EP1497897B1 - Gegen photochromismus beständige materialien für optische geräte in plasmaumgebungen - Google Patents

Gegen photochromismus beständige materialien für optische geräte in plasmaumgebungen Download PDF

Info

Publication number
EP1497897B1
EP1497897B1 EP03724168.4A EP03724168A EP1497897B1 EP 1497897 B1 EP1497897 B1 EP 1497897B1 EP 03724168 A EP03724168 A EP 03724168A EP 1497897 B1 EP1497897 B1 EP 1497897B1
Authority
EP
European Patent Office
Prior art keywords
matrix
ring laser
laser gyroscope
weight percent
metal oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP03724168.4A
Other languages
English (en)
French (fr)
Other versions
EP1497897A1 (de
Inventor
Randy J. Ramberg
Theodore Broberg
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honeywell International Inc
Original Assignee
Honeywell International Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Honeywell International Inc filed Critical Honeywell International Inc
Publication of EP1497897A1 publication Critical patent/EP1497897A1/de
Application granted granted Critical
Publication of EP1497897B1 publication Critical patent/EP1497897B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G02B5/0825—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only
    • G02B5/0833—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only comprising inorganic materials only

Definitions

  • the present invention is a ring laser gyroscope comprising an interference mirror, formed from a matrix including ZrO 2 and another large heat of formation material such as Al 2 O 3 .
  • Laser mirrors such as interference mirrors used in ring laser gyroscopes, are continually exposed to a high-energy plasma environment that degrades the mirror by reducing the oxide (removing oxygen) and by inducing photochromic losses.
  • Optical devices of this type are formed from a "quarter wave" stack of alternating 1 ⁇ 4 ⁇ -thickness layers of a relatively high index of refraction material and a relatively low index of refraction material. These layers of material are often deposited on a dielectric substrate by vacuum deposition processes.
  • ZrO 2 zirconium oxide
  • a layer of ZrO 2 is also often typically used as the top layer of the stack in interference mirrors.
  • ZrO 2 has a relatively large heat of formation (about -131,490 gram calories/mole of oxygen), and exhibits a relatively high resistance to degradation in plasma environments.
  • ZrO 2 is also compatible with the relatively high temperatures (e.g., 450°-550°C) to which the mirrors are exposed during other ring laser gyro manufacturing steps.
  • Another approach for minimizing the degradation effects involves coating the top layer of the mirror stack with Al 2 O 3 , another relatively large heat of formation material (about -134,693 gram calories/mole of oxygen).
  • the ZrO 2 tends to form a micro-crystalline structure when deposited. This micro-crystalline structure creates scattering sites, increasing the loss of the mirror.
  • One known approach for preventing the formation of the crystalline structure and producing an amorphous, low-scatter material is to dope the ZrO 2 with small amounts of a second material such as SiO 2 . Doping the ZrO 2 with a relatively low amount (e.g., 5-15 weight %) of SiO 2 in this manner inhibits the micro-crystalline structure, thereby enabling relatively low loss, low scatter and long life mirrors.
  • the bonding energy of Si0 2 is so different with respect to that of Zr0 2 , however, that the Si0 2 is reduced in the presence of a significant energy source such as a plasma environment. This interaction can lead to photochromic loss increase which can degrade the performance of the mirror. The result is a decrease in the performance of the ring laser gyro or other system in which the optical device is used.
  • EP-A-372438 and US5646780 disclose a ring laser gyroscope comprising an interference mirror including a layer formed from a matrix comprising ZrO 2 .
  • the present invention is a ring laser gyroscope, comprising an interference mirror having a top layer with a homogeneous matrix of material including Zr0 2 and an amount of a second metal oxide selected from the group of Hf0 2 , Ti0 2 , Nb 2 0 5 and Al 2 0 3 .
  • the second metal oxide is incorporated into the matrix at 2 to 15 weight percent, preferably 4 to 11 weight percent, and most preferably 6 to 9 weight percent.
  • the matrix of material consists essentially of Zr0 2 and Al 2 0 3 .
  • SiO 2 is not considered a metal oxide.
  • the amount of metal oxide in the material is an amount which is effective to minimize microcrystalline structure formation without significantly reducing the effective index of refraction of the material.
  • SiO 2 is not included in the material matrix.
  • One embodiment of the invention includes about 2-15 weight percent of Al 2 O 3 in the matrix.
  • Another preferred embodiment includes about 4-11 weight percent of Al 2 O 3 in the matrix.
  • Yet another embodiment of the invention includes about 6-9 weight percent Al 2 O 3 in the matrix.
  • RF ion beam or other vapor deposition processes can be used to form the matrix of material.
  • One preferred embodiment is a sputtering process (e.g., ion beam sputtering) where the composition of the deposited film mimics the composition of the target. It is anticipated that other deposition techniques can be used with modified compositions to compensate for different evaporation rates. Co-deposition techniques can also be used.
  • Preferred embodiments of the invention consist solely of the ZrO 2 and Al 2 O 3 compounds described above. However, it is anticipated that other elements or compounds can be incorporated into the matrix of material as well. Introduction of dopants into the matrix is known to alter physical, optical and electrical properties of the material.
  • an interference mirror having a top layer formed by a matrix of ZrO 2 and Al 2 O 3 having the composition described above exhibits relatively low loss, low scatter and long life characteristics in a plasma environment. The photochromic loss of the laser is thereby significantly reduced, enhancing the power output of the device.
  • the thickness of the layer is determined by the particular application for which the interference mirror is designed (i.e., the wavelength of light desired to be reflected).
  • Al 2 O 3 is the large heat of formation metal oxide incorporated into the matrix in the preferred embodiment of the invention described above.
  • metal oxides can be effectively used for this purpose as well.
  • one such metal oxide is hafnium dioxide (HfO 2 ), which has a heat of formation of -134,190 gram calories per mole per oxygen.
  • suitable metal oxides include, for example, titanium dioxide (TiO 2 ) and niobium oxide (Nb 2 O 5 ).

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Physical Vapour Deposition (AREA)

Claims (11)

  1. Ringlasergyroskop, welches einen Interferenzspiegel umfasst, der eine obere Schicht mit einer homogenen Matrix eines ZrO2 aufweisenden Materials und einem Anteil eines zweiten Metalloxids aufweist, wobei das zweite Metalloxid aus der Gruppe ausgewählt ist, die aus HfO2, TiO2, Nb2O5 und Al2O3 besteht.
  2. Ringlasergyroskop nach Anspruch 1, wobei der Anteil des zweiten Metalloxids in der Matrix des Materials ein zum Verringern einer Bildung mikrokristalliner Strukturen während der Interferenzspiegelherstellung wirksamer Anteil ist.
  3. Ringlasergyroskop nach Anspruch 2, wobei der Anteil des zweiten Metalloxids in der Matrix des Materials ein Anteil ist, der bewirkt, dass der Interferenzspiegel Charakteristika eines verhältnismäßig geringen photochromen Verhaltens zeigt.
  4. Ringlasergyroskop nach Anspruch 1, wobei das zweite Metalloxid Al2O3 aufweist.
  5. Ringlasergyroskop nach Anspruch 4, wobei die Matrix des Materials etwa 2 - 15 Gewichtsprozent Al2O3 aufweist.
  6. Ringlasergyroskop nach Anspruch 4, wobei die Matrix des Materials etwa 4 - 11 Gewichtsprozent Al2O3 aufweist.
  7. Ringlasergyroskop nach Anspruch 4, wobei die Matrix des Materials etwa 6 - 9 Gewichtsprozent Al2O3 aufweist.
  8. Ringlasergyroskop nach Anspruch 1, wobei die Matrix des Materials im Wesentlichen aus ZrO2 und Al2O3 besteht.
  9. Ringlasergyroskop nach Anspruch 8, wobei die Matrix des Materials etwa 2 - 15 Gewichtsprozent Al2O3 aufweist.
  10. Ringlasergyroskop nach Anspruch 8, wobei die Matrix des Materials etwa 4 - 11 Gewichtsprozent Al2O3 aufweist.
  11. Ringlasergyroskop nach Anspruch 8, wobei die Matrix des Materials etwa 6 - 9 Gewichtsprozent Al2O3 aufweist.
EP03724168.4A 2002-04-25 2003-04-23 Gegen photochromismus beständige materialien für optische geräte in plasmaumgebungen Expired - Lifetime EP1497897B1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/131,881 US7760432B2 (en) 2002-04-25 2002-04-25 Photochromic resistant materials for optical devices in plasma environments
US131881 2002-04-25
PCT/US2003/012526 WO2003092129A1 (en) 2002-04-25 2003-04-23 Photochromic resistant materials for optical devices in plasma environments

Publications (2)

Publication Number Publication Date
EP1497897A1 EP1497897A1 (de) 2005-01-19
EP1497897B1 true EP1497897B1 (de) 2018-02-14

Family

ID=29248639

Family Applications (1)

Application Number Title Priority Date Filing Date
EP03724168.4A Expired - Lifetime EP1497897B1 (de) 2002-04-25 2003-04-23 Gegen photochromismus beständige materialien für optische geräte in plasmaumgebungen

Country Status (5)

Country Link
US (1) US7760432B2 (de)
EP (1) EP1497897B1 (de)
JP (1) JP2005524111A (de)
AU (1) AU2003231044A1 (de)
WO (1) WO2003092129A1 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10739137B2 (en) 2018-08-17 2020-08-11 Honeywell International Inc. Solid state ring laser gyroscope using rare-earth gain dopants in glassy hosts
US11385057B2 (en) 2019-09-20 2022-07-12 Honeywell International Inc. Extra thick ultraviolet durability coating
US11962118B2 (en) 2020-10-27 2024-04-16 Honeywell International Inc. Ultraviolet filter for ring laser gyroscope mirrors

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2658418A1 (de) * 1976-12-23 1978-06-29 Leybold Heraeus Gmbh & Co Kg Verfahren zur herstellung von antireflexschichten auf acrylglaesern, nach dem verfahren hergestellter optischer koerper und verwendung des optischen koerpers
US5764416A (en) * 1988-04-19 1998-06-09 Litton Systems, Inc. Fault tolerant antireflective coatings
EP0372438A3 (de) 1988-12-05 1990-08-01 Honeywell Inc. UV- und plasmastabiler vielschichtiger, hochreflektierender dielektrischer Spiegel
DK0395912T3 (da) * 1989-05-02 1993-12-06 Lonza Ag Sintringsdygtigt zirconiumoxidpulver og fremgangsmåde til dets fremstilling
RU2064206C1 (ru) * 1991-12-26 1996-07-20 Физический институт им.П.Н.Лебедева РАН Лазерный экран электронно-лучевой трубки и способ его изготовления
US5457570A (en) * 1993-05-25 1995-10-10 Litton Systems, Inc. Ultraviolet resistive antireflective coating of Ta2 O5 doped with Al2 O3 and method of fabrication
FR2712990B1 (fr) * 1993-11-22 1996-04-05 Commissariat Energie Atomique Miroir à large bande et à haute réflectivité et procédé de réalisation d'un tel miroir.
US5646780A (en) * 1994-08-24 1997-07-08 Honeywell Inc. Overcoat method and apparatus for ZRO2 mirror stacks
US5786611A (en) * 1995-01-23 1998-07-28 Lockheed Idaho Technologies Company Radiation shielding composition
US5978141A (en) * 1997-11-17 1999-11-02 The United States Of America As Represented By The Secretary Of The Navy Optical mirror particularly suited for a quantum well mirror
US6107239A (en) * 1998-01-19 2000-08-22 Luchuang Environment Protection Science Co. Ltd. Heat resistant metallic oxide catalyst for reducing pollution emission
US6495844B1 (en) * 2000-01-25 2002-12-17 Welch Allyn, Inc. Metal halide lamp for curing adhesives
US6424419B1 (en) * 2000-07-28 2002-07-23 Northrop Grumman Corporation System and method for providing cavity length control of a ring laser gyroscope

Also Published As

Publication number Publication date
US7760432B2 (en) 2010-07-20
EP1497897A1 (de) 2005-01-19
US20030202248A1 (en) 2003-10-30
AU2003231044A1 (en) 2003-11-10
WO2003092129A1 (en) 2003-11-06
JP2005524111A (ja) 2005-08-11

Similar Documents

Publication Publication Date Title
KR970003196B1 (ko) 광학 간섭 필터
Jin et al. Design, formation and characterization of a novel multifunctional window with VO2 and TiO2 coatings
US20060246321A1 (en) Layer system comprising a titanium-aluminium-oxide layer
AU756842B2 (en) Optical element having antireflection film
EA023984B1 (ru) Пропускающая свет проводящая подложка для органических светоизлучающих устройств
EP0372438A2 (de) UV- und plasmastabiler vielschichtiger, hochreflektierender dielektrischer Spiegel
CN1033471C (zh) 用于生产高折射率光学涂层的蒸镀用材料
JP2009538815A (ja) 低放射率板ガラス
JPH06313803A (ja) 高反射性の銀鏡
US20170160600A1 (en) Tunable liquid crystal optical device
AU752935B2 (en) Composition for vapor deposition, method for forming antireflection film using it, and optical element
JP4434491B2 (ja) 電気ランプ
US7760432B2 (en) Photochromic resistant materials for optical devices in plasma environments
JP2018036325A (ja) Ｎｄフィルタ及びその製造方法
JPWO2019151431A1 (ja) 膜付き透明基板の製造方法
WO2021024834A1 (ja) 反射防止膜付き光学部材及びその製造方法
JP2018197171A (ja) 親水性反射防止膜付きレンズ及びその製造方法
JP2005232565A (ja) 薄膜の製造方法
CN116819661A (zh) 一种光谱特性可变的光学薄膜及其光谱特性的调节方法
KR102373366B1 (ko) 스마트 칼라필터
KR20070098783A (ko) 전기 램프 및 간섭막
JP3221349B2 (ja) 熱線反射膜
JPS61159602A (ja) 多層反射防止膜
JP7117081B2 (ja) 防塵レンズ及びその製造方法
JP2002286932A (ja) 偏光フィルムまたは偏光子用保護フィルムの製造方法

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20041026

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR

AX Request for extension of the european patent

Extension state: AL LT LV MK

17Q First examination report despatched

Effective date: 20050831

RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: HONEYWELL INTERNATIONAL INC.

REG Reference to a national code

Ref country code: DE

Ref legal event code: R079

Ref document number: 60350966

Country of ref document: DE

Free format text: PREVIOUS MAIN CLASS: H01S0003080000

Ipc: G02B0005080000

RIC1 Information provided on ipc code assigned before grant

Ipc: G02B 5/28 20060101ALI20170731BHEP

Ipc: G02B 5/08 20060101AFI20170731BHEP

Ipc: H01S 3/08 20060101ALI20170731BHEP

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

INTG Intention to grant announced

Effective date: 20170913

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): DE FR GB IT

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

REG Reference to a national code

Ref country code: DE

Ref legal event code: R096

Ref document number: 60350966

Country of ref document: DE

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 16

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20180214

REG Reference to a national code

Ref country code: DE

Ref legal event code: R119

Ref document number: 60350966

Country of ref document: DE

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed

Effective date: 20181115

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20180514

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20181101

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20180514

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20220427

Year of fee payment: 20

P01 Opt-out of the competence of the unified patent court (upc) registered

Effective date: 20230525