EP1396870A3 - Sputterionenquelle - Google Patents

Sputterionenquelle Download PDF

Info

Publication number
EP1396870A3
EP1396870A3 EP03017996A EP03017996A EP1396870A3 EP 1396870 A3 EP1396870 A3 EP 1396870A3 EP 03017996 A EP03017996 A EP 03017996A EP 03017996 A EP03017996 A EP 03017996A EP 1396870 A3 EP1396870 A3 EP 1396870A3
Authority
EP
European Patent Office
Prior art keywords
sputter
cathode
ion source
sputter ion
insert
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP03017996A
Other languages
English (en)
French (fr)
Other versions
EP1396870A2 (de
EP1396870B1 (de
Inventor
Manfred Dr. Friedrich
Horst Dr. Tyrroff
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Forschungszentrum Dresden Rossendorf eV
Original Assignee
Forschungszentrum Dresden Rossendorf eV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Forschungszentrum Dresden Rossendorf eV filed Critical Forschungszentrum Dresden Rossendorf eV
Publication of EP1396870A2 publication Critical patent/EP1396870A2/de
Publication of EP1396870A3 publication Critical patent/EP1396870A3/de
Application granted granted Critical
Publication of EP1396870B1 publication Critical patent/EP1396870B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/04—Ion sources; Ion guns using reflex discharge, e.g. Penning ion sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Der Erfindung liegt die Aufgabe zugrunde, die Lebensdauer einer Sputterionenquelle zu erhöhen, den Wartungsaufwand zu senken und die Zerstäubung der Teile der Ionenquelle, welche sich in der Nähe des für die Erzeugung der negativen Ionen erforderlichen Kathodeneinsatzes befinden, weitgehend zu verhindern.
Die Erfindung geht aus von den Bauteilen lonisierer (2), Kathode (3), Sputtereinsatz (4), Formierungselektrode (5), Abschirmkappe (6) und Kathodenisolator (7) in einem vakuumdichten Gehäuse und ist dadurch gekennzeichnet, dass eine Abschirmelektrode (1) hohlzylinderförmig um die Sputterkathode, bestehend aus den Bauteilen Kathode (3), Sputtereinsatz (4) und Abschirmkappe (6), angeordnet ist, wobei die Abschirmelektrode (1) im Bereich des Sputtereinsatzes (4) rotationssymmetrisch verjüngt ausgebildet ist.
EP03017996A 2002-09-06 2003-08-07 Sputterionenquelle Expired - Lifetime EP1396870B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10241252A DE10241252B4 (de) 2002-09-06 2002-09-06 Sputterionenquelle
DE10241252 2002-09-06

Publications (3)

Publication Number Publication Date
EP1396870A2 EP1396870A2 (de) 2004-03-10
EP1396870A3 true EP1396870A3 (de) 2004-07-21
EP1396870B1 EP1396870B1 (de) 2006-04-26

Family

ID=31502445

Family Applications (1)

Application Number Title Priority Date Filing Date
EP03017996A Expired - Lifetime EP1396870B1 (de) 2002-09-06 2003-08-07 Sputterionenquelle

Country Status (4)

Country Link
US (1) US6929725B2 (de)
EP (1) EP1396870B1 (de)
AT (1) ATE324667T1 (de)
DE (2) DE10241252B4 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2957455B1 (fr) * 2010-03-09 2012-04-20 Essilor Int Enveloppe de protection pour canon a ions, dispositif de depot de materiaux par evaporation sous vide comprenant une telle enveloppe de protection et procede de depot de materiaux
KR102082168B1 (ko) * 2012-02-08 2020-02-27 엠케이에스 인스트루먼츠, 인코포레이티드 압력을 측정하는 이온화 게이지 및 이를 이용한 압력 측정 방법
US10643823B2 (en) 2018-09-07 2020-05-05 Varian Semiconductor Equipment Associates, Inc. Foam in ion implantation system
US11222768B2 (en) * 2018-09-07 2022-01-11 Varian Semiconductor Equipment Associates, Inc. Foam in ion implantation system
US11031205B1 (en) * 2020-02-04 2021-06-08 Georg-August-Universität Göttingen Stiftung Öffentlichen Rechts, Universitätsmedizin Device for generating negative ions by impinging positive ions on a target

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2610165C2 (de) * 1976-03-11 1983-11-10 Gesellschaft für Schwerionenforschung mbH, 6100 Darmstadt Duoplasmatron-Ionenquelle zur Erzeugung mehrfach geladener Ionen
JP3304861B2 (ja) * 1997-12-19 2002-07-22 日新ハイボルテージ株式会社 セシウムスパッタ形負イオン源

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
ALTON G D: "ION SOURCES FOR ACCELERATORS IN MATERIALS RESEARCH", NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, SECTION - B: BEAM INTERACTIONS WITH MATERIALS AND ATOMS, NORTH-HOLLAND PUBLISHING COMPANY. AMSTERDAM, NL, vol. B73, no. 2, 1 February 1993 (1993-02-01), pages 221 - 288, XP000381499, ISSN: 0168-583X *
LIU LIANFAN ET AL: "THE AMS SYSTEM AT THE SHANGHAI INSTITUTE OF NUCLEAR RESEARCH", NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, SECTION - B: BEAM INTERACTIONS WITH MATERIALS AND ATOMS, NORTH-HOLLAND PUBLISHING COMPANY. AMSTERDAM, NL, vol. B52, no. 3 / 4, 2 December 1990 (1990-12-02), pages 298 - 300, XP000178381, ISSN: 0168-583X *
MOUS D J W ET AL: "THE HVEE TANDETRON LINE;NEW DEVELOPMENTS AND DESIGN CONSIDERATIONS", NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, SECTION - B: BEAM INTERACTIONS WITH MATERIALS AND ATOMS, NORTH-HOLLAND PUBLISHING COMPANY. AMSTERDAM, NL, vol. B62, no. 3, 2 January 1992 (1992-01-02), pages 421 - 424, XP000248270, ISSN: 0168-583X *
R. MIDDLETON: "A versatile high intensity negative ion source", NUCLEAR INSTRUMENTS AND METHODS, vol. 214, 1 September 1983 (1983-09-01), pages 139 - 150, XP009031202 *

Also Published As

Publication number Publication date
EP1396870A2 (de) 2004-03-10
DE50303089D1 (de) 2006-06-01
ATE324667T1 (de) 2006-05-15
US20040182699A1 (en) 2004-09-23
EP1396870B1 (de) 2006-04-26
DE10241252B4 (de) 2004-09-02
US6929725B2 (en) 2005-08-16
DE10241252A1 (de) 2004-03-25

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