EP0881537B1 - Photographisches Entwicklungsgerät - Google Patents
Photographisches Entwicklungsgerät Download PDFInfo
- Publication number
- EP0881537B1 EP0881537B1 EP19980201611 EP98201611A EP0881537B1 EP 0881537 B1 EP0881537 B1 EP 0881537B1 EP 19980201611 EP19980201611 EP 19980201611 EP 98201611 A EP98201611 A EP 98201611A EP 0881537 B1 EP0881537 B1 EP 0881537B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- photosensitive material
- processing
- processing solution
- film
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
- G03D13/00—Processing apparatus or accessories therefor, not covered by groups G11B3/00 - G11B11/00
- G03D13/006—Temperature control of the developer
Definitions
- the present invention relates to the field of photography, and more particularly, to the method and apparatus for processing photosensitive material.
- the processing of photosensitive material involves a series of steps when the photosensitive material is subjected to various different processing solutions.
- photosensitive material will be subjected to developing, bleaching, fixing, and washing solutions. Thereafter, the photosensitive material is subjected to a drying operation before leaving the apparatus.
- a drying operation before leaving the apparatus.
- the temperature of the processing solution is maintained by the use of heaters which heat the processing solution to a specified temperature and maintains the processing solution at the specified temperature within certain tolerances through the use of a temperature controller.
- processing parameters may be varied. These include the concentration and make-up of the processing solution themselves, the amount of agitation used to apply the solution of photosensitive material, and the temperature of the solution.
- An effective way to shorten a photographic process time is to increase the temperature of processing solution through which the photosensitive material passes.
- increasing the temperature causes a chemical reaction to occur at an accelerated rate.
- the problem with increasing the temperature of the solution is that the processed solution may oxidize and generally decompose at a much faster rate.
- the higher temperatures increase the rate of evaporation of processing solution.
- greater care must be taken with the processing solution to prevent operators from getting burned, or being subjected to chemical vapors that are outgassed because of the higher temperatures.
- increased wear and tear occurs on the processing equipment due to the increase in the differential in temperature the equipment experiences between time when the device is in use and when the processor is not in use. All of the foregoing factors require increased cost of running the equipment.
- the photosensitive material in order to increase faster processing time, be preheated before entering the processor. While this has been found to find a slight increase in efficiency and use of the solution and improvement in processing time, the down side is that the heat added by the preheated photosensitive material also brings additional problems associated with increased processing solution temperatures as previously discussed.
- Another problem with preheating of photosensitive material is that all the layers of the emulsion of the photosensitive material have the same temperature. As the processing solution diffuses in the various emulsion layers, the increase in chemical reaction is the same for the top layer, as well as the layers closest to the base.
- An object of the present invention is to overcome the above problems experienced by processors by selectively raising or lowering the temperature of the photosensitive material after it has entered the processing solution and that the overall temperature of the processed solution is not increased. This is accomplished by applying heat or cooling directly to a very small area of the film in an area where fresh processing solution has broadened the contact with the surface of the photosensitive material.
- the resulting temperature gradient results in the emulsion layer.
- the resulting temperature gradient provided by an apparatus according to the present invention allows the photosensitive film designer more latitude where they can place the various light-sensitive emulsion.
- emulsions that react slower to processing solution must be located closer to the photosensitive material surface and faster reaction layers are placed closer to the base. This arrangement does not always correspond to the optimal placing of emulsion layers for the capturing of light in the resulting layer and interactions and image sharpness. The overall result is usually a compromise that causes longer processing time, need for higher concentration of solutions, or inefficient use of processing solution.
- a photographic processor for and method of developing photosensitive material.
- the apparatus comprises a processing tank containing a processing solution for processing of said photosensitive material; a transport mechanism for moving of said photosensitive material through said processing solution; and a heating and/or cooling mechanism for providing a temperature gradient across the photosensitive material, when it is moved throug the processing solution.
- the apparatus 10 includes at least one processing section 11.
- the processing section 11 comprises a processing tank 12 and rack 14 for placement in the tank 12.
- the processing section 11 is of the low volume thin tank type construction.
- the rack 14 and tank 12 are constructed so as to form a narrow processing channel 16 for containing a processing solution 18 through which a photosensitive material 20 passes for processing.
- the processing channel 16 includes a pair of outlets 22 for allowing processing solution to go through the recirculation system 24 and then return to the processing channel 16.
- the recirculation system 24 includes conduits 28 for fluidly connecting the outlets 22 of the processing channel 16 to a recirculation pump 30, which recirculates the processing solution 18 through the recirculation system 24.
- a conduit 32 is provided for directing processing solution 18 through a manifold 34 from recirculation pump 30.
- the manifold 34 is provided for introducing replenishment solution contained in reservoirs 36,38,40 which are introduced to the manifold 34 by pumps, not shown.
- the manifold 34 is fluidly connected to a filter 42 by conduit 44.
- the filter 42 is connected to inlet nozzle 46 by conduit 48.
- the inlet nozzle 46 is designed for introducing processing solution 18 against the top surface 50 of the emulsion side of the photosensitive material 20.
- a plurality of roller pairs 52, 54, 56, 58, 60 are provided for transporting and guiding the photosensitive material 20 through the processing channel 16. It is to be understood that any desired means may be used for transporting the photosensitive material 20 through the processor and that the photosensitive material may be of the continuous web or sheet form.
- a computer not shown, is provided for controlling operation of the apparatus 10 as is conventionally done and, therefore, will not be discussed in any detail herein.
- FIG 1 only one processing section 11 is illustrated for containing a single processing solution for processing of the photosensitive material 20. It is to be understood that any desired number of processing sections 11 may be provided with each processing section containing any desired processing solution. The processing sections would serially subject the photosensitive material as is typically done in the prior art.
- nozzle 46 which has a nozzle opening 62 which has a thickness T.
- the nozzle 46 is preferably disposed in an insulating jacket 63 provided in wall 64 of tank 12.
- the jacket 63 is made of low thermal conductive material, such as polystyrene, polypropylene and polyethylene, so as to minimize heat transfer to the processing solution 18 passing therethrough.
- an air gap may be provided around nozzle 46.
- the opening 62 is in the form of an elongated slot which extends at least along the width of the photosensitive material 20 passing adjacent thereto.
- a narrow processing channel 16 is provided such that the opening 62 is disposed closely adjacent the surface 50 of the photosensitive material 20.
- a narrow processing channel 16 shall be considered a channel having a thickness T equal to or less than 100 times the thickness of photosensitive material.
- processing channel 16 has a thickness T equal to or less than 50 times the photosensitive material when photographic paper is used, most preferably a thickness T equal to or less than 10 times the thickness of the photographic paper.
- the thickness T is most preferably equal to or less than 18 times the thickness of the film.
- processors made in accordance with the present invention for processing photosensitive paper would have a processing channel 16 having a thickness T of 0.080 inches
- a processor for processing photographic film would have a channel 16 having a thickness T of .1 inches.
- the thickness of the channel 16 may be varied as appropriate.
- the nozzle opening 62 deliver processing solution to the processing channel in accordance with the following relationship: 1>F/A>40 wherein:
- Providing a nozzle in accordance with the foregoing relationship assures appropriate discharge of the processed solution against the photosensitive material so as to provide an impinging force for introducing new processing solution to the surface of the photosensitive material.
- the present invention is designed to provide localized heating of the photosensitive material 20 as it passes through the processing channel 16.
- a heater 80 which is provided in rack 14.
- the heater 80 comprises a first insulating block 82 made of a material having a low thermal conductivity and includes an elongated roller 92 disposed in a substantially circular cavity 94 formed therein.
- the insulating material may be of any desired low thermal conductive material, such as polystyrene, polypropylene and polyethylene.
- an air gap may be provided around the heater 80.
- the cavity 94 closely conforms to the outer configuration roller 92, leaving only a small distance therebetween.
- the distance D is sufficient to allow easy rotation of the roller 92 therein.
- the roller 92 is of the conductive type which allows heat to flow from roller 92 against the back surface 96 of the photosensitive material 20. It is to be understood that roller 92 may be heated by any desired technique.
- the roller 92 has an outer shell section 98 made of an appropriate conductive material and is heated by appropriate electrical wires, not shown, connected thereto. The shell construction minimizes the thermal mask of the roller 92, thereby allowing easy adjustment of the temperature such that the appropriate amount of heat transfer occurs between the photosensitive material 20 and the roller 92.
- the heater 80 is positioned in direct opposition to the inlet nozzle 46. This is done so that the photographic processing solution 18 will cause the photosensitive material 20 to be pushed into intimate and continuous contact with the heat transfer roller 92. In addition, this provides heat at the exact area in which there is a high degree of agitation and new fresh processing solution being brought to the emulsion surface of the photosensitive material 20.
- photosensitive material 20 comprises a support base 100 having top surface 95 on which an emulsion layer 102 is provided.
- the emulsion layer 102 comprises a plurality of separate layers 103, 104, 105, 106, 107, 108, 109, 110, 111, 112, 113, 114. These layers serve to provide color to the photosensitive material, control processing and protection against ultraviolet light and physical abrasion. The operation and description of these layers is well known to those skilled in the art. A detailed description of these and similar type photosensitive material structures may be found in an article in Research Disclosure, September 1996, No.
- FIG. 4A there is illustrated in graphical form, the chemical reactivity of the emulsion layer with respect to its distance from the surface of the emulsion layer 102 as illustrated by line 120, for a processor made in accordance with the prior art wherein the photosensitive material experiences a substantially uniform temperature across the width W of the photosensitive material.
- the chemical reactivity is greatest at the surface of the photosensitive material closest to nozzle 46 and the lowest at layer 103 of the emulsion layer 102 adjacent the support base 100.
- the variation in the range of chemical reactivity is illustrated by R1.
- FIG. 4B there is illustrated a graph of the type illustrated in Figure 4A for an apparatus made in accordance with the present invention.
- a heating roller is used to heat the back side of the support layer 100 of the photosensitive material 20.
- the chemical reactivity of the emulsion layer 102 is illustrated by line 122.
- the temperature of the emulsion layer increases the closer it is to the heater 80 as illustrated by line 115.
- the area of the emulsion layers closest to the base 100 experience the greatest temperature, however, receive the least chemical reactivity due to the impinging processing solution.
- the variation of chemical reactivity R2 is substantially less than the range of variation R1 of the apparatus of Figure 4A.
- the present invention provides a compensating effect in that the emulsion layer receiving the least chemical reactivity experiences the greatest temperature, therefore, providing a more uniform overall chemical reactivity for all of the emulsion layers.
- FIG. 5 there is illustrated a partial view of a modified apparatus similar to Figure 2 illustrating a modified heater 130 made in accordance with the present invention, like numerals indicating like parts and operation as previously discussed.
- a heater 130 embedded into the rack 14, such that the surface 134 of the heater is substantially planar and substantially flush with the surface 136 of the rack 14.
- the heater 130 comprises a mounting body section 138, which is mounted in rack 14, and is made out of an insulating material.
- a heat-conductive element 140 Disposed at the outer surface, and within the body section 138, there is provided a heat-conductive element 140 having an outer engaging surface 142, which is also coplanar with the surface 136 of the rack 14.
- the surface 142 is designed to engage the back surface 144 of the photosensitive material as illustrated.
- the heating element 140 is positioned to be substantially opposite the nozzle 46 such that the nozzle 46 will force the photosensitive material 20 against the heating element 140, thus encouraging the heat transfer from the heating element 140 to the photosensitive material 20.
- the back surface 144 of the photosensitive material 20 slides against the surface 142. Therefore, the surface 142 is appropriately made as smooth as possible to avoid any unnecessary abrasive scratching to the surface of the photosensitive material.
- a pair of cooling coils 160 are provided in conduits 28 for cooling of a processing solution in the recirculation system 24 prior to reaching the pump 30.
- This is particularly important in a low volume thin tank type processor where a minimum amount of volume is provided, both in the processing channel and in the recirculatory system. This avoids the possibility of the overall temperature of the processing solution from increasing to an undesirable level.
- a cross-conduit 152 connects the two conduits 28.
- a valve 170 is provided in conduit 152 where another conduit 180 is provided for providing fluid connection with section 155 of conduits 28 at a point after cooling coils 160.
- Valves 171,172 are provided after the cooling coils 160 in conduits 28.
- processing solution will be cooled by cooling coils 160.
- valve 170 is in the open state and valves 171,172 are in the closed state, there is no cooling of the processing solution.
- cooling of the processing solution may be turned on and off as required for proper operation of the apparatus.
- the processing tank is of a low volume thin tank type. It is to be understood that the present invention may be applied to other type construction.
- FIG 7 there is illustrated a modified apparatus 210 made in accordance with the present invention, like numerals indicating like parts and operation as previously discussed.
- the tank 12 contains processing solution and a typical rack 212 is provided within the tank 12 for transporting and guiding the photosensitive material through the processing solution 18.
- the heater 80 and nozzle 46 are simply positioned within the tank 12 closely adjacent the path of the photosensitive material 20 such that the nozzle 46 will be closely adjacent for providing impingement solution against the photosensitive material 20 and the heater 80 being disposed in direct opposition to the nozzle 46 for providing heat to the photosensitive material 20 at this area.
- FIG 8 there is illustrated yet another modified apparatus made in accordance with the present invention, like numerals indicating like parts and operation as previously discussed.
- This embodiment is similar to that of Figure 7 except that cooling coils 160 are provided for cooling of the processing solution as it leaves the tank 12.
- the heater 80 is provided on one side of the photosensitive material. If desired, heater rollers 80 may be provided on both sides of the photosensitive material, for example, when emulsion layers are provided on both sides of the photosensitive material.
- the development characteristics of the emulsion layers are controlled by providing heat to the front or back side of the photosensitive material.
- the film may be cooled for providing yet again a different temperature gradient across the photosensitive film for providing yet still further development characteristics of the film.
- this system 220 includes a developmental block 222 having a retaining section 224 for holding a strip of photosensitive material 226 therein against a supporting back surface 228, which may be heated or cooled as appropriate.
- a processing solution is delivered to the front surface 230 of the strip of photosensitive material by a dispensing tube 232, which dispenses a processing solution along the width of the photosensitive material 226.
- the block 222 is disposed at an angle such that the processing solution will flow downward along the surface of the photosensitive material 226 and captured by retaining section 234.
- a pump 236 draws solution from the retention section 234 and delivers it back to the dispensing tube 232.
- a thermostat 238 is provided for monitoring the temperature of the processing solution that is circulated therethrough.
- the block section 222 is provided with passages for passing a cooling or heating solution therethrough, thereby controlling the temperature of surface 228.
- a color developer processing solution such as shown in Table 1 below, was made and used to develop Kodak Gold 100 film in a system shown in Figures 9 and 10. Processing solution was pumped and provided on the film surface at 1 liter/minute and flows down the front of the film by gravity.
- the device was set such that the surface 228 was disposed at an angle of 70°, although other angles may have been used.
- Developer Composition Potassium carbonate(anhydrous) 37.5 g/l Sodium sulphite(anhydrous) 4.25 g/l Potassium iodide 1.2 mg/l Sodium bromide 1.3 g/l Hydroxylamine sulphate 2.0 g/l Anti-calcium agent 6.5 ml/l Color developing agent 4.5 g/l pH 10.00
- Process cycle used is shown in Table 2.
- the present invention provides a processing apparatus which increases the efficiency of the processor without adversely affecting the processing solution.
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photographic Processing Devices Using Wet Methods (AREA)
Claims (6)
- Fotografischer Prozessor zum Entwickeln lichtempfindlichen Materials (20) mit:einem Verarbeitungstank (12), der eine Verarbeitungslösung (18) zum Verarbeiten des lichtempfindlichen Materials (20) enthält;einem Transportmechanismus (52,54,56,58,60) zum Transportieren des lichtempfindlichen Materials (20) durch die Verarbeitungslösung (18); undeinem Heiz- und/oder Kühlmechanismus zum Erzeugen eines Temperaturgradienten über dem lichtempfindlichen Material (20) bei dessen Transport durch die Verarbeitungslösung.
- Fotografischer Prozessor nach Anspruch 1, dadurch gekennzeichnet, dass das lichtempfindliche Material (20) eine Vorderseite (95) und eine Rückseite (96) sowie eine auf der Vorderseite angeordnete Emulsionsschicht (102) aufweist, und dass der Mechanismus zum Heizen oder Kühlen benachbart zur Rückseite (96) des Films angeordnet ist.
- Fotografischer Prozessor nach Anspruch 1, dadurch gekennzeichnet, dass die benachbart zur Emulsionsseite (102) strömende Verarbeitungslösung (18) eine Temperatur aufweist, die höher als die Temperatur des Mechanismus zum Kühlen des Films ist, der benachbart zur Rückseite (96) des Films angeordnet ist.
- Fotografischer Prozessor nach Anspruch 1, dadurch gekennzeichnet, dass die benachbart zur Emulsionsseite (102) strömende Verarbeitungslösung (18) eine Temperatur aufweist, die höher als die Temperatur des Mechanismus zum Heizen des Films ist, der benachbart zur Rückseite (96) des Films angeordnet ist.
- Fotografischer Prozessor nach Anspruch 1, dadurch gekennzeichnet, dass der Heizund/oder Kühlmechanismus ein örtlich begrenztes Heizen und/oder Kühlen vorsieht.
- Verfahren zum Verarbeiten eines lichtempfindlichen Materials (20) durch Transportieren des lichtempfindlichen Materials (20) durch einen Verarbeitungstank (12), der eine Verarbeitungslösung (18) enthält, wobei das lichtempfindliche Material (20) eine Emulsionsschicht (102) aufweist, die eine Vielzahl verschiedener lichtempfindlicher Schichten umfasst, gekennzeichnet durch folgende Schritte:Transportieren des lichtempfindlichen Materials (20) durch die Verarbeitungslösung (18); undörtlich begrenztes Heizen oder Kühlen des lichtempfindlichen Materials (20) derart, dass ein Temperaturgradient über der Emulsionsschicht (102) erzeugt wird, wenn diese durch die Verarbeitungslösung tritt.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US86579397A | 1997-05-30 | 1997-05-30 | |
US865793 | 1997-05-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0881537A1 EP0881537A1 (de) | 1998-12-02 |
EP0881537B1 true EP0881537B1 (de) | 2004-02-25 |
Family
ID=25346239
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP19980201611 Expired - Lifetime EP0881537B1 (de) | 1997-05-30 | 1998-05-18 | Photographisches Entwicklungsgerät |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0881537B1 (de) |
JP (1) | JPH10333306A (de) |
CN (1) | CN1230701A (de) |
DE (1) | DE69821827D1 (de) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109164673A (zh) * | 2018-10-25 | 2019-01-08 | 叶柳城 | 一种洗片机 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3850635A (en) * | 1972-08-03 | 1974-11-26 | Cutler Hammer Inc | Method and apparatus for developing heat processable photographic film |
GB9216334D0 (en) * | 1992-07-31 | 1992-09-16 | Kodak Ltd | Film transport means for use in a film dryer |
JP3128186B2 (ja) * | 1994-12-19 | 2001-01-29 | キヤノン株式会社 | 電子写真装置 |
-
1998
- 1998-05-18 DE DE69821827T patent/DE69821827D1/de not_active Expired - Lifetime
- 1998-05-18 EP EP19980201611 patent/EP0881537B1/de not_active Expired - Lifetime
- 1998-05-29 CN CN 98109364 patent/CN1230701A/zh active Pending
- 1998-06-01 JP JP15112898A patent/JPH10333306A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
EP0881537A1 (de) | 1998-12-02 |
CN1230701A (zh) | 1999-10-06 |
JPH10333306A (ja) | 1998-12-18 |
DE69821827D1 (de) | 2004-04-01 |
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