WO2000024030A3 - Improved alignment of a thermal field emission electron source and application in a microcolumn - Google Patents

Improved alignment of a thermal field emission electron source and application in a microcolumn Download PDF

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Publication number
WO2000024030A3
WO2000024030A3 PCT/US1999/023704 US9923704W WO0024030A3 WO 2000024030 A3 WO2000024030 A3 WO 2000024030A3 US 9923704 W US9923704 W US 9923704W WO 0024030 A3 WO0024030 A3 WO 0024030A3
Authority
WO
WIPO (PCT)
Prior art keywords
microcolumn
field emission
application
electron source
thermal field
Prior art date
Application number
PCT/US1999/023704
Other languages
French (fr)
Other versions
WO2000024030A2 (en
Inventor
H S Kim
L P Muray
Tai-Hon Philip Chang
Original Assignee
Etec Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Etec Systems Inc filed Critical Etec Systems Inc
Priority to EP99954854A priority Critical patent/EP1145272A3/en
Priority to KR1020017005019A priority patent/KR20010080286A/en
Priority to JP2000577692A priority patent/JP2003513407A/en
Publication of WO2000024030A2 publication Critical patent/WO2000024030A2/en
Publication of WO2000024030A3 publication Critical patent/WO2000024030A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06308—Thermionic sources
    • H01J2237/06316—Schottky emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1501—Beam alignment means or procedures

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)

Abstract

An electron-beam microcolumn alignment method and system in situ includes a split suppressor cap (124) for a miniature Schottky electron (16) or other field emission source. The split suppressor cap is segmented into four or more electrically separate electrode elements (124...130) which are independently driven and controlled by separate deflection voltages (Vs±Vx, Vs±Vy) to scan the electron beam without requiring mechanical movement.
PCT/US1999/023704 1998-10-21 1999-10-07 Improved alignment of a thermal field emission electron source and application in a microcolumn WO2000024030A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP99954854A EP1145272A3 (en) 1998-10-21 1999-10-07 Improved alignment of a thermal field emission electron source and application in a microcolumn
KR1020017005019A KR20010080286A (en) 1998-10-21 1999-10-07 Improved thermal field emission alignment
JP2000577692A JP2003513407A (en) 1998-10-21 1999-10-07 Improved thermal field emission alignment

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US17661398A 1998-10-21 1998-10-21
US09/176,613 1998-10-21

Publications (2)

Publication Number Publication Date
WO2000024030A2 WO2000024030A2 (en) 2000-04-27
WO2000024030A3 true WO2000024030A3 (en) 2002-10-10

Family

ID=22645098

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1999/023704 WO2000024030A2 (en) 1998-10-21 1999-10-07 Improved alignment of a thermal field emission electron source and application in a microcolumn

Country Status (4)

Country Link
EP (1) EP1145272A3 (en)
JP (1) JP2003513407A (en)
KR (1) KR20010080286A (en)
WO (1) WO2000024030A2 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6288401B1 (en) * 1999-07-30 2001-09-11 Etec Systems, Inc. Electrostatic alignment of a charged particle beam
US6512235B1 (en) * 2000-05-01 2003-01-28 El-Mul Technologies Ltd. Nanotube-based electron emission device and systems using the same
US9484179B2 (en) * 2012-12-18 2016-11-01 General Electric Company X-ray tube with adjustable intensity profile
US9793089B2 (en) * 2013-09-16 2017-10-17 Kla-Tencor Corporation Electron emitter device with integrated multi-pole electrode structure
US10388489B2 (en) 2017-02-07 2019-08-20 Kla-Tencor Corporation Electron source architecture for a scanning electron microscopy system
KR20210132599A (en) 2020-04-24 2021-11-04 아이엠에스 나노패브릭케이션 게엠베하 Charged­particle source
JP7366266B2 (en) * 2020-06-29 2023-10-20 株式会社日立ハイテク Electron sources, electron guns, and charged particle beam devices

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3358174A (en) * 1964-12-18 1967-12-12 Gen Electric Electron gun having a segmented control electrode
US4514638A (en) * 1981-09-30 1985-04-30 Siemens Aktiengesellschaft Electron-optical system with variable-shaped beam for generating and measuring microstructures
US4588928A (en) * 1983-06-15 1986-05-13 At&T Bell Laboratories Electron emission system

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3358174A (en) * 1964-12-18 1967-12-12 Gen Electric Electron gun having a segmented control electrode
US4514638A (en) * 1981-09-30 1985-04-30 Siemens Aktiengesellschaft Electron-optical system with variable-shaped beam for generating and measuring microstructures
US4588928A (en) * 1983-06-15 1986-05-13 At&T Bell Laboratories Electron emission system

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
CHANG T H P ET AL: "ELECTRON BEAM TECHNOLOGY - SEM TO MICROCOLUMN", MICROELECTRONIC ENGINEERING,NL,ELSEVIER PUBLISHERS BV., AMSTERDAM, vol. 32, no. 1/04, 1 September 1996 (1996-09-01), pages 113 - 130, XP000624903, ISSN: 0167-9317 *
CREWE D A ET AL: "INITIAL IMAGES WITH A PARTIALLY MICROMACHINED SCANNING ELECTRON MICROSCOPE", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B,US,AMERICAN INSTITUTE OF PHYSICS. NEW YORK, vol. 14, no. 6, 1 November 1996 (1996-11-01), pages 3808 - 3812, XP000721113, ISSN: 0734-211X *
KRATSCHMER E ET AL: "AN ELECTRON-BEAM MICROCOLUMN WITH IMPROVED RESOLUTION, BEAM CURRENT,AND STABILITY", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B,US,AMERICAN INSTITUTE OF PHYSICS. NEW YORK, vol. 13, no. 6, 1 November 1995 (1995-11-01), pages 2498 - 2503, XP000558325, ISSN: 0734-211X *

Also Published As

Publication number Publication date
KR20010080286A (en) 2001-08-22
WO2000024030A2 (en) 2000-04-27
EP1145272A2 (en) 2001-10-17
EP1145272A3 (en) 2002-11-27
JP2003513407A (en) 2003-04-08

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