claim 1, characterized in that the carrying device (104; 204) is movable in at least one direction.
  11. Apparatus according to claim 10, characterized in that the carrying device (104; 204) and/or the substrate stack (103; 203) is/are movable against the pressing element (122; 222).
  12. Apparatus according to claim 10, characterized in that the carrying device (204) and/or the substrate stack (203) is/are movable against the position detection device (220).
  13. Apparatus according to one of the preceding claims, characterized in that it further comprises a transporting device (113; 213) that is arranged above the substrate stack (103; 203) with the substrates to be separated (102; 202).
  14. Apparatus according to claim 3, characterized in that the position detection device (220) comprises a sensor (222) for checking of contact of a substrate (202).
  15. Apparatus according to claim 2, characterized in that the pressing element (122; 222) is arranged in such a manner that the gripper (108; 208) can be positioned between its pressing pins (123; 223).
  16. Method for the fanning, separation and transportation of disc shaped substrates using an apparatus comprising the following assembly groups:
    - a carrying device (104; 204) arranged within a fluid, in which the individual substrates (102; 202), in feed direction (105; 205), are sequentially arranged standing one after another in the form of a substrate stack (103; 203),
    - an unloading device (107; 207) for the separation and transportation of at least one substrate (102; 202), wherein the unloading device (107; 207) comprises a gripper (108; 208) with means by the aid of which the substrate (102; 202) can be taken up and guided away from the carrying device (104; 204),
    - a flow device (117; 217) for fanning of at least a part of the substrate stack (103; 203), and
    - a pressing element (122; 222) that acts against the fanned substrates (102; 202)
    , wherein the method comprises the following steps:
    a. moving of the carrying device (104; 204) together with the substrate stack (103; 203), or of the substrate stack (103; 203), respectively, in feed direction (105; 205) against the pressing element (123; 223) to achieve an unloading position for the substrate to be separated (102; 202),
    b. fanning of at least a region of the substrate stack (103; 203) by a flow device (117; 217) in such a manner that interspaces (119; 219) develop;
    c. separating of the substrate by
    - positioning of the gripper (108; 208) almost parallel to the planar design of the substrate (102; 202),
    - establishment of an adhesive contact between substrate (102; 202) and gripper (108; 208), and
    - removing of the substrate (102; 202) within the fluid perpendicular to the feed direction (105, 205), or parallel to the planar design of the substrates (102; 202), respectively.
  17. Method according to claim 16, characterized in that interspaces (119; 219) are developed within the substrate stack (103; 203) due to the fanning by the flow device (117; 217), and that fluid cushions develop in the interspaces (119; 219) due to the fluid stream of the flow device (117; 217), exerting a damping effect on the substrate to be separated (102; 202) upon contacting of the gripper (108; 208).
EP06026054A 2006-07-06 2006-12-15 Device and method for the separation and the transport of substrates Not-in-force EP1935599B1 (en)

Priority Applications (14)

Application Number Priority Date Filing Date Title
ES06026054T ES2313535T3 (en) 2006-12-15 2006-12-15 DEVICE AND PROCEDURE TO INDIVIDUALIZE AND TRANSPORT SUBSTRATES.
EP06026054A EP1935599B1 (en) 2006-12-15 2006-12-15 Device and method for the separation and the transport of substrates
DE502006001352T DE502006001352D1 (en) 2006-12-15 2006-12-15 Device and method for separating and transporting substrates
AT06026054T ATE404341T1 (en) 2006-12-15 2006-12-15 DEVICE AND METHOD FOR SEPARATING AND TRANSPORTING SUBSTRATES
PL06026054T PL1935599T3 (en) 2006-12-15 2006-12-15 Device and method for the separation and the transport of substrates
CN2007800011343A CN101356047B (en) 2006-07-06 2007-07-05 Apparatus and method for separating and transporting substrates
KR1020087004916A KR100992108B1 (en) 2006-07-06 2007-07-05 Apparatus and method for the fanning, separation and transportation of disc shaped substrates
US12/064,451 US20080213079A1 (en) 2006-07-06 2007-07-05 Apparatus and Method for Separating and Transporting Substrates
RU2008115260/11A RU2380305C2 (en) 2006-07-06 2007-07-05 Device and method to separate and transfer substrates
PCT/EP2007/005968 WO2008003502A1 (en) 2006-07-06 2007-07-05 Apparatus and method for separating and transporting substrates
JP2008532810A JP5006880B2 (en) 2006-07-06 2007-07-05 Apparatus and method for separating and conveying substrates
TW096148137A TW200842014A (en) 2006-12-15 2007-12-14 Apparatus and method for separating and transporting substrates
NO20080795A NO20080795L (en) 2006-07-06 2008-02-13 Apparatus and method for separating and transporting a substrate
MYPI20080302A MY142778A (en) 2006-07-06 2008-02-18 Device and method for the separation and the transport of substrates

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EP06026054A EP1935599B1 (en) 2006-12-15 2006-12-15 Device and method for the separation and the transport of substrates

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EP1935599A1 EP1935599A1 (en) 2008-06-25
EP1935599B1 true EP1935599B1 (en) 2008-08-13

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DE (1) DE502006001352D1 (en)
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CN101652849B (en) 2006-12-19 2011-09-14 Rec斯坎沃佛股份有限公司 Method and device for separation of silicon wafers
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TW200842014A (en) 2008-11-01
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DE502006001352D1 (en) 2008-09-25

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