EP1380669A1 - Procede de formation d'un film, procede de fabrication d'un reflecteur de film multicouche, et dispositif de formation de film - Google Patents
Procede de formation d'un film, procede de fabrication d'un reflecteur de film multicouche, et dispositif de formation de filmInfo
- Publication number
- EP1380669A1 EP1380669A1 EP02700781.4A EP02700781A EP1380669A1 EP 1380669 A1 EP1380669 A1 EP 1380669A1 EP 02700781 A EP02700781 A EP 02700781A EP 1380669 A1 EP1380669 A1 EP 1380669A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- film forming
- film
- forming device
- reflector manufacturing
- multilayer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001083095 | 2001-03-22 | ||
JP2001083094A JP4770040B2 (ja) | 2001-03-22 | 2001-03-22 | 成膜装置、成膜方法及び多層膜反射鏡の製造方法 |
JP2001083094 | 2001-03-22 | ||
JP2001083095A JP2002285330A (ja) | 2001-03-22 | 2001-03-22 | 成膜装置、成膜方法及び多層膜反射鏡の製造方法 |
PCT/JP2002/001713 WO2002077316A1 (fr) | 2001-03-22 | 2002-02-26 | Procede de formation d'un film, procede de fabrication d'un reflecteur de film multicouche, et dispositif de formation de film |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1380669A1 true EP1380669A1 (fr) | 2004-01-14 |
EP1400608A1 EP1400608A1 (fr) | 2004-03-24 |
Family
ID=26611820
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP02700781A Withdrawn EP1400608A1 (fr) | 2001-03-22 | 2002-02-26 | Procede de formation d'un film, procede de fabrication d'un reflecteur de film multicouche, et dispositif de formation de film |
Country Status (5)
Country | Link |
---|---|
US (1) | US20030129325A1 (fr) |
EP (1) | EP1400608A1 (fr) |
KR (1) | KR20030014231A (fr) |
TW (1) | TW528890B (fr) |
WO (1) | WO2002077316A1 (fr) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20090094147A (ko) * | 2006-12-20 | 2009-09-03 | 가부시키가이샤 알박 | 다중막 필름 형성 방법 및 다중막 필름 형성 장치 |
US8308921B1 (en) * | 2006-12-21 | 2012-11-13 | Western Digital (Fremont), Llc | Mask for increased uniformity in ion beam deposition |
US7863587B2 (en) * | 2007-01-31 | 2011-01-04 | Hitachi Global Storage Technologies, Netherlands, B.V. | Symmetrical shaper for an ion beam deposition and etching apparatus |
JP6049051B2 (ja) | 2011-07-29 | 2016-12-21 | 日東電工株式会社 | 両面真空成膜方法 |
US10947617B2 (en) * | 2017-12-03 | 2021-03-16 | Shiping Cheng | Tune able masks for PVD deposit thickness uniformity management |
CN114472090B (zh) * | 2022-02-10 | 2023-06-02 | 华能新能源股份有限公司 | 一种膜层生长设备及膜层生长方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6117549Y2 (fr) * | 1980-05-10 | 1986-05-29 | ||
JPS61183464A (ja) * | 1985-02-07 | 1986-08-16 | Nec Corp | スパツタ装置 |
JPH1026698A (ja) * | 1996-07-12 | 1998-01-27 | Nikon Corp | 真空薄膜形成装置及び反射鏡の製造方法 |
US6547939B2 (en) * | 2001-03-29 | 2003-04-15 | Super Light Wave Corp. | Adjustable shadow mask for improving uniformity of film deposition using multiple monitoring points along radius of substrate |
US6733640B2 (en) * | 2002-01-14 | 2004-05-11 | Seagate Technology Llc | Shutter assembly having optimized shutter opening shape for thin film uniformity |
US20030164998A1 (en) * | 2002-03-01 | 2003-09-04 | The Regents Of The University Of California | Ion-assisted deposition techniques for the planarization of topological defects |
-
2002
- 2002-02-26 WO PCT/JP2002/001713 patent/WO2002077316A1/fr not_active Application Discontinuation
- 2002-02-26 EP EP02700781A patent/EP1400608A1/fr not_active Withdrawn
- 2002-02-26 KR KR1020027015552A patent/KR20030014231A/ko not_active Application Discontinuation
- 2002-02-26 US US10/296,291 patent/US20030129325A1/en not_active Abandoned
- 2002-02-27 TW TW091103509A patent/TW528890B/zh not_active IP Right Cessation
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