EP1902161B1 - Elektrodenanordnung und verfahren zum elektrochemischen beschichten einer werkstückoberfläche - Google Patents

Elektrodenanordnung und verfahren zum elektrochemischen beschichten einer werkstückoberfläche Download PDF

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Publication number
EP1902161B1
EP1902161B1 EP06777644A EP06777644A EP1902161B1 EP 1902161 B1 EP1902161 B1 EP 1902161B1 EP 06777644 A EP06777644 A EP 06777644A EP 06777644 A EP06777644 A EP 06777644A EP 1902161 B1 EP1902161 B1 EP 1902161B1
Authority
EP
European Patent Office
Prior art keywords
coating
workpiece
electrodes
jet
tubular elements
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Not-in-force
Application number
EP06777644A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP1902161A1 (de
Inventor
Jens Dahl Jensen
Ursus KRÜGER
Uwe Pyritz
Manuela Schneider
Gabriele Winkler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Publication of EP1902161A1 publication Critical patent/EP1902161A1/de
Application granted granted Critical
Publication of EP1902161B1 publication Critical patent/EP1902161B1/de
Not-in-force legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode

Definitions

  • the configuration of the process electrodes as tubular elements and the channels arranged therein make it possible to target a process medium, such as micro- or nanoscale particles or a mixture of a chemical treatment solution and micro- or nanoscale particles dispersed therein, as a jet medium in the form of a jet between the process electrodes and the working electrode as the workpiece. In this way, an effective use of the micro- or nanoscale particles can take place during coating.
  • a process medium such as micro- or nanoscale particles or a mixture of a chemical treatment solution and micro- or nanoscale particles dispersed therein
  • the number of micro- or nanoscale particles present in the region between the counter electrode arrangement 9 and the workpiece 1 can be purposefully increased or reduced. In this way, the incorporation density of the particles in the coating can be specifically increased and reduced.
  • the pressure conditions in the distribution tank 17 can be adjusted for example via the pressure in the inflow 19. Both continuous pressures and pulsating pressures are possible. Controlling the pressure here may include both the pressure amplitude and the frequency at pulsating pressures.
  • Coatings with layers which differ from one another due to the incorporation density of the particles can be produced by continuously changing the pressure conditions in the distribution tank 17. It should be noted at this point that the method according to the invention can also be used to produce multi-layer systems which differ from one another by the nature of the particles and have a graded or abrupt change in the density of the incorporated particles. This is possible since the type of particles introduced into the distribution tank 17 and the pressure in the distribution tank 17 can be controlled independently of each other.
  • the counter electrode arrangement 9 comprises a plurality of tubular elements 11a to 11e, which form tubular process electrodes 12a to 12e.
  • the process electrodes 12a to 12e are connected via an in Fig. 2 not shown line with the pole of a voltage source connectable. All process electrodes 12a to 12e are connected at one end to the distribution tank 17 in such a way that a process medium, for example an electrolyte with dispersed micro- or nanoscale particles, passes through the channels 13 in the interior of the process electrodes 12a to 12e (cf. Fig. 1 ) can flow to the outlet openings 14a to 14e.
  • a process medium for example an electrolyte with dispersed micro- or nanoscale particles
  • the electrode arrangement 9 according to the invention can be adapted particularly well to the geometry of the workpiece 1 in the described manner, without the need to specially manufacture a specially shaped electrode for this purpose. Due to the same distance of the various openings 14a to 14e of the process electrodes 12a to 12e from the workpiece 1, a uniform distribution of the micro- or nanoscale particles irradiated in the direction of the surface in the coating can be achieved.
  • the carrier 129 comprises a first, the distribution tank 17 facing support plate 131 and a second, the distribution tank 17 applied support plate 133. Both support plates have openings whose size is chosen so that between the edges of the openings and through the support plates 131, 133rd passed through process electrodes 11a to 11e remains a game that allows axial displacement of the process electrodes 12a to 12e relative to the carrier 129.
  • adjustment plates 134, 136, 138 which likewise have openings which are dimensioned such that the process electrodes 12a to 12e are passed through them with play.
  • the Justageplatten 134, 136, 138 therefore do not hinder axial displacement of the process electrodes 12a to 12e in a first state.
  • the possible axial displacement of the process electrodes 12a to 12e is limited only by flange-like projections 135, 137, 139 in the region of the process electrodes 12a to 12e which is located inside the carrier 129.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Electroplating Methods And Accessories (AREA)
EP06777644A 2005-07-12 2006-07-07 Elektrodenanordnung und verfahren zum elektrochemischen beschichten einer werkstückoberfläche Not-in-force EP1902161B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102005033857A DE102005033857A1 (de) 2005-07-12 2005-07-12 Elektrodenanordnung und Verfahren zum elektrochemischen Beschichten einer Werkstückoberfläche
PCT/EP2006/064014 WO2007006752A1 (de) 2005-07-12 2006-07-07 Elektrodenanordnung und verfahren zum elektrochemischen beschichten einer werkstückoberfläche

Publications (2)

Publication Number Publication Date
EP1902161A1 EP1902161A1 (de) 2008-03-26
EP1902161B1 true EP1902161B1 (de) 2012-08-29

Family

ID=36968928

Family Applications (1)

Application Number Title Priority Date Filing Date
EP06777644A Not-in-force EP1902161B1 (de) 2005-07-12 2006-07-07 Elektrodenanordnung und verfahren zum elektrochemischen beschichten einer werkstückoberfläche

Country Status (7)

Country Link
US (1) US8747638B2 (zh)
EP (1) EP1902161B1 (zh)
JP (1) JP2009501276A (zh)
CN (1) CN101223304A (zh)
DE (1) DE102005033857A1 (zh)
DK (1) DK1902161T3 (zh)
WO (1) WO2007006752A1 (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070275262A1 (en) * 2006-05-23 2007-11-29 Dechao Lin Reducing formation of tin whiskers on a tin plating layer
CN101717977B (zh) * 2009-12-08 2011-09-14 淮海工学院 高硬度Cu-SiC纳米复合镀层的制备方法及其专用设备
CN102787332B (zh) * 2012-08-17 2014-12-24 湖北联合天诚防伪技术股份有限公司 一种喷银板贴板电铸的方法
WO2017110765A1 (ja) * 2015-12-25 2017-06-29 株式会社山本鍍金試験器 めっき装置
CN105970260B (zh) * 2016-04-25 2019-05-03 江苏师范大学 一种在喷射电沉积加工过程中改善均匀性的方法
CN106868572B (zh) * 2017-04-25 2019-07-09 广东工业大学 一种电泳辅助微纳颗粒熔融自组装表面改性设备

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
LU67358A1 (zh) 1973-04-04 1974-05-09
US4027366A (en) 1973-08-02 1977-06-07 Beatrice Foods Co. Multilayer coated substrate
US4826508A (en) * 1986-09-15 1989-05-02 Diabrasive International, Ltd. Flexible abrasive coated article and method of making it
DE59301228D1 (de) 1992-03-06 1996-02-08 Frei Siegfried Verfahren und Vorrichtung zur Überwachung des Sprühstromes in einer Pulverbeschichtungsanlage
US5865976A (en) * 1994-10-07 1999-02-02 Toyoda Gosei Co., Inc. Plating method
JP3391113B2 (ja) 1994-10-07 2003-03-31 豊田合成株式会社 複合めっき方法
DE19521323A1 (de) * 1995-06-12 1996-12-19 Abb Management Ag Teil mit einer galvanisch aufgebrachten Beschichtung und Verfahren zur Herstellung von galvanischen Schichten
DE19702366C2 (de) * 1996-01-24 2002-10-31 Toyoda Gosei Kk Beschichtungsverfahren
US6221230B1 (en) 1997-05-15 2001-04-24 Hiromitsu Takeuchi Plating method and apparatus
US6352636B1 (en) * 1999-10-18 2002-03-05 General Electric Company Electrochemical system and process for stripping metallic coatings
DE10250471B3 (de) 2002-10-30 2004-04-01 Lindal Ventil Gmbh Anlage zur Antikorrosionsbehandlung von Ventiltellern für Spenderbehälter
US20040084318A1 (en) * 2002-11-05 2004-05-06 Uri Cohen Methods and apparatus for activating openings and for jets plating

Also Published As

Publication number Publication date
JP2009501276A (ja) 2009-01-15
DE102005033857A1 (de) 2007-01-18
EP1902161A1 (de) 2008-03-26
US20080202936A1 (en) 2008-08-28
CN101223304A (zh) 2008-07-16
WO2007006752A1 (de) 2007-01-18
DK1902161T3 (da) 2012-10-15
US8747638B2 (en) 2014-06-10

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