JP2003513407A - 改良された熱電界放出の整列 - Google Patents
改良された熱電界放出の整列Info
- Publication number
- JP2003513407A JP2003513407A JP2000577692A JP2000577692A JP2003513407A JP 2003513407 A JP2003513407 A JP 2003513407A JP 2000577692 A JP2000577692 A JP 2000577692A JP 2000577692 A JP2000577692 A JP 2000577692A JP 2003513407 A JP2003513407 A JP 2003513407A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- emission source
- field emission
- thermal field
- microcolumn
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/063—Electron sources
- H01J2237/06308—Thermionic sources
- H01J2237/06316—Schottky emission
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/15—Means for deflecting or directing discharge
- H01J2237/1501—Beam alignment means or procedures
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US17661398A | 1998-10-21 | 1998-10-21 | |
US09/176,613 | 1998-10-21 | ||
PCT/US1999/023704 WO2000024030A2 (en) | 1998-10-21 | 1999-10-07 | Improved alignment of a thermal field emission electron source and application in a microcolumn |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2003513407A true JP2003513407A (ja) | 2003-04-08 |
Family
ID=22645098
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000577692A Pending JP2003513407A (ja) | 1998-10-21 | 1999-10-07 | 改良された熱電界放出の整列 |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1145272A3 (ko) |
JP (1) | JP2003513407A (ko) |
KR (1) | KR20010080286A (ko) |
WO (1) | WO2000024030A2 (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016531413A (ja) * | 2013-09-16 | 2016-10-06 | ケーエルエー−テンカー コーポレイション | 多重極の電極構造を組み込んだ電子エミッタデバイス |
JPWO2022003770A1 (ko) * | 2020-06-29 | 2022-01-06 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6288401B1 (en) * | 1999-07-30 | 2001-09-11 | Etec Systems, Inc. | Electrostatic alignment of a charged particle beam |
US6512235B1 (en) * | 2000-05-01 | 2003-01-28 | El-Mul Technologies Ltd. | Nanotube-based electron emission device and systems using the same |
US9484179B2 (en) * | 2012-12-18 | 2016-11-01 | General Electric Company | X-ray tube with adjustable intensity profile |
US10388489B2 (en) | 2017-02-07 | 2019-08-20 | Kla-Tencor Corporation | Electron source architecture for a scanning electron microscopy system |
KR20210132599A (ko) * | 2020-04-24 | 2021-11-04 | 아이엠에스 나노패브릭케이션 게엠베하 | 대전 입자 소스 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3358174A (en) * | 1964-12-18 | 1967-12-12 | Gen Electric | Electron gun having a segmented control electrode |
DE3138896A1 (de) * | 1981-09-30 | 1983-04-14 | Siemens AG, 1000 Berlin und 8000 München | Elektronenoptisches system mit vario-formstrahl zur erzeugung und messung von mikrostrukturen |
US4588928A (en) * | 1983-06-15 | 1986-05-13 | At&T Bell Laboratories | Electron emission system |
-
1999
- 1999-10-07 KR KR1020017005019A patent/KR20010080286A/ko not_active Application Discontinuation
- 1999-10-07 WO PCT/US1999/023704 patent/WO2000024030A2/en not_active Application Discontinuation
- 1999-10-07 JP JP2000577692A patent/JP2003513407A/ja active Pending
- 1999-10-07 EP EP99954854A patent/EP1145272A3/en not_active Withdrawn
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016531413A (ja) * | 2013-09-16 | 2016-10-06 | ケーエルエー−テンカー コーポレイション | 多重極の電極構造を組み込んだ電子エミッタデバイス |
JPWO2022003770A1 (ko) * | 2020-06-29 | 2022-01-06 | ||
WO2022003770A1 (ja) * | 2020-06-29 | 2022-01-06 | 株式会社日立ハイテク | 電子源、電子銃、及び荷電粒子線装置 |
JP7366266B2 (ja) | 2020-06-29 | 2023-10-20 | 株式会社日立ハイテク | 電子源、電子銃、及び荷電粒子線装置 |
Also Published As
Publication number | Publication date |
---|---|
WO2000024030A2 (en) | 2000-04-27 |
KR20010080286A (ko) | 2001-08-22 |
EP1145272A2 (en) | 2001-10-17 |
EP1145272A3 (en) | 2002-11-27 |
WO2000024030A3 (en) | 2002-10-10 |
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