EP0881865A3 - Device for producing a plurality of low temperature plasma jets - Google Patents

Device for producing a plurality of low temperature plasma jets Download PDF

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Publication number
EP0881865A3
EP0881865A3 EP98109597A EP98109597A EP0881865A3 EP 0881865 A3 EP0881865 A3 EP 0881865A3 EP 98109597 A EP98109597 A EP 98109597A EP 98109597 A EP98109597 A EP 98109597A EP 0881865 A3 EP0881865 A3 EP 0881865A3
Authority
EP
European Patent Office
Prior art keywords
hollow cathode
plasma jets
low temperature
temperature plasma
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP98109597A
Other languages
German (de)
French (fr)
Other versions
EP0881865A2 (en
EP0881865B1 (en
Inventor
Jürgen Prof. Dr. Dr. h.c. Engemann
Darius Dr. Korzec
Mark Mildner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JE PlasmaConsult GmbH
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JE PlasmaConsult GmbH
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Filing date
Publication date
Application filed by JE PlasmaConsult GmbH filed Critical JE PlasmaConsult GmbH
Publication of EP0881865A2 publication Critical patent/EP0881865A2/en
Publication of EP0881865A3 publication Critical patent/EP0881865A3/en
Application granted granted Critical
Publication of EP0881865B1 publication Critical patent/EP0881865B1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/48—Generating plasma using an arc
    • H05H1/481—Hollow cathodes

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

Dargestellt und beschrieben ist eine Vorrichtung zur Erzeugung einer Vielzahl von Niedertemperatur-Plasmajets (5) mittels hochfrequenter Leistung unter Ausnutzung von Hohlkathodenentladungen in mindestens einer Hohlkathodenkammer (32), die von einer Hohlkathode (12) umgeben ist, die eine Einlaßöffnung (15) für ein Arbeitsgas umfaßt, mit wenigstens einer der Hohlkathode (12) benachbarten Anode (11), wobei die Hohlkathode (12) und die Anode (11) gegenüberliegende Öffnungen (6, 7) aufweisen, durch die die Plasmajets (5) von der Hohlkathodenkammer (32) in einen Prozeßraum (33) gelangen.A device is shown and described to produce a variety of low temperature plasma jets (5) using high frequency power using hollow cathode discharges in at least a hollow cathode chamber (32) by a Hollow cathode (12) is surrounded, which has an inlet opening (15) for a working gas, with at least one the anode (11) adjacent to the hollow cathode (12), wherein the hollow cathode (12) and the anode (11) opposite Have openings (6, 7) through which the plasma jets (5) from the hollow cathode chamber (32) into one Process room (33) arrive.

Aufgabe der Erfindung ist es, eine derartige Vorrichtung zu schaffen, die eine homogene Disposition einer funktionalen Schicht (25) auf einem bahnförmigen und gegebenenfalls temperaturempfindlichen Substrat (24) ermöglicht.The object of the invention is such Device to create a homogeneous disposition a functional layer (25) on a web and possibly temperature sensitive Allows substrate (24).

Die Aufgabe wird dadurch gelöst, daß die Vorrichtung mehrere separate Hohlkathodenkammern (32) umfaßt und jedem Plasmajet (5) jeweils eine Hohlkathodenkammer (32) als Entladungsraum zugeordnet ist.

Figure 00000001
The object is achieved in that the device comprises several separate hollow cathode chambers (32) and each plasma jet (5) is assigned a hollow cathode chamber (32) as a discharge space.
Figure 00000001
EP98109597A 1997-05-30 1998-05-27 Device for producing a plurality of low temperature plasma jets Expired - Lifetime EP0881865B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19722624 1997-05-30
DE19722624A DE19722624C2 (en) 1997-05-30 1997-05-30 Device for producing a large number of low-temperature plasma jets

Publications (3)

Publication Number Publication Date
EP0881865A2 EP0881865A2 (en) 1998-12-02
EP0881865A3 true EP0881865A3 (en) 2000-06-28
EP0881865B1 EP0881865B1 (en) 2002-09-18

Family

ID=7830910

Family Applications (1)

Application Number Title Priority Date Filing Date
EP98109597A Expired - Lifetime EP0881865B1 (en) 1997-05-30 1998-05-27 Device for producing a plurality of low temperature plasma jets

Country Status (2)

Country Link
EP (1) EP0881865B1 (en)
DE (2) DE19722624C2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107852805A (en) * 2014-12-05 2018-03-27 Agc玻璃欧洲公司 Hollow-cathode plasma source

Families Citing this family (19)

* Cited by examiner, † Cited by third party
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SE516336C2 (en) * 1999-04-28 2001-12-17 Hana Barankova Apparatus for plasma treatment of surfaces
EP1264330B1 (en) * 2000-03-14 2003-07-16 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. Method and device for the plasma-activated surface treatment and use of the inventive method
DE10120405B4 (en) * 2001-04-25 2008-08-21 Je Plasmaconsult Gmbh Device for generating a low-temperature plasma
DE10203543B4 (en) * 2002-01-29 2008-04-30 Je Plasmaconsult Gmbh Device for generating an APG plasma
DE102004029081A1 (en) * 2004-06-16 2006-01-05 Je Plasmaconsult Gmbh Device for processing a substrate by means of at least one plasma jet
DE102005032890B4 (en) * 2005-07-14 2009-01-29 Je Plasmaconsult Gmbh Apparatus for generating atmospheric pressure plasmas
GB0612814D0 (en) * 2006-06-28 2006-08-09 Boc Group Plc Method of treating a gas stream
TWI318417B (en) 2006-11-03 2009-12-11 Ind Tech Res Inst Hollow-type cathode electricity discharging apparatus
FR2912864B1 (en) 2007-02-15 2009-07-31 H E F Soc Par Actions Simplifi DEVICE FOR GENERATING A COLD PLASMA IN A VACUUM ENCLOSURE AND USING THE DEVICE FOR THERMOCHEMICAL TREATMENTS
CN105154856B (en) 2008-08-04 2018-08-10 北美Agc平板玻璃公司 Plasma source and with the chemical vapor deposition of plasma enhancing come the method for depositing thin film coatings
CN101730374B (en) * 2008-10-30 2012-05-09 财团法人工业技术研究院 Plasma system
DE102010027570B3 (en) 2010-07-19 2011-11-10 Eagleburgmann Germany Gmbh & Co. Kg Bellows compensator
RU2466514C2 (en) * 2011-02-09 2012-11-10 Государственное образовательное учреждение высшего профессионального образования "Камская государственная инженерно-экономическая академия" (ИНЭКА) Method to produce electric discharge in vapours of electrolyte and device for its realisation
KR102365939B1 (en) 2014-12-05 2022-02-22 에이지씨 플랫 글래스 노스 아메리카, 인코퍼레이티드 Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces
US9721765B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Plasma device driven by multiple-phase alternating or pulsed electrical current
US10242846B2 (en) 2015-12-18 2019-03-26 Agc Flat Glass North America, Inc. Hollow cathode ion source
US10573499B2 (en) 2015-12-18 2020-02-25 Agc Flat Glass North America, Inc. Method of extracting and accelerating ions
EP3474635B1 (en) 2017-10-17 2021-08-18 Leibniz-Institut für Plasmaforschung und Technologie e.V. Modular plasma jet treatment system
FR3115180B1 (en) * 2020-10-14 2022-11-04 Peter Choi Plasma generating device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0502829A1 (en) * 1991-03-04 1992-09-09 PROEL TECNOLOGIE S.p.A. Device with unheated hollow cathode for the dynamic generation of plasma
DE4233895A1 (en) * 1992-10-08 1994-04-14 Juergen Prof Dr Engemann Double-sided plasma treatment of strip-form material - involves forming spatially limited hollow cathode discharge low-pressure plasma in special treatment chamber with space limited by material being treated
EP0727508A1 (en) * 1995-02-16 1996-08-21 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. Method and apparatus for treatment of substrate surfaces

Family Cites Families (5)

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CS246982B1 (en) * 1985-06-17 1986-11-13 Ladislav Bardos Method and apparatus for producing chemically active environment for plasma chemical reactions namely for deposition of thin layers
US4954751A (en) * 1986-03-12 1990-09-04 Kaufman Harold R Radio frequency hollow cathode
US5464667A (en) * 1994-08-16 1995-11-07 Minnesota Mining And Manufacturing Company Jet plasma process and apparatus
SE503141C2 (en) * 1994-11-18 1996-04-01 Ladislav Bardos Apparatus for generating linear arc discharge for plasma processing
DE19541236A1 (en) * 1995-11-06 1997-05-07 Leybold Ag Apparatus for coating the surfaces of substrates shaped as bodies of revolution

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0502829A1 (en) * 1991-03-04 1992-09-09 PROEL TECNOLOGIE S.p.A. Device with unheated hollow cathode for the dynamic generation of plasma
DE4233895A1 (en) * 1992-10-08 1994-04-14 Juergen Prof Dr Engemann Double-sided plasma treatment of strip-form material - involves forming spatially limited hollow cathode discharge low-pressure plasma in special treatment chamber with space limited by material being treated
EP0727508A1 (en) * 1995-02-16 1996-08-21 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. Method and apparatus for treatment of substrate surfaces

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107852805A (en) * 2014-12-05 2018-03-27 Agc玻璃欧洲公司 Hollow-cathode plasma source
CN107852805B (en) * 2014-12-05 2020-10-16 Agc玻璃欧洲公司 Hollow cathode plasma source

Also Published As

Publication number Publication date
DE19722624A1 (en) 1998-12-03
EP0881865A2 (en) 1998-12-02
DE19722624C2 (en) 2001-08-09
EP0881865B1 (en) 2002-09-18
DE59805573D1 (en) 2002-10-24

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