EP1549923B1 - Procedes de fragmentation pour spectrometrie de masse - Google Patents

Procedes de fragmentation pour spectrometrie de masse Download PDF

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Publication number
EP1549923B1
EP1549923B1 EP03756376A EP03756376A EP1549923B1 EP 1549923 B1 EP1549923 B1 EP 1549923B1 EP 03756376 A EP03756376 A EP 03756376A EP 03756376 A EP03756376 A EP 03756376A EP 1549923 B1 EP1549923 B1 EP 1549923B1
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electrons
ions
low
rods
multipole
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EP1549923A4 (fr
EP1549923A2 (fr
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Craig M. Analytica of Branford Inc. WHITEHOUSE
David G. c/o Analytica of Branford Inc. WELKIE
Javahery Analytica of Branford Inc. GHOLAMREZA
Lisa c/o Analytica of Branford Inc. COUSINS
Sergey c/o Analytica of Branford Inc. RAKOV
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Revvity Health Sciences Inc
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PerkinElmer Health Sciences Inc
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/06—Electron- or ion-optical arrangements
    • H01J49/062—Ion guides
    • H01J49/063—Multipole ion guides, e.g. quadrupoles, hexapoles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/004—Combinations of spectrometers, tandem spectrometers, e.g. MS/MS, MSn
    • H01J49/0045—Combinations of spectrometers, tandem spectrometers, e.g. MS/MS, MSn characterised by the fragmentation or other specific reaction
    • H01J49/0054—Combinations of spectrometers, tandem spectrometers, e.g. MS/MS, MSn characterised by the fragmentation or other specific reaction by an electron beam, e.g. electron impact dissociation, electron capture dissociation

Definitions

  • This invention relates to the field of mass spectrometry, and specifically to the application of electron-capture dissociation (ECD) or positron-capture dissociation (PCD) within multipole ion guides of mass spectrometers to facilitate the identification and structure of chemical species.
  • ECD electron-capture dissociation
  • PCD positron-capture dissociation
  • Mass spectrometers are powerful tools for solving important analytical and biological problems. For example, mass spectrometers can be used to determine the molecular weight of an ion by measurement of its mass-to-charge (m/z) ratio, while its structure may be elucidated by dissociation methods and subsequent analysis of fragmentation patterns.
  • m/z mass-to-charge ratio
  • the most common useful ion sources for large molecules are atmospheric pressure chemical ionization (APCI), matrix-assisted laser desorption ionization (MALDI) and electrospray ionization (ESI) sources.
  • APCI atmospheric pressure chemical ionization
  • MALDI matrix-assisted laser desorption ionization
  • ESI electrospray ionization
  • the ionization processes used in MALDI and ESI sources may be characterized as gentle, in that molecules become charged without inducing fragmentation, thereby preserving the identity of the sample molecules.
  • Such gentle ionization can be efficiently achieved with MALDI and ESI even for relatively large biomolecules such as proteins, peptides, DNA, RNA, and the like. This capability is in large part responsible for the important role that MALDI and ESI, coupled to mass spectrometers, have come to assume in the advancement of research and development in biotechnology fields.
  • ESI efficiently produces primarily multiple-charged ions (z>1) ( Fenn, et al, Science 246, 64 (1989 )).
  • a very large molecule may be analyzed in conventional mass spectrometers if the molecule can be ionized with multiple charges. For example, if a protein of molecular weight 30,000 Da acquires 10 charges, its m / z value is reduced to 3,000, which is readily measurable with essentially all commonly used mass spectrometers.
  • the multiple-charge ionization of large molecules is one prominent capability of the ESI process, which has resulted in rapid growth of the popularity of ESI sources for the creation of multiple-charge ions of a variety of biomolecules, including small organic molecules, peptides, proteins, and other molecular complexes such as DNA derivatives.
  • Mass spectrometer types that have been configured with ESI sources include Fourier transform ion-cyclotron resonance (FTICR), magnetic-sector, 2-dimensional and 3-dimensional quadrupole ion-traps, quadrupole mass filters, and hybrid instruments consisting of various combinations of these types, as well as others.
  • FTICR Fourier transform ion-cyclotron resonance
  • magnetic-sector magnetic-sector
  • 2-dimensional and 3-dimensional quadrupole ion-traps 2-dimensional and 3-dimensional quadrupole ion-traps
  • quadrupole mass filters and hybrid instruments consisting of various combinations of these types, as well as others.
  • ESI combined with mass spectrometry is the structural identification of peptides, proteins, and other biomolecules with amino-acid residues.
  • Structural analysis is often performed with a so-called tandem mass spectrometer using a technique referred to as MS/MS analysis.
  • a precursor ion of interest is m / z -selected in a first stage of a tandem mass spectrometer, and the selected ion is then fragmented in a second stage to produce product ions.
  • product ions are then m / z- analyzed in a third stage, resulting in a product-ion mass spectrum that represents a fragmentation pattern of the selected precursor ion.
  • tandem instruments may be configured so that the separate stages are either sequential in space, such as multiple quadrupole mass filters arranged coaxially in series, or sequential in time, as with a single three-dimensional ion trap.
  • Deductions about the molecular structure of the precursor ion may then be made from an analysis of the fragmentation pattern observed in the product-ion spectrum.
  • the sequence structure of a protein may be (at least partly) determined from the measured m / z values of the various detected fragment ions, by deducing the sequence of amino acid residues that would have had to exist in the protein precursor ion to produce the observed fragment ions.
  • the ideal situation in this case would be the cleavage of the amine backbone bonds on either side of each amino acid residue in a protein or peptide chain.
  • dissociation occurs by cleavage of any particular chemical bond in a precursor ion depends on many factors, including: the nature of the chemical bond; the amount of energy absorbed by the precursor ion; the modes available in the precursor ion to dissipate energy; and the mechanism by which energy is deposited.
  • CAD collisionally activated dissociation
  • IRMPD infrared multi-photon dissociation
  • both CAD and IRMPD depend ultimately on the excitation of vibrational and rotational states within the precursor ion to cleave chemical bonds, and so the fragmentation patterns resulting from either method naturally tend to be dominated by excitation of the lowest-energy vibrational and/or rotational states. Consequently, cleavage at some bond sites of a particular precursor ion is typically preferred over others within any particular ion.
  • CAD and IRMPD CAD and IRMPD are examples of the probability for dissociation of a precursor ion by cleavage at many of its bond sites. For example, for peptides, cleavage readily occurs at the N-terminal side of a proline residue or the C-terminal side of an aspartic acid, while cleavage seldom occurs at di-sulfide bonds. The net result is that the structural information provided by fragment ion spectra is often insufficient to deduce a complete residue sequence.
  • ECD peptide backbone amine bonds
  • C ⁇ ⁇ N bonds peptide backbone amine bonds
  • di-sulfide bonds of larger proteins readily and selectively fragment, unlike CAD. Consequently, for example, McLafferty et al., in Science 284, 1289 (1999 ), report that, for the 76-residue ubiquitin (8.6 kDa), data from one CAD and two ECD spectra provided complete sequence information. Olsen et al., in Rapid Commun.
  • a second critical requirement is to be able to transport low-energy electrons into the mass spectrometer with good efficiency.
  • a third critical requirement is to retain low-energy electrons in the volume occupied by precursor ions long enough to allow a significant number of interactions to take place between the precursor ions and the low-energy electrons.
  • the successful incorporation of the ECD technique in FTICR instruments is directly related to the relative ease with which low-energy electrons can be readily transported and retained, along with precursor ions, due to the stability of the electrons' motion in the strong magnetic fields of the ICR cell.
  • FTICR instruments are currently relatively expensive, and require specialized skill to operate and maintain. Therefore, it would be of substantial benefit to incorporate the ECD fragmentation technique into more economical, commonly-used types of mass spectrometers, such as triple quadrupole mass spectrometers, quadrupole-time-of-flight mass spectrometers, two-dimensional quadrupole ion traps, and other similar multipole ion guide-based mass spectrometers.
  • mass spectrometers such as triple quadrupole mass spectrometers, quadrupole-time-of-flight mass spectrometers, two-dimensional quadrupole ion traps, and other similar multipole ion guide-based mass spectrometers.
  • multipole ion guide-based mass spectrometers typically utilize only DC and AC (RF) electric fields, that is, without magnetic fields.
  • multipole ion guides are sometimes referred herein as 'RF multipole ion guides', which is to be understood to encompass ion guides that employ both DC and RF voltages, as well as RF-only voltages).
  • 'RF multipole ion guides' which is to be understood to encompass ion guides that employ both DC and RF voltages, as well as RF-only voltages.
  • the stability of motion of a charged particle in such electric fields extends only over a limited range of particle m/z values.
  • the m / z value of an electron is typically a factor of at least five orders of magnitude less than ions with even the lowest m / z value of interest. Therefore, low-energy electrons and precursor ions are hardly likely to be stable simultaneously within the fields of an RF multipole ion guide, in contrast to the situation in an FTICR instrument.
  • electrospray ionization readily produces negative ions as well as protonated positive molecules, and most mass spectrometers have the capacity to routinely analyze and detect both positive and negative ions.
  • the ECD method of fragmentation is not useful for negative ions, since the Coulomb repulsion of same-polarity charge would preclude the close-range interaction of electrons and negative ions. Nevertheless, a fragmentation method similar to ECD would prove to be just as useful for structure analysis of negative ions as ECD appears to be for positive ions. In fact, it is expected that the capture of positrons (electron anti-particles) by negative ions follows a mechanism similar to electron capture in reaction with positive ions.
  • the fragmentation of ions due to capture of positrons may be referred to as 'positron capture dissociation', or PCD.
  • Positrons are stable but relatively short-lived due to their strong reaction with matter.
  • McLuckey et al. in Rapid Commun. Mass Spectrom. 10, 269 (1996 ), has reported that positron capture by organic molecules can occur, and, at positron energy less than about 3 eV, extensive fragmentation of organic molecules was observed. They also noted that the fragmentation efficiency increased as the positron energy decreased, similar to trends observed with ECD fragmentation of positive ions, which seems to suggest that similar mechanisms leading to fragmentation are involved.
  • the apparatus incorporated a Penning trap where close interaction between positrons and organic molecules was achieved in the presence of a 1 T magnetic field over the length of the trap.
  • PCD RF multipole ion guide-based mass spectrometers
  • US 4,988,869 describes a tandem mass spectrometer with a focused electron source provided between a first and a second mass analyzer to provide for dissociation of a parent ion beam into a plurality of daughter ion beams.
  • WO 02/78048 A1 which belongs to the state of the art in the sense of art 54 (3) EPC in application of art 158 EPC 1973, discloses an RF multipole ion guide into which low energy electrons are introduced for performing electron capture dissociation.
  • a precursor ion for fragmentation is most frequently performed with an RF quadrupole ion guide operated in the so-called RF/DC mass filter mode.
  • the selected precursor ions are usually accelerated into a pressurized second multipole ion guide (typically an RF-only multipole collision cell), where they fragment due to collisions with target gas molecules.
  • the collision cell multipole can be a quadrupole, hexapole, octapole, etc. essentially coaxial with the upstream m / z -resolving quadrupole.
  • the rods are mounted in an enclosure in order to establish the desired target gas pressure within the collision cell, while maintaining a low pressure in surrounding regions.
  • Two electrodes with apertures are positioned in the entrance and the exit of the collision cell to restrict outflow of gas while allowing ions to pass in and out of the cell.
  • a third m/z analyzer then measures the m/z spectrum of the resulting fragment, or product, ions.
  • this third m / z analyzer is another RF/DC mass filter
  • the overall configuration just described is referred to as a 'triple-quadrupole' configuration.
  • the third m / z analyzer may be a time-of-flight mass spectrometer (TOF-MS), in which case, the overall configuration is referred to as a 'QqTOF' configuration.
  • TOF-MS time-of-flight mass spectrometer
  • Other types of m / z analyzers may be used for m / z selection of precursor and product ions, as well.
  • the ECD technique is best incorporated into such multiple ion guide arrangements in the vicinity of the collision cell, that is, after the precursor ions have been selected for dissociation, and before the m/z analyzer that will measure the fragment ions.
  • the challenges that need to be surmounted in order to achieve effective and efficient ECD in a multipole ion guide include the same ones that were discussed above in conjunction with the implementation of ECD in an FTICR instrument.
  • the first requirement is the production of a large flux of low-energy electrons in the energy range of ⁇ 0.2 to about 5 eV.
  • a second requirement is to be able to transport such low-energy electrons into the multipole ion guide, or otherwise, the region where ECD fragmentation is intended, with good efficiency.
  • low-energy electrons may be produced in the intended vicinity of fragmentation.
  • a third requirement is to retain low-energy electrons in the volume occupied by precursor ions long enough to allow a significant number of interactions to take place between the precursor ions and the low-energy electrons.
  • a pressurized RF multipole ion guide provides an attractive environment for efficient ECD because ions are forced to move with low velocity due to collisional cooling effects.
  • Douglas, et al. in U.S. Patent No. 4,963,736 , teach that RF multipole ion guides operating at elevated pressures provide an effective means to achieve reduced ion kinetic energy. Ion collisions with the neutral background gas serve to reduce the radial and axial velocity components of the ion due to momentum changing collisions. As the ions lose most of their radial and axial energy due to such collisions in the presence of the RF field, they tend to coalesce near the axis of the collision cell.
  • the reduction of ion velocity in a pressurized collision cell leads to an increase in low-energy electron capture efficiency.
  • the electron capture efficiency is also increased due to the electrostatic potential well created near the collision cell axis by the space charge of the coalesced ion population.
  • the space charge well creates an attractive potential for the slow electrons and serves to draw them toward the higher density ions.
  • reaction efficiency can be further enhanced by electrostatic trapping in an RF multipole ion guide as taught by Whitehouse, et al., in U.S. Patent No. 6,011,259 .
  • electrostatic trapping an axial field gradient is applied that reverses the ion velocity ions in the regions of the exit and entrance of an RF multipole ion guide. Reactions are most efficient when the ions and electrons have very low relative velocity, which can occur in the vicinity of velocity reversal of the ions in the repulsive electric fields.
  • Utilizing methods of electron reversal in electric fields can produce a high flux of low-energy electrons.
  • Electrostatic focussing of the electron beam can be arranged such that electrons undergo velocity reversal in the RF multipole ion guide. At these points the electrons have near-zero energy.
  • a preferred configuration permits overlap in space of the low velocity ions with the near-zero energy electrons.
  • Dispenser cathodes are useful when low temperature, high current density electron emission is desired, and typically are constructed from doped porous tungsten metal with oxide coatings. Materials with wide band gaps, including but not limited to magnesium oxide, silicon carbide, aluminum oxide, and aluminum nitride, also are used for emission of electrons from surfaces. They exhibit the property of negative electron affinity (NEA), whereby the vacuum level of the material lies below the bottom of the conduction band. In this case no energy barrier prevents low-energy electrons from escaping into the vacuum. Lasers of appropriate wavelength can also be used to induce electron emission from surfaces.
  • NAA negative electron affinity
  • High intensity positron sources can be generated using an particle accelerator, by colliding a high energy electron beam (100 MeV) with a platinum or tungsten surface. When the electron beam impinges on the target, it decelerates and generates highly energetic photons. These photons interact with the electric field of the target nuclei and produces electron-positron pairs. Then normal optics are used to accelerate positrons and reject electrons.
  • Low energy positron beams can be produced relatively inexpensively using radioactive substances such as 22 Na. 22 Na emits beta particles (with energy of 554 keV). A solution of 22 NaCl is deposited on a thin layer of Kapton. The layer is encapsulated with tungsten, and reaction occurs that produces positrons in a range of energies from 0.2 eV to 100 eV.
  • Each embodiment comprises a source of electrons or positrons.
  • the source of electrons includes, but is not limited to, appropriate electron transfer optics in combination with: a heated filament; an indirectly heated cathode dispenser; photosensitive materials in combination with a photon source; wide band-gap materials in combination with applied voltages; a commercially obtained electron gun; and any of the electron sources mentioned above.
  • Each embodiment also contains at least one multipole ion guide, with or without electrostatic trapping.
  • Each embodiment contains apparatus and methods for the production of low-energy electrons, the introduction of the low-energy electrons into a multipole RF ion guide configuration, and the sustained interaction of low-energy electrons or positrons with positive or negative ions, respectively.
  • a two-dimensional multipole ion guide may be comprised of a set of 4 rods (quadrupole), 6 rods (hexapole), 8 rods (octapole) or greater numbers of rods arranged symmetrically about a common axis. In some cases it is preferable to fill the ion guide with background gas.
  • a quadrupole ion guide for example, to yield a narrower beam of ions on axis, or as another example, to permit mass-to-charge selection.
  • a higher order multipole may be used.
  • API sources include but are not limited to Electrospray (ESI), Matrix-Assisted Laser Desorption and Ionization (MALDI), Inductively Coupled Plasma (ICP) and Atmospheric Pressure Chemical Ionization (APCI) sources.
  • Ion sources that operate in vacuum or partial vacuum include, but are not limited to, chemical Ionization (CI), Electron Ionization (EI), Fast Atom Bombardment (FAB), Flow FAB, Laser Desorption (LD), Matrix Assisted Laser Desorption Ionization (MALDI), Thermospray (TS) and Particle Beam (PB).
  • the embodiments of the invention can be interfaced to continuous-flow single and triple quadrupole ion guides, two-dimensional ion traps, three dimensional ion traps, magnetic sector, FTICR, time-of-flight, and hybrid quadrupole-TOF mass analyzers, or to any combination of these.
  • the embodiments described herein utilize the phenomenon of radial and axial compression in a pressurized RF multipole collision cell. Ions that are introduced into an RF multipole collision cell experience a dramatic reduction in their velocity due to momentum changing collisions with the neutral background gas in the RF field. As the ions lose most of their radial and axial velocity in the presence of the RF field, they converge to the centerline of the collision cell. The spatial focus of the ions creates an attractive potential for slow electrons and serves to draw them toward the higher density ions.
  • the embodiments described below also utilize the advantages of trapping the ions in the collision cell. (Trapping is accomplished by providing repulsive barriers at the exit and entrance). Trapping is utilized for a number of reasons. First, the ions are given enough time to undergo a large number of collisions, which is required in order to focus them near the centerline of the axis of the RF multipole collision cell, where the RF field is zero. Any charged particle introduced in or very close to the zero field of the RF field has a stable trajectory, because they will not be influenced in any way by the field. Second, the electrons can be introduced into the RF multipole collision cell in such a way as to permit a focus along the centerline.
  • Electrons that reside in close vicinity to the ions for a sufficient period of time undergo reaction.
  • electrostatic lenses can be arranged such that velocity reversal of both ions and electrons can be utilized in the trapping field, minimizing their relative velocity and enhancing the electron capture efficiency.
  • the electron flux may be low and it may be necessary to irradiate the ions with electrons for a period of time longer than a typical flight through a pressurized ion guide.
  • the reaction time for electron capture is fast, the ion may need time to rearrange prior to fragmentation. Thus the yield of fragments may depend on the excess time given to the fragmenting ion prior to exiting the collision cell.
  • trapping the ions is helpful because it is sometimes preferable to pulse the focussing optics. For example, it is sometimes preferable to pulse the RF off temporarily to permit the electrons to enter an RF-free multipole collision cell. By first thermalizing the precursor ions to the center of the cell, more time is required for precursor ions and their fragments to respond to the pulsed field.
  • One embodiment of the present invention includes the pulsed injection of electrons onto the axis of a pressurized RF multipole collision cell.
  • An electron source is positioned behind an RF multipole collision cell, between two lenses, and at an angle from the axis of the collision cell, typically near 90 degrees.
  • the electrons are pulsed onto the centerline of the RF multipole ion guide, where the RF field is adjusted to be close to zero.
  • the voltages on the lenses are adjusted in such a way as to cause the electron to undergo velocity reversal along the axis of the ion guide. This is accomplished by applying appropriate DC or pulsed voltages within the electron source, on the RF multipole electrodes, and on the entrance and exit lenses.
  • the ions are trapped within the RF multipole collision cell, and undergo velocity reversal. Voltages are arranged to permit maximum overlap of the electron and ion density.
  • An alternative configuration includes positioning an electron source on axis, in the region behind the RF multipole collision cell, in a volume between two lenses, to enhance the number of electrons with velocity components that are coaxial with the RF multipole collision cell.
  • Another embodiment of the invention includes a weak magnetic field of several milliTesla, along the axis of an RF multipole collision cell.
  • the magnetic field aids to compress the electron radial velocity, discouraging the electrons from escaping the centerline.
  • Yet another embodiment includes the pulsing the RF field off and on at regular intervals, to reduce electron scattering losses as the electrons are injected into the RF multipole collision cell.
  • Yet another embodiment includes a magnetic field aligned radially with respect to the axis of the RF multipole ion guide. Yet another embodiment includes adjustment of the RF balance on the multipole ion guide or collision cell.
  • Another embodiment of the invention comprises sequential collision cells and injection of electrons in an essentially field-free region between the exit of the first collision cell and the entrance of the second collision cell.
  • Another embodiment of the invention further enhancing the flux of low-energy electrons, comprises the injection of an electron or positron beam in the elongated space between one A pole and one B pole of a quadrupole rod set.
  • An alternative configuration of this embodiment comprises the injection of an electron or positron beam in the elongated space between one + pole and one - pole of a multipole rod set.
  • Another embodiment comprises collision cell rods with thin wires or meshed conducting materials, positioning an electron source behind the meshes.
  • Another embodiment comprises a light source or a laser to induce electron emission from a photosensitive surface.
  • a laser beam is aimed at the surface, preferably at an angle to permit multiple passes.
  • the surface is positioned behind the collision cell and the laser strikes the surface orthogonal to the axis of the RF multipole collision cell.
  • Another embodiment utilizes a fast ion beam source is used to eject electrons from a surface.
  • Another embodiment comprises the injection of an ion beam into the multipole volume and the simultaneous injection of an electron beam into the volume, at some angle between 0 and 90 degrees.
  • Another embodiment comprises an orthogonal ion source positioned behind the RF multipole collision cell, useful for ion-ion interactions.
  • the ions are turned and directed inward, to the center of the collision cell.
  • Another embodiment comprises an orthogonal ion source positioned in between two RF multipole collision cells, useful for ion-ion interactions in a continuous flow device.
  • the ions are produced and injected orthogonal to the axis, and undergo collision with the precursor ion beam in a cross-beam fashion.
  • the invention can involve the utilization of a pressurized RF multipole ion guide.
  • the pressure within the ion guide also impacts the yield of electron capture.
  • the yield depends on the specific conditions employed, including but not limited to the precursor ion to be fragmented, the required electron flux, and whether CAD is desired to occur simultaneously. Therefore, in the embodiments described below, the pressure can vary over the range such that the number of ion-neutral collisions varies from 1 to >50.
  • Ions are produced in atmospheric pressure ion (API) source 1, and are transported through: various vacuum stages 6 of decreasing pressure; RF multipole ion guide 7; RF/DC quadrupole mass filter 2; RF multipole collision cell 3 containing target gas 4; RF multipole ion guide 24; and TOF m / z analyzer 6.
  • Mass filter 2 is driven by RF/DC power supply 8.
  • a set of ions of one particular m / z is selected and transmitted into RF multipole collision cell 3, typically held at an elevated pressure with respect to mass filter 2.
  • RF multipole collision cell 3 is powered by an RF power supply 9 that provides oscillating voltage to the pairs of electrodes.
  • RF multipole collision cell 3 may comprise a quadrupole rod set 10 containing four cylindrical electrodes with rounded surfaces, illustrated in Figure 1B .
  • Rod set 10 is electrically configured such that the electrodes positioned 180 degrees are electrically connected and form an electrode pair, for example electrodes 13 form a pair and electrodes 14 form a pair.
  • the two electrode pairs have opposite RF polarity; for example, if negative voltage is applied to electrode pair 13, then a voltage equal in magnitude but positive in polarity is applied to electrode pair 14.
  • a common DC bias voltage 15 defines the reference voltage for the RF waveforms applied to the rods.
  • Capacitance device 16 is used to adjust the RF balance on the electrodes, to optimize the RF field.
  • the DC potential on centerline 17 is determined by DC bias voltage 15. Ideally the RF field on centerline 17 is zero.
  • RF multipole collision cell 3 is equipped with lens 11 at the collision cell entrance and lens 12 at the collision cell exit.
  • the voltage on lens 11 is adjusted to transfer ions from mass analyzer 2 into the collision cell 3.
  • the voltage on lens 12 is set repulsive with respect to DC bias voltage 15 to prevent the ions from exiting RF multipole collision cell 3 through an orifice in lens 12.
  • the pressurized collision cell is held at a potential given by the DC bias voltage 15.
  • the pressure of collision gas 4 is variable from 1.3 mPa to 26 Pa (from 0.01 mTorr to 200 mTorr).
  • lens 11 is set repulsive with respect to the DC bias voltage15 such that ions can neither enter nor exit the RF multipole collision cell 3.
  • the ions then traverse the length of the RF multipole collision cell 3 in a multi-pass fashion and compress to a volume along centerline 17 where the RF field is zero.
  • a capacitance device 16 may be required to perfectly balance, or optimize, this field.
  • the DC field on centerline 17 is repulsive to the ions near lens 11 and lens 12, yielding ion velocity reversal near points 18 and 19.
  • the DC voltages applied to lens 11 and lens 12 determine the location of the points.
  • Lens 20 is positioned behind lens 12, with gap 21 of sufficient width to contain electron source 5 yet still prevent ion losses during ion extraction into RF multipole ion guide 24. Gap 21 may be held at a lower pressure than that of RF multipole collision cell 3. Lens 20 is set to the same voltage as lens 12.
  • an electron source 5 of appropriate diameter is positioned orthogonal but close to the centerline 17.
  • Casing 22 surrounds the electron source and is held at the same potential as lens 12 and lens 20.
  • the electron source may be of a type that includes, but is not limited to: a heated filament; an indirectly heated cathode dispenser; photosensitive materials in combination with a photon source; a commercially obtained electron gun; and so on.
  • the electron source is configured to optimize the flux of low-energy electrons directed toward the centerline 17.
  • Electrons emitted from the electron source enter the field free region defined by lens 12, lens 20 and enclosure 22. At some time t 3 the electrons are injected into the RF multipole collision cell 3 by pulsing the voltage on lens 20 to a value slightly more negative potential to that on lens 12. Electrons with appropriate velocity are pulsed near centerline 17 of RF multipole collision cell 3 and are focussed on centerline 17 by the voltage combination of lens 12 and DC bias voltage 15 on RF multipole collision cell 3. The value of the voltage on lens 20 determines the extent to which the ions are accelerated into the field, and can be chosen such that, at some turning point 23, the field on axis 17 becomes repulsive to the electrons. In regions near this point the ECD yield is high.
  • Lens 12 and lens 20 are constructed of mesh lenses or aperture lenses. Alternative lens arrangements can be employed in this region to optimize the flux of low-energy electrons in this region.
  • Lens 20 is pulsed at a high rate, typically 1-5 MHz.
  • the voltages on lens 20 and lens 12, and the DC bias voltage 15, may be varied in a repetitive fashion to permit overlap between the low energy electron beam and low energy ion beam at different points along centerline 17. In some cases it may be preferable to transmit a continuous beam of electrons onto centerline 17, for example if the physical dimensions of the electron source are very small such that the electrons are produced very close to centerline 17.
  • FIG. 1C Another configuration of a preferred embodiment is illustrated in Figure 1C , and includes the addition of a magnetic field to enhance the axial capture of slow electrons. Electrons are introduced by means of electron source 25. Solenoid 26 of several thousand turns/m is wound around an RF multipole collision cell enclosure 27 producing magnetic field 28. The material of enclosure 27 is transparent to the magnetic field. A current of several amps is passed through the solenoid to generate magnetic field 28 on the order of 5-10 milliTesla. The magnetic field is directed parallel to centerline 17 of the RF multipole collision cell. The current applied depends on the radial dispersion of the electron beam. Electrons with velocity perpendicular to the magnetic field vector rotate about the magnetic field lines.
  • Solenoid 26 is optimized to produce an electron orbit radius of less than 0.5 mm. Heat may be removed from the solenoid by use of a small portion of cooling gas into inlet 29. The ions are sufficiently slow that their orbit radius is very small, sub-micron, and are essentially not affected by the magnetic field.
  • Another mode of operating the preferred embodiment illustrated in Figure 1A includes the ability to rapidly turn the RF voltage off during the injection of the electrons. This prevents possible repulsion from the axis of electrons with radial velocity components.
  • the RF voltage can be reduced to zero in a relatively short time (commercially available RF power supplied are available, e.g., from R.M. Jordan Co., that can reduce the RF voltage to essentially zero in 1/2 of an RF cycle).
  • the RF voltage While the RF voltage is off, electrons may enter the collision cell and react with ions.
  • the RF voltage may then be turned back on after several us, for a period of time permitting the fragments to thermalize and be focused on centerline 17. This sequence may be repeated for a number of cycles, after which the resulting fragment ions are release for mass analysis.
  • Another configuration of the preferred embodiment above includes magnetic field confinement in axial and radial directions. This configuration also includes the ability to inject electrons into RF multipole collision cell 3 prior to injecting the ions. The RF voltage on the RF multipole collision cell 3 is held off during the injection of electrons. During this time the electrons are compressed axially by the magnetic field in three dimensions. After a sufficient fill time of electrons, the ions are then injected into RF multipole collision cell 3 and the RF voltage is slowly ramped on to provide confinement for the precursor and fragment ions.
  • Figure 1D illustrates yet another configuration of the preferred embodiment above, whereby electron source 30 is positioned close to lens 20 behind lens 12. A spray of electrons is released from electron source 30 and voltages are arranged such that the electrons are focused on centerline 17 and undergo velocity reversal near turning point 23.
  • FIG. 2 A detailed illustration of the preferred embodiment of Figure 1 is illustrated in Figure 2 .
  • liquid sample is introduced into ES probe 31 using a liquid delivery system, for example a separation system such as liquid chromatography.
  • the ES source 32 is operated by applying potentials to cylindrical electrode 33, endplate electrode 34 and capillary entrance electrode 35.
  • Counter current drying gas 36 is directed to flow through heater 37 and into the ES source chamber through endplate nosepiece 38 opening 39.
  • Bore 40 through dielectric capillary tube 41 comprises an entrance orifice 42 and exit orifice 43. Ions enter and exit the dielectric capillary tube with potential energy roughly equivalent to the entrance and exit electrode potentials respectively.
  • ES probe 31 remains at ground potential during operation.
  • the polarity of electrodes 33, 34 and 38 are reversed with ES probe 34 remaining at ground potential.
  • electrosprayed charged droplets are produced.
  • the charged droplets exiting ES probe tip 44 are driven against the counter current drying gas 36 by the electric fields formed by the relative potentials applied to ES probe 31 and ES chamber electrodes 33, 34, and 38.
  • a nebulization gas 45 can be applied through a second layer tube surrounding the sample introduction first layer tube to assist the formation of droplets. As the droplets evaporate, ions are formed and a portion of these ions are swept into vacuum through capillary bore 40. The droplets are entrained in neutral background gas that forms a supersonic jet, expanding into vacuum from capillary exit orifice 43.
  • a portion of the ions entering first stage vacuum 46 is directed through the skimmer orifice 47 and into second vacuum stage 48.
  • Ions are transported through RF multipole ion guide 7 into a third vacuum stage 50 and into resolving RF/DC quadrupole mass filter 2.
  • a particular m/z value (or set of values) is selected from the ion beam, and ions of other m/z values are ejected.
  • the selected ion is then transported into the pressurized RF multipole collision cell 3 where they are trapped by proper adjustment of lens 11 and lens 12. They are collisionally damped to centerline 17.
  • Electron source 5 generates low-energy electrons that are injected along the axis of RF multipole 3 as discussed above.
  • the ion undergoes electron capture reaction induced by the injection of low-energy electrons into RF multipole collision cell 3.
  • the ion may also undergo conventional collisionally activated dissociation (CAD) such as axial acceleration CAD, whereby the ions are accelerated into a high pressure region, typically as they are transported through collision cell 3. This is achieved by applying acceleration potential between mass filter 2 and RF multipole collision cell 3.
  • CAD collisionally activated dissociation
  • the ions may undergo conventional CAD followed by electron capture, or the ion may proceed without further fragmentation. Additional methods of fragmentation, including additional stages of fragmentation, such as resonant excitation as taught by Whitehouse, et.al. may also be accomplished in the RF multipole collision cell 3.
  • the resulting fragment and precursor ions are extracted from RF multipole collision cell 3 and are transported through RF multipole ion guide 24, which is positioned in two vacuum stages, 50 and 51, and serves as a conductance limiting tube separating stage 50 and 51. Pressure continually drops across its length.
  • the ions may be trapped in RF multipole ion guide 24, and rapidly pulsed out, to improve duty cycle as taught by Whitehouse.
  • other forms of CAD may be carried out in this region, for example resonant excitation CAD or even ECD.
  • the ions are focused through lens 120 and orifice 121 into the TOF 5 and TOF pulsing region 122.
  • the TOF is positioned in another vacuum region 123.
  • the product ions are transported into the pulser region 122 and pulsed into the flight region 123, where they are separated in time and detected by microchannel plate 124.
  • the resulting signal is sent to a digital signal averager 125 for amplification and analysis.
  • FIG. 3 Another preferred embodiment is illustrated in Figure 3 .
  • This embodiment comprises injection of low-energy electrons into RF multipole ion guide 52, which is positioned behind RF multipole collision cell 3.
  • RF multipole ion guide 52 is constructed of appropriate diameter and length to restrict the conductance between RF multipole collision cell 3 held at pressure 56, and the evacuated region 57.
  • the junctions 58 and 59 are vacuum seals.
  • RF multipole ion guide 52 restricts flow from evacuated region 57 into evacuated region 62.
  • the junctions 60 and 61 are vacuum seals.
  • Low-energy electrons generated by source 53 are injected along the axis of RF multipole ion guide 52.
  • Voltages are arranged on lenses 55, 54, and electron source 53, DC voltage bias on RF multipole ion guide 52, and DC voltage bias 15 on RF multipole collision cell 3 such that electron velocity reversal occurs near point 76. Near point 76, there are still a sufficient number of collisions to contain the fragment ions in RF multipole ion guide 52.
  • Other electron source configurations as described above can be utilized, such as injection of electrons through the space between the rods on RF multipole ion guide 52.
  • This embodiment has the advantage of producing thermalized precursor ions in RF multipole collision cell 3, and efficiently transporting them RF multipole ion guide 52 where low-energy electrons are injected in a lower pressure region 58.
  • FIG. 4 Another example, useful for understanding the invention, as illustrated in Figure 4 , comprises electron sources 62 and 63 positioned within RF multipole collision cell 3.
  • electron sources 62 and 63 are positioned close to the lens 12 and lens 11, respectively, of RF multipole collision cell 3.
  • a spray of electrons is injected toward centerline 17.
  • Voltages are arranged on lenses 11, 12, 64 and 65, bias voltage 15, and on the casing of electrons sources 62 and 63, such that low-energy electrons are focussed onto centerline 17 and undergo velocity reversal near points 23 and 66.
  • FIG. 5 illustrates another embodiment of the invention.
  • two RF multipole ion guides 203 and 214 are positioned so that ions exiting ion guide 203 move in the direction toward the entrance of ion guide 214, and will cross gap 225 accordingly.
  • Ion guide 203 is an integral component of collision cell 205, which comprises enclosure 204, entrance electrode 201 with entrance aperture 202, exit electrode 206 with exit aperture 207, as well as multipole ion guide 203.
  • the gas pressure within collision cell 205 may be adjusted by leaking in gas from an external gas source (not shown) through a valve (not shown) connected to a gas inlet (not shown) to the enclosure 204.
  • Assembly 216 comprises enclosure 215, entrance electrode 212 with entrance aperture 213, exit electrode 217 with exit aperture 218, and multipole ion guide 214. Assembly 216 may or may not be utilized as a collison cell. When assembly 216 is usd as a collision cell, the gas pressure within assembly 216 may be adjusted independently from the adjustment of the gas pressure of collision cell 205, by leaking in gas from an external gas source (not shown) through a valve (not shown) connected to a gas inlet (not shown) to the enclosure 215.
  • RF/DC quadrupole mass filter assembly 200 is shown schematically in Figure 5.
  • the exit of mass filter 200 which is typically a so-called Brubaker lens assembly comprising a short RF-only section following the actual mass filter assembly, is positioned immediately adjacent to the entrance aperture 202 of entrance electrode 201 of collision cell 205.
  • Precursor ions that are m / z -selected in mass filter 200 are accelerated (gently, so as to avoid CAD) through aperture 202 and enter ion guide 203, which is operated as in RF-only mode for transmitting a wide range of m/z values.
  • the ions Due to low-energy collisions with background gas as the ions traverse ion guide 203, the ions lose kinetic energy and, by the time the ions reach exit aperture 207, the thermal energy of the ions is typically equilibrated to the temperature of the background gas.
  • ions are accelerated on their approach to exit aperture 207 due to potential difference between the DC offset bias of ion guide 203 and the voltage of exit electrode 206.
  • the kinetic energy of the ions needs to be reduced following this extraction acceleration.
  • the ions are then decelerated as they pass through exit aperture 207 toward opening 209 in electrode 208 due to a retarding field between electrode 206 and electrode 208 established by their different applied voltages.
  • Opening 209 may be a simple aperture, or may comprise a highly transparent mesh (e.g., a 70 line/inch mesh with 90% transparency is available commercially from Buckbee-Meers Corporation), as depicted in Figure 5 , in order to maintain region 224 field-free.
  • a beam of low-energy electrons is provided in region 224 as well.
  • the precursor ions and low-energy electrons overlap and interact in region 224, resulting in fragmentation of precursor ions via ECD.
  • the resulting product ions, as well as any remaining precursor ions continue through field-free region 224 and pass through opening 211 in electrode 210. They are then accelerated by an electric field due to a difference in the voltages applied to electrodes 210 and 212, and continue through aperture 213 into the entrance region of ion guide 214.
  • Ion guide 214 may be an RF/DC mass filter, which may be used for m / z analysis of the precursor and product ion m / z distribution.
  • a detector that produces a signal in response to a flux of ions exiting through aperture 218 in exit electrode 217 would be located proximal to the ion beam exit side of aperture 218.
  • a record of this signal as a function of the m/z value of the ions transmitted by the mass filter would constitute the measured product ion spectrum (along with any remaining precursor ions.
  • the assembly 216 may also be used as a collision cell.
  • target gas would be admitted into enclosure 215 to the desired pressure
  • ion guide 214 would be operated in RF-only mode, and the ions would experience collisional cooling as described above.
  • the ions exit ion guide 214 via exit aperture 218 in exit electrode 217, and, hving a reduced kinetic energy and energy spread due to collisional cooling, may be optimally focussed into a subsequent m/z analyzer, such as another RF quadrupole mass filter, a TOF-MS, etc., for analysis of the ECD product ion m / z distribution.
  • a subsequent m/z analyzer such as another RF quadrupole mass filter, a TOF-MS, etc.
  • electrons are produced by electron emitter 219, which is shown schematically in Figure 5 as a filament, but could also be any of a number of well-known electron emitters. Electrons emitted by electron emitter 219 are accelerated through emission aperture 226 in Wehnelt electrode 220 due to the potential difference between the electron emitter 219 and extraction electrode 227. The voltage applied to the Wehnelt electrode 220 may be positive or negative with respect to the bias voltage of the emitter 219, as needed, to properly regulate the electron emission current. The electrons are then focused into a beam and steered by electric fields established by voltages on electrodes 221, 222, 208, and 210, as is well-known to those skilled in the art.
  • the electrons As the electrons travel from emitter 219 to the region 229 enclosed by electrodes 208 and 210, the electrons are first accelerated to a relatively high energy, i.e., at least a few tens of electron-Volts (eV) in order to attain maximum electron transport efficiency.
  • eV electron-Volts
  • the electron energy ultimately needs to be reduced to the energies required for performing ECD, i.e., from about 0.2 eV upwards of 5 eV or so.
  • the electrons are decelerated to their final low kinetic energy upon reaching the essentially field-free region 229 enclosed by electrodes 208 and 210.
  • the kinetic energy of the electrons upon reaching the field-free region 229 is determined by the potential difference between the potential at region 229, as defined primarily by the voltages applied to electrodes 208 and 210, and the bias voltage applied to the emitter 219.
  • the space enclosed by electrodes 208 and 210 extending from region 229 to region 224 and beyond is maintained field-free to ensure that no additional external forces act to divert the low-energy electrons from the path between region 229 and region 224.
  • Region 224 is the region where ECD of precursor ions will occur.
  • a small differential between the voltage applied to electrode 208 and the voltage applied to electrode 210 may sometimes be beneficial in optimizing the overlap between the electron distribution and the precursor ion distribution. Electrons that do not interact in region 224 continue on to region 230.
  • Region 230 is located near electrode 223 which has a voltage applied that is slightly negative with respect to the electron emitter bias. Therefore, electrons reaching the vicinity of electrode 223 will not quite have enough kinetic energy to surmount the potential barrier that this slightly negative potential represents for these electrons. Thus, they will reverse their trajectories, and, if not lost to the surfaces of surrounding electrodes due to field de-focusing effects, will return to region 224, where they will again have the opportunity to interact with precursor ions.
  • the nominally field-free beam path from region 229 to region 224 ensures that many low-energy electrons reach region 224 successfully. Nevertheless, the transport efficiency for electrons of such low energy is reduced by a number of effects that are difficult to control, such as space-charge broadening in the electron beam, local charging of surfaces along the beam path, residual magnetic fields, as well as the earth's magnetic field, etc. Therefore, a number of improvements over the embodiment sketched in Figure 5 are envisioned, all being within the scope of the present invention.
  • One such improvement would be to arrange the beam forming and transport electrodes, and the voltages applied to them, along the electron beam path from the emitter to immediately before region 224, such that the kinetic energy of the electrons in the beam remained high until just arriving at region 224, at which point they are rapidly decelerated to their final low energy immediately upon arriving at region 224. This may easily be accomplished by the addition of grids that separate the two regions of different potential, according to methods that are known to those skilled in the art.
  • Another improvement is the addition of a relative weak magnetic field (a few hundred gauss or so) arranged so the the magnetic field lines are more-or-less along the electron beam path and extend from the electron emitter to at least the axis of the collision cell.
  • a relative weak magnetic field a few hundred gauss or so
  • This is a well-known approach often used in the design of electron-impact ion sources for enhancing electron transport efficiency, since electrons of low energy tend to follow such magnetic field lines in spite of the presence of mild electric fields.
  • Such a weak magnetic field is expected to have negligible effect on the transport of ions in region 224 due to their much larger m / z value and much lower velocity.
  • Still another enhancement of the electron transport efficiency from region 229 to region 224 is to arrange the voltage differential between the electron emitter 219 and the field free region 229 such that the electron kinetic energy at region 229 is still relatively high.
  • the kinetic energy of the electrons may be reduced substantially by maintaining the volume enclosed by electrodes 208 and 210 at a relatively high gas pressure, so that collisions between the energetic electrons and background gas molecules result in sufficient kinetic energy by the time they arrive at the region 224.
  • the volume that includes regions 229, 224, and 230 may be more completely enclosed than is indicated in Figure 5 , which would result in elevated gas pressure due to gas flowing from the collision cells through orifices 207 and 213.
  • a separate gas source may be configured to elevate the gas pressure in this volume.
  • enclosures 204 and 215 may be configured to include a re-entrant cavity or recess wide enough and deep enough to accommodate electron source 219 and associated beam formation and transport electrodes 220, 227, 221, and 222, within the recess. This has the effect of reducing the distance over which the low-energy electron beam must traverse before arriving at region 224, resulting in a greater low-energy electron transmission efficiency.
  • the relatively high efficiency that is expected from this arrangment stems from the combination of a number of unique and novel features: 1) the substantial reduction in ion kinetic energy due to the previous collisional cooling results in a longer interaction time with low-energy electrons; 2) the establishment of an interaction region that is free of electric fields results in longer residence times for both low-energy electrons and ions, and allows mutual Coulomb attraction forces to be more significant in increasing the frequency and effectivenes of interactions between the ions and electrons; 3) the establishment of an interaction region in close proximity to the exit region of the collision cell implies that cooled precursor ions have very little time to disperse due to space charge effects once they leave the confining action of the RF fields of the collision cell, resulting in a greater probability of interaction with low-energy electrons; 4) in case a magnetic field aligned with the electron beam is used to prevent distortion and dispersion of the low-energy electrons before they arrive at the ion-electron interaction region 224, more electrons arriving at this region results in greater interaction efficiency.
  • the collision cells 205 and/or 216 of the embodiment illustrated in Figure 5 may also be operated in trapping mode. In this way, the ions are provided sufficient time to collide with the collision gas and cool to the temperature of the target gas before reaction.
  • the RF multipole collision cell 216 may be pressurized by addition of the same or different collision gas as the first RF multipole collision cell 205. Fragment ions in RF multipole collision cell 216 can continue their migration through collision cell 216, or they may be trapped, cooled and/or even further fragmented, before being released for m / z analysis.
  • FIGs 6A through 6E Another preferred embodiment is illustrated in Figures 6A through 6E , and comprises the introduction of an electron beam between the electrode structures of an RF multipole collision cell, with the electron source positioned above and/or between the poles of the electrode structure. Ions are generated, transported and mass-selected conventionally as described above. Electron source 77 is configured to provide emission along the length of the electrodes. Electrons are injected in the space between the rods, and along the length of the rods, as illustrated in Figures 6A and 6B . In this schematic representation, an RF quadrupole ion guide is utilized, as shown in Figures 6C and 6D , although, again, an RF ion guide with a different number of rods could be used as well.
  • the collision cell quadrupole consists of 4 rods 78, 79, 80 and 81 (round or hyperbolic) mounted coaxial with a circumscribed radius 82, as illustrated in Figure 6C .
  • One set of opposite pairs of rods 79 and 81 is connected together to form the A pole and the other set of rods 78 and 80 is connected to form the B pole.
  • an RF voltage is applied to each pole with a 180-degree phase shift producing a quadrupolar field.
  • the potential at point 83 in the center of the rods is adjusted to be close to zero, (assuming the DC reference voltage is zero).
  • the RF voltage alternates from Vp to 0 to -Vp and back again, on the A pole, and from -Vp to 0 to Vp, and back again, on the B pole.
  • Typical RF frequencies are in the range of 250 kHz to 2 MHz.
  • the voltage repeats its cycle every 4 us, and achieves a field-free or nearly field-free region within the ion guide volume every 2 us.
  • Lines 87 on Figure 6D illustrate the window of time ⁇ t for which electrons can pass through the rods and traverse centerline 85.
  • a sinusoidal field is given by V o sin ( ⁇ t) and the rate of change of the voltage is - ⁇ V o cos( ⁇ t).
  • the duty cycle in the case of a 250 kHz frequency is ⁇ t/2us.
  • FIG. 7A and 7B Another preferred embodiment of the invention comprises a multipole rod structure constructed of semi-transparent thin wires or meshed conducting materials 92. This is illustrated in Figures 7A and 7B .
  • the mesh assembly 93 comprises 4 electrodes, 94,95,96 and 97. As above, opposite pairs of electrodes are electrically connected to form the pairs A pole and B pole.
  • Electron source 98 is positioned within the mesh rods. The alternating nature of the RF voltage is utilized for introduction of the electron beam into the RF collision cell. The potential difference between the voltage on electron source 98 and the potential surface near centerline 17 determines the kinetic energy of the electron as it traverses inward, toward centerline 17. The voltages applied to the poles determine the potential surface near centerline 17.
  • the potential rapidly changes from the positive value at the electrode surface, to close to zero at the centerline. This field is repulsive to the electrons, and they decelerate as they move toward centerline 17.
  • the voltages of electron source 98 are adjusted differently for the two cases, and also take into account the DC bias voltage 15 on RF multipole collision cell 3 from Figure 1 , to maximize the density of low-energy electrons near centerline 17.
  • the balance of the electrode pairs can be adjusted using capacitance device 16 of Figure 1 to optimize the electric fields near centerline 17.
  • FIG. 8A , 8B and 8C Another example useful in understanding the invention comprises an RF multipole collision cells and a light source such as an ultraviolet (UV) laser to induce resonant ionization of molecules, generating low-energy electrons.
  • a light source such as an ultraviolet (UV) laser to induce resonant ionization of molecules, generating low-energy electrons.
  • An ultraviolet light source is tuned to the transition of a dopant molecule in the collision cell. This molecule may be Nitrogen gas, which is plentiful and which has a high cross section for resonant multiphoton ionization.
  • One photon is tuned to excite an electronically excited state.
  • the second photon induces ionization from that excited state.
  • low-energy electrons can be ejected in this manner. The highest yield occurs when laser beam overlaps the ion beam on centerline 17.
  • Figure 8A illustrates a configuration whereby laser beam 118 is introduced to the mass spectrometer through a high transmission window 100 at one end of the mass spectrometer.
  • the laser beam is focused on centerline 17 and transported into RF multipole collision cell 3 through several orifices.
  • Laser beam 118 ionizes gas phase molecules along centerline 17 within RF multipole collision cell 3.
  • Figure 8B illustrates an alternative approach whereby the laser beam 101 is introduced to the RF multipole collision cell 3 orthogonal to centerline 17, through the space between the adjacent poles of RF multipole collision cell 3.
  • Laser beam 101 is swept along axis 102 by means of a rotating a mirror 103.
  • An additional mirror 104 can be positioned below the ion guide to permit multiple passing of laser beam 101 as illustrated in Figure 8C .
  • FIG 9C Another embodiment of the invention is illustrated in Figure 9C with Figures 9A and 9B being useful in understanding Figure 9C , and comprises a light source or a laser to induce electron emission from a photosensitive surface.
  • the light source may be oriented as shown in Figures 9A and 9B . Alternatively, it may be introduced at an angle to the RF multipole collision cell 3. This is illustrated in Figure 9C .
  • photosensitive surface 103 is embedded in lens 11 and 12 of RF multipole collision cell 3. Focusing lens 104 aids in directing electrons toward centerline 17.
  • the photosensitive material is fabricated to provide a high yield of electron emission when impinged upon by high-energy ions or photons or electrons and may be obtained commercially and fabricated for this application.
  • Laser beam 105 from laser source 106 is introduced at an angle 107 with respect to axis 119, striking surface 103, as illustrated in Figure 9B . Some fraction of photons are absorbed, causing an electronic transition within the material to occur. An electron is ejected whose energy is approximately equal to the photon energy minus the energy of the state that absorbed the photon.
  • the system is configured to permit multiple passes of laser beam 105 by reflecting it off surface 103 positioned at an angle 107.
  • An alternative configuration which embodies the invention utilizing a photosensitive surface placed orthogonal to centerline 17 is illustrated in Figure 9C . This configuration is similar to those outlined above. Photosensitive surface 108 is mounted below centerline 17 in the space between lens 12 and lens 20.
  • Laser beam 110 impinges directly on photosensitive surface 108.
  • ions can be trapped in RF multipole collision cell 3.
  • Voltages are arranged on lenses, including lens 12, 20, surface 108, RF multipole collision cell 3, DC bias voltage 15, and lens 11, to direct low-energy electrons onto centerline 17 and to induce electron velocity reversal near point 120.
  • FIG. 10 Another embodiment is illustrated in Figure 10 .
  • This embodiment comprises the injection of an ion beam 110 from ion source 111 into RF multipole collision cell 3 and the simultaneous injection of electron beam 112 into the volume, at angle 113 between 0 and 90 degrees.
  • Ion beam 110 is generated by normal means, i.e., utilization of ion source 1 in transport region 6 and RF multipole ion guide 7 and mass analyzer 2 in Figure 1 . These ions can then be mildly accelerated and injected into RF multipole collision cell 3 at angle 113.
  • the RF field is set at sufficiently high q to capture a large fraction of the ions, after which point they are trapped.
  • Low energy electron beam 112 is injected coaxial to RF multipole collision cell 3.
  • ions of opposite polarity to the precursor ions are injected into RF multipole collision cell 3 in order to induce fragmentation.
  • Figure 11A illustrates the configurations whereby an orthogonal injection source is coupled to RF multipole collision cell 3. Ions are produced in source region 113 rather than electrons. For example, negative ions are chemically produced in source region 113 by means of chemical reactions . The ions are directed upward toward centerline 17 using optics configuration 114. Precursor ions may be trapped in RF multipole collision cell 3, as described earlier. Voltages are adjusted to turn the ions into RF multipole collision cell 3 and direct the ions onto centerline 17, as described earlier.
  • FIG. 11B An alternative technique not embodying the invention is illustrated in Figure 11B .
  • the ions of opposite polarity intersect in a cross beam fashion, as the precursor ion flows from RF multipole collision cell 115 to RF multipole collision cell 116.
  • ions are produced ion source 113, directed toward centerline 17 by use of optics configuration 114. Fragment ions are contained by RF multipole 116, and may undergo further steps of CAD.
  • All embodiments described provide for a means to adjust the RF balance on the multipole rods.
  • a quadrupole ion guide it is important that there is a means to adjust the ratio A/B in order to optimize the yield of electron capture. This is necessary because the RF field on axis needs to be optimized. In most cases no offset is desirable. Nonetheless it is a parameter that needs to be optimized for all configurations and experimental conditions.
  • All embodiments described above relate to the combination of electrons and ions in an RF multipole ion guide.
  • the volume may be pressurized, for example as in an RF multipole collision cell.
  • the pressure range is typically near 0.13 Pa (1 mtorr) but can range from 1.3 mPa to 26 Pa (from 0.01 mTorr to 200 mTorr).
  • an electron source may be positioned at the entrance and exit of the multipole ion guide simultaneously with the space between the A and B of an RF quadrupole collision cell, both directed toward the axis, and is also included within the scope of the invention.
  • Combinations of RF multipole ion guides and collision cells are within the scope of the invention. For example, in some cases it is preferable to first set conditions for CAD and then perform electron capture. For example a single collision cell can be used to permit simultaneous performance of CAD and ECD. Alternatively, multiple collision cells can be used to permit conventional low energy CAD and ECD to be performed one after the other (in sequence).
  • the electron source is suitable for operation in the 0.1 Pa (mTorr) range and can include but is not limited to a heated filament; an indirectly heated cathode dispenser; photosensitive materials in combination with a photon source; a commercially obtained electron gun; and so on.
  • the electron source may be configured close to the axis of the RF multipole collision cell or RF multipole ion guide, or displaced from the axis with appropriate use of electron transfer optics.
  • the electron sources are configured to give a range of energy from 0.2 to 10 eV with reference to the axis of the multipole RF collision cell or ion guide.
  • the embodiments as stated above require optimization of all the electrode voltages within the electron source, RF multipole collision cells, and RF multipole ion guides.
  • the electric fields are determined in part by the relative sizes of the structures and therefore it is within the scope of this invention to include rod diameters, lengths, circumscribed diameters and configurations of a variety of sizes and poles numbers.

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Claims (32)

  1. Appareil pour la fragmentation d'ions de substances échantillons, comprenant :
    (a) un premier guide d'ions multipolaire (10, 203) comprenant un premier ensemble de baguettes (13, 14) ayant une première extrémité d'entrée et une première extrémité de sortie ;
    (b) une première enceinte, qui entoure ledit premier guide d'ions multipolaire, ladite première enceinte ayant une première ouverture d'entrée (11, 202) proximale de ladite première extrémité d'entrée et une première ouverture de sortie (12, 207) proximale de ladite première extrémité de sortie ;
    (c) des moyens de production d'électrons ou de positrons de faible énergie (5, 219) ;
    (d) des moyens de direction desdits électrons ou positrons de faible énergie dans une première région (21, 224) proximale de ladite première ouverture de sortie et extérieure à ladite première enceinte ; et
    (e) des moyens (9, 15) pour appliquer des tensions RF et/ou CC audit premier ensemble de baguettes ;
    l'appareil étant conçu de manière à ce que l'énergie cinétique desdits électrons ou positrons de faible énergie soit dans la plage allant de 0,2 à 10 eV dans ladite première région (21).
  2. Appareil selon la revendication 1, comprenant également des moyens d'application d'une tension à ladite ouverture de sortie.
  3. Appareil selon la revendication 1, comprenant également :
    (a) un second guide d'ions multipolaire (24) comprenant un second ensemble de baguettes ayant une seconde extrémité d'entrée et une seconde extrémité de sortie, ladite seconde extrémité d'entrée étant proximale de ladite première région, de manière à ce que ladite première région se trouve entre ladite première ouverture de sortie et ladite seconde extrémité d'entrée ; et
    (b) des moyens d'application de tensions RF et/ou CC audit second ensemble de baguettes.
  4. Appareil selon la revendication 1, comprenant également :
    (a) un second guide d'ions multipolaire (214) comprenant un second ensemble de baguettes ayant une seconde extrémité d'entrée et une seconde extrémité de sortie ;
    (b) une seconde enceinte, qui entoure ledit second guide d'ions multipolaire, ladite seconde enceinte ayant une seconde ouverture d'entrée (213), ladite seconde ouverture d'entrée étant proximale de ladite première région (224) à l'extérieur de ladite seconde enceinte, et ladite ouverture d'entrée étant proximale de ladite seconde extrémité d'entrée dans ladite seconde enceinte, de manière à ce que ladite première région soit proximale de et se trouve entre ladite première ouverture de sortie (201) et ladite seconde ouverture d'entrée (213) ; et
    (c) des moyens d'application de tensions RF et/ou CC audit second ensemble de baguettes.
  5. Appareil selon la revendication 4, comprenant également :
    des moyens d'application d'une tension à ladite seconde électrode d'entrée.
  6. Appareil selon la revendication 1, 2, 3, 4 ou 5, dans lequel ladite première enceinte comprend également des moyens d'ajustement de la pression de gaz dans ladite première enceinte.
  7. Appareil selon la revendication 4 ou 5, dans lequel ladite seconde enceinte comprend également des moyens d'ajustement de la pression de gaz dans ladite seconde enceinte.
  8. Appareil selon la revendication 1, 2, 3, 4 ou 5, dans lequel ledit premier ensemble de baguettes comprend un quadrupôle.
  9. Appareil selon la revendication 1, 2, 3, 4 ou 5, dans lequel ledit premier ensemble de baguettes comprend un hexapôle.
  10. Appareil selon la revendication 1, 2, 3, 4 ou 5, dans lequel ledit premier ensemble de baguettes comprend un octapôle.
  11. Appareil selon la revendication 1, 2, 3, 4 ou 5, dans lequel ledit premier ensemble de baguettes comprend plus de huit baguettes.
  12. Appareil selon la revendication 3, 4 ou 5, dans lequel ledit second ensemble de baguettes comprend un quadrupôle.
  13. Appareil selon la revendication 3, 4 ou 5, dans lequel ledit second ensemble de baguettes comprend un hexapôle.
  14. Appareil selon la revendication 3, 4 ou 5, dans lequel ledit second ensemble de baguettes comprend un octapôle.
  15. Appareil selon la revendication 3, 4 ou 5, dans lequel ledit second ensemble de baguettes comprend plus de huit baguettes.
  16. Appareil selon la revendication 1, 2, 3, 4 ou 5, dans lequel ledit moyen de production d'électrons ou de positrons est pour la production d'électrons et comprend un filament chauffé directement.
  17. Appareil selon la revendication 1, 2, 3, 4 ou 5, dans lequel ledit moyen de production d'électrons ou de positrons est pour la production d'électrons et comprend une cathode chauffée indirectement.
  18. Appareil selon la revendication 1, 2, 3, 4 ou 5, dans lequel ledit moyen de production d'électrons ou de positrons est pour la production d'électrons et comprend une surface à affinité électronique négative.
  19. Appareil selon la revendication 1, 2, 3, 4 ou 5, dans lequel ledit moyen de production d'électrons ou de positrons est pour la production d'électrons et comprend une plaque à canaux multiples.
  20. Appareil selon la revendication 1, 2, 3, 4 ou 5, dans lequel ledit moyen de production d'électrons ou de positrons est pour la production d'électrons et comprend un réseau d'émission d'électrons par effet de champ.
  21. Appareil selon la revendication 1, 2, 3, 4 ou 5, dans lequel ledit moyen de production d'électrons ou de positrons est pour la production d'électrons et comprend :
    (a) une substance qui émet des électrons de faible énergie lors de l'impact de photons ; et
    (b) une source de photons pour la production d'électrons de faible énergie lors de l'impact desdits photons sur ladite substance.
  22. Appareil selon la revendication 21, dans lequel ladite source de photons comprend un laser.
  23. Appareil selon la revendication 21, dans lequel ladite source de photons comprend une source de photons de longueurs d'onde ultraviolettes.
  24. Appareil selon la revendication 21, dans lequel ladite substance comprend une surface solide.
  25. Appareil selon la revendication 21, dans lequel ladite substance comprend des molécules de gaz.
  26. Appareil selon la revendication 1, 2, 3, 4 ou 5, dans lequel ledit moyen de direction desdits électrons ou positrons de faible énergie dans ladite première région comprend :
    (a) des électrodes pour focaliser et orienter lesdits électrons ou positrons de faible énergie ; et
    (b) des moyens d'application de tensions auxdites électrodes pour focaliser et orienter lesdits électrons ou positrons de faible énergie.
  27. Appareil selon la revendication 1, 2, 3, 4 ou 5, dans lequel ledit moyen de direction est pour la direction d'électrons de faible énergie dans ladite première région et comprend des moyens de formation d'une trajectoire de faisceau d'électrons qui est essentiellement exempte de champs électriques.
  28. Appareil selon la revendication 1, 2, 3, 4 ou 5, dans lequel ledit moyen de direction desdits électrons ou positrons de faible énergie dans ladite première région comprend un champ magnétique.
  29. Appareil selon la revendication 1, 2, 3, 4 ou 5, dans lequel ledit moyen de direction est pour la direction d'électrons de faible énergie dans ladite première région et comprend :
    (a) des électrodes pour focaliser et orienter lesdits électrons de faible énergie ; et
    (b) des moyens d'application de tensions auxdites électrodes pour focaliser et orienter lesdits électrons de faible énergie ;
    (c) des moyens de formation d'une trajectoire de faisceau d'électrons qui est essentiellement exempte de champs électriques : et
    (d) un champ magnétique.
  30. Appareil selon la revendication 29, dans lequel les moyens de formation d'une trajectoire de faisceau d'électrons qui est essentiellement exempte de champs électriques comprennent :
    (a) une première électrode de garde proximale de ladite première extrémité de sortie, ladite première électrode de garde ayant une première ouverture de garde pour la transmission d'ions au travers de celle-ci ;
    (b) une seconde électrode de garde proximale de ladite seconde extrémité d'entrée, ladite seconde électrode de garde ayant une seconde ouverture de garde pour la transmission d'ions au travers de celle-ci ;
    (c) des moyens d'application d'une première tension d'électrode de garde à ladite première électrode de garde ; et
    (d) des moyens d'application d'une seconde tension d'électrode de garde à ladite seconde électrode de garde ; ladite première tension d'électrode de garde étant essentiellement identique à ladite seconde tension d'électrode de garde.
  31. Appareil selon la revendication 30, dans lequel ladite première ouverture de garde comprend également une première grille conductrice.
  32. Appareil selon la revendication 30, dans lequel ladite seconde ouverture de garde comprend également une seconde grille conductrice.
EP03756376A 2002-05-31 2003-05-30 Procedes de fragmentation pour spectrometrie de masse Expired - Lifetime EP1549923B1 (fr)

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US38511302P 2002-05-31 2002-05-31
US385113P 2002-05-31
PCT/US2003/017436 WO2003102545A2 (fr) 2002-05-31 2003-05-30 Procedes de fragmentation pour spectrometrie de masse

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EP1549923A4 EP1549923A4 (fr) 2009-03-25
EP1549923B1 true EP1549923B1 (fr) 2012-10-17

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AU (1) AU2003247472A1 (fr)
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WO2003102545A2 (fr) 2003-12-11
AU2003247472A1 (en) 2003-12-19
CA2643534C (fr) 2011-08-02
CA2643534A1 (fr) 2003-12-11
EP1549923A4 (fr) 2009-03-25
WO2003102545A3 (fr) 2004-05-06
CA2487135C (fr) 2009-01-27
CA2487135A1 (fr) 2003-12-11
EP1549923A2 (fr) 2005-07-06
AU2003247472A8 (en) 2003-12-19

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