EP1309737A1 - Procede de revetement par plasma - Google Patents

Procede de revetement par plasma

Info

Publication number
EP1309737A1
EP1309737A1 EP01958165A EP01958165A EP1309737A1 EP 1309737 A1 EP1309737 A1 EP 1309737A1 EP 01958165 A EP01958165 A EP 01958165A EP 01958165 A EP01958165 A EP 01958165A EP 1309737 A1 EP1309737 A1 EP 1309737A1
Authority
EP
European Patent Office
Prior art keywords
coating
reaction fluid
during
treatment zone
deposited
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP01958165A
Other languages
German (de)
English (en)
French (fr)
Inventor
Jean-Tristan SIDEL OUTREMAN
Eric SIDEL ADRIANSENS
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sidel SA
Original Assignee
Sidel SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sidel SA filed Critical Sidel SA
Publication of EP1309737A1 publication Critical patent/EP1309737A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer

Definitions

  • the power of the electromagnetic field is kept substantially constant during the duration of the two stages; the pressure in the treatment zone during the second stage is lower than the pressure in the treatment zone during the first stage;
  • the reaction fluid comprises a gaseous hydrocarbon compound
  • the pressure outside does not drop below 0.05 to 0.1. bar, against a pressure of approximately 1 0 "4 bar inside. It can also be seen that the bottles, even with thin walls, can withstand this pressure difference without undergoing significant deformation. For this reason, provision is made to provide the cover with a controlled valve (not shown) capable of closing off the auxiliary termination.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Details Of Rigid Or Semi-Rigid Containers (AREA)
EP01958165A 2000-08-01 2001-07-24 Procede de revetement par plasma Withdrawn EP1309737A1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR0010101 2000-08-01
FR0010101A FR2812665B1 (fr) 2000-08-01 2000-08-01 Procede de depot de revetement par plasma, dispositif de mise en oeuvre du procede et revetement obtenu par un tel procede
PCT/FR2001/002406 WO2002010474A1 (fr) 2000-08-01 2001-07-24 Procede de revetement par plasma

Publications (1)

Publication Number Publication Date
EP1309737A1 true EP1309737A1 (fr) 2003-05-14

Family

ID=8853164

Family Applications (1)

Application Number Title Priority Date Filing Date
EP01958165A Withdrawn EP1309737A1 (fr) 2000-08-01 2001-07-24 Procede de revetement par plasma

Country Status (11)

Country Link
US (4) US20030150858A1 (zh)
EP (1) EP1309737A1 (zh)
JP (1) JP2004505177A (zh)
KR (1) KR20030033003A (zh)
CN (1) CN1446269A (zh)
AU (1) AU2001279897A1 (zh)
BR (1) BR0112873A (zh)
CA (1) CA2416521A1 (zh)
FR (1) FR2812665B1 (zh)
MX (1) MXPA03000910A (zh)
WO (1) WO2002010474A1 (zh)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7166336B1 (en) * 1999-05-19 2007-01-23 Mitsubishi Shoji Plastics Corporation DLC film, DLC-coated plastic container, and method and apparatus for manufacturing DLC-coated plastic container
DE10224546A1 (de) * 2002-05-24 2003-12-04 Sig Technology Ltd Verfahren und Vorrichtung zur Plasmabehandlung von Werkstücken
US7513953B1 (en) * 2003-11-25 2009-04-07 Nano Scale Surface Systems, Inc. Continuous system for depositing films onto plastic bottles and method
EP1828433A1 (en) * 2004-12-01 2007-09-05 Sidel Participations Method for manufacturing a pecvd carbon coated polymer article and article obtained by such method
JP2006261217A (ja) * 2005-03-15 2006-09-28 Canon Anelva Corp 薄膜形成方法
JP2006315697A (ja) * 2005-05-11 2006-11-24 Hokkai Can Co Ltd 炭酸飲料用プラスチックボトル
WO2007029050A1 (en) * 2005-09-09 2007-03-15 Sidel Barrier layer
US20070172612A1 (en) * 2006-01-23 2007-07-26 Plastipak Packaging, Inc. Plastic container
DE102007062977B4 (de) * 2007-12-21 2018-07-19 Schott Ag Verfahren zur Herstellung von Prozessgasen für die Dampfphasenabscheidung
US8062470B2 (en) * 2008-05-12 2011-11-22 Yuri Glukhoy Method and apparatus for application of thin coatings from plasma onto inner surfaces of hollow containers
DE102009020385A1 (de) * 2008-12-19 2010-07-01 Erhard & Söhne GmbH Druckluftbehälter für Nutzfahrzeuge und Verfahren zu dessen Herstellung
DE102014106129A1 (de) * 2014-04-30 2015-11-05 Thyssenkrupp Ag Verfahren und Vorrichtung zur kontinuierlichen Präkursorzuführung
GB201717996D0 (en) * 2017-10-31 2017-12-13 Portal Medical Ltd Medicament dispenser device
CN115366321A (zh) * 2022-09-20 2022-11-22 湖南千山制药机械股份有限公司 塑料杯注镀一体机及注镀灌封一体机

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4698256A (en) * 1984-04-02 1987-10-06 American Cyanamid Company Articles coated with adherent diamondlike carbon films
US4877677A (en) * 1985-02-19 1989-10-31 Matsushita Electric Industrial Co., Ltd. Wear-protected device
US4725345A (en) * 1985-04-22 1988-02-16 Kabushiki Kaisha Kenwood Method for forming a hard carbon thin film on article and applications thereof
FR2592874B1 (fr) * 1986-01-14 1990-08-03 Centre Nat Rech Scient Procede pour tremper un objet en verre ou vitreux et objet ainsi trempe
US4809876A (en) * 1987-08-27 1989-03-07 Aluminum Company Of America Container body having improved gas barrier properties
JP2679067B2 (ja) * 1987-12-15 1997-11-19 株式会社日本自動車部品総合研究所 ダイヤモンド膜付基板の製造方法
US5190824A (en) * 1988-03-07 1993-03-02 Semiconductor Energy Laboratory Co., Ltd. Electrostatic-erasing abrasion-proof coating
DE3830249A1 (de) * 1988-09-06 1990-03-15 Schott Glaswerke Plasmaverfahren zum beschichten ebener substrate
US5266409A (en) * 1989-04-28 1993-11-30 Digital Equipment Corporation Hydrogenated carbon compositions
DE69112465T2 (de) * 1990-03-30 1996-03-28 Sumitomo Electric Industries Polykristallines Diamantwerkzeug und Verfahren für seine Herstellung.
CA2044543C (en) * 1990-08-10 1999-12-14 Louis Kimball Bigelow Multi-layer superhard film structure
CA2089288A1 (en) * 1992-03-20 1993-09-21 David E. Slutz Multilayer cvd diamond films
DE4236324C1 (zh) * 1992-10-28 1993-09-02 Schott Glaswerke, 55122 Mainz, De
US5470661A (en) * 1993-01-07 1995-11-28 International Business Machines Corporation Diamond-like carbon films from a hydrocarbon helium plasma
EP0643385A3 (en) * 1993-09-12 1996-01-17 Fujitsu Ltd Magnetic recording medium, magnetic head and magnetic recording device.
JP2788412B2 (ja) * 1994-08-11 1998-08-20 麒麟麦酒株式会社 炭素膜コーティングプラスチック容器の製造装置および製造方法
JPH0853116A (ja) * 1994-08-11 1996-02-27 Kirin Brewery Co Ltd 炭素膜コーティングプラスチック容器
US6063149A (en) * 1995-02-24 2000-05-16 Zimmer; Jerry W. Graded grain size diamond layer
US5824387A (en) * 1996-02-05 1998-10-20 Seagate Technology, Inc. Magnetic disc with carbon protective layer having regions differing in hardness
JP3256459B2 (ja) * 1996-05-20 2002-02-12 株式会社大協精工 衛生品用容器及びその製造方法
DE19634795C2 (de) * 1996-08-29 1999-11-04 Schott Glas Plasma-CVD-Anlage mit einem Array von Mikrowellen-Plasmaelektroden und Plasma-CVD-Verfahren
US5942317A (en) * 1997-01-31 1999-08-24 International Business Machines Corporation Hydrogenated carbon thin films
JPH10217522A (ja) * 1997-02-07 1998-08-18 Fuji Photo Film Co Ltd サーマルヘッドおよびサーマルヘッドの製造方法
EP1010773A4 (en) * 1997-02-19 2004-08-25 Kirin Brewery METHOD AND DEVICE FOR PRODUCING PLASTIC CONTAINER COATED WITH CARBON FILM
US5879459A (en) * 1997-08-29 1999-03-09 Genus, Inc. Vertically-stacked process reactor and cluster tool system for atomic layer deposition
JPH10306377A (ja) * 1997-05-02 1998-11-17 Tokyo Electron Ltd 微量ガス供給方法及びその装置
US6110544A (en) * 1997-06-26 2000-08-29 General Electric Company Protective coating by high rate arc plasma deposition
JPH11111644A (ja) * 1997-09-30 1999-04-23 Japan Pionics Co Ltd 気化供給装置
US6194038B1 (en) * 1998-03-20 2001-02-27 Applied Materials, Inc. Method for deposition of a conformal layer on a substrate
US6475579B1 (en) * 1999-08-06 2002-11-05 Plastipak Packaging, Inc. Multi-layer plastic container having a carbon-treated internal surface and method for making the same
US6461699B1 (en) * 2000-10-06 2002-10-08 Plastipak Packaging, Inc. Plastic container having a carbon-treated internal surface for non-carbonated food products

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO0210474A1 *

Also Published As

Publication number Publication date
US20050019481A1 (en) 2005-01-27
MXPA03000910A (es) 2003-10-06
FR2812665B1 (fr) 2003-08-08
KR20030033003A (ko) 2003-04-26
CA2416521A1 (fr) 2002-02-07
US20050019577A1 (en) 2005-01-27
BR0112873A (pt) 2003-07-01
US20050016459A1 (en) 2005-01-27
WO2002010474A1 (fr) 2002-02-07
CN1446269A (zh) 2003-10-01
AU2001279897A1 (en) 2002-02-13
JP2004505177A (ja) 2004-02-19
US20030150858A1 (en) 2003-08-14
FR2812665A1 (fr) 2002-02-08

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Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20030303

AK Designated contracting states

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR

AX Request for extension of the european patent

Extension state: AL LT LV MK RO SI

RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: SIDEL

17Q First examination report despatched

Effective date: 20090310

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN

18D Application deemed to be withdrawn

Effective date: 20090721