EP1380669A1 - Procede de formation d'un film, procede de fabrication d'un reflecteur de film multicouche, et dispositif de formation de film - Google Patents

Procede de formation d'un film, procede de fabrication d'un reflecteur de film multicouche, et dispositif de formation de film

Info

Publication number
EP1380669A1
EP1380669A1 EP02700781.4A EP02700781A EP1380669A1 EP 1380669 A1 EP1380669 A1 EP 1380669A1 EP 02700781 A EP02700781 A EP 02700781A EP 1380669 A1 EP1380669 A1 EP 1380669A1
Authority
EP
European Patent Office
Prior art keywords
film forming
film
forming device
reflector manufacturing
multilayer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP02700781.4A
Other languages
German (de)
English (en)
Other versions
EP1400608A1 (fr
Inventor
Noriaki Kandaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2001083094A external-priority patent/JP4770040B2/ja
Priority claimed from JP2001083095A external-priority patent/JP2002285330A/ja
Application filed by Nikon Corp filed Critical Nikon Corp
Priority claimed from PCT/JP2002/001713 external-priority patent/WO2002077316A1/fr
Publication of EP1380669A1 publication Critical patent/EP1380669A1/fr
Publication of EP1400608A1 publication Critical patent/EP1400608A1/fr
Withdrawn legal-status Critical Current

Links

EP02700781A 2001-03-22 2002-02-26 Procede de formation d'un film, procede de fabrication d'un reflecteur de film multicouche, et dispositif de formation de film Withdrawn EP1400608A1 (fr)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2001083095 2001-03-22
JP2001083094A JP4770040B2 (ja) 2001-03-22 2001-03-22 成膜装置、成膜方法及び多層膜反射鏡の製造方法
JP2001083094 2001-03-22
JP2001083095A JP2002285330A (ja) 2001-03-22 2001-03-22 成膜装置、成膜方法及び多層膜反射鏡の製造方法
PCT/JP2002/001713 WO2002077316A1 (fr) 2001-03-22 2002-02-26 Procede de formation d'un film, procede de fabrication d'un reflecteur de film multicouche, et dispositif de formation de film

Publications (2)

Publication Number Publication Date
EP1380669A1 true EP1380669A1 (fr) 2004-01-14
EP1400608A1 EP1400608A1 (fr) 2004-03-24

Family

ID=26611820

Family Applications (1)

Application Number Title Priority Date Filing Date
EP02700781A Withdrawn EP1400608A1 (fr) 2001-03-22 2002-02-26 Procede de formation d'un film, procede de fabrication d'un reflecteur de film multicouche, et dispositif de formation de film

Country Status (5)

Country Link
US (1) US20030129325A1 (fr)
EP (1) EP1400608A1 (fr)
KR (1) KR20030014231A (fr)
TW (1) TW528890B (fr)
WO (1) WO2002077316A1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20090094147A (ko) * 2006-12-20 2009-09-03 가부시키가이샤 알박 다중막 필름 형성 방법 및 다중막 필름 형성 장치
US8308921B1 (en) * 2006-12-21 2012-11-13 Western Digital (Fremont), Llc Mask for increased uniformity in ion beam deposition
US7863587B2 (en) * 2007-01-31 2011-01-04 Hitachi Global Storage Technologies, Netherlands, B.V. Symmetrical shaper for an ion beam deposition and etching apparatus
JP6049051B2 (ja) 2011-07-29 2016-12-21 日東電工株式会社 両面真空成膜方法
US10947617B2 (en) * 2017-12-03 2021-03-16 Shiping Cheng Tune able masks for PVD deposit thickness uniformity management
CN114472090B (zh) * 2022-02-10 2023-06-02 华能新能源股份有限公司 一种膜层生长设备及膜层生长方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6117549Y2 (fr) * 1980-05-10 1986-05-29
JPS61183464A (ja) * 1985-02-07 1986-08-16 Nec Corp スパツタ装置
JPH1026698A (ja) * 1996-07-12 1998-01-27 Nikon Corp 真空薄膜形成装置及び反射鏡の製造方法
US6547939B2 (en) * 2001-03-29 2003-04-15 Super Light Wave Corp. Adjustable shadow mask for improving uniformity of film deposition using multiple monitoring points along radius of substrate
US6733640B2 (en) * 2002-01-14 2004-05-11 Seagate Technology Llc Shutter assembly having optimized shutter opening shape for thin film uniformity
US20030164998A1 (en) * 2002-03-01 2003-09-04 The Regents Of The University Of California Ion-assisted deposition techniques for the planarization of topological defects

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