EP1145272A3 - Improved alignment of a thermal field emission electron source and application in a microcolumn - Google Patents

Improved alignment of a thermal field emission electron source and application in a microcolumn

Info

Publication number
EP1145272A3
EP1145272A3 EP99954854A EP99954854A EP1145272A3 EP 1145272 A3 EP1145272 A3 EP 1145272A3 EP 99954854 A EP99954854 A EP 99954854A EP 99954854 A EP99954854 A EP 99954854A EP 1145272 A3 EP1145272 A3 EP 1145272A3
Authority
EP
European Patent Office
Prior art keywords
microcolumn
application
field emission
electron source
thermal field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP99954854A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP1145272A2 (en
Inventor
H. S. Kim
L. P. Muray
Tai-Hon Philip Chang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Etec Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Etec Systems Inc filed Critical Etec Systems Inc
Publication of EP1145272A2 publication Critical patent/EP1145272A2/en
Publication of EP1145272A3 publication Critical patent/EP1145272A3/en
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06308—Thermionic sources
    • H01J2237/06316—Schottky emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1501—Beam alignment means or procedures

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
EP99954854A 1998-10-21 1999-10-07 Improved alignment of a thermal field emission electron source and application in a microcolumn Withdrawn EP1145272A3 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US17661398A 1998-10-21 1998-10-21
US176613 1998-10-21
PCT/US1999/023704 WO2000024030A2 (en) 1998-10-21 1999-10-07 Improved alignment of a thermal field emission electron source and application in a microcolumn

Publications (2)

Publication Number Publication Date
EP1145272A2 EP1145272A2 (en) 2001-10-17
EP1145272A3 true EP1145272A3 (en) 2002-11-27

Family

ID=22645098

Family Applications (1)

Application Number Title Priority Date Filing Date
EP99954854A Withdrawn EP1145272A3 (en) 1998-10-21 1999-10-07 Improved alignment of a thermal field emission electron source and application in a microcolumn

Country Status (4)

Country Link
EP (1) EP1145272A3 (ko)
JP (1) JP2003513407A (ko)
KR (1) KR20010080286A (ko)
WO (1) WO2000024030A2 (ko)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6288401B1 (en) 1999-07-30 2001-09-11 Etec Systems, Inc. Electrostatic alignment of a charged particle beam
US6512235B1 (en) * 2000-05-01 2003-01-28 El-Mul Technologies Ltd. Nanotube-based electron emission device and systems using the same
US9484179B2 (en) * 2012-12-18 2016-11-01 General Electric Company X-ray tube with adjustable intensity profile
US9793089B2 (en) * 2013-09-16 2017-10-17 Kla-Tencor Corporation Electron emitter device with integrated multi-pole electrode structure
US10388489B2 (en) 2017-02-07 2019-08-20 Kla-Tencor Corporation Electron source architecture for a scanning electron microscopy system
KR20210132599A (ko) 2020-04-24 2021-11-04 아이엠에스 나노패브릭케이션 게엠베하 대전 입자 소스
KR20230005357A (ko) * 2020-06-29 2023-01-09 주식회사 히타치하이테크 전자원, 전자총, 및 하전 입자선 장치
EP4095882A1 (en) 2021-05-25 2022-11-30 IMS Nanofabrication GmbH Pattern data processing for programmable direct-write apparatus

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3358174A (en) * 1964-12-18 1967-12-12 Gen Electric Electron gun having a segmented control electrode
DE3138896A1 (de) * 1981-09-30 1983-04-14 Siemens AG, 1000 Berlin und 8000 München Elektronenoptisches system mit vario-formstrahl zur erzeugung und messung von mikrostrukturen
US4588928A (en) * 1983-06-15 1986-05-13 At&T Bell Laboratories Electron emission system

Also Published As

Publication number Publication date
WO2000024030A2 (en) 2000-04-27
KR20010080286A (ko) 2001-08-22
WO2000024030A3 (en) 2002-10-10
EP1145272A2 (en) 2001-10-17
JP2003513407A (ja) 2003-04-08

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