EP1200509B1 - Composites of powdered fillers and polymer matrix and process for preparing them - Google Patents

Composites of powdered fillers and polymer matrix and process for preparing them Download PDF

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Publication number
EP1200509B1
EP1200509B1 EP00945027A EP00945027A EP1200509B1 EP 1200509 B1 EP1200509 B1 EP 1200509B1 EP 00945027 A EP00945027 A EP 00945027A EP 00945027 A EP00945027 A EP 00945027A EP 1200509 B1 EP1200509 B1 EP 1200509B1
Authority
EP
European Patent Office
Prior art keywords
materials
particles
polymer
mixture
filler
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP00945027A
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German (de)
English (en)
French (fr)
Other versions
EP1200509A1 (en
Inventor
Richard A. Holl
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kreido Laboratories
Original Assignee
Kreido Laboratories
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Filing date
Publication date
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
    • C08K3/013—Fillers, pigments or reinforcing additives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/22—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces for producing castings from a slip
    • B22F3/227—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces for producing castings from a slip by organic binder assisted extrusion
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F33/00—Other mixers; Mixing plants; Combinations of mixers
    • B01F33/80—Mixing plants; Combinations of mixers
    • B01F33/836—Mixing plants; Combinations of mixers combining mixing with other treatments
    • B01F33/8361—Mixing plants; Combinations of mixers combining mixing with other treatments with disintegrating
    • B01F33/83613—Mixing plants; Combinations of mixers combining mixing with other treatments with disintegrating by grinding or milling
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/10—Metallic powder containing lubricating or binding agents; Metallic powder containing organic material
    • B22F1/102—Metallic powder coated with organic material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/10—Metallic powder containing lubricating or binding agents; Metallic powder containing organic material
    • B22F1/107—Metallic powder containing lubricating or binding agents; Metallic powder containing organic material containing organic material comprising solvents, e.g. for slip casting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F7/00—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression
    • B22F7/02—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite layers
    • B22F7/04—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite layers with one or more layers not made from powder, e.g. made from solid metal
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29B—PREPARATION OR PRETREATMENT OF THE MATERIAL TO BE SHAPED; MAKING GRANULES OR PREFORMS; RECOVERY OF PLASTICS OR OTHER CONSTITUENTS OF WASTE MATERIAL CONTAINING PLASTICS
    • B29B13/00—Conditioning or physical treatment of the material to be shaped
    • B29B13/10—Conditioning or physical treatment of the material to be shaped by grinding, e.g. by triturating; by sieving; by filtering
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29B—PREPARATION OR PRETREATMENT OF THE MATERIAL TO BE SHAPED; MAKING GRANULES OR PREFORMS; RECOVERY OF PLASTICS OR OTHER CONSTITUENTS OF WASTE MATERIAL CONTAINING PLASTICS
    • B29B7/00—Mixing; Kneading
    • B29B7/30—Mixing; Kneading continuous, with mechanical mixing or kneading devices
    • B29B7/34—Mixing; Kneading continuous, with mechanical mixing or kneading devices with movable mixing or kneading devices
    • B29B7/38—Mixing; Kneading continuous, with mechanical mixing or kneading devices with movable mixing or kneading devices rotary
    • B29B7/40—Mixing; Kneading continuous, with mechanical mixing or kneading devices with movable mixing or kneading devices rotary with single shaft
    • B29B7/401—Mixing; Kneading continuous, with mechanical mixing or kneading devices with movable mixing or kneading devices rotary with single shaft having a casing closely surrounding the rotor, e.g. with a plunger for feeding the material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29B—PREPARATION OR PRETREATMENT OF THE MATERIAL TO BE SHAPED; MAKING GRANULES OR PREFORMS; RECOVERY OF PLASTICS OR OTHER CONSTITUENTS OF WASTE MATERIAL CONTAINING PLASTICS
    • B29B7/00—Mixing; Kneading
    • B29B7/30—Mixing; Kneading continuous, with mechanical mixing or kneading devices
    • B29B7/58—Component parts, details or accessories; Auxiliary operations
    • B29B7/60—Component parts, details or accessories; Auxiliary operations for feeding, e.g. end guides for the incoming material
    • B29B7/603—Component parts, details or accessories; Auxiliary operations for feeding, e.g. end guides for the incoming material in measured doses, e.g. proportioning of several materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29B—PREPARATION OR PRETREATMENT OF THE MATERIAL TO BE SHAPED; MAKING GRANULES OR PREFORMS; RECOVERY OF PLASTICS OR OTHER CONSTITUENTS OF WASTE MATERIAL CONTAINING PLASTICS
    • B29B7/00—Mixing; Kneading
    • B29B7/74—Mixing; Kneading using other mixers or combinations of mixers, e.g. of dissimilar mixers ; Plant
    • B29B7/7461—Combinations of dissimilar mixers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29B—PREPARATION OR PRETREATMENT OF THE MATERIAL TO BE SHAPED; MAKING GRANULES OR PREFORMS; RECOVERY OF PLASTICS OR OTHER CONSTITUENTS OF WASTE MATERIAL CONTAINING PLASTICS
    • B29B7/00—Mixing; Kneading
    • B29B7/74—Mixing; Kneading using other mixers or combinations of mixers, e.g. of dissimilar mixers ; Plant
    • B29B7/7466—Combinations of similar mixers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29B—PREPARATION OR PRETREATMENT OF THE MATERIAL TO BE SHAPED; MAKING GRANULES OR PREFORMS; RECOVERY OF PLASTICS OR OTHER CONSTITUENTS OF WASTE MATERIAL CONTAINING PLASTICS
    • B29B7/00—Mixing; Kneading
    • B29B7/74—Mixing; Kneading using other mixers or combinations of mixers, e.g. of dissimilar mixers ; Plant
    • B29B7/7476—Systems, i.e. flow charts or diagrams; Plants
    • B29B7/748—Plants
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29B—PREPARATION OR PRETREATMENT OF THE MATERIAL TO BE SHAPED; MAKING GRANULES OR PREFORMS; RECOVERY OF PLASTICS OR OTHER CONSTITUENTS OF WASTE MATERIAL CONTAINING PLASTICS
    • B29B7/00—Mixing; Kneading
    • B29B7/74—Mixing; Kneading using other mixers or combinations of mixers, e.g. of dissimilar mixers ; Plant
    • B29B7/7476—Systems, i.e. flow charts or diagrams; Plants
    • B29B7/7485—Systems, i.e. flow charts or diagrams; Plants with consecutive mixers, e.g. with premixing some of the components
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29B—PREPARATION OR PRETREATMENT OF THE MATERIAL TO BE SHAPED; MAKING GRANULES OR PREFORMS; RECOVERY OF PLASTICS OR OTHER CONSTITUENTS OF WASTE MATERIAL CONTAINING PLASTICS
    • B29B7/00—Mixing; Kneading
    • B29B7/80—Component parts, details or accessories; Auxiliary operations
    • B29B7/88—Adding charges, i.e. additives
    • B29B7/90—Fillers or reinforcements, e.g. fibres
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C48/00—Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
    • B29C48/03—Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor characterised by the shape of the extruded material at extrusion
    • B29C48/07—Flat, e.g. panels
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C48/00—Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
    • B29C48/25—Component parts, details or accessories; Auxiliary operations
    • B29C48/36—Means for plasticising or homogenising the moulding material or forcing it through the nozzle or die
    • B29C48/375—Plasticisers, homogenisers or feeders comprising two or more stages
    • B29C48/38—Plasticisers, homogenisers or feeders comprising two or more stages using two or more serially arranged screws in the same barrel
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C67/00—Shaping techniques not covered by groups B29C39/00 - B29C65/00, B29C70/00 or B29C73/00
    • B29C67/24—Shaping techniques not covered by groups B29C39/00 - B29C65/00, B29C70/00 or B29C73/00 characterised by the choice of material
    • B29C67/242—Moulding mineral aggregates bonded with resin, e.g. resin concrete
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C70/00—Shaping composites, i.e. plastics material comprising reinforcements, fillers or preformed parts, e.g. inserts
    • B29C70/58—Shaping composites, i.e. plastics material comprising reinforcements, fillers or preformed parts, e.g. inserts comprising fillers only, e.g. particles, powder, beads, flakes, spheres
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/20—Compounding polymers with additives, e.g. colouring
    • C08J3/205—Compounding polymers with additives, e.g. colouring in the presence of a continuous liquid phase
    • C08J3/21—Compounding polymers with additives, e.g. colouring in the presence of a continuous liquid phase the polymer being premixed with a liquid phase
    • C08J3/212—Compounding polymers with additives, e.g. colouring in the presence of a continuous liquid phase the polymer being premixed with a liquid phase and solid additives
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L71/00—Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
    • C08L71/08—Polyethers derived from hydroxy compounds or from their metallic derivatives
    • C08L71/10—Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
    • C08L71/12—Polyphenylene oxides
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C32/00—Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ
    • C22C32/0094—Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ with organic materials as the main non-metallic constituent, e.g. resin
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/12—Mountings, e.g. non-detachable insulating substrates
    • H01L23/14—Mountings, e.g. non-detachable insulating substrates characterised by the material or its electrical properties
    • H01L23/145—Organic substrates, e.g. plastic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293—Organic, e.g. plastic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
    • H01L23/3737—Organic materials with or without a thermoconductive filler
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/03—Use of materials for the substrate
    • H05K1/0313—Organic insulating material
    • H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
    • H05K1/0373—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement containing additives, e.g. fillers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/381—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the substrate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/00074—Controlling the temperature by indirect heating or cooling employing heat exchange fluids
    • B01J2219/00087—Controlling the temperature by indirect heating or cooling employing heat exchange fluids with heat exchange elements outside the reactor
    • B01J2219/00094—Jackets
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/20—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces by extruding
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29B—PREPARATION OR PRETREATMENT OF THE MATERIAL TO BE SHAPED; MAKING GRANULES OR PREFORMS; RECOVERY OF PLASTICS OR OTHER CONSTITUENTS OF WASTE MATERIAL CONTAINING PLASTICS
    • B29B7/00—Mixing; Kneading
    • B29B7/80—Component parts, details or accessories; Auxiliary operations
    • B29B7/82—Heating or cooling
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29B—PREPARATION OR PRETREATMENT OF THE MATERIAL TO BE SHAPED; MAKING GRANULES OR PREFORMS; RECOVERY OF PLASTICS OR OTHER CONSTITUENTS OF WASTE MATERIAL CONTAINING PLASTICS
    • B29B7/00—Mixing; Kneading
    • B29B7/80—Component parts, details or accessories; Auxiliary operations
    • B29B7/84—Venting or degassing ; Removing liquids, e.g. by evaporating components
    • B29B7/845—Venting, degassing or removing evaporated components in devices with rotary stirrers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C48/00—Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2021/00—Use of unspecified rubbers as moulding material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2071/00—Use of polyethers, e.g. PEEK, i.e. polyether-etherketone or PEK, i.e. polyetherketone or derivatives thereof, as moulding material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2105/00—Condition, form or state of moulded material or of the material to be shaped
    • B29K2105/06—Condition, form or state of moulded material or of the material to be shaped containing reinforcements, fillers or inserts
    • B29K2105/16—Fillers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2503/00—Use of resin-bonded materials as filler
    • B29K2503/04—Inorganic materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2371/00—Characterised by the use of polyethers obtained by reactions forming an ether link in the main chain; Derivatives of such polymers
    • C08J2371/08—Polyethers derived from hydroxy compounds or from their metallic derivatives
    • C08J2371/10—Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
    • C08J2371/12—Polyphenylene oxides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00—Specific properties of additives
    • C08K2201/002—Physical properties
    • C08K2201/005—Additives being defined by their particle size in general
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4814—Conductive parts
    • H01L21/4871—Bases, plates or heatsinks
    • H01L21/4882—Assembly of heatsink parts
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10—Details of semiconductor or other solid state devices to be connected
    • H01L2924/11—Device type
    • H01L2924/12—Passive devices, e.g. 2 terminal devices
    • H01L2924/1204—Optical Diode
    • H01L2924/12044—OLED
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
    • H05K2201/0203—Fillers and particles
    • H05K2201/0206—Materials
    • H05K2201/0209—Inorganic, non-metallic particles
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
    • H05K2201/0203—Fillers and particles
    • H05K2201/0206—Materials
    • H05K2201/0212—Resin particles
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
    • H05K2201/0203—Fillers and particles
    • H05K2201/0206—Materials
    • H05K2201/0215—Metallic fillers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
    • H05K2201/0203—Fillers and particles
    • H05K2201/0206—Materials
    • H05K2201/0227—Insulating particles having an insulating coating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
    • H05K2201/0203—Fillers and particles
    • H05K2201/0242—Shape of an individual particle
    • H05K2201/0254—Microballoons or hollow filler particles
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/06—Thermal details
    • H05K2201/068—Thermal details wherein the coefficient of thermal expansion is important
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/07—Electric details
    • H05K2201/0776—Resistance and impedance
    • H05K2201/0792—Means against parasitic impedance; Means against eddy currents
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/08—Magnetic details
    • H05K2201/083—Magnetic materials
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/02—Details related to mechanical or acoustic processing, e.g. drilling, punching, cutting, using ultrasound
    • H05K2203/0278—Flat pressure, e.g. for connecting terminals with anisotropic conductive adhesive
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/06—Lamination
    • H05K2203/068—Features of the lamination press or of the lamination process, e.g. using special separator sheets
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
    • H05K2203/1194—Thermal treatment leading to a different chemical state of a material, e.g. annealing for stress-relief, aging
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/022—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/14—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using spraying techniques to apply the conductive material, e.g. vapour evaporation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12014—All metal or with adjacent metals having metal particles
    • Y10T428/12028—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, etc.]

Definitions

  • the invention is concerned with methods for the manufacture of composite materials consisting of particles of finely powdered filler material bonded in a matrix of polymer material, and new composite materials made by such methods.
  • the electronics industry is an example of one which makes substantial use of printed wiring boards and substrates as supports and dielectric participants for electronic circuits, such substrates consisting ofthin flat pieces produced to exacting specifications as to starting material and physical and electrical properties.
  • the history of the industry shows the use of progressively higher operating frequencies and currently for frequencies up to about 800 megahertz (MHz) copper coated circuit boards of glass fiber reinforced polymers, such as epoxies, cyanide esters, polytetrafluoroethylene (PTFE) and polyimides, have been and are still used.
  • FR-4 consisting of epoxyresin deposited on a woven glass fabric, because of its ease of manufacture and low cost.
  • this material typically has a dielectric constant of 4.3-4.6 and a dissipation factor of 0.016-0.022 and is frequently used in computerrelated applications below about 500 MHz frequencies.
  • Mobile telephones now operate at frequencies of 1-40 GHz and some computers already at 0.5 GHz, with the prospect of higher frequencies in the future.
  • the lowest possible value ofdielectric constant is preferred in computer applications to improve signal speed.
  • FR-4 and similar materials are materials, despite their low cost, are no longer entirely suitable, primarily because of unacceptable dielectric losses, heating up, lack of sufficient uniformity, unacceptable anisotropy, unacceptable mismatch of thermal expansion between the dielectric material and its metallization, and anisotropic thermal expansion problems as the operating temperatures ofthe substrates fluctuate.
  • the dielectric material ofthe substrates become an active capacitative participant in signal propagation and here the current materials of choice are certain ceramics formed by sintering or firing suitable powdered inorganic materials, such as fused silica; alumina; aluminum nitride; boron nitride; barium titanate; barium titanate complexes such as Ba(Mg 1/3 Ti 2/3 )O 2 , Ba(Zr,Sn)TiO 4 , and BaTiO 3 doped with Sc 2 O 3 and rare earth oxides; alkoxide-derived SrZrO 3 and SrTiO 3 ; and pyrochlore structured Ba(Zr,Nb) oxides.
  • Substrates have also been employed consisting of metal powders, and semiconductor powders embedded in a glass or polymer matrix, a particular
  • Dielectric materials are commonly used as insulating layers between circuits, and layers of circuits in multilayer integrated circuits, the most commonly used of which is silica, which in its various modifications has dielectric constants of the order of 3.0-5.0, more usually 4.0-4.5.
  • Low values of dielectric constant are preferred and organic polymers inherently usually have low dielectric values in the range 1.9-3.5, so that considerable research and work has been done to try to develop polymers suitable for this special purpose, among which are polyimides (frequently fluorinated), PTFE, and fluorinated poly(arylene ethers), some of the materials having dielectric constants as low as that of air, i.e. 1.00.
  • fluorination is the most common modification of the polymers employed in view of the improvements obtained comprising lowered dielectric constants, enhanced optical transparency, and reduced hydrophilicity and solubility in organic solvents, but the fluorination usually results in the polymers exhibiting a degree of polarization which can cause problems in obtaining the desired dielectric properties.
  • Ar 1 , Ar 2 , Ar 3 and Ar 4 are stated to allow access to a variety of properties such as reduction or elimination of crystallinity, modulus, tensile strength, high glass transition temperature, etc.
  • the polymers are said to be essentially chemically inert, have low polarity, have no additional functional or reactive groups, and to be thermally stable at temperatures of 400°-450°C in inert atmospheres.
  • the polymers may also be cross-linked, either by cross-linking itself, through exposure to temperatures in the range of 350°-450°C, or by providing a cross-linking agent, as well as end capping the polymer with known end capping agents, such as phenylethynyl, benzocyclobutene, ethynyl and nitrile.
  • end capping agents such as phenylethynyl, benzocyclobutene, ethynyl and nitrile.
  • the specified polymers are non-functional in that the are chemically inert and they do not bear any functional groups that are detrimental to their application in the fabrication of microelectronic devices. They do not have carbonyl moieties such as amide, imide and ketone, which promote adsorption ofwater. They do not bear halogens such as fluorine, chlorine, bromine and iodine which can react with metal sources in metal deposition processes. They are composed essentially of aromatic carbons, except for the bridging carbon in the 9,9-fluorenylidene group, which has much ofthe character of aromatic carbons due to its proximity to aromatic structures; for the purposes of the invention the carbon is deemed to be a perphenylated carbon.
  • the polymers are proposed for use as coatings, layers, encapsulants, barrier regions or barrier layers or substrates in microelectronic devices. These devices may include, but are not limited to multichip modules, integrated circuits, conductive layers in integrated circuits, conductors in circuit patterns of an integrated circuit, circuit boards as well as similar or analogous electronic structures requiring insulating or dielectric regions or layers. They are also proposed for use as a substrate (dielectric material) in circuit boards or printed wiring boards. Such a circuit board has mounted on its surface patterns for various electrical conductor circuits, and may include various reinforcements, such as woven nonconducting fibers, such as glass cloth. Such circuit boards may be single sided as well as double sided or multilayer.
  • additives can be used to impart particular target properties, as is conventionally known in the polymer art, including stabilizers, flame retardants, pigments, plasticizers, surfactants, and the like.
  • adhesion promoters can be used to adhere the polymers to the appropriate substrates. Such promoters are typified by hexamethyldisilazane, which can be used to interact with available hydroxyl functionality that maybe present on a surface, such as a silica surface.
  • PCT Patent Application No 97 42639 A discloses a polymeric composition having a high dielectric constant which varies little with temperature and is made from a thermoplastic polymer, a high dielectric ceramic having a dielectric constant of at least about 50 at 1.0 GHz and 20 °C, and a second ceramic material having a dielectric constant ofat least about 5.0 at 1.0 GHz and 20 °C, where the high dielectric ceramic and the second ceramic material have temperature coefficients that are opposite in sign from one another.
  • European Patent Application No 660 336 discloses an electrical insulatingmaterial having a matrix composed of at least one polymer in which at least one insulating mineral, which is constructed in the form of platelets, is embedded.
  • the intention is stated to be to create an insulating material which is suitable for the production of insulation which is free of partial discharge even at high voltages (stresses) and at comparatively high operating temperatures. This is achieved in that a temperature-resistant thermoplastic is provided as the polymer, and in that micro-mica platelets having a particle size ofless than 20 mu m are embedded as the insulating material.
  • it is intended to specify a method for the production of an electrically insulated conductor in which the insulating material is used.
  • the principal object of the invention is to provide new methods for manufacturing composite materials consisting of particles of finely powdered fillermaterial bonded together in a matrix of polymer material, such new composite materials, and articles made from such composite materials.
  • the polymer material may be selected from the group consisting ofpolyarylene ether-2 (PAE-2), polyarylene ether-3 (PAE-3), and polyarylene ether-4 (PAE-4), wherein PAE-2 is a poly(arylene ether) having a biphenyl diradical repeating unit linked with 4,4'-diradical of 9,9-diphenylfluorene, PAE-3 is a poly(arylene ether) having a para-terphenyl diradical repeating unit linked with 4,4'-diradical of 9,9-diphenylfluorene, and PAE-4 is a poly(arylene ether) having a repeating unit which is a combination of the PAE-2 and PAE-3 repeating units.
  • PAE-2 is a poly(arylene ether) having a biphenyl diradical repeating unit linked with 4,4'-diradical of 9,9-diphenylfluorene
  • PAE-3 is a poly(arylene ether) having
  • the polymer may be heated to a temperature in the range 350-450°C to obtain cross-linking thereof.
  • the composite mixture may include a cross-linking agent and/or an end capping agent.
  • the filler material maybe selected from the group consisting of particles of inorganic material, particles of electromagnetic material, particles of a core of inorganic material covered with a layer ofa metal oxide material, particles ofmetal material, and particles ofa polymer material having a dielectric constant in a 1.9-3.5 range, all of which particles may be hollow.
  • the composite mixture may be heated to a temperature in the range 280-400°C and at a pressure in the range 3.5 to 1,380 MPa (500 to 200,000 psi), preferably 70 to 1,380 MPa (10,000 to 200,000 psi).
  • the method may further comprise the steps ofmixing together the particles of filler material in finely powdered form, the polymer, and a liquid dispersion medium to form aflowable composite mixture thereof, grinding the flowable composite mixture to uniformly disperse the particles of the finely powdered materials in the liquid dispersion medium, removing liquid dispersion medium from the flowable composite mixture to produce a pasty composite mixture and forming articles from the composite pasty mixture and subjecting the articles to the specified temperature and pressure.
  • Each of the polymer and the filler material may be mixed separately with a respective liquid dispersion medium, and may be mixed in respective drum type grinding apparatus to provide uniform dispersion of the components.
  • the composite mixture may be mixed in at least one drum type grinding apparatus to provide uniform dispersion of the components.
  • the particles of filler material maybe of size in the range 0.1 to 50 micrometers and the polymer material, when in the form of solid particles may also be ofsize in the range 0.01 to 50 micrometers, and wherein the particles of filler material mayconsist of a mixture of filler materials of different chemical compositions.
  • the method may further include the step of forming the heated and pressurized composite mixture into a sheet, film or tape.
  • the method may further comprise the step of applying a layer ofcopper to a surface of the sheet, film or tape by a process selected from sputtering and direct bonding of copper foil under heat and pressure in a vacuum.
  • the sheet, film or tape may have a thickness less than about 1.5 mm (60 niil), alternatively less than about .75 mm (30 mil), alternatively less than about .25 mm (10 mil), alternatively less than about .1 mm (4 mil), and alternatively less than about .025 mm (1 mil).
  • the method may further include the step of applying a layer of copper to a surface of the heated and pressurized composite mixture by a process selected from sputtering and direct bonding of copper foil.
  • the resulting heated and pressed composite material may be ground back down to become again finelydivided particles of the filler material intimately mixed with the polymer material, and the resultant finely divided particles are again subjected to a heating and pressing operation to produce a solid body of the composite material.
  • the method may further include the step of forming substrates for electronic circuits from the heated and pressurized composite mixture.
  • the method may further include the step of enclosing electronic circuits or devices with the heated and pressurized composite mixture.
  • composite materials comprising particles of finely powdered filler material uniformly distributed in a matrix of polymer matetial, the materials comprising:
  • the polymer material is of maximum dimension or maximum equivalent spherical dimension of 50 ⁇ m.
  • the polymer material may be selected from the group consisting of polyarylene ether-2, polyarylene ether-3, and polyarlene ether-4.
  • the filler material may be selected from the group consisting of particles of inorganic material, particles of electromagnetic material, particles of a core of inorganic material covered with a layer of a metal oxide material, particles of metal material, and particles of low dielectric constant high melting point polymer material, all of which particles may be hollow.
  • the particles of filler material are of size in the range 0.1 to 50 micrometers, and wherein the particles of filler material consist of a mixture of filler materials of different chemical compositions.
  • the materials may have the form of a sheet, film or tape, and in that the sheet, film or tape has a thickness less than about 60 mil, alternatively less than about 30 mil, alternatively less than about 10 mil, alternatively less than about 4 mil, and alternatively less than about 1 mil.
  • the materials may comprise a layer ofcopper applied to a surface of the sheet, film or tape by sputtering or by direct bonding of copper foil under heat and pressure in a vacuum.
  • the materials may have a layer of copper applied to a surface by sputtering or by direct bonding of copper foil.
  • the materials may comprise substrates for electronic circuits formed from the heated and pressurized composite mixture.
  • the materials may comprise electronic circuits or devices enclosed with the composite mixture.
  • An acceptable minimum formy new composite materials is 60 volume percent, in that such materials are ofthe required minimum mechanical strength, it being found that the mechanical strength increases with increased solids content, instead of decreasing, up to the value of about 95-97 volume percent, or beyond which the proportion of polymer is reduced below the minimum value required to maintain adequate adhesion between the uniformly distributed filler particles.
  • Composite materials of the invention can be made by mixing together the required portion by weight, or by volume, ofparticles ofthe chosen non-polar, nonfunctionalized polymer material of sufficiently small dimension, or equivalent spherical dimension, e.g. in the range 0.1 to 50 micrometers, with the corresponding portion by weight or by volume of the chosen filler material, again of sufficiently small dimension, or equivalent spherical dimension, e.g. in the range 0.1 to 50 micrometers, and subjecting the mixture to a temperature sufficient to melt the polymer material, e.g. in the range 280-400°C and to a pressure, e.g.
  • spherical diameter is meant the diameter of a completely spherical particle having the same volume as the specified particle.
  • the polymer material preferably is selected from the group comprising polyarylene ether-2, polyarylene ether-3, and polyarylene ether-4, which materials are described in more detail below, while the filler material is selected from the group comprising particles ofinorganic material, particles of electromagnetic material, particles of a core of inorganic material covered with a layer of a metal oxide material, particles of metal material, particles ofmagnetic material, and particles oflow dielectric constant high melting point polymer material, all of which particles may be hollow.
  • the resultant heated and pressurized composite mixture may be formed into a sheet, film or tape, onto a surface ofwhich a layer of copper may be applied, either by sputtering or by direct bonding of copper foil under heat and pressure in a vacuum, the sheet, film or tape being formed by a thermoplastic extrusion process.
  • green bodies can be cut from sheet or tape before the heat and pressure step and these green bodies then converted to heated and pressed bodies by a thermoplastic compression process, again to a surface ofwhich a layer ofcopper can be applied by sputtering or by direct bonding of copper foil under heat and pressure in a vacuum.
  • the resultant bodies may comprise substrates for electronic circuits or enclosures for electronic circuits or devices.
  • the polymer is used in the form of a solution thereof (usually of about 10% concentration) in a suitable solvent such as cyclohexanone, and the opportunity is taken of employing this solvent also as a liquid dispersion and suspension vehicle for the filler materials.
  • a preliminary mixture is first formed of each of the selected finely powdered filler materials, usually inorganic materials, with the selected polymer solution, although in other processes other vehicles may of course also be used.
  • the filler material or mixture ofmaterials may be obtained respectively byprecipitation or coprecipitation from solutions of suitable precursors, and however obtained should have the required purity, dielectric constant, loss tangent, and particle size distribution.
  • up to four different powdered materials can be fed from a delivery and metering system comprising a plurality of hoppers 10, 12, 14 and 16 respectively, while the solution of the polymer in the cyclohexanone is fed from its hopper 18, and suitable surface active functional additives, if required, such as surfactants, plasticizers and lubricants, are fed from a respective hopper 20.
  • Each powdered material can be fed directly to the respective hopper 10, 12, 14, and 16, or alternatively obtained from respective precipitation or coprecipitation systems 22, 24, or 26 (a system for the contents of the hopper L6 is not shown). If the polymer is employed in the form of a powder then it will be fed from the hopper 18, while the dispersion vehicle will be fed from a respective hopper, or perhaps from the hopper 20 along with the additives.
  • the flow of each filler powder from its hopper is continuously precision metered by a respective meter 28, that of the polymer solution is metered by meter 32, that of the surface active additives is metered by meter 34, and those of the combined polymer solution/filler or additive flows are metered byrespective meters 36.
  • Each preliminary mixture of polymer solution, powders and additives is delivered into a respective drum type mixer/grinding mill 38, described in more detail below.
  • One ofthe aspects of the invention that also distinguishes it from prior art processes is that it is preferred to use low cost powders of a relatively wide range of particle sizes in order to obtain optimum packing together ofthe particles, and resultant minimization ofthe interposed polymer layers, as contrasted with the highly uniform size, and consequently expensive, powders which were required, particularly for the production of fired ceramic substrates to achieve adequate uniformity of processing.
  • the respective powder particles Prior to the formation of each mixture the respective powder particles usually consist ofparticles of a range of sizes and agglomerates ofmany finer particles that can vary even more widely in size, and this must be corrected, particularly the reduction of the agglomerates back to their individual particles.
  • Each mixer/mill 38 operates to mix the components and produce complete dispersion of the powdered material in the liquid vehicle, and also as a grinding mill to mill the respective powder particles and agglomerates to a required size distribution to a obtain a required degree of uniformity, but with a distribution that will also result in a minimum pore volume when compacted.
  • the proportions ofthe powder, polymer solution and additives from the hoppers are such as to obtain a solids content in the respective preliminary mixture in the range of 40-95% by volume, the quantities of the dispersing vehicle and the functional additives being kept as low as possible, but sufficient for the consistency of the mixture to be kept to that of a relatively wet paste or slurry, to permit its free flow through the relatively narrow processing flow passages of the respective mill 38, and the subsequent machines.
  • a viscosity in the range of about 100-10,000 centipoises will usually be satisfactory.
  • deagglomeration and dispersion of each preliminary mixture is carried out simultaneously in its respective mill 38, using for this purpose a special mill which is the subject of my U.S. Patents Nos. 5,279,463, issued 18 January, 1994, and 5,538,191, issued 23 July, 1996.
  • mills maybe oftwo major types, in a first of which the mill has two circular coaxial plate members with a processing gap formed between them; the axis of rotation can be vertical of horizontal. It is preferred however to use the second type of mill, which consists of an inner cylindrical member rotatable about a horizontal axis inside a stationary hollow outer cylindrical member, the axes of the two cylinders being slightly displaced so that the facing walls are more closely spaced together at one longitudinal location around their periphery to form, parallel to the axes, what is referred to as a processing or micro gap, and are more widely spaced at the diametrically opposed longitudinal location to form, again parallel to the axes, what is referred to as a complementary or macro gap.
  • the mixture flows through the processing gap producing so-called “supra-Kolmorgoroff” mixing eddies in the portion of the slurry at and close to the macro gap and so-called “sub-Kolmorgoroff” mixing eddies in the micro or processing gap.
  • Ultrasonic transducers may be mounted on the stationary member which apply longitudinal pressure oscillations into the processing gap and reinforce the "sub-Kolmorgoroff” mixing eddies.
  • Such apparatus is capable of processing relatively thick slurries of sub-micrometer particles in minutes that otherwise can take several days in conventional high shear mixers and ball or sand mills.
  • the separate preliminary mixtures are now mixed together to form a combined mixture having the consistency of a uniform slurry or wet paste bypassing them into a mixer/mill 40, in which the combined mixture is subjected to another grinding, deagglomerating and uniform dispersing operation.
  • the mixer/mill 40 is again one of the above-mentioned special mills which are the subject of my Patents Nos. 5,279,463 and 5,538,191, being also of the type comprising an inner cylindrical member rotatable inside a stationary hollow outer cylindrical member.
  • a single mixer/mill 40 is employed in this embodiment, in some processes it may be preferred to employ a chain of two or more such mills depending upon the amount and rate of grinding, deagglomeration and mixing that is required.
  • the milled slurry from the mill 40 passes to a mixer/solvent evaporation mill 42 which again is of the type comprising an inner cylindrical member 44 rotatable inside a stationary hollow outer cylindrical member 46, the paste being carried on the outer cylindrical surface of the member 44 in the form of a thin film 47.
  • a mixer/solvent evaporation mill 42 which again is of the type comprising an inner cylindrical member 44 rotatable inside a stationary hollow outer cylindrical member 46, the paste being carried on the outer cylindrical surface of the member 44 in the form of a thin film 47.
  • the paste becoming continuously thicker as it travels in a helical path from the feed entry point 48 of the evaporation mill to its discharge outlet 50 as more and more solvent is withdrawn through solvent discharge outlet 52, from which it passes to a condenser (not shown) for recovery and reuse.
  • the evaporation of the solvent from this mill is facilitated by heat from a row of cartridge heaters 54 in the base of the machine, their output being such as to obtain a temperature in the tape body of about 150°C. Near to the discharge outlet of the mill the paste is of sufficient stiffness that it can be extruded into a coherent thin tape 56 of the desired dimension in thickness and width using a conventional paste extruding machine 58.
  • this tape still contains small amounts of solvent and the additives, it must be subjected to a further heating process in a tunnel dryer oven, and to this end the tape is deposited on an endless conveyor 60, which passes it through a drying oven 62, during which passage the solvent and as much as possible of the additives are removed to leave the strip or tape consisting only of a thoroughly and uniformly dispersed composite mixture ofthe particles ofthe filler material or materials and the polymer or polymers.
  • a suitable temperature for such an oven is, for example, in the range 150-250°C, the heating being carried out slowly to avoid as far as possible the formation ofbubble holes by the exiting dispersion medium and additives or additive breakdown products.
  • the tape 56 of dried paste is passed through a cutting station 64, in which it is severed into individual "green" substrate preforms 66, usually of rectangular shape and of the size required for the electronic circuit board substrate, if that is the use for which the materials are intended.
  • the preforms are deposited manually or automatically into the cavity ofa heated compression mold comprising heated upper and lower platens 68 and 70, the cavity being located in the lower heated platen 70 to facilitate the loading process. Once the preform is loaded the mold cavity is closed by the downward moving heated top platen 68 which protrudes into the cavity to compress the preform to its required dimensions and density.
  • the temperature to which the preforms are heated in the mold is sufficient to melt the polymer so that it will flow freely under the pressure applied to completely fill the interstices and coat the filler material particles, while the maximum is that at which the polymer will begin to degrade unacceptably.
  • the minimum pressure to be employed is coupled with the choice of temperature, in that it must be sufficient for the melted polymer to flow as described, the pressure and time for which the mold is closed being sufficient for the material of the preforms to attain maximum compaction and density.
  • the melted polymer will flow relatively freely and the temperature and pressure are maintained for a period sufficient to ensure that the polymer can completely fill the relatively small interstices between the solid particles in the form of correspondingly very thin layers.
  • the temperature is in the range 280-400°C, while the pressure is in the range 70 MPa to 1,380 MPa (10,150 to 200,000 psi), although a more commercially likely pressure is about 345 MPa (50,000 psi), while pressures as low as 3.5 MPa (500 psi) may be usable.
  • the surfaces of the platens that contact the preforms are mirror-finished or better to assist in obtaining the smooth surfaces that are desired for electronic substrates intended for microwave frequency applications.
  • nonfunctionalised poly(arylene ethers) employed is that, since they may be cross-linked by exposure to temperatures in the range of 350°-450°C in the presence of oxygen, it is possible to take the finished substrate through a cycle in which initially the polymer is melted again and thoroughly diffused throughout the body, the polymer at this stage being relatively fluid, and thereafter the temperature is increased until cross-linking and corresponding densification ofthe polymer takes place.
  • the composite mixture may include as an additive a cross-linking agent and/or an end capping agent, so that the desired densification will take place at lower temperatures.
  • this ability to crosslink and/or end cap at elevated temperatures makes the materials particularly useful in microelectronic applications because they can readily be applied as low viscosity materials, e.g. even from solution as described, and then converted to a solvent resistant material of maximum density by the heating.
  • the substrates 66 issuing from the press are fed to a multi-stand, heated, flattening roller mill 72 in which they are rolled to an accurately controlled thickness and flattened.
  • the surfaces of these rolls are also mirror-finished, or better, again in order to obtain the desired final smooth surfaces.
  • the sheet, film or tape from which the preforms have been cut usually has a thickness less than about 60 mil, can be less than about 30 mil, maybe less than about 10 mil, maybe less than about 4 mil, and can even be less than about 1 mil.
  • Substrates intended for use in electronic circuits will usually be of thickness in the range 0.125mm to 1.5mm (5-60 mil), and ifintended for thick film usage are usually required to be smooth to about 0.75-0.90 micrometer (22-40 microins), while if intended for thin film usage must be flat to better than 0.05 micrometer (2 microins).
  • the preforms are now fed to a heated laminating press 74 in which they are each laminated on one orboth sides with a thin flat smooth piece 76 ofcopper sheet ofthe same size, which subsequently is etched to produce the electric circuit.
  • These sheet copper pieces are obtained by cutting from a strip 78 supplied from a roll thereof (not shown) which is cut into pieces at a cutting and minor-finish surfacing station 80.
  • the surfacing means comprises a hot press in which the cut pieces are pressed between a pair of heated platens, the platen surfaces being mirror-finished orbetter so that a corresponding finish is imparted to the surfaces of the pieces.
  • the mirror-finishing of the substrate surfaces and those of the copperpieces is especially important in ultrahigh-frequency applications since, as described above, the currents tend to flow only in the surface layers of the conductors, and uniformity in characteristics of the etched conductors is facilitated by such smooth surfaces.
  • the volume percentage ofthe filler material can be 60% or more, the minimum value being that at which the interposed layers ofpolymer are somewhat too thick to have the required mechanical strength for the substrate to have the corresponding amount of mechanical strength.
  • the maximum value is set by the amount of the particular polymer required to adequatelybind the particular filler material to form a strong coherent body.
  • the degree of uniformity required in the material of the finished substrate is such that even the extensive specific process described above may not be sufficient, and it may be necessary to apply an additional series of steps in which the substrates are broken and ground back down to about the original particle size distribution, with the difference that the filler material particles are now intimately associated with particles and thin coatings of the polymer.
  • This finely divided material is again ground and dispersed in a suitable medium by use of one or a chain of the special mills, such as the mills 38 and 40 described above, until the maximum possible uniformity is obtained, when the dispersion medium is removed and the resultant material again subjected to a heating and pressing operation to produce the desired substrates, the polymer being sufficiently thermoplastic at the temperatures required for this to be possible.
  • Figures 6 and 7 are respective photo micrograph cross sections through a material ofthe invention, respectively before and after the mirror finished piece 76 of copper sheet is attached to the mirror-finished surface of the substrate, the material consisting ofclosely packed particles 82 of the filler material, of irregular size and shape, coated and bound together by polymer material 84 that no longer exists as discrete particles but as thin intervening films and interstice-filling masses.
  • the square section of Figure 6 measures 5 micrometers each side.
  • the adhesiveness of the polymers of the invention is sufficient to ensure adequate bonding without the need for reinforcing fibers or fiber-cloth.
  • a particular currently preferred group of the selected poly(arylene ether) polymers in which the repeating unit is biphenyl diradical linked with the 4,4'-diradical of 9,9-diphenylfluorene, are designated PAE-2, while another currently preferred group, in which the repeating unit is para-terphenyl diradical linked with the 4,4'-diradical of 9,9-diphenylfluorene, are designated PAE-3, and third currently preferred group, in which the repeating unit is a combination of the units ofPAE-2 and PAE-3, are designated PAE-4.
  • Substrates made using PAE-2 have been very successful; the material does not oxidise in air, is highly adhesive without the use of coupling agents, and has a loss tangent in the frequency range of particular interest (1-10 GHz) less than 0.0008, as compared to most other thermoset polymer materials presently used for electronic circuit applications, namely 0.02-0.005.
  • the polymer is thermoplastic and can be processed at 280-300°C, and by post treating the substrates at 300-400°C to establish cross-linking they can be rendered thermoset, when the loss tangent drops below 0.0008.
  • Polymers ofweight average molecular weight below about 30,000 are regarded as less desirable for use with the methods of the invention, since even more than the PAE-2/3/4 materials they are not able to form adequately structurally strong films, sheets or any other substantially three-dimensional body, because ofa tendency ofthese relatively thick structures to shatter into a multitude of smaller fragments. I have discovered however that surprisingly even the lower molecular weight materials remain intact and cohesive as thin film depositions in the low micrometer range thicknesses of about 1-3 micrometers and can therefore be used, although the higher molecular weight materials are to be preferred.
  • the relative proportions of the filler materials and of the polymer depend at least to some extent upon the use to which the substrate is to be put; ifa very high frequency circuit is to be installed then it will be preferred to have the maximum amount of filler dielectric material and the minimum amount of polymer.
  • the minimum amount ofpolymer is set by that required to fill the intergrain interstices when the interstitial volume is at its minimum value, and to ensure sufficient coating of the grains for the resulting composite to have the required mechanical strength.
  • the composites usually require a minimum of 3% by volume of polymer to be present as long as the optimum particle packing of the filler material has been obtained, the remaining 97% solids content comprising the filler dielectric material, residual surface active and coupling agents, and organic or inorganic reinforcing, strength-providing, fibers and whiskers, when these are provided.
  • the preferred particle size range for the filler starting materials is from 0.01 to 50 micrometers, while that for the polymer is from 0.1 to 50 micrometers.
  • the presence of particles offiller material of a range comprising different sizes is preferred, since this improves the capability of dense packing in a manner that reduces the interstitial volume, and consequently facilitates the production of the very thin highly adhesive layers that are characteristic of the invention, besides reducing the amount of polymer required to fill the interstices and adhere the particles together. It can be shown theoretically that the minimum interstitial volume that can be obtained when packing spheres of uniform size is about 45%. Owing to the wider particle size distribution that can be employed, this volume can be reduced considerably further, down to the specified value, of about 3%.
  • the methods of this invention are particularly applicable to the production of composite materials.
  • the finely powdered filler material consists of any one or a mixture of the "advanced" materials that are now used in industry for the production of fired ceramic substrates for electronic circuits, the most common of which are aluminium nitride; barium titanate; barium-neodymium titanate; barium copper tungstate; lead titanate; lead magnesium niobate; lead zinc niobate; lead iron niobate; lead iron tungstate; strontium titanate; zirconium tungstate; the chemical and/or physical equivalents of any of the foregoing; alumina, fused quartz; boron nitride; metal powders; and semiconductors.
  • compositions comprising powdered ferrites and like inductive materials in a polymer matrix that have already been produced, used for example in magnetic passive products such as transformers, inductors and ferrite core devices, but the methods used add the powdered filler material into the polymer matrix and their solids contents have generally been limited to not more then about 50% by volume.
  • the invention permits the production of such composite materials of higher solids content, e.g. 80% by volume and above.
  • the only ceramic materials with temperature stable dielectric constants that are available have values in the ranges 2.6 to 12, 37 to 39 and 80 to 90, whereas in the quickly expanding market of wireless telecommunication, which is based on microwave frequencies ranging from 800MHz to over 30GHz, and in which small size and low weight are of increasing importance, the preferred dielectric constant values need to be tailored to be anywhere between 8 and 2000, according to choices dictated by the optimum circuit architecture, instead of, as at present, the circuit architecture being dictated by the very limited ranges of dielectric constants that are available.
  • signal propagation depends mainly on the waveguide character ofthe circuitry and consequently only such high dielectric constant materials allow significant miniaturization, permitting the use ofnarrower conductor line widths and shorter lengths.
  • coaxial dielectric resonators at this time used in more than 25 million cellular telephones worldwide, could be reduced in size and weight by more than half and in cost by more than two thirds ifthe dielectric constant of the substrate material could be raised from the present value of alumina of about 9 to over 400 and its dielectric loss (loss tangent) kept below 0.0005.
  • the powdered filler material is a tailored blend of two or more individual materials.
  • the requirements for substrate materials, especially for very high frequency applications, are very exacting, requiring consideration of a large number ofphysical properties including filler material content, bulk density (range), surface finish, grain size (average), water absorption (%), flexural strength, modulus of elasticity, coefficient of linear thermal expansion, thermal conductivity, dielectric strength, dielectric constant, dissipation factor, and volume resistivity.
  • the possibility of such blending makes it possible to tailor the properties of the substrates to their specific tasks in a manner which is not possible with a sintered ceramic as in most cases the sintering phase rules would be violated and the resulting fired material would fall apart.
  • One of the main reasons for combining filler materials in any given ratio is to obtain a mixture with a tailored dielectric constant, which constant will remain uniform over a temperature range from say -50°C to +200°C, and with a very high Q factor (equivalent to a very low loss tangent) desirably above 500 and if possible as high as 5,000.

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WO2001002468A9 (en) 2002-07-25
EP1200509A1 (en) 2002-05-02
ATE283305T1 (de) 2004-12-15
KR20020085865A (ko) 2002-11-16
AU5902300A (en) 2001-01-22
JP2003521566A (ja) 2003-07-15
DE60016228D1 (de) 2004-12-30
DE60016228T2 (de) 2006-05-04
CN1420904A (zh) 2003-05-28
KR100690110B1 (ko) 2007-03-08
US20020038582A1 (en) 2002-04-04
WO2001002468A1 (en) 2001-01-11
CN1175033C (zh) 2004-11-10

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