EP1252554A1 - Korrektur von bildverzerrungen bei der herstellung von leiterplatten - Google Patents
Korrektur von bildverzerrungen bei der herstellung von leiterplattenInfo
- Publication number
- EP1252554A1 EP1252554A1 EP00969787A EP00969787A EP1252554A1 EP 1252554 A1 EP1252554 A1 EP 1252554A1 EP 00969787 A EP00969787 A EP 00969787A EP 00969787 A EP00969787 A EP 00969787A EP 1252554 A1 EP1252554 A1 EP 1252554A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- layer
- pattern
- image data
- conductive material
- layers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
Definitions
- Post-etch punching of inner layers offered the following advantages as compared to pre-exposure methods:
- the tooling pattern is punched in the inner layer after etching. All material movement resulting from artwork instability, etching, black oxidizing, etc. is compensated for by offset and global scale.
- linear scaling error may be characterized by a single correction factor per axis for a given type of layer
- non-linear scaling errors require a more complex correction scheme.
- second order non-linearity which requires two correction factors through higher degrees of non-linearity, which require a number of correction factors equal to the degree of non-linearity to the most complex case where the required correction factor is as complex as the image file itself.
- An actual conductor pattern (produced from an initial map or stored image data, and produced by a defined process on defined apparatus) on at least one inner layer (artificially termed "a first inner layer,” even though it does not have to be the first layer) is scanned by an image scanner to produce a scanned map or scanned image data.
- the information from the scanned image of the first inner layer includes either the entire pattern of the conductor pattern, substantially all areas of the conductor pattern which contain conductor sites, or a segmented (discontinuous) pattern identifying the location of all conductor sites in the first inner layer, or a preselected portion of conductor sites.
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Image Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/IL2000/000667 WO2002033492A1 (en) | 1999-07-06 | 2000-10-19 | Nonlinear image distortion correction in printed circuit board manufacturing |
Publications (1)
Publication Number | Publication Date |
---|---|
EP1252554A1 true EP1252554A1 (de) | 2002-10-30 |
Family
ID=11043004
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP00969787A Withdrawn EP1252554A1 (de) | 2000-10-19 | 2000-10-19 | Korrektur von bildverzerrungen bei der herstellung von leiterplatten |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP1252554A1 (de) |
JP (1) | JP4791681B2 (de) |
KR (1) | KR20020074163A (de) |
CN (1) | CN1434932A (de) |
AU (1) | AU2000279433A1 (de) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108901119A (zh) * | 2018-06-22 | 2018-11-27 | 广州兴森快捷电路科技有限公司 | 用于测量激光钻机孔位精度的治具及方法 |
CN116362957A (zh) * | 2021-12-27 | 2023-06-30 | 广州镭晨智能装备科技有限公司 | Pcb板卡图像对齐的方法、装置、介质和电子设备 |
CN117141037A (zh) * | 2023-10-30 | 2023-12-01 | 山西昌鸿电力器材有限公司 | 一种电力金具加工工艺 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100526035B1 (ko) * | 2003-05-07 | 2005-11-08 | 홍성국 | 메탈 마스크 검사 장치 및 그의 검사 방법 |
JP4844835B2 (ja) * | 2004-09-14 | 2011-12-28 | 株式会社ニコン | 補正方法及び露光装置 |
US7368207B2 (en) * | 2006-03-31 | 2008-05-06 | Eastman Kodak Company | Dynamic compensation system for maskless lithography |
CN103097956B (zh) * | 2010-02-26 | 2016-01-27 | 密克罗尼克麦达塔公司 | 用于执行图案对准的方法和装置 |
CN111694226B (zh) * | 2020-05-25 | 2022-05-17 | 合肥芯碁微电子装备股份有限公司 | 水平度测量方法和直接式成像设备 |
KR102385554B1 (ko) * | 2020-06-16 | 2022-04-13 | 재단법인 아산사회복지재단 | 나노구조체 기반의 표면증강라만 기판 및 그 제조 방법 |
CN114485409A (zh) * | 2022-04-18 | 2022-05-13 | 深圳市元硕自动化科技有限公司 | 原料板质量检测方法、装置、设备及可读存储介质 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3291176B2 (ja) * | 1995-05-15 | 2002-06-10 | 松下電工株式会社 | 回路パターンの検査方法および検査装置 |
-
2000
- 2000-10-19 EP EP00969787A patent/EP1252554A1/de not_active Withdrawn
- 2000-10-19 AU AU2000279433A patent/AU2000279433A1/en not_active Abandoned
- 2000-10-19 KR KR1020027007439A patent/KR20020074163A/ko not_active Application Discontinuation
- 2000-10-19 JP JP2002536614A patent/JP4791681B2/ja not_active Expired - Fee Related
- 2000-10-19 CN CN00819083A patent/CN1434932A/zh active Pending
Non-Patent Citations (1)
Title |
---|
See references of WO0233492A1 * |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108901119A (zh) * | 2018-06-22 | 2018-11-27 | 广州兴森快捷电路科技有限公司 | 用于测量激光钻机孔位精度的治具及方法 |
CN116362957A (zh) * | 2021-12-27 | 2023-06-30 | 广州镭晨智能装备科技有限公司 | Pcb板卡图像对齐的方法、装置、介质和电子设备 |
CN116362957B (zh) * | 2021-12-27 | 2024-05-14 | 广州镭晨智能装备科技有限公司 | Pcb板卡图像对齐的方法、装置、介质和电子设备 |
CN117141037A (zh) * | 2023-10-30 | 2023-12-01 | 山西昌鸿电力器材有限公司 | 一种电力金具加工工艺 |
CN117141037B (zh) * | 2023-10-30 | 2024-02-02 | 山西昌鸿电力器材有限公司 | 一种电力金具加工工艺 |
Also Published As
Publication number | Publication date |
---|---|
KR20020074163A (ko) | 2002-09-28 |
JP2004512678A (ja) | 2004-04-22 |
CN1434932A (zh) | 2003-08-06 |
AU2000279433A1 (en) | 2002-04-29 |
JP4791681B2 (ja) | 2011-10-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE |
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AX | Request for extension of the european patent |
Free format text: AL;LT;LV;MK;RO;SI |
|
17P | Request for examination filed |
Effective date: 20030513 |
|
RBV | Designated contracting states (corrected) |
Designated state(s): AT BE CH DE FR GB LI |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 20060501 |