EP1145272A3 - Improved alignment of a thermal field emission electron source and application in a microcolumn - Google Patents
Improved alignment of a thermal field emission electron source and application in a microcolumnInfo
- Publication number
- EP1145272A3 EP1145272A3 EP99954854A EP99954854A EP1145272A3 EP 1145272 A3 EP1145272 A3 EP 1145272A3 EP 99954854 A EP99954854 A EP 99954854A EP 99954854 A EP99954854 A EP 99954854A EP 1145272 A3 EP1145272 A3 EP 1145272A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- microcolumn
- application
- field emission
- electron source
- thermal field
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/063—Electron sources
- H01J2237/06308—Thermionic sources
- H01J2237/06316—Schottky emission
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/15—Means for deflecting or directing discharge
- H01J2237/1501—Beam alignment means or procedures
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US17661398A | 1998-10-21 | 1998-10-21 | |
US176613 | 1998-10-21 | ||
PCT/US1999/023704 WO2000024030A2 (en) | 1998-10-21 | 1999-10-07 | Improved alignment of a thermal field emission electron source and application in a microcolumn |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1145272A2 EP1145272A2 (en) | 2001-10-17 |
EP1145272A3 true EP1145272A3 (en) | 2002-11-27 |
Family
ID=22645098
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP99954854A Withdrawn EP1145272A3 (en) | 1998-10-21 | 1999-10-07 | Improved alignment of a thermal field emission electron source and application in a microcolumn |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1145272A3 (en) |
JP (1) | JP2003513407A (en) |
KR (1) | KR20010080286A (en) |
WO (1) | WO2000024030A2 (en) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6288401B1 (en) | 1999-07-30 | 2001-09-11 | Etec Systems, Inc. | Electrostatic alignment of a charged particle beam |
US6512235B1 (en) * | 2000-05-01 | 2003-01-28 | El-Mul Technologies Ltd. | Nanotube-based electron emission device and systems using the same |
US9484179B2 (en) * | 2012-12-18 | 2016-11-01 | General Electric Company | X-ray tube with adjustable intensity profile |
US9793089B2 (en) * | 2013-09-16 | 2017-10-17 | Kla-Tencor Corporation | Electron emitter device with integrated multi-pole electrode structure |
US10388489B2 (en) | 2017-02-07 | 2019-08-20 | Kla-Tencor Corporation | Electron source architecture for a scanning electron microscopy system |
KR20210132599A (en) | 2020-04-24 | 2021-11-04 | 아이엠에스 나노패브릭케이션 게엠베하 | Chargedparticle source |
KR20230005357A (en) * | 2020-06-29 | 2023-01-09 | 주식회사 히타치하이테크 | Electron sources, electron guns, and charged particle beam devices |
EP4095882A1 (en) | 2021-05-25 | 2022-11-30 | IMS Nanofabrication GmbH | Pattern data processing for programmable direct-write apparatus |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3358174A (en) * | 1964-12-18 | 1967-12-12 | Gen Electric | Electron gun having a segmented control electrode |
DE3138896A1 (en) * | 1981-09-30 | 1983-04-14 | Siemens AG, 1000 Berlin und 8000 München | ELECTRONIC OPTICAL SYSTEM WITH VARIO SHAPED BEAM FOR THE GENERATION AND MEASUREMENT OF MICROSTRUCTURES |
US4588928A (en) * | 1983-06-15 | 1986-05-13 | At&T Bell Laboratories | Electron emission system |
-
1999
- 1999-10-07 WO PCT/US1999/023704 patent/WO2000024030A2/en not_active Application Discontinuation
- 1999-10-07 EP EP99954854A patent/EP1145272A3/en not_active Withdrawn
- 1999-10-07 KR KR1020017005019A patent/KR20010080286A/en not_active Application Discontinuation
- 1999-10-07 JP JP2000577692A patent/JP2003513407A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
WO2000024030A2 (en) | 2000-04-27 |
KR20010080286A (en) | 2001-08-22 |
WO2000024030A3 (en) | 2002-10-10 |
EP1145272A2 (en) | 2001-10-17 |
JP2003513407A (en) | 2003-04-08 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20010511 |
|
AK | Designated contracting states |
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XX | Miscellaneous |
Free format text: DERZEIT SIND DIE WIPO-PUBLIKATIONSDATEN A3 NICHT VERFUEGBAR. |
|
PUAK | Availability of information related to the publication of the international search report |
Free format text: ORIGINAL CODE: 0009015 |
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AK | Designated contracting states |
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RIC1 | Information provided on ipc code assigned before grant |
Free format text: 7H 01J 3/02 A |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: APPLIED MATERIALS, INC. |
|
RBV | Designated contracting states (corrected) |
Designated state(s): DE GB NL |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 20040504 |