EP1511582A2 - Vorrichtung zum säubern der fläche einer komponente - Google Patents

Vorrichtung zum säubern der fläche einer komponente

Info

Publication number
EP1511582A2
EP1511582A2 EP03760019A EP03760019A EP1511582A2 EP 1511582 A2 EP1511582 A2 EP 1511582A2 EP 03760019 A EP03760019 A EP 03760019A EP 03760019 A EP03760019 A EP 03760019A EP 1511582 A2 EP1511582 A2 EP 1511582A2
Authority
EP
European Patent Office
Prior art keywords
cleaning
laser
particles
part according
polarized
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP03760019A
Other languages
English (en)
French (fr)
Inventor
Jean Hue
Etienne Quesnel
Florian Evers
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat à l'Énergie Atomique et Aux Énergies Alternatives
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Publication of EP1511582A2 publication Critical patent/EP1511582A2/de
Withdrawn legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B08B7/0042—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by laser

Definitions

  • the subject of this invention is a device for cleaning a surface of a part, in particular an optical or electronic part, in order to remove certain so-called contaminating particles which would render it unfit for the service for which it is intended.
  • These particles can be mineral or organic in nature.
  • One known means for cleaning various objects is the beam of a laser. This technique has been proposed for cleaning facades of monuments, micro-electronic components such as integrated circuits of optical discs, or parts intended for optical uses.
  • the beam energy detaches the particles from the surface.
  • the means of elimination proposed with the invention is a means of capturing or destroying particles which can take various forms, but which is arranged in front of the surface (and therefore close to it) to produce either an attraction on the particles if the medium is a means of capture, or an immediate elimination of particles if the means is a means of destruction.
  • the attraction capture means have the characteristic that their action on the particles does not relax until capture, unlike the action of the scanning means. Some of these means consist of suction means or structures polarized with respect to the part to produce the force of attraction on the detached particles. Destruction means may include the beam of a second laser different from the previous one. The proximity of the means for capturing or destroying the surface to be cleaned guarantees a good result of the process.
  • a part to be decontaminated bears the reference 1, and it is placed on a table 2 movable in an XY plane to move the part 1, and more precisely its upper face 3 to be decontaminated, in front of an apparatus which comprises a laser 4 emitting a beam 5 directed towards the face 3, and a suction device 6 comprising a pump 7 and a conduit 8 directed towards the face 3 and more precisely towards the point of arrival of the beam 5; a filter 9 can be added in the duct 8 or downstream of the pump 7.
  • the beam 5 detaches the contaminating particles from the face 3, and the suction current attracts them towards the conduit 8 and passes them through the filter 9 where they are definitively retained.
  • the complete decontamination process consists of moving the table 2 and the piece 1 of preservation until the entire area to be cleaned of the face 3 has been scanned by the beam 5.
  • the suction device is replaced by a tip 10 made of conductive material and therefore capable of being polarized by a voltage generator 11 relative to the part 1.
  • the direction of polarization is chosen so that the detached particles and ionized by the energy of the laser 4 are attracted to the tip 10 and deposit on it.
  • the distance between tip 10 and face 3 is a few hundred micrometers, for a difference potential from a few tens of volts to a few kilovolts.
  • this embodiment is particularly advantageous for parts in relief, and in particular with cavity, since the attraction means can be shaped so as to remain very close to the beam of the laser 5 and to follow it even in narrow cavities.
  • All the embodiments of the invention comprising a capture of the particles thus comprise a point-shaped polarization piece which attracts the detached particles from the surface under the best conditions.
  • the pointed shape has the other advantage of strengthening the field of polarization where it is required.
  • the polarization can be continuous or alternative.
  • the application of the field is located where it is useful.
  • the end of the conduit 8 comprises polarized plates 15 (which can form the duct or be simply added to it) similar to those of the tip 10.
  • the detached particles are sucked into the duct 8 by both the suction force and the electrostatic force, and they can deposit on the plates 15 when this force is sufficient.
  • a voltage generator 11 for polarizing the plates 15 relative to the part 1.
  • Another means used to prevent contamination includes a second laser, providing energy different from the first and designed to destroy loose particles.
  • the first laser 4 can provide a beam 5 per pulse of 0.1 nanosecond to 100 nanoseconds at a rate greater than a few hertz and a wavelength in the ultraviolet
  • the second laser will for example be continuous operation at several hundred watts or a few kilowatts.
  • the wavelength will be chosen to be best absorbed by the body constituting the particles.
  • 5 shows a 'such an arrangement, where next to the first laser 4, a second laser 16 is encountered which emits a beam 17 at grazing incidence above the upper face 3 so as to contact the loose particles that fly at this height.
  • the beam 17 is focused in one or two directions and has a focus 18 where it cuts the beam 5 of the first laser 4, so that the energy is most concentrated at the place where the particles are detached and where their destruction is therefore most indicated.
  • Certain variants of the invention must also be mentioned. It is thus not necessary that the laser 4 detaching the particles is directed towards the contaminated face 3: FIG. 6 shows that it can very well be directed towards the opposite side of this face, provided that the part 1 is transparent to the beam 5. The laser 4 is then separated from the means for capturing or destroying the particles (which may be the same as previously, for example a second laser 16) by the part 1.
  • FIG. 6 shows that it can very well be directed towards the opposite side of this face, provided that the part 1 is transparent to the beam 5.
  • the laser 4 is then separated from the means for capturing or destroying the particles (which may be the same as previously, for example a second laser 16) by the part 1.
  • FIG. 7 shows that at the device previous can be added a device for observing the phenomenon which may consist of an additional laser 18 emitting a beam 19 of illumination which is diffused towards an optical device which may include a deflection mirror 20 and a lens 21 which focuses this beam towards a camera 22.
  • This device makes it possible in particular to visualize the particles then to destroy them by following, in the image, the result of cleaning. So it is not always necessary to sweep the whole surface but to direct the beam only on the particles when these are rare.
  • a means for capturing or eliminating particles similar to the previous ones is added to the device, but has not been shown here for reasons of clarity. It should be noted that the beams laser are not necessarily perpendicular to the surfaces to be cleaned or observed.
  • the tips 25 depend on a common support 26 and are all directed parallel to the surface to be decontaminated from the part 1 Screw or friction adjustments of the points 25 in the holes of the common support 26 make it possible to separately adjust the advance of each of the points 25 and therefore to place them all at the desired distance from the surface of the part 1 even if it is in relief, so as to establish a sufficient field without risking a scratching of the surface and also according to the nature of the field, that of the particles and the conditions of execution of the process.
  • the source 27 of the field can be different for each of the points 25 or common. As before, it can be thermal, electric, alternative or continuous.
  • This embodiment can be used with effect in microelectronics, on laminated substrates and composed of etched layers. Peaks

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Cleaning In General (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
EP03760019A 2002-06-13 2003-06-12 Vorrichtung zum säubern der fläche einer komponente Withdrawn EP1511582A2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR0207263A FR2840837B1 (fr) 2002-06-13 2002-06-13 Dispositif de nettoyage d'une surface d'une piece
FR0207263 2002-06-13
PCT/FR2003/001768 WO2003106060A2 (fr) 2002-06-13 2003-06-12 Dispositif de nettoyage d'une surface d'une piece

Publications (1)

Publication Number Publication Date
EP1511582A2 true EP1511582A2 (de) 2005-03-09

Family

ID=29595192

Family Applications (1)

Application Number Title Priority Date Filing Date
EP03760019A Withdrawn EP1511582A2 (de) 2002-06-13 2003-06-12 Vorrichtung zum säubern der fläche einer komponente

Country Status (4)

Country Link
US (1) US20060154495A1 (de)
EP (1) EP1511582A2 (de)
FR (1) FR2840837B1 (de)
WO (1) WO2003106060A2 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011072992A1 (en) 2009-12-15 2011-06-23 Exxonmobil Chemical Patents Inc. Temperature control of an oligomerisation process and reactor

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005005709B4 (de) * 2005-01-31 2009-06-10 Technische Universität Dresden Einrichtung zur Bearbeitung von Materialoberflächen
JP5858426B2 (ja) * 2012-05-21 2016-02-10 株式会社日本製鋼所 パーティクル捕集機構付きレーザアニール装置
CN104475402B (zh) * 2014-11-29 2016-12-07 宁波江东思犒技术服务有限公司 用于磁钢的双面激光清洗装置
ES2636715B2 (es) * 2017-06-07 2018-02-12 Sitexco Girona, S.L. Máquina de limpieza de rodillos anilox por láser y procedimiento para autoajuste del punto focal láser al diámetro del rodillo anilox.
CN109092804A (zh) * 2018-10-15 2018-12-28 南京集萃激光智能制造有限公司 一种电子元件激光清洗装置及其清洗方法
RU2740533C1 (ru) * 2020-07-13 2021-01-15 Федеральное государственное бюджетное образовательное учреждение высшего образования "Сибирский государственный университет геосистем и технологий" Устройство оптической очистки твердой поверхности от наночастиц
CN113690280B (zh) * 2021-08-11 2023-11-28 深圳市华星光电半导体显示技术有限公司 阵列基板的修复方法和阵列基板
CN114131211B (zh) * 2021-11-10 2024-05-24 苏州热工研究院有限公司 激光去污与切割复合系统及激光去污与切割方法
CN114904846B (zh) * 2022-05-10 2023-08-25 郑州机械研究所有限公司 焊丝/焊带激光清洗设备及其贵金属回收模块
CN116000020A (zh) * 2022-12-05 2023-04-25 苏州天准科技股份有限公司 板面复合清洁设备和复合清洁检测方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2752325B1 (fr) * 1996-08-06 1998-10-09 Cogema Procede et dispositif de depouissierage de pastilles de combustible nucleaire au moyen d'un faisceau laser
US6805751B2 (en) * 2000-07-24 2004-10-19 Alkansas State University Method and apparatus for removal of minute particles from a surface using thermophoresis to prevent particle redeposition
JP2002035709A (ja) * 2000-07-25 2002-02-05 Japan Steel Works Ltd:The レーザクリーニング処理におけるパーティクルの捕集装置及び捕集方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO03106060A3 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011072992A1 (en) 2009-12-15 2011-06-23 Exxonmobil Chemical Patents Inc. Temperature control of an oligomerisation process and reactor

Also Published As

Publication number Publication date
WO2003106060A2 (fr) 2003-12-24
WO2003106060A3 (fr) 2004-04-01
FR2840837A1 (fr) 2003-12-19
FR2840837B1 (fr) 2004-11-26
US20060154495A1 (en) 2006-07-13

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