Classifications

• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C14/00—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix
  • C03C14/006—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix the non-glass component being in the form of microcrystallites, e.g. of optically or electrically active material
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching

Definitions

• polarizing glasses For example, one such method is to redraw a glass above its softening temperature.
• the glass contains a separate phase which is elongated by the redraw process.
• the thermal treatment which leads to the phase separation is usually carried out before the redraw process.
• the separated phase is initially spectrally non- absorbing material such as AgClBr, CuClBr, Agl, Cul or copper/cadmium halides, which must be subsequently modified to create a desired dichroic property necessary for the polarizing effect.
• This is accomplished by treating the stretched glass in hydrogen gas at elevated temperatures for sufficient time to effect the chemical reduction ofthe spectrally non-absorbing materials to their corresponding metal.
• the chemical reduction process is a combined process involving both the diffusion of hydrogen in the glass, and the chemical reaction ofthe hydrogen with the halide phase.
• the invention relates to a polarizing glass having an integral non-polarizing region.
• the invention relates to a method of producing a polarizing glass in which a region on the glass surface is rendered non-polarizing.
• the invention relates to a method of forming a glass having integral polarizing and non-polarizing regions by:
• the invention relates to a method of forming a non-polarizing region in a polarizing glass by, providing a polarizing glass comprising reducible elongated phase particles; and then subjecting a region ofthe glass surface to thermal heating to re- spheridize the elongated phase and thereby render the polarizing glass, non-polarizing in said region.
• the invention relates to a method of forming a non-polarizing region in a polarizing glass by selectively removing the polarizing layer to render the glass in said region, non-polarizing.
• reducing atmosphere refers to a gaseous atmosphere in which the chemical potential of oxygen is low.
• reducing gases include hydrogen, hydrazine vapor, cracked ammonia, deuterium and forming gas (i.e., a mixture of hydrogen and an inert gas, for example, H 2 /He and H 2 /N 2 ).
• Figs, la to lc are schematic diagrams illustrating one inventive method of forming a polarizing glass having at least one non-polarizing region
• Figs. 2a to 2d are schematic diagrams illustrating another inventive method of forming a pattern of polarizing and non-polarizing glass, by a photolithographic process
• Figs.3a and 3b are schematic diagrams illustrating an embodiment ofthe invention, involving, exposing an assembly of polarizing glass and photoresist to light radiation, developing the photoresist to expose the underlying polarizing layer ( Figure 3a), etching the exposed region to remove the polarizing layer in said region, and the stripping away the photoresist ( Figure 3b).
• a polarizing glass having non-polarizing regions can be formed by (1) use of a hydrogen blocking film, (2) local thermal treatment. (3) etching, or (4) a combination of these methods.
• the layer of reducing gas blocking material will be referred to herein as "hydrogen-blocking film" even though it is understood that in addition to hydrogen, other reducing gases such as cracked ammonia, deuterium or forming gas (i.e., a mixture of H 2 with He, N 2 , or Ar) may be used.
• the polarizing glass contains a reducible elongated phase such as, AgCl x Br,. x , CuCl x Br,. x , where x has a value between 0 and 1, or phase separated Pb-borate glass.
• Other useful reducible phases include, Agl, Cul and
• a thin layer of material 6, preferably a dense film of material such as Cr, Mo or their oxides is formed on the surface of a non-polarizing glass 2 to retard the reduction process and enable the production of color gradients and designs or patterns on the glass.
• a non-polarizing region 10 is formed in a glass having a stretched or elongated particles by using a reducing gas and a pattemed film which is capable of retarding penetration ofthe reducing gas.
• the non-polarizing region is formed by: 1 ) providing a glass 2 having a layer of reducible elongated phase;
• the preferred reducing gas can be H 2 , cracked ammonia, forming gas and D 2 . If forming gas is used, then the hydrogen content ofthe forming gas mixture is preferably at least 0.1 %, more preferably, at least 5%, and most preferably, at least 10%. The higher the hydrogen content ofthe forming gas mixture, the lower the pressure and the less the time required to reduce the reducible phase in the glass.
• the preferred forming gas is H 2 N 3 .
• the layer of hydrogen- blocking material may be patterned using any method.
• a particularly useful method of selectively forming the thin film layer is by placing a shadow mask 4 above the glass surface, such that the mask shadows or protects certain regions of the glass (Fig. 1 ).
• a pattemed layer of blocking material is thereby formed on the unmasked or unprotected regions of the glass through holes or openings in the shadow mask.
• FIG. 2 Another useful method of patterning the thin film blocking layer is by using photolithography (Fig. 2).
• a thin film of hydrogen-blocking material 6 is deposited over the entire surface of a reducible glass 2, that is, a glass having a layer of stretched or elongated particles;
• a thin photoresist layer 12 is then applied to the surface of the hydrogen-blocking material 6 (Fig. 2a);
• the photoresist is lithographically pattemed using a mask and developed (Fig.
• the particular method used to deposit the thin layer of material is a key aspect ofthe invention.
• the film is deposited, preferably in a Class 1000 (or better) clean room environment, by sputtering or other suitable methods.
• the choice ofthe blocking material and its deposited thickness is made on the basis of how deep a reduced layer in the glass is required for any given application.
• the property ofthe deposited film, through the combined property of density and thickness must be sufficient to retard the diffusion of H 2 for the time/pressure/temperature required to produce a sufficient reduced depth in the glass, in turn, providing the desired contrast.
• the depth to which the silver or copper halide phase is chemically reduced to silver, or copper determines the contrast ofthe polarizer. It has been shown that the reduced depth is proportional to the square root ofthe H 2 pressure and the time of treatment, as well as an exponential function ofthe temperature.
• the contrast is defined as the ratio of the transmittance in the passing direction
• contrast T 0 /exp(- ⁇ d) where d is the polarizing film thickness.
• the coefficient, depends on the wavelength of light and the degree to which the glass was stretched.
• ⁇ , and T 0 are determined experimentally, and the thickness ofthe polarizing film can be determined for any desired contrast. In one particularly useful embodiment, at a wavelength of 640 nm, a thickness of 28 ⁇ m is required to achieve a contrast of 100.
• a material for use in the blocking of hydrogen may depend on the method used to form the thin layer and the related deposition variables.
• Other useful hydrogen blocking materials include the noble metals such as Au, Rh, Pd, Pt, and Ir.
• the relevant variables may include the porosity of the deposited film, which depends on the specific deposition method and system, the film adherence, and how it varies with thickness, the thermal mismatch, and how it relates to thickness. These latter issues relate to the quality ofthe film that is produced, pinholes, cracks, and other features that would allow H 2 to penetrate through the film.
• Table 1 A summary of illustrative results using several hydrogen blocking materials films is shown in Table 1. For this particular case the high contrast was desired at a wavelength of 640nm.
• localized heating is used to render a portion of a polarizing glass, non-polarizing.
• a non-polarizing region is formed in a polarizing glass by subjecting a region of the glass surface to thermal heating to re- spheridize the elongated phase and thereby render the polarizing glass, non-polarizing in the region of thermal contact.
• the object is to locally heat the glass to above about 450°C, preferably, above about 500 °C in a manner appropriate for forming the desired pattem. In the heated region, the elongated phase will be re-spheroidized and rendered nonpolarizing.
• the intensity distribution ofthe beam is important in that it will influence the temperature profile and, therefore, affect the nature of the transition from the non-polarizing to polarizing region.
• a CO 2 laser source is focused on a region of polarizing glass to heat the glass in said region and thereby render the glass non-polarizing by re-spheroidizing the elongated phases as described above.
• Another way to provide local heating is to use a polarized light source whose polarization direction is oriented in the absorbing orientation ofthe polarizing material.
• the wavelength ofthe light is chosen to correspond to the high contrast spectral region.
• Another way to provide local heating in the thin polarizing layer is to use a high current of an energetic beam, such a electrons or ions, either focused or in conjunction with a suitable mask. The beam would locally heat the polarized surface layer.
• Another useful method of forming a non-polarizing region by local thermal treatment is by thermal contact.
• heated tips or ridges are brought in contact with the polarized layer ofthe glass to heat the contact region, and thereby effect re-spheroidization.
• thermal contact method care must be taken to avoid thermal shock which may result due to the rapid heating and cooling.
• One possible disadvantage ofthe thermal heating methods is the residual birefringence that may result from the rapid heating and cooling. This can be mitigated by careful annealing.
• it is not necessary to directly contact the polarizing glass with the heat source, as effective heating can be achieved without direct contact. Thus, it may be sufficient to bring the heat source to the proximate region ofthe glass to be heated, since it is the heat radiation, rather than the heat source itself that is required to achieve the objective of this method.
• the etching method (Figs. 3a and 3b), relies on the selective removal of the polarizing layer by any number of etching techniques.
• parts of the polarizing layer 8 is protected by use of a film or layer of metal or photoresist 16.
• the unprotected layer of polarizing glass is then etched to remove the polarizing layer and thereby form a polarizing glass having an integral non-polarizing region 20 (Fig. 3b).
• the protected region restricts the removal of the polarized surface layer.
• the thickness of the polarizing layer is in the range of 10-50 microns, depending on the polarizing property required.
• the selective removal or etching away ofthe polarizing layer may be done by either wet or dry etching techniques. This method may produce a phase front alteration to a beam because light passing through it may have different optical paths in the etched and non-etched areas. This front alteration may be undesirable for certain applications.
• the hydrogen-blocking material was applied by sputtering, in a Class 1000 clean room environment.
• the hydrogen-blocking material was Cr, having a thickness of about O. ⁇ m.
• the H 2 treatment was at 420° C, at 1 atm, for 3 hours.
• the resulting polarizing layer had a depth of about 15 ⁇ m.
• the hydrogen-blocking layer was 1 ⁇ m of ZnO.
• the H 2 treatment was 420° C for 3 hours, at 1 atm.
• Thickness ofthe polarizing layer was 15 ⁇ m
• Mo film having a thickness as low as 0.5 ⁇ m can be treated in a hydrogen environment at 1 atm, 420°C for 16 hours without any bleed through. That is, the hydrogen did not penetrate through the Mo film into the underlying glass.
• the higher the pressure the more likely the hydrogen is to bleed through the film.
• the optimal reducing gas treatment conditions time, temperature, pressure
• the reducing gas treatment can be carried out at high pressure with minimal effect from any resulting bleed through.
• a polarizing glass having an integral non-polarizing region, (Fig. 3b).
• a dry etching process reactive ion etching
• the metal films used to inhibit the H 2 penetration were delineated using a shadow mask. Samples were prepared using two dense metal - Cr and
• Thin layers ofthe hydrogen-blocking metal were deposited using either a CVC DC sputtering system or a MRC in-line sputter system, both in a Class 1000 clean room. If desired, a film ofthe reducing gas blocking material may also be applied to the other surface to the polarizing glass prior to the hydrogen treatment.
• the deposition conditions were as follows:
• the glass used in all cases was PolarcorTM (available from Coming Inco ⁇ orated), with a 680 nm center peak wavelength.
• the samples were ground and polished to a thickness of 0.5 mm before hydrogen treatment. The results are summarized in the table below.
• H 2 - Thickness block of H 2 block, H 2 treatment Polarizing film

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• Polarising Elements (AREA)

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• 1997
  • 1997-03-25 DE DE69706290T patent/DE69706290T2/de not_active Expired - Fee Related
  • 1997-03-25 JP JP53458697A patent/JP2001510429A/ja not_active Ceased
  • 1997-03-25 WO PCT/US1997/004870 patent/WO1997035812A1/en active IP Right Grant
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