EP1595668B1 - Brittle material substrate scribing device and scribing method, and automatic analysis line - Google Patents
Brittle material substrate scribing device and scribing method, and automatic analysis line Download PDFInfo
- Publication number
- EP1595668B1 EP1595668B1 EP04700788A EP04700788A EP1595668B1 EP 1595668 B1 EP1595668 B1 EP 1595668B1 EP 04700788 A EP04700788 A EP 04700788A EP 04700788 A EP04700788 A EP 04700788A EP 1595668 B1 EP1595668 B1 EP 1595668B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- light
- glass substrate
- blind crack
- brittle material
- material substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- 239000000758 substrate Substances 0.000 title claims abstract description 156
- 239000000463 material Substances 0.000 title claims description 29
- 238000000034 method Methods 0.000 title claims description 17
- 238000001514 detection method Methods 0.000 claims abstract description 25
- 239000013307 optical fiber Substances 0.000 claims abstract description 25
- 230000015572 biosynthetic process Effects 0.000 claims description 12
- 230000010287 polarization Effects 0.000 claims 4
- 239000011521 glass Substances 0.000 abstract description 130
- 238000001816 cooling Methods 0.000 abstract description 24
- 238000010438 heat treatment Methods 0.000 abstract description 6
- 230000003287 optical effect Effects 0.000 description 13
- 239000013256 coordination polymer Substances 0.000 description 12
- 239000002826 coolant Substances 0.000 description 7
- 239000000498 cooling water Substances 0.000 description 6
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 6
- 230000006835 compression Effects 0.000 description 5
- 238000007906 compression Methods 0.000 description 5
- 230000002950 deficient Effects 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 230000010355 oscillation Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000005856 abnormality Effects 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/09—Severing cooled glass by thermal shock
- C03B33/091—Severing cooled glass by thermal shock using at least one focussed radiation beam, e.g. laser beam
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
- B23K26/402—Removing material taking account of the properties of the material involved involving non-metallic material, e.g. isolators
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0005—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
- B28D5/0011—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing with preliminary treatment, e.g. weakening by scoring
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
Definitions
- the present invention relates to a scribing device according to the preamble of claim 1 and a scribing method according to the preamble of claim 2 which are used upon forming a scribe line on a brittle material such as a glass substrate to be used for a flat panel display (hereinafter, referred to as FPD) or a semiconductor wafer, and also relates to an automated breaking line using the device.
- FPD flat panel display
- semiconductor wafer also relates to an automated breaking line using the device.
- Such a scribing device and such a scribing method are known from JP 2001130921 A .
- An FPD formed of a pair of glass substrates bonded to one another is produced by mutually bonding two large-sized mother glasses and then breaking the glasses into a predetermined size.
- a scribe step having a scribing device scribe lines are previously formed with a cutter on the respective mother glasses, and the mother glasses with the scribe lines formed thereon are conveyed to a break step where vertical cracks immediately under the scribe lines are penetrated (broken) in a thickness direction of the mother glasses.
- the step of breaking a mother substrate is constituted of the scribe step and the break step provided after the scribe step.
- a method of using a laser beam for formation of a scribe line has come into practical use in the scribe step, as disclosed in Japanese Patent No. 3027768 .
- a glass substrate 111 is irradiated with a laser beam from a laser oscillation device 112.
- the laser beam emitted from the laser oscillation device 112 forms an elliptical laser spot LS on the glass substrate 111 along a line to be scribed.
- the glass substrate 111 and the laser beam emitted from the laser oscillation device 112 are relatively shifted along a longitudinal direction of the laser spot.
- a cooling medium such as cooling water
- a cooling nozzle 113 is sprayed from a cooling nozzle 113 in the vicinity of the laser-beam irradiation region on a surface of the glass substrate 111, so as to form a scribe line.
- compression stress generates due to heating by the laser beam and, thereafter, tensile stress generates due to the spraying of the cooling medium.
- a blind crack vertical crack
- a blind crack vertical crack
- the crack Since the vertical crack, formed on the surface of the glass substrate 111 by the use of the laser beam in the manner as described above, is minute and thus normally invisible to the naked eye, the crack is called a blind crack BC.
- the glass substrate 111 is conveyed to the subsequent break step, where a force is applied onto the glass substrate such that a bending moment acts in a width direction of the blind crack BC, to allow the vertical crack to penetrate in the thickness direction of the glass substrate, and the glass substrate 111 is thereby broken along the blind crack BC as the scribe line.
- a blind crack BC is not normally formed with the above-described scribing device when conditions are not appropriately set, the conditions including heating by irradiation energy per unit area of a laser beam, cooling by a cooling medium, and a relative shifting speed of the laser beam and the glass substrate.
- the glass substrate on which the blind crack BC has not been normally formed is supplied to the subsequent break step, the glass substrate is not broken along the blind crack BC, which may lead to damage of the glass substrate.
- the glass substrate cannot be used as a component of an FPD, resulting in loss of economical efficiency as well as deteriorated production efficiency of the FPD. Further, the damage of the glass substrate might cause damage of a device for breaking a glass substrate itself.
- blind crack BC has been certainly formed on the glass substrate in the scribing device.
- the blind crack BC to be formed on the glass substrate is minute, it normally cannot be visually inspected nor directly observed with a CCD camera.
- the present invention solves the above-mentioned problems, and aims to provide a device and a method for scribing a brittle material substrate, which are capable of certainly checking a formation state of a blind crack to be formed on a surface of a brittle material substrate such as a glass substrate to certainly break the brittle material substrate in a step of breaking a brittle material substrate, and also provide an automated breaking line using the device and the method.
- the present invention provides a scribing device for a brittle material substrate according to claim 1 and a scribing method according to claim 2.
- scribing device is used in one of scribe steps for breaking a glass substrate to be used for an FPD, for example.
- Fig. 2 is a schematic constitutional view which shows an embodiment of the present invention.
- This scribing device comprises a slide table 12, which reciprocates along a predetermined horizontal direction (Y direction), on a horizontal base 11.
- the slide table 12 is slidably supported by a pair of guide rails 14 and 15, which are arranged in parallel along an upper surface of the base 11, in a horizontal state along each of the guide rails 14 and 15.
- a ball screw 13 is provided in the middle of the guide rails 14 and 15 so as to rotate in parallel with each of the guide rails 14 and 15 by means of a motor (not shown).
- the ball screw 13 is rotatable forward and rearward by means of the motor (not shown), and a ball nut 16 is attached to the ball screw 13 in the state of being meshed with together therewith.
- the ball nut 16 is integrally attached to the slide table 12 in a non-rotating state, and slides in both directions along the ball screw 13 by the forward and rearward rotations of the ball screw 13.
- the slide table 12 to which the ball nut 16 is integrally attached, slides along each of the guide rails 14 and 15 in the Y direction.
- a pedestal 19 is arranged in a horizontal state on the slide table 12.
- the pedestal 19 is slidably supported by a pair of guide rails 21 arranged in parallel on the slide table 12.
- Each of the guide rails 21 is arranged in an X direction orthogonal to the Y direction as the sliding direction of the slide table 12.
- a ball screw 22 is arranged in parallel with each of the guide rails 21, and the ball screw 22 rotates forward and rearward by means of a motor 23.
- a ball nut 24 is attached to the ball screw 22 in a state of being meshed with together therewith.
- the ball nut 24 is integrally attached to the pedestal 19 in a non-rotating state, and moves in both directions along the ball screw 22 by the forward and rearward rotations of the ball screw 22. Thereby, the pedestal 19 slides along each of the guide rails 21 in the X direction.
- a rotation mechanism 25 is provided on the pedestal 19, and a rotation table 26 is provided in a horizontal state on the rotation mechanism 25.
- a glass substrate 50 as an object of scribing is mounted on the rotation table 26.
- the rotation mechanism 25 is rotated around a central axis along the vertical direction of the rotation table 26, so that the rotation table 26 can be rotated at an arbitrary rotation angle with respect to a reference position.
- the glass substrate 50 is fixed onto the rotation table 26 with, for example, a suction chuck.
- a supporting table 31 is arranged above the rotation table 26 at an appropriate spacing therebetween.
- the supporting table 31 is supported in a horizontal state by a lower end of an optical holder 33 arranged in a vertical state.
- An upper end of the optical holder 33 is attached to a lower surface of a mount 32 provided on the base 11.
- a laser oscillator 34 for oscillating a laser beam is provided on the mount 32, and an optical system, held in the optical holder 33a, is irradiated with a laser beam oscillated from the laser oscillator 34.
- the glass substrate 50 mounted on the rotation table 26, is irradiated with the laser beam, with which the inside of the optical holder 33 has been irradiated, from the lower end face of the optical holder 33. At this time, the glass substrate 50 is irradiated with the laser beam as an elliptical laser spot long extended along a predetermined direction by the optical system held in the optical holder 33.
- a cutter wheel tip 35 for forming a cutout (trigger) on the surface of the glass substrate 50 is provided under the supporting table 31.
- This cutter wheel tip 35 is used for forming a cutout (trigger) as a trigger for forming a blind crack (vertical crack) along the longitudinal direction of the laser beam with which the end of the glass substrate 50 is irradiated, and the cutter wheel tip 35 is ascendably/descendably held by a chip holder 36.
- the supporting table 31 is provided with a cooling nozzle 37 in proximity to the optical holder 33 such that an arrangement position of the cooling nozzle 37 is changeable. From this cooling nozzle 37, a cooling medium, such as cooling water, He gas, N 2 gas or CO 2 gas, is sprayed onto the glass substrate 50. The cooling medium is sprayed from the cooling nozzle 37 onto a position in proximity to the end of the longitudinal direction of the laser spot from the optical holder 33, with which the glass substrate 50 is irradiated.
- a cooling medium such as cooling water, He gas, N 2 gas or CO 2 gas
- the scribing device comprises a pair of CCD cameras 38 and 39 for picking up alignment marks previously patterned on the glass substrate 50, and monitors 28 and 29 are provided on the mount 32, which respectively display images picked up by the CCD cameras 38 and 39.
- the supporting table 31 is provided with a detection unit 40 in proximity to the cooling nozzle 37.
- the detection unit 40 detects whether a blind crack (vertical crack) has been normally formed or not in a region in proximity to the cooling medium sprayed from the cooling nozzle 37 onto the glass substrate.
- a photoelectric sensor is used as the detection unit 40, and constituted by including an optical fiber 41, a light projecting/receiving part 42 and a determination unit 43.
- the glass substrate 50 to be broken into a predetermined size is mounted on the rotation table 26 of the scribing device, and then fixed thereto by suction means.
- alignment marks provided on the glass substrate 50 are picked up by the CCD cameras 38 and 39.
- the picked up alignment marks are displayed on the monitors 28 and 29, and the positional information on the alignment marks are processed in an image processing device (not shown) for positioning a table.
- the rotation table 26 mounting the glass substrate 50 is positioned at a predetermined position with respect to the supporting table 31, and the glass substrate 50 is then scribed with the use of a laser beam.
- a longitudinal direction of an elliptical laser spot, with which the surface of the glass substrate 50 is irradiated, from the optical holder 33 is an X direction along a scribe line to be formed on the glass substrate 50.
- the rotation table 26 is positioned by the slide of the pedestal 19 on the slide table 12 and the rotation of the rotation table 26 by the rotation mechanism 25.
- Fig. 3 is a diagrammatic perspective view which shows a laser-beam irradiating state on the glass substrate 50 to be scribed by the scribing device.
- Fig. 4 is a plan view which diagrammatically shows a physical state of change on the surface of the glass substrate 50.
- the rotation table 26 Upon positioning of the rotation table 26 with respect to the supporting table 31, the rotation table 26 is slid along an X-axis direction, so that the end of the glass substrate 50 is opposed to the cutter wheel tip 35. The cutter wheel tip 35 then descends to form a cutout (trigger) TR at the end of the glass substrate 50.
- a laser beam is applied from the laser oscillator 34.
- a cooling medium such as cooling water, is sprayed from the cooling nozzle 37 together with compressed air.
- the laser beam oscillated from the laser oscillator 34 forms an elliptical laser spot LS on the surface of the glass substrate 50.
- the laser spot LS has an elliptical shape with a long diameter "b" of 30.0 mm and a short diameter "a" of 1.0 mm, and is irradiated such that the long axis thereof agrees with the direction of the scribe line to be formed.
- a temperature of heating by the laser spot LS is lower than a temperature at which the glass substrate 50 is melted, that is, lower than a softening point of the glass substrate. This enables the surface of the glass substrate 50, irradiated with the laser spot LS, to be heated without melting.
- the cooling water is sprayed from the cooling nozzle 37 onto a cooling point CP, which is on the line to be scribed at a spacing of 2.5 mm, for example, in the longitudinal direction of the laser spot LS from the region irradiated with the laser spot LS. This cools the cooling point CP on the surface of the glass substrate 50. Consequently, a temperature gradient occurs in a region between the laser spot LS and the cooling point CP.
- Compression stress generates in the region on the surface of the glass substrate 50 which was heated by the laser spot LS, while tensile stress generates on the cooling point CP onto which the cooling water was sprayed.
- compression stress generated in the region heated by the laser spot LS and the tensile stress generated on the cooling point CP cooled by the cooling water, compression stress having generated in a heat diffusion region HD between the laser spot LS and the cooling point CP leads to generation of a large tensile stress at the cooling point CP toward a region on the opposite side to the laser spot LS.
- the rotation table 26 is slid in the X direction along the line to be scribed, and with this slide, a blind crack BC is formed along the line to be scribed from a cutout (trigger) TR formed at the end of the glass substrate 50 with the cutter wheel tip 35.
- the blind crack can be visually inspected immediately after the generation thereof, but becomes non-observable several seconds later.
- a short diameter "a" of the laser spot LS is 1.0 mm
- a long diameter "b" of the laser spot LS is 30.0 mm
- a length L along a scribe line in the heat diffusion region HD is 2.5 mm
- a shifting speed of the glass substrate 50 is 300 mm/sec
- a power of the laser beam is 80 W
- a depth of the blind crack BC is 120 ⁇ m.
- the cooling point CP is located immediately behind the laser spot LS, and a vertical crack occurs immediately behind the cooling point CP, as described above. Since this vertical crack soon becomes the blind crack BC, light is projected from the light projecting/receiving unit 42 of the photoelectric sensor toward the detection point DP immediately behind the detectable cooling point CP. As shown in Figs. 3 and 5 , the projected light is once reflected on the lower face of the glass substrate 50, the blind crack is irradiated with the reflected light, the light is reflected diffusely by the blind crack, and part of the diffusely reflected light is obtained in the light projecting/receiving unit 42 of the photoelectric sensor.
- a photodiode of the determination unit in the photoelectric sensor converts a light amount level of the reflected light into an electric signal and then amplifies the signal.
- the condition of the scribe line (blind crack BC line) is detected by the discrimination of the amplified signal using predetermined thresholds.
- a light guide is used for projecting light from the light projecting/receiving unit 42 of the photoelectric sensor toward the detection point DP, and for receiving reflected light diffusedly reflected by the blind crack.
- An optical fiber or an optical waveguide film is used as the light guide, and in the description of the present invention, the optical fiber is used as one example of the light guides.
- Fig. 6(a) is a graph which shows change in amount (I) of feedback light to the sensor obtained in the optical fiber 41 with respect to a position P on the scribe line along the X direction of the glass substrate 50.
- an uncontrollable crack may be formed in front of the laser spot LS on the glass substrate.
- Such an uncontrollable crack is called an preceding crack CR1, and when this preceding crack CR1 occurs, a light amount level I4 of the preceding crack portion increases, as shown in Fig. 6(b) .
- Fig. 6(c) when a scribe line fails to be formed, reflected light is not obtained, and hence a light amount level detected by the sensor is zero. Accordingly, it is possible to detect a defective state of the blind crack formed on the glass substrate.
- an uncontrollable crack CR2 may be formed on the glass substrate 50 in the opposite direction to the direction in which the laser spot LS shifts from the side edge of the glass substrate 50.
- Such a crack CR2 is also uncontrollable, and a reflected light level becomes higher also with the occurrence of this crack CR2. Therefore, predetermined threshold levels Vref1 and Vref2 are set above and below the normal reflected light level.
- the determination unit 43 of the photoelectric sensor determines the state as defective.
- an OK signal is outputted from the determination unit 43 of the photoelectric sensor as one example of the detection units 40, an operation for forming a scribe line (blind crack BC line) on the glass substrate 50 is continuously performed.
- the blind crack BC is not favorably formed on the glass substrate 50 during the scribing process, an alarm is issued while the scribing process is discontinued.
- the operator can thereby recognize that the blind crack BC has not been normally formed on the glass substrate 50 under scribing.
- the operator removes the glass substrate 50 from the rotation table 26 of the scribing device as a defective product. With this removal, there is no risk of supplying the subsequent break step with a defective glass substrate 50 on which the blind crack BC has not been normally formed.
- the optical fiber 41 and the light projecting/receiving unit 42 are provided from the left hand of the blind crack BC for the detection in Fig. 5
- the light may be projected from the right hand of the blind crack with the use of the optical fiber 41 and light projecting/receiving part, and from which direction the light is projected can be selected depending on a line to be formed with a blind crack. Further, the light may directly enter the position where the blind crack has been formed, instead of allowing light to be reflected on the lower face of the glass substrate 50 once and then enter the blind crack.
- FIG. 8 is a view which shows a schematic constitution of a transmissive type detection unit.
- An optical fiber 71 is a first optical fiber for light projection. The optical fiber 71 is located in the same position as the optical fiber 41 in Fig. 5 , and a light projection unit 72 is provided on the distal end of the optical fiber 71. Further, a light reception unit 73 for receiving light transmitted through the position of the blind crack, and a second optical fiber 74 for light reception are provided.
- a light diffuse reflection level is high in the location where an uncontrollable crack has occurred, and a light receiving level obtained as transmitted light is significantly lowered. Therefore, setting of thresholds above and below the normal transmitted light level enables individual recognition of a normal state where a blind crack (vertical crack) has been formed and the above-mentioned abnormal state.
- the supporting table 31 provided with the detection unit may be arranged under the table together with the laser oscillator and the cooling nozzle, and a blind crack may be formed from underneath.
- the detection unit is small enough to be readily arranged on the downside, and implementation of the first embodiment from the downside of the glass substrate 50 enables detection as to whether the blind crack BC has been accurately formed from the downside of the glass substrate 50.
- the light projection unit and the light reception unit of the detection unit may be split from one another.
- the detection unit 40 is a unit having a light source as which a laser diode 61 is used.
- a polarized beam splitter 64 is arranged on a light projection axis of the detection unit 40 through a lens 62 and a polarized filter 63.
- the polarized filter 63 selects only light in a predetermined polarized direction as irradiated light, and the polarized beam splitter 64 transmits the laser light as it is in the polarized direction selected by the polarized filter 63, to allow reflection of the laser light in the vertical direction to the selected laser light.
- the foregoing optical fiber 41 is provided on the light projection end of the polarized beam splitter 64. Further, since the reflected light obtained from the optical fiber 41 is polarized in random directions, part of the reflected light is split with the polarized beam splitter 64. It is constituted that the light split by the polarized beam splitter 64 enters a photodiode 67 as a light reception element through a mirror 65 and a lens 66. Further, a signal obtained in the photodiode 67 is amplified with an amplifier 68 to be given to a determination unit (DET) 69.
- DET determination unit
- the determination unit 69 is constituted by including a window comparator, and a good or bad determination is made on a condition of the blind crack formation based on whether the amplified signal is on the level between the thresholds Vref1 and Vref2 which are set in the window comparator.
- the laser diode 61, the lens 62, the polarized filter 63 and the polarized beam splitter 64 constitute a light projection unit for making light enter the optical fiber for the sensor, while the polarized beam splitter 64, the mirror 65, the lens 66 and the photodiode 67 constitute a light reception unit for receiving reflected light through the optical fiber.
- Fig. 11 is a schematic diagrammatic view of an automated line 100 for breaking a single panel glass substrate, which shows one example of an automated line for breaking the glass substrate 50 having a breaking device incorporated therein, following the scribing device.
- the automated glass substrate breaking line 100 comprises: a cassette loader 101 equipped with a cassette housing the glass substrate 50; a conveyor 102 for mounting the glass substrate 50 having been pulled out of the cassette loader 101 and then positioning the mounted glass substrate 50; a scribing device 103 of the present invention for scribing the glass substrate 50; a conveyor 104 for mounting and then positioning the glass substrate 50 on which a scribe line has been formed; a breaking device 105 which is constituted of a table divided into halves and in which at least one of the divided tables is rotation-shifted downwardly to bend the glass substrate 50 so as to break the glass substrate 50 along the scribe line; and a discharge conveyor 106 for discharging the broken glass substrate 50 (hereinafter, each of the glass substrate broken into a plurality of substrates is referred to as a glass substrate 50B) to the outside of the automated glass substrate breaking line 100. Further, in various locations of the automated glass substrate breaking line 100, a material supply robot R1 and conveyor robots R2 to R5 are respectively provided for
- the glass substrate 50 housed in a cassette of the cassette loader 101 is taken out with the material supply robot R1, and the taken out glass substrate 50 is positioned on the conveyor 102. Thereafter, the glass substrate 50 is held with the conveyor robot R2 to be conveyed into the scribing device 103.
- the conveyed glass substrate 50 is mounted on a table in the scribing device 103.
- a blind crack BC along a previously designed line is formed on the glass substrate 50 in the scribing device 103.
- an NG signal is outputted from the detection unit 40, and with this NG signal, the operation of the scribing device 103 is discontinued while an alarm is issued for informing occurrence of abnormality.
- the glass substrate 50 is held with the conveyor robot R3 and mounted on the conveyor 104.
- the glass substrate 50 mounted on the conveyor 104 is positioned on the front side of the conveyor 104, and the conveyor robot R4 conveys the glass substrate 50 into the breaking device 105 such that the blind crack BC on the glass substrate 50 is positioned in the middle between the divided tables.
- the breaking device 105 the glass substrate 50 on which the blind crack has been formed is broken along the blind crack.
- a plurality of glass substrates 50B obtained by breaking of the glass substrate 50 in the breaking device 105 are mounted on the discharge conveyor 106 with the conveyor robot R5.
- an apparatus constitution can be employed where the glass substrate 50 having no predetermined blind crack BC is automatically discharged from the line 100 when an NG signal generates from the detection unit 40. This makes a totally automated operation possible.
- the brittle material substrate includes, other than the single panel glass substrate, a semiconductor wafer, a laminated substrate to serve as a liquid crystal panel and a ceramic substrate.
- the brittle material substrate further includes a mother liquid crystal panel substrate as the laminated substrate, a PDP (Plasma Display Panel), LCOS, and a projector substrate, and the present invention is applicable to the processes of those various brittle material substrates.
- the optical fiber as the light guide, this is not limitation, and an optical waveguide film and the like can be used as the light guide.
- the size of the detection unit can be reduced to readily determine whether the blind crack has been normally formed or not.
- the scribing device and the scribing method according to the present invention can be employed in the case where a brittle material substrate such as a glass substrate to be used for a flat panel display (hereinafter, refereed to as FPD) or the semiconductor wafer is scribed.
- FPD flat panel display
- the scribing device and the scribing method applied to an automated breaking line it is possible to convey only a brittle material substrate, on which a blind crack (vertical crack) line (scribe line) has been normally formed, to the subsequent break step for breaking.
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- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Plasma & Fusion (AREA)
- Toxicology (AREA)
- Thermal Sciences (AREA)
- Health & Medical Sciences (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
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Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003004282 | 2003-01-10 | ||
JP2003004282 | 2003-01-10 | ||
PCT/JP2004/000084 WO2004062868A1 (ja) | 2003-01-10 | 2004-01-08 | 脆性材料基板のスクライブ装置及びスクライブ方法並びに自動分断ライン |
Publications (3)
Publication Number | Publication Date |
---|---|
EP1595668A1 EP1595668A1 (en) | 2005-11-16 |
EP1595668A4 EP1595668A4 (en) | 2008-09-17 |
EP1595668B1 true EP1595668B1 (en) | 2011-09-14 |
Family
ID=32708944
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP04700788A Expired - Lifetime EP1595668B1 (en) | 2003-01-10 | 2004-01-08 | Brittle material substrate scribing device and scribing method, and automatic analysis line |
Country Status (8)
Country | Link |
---|---|
US (1) | US7723641B2 (pt) |
EP (1) | EP1595668B1 (pt) |
JP (1) | JPWO2004062868A1 (pt) |
KR (1) | KR20050091069A (pt) |
CN (1) | CN100506500C (pt) |
AT (1) | ATE524285T1 (pt) |
TW (1) | TW200510152A (pt) |
WO (1) | WO2004062868A1 (pt) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100497820B1 (ko) * | 2003-01-06 | 2005-07-01 | 로체 시스템즈(주) | 유리판절단장치 |
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-
2004
- 2004-01-08 US US10/541,965 patent/US7723641B2/en not_active Expired - Fee Related
- 2004-01-08 TW TW093100427A patent/TW200510152A/zh not_active IP Right Cessation
- 2004-01-08 AT AT04700788T patent/ATE524285T1/de not_active IP Right Cessation
- 2004-01-08 KR KR1020057012731A patent/KR20050091069A/ko not_active Application Discontinuation
- 2004-01-08 EP EP04700788A patent/EP1595668B1/en not_active Expired - Lifetime
- 2004-01-08 JP JP2005507979A patent/JPWO2004062868A1/ja active Pending
- 2004-01-08 CN CNB2004800039010A patent/CN100506500C/zh not_active Expired - Fee Related
- 2004-01-08 WO PCT/JP2004/000084 patent/WO2004062868A1/ja active Application Filing
Also Published As
Publication number | Publication date |
---|---|
EP1595668A4 (en) | 2008-09-17 |
TWI319744B (pt) | 2010-01-21 |
CN1747820A (zh) | 2006-03-15 |
EP1595668A1 (en) | 2005-11-16 |
CN100506500C (zh) | 2009-07-01 |
JPWO2004062868A1 (ja) | 2006-05-18 |
TW200510152A (en) | 2005-03-16 |
US20060101858A1 (en) | 2006-05-18 |
KR20050091069A (ko) | 2005-09-14 |
ATE524285T1 (de) | 2011-09-15 |
US7723641B2 (en) | 2010-05-25 |
WO2004062868A1 (ja) | 2004-07-29 |
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