EP0881865A3 - Vorrichtung zur Erzeugung einer Vielzahl von Niedertemperatur-Plasmajets - Google Patents
Vorrichtung zur Erzeugung einer Vielzahl von Niedertemperatur-Plasmajets Download PDFInfo
- Publication number
- EP0881865A3 EP0881865A3 EP98109597A EP98109597A EP0881865A3 EP 0881865 A3 EP0881865 A3 EP 0881865A3 EP 98109597 A EP98109597 A EP 98109597A EP 98109597 A EP98109597 A EP 98109597A EP 0881865 A3 EP0881865 A3 EP 0881865A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- hollow cathode
- plasma jets
- low temperature
- temperature plasma
- producing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/48—Generating plasma using an arc
- H05H1/481—Hollow cathodes
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
- Chemical Vapour Deposition (AREA)
- Coating By Spraying Or Casting (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19722624 | 1997-05-30 | ||
DE19722624A DE19722624C2 (de) | 1997-05-30 | 1997-05-30 | Vorrichtung zur Erzeugung einer Vielzahl von Niedertemperatur-Plasmajets |
Publications (3)
Publication Number | Publication Date |
---|---|
EP0881865A2 EP0881865A2 (de) | 1998-12-02 |
EP0881865A3 true EP0881865A3 (de) | 2000-06-28 |
EP0881865B1 EP0881865B1 (de) | 2002-09-18 |
Family
ID=7830910
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP98109597A Expired - Lifetime EP0881865B1 (de) | 1997-05-30 | 1998-05-27 | Vorrichtung zur Erzeugung einer Vielzahl von Niedertemperatur-Plasmajets |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP0881865B1 (de) |
DE (2) | DE19722624C2 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107852805A (zh) * | 2014-12-05 | 2018-03-27 | Agc玻璃欧洲公司 | 空心阴极等离子体源 |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SE516336C2 (sv) * | 1999-04-28 | 2001-12-17 | Hana Barankova | Apparat för plasmabehandling av ytor |
EP1264330B1 (de) * | 2000-03-14 | 2003-07-16 | Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. | Verfahren und vorrichtung zur plasmagestützten oberflächenbehandlung und verwendung des verfahrens |
DE10120405B4 (de) * | 2001-04-25 | 2008-08-21 | Je Plasmaconsult Gmbh | Vorrichtung zur Erzeugung eines Niedertemperatur-Plasmas |
DE10203543B4 (de) * | 2002-01-29 | 2008-04-30 | Je Plasmaconsult Gmbh | Vorrichtung zur Erzeugung eines APG-Plasmas |
DE102004029081A1 (de) * | 2004-06-16 | 2006-01-05 | Je Plasmaconsult Gmbh | Vorrichtung zur Bearbeitung eines Substrates mittels mindestens eines Plasma-Jets |
DE102005032890B4 (de) * | 2005-07-14 | 2009-01-29 | Je Plasmaconsult Gmbh | Vorrichtung zur Erzeugung von Atmosphärendruck-Plasmen |
GB0612814D0 (en) * | 2006-06-28 | 2006-08-09 | Boc Group Plc | Method of treating a gas stream |
TWI318417B (en) | 2006-11-03 | 2009-12-11 | Ind Tech Res Inst | Hollow-type cathode electricity discharging apparatus |
FR2912864B1 (fr) | 2007-02-15 | 2009-07-31 | H E F Soc Par Actions Simplifi | Dispositif pour generer un plasma froid dans une enceinte sous vide et utilisation du dispositif pour des traitements thermochimiques |
CN105154856B (zh) | 2008-08-04 | 2018-08-10 | 北美Agc平板玻璃公司 | 等离子体源和用等离子体增强的化学气相沉积来沉积薄膜涂层的方法 |
CN101730374B (zh) * | 2008-10-30 | 2012-05-09 | 财团法人工业技术研究院 | 等离子体系统 |
DE102010027570B3 (de) | 2010-07-19 | 2011-11-10 | Eagleburgmann Germany Gmbh & Co. Kg | Faltenbalg-Kompensator |
RU2466514C2 (ru) * | 2011-02-09 | 2012-11-10 | Государственное образовательное учреждение высшего профессионального образования "Камская государственная инженерно-экономическая академия" (ИНЭКА) | Способ получения электрического разряда в парах электролита и устройство для его осуществления |
KR102365939B1 (ko) | 2014-12-05 | 2022-02-22 | 에이지씨 플랫 글래스 노스 아메리카, 인코퍼레이티드 | 거대-입자 감소 코팅을 활용하는 플라즈마 소스 및 박막 코팅의 증착과 표면의 개질을 위해 거대-입자 감소 코팅을 활용하는 플라즈마 소스의 사용 방법 |
US9721765B2 (en) | 2015-11-16 | 2017-08-01 | Agc Flat Glass North America, Inc. | Plasma device driven by multiple-phase alternating or pulsed electrical current |
US10242846B2 (en) | 2015-12-18 | 2019-03-26 | Agc Flat Glass North America, Inc. | Hollow cathode ion source |
US10573499B2 (en) | 2015-12-18 | 2020-02-25 | Agc Flat Glass North America, Inc. | Method of extracting and accelerating ions |
EP3474635B1 (de) | 2017-10-17 | 2021-08-18 | Leibniz-Institut für Plasmaforschung und Technologie e.V. | Modulares plasmastrahlbehandlungssystem |
FR3115180B1 (fr) * | 2020-10-14 | 2022-11-04 | Peter Choi | Appareil de génération de plasma |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0502829A1 (de) * | 1991-03-04 | 1992-09-09 | PROEL TECNOLOGIE S.p.A. | Vorrichtung mit ungeheizter Kathode zur dynamischen Erzeugung von Plasma |
DE4233895A1 (de) * | 1992-10-08 | 1994-04-14 | Juergen Prof Dr Engemann | Verfahren und Vorrichtung zur Plasmabehandlung bahnförmiger Materialien |
EP0727508A1 (de) * | 1995-02-16 | 1996-08-21 | Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. | Verfahren und Vorrichtung zur Behandlung von Substratoberflächen |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CS246982B1 (en) * | 1985-06-17 | 1986-11-13 | Ladislav Bardos | Method and apparatus for producing chemically active environment for plasma chemical reactions namely for deposition of thin layers |
US4954751A (en) * | 1986-03-12 | 1990-09-04 | Kaufman Harold R | Radio frequency hollow cathode |
US5464667A (en) * | 1994-08-16 | 1995-11-07 | Minnesota Mining And Manufacturing Company | Jet plasma process and apparatus |
SE503141C2 (sv) * | 1994-11-18 | 1996-04-01 | Ladislav Bardos | Apparat för alstring av linjär ljusbågsurladdning för plasmabearbetning |
DE19541236A1 (de) * | 1995-11-06 | 1997-05-07 | Leybold Ag | Vorrichtung zum Beschichten der Oberflächen von als Rotationskörper ausgeformten Substraten |
-
1997
- 1997-05-30 DE DE19722624A patent/DE19722624C2/de not_active Expired - Fee Related
-
1998
- 1998-05-27 DE DE59805573T patent/DE59805573D1/de not_active Expired - Lifetime
- 1998-05-27 EP EP98109597A patent/EP0881865B1/de not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0502829A1 (de) * | 1991-03-04 | 1992-09-09 | PROEL TECNOLOGIE S.p.A. | Vorrichtung mit ungeheizter Kathode zur dynamischen Erzeugung von Plasma |
DE4233895A1 (de) * | 1992-10-08 | 1994-04-14 | Juergen Prof Dr Engemann | Verfahren und Vorrichtung zur Plasmabehandlung bahnförmiger Materialien |
EP0727508A1 (de) * | 1995-02-16 | 1996-08-21 | Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. | Verfahren und Vorrichtung zur Behandlung von Substratoberflächen |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107852805A (zh) * | 2014-12-05 | 2018-03-27 | Agc玻璃欧洲公司 | 空心阴极等离子体源 |
CN107852805B (zh) * | 2014-12-05 | 2020-10-16 | Agc玻璃欧洲公司 | 空心阴极等离子体源 |
Also Published As
Publication number | Publication date |
---|---|
DE19722624A1 (de) | 1998-12-03 |
EP0881865A2 (de) | 1998-12-02 |
DE19722624C2 (de) | 2001-08-09 |
EP0881865B1 (de) | 2002-09-18 |
DE59805573D1 (de) | 2002-10-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0881865A3 (de) | Vorrichtung zur Erzeugung einer Vielzahl von Niedertemperatur-Plasmajets | |
DE112007003616B4 (de) | Veraschungsvorrichtung | |
DE102011077620A1 (de) | Bauelement, Verfahren zur Herstellung eines Bauelementes und Flugzeugtriebwerk mit einem Bauelement | |
DE102010000888B4 (de) | Verfahren zum Ausbilden von Aussparungen in einem Halbleiterbauelement und mit dem Verfahren hergestelltes Bauelement | |
US20030192864A1 (en) | Plasma processing apparatus and method | |
DE07123053T1 (de) | Verfahren zum Bilden fächerförmiger Ausströmungsöffnungen bei Verbrennungsanlagen | |
EP3230492B1 (de) | Verfahren zum kaltgasspritzen mit maske | |
DE2640511B2 (de) | Verfahren und Vorrichtung zum selektiven Ätzen einer Aluminiumschicht | |
WO2007036422A1 (de) | Vorrichtung mit stresskompensierter membran | |
DE102011006331A1 (de) | Herstellungsverfahren für eine Halbleitervorrichtung | |
EP1959096B1 (de) | Verfahren zur Prallluftkühlung für Gasturbinen | |
EP0737998A3 (de) | Vorrichtung zum Aufbringen dünner Schichten auf ein Substrat | |
EP1836718B1 (de) | Mikroplasmaarray | |
EP1349731B1 (de) | Mikrodüse und verfahren zur herstellung derselben | |
DE502004004094C5 (de) | Mikromechanische uhrwerkbauteile und verfahren zu ihrer herstellung | |
DE602004010737T2 (de) | Massenspektrometer und seine Verwendung | |
DE69938491T2 (de) | Plasmaerzeuger mit substratelektrode und verfahren zur behandlung von stoffen/ materialen | |
DE102018126617A1 (de) | Schirmplatte für einen CVD-Reaktor | |
DE10016938C2 (de) | Selektives Trockenätzen eines dielektrischen Films | |
EP1352985A1 (de) | Wärmedämmschichtsystem | |
EP1042794A1 (de) | Verfahren zur herstellung einer porösen schicht mit hilfe eines elektrochemischen ätzprozesses | |
EP3611343B1 (de) | Bauelement mit einer haftstruktur für eine turbomaschine, verfahren zur herstellung eines bauelementes mit einer haftstruktur für eine turbomaschine und turbomaschine mit einem bauelement mit einer haftstruktur | |
EP1583630B1 (de) | Verfahren zur erzeugung eines lochs | |
DE10255850B4 (de) | Verfahren zur Herstellung von Halbleiterstrukturen unter Ausbildung einer Signalschicht zur Generierung charakteristischer optischer Plasmaemissionen und integrierter Schaltungschip | |
EP3673249B1 (de) | Strahlungsquelle zur erzeugung einer elektromagnetischen strahlung sowie verfahren zu ihrer herstellung |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
AK | Designated contracting states |
Kind code of ref document: A2 Designated state(s): CH DE FR IT LI |
|
AX | Request for extension of the european patent |
Free format text: AL;LT;LV;MK;RO;SI |
|
PUAL | Search report despatched |
Free format text: ORIGINAL CODE: 0009013 |
|
AK | Designated contracting states |
Kind code of ref document: A3 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE |
|
AX | Request for extension of the european patent |
Free format text: AL;LT;LV;MK;RO;SI |
|
17P | Request for examination filed |
Effective date: 20000603 |
|
AKX | Designation fees paid |
Free format text: CH DE FR IT LI |
|
17Q | First examination report despatched |
Effective date: 20010309 |
|
GRAG | Despatch of communication of intention to grant |
Free format text: ORIGINAL CODE: EPIDOS AGRA |
|
GRAG | Despatch of communication of intention to grant |
Free format text: ORIGINAL CODE: EPIDOS AGRA |
|
GRAH | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOS IGRA |
|
GRAH | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOS IGRA |
|
GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): CH DE FR IT LI |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: EP |
|
REF | Corresponds to: |
Ref document number: 59805573 Country of ref document: DE Date of ref document: 20021024 |
|
ET | Fr: translation filed | ||
REG | Reference to a national code |
Ref country code: CH Ref legal event code: NV Representative=s name: MOINAS & SAVOYE SA |
|
PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
26N | No opposition filed |
Effective date: 20030619 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: IT Payment date: 20060531 Year of fee payment: 9 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20070527 |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: PUE Owner name: REINHAUSEN PLASMA GMBH Free format text: JE PLASMACONSULT GMBH#MUENGSTENER STRASSE 10#42285 WUPPERTAL (DE) -TRANSFER TO- REINHAUSEN PLASMA GMBH#WEIDENER STR. 20#93057 REGENSBURG (DE) Ref country code: CH Ref legal event code: NV Representative=s name: ROTTMANN, ZIMMERMANN + PARTNER AG |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R081 Ref document number: 59805573 Country of ref document: DE Owner name: REINHAUSEN PLASMA GMBH, DE Free format text: FORMER OWNER: JE PLASMACONSULT GMBH, 42119 WUPPERTAL, DE Effective date: 20110715 |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: PFA Owner name: REINHAUSEN PLASMA GMBH Free format text: REINHAUSEN PLASMA GMBH#WEIDENER STR. 20#93057 REGENSBURG (DE) -TRANSFER TO- REINHAUSEN PLASMA GMBH#WEIDENER STR. 20#93057 REGENSBURG (DE) |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: TP Owner name: REINHAUSEN PLASMA GMBH, DE Effective date: 20110914 Ref country code: FR Ref legal event code: CA Effective date: 20110914 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: CH Payment date: 20140522 Year of fee payment: 17 Ref country code: DE Payment date: 20140519 Year of fee payment: 17 Ref country code: FR Payment date: 20140516 Year of fee payment: 17 |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R119 Ref document number: 59805573 Country of ref document: DE |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: PL |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LI Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20150531 Ref country code: CH Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20150531 |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: ST Effective date: 20160129 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: DE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20151201 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: FR Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20150601 |