EP1595183B1 - Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon - Google Patents

Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon Download PDF

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Publication number
EP1595183B1
EP1595183B1 EP04713069A EP04713069A EP1595183B1 EP 1595183 B1 EP1595183 B1 EP 1595183B1 EP 04713069 A EP04713069 A EP 04713069A EP 04713069 A EP04713069 A EP 04713069A EP 1595183 B1 EP1595183 B1 EP 1595183B1
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European Patent Office
Prior art keywords
radiation
aryl
sensitive
group
sensitizer
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EP04713069A
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German (de)
English (en)
French (fr)
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EP1595183A2 (en
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Harald Baumann
Udo Dwars
Detlef Pietsch
Michael Flugel
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Kodak Graphic Communications GmbH
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Kodak Graphic Communications GmbH
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Definitions

  • the present invention relates to radiation-sensitive compositions, in particular radiation-sensitive compositions comprising oxazole derivatives as sensitizers.
  • the invention furthermore relates to imageable elements based thereon, a process for the production of such elements, a process for imaging such elements and an imaged element such as for example a lithographic printing plate.
  • the technical field of lithographic printing is based on the immiscibility of oil and water, wherein the oily material or the printing ink is preferably accepted by the image area, and the water or fountain solution is preferably accepted by the non-image area.
  • the background or non-image area accepts the water and repels the printing ink
  • the image area accepts the printing ink and repels the water.
  • the printing ink in the image area is then transferred to the surface of a material such as paper, fabric and the like, on which the image is to be formed.
  • the printing ink is first transferred to an intermediate material, referred to as blanket, which then in turn transfers the printing ink onto the surface of the material on which the image is to be formed; this technique is referred to as offset lithography.
  • a frequently used type of lithographic printing plate precursor comprises a photosensitive coating applied onto a substrate on aluminum basis.
  • the coating can react to radiation such that the exposed portion becomes so soluble that it is removed during the developing process.
  • Such a plate is referred to as positive working.
  • a plate is referred to as negative working if the exposed portion of the coating is hardened by the radiation.
  • the remaining image area accepts printing ink, i.e. is oleophilic
  • the non-image area (background) accepts water, i.e. is hydrophilic.
  • the differentiation between image and non-image areas takes place during exposure, for which a film is attached to the printing plate precursor under vacuum in order to guarantee good contact.
  • the plate is then exposed by means of a radiation source.
  • the plate can also be exposed digitally without a film, e.g. with a UV laser.
  • a positive plate the area on the film corresponding to the image on the plate is so opaque that the light does not reach the plate, while the area on the film corresponding to the non-image area is clear and allows light to permeate the coating, whose solubility increases.
  • a negative plate the opposite takes place: The area on the film corresponding to the image on the plate is clear, while the non-image area is opaque.
  • the coating beneath the clear film area is hardened due to the incident light, while the area not affected by the light is removed during developing.
  • the light-hardened surface of a negative working plate is therefore oleophilic and accepts printing ink, while the non-image area that used to be coated with the coating removed by the developer is desensitized and therefore hydrophilic.
  • Photosensitive mixtures have been used for years in photopolymerizable compositions for the production of photosensitive materials such as e.g. printing plate precursors.
  • an improved sensitivity in particular in the near UV and the visible spectral range is required for new and advanced applications (e.g. exposure by means of lasers) so that the exposure time can be shortened
  • low-intensity radiation sources can be used, which are less expensive and more reliable than high-intensity radiation sources. Therefore, efforts have been made for some time to increase the sensitivity of photosensitive mixtures to be used in photopolymerizable compositions.
  • DE-A-3021599 discloses radiation-sensitive compositions comprising ethylenically unsaturated monomers as well as a 2-(halogenomethyl-phenyl)-4-halogen-oxazole derivative as photoinitiator.
  • the efficiency of the photoinitiator is insufficient.
  • DE-A-3907666 also describes radiation-sensitive compositions containing a halogen substituted oxazole; again the sensitivity of such a system is too low compared to today's standards.
  • US-A-3,597,343 discloses azole compounds as photopolymerization initiators, however, based on today's standards the sensitivity of compositions containing such initiators is too low.
  • compositions additionally containing photo-oxidation sensitizers like Rose Bengale and Eosine are described; however, due to the presence of said dyes, the compositions not only suffer from insufficient sensitivity but also poor stability under yellow light conditions.
  • US-A-3,912,606 describes UV-hardenable compositions for films and coatings which in addition to ethylenically unsaturated monomers comprise a photoinitiator selected from haloalkane benzoxazoles, benzimidazoles and benzothiazoles. In these compositions as well, the efficiency of the photoinitiator is insufficient.
  • EP-A-0741 333 describes photopolymerizable compositions which in addition to ethylenically unsaturated monomers and organic binders comprise a combination of an optical brightener and a photoinitiator selected from acyl and diacyl phosphine oxides.
  • optical brighteners those comprising a stilbene, triazine, thiazole, benzoxazole, coumarin, xanthene, triazole, oxazole, thiophene or pyrazoline unit are listed. However, based on today's standards, these photopolymerizable compositions do not exhibit sufficient sensitivity.
  • US-A-3,647,467 describes "photo-activable" compositions comprising a hexaarylbiimidazole and a heterocyclic compound Ar 1 -G-Ar 2 (wherein Ar 1 is an aryl group with 6 to 12 ring carbon atoms, Ar 2 is either Ar 1 or a group arylene-G-Ar 1 and G is a divalent furan, oxazole or oxadiazole ring).
  • Ar 1 is an aryl group with 6 to 12 ring carbon atoms
  • Ar 2 is either Ar 1 or a group arylene-G-Ar 1 and G is a divalent furan, oxazole or oxadiazole ring.
  • the radiation sensitivity of these compositions does not meet present-day requirements.
  • oxazole derivatives are used as photoconductive substances in electrophotographic elements.
  • 2-mercaptobenzoxazoles are used as chain extension agents in "photo-activable" compositions comprising hexaarylbiimidazole and bis(p-aminophenyl...- ⁇ , ⁇ -unsaturated) ketones. In this combination as well, the obtained photosensitivity is too low.
  • alkyl group refers to a straight-chain, branched or cyclic saturated hydrocarbon group preferably comprising 1 to 18 carbon atoms, especially preferred 1 to 10 carbon atoms and most preferred 1 to 6 carbon atoms.
  • the alkyl group can optionally comprise one or more substituents (preferably 0 or 1 substituent) selected for example from halogen atoms (fluorine, chlorine, bromine, iodine), CN, NO 2 , NR' 2 , COOR' and OR' (R' independently represents a hydrogen atom or an alkyl group).
  • substituents preferably 0 or 1 substituent
  • aryl group refers to an aromatic carbocyclic group with one or more fused rings, which preferably comprises 5 to 14 carbon atoms.
  • the aryl group can optionally comprise one or more substituents (preferably 0 to 3) selected for example from halogen atoms, alkyl groups, alkoxy groups, CN, NO 2 , NR' 2 , COOR' and OR' (wherein each R' is independently selected from hydrogen and alkyl).
  • substituents preferably 0 to 3
  • substituents preferably 0 to 3
  • a fused ring or ring system as referred to in the present invention is a ring that shares two carbon atoms with the ring to which it is fused.
  • All monomers, oligomers and polymers which are free-radical polymerizable and comprise at least one C-C double can be used as ethylenically unsaturated monomers, oligomers and polymers.
  • Monomers, oligomers and polymers with C-C triple bonds can also be used, but they are not preferred.
  • Suitable compounds are well known to the person skilled in the art and can be used in the present invention without any particular limitations. Esters of acrylic and methacrylic acids, itaconic acid, crotonic acid, isocrotonic acid, maleic acid and fumaric acid with one or more unsaturated groups in the form of monomers, oligomers or prepolymers are preferred.
  • Compounds suitable as monomers include for instance trimethylol propane triacrylate and methacrylate, pentaerythritol triacrylate and methacrylate, dipentaerythritolmonohydroxy pentaacrylate and methacrylate, dipentaerythritol hexaacrylate and methacrylate, pentaerythritol tetraacrylate and methacrylate, ditrimethylol propane tetraacrylate and methacrylate, diethyleneglycol diacrylate and methacrylate, triethyleneglycol diacrylate and methacrylate or tetraethyleneglycol diacrylate and methacrylate.
  • Suitable oligomers and/or prepolymers are for example urethane acrylates and methacrylates, epoxide acrylates and methacrylates, polyester acrylates and methacrylates, polyether acrylates and methacrylates or unsaturated polyester resins.
  • polymers comprising free-radical polymerizable C-C double bonds in the main or side chains.
  • examples thereof include reaction products of maleic acid anhydride olefin copolymers and hydroxyalkyl(meth)acrylates (cf. e.g. DE-A-4311738 ); (meth)acrylic acid polymers, partially or fully esterified with allyl alcohol (cf. e.g.
  • reaction products of polymeric polyalcohols and isocyanato(meth)acrylates unsaturated polyesters; (meth)acrylate-terminated polystyrenes, poly(meth)acrylic acid ester, poly(meth)acrylic acids, poly(meth)acrylamides; (meth)acrylic acid polymers, partially or fully esterified with epoxides comprising free-radical polymerizable groups; and polyethers.
  • the prefix "(meth)" indicates that both derivatives of acrylic acid and of methacrylic acid can be used.
  • the free-radical polymerizable monomers/oligomers/polymers are preferably present in an amount of 5 to 95 wt.%; if monomers/oligomers are used, especially preferred 20 to 85 wt.-%, based on the dry layer weight of a radiation-sensitive coating prepared from the radiation-sensitive composition of the present invention.
  • dry layer weight of the radiation-sensitive coating is therefore synonymous with the term "solids of the radiation-sensitive composition”.
  • a sensitizer as referred to in the present invention is a compound which can absorb radiation when it is exposed to radiation but which cannot by itself, i.e. without the addition of coinitiators, form free radicals.
  • one sensitizer or a mixture of two or more can be used.
  • a 1,3-oxazole compound of formula (I) is used as sensitizer.
  • each R 1 , R 2 and R 3 is independently selected from a halogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, which may also be fused, an optionally substituted aralkyl group, a group -NR 4 R 5 and a group -OR 6 , wherein at least one of the groups R 1 , R 2 and R 3 represents a group -NR 4 R 5 , wherein R 4 and R 5 are independently selected from a hydrogen atom, an alkyl, aryl or aralkyl group, R 6 is an optionally substituted alkyl, aryl or aralkyl group or a hydrogen, atom, and k, m and n are independently 0 or an integer from 1 to 5.
  • R 1 , R 2 and R 3 represents an optionally substituted alkyl group
  • the alkyl group is either unsubstituted or substituted with one substituent selected from CN, NO 2 , NR' 2 , COOR' and OR' (R' being hydrogen or alkyl).
  • At least one of R 1 , R 2 and R 3 represents a group NR 4 R 5 and the other of groups R 1 , R 2 and R 3 are independently selected from a halogen atom, a C 1 -C 8 alkyl and a group -NR 4 R 5 , wherein R 4 and R 5 are preferably independently selected from hydrogen atoms and C 1 -C 6 alkyl.
  • k, m and n are preferably independently 0 or 1, provided that there must be present at least one NR 4 R 5 group.
  • oxazole derivatives used in the present invention can be prepared according to processes well known to the person skilled in the art. In this connection, reference is made to DE-A-1120875 and EP-A-129 059 ; the processes described in these documents can also be used for the synthesis of oxazoles not explicitly described therein by varying the starting compounds accordingly.
  • the sensitizers are used in combination with one or more coinitiators.
  • the amount of sensitizer(s) is not particularly restricted; however, it is preferably in the range of 0.2 to 25 wt.%, based on the solids content or the dry layer weight of a coating produced from the composition, especially preferred 0.5 to 15 wt.%.
  • a coinitiator as referred to in the present invention is a compound that is essentially unable to absorb when exposed to radiation but forms free radicals together with the radiation-absorbing sensitizers used according to the present invention.
  • the coinitiators are selected from amines, such as alkanols amines; N,N-dialkylaminobenzoic acid esters; N-arylglycines and derivatives thereof (e.g.
  • N-phenylglycine aromatic sulfonylhalides; trihalogenomethylsulfones; imides such as N-benzoyloxyphthalimide; diazosulfonates; 9,10-dihydroanthracene derivatives; N-aryl, S-aryl or O-aryl polycarboxylic acids with at least 2 carboxyl groups of which at least one is bonded to the nitrogen, oxygen or sulfur atom of the aryl unit (e.g. aniline diacetic acid and derivatives thereof and other coinitiators described in US-A-5,629,354 ); a hexaarylbiimidazole such as e.g.
  • cyclopentadienyl groups and one or two six-membered aromatic groups with at least one ortho fluorine atom and optionally also a pyrryl group such as bis(cyclopentadienyl)-bis-[2,6-difluoro-3-(pyrr-1-yl)-phenyl]titanium and dicyclopentadiene-bis-2,4,6-trifluorophenyl-titanium or zirconium), and peroxides (e.g. those listed in EP-A-1 035 435 as activators of the type of an organic peroxide).
  • one of the above coinitiators or a mixture thereof can be used.
  • the amount of coinitiator(s) is not particularly restricted; however, it is preferably 0.2 to 25 wt.-%, based on the dry layer weight, especially preferred 0.5 to 15 wt.-%.
  • the radiation-sensitive coating can also comprise one or more onium salts as additional coinitiators; for example ammonium salts, diaryliodonium salts, triarylsulfonium salts, aryldiazonium salts and N-alkoxypyridinium salts. They are preferably present in an amount of 0 to 15 wt.-%, based on the dry layer weight.
  • the photosensitive composition of the present invention can also comprise a binder or a mixture of binders.
  • the binder is preferably selected from polyvinyl acetals, acrylic polymers, polyurethanes and copolymers thereof. It is preferred that the binder contain acid groups, especially preferred carboxyl groups. Most preferred are acrylic polymers. Binders with acid groups preferably have acid numbers in the range of 20 to 180 mg KOH/g polymer.
  • the binder can comprise groups capable of undergoing a cycloaddition reaction (e.g. photocycloaddition).
  • the amount of binder is not particularly restricted and is preferably in the range of 0 to 90 wt.-%, especially preferred 5 to 60 wt.-%.
  • the radiation-sensitive coating can optionally also comprise small amounts of a thermopolymerization inhibitor.
  • Suitable examples of inhibitors of undesired thermopolymerization include hydroquinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrrogallol, t-butylcatechol, benzoquinone, 4,4'-thio-bis-(3-methyl-6-t-butylphenol), 2,2'-methylene-bis-(4-methyl-6-t-butylphenol) and N-nitrosophenylhydroxylamine salts.
  • the amount of the non-absorbable polymerization inhibitor in the radiation-sensitive coating is preferably 0 to 5 wt.-%, based on the dry layer weight, especially preferred 0.01 to 2 wt.-%.
  • Such inhibitors are often introduced into the radiation-sensitive coating via commercial monomers or oligomers and are therefore not expressly mentioned.
  • the radiation-sensitive coating of the present invention can comprise dyes or pigments for coloring the layer.
  • colorants include e.g. phthalocyanine pigments, azo pigments, carbon black and titanium dioxide, ethyl violet, crystal violet, azo dyes, anthraquinone dyes and cyanine dyes.
  • the amount of colorant is preferably 0 to 20 wt.-%, based on the dry layer weight, especially preferred 0.5 to 10 wt.-%.
  • the radiation-sensitive coating can additionally comprise further additives such as plasticizers or inorganic fillers.
  • plasticizers include e.g. dibutyl phthalate, dioctyl phthalate, didodecyl phthalate, dioctyl adipate, dibutyl sebacate, triacetyl glycerin und tricresyl phosphate.
  • the amount of plasticizer is not particularly restricted, however, it is preferably 0 to 10 wt.-%, based on the dry layer weight, especially preferred 0.25 to 5 wt.-%.
  • the radiation-sensitive coating can also comprise known chain transfer agents. They are preferably used in an amount of 0 to 15 wt.-%, based on the dry layer weight, especially preferred 0.5 to 5 wt.-%.
  • the radiation-sensitive coating can comprise leuco dyes such as e.g. leuco crystal violet and leucomalachite green. They are preferably present in an amount of 0 to 10 wt.-%, based on the dry layer weight, especially preferred 0.5 to 5 wt.-%.
  • leuco dyes such as e.g. leuco crystal violet and leucomalachite green. They are preferably present in an amount of 0 to 10 wt.-%, based on the dry layer weight, especially preferred 0.5 to 5 wt.-%.
  • the radiation-sensitive coating can comprise surfactants.
  • Suitable surfactants include siloxane-containing polymers, fluorine-containing polymers and polymers with ethylene oxide and/or propylene oxide groups. They are preferably present in an amount of 0 to 10 wt.-%, based on the dry layer weight, especially preferred 0.2 to 5 wt.-%.
  • the radiation-sensitive coating include inorganic fillers such as e.g. Al 2 O 3 and SiO 2 (they are preferably present in an amount of 0 to 20 wt.-%, based on the dry layer weight, especially preferred 0.1 to 5 wt.-%).
  • inorganic fillers such as e.g. Al 2 O 3 and SiO 2 (they are preferably present in an amount of 0 to 20 wt.-%, based on the dry layer weight, especially preferred 0.1 to 5 wt.-%).
  • Exposure indicators such as e.g. 4-phenylazodiphenylamine, can also be present as optional components of the radiation-sensitive coating; they are preferably present in an amount of 0 to 5 wt.-%, especially preferred 0 to 2 wt.-%, based on the dry layer weight.
  • the radiation-sensitive elements of the present invention can for example be printing plate precursors (in particular precursors of lithographic printing plates), printed circuit boards for integrated circuits or photomasks.
  • a dimensionally stable plate or foil-shaped material is preferably used as a substrate in particular in the production of printing plate precursors.
  • a material is used as dimensionally stable plate or foil-shaped material that has already been used as a substrate for printing matters.
  • substrates include paper, paper coated with plastic materials (such as polyethylene, polypropylene, polystyrene), a metal plate or foil, such as e.g. aluminum (including aluminum alloys), zinc and copper plates, plastic films made e.g.
  • an aluminum plate or foil is especially preferred since it shows a remarkable degree of dimensional stability, is inexpensive and furthermore exhibits excellent adhesion to the coating.
  • a composite film can be used wherein an aluminum foil has been laminated onto a polyethylene terephthalate film.
  • a metal substrate in particular an aluminum substrate, is preferably subjected to at least one treatment selected from graining (e.g. by brushing in a dry state or brushing with abrasive suspensions, or electrochemical graining, e.g. by means of a hydrochloric acid electrolyte), anodizing (e.g. in sulfuric acid or phosphoric acid) and hydrophilizing.
  • graining e.g. by brushing in a dry state or brushing with abrasive suspensions, or electrochemical graining, e.g. by means of a hydrochloric acid electrolyte
  • anodizing e.g. in sulfuric acid or phosphoric acid
  • hydrophilizing e.g. in sulfuric acid or phosphoric acid
  • the metal substrate can be subjected to an aftertreatment with an aqueous solution of sodium silicate, calcium zirconium fluoride, polyvinylphosphonic acid or phosphoric acid.
  • an aqueous solution of sodium silicate, calcium zirconium fluoride, polyvinylphosphonic acid or phosphoric acid within the framework of the present invention, the term "substrate” also encompasses an optionally pre-treated substrate exhibiting, for example, a hydrophilizing layer on its surface.
  • the radiation-sensitive composition of the present invention is applied to the surface of the substrate by means of common processes (e.g. spin coating, dip coating, coating by means of doctor blades). It is also possible to apply the radiation-sensitive composition on both sides of the substrate; however, for the elements of the present invention, it is preferred that the radiation-sensitive coating be only applied to one side of the substrate.
  • the radiation-sensitive composition comprises one or more organic solvents.
  • Suitable solvents include low alcohols (e.g. methanol, ethanol, propanol and butanol), glycolether derivatives (e.g. ethyleneglycol monomethylether, ethyleneglycol dimethylether, propyleneglycol monomethylether, ethyleneglycol monomethylether acetate, ethyleneglycol monoethylether acetate, propyleneglycol monomethylether acetate, propyleneglycol monoethylether acetate, ethyleneglycol monoisopropylether acetate, ethyleneglycol monobutylether acetate, diethyleneglycol monomethylether, diethyleneglycol monoethylether), ketones (e.g.
  • esters e.g. z.B. methyl lactate, ethyl lactate, ethyl acetate, 3-methoxypropyl acetate and butyl acetate
  • aromatics e.g. toluene and xylene
  • cyclohexane 3-methoxy-2-propanol, 1-methoxy-2-propanol, methoxymethoxyethanol, ⁇ -butyrolactone and dipolar aprotic solvents (e.g. THF, dimethylsulfoxide, dimethylformamide and N-methylpropyrrolidone).
  • the solids content of the radiation-sensitive mixture to be applied depends on the coating method that is used and is preferably 1 to 50 wt.-%.
  • the additional application of a water-soluble oxygen-impermeable overcoat onto the radiation-sensitive layer can be advantageous.
  • the polymers suitable for such an overcoat include, inter alia, polyvinyl alcohol, polyvinyl alcohol/polyvinyl acetate copolymers, polyvinyl pyrrolidone, polyvinyl pyrrolidone/polyvinyl acetate copolymers, polyvinyl methylethers, ring-opened copolymers of maleic acid anhydride and a comonomer such as methylvinylether, polyacrylic acid, cellulose ether, gelatin, etc.; polyvinyl alcohol is preferred.
  • the composition for the oxygen-impermeable overcoat is applied in the form of a solution in water or in a solvent miscible with water, in any case, the solvent is selected such that the radiation-sensitive coating already present on the substrate does not dissolve.
  • the layer weight of the overcoat can e.g. be 0.1 to 6 g/m 2 , preferably 0.5 to 6 g/m 2 .
  • the printing plate precursors according to the present invention show excellent properties even without an overcoat.
  • the overcoat can also comprise matting agents (i.e. organic or inorganic particles with a particle size of 2 to 20 ⁇ m) which facilitate the planar positioning of the film during contact exposure.
  • the overcoat can comprise adhesion promoters such as e.g. poly(vinylpyrrolidone), poly(ethyleneimine) and poly(vinylimidazole).
  • adhesion promoters such as e.g. poly(vinylpyrrolidone), poly(ethyleneimine) and poly(vinylimidazole).
  • Suitable overcoats are described for example in WO 99/06890 .
  • the thus produced radiation-sensitive elements are image-wise exposed in a manner known to the person skilled in the art with UV radiation of a wavelength of 350 to 450 nm and subsequently developed with a commercially available aqueous alkaline developer.
  • UV laser diodes emitting UV radiation in the range of about 405 nm (e.g. 405 ⁇ 10 nm) are of particular interest as a radiation source.
  • a heat treatment can be carried out at 50 to 180°C, preferably 90 to 150°C.
  • the developed elements can be treated with a preservative ("gumming") using a common method.
  • the preservatives are aqueous solutions of hydrophilic polymers, wetting agents and other additives.
  • baking For certain applications (e.g. in the case of printing plates), it is furthermore advantageous to increase the mechanical strength of the portions of the coating remaining after developing by subjecting them to a heat treatment (what is referred as "baking") and/or overall exposure (e.g. to UV light).
  • a heat treatment what is referred as "baking"
  • overall exposure e.g. to UV light
  • the developed element prior to the treatment, the developed element is treated with a solution that protects the non-image areas such that the heat treatment does not cause these areas to accept ink.
  • a solution suitable for this purpose is e.g. described in US-A-4,355,096 .
  • Baking takes place at a temperature in the range of 150 to 250°C.
  • elements as well as printing plates prepared from radiation-sensitive elements according to the present invention show excellent properties even without having been subjected to a heat treatment.
  • the two treatment steps can be performed simultaneously or one after the other.
  • the radiation-sensitive elements according to the present invention are characterized by excellent stability under yellow light conditions, a high degree of photosensitivity and excellent resolution in combination with good storage stability.
  • the developed printing plates exhibit excellent abrasion resistance which allows a large number of copies.
  • the solution was filtered, applied to the lithographic substrate and the coating was dried for 4 minutes at 90°C.
  • the dry layer weight of the photopolymer layer was about 1.5 g/m 2 .
  • the obtained samples were coated with an overcoat by applying an aqueous solution of poly(vinylalcohol) (Airvol 203 available from Airproducts; degree of hydrolysis: 88%); after drying for 4 minutes at 90°C, the overcoat had a dry layer weight of about 3 g/m 2 .
  • poly(vinylalcohol) Airvol 203 available from Airproducts; degree of hydrolysis: 88%
  • the printing plate precursor was exposed with a tungsten lamp having a metal interference filter for 405 nm through a gray scale having a tonal range of 0.15 to 1.95, wherein the density increments amount to 0.15 (UGRA gray scale) with 1 ⁇ W/cm 2 .
  • the plate was heated in an oven for 2 minutes at 90°C.
  • the developer solution was again rubbed over the surface for another 30 seconds using a tampon and then the entire plate was rinsed with water. After this treatment, the exposed portions remained on the plate.
  • the plate was blackened in a wet state with printing ink.
  • the unexposed printing plate precursors were stored for 60 minutes in a 90°C oven, then exposed and developed as described above (storage stability test).
  • a printing layer was applied to the aluminum foil, as explained above, exposed, heated, developed, and after rinsing with water, the developed plate was rubbed with an aqueous solution of 0.5% phosphoric acid and 6% gum arabic.
  • the thus prepared plate was loaded in a sheet-fed offset printing machine and used for printing with an abrasive printing ink (Offset S 7184 available from Sun Chemical, containing 10% potassium carbonate).

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
EP04713069A 2003-02-21 2004-02-20 Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon Expired - Lifetime EP1595183B1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10307453A DE10307453B4 (de) 2003-02-21 2003-02-21 Oxazol-Derivate enthaltende strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente
DE10307453 2003-02-21
PCT/EP2004/001706 WO2004074930A2 (en) 2003-02-21 2004-02-20 Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon

Publications (2)

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EP1595183A2 EP1595183A2 (en) 2005-11-16
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US7442486B2 (en) 2008-10-28
WO2004074930A3 (en) 2005-02-03
EP1595183A2 (en) 2005-11-16
DE10307453B4 (de) 2005-07-21
BRPI0407697A (pt) 2006-03-01
BRPI0407697B1 (pt) 2012-05-15
DE10307453A1 (de) 2004-09-16
JP2006519405A (ja) 2006-08-24
CN1751270B (zh) 2011-03-09
JP4598755B2 (ja) 2010-12-15
US20060234155A1 (en) 2006-10-19
WO2004074930A2 (en) 2004-09-02
CN1751270A (zh) 2006-03-22

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