EP0809854B1 - Feldemissionskathode und herstellungsverfahren derselben - Google Patents
Feldemissionskathode und herstellungsverfahren derselben Download PDFInfo
- Publication number
- EP0809854B1 EP0809854B1 EP96903328A EP96903328A EP0809854B1 EP 0809854 B1 EP0809854 B1 EP 0809854B1 EP 96903328 A EP96903328 A EP 96903328A EP 96903328 A EP96903328 A EP 96903328A EP 0809854 B1 EP0809854 B1 EP 0809854B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- field emission
- emitting surface
- substance
- irregularity
- emission cathode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title claims abstract description 33
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 239000000126 substance Substances 0.000 claims abstract description 35
- 230000005684 electric field Effects 0.000 claims abstract description 19
- 150000002500 ions Chemical class 0.000 claims abstract description 16
- 239000000835 fiber Substances 0.000 claims description 27
- 239000000463 material Substances 0.000 claims description 16
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 11
- 229910052799 carbon Inorganic materials 0.000 claims description 11
- 238000000137 annealing Methods 0.000 claims description 7
- 230000001678 irradiating effect Effects 0.000 claims description 4
- 229910052792 caesium Inorganic materials 0.000 claims description 3
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical group [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 claims description 3
- 238000010606 normalization Methods 0.000 claims description 3
- 230000003628 erosive effect Effects 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims 3
- 239000002245 particle Substances 0.000 claims 1
- 238000002360 preparation method Methods 0.000 abstract description 3
- 230000001939 inductive effect Effects 0.000 abstract 1
- 230000006870 function Effects 0.000 description 7
- 239000007789 gas Substances 0.000 description 6
- 238000002844 melting Methods 0.000 description 6
- 230000008018 melting Effects 0.000 description 6
- 239000011521 glass Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 238000005520 cutting process Methods 0.000 description 4
- 238000010849 ion bombardment Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000009499 grossing Methods 0.000 description 2
- 238000003892 spreading Methods 0.000 description 2
- 230000007480 spreading Effects 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000007792 gaseous phase Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 230000006386 memory function Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 238000012876 topography Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/30—Cold cathodes, e.g. field-emissive cathode
- H01J1/304—Field-emissive cathodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2201/00—Electrodes common to discharge tubes
- H01J2201/30—Cold cathodes
- H01J2201/304—Field emission cathodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2329/00—Electron emission display panels, e.g. field emission display panels
Definitions
- the present invention relates to a field emission cathode to be used in light sources and similar devices, such as display panels, cathode-ray tubes, etc., and to methods in the production of such a field emission cathode.
- US patent 4 728 851 discloses a field emission cathode in an emitting device with a memory function, consisting of one carbon fibre with a diameter in the order of two micrometers with an emitting end sharpened by corona discharge to a diameter of approximately 0.2 micrometers.
- US patent 4 272 699 discloses a field emission cathode in an electron impact ion source device consisting of a bundle of carbon fibres with diameters in the order of two to ten micrometers with emitting ends, which are cut off and not sharpened by any refinishing operation.
- the field emission cathode is made from a fibre material containing a first substance, the method comprising firstly the steps of combining a plurality of fibres of the fibre material; cutting, mechanically or by melting, bundles from the fibre material, each bundle consisting of a plurality of fibre segments of a predetermined length; and annealing the fibre segments in order to remove from it other substances than the first substance, and/or to normalize the structure of the first substance in the fibre segments.
- the method secondly comprises the steps of irradiating the emitting ends of the fibre segments with ions, to increase and improve irregularities of the emitting ends, in order to facilitate electron field emission (Stronger local electrical fields are formed generally at irregularities or tips); and modifying the emitting ends by applying a variable voltage to the fibre segments and increasing according to a predetermined scheme the variable voltage, during electron field emission from the emitting ends, in order to preserve the irregularities of the emitting ends, to such an extent that full operating voltage may then be applied momentarily (in a step) without any substantial deterioration of the field emitting properties of the cathode.
- the steps of irradiating and modifying are performed simultaneously in an evacuated environment containing residual gas ions.
- the ion bombardment may involve adding ions of a second substance with a lower work function than that of the first substance.
- a field emission cathode consists of a bundle 1 of carbon fibres 3 with emitting ends 2.
- a bundle 1 there may be in the order of a hundred fibres 3 or more.
- the diameter of the fibres 3 are in the range of a few micrometers. For clarity, a small number only of the carbon fibre segments is shown in figs. 1 and 2.
- the cut fibre bundles are annealed, preferably in open air at a temperature which is increased continuously for about 1.5 hours to approximately 500°C and then maintained for about 8-10 minutes.
- This treatment improves the ability of the emitting surface to develop effectively emitting irregularities.
- Fig. 1 shows a part only of the bundle 1 of fibres 3 with the emitting ends 2 after the annealing.
- Fig. 3 shows a profile 5 of one fibre 4 after the annealing, the emitting end profile 5 having small irregularities.
- the next step of preparing the emitting ends is performed together with the step of modifying ("burning-in") in a vacuum chamber.
- the pressure in the chamber is approximately 10 -6 Torr, which means that the chamber contains some residual gas.
- An electric field strong enough is applied to the cathode, electron emission will occur from the emitting ends.
- the application of the electric field also causes ions of the residual gas to accelerate toward the emitting surface and collide with it creating new irregularities.
- the emission will reach levels in the sharpest irregularities (peaks), causing them to melt locally. If the electric field strength is increased slowly, the melting will be restricted and a substantial portion of the irregularities be preserved, and so will the field emission properties of the emitting ends.
- the electrical field is increased in five, possibly, equal steps from zero to full operating voltage, each step being a few minutes, e.g., ten minutes.
- Fig. 2 shows a part only of the bundle 1 of fibres 3 with the emitting ends 2 after the irradiation, wherein still another advantageous effect is achieved.
- the emitting ends 2 (the tips of the fibre segments) are slightly separated, which facilitates a wider distribution of emitted electrons.
- Fig. 4 shows a profile 7 of one fibre 6 after the irradiation, the emitting end profile 7 having high and sharp irregularities 8.
- Fig. 5 shows a profile 10 of one fibre 9 after the modifying, the emitting end profile 10 having high, but slightly rounded irregularities 11.
- the step of irradiation (bombardment) of the emitting ends may be performed with ions of cesium or a similar low work function material.
- the ions are then saturated into the surface of the emitting ends, thereby lowering the electron work function of the emitting ends.
- these irradiation impacts also cause sharp irregularities in the emitting ends.
- the step of modifying may be applied at different stages of the manufacturing of a field emission cathode according to the invention.
- modifying may be performed when the fibres (or bodies) are being treated in the vacuum chamber and/or when they are mounted in an illuminating device or in any electron emitting device.
- Fig. 6 shows a light source with field emission cathodes applied in the form of bundles 1, preferably in a matrix, arranged on a conductive substrate 17.
- a modulator electrode 12 with an aperture centred around each bundle.
- the substrate 17 and the modulator 12 rest on dielectric supports 18 inside an evacuated glass container with an upper boundary glass plate 15 and a lower boundary glass plate 16.
- an anode 13 and a luminescent layer 14 Opposite the bundles 1 and the modulator, there is provided on the inside of the upper boundary 15 an anode 13 and a luminescent layer 14.
- the anode 13, the modulator 12, arid the substrate 17, have electrical terminals A, B, C, respectively, for application of voltages leading electrons from the bundles 1, via the modulator apertures, to the luminescent layer 14 in connection with the anode 13.
- the luminescent layer 14 When electrons hit the luminescent layer 14, light is emitted escaping the transparent anode 13 and the glass container.
- a field emission cathode constituted by at least one body, preferably purified to contain essentially a first substance, and preferably normalized in its internal and surface structure, is treated in the following steps: preparing the body or bodies by mechanical, thermal, erosion, and/or irradiation treatment so as to provide it with at least one emitting surface having irregularities facilitating electron field emission; and modifying the emitting surface by applying to the body a variable electric field, in order to induce electron field emission from the emitting surface, and increasing the field intensity according to a predetermined scheme, in order to preserve the irregularities of the emitting surface, to such an extent that full operating voltage may then be applied momentarily (in a step) without any substantial deterioration of the field emitting properties of the cathode.
- the method may comprise the step of adding to the emitting surface a second substance with a lower work function than that of the first substance, in order to lower the electrical field strength required to induce electron field emission from the emitting surface.
- One way of arriving at a suitable initial material for the cathode would be to anneal the body or the initial material, in order to remove from it other substances than the first substance and/or to normalize its structure.
- the term normalization may be understood as reduction of the occurrence of amorphous structures of the body of the initial material.
- the body of the cathode may have any geometric configuration, including but not limited to a fibre, a layer, a cone shaped body, and a block.
- the term irregularities should not be understood as excluding non-smooth geometries formed in a regular pattern on the emitting surface.
- the preparation step may more specifically be performed through mechanical grinding, electrical spark discharge, or ion bombardment. It is preferred to perform the step of preparation by bombardment simultaneously with the step of modifying, see below. Also, in the case of preparing by ion bombardment, that step could be performed with ions of the second substance, which would combine the step of adding with the step of preparing (and modifying).
- the bodies being a bundle of fibres
- the first substance of the cathodes is carbon or a substance with similar properties.
- the use of carbon is advantageous, e.g., due to its ability to develop irregularities when hit by ions in production and in normal use.
- the second substance (the implant), if used, may be cesium or other suitable material with a low work function. It would be possible to manufacture or develop a suited electro-conductive body from either a solid, liquid or gaseous phase of the selected substance(s) or through an external action on a body.
- the irregularities remaining after the step of preparing the emitting ends by bombarding (irradiating) with, and possibly adding (doping), ions are crucial to field emission properties of the cathode.
- the irregularities may consist of peaks or tips (microtips) of carbon, which is possibly cesium-doped.
- the radius of curvature of the tips are preferably within the orders of magnitude of 0.1-100 nanometers.
- the step of modifying the emitting surface is a "burning-in" process, in which the irregularities are rounded off at the peaks by melting due to heat generation from electron field emission. According to the invention, this process is performed carefully, so that only the sharpest or highest points are rounded off, leaving irregularities that withstand momentary application of full operating voltage without melting.
- the variable voltage in the step of modifying is applied either in predetermined steps, according to a predetermined (continuous) curve, or with regulation in respect to a maximum voltage derivative with respect to time, so as to limit probability of local current density in tips (irregularities) of the ends exceeding a predetermined value (restricting or limiting points of melting).
- a predetermined value restrictive or limiting points of melting.
- Excessive melting will result in a disadvantageous smoothing of the surface. This smoothing will be more severe should the heat not be allowed to escape from the tips through raising the field emission current (field intensity) slowly or in a number of steps the first time.
- One possible way of expressing a criterion for the modifying step could be limiting the probability of local current density in irregularities of the tips exceeding a predetermined value. Another would be increasing the variable electric field, in such a manner that a deterioration of said irregularities of said emitting surface is limited.
- the first substance of the cathode could contain a crystal or a grain structure or both. Moreover, it is possible for the irregularities to occur in the form of micro-pores or cavities with high concentration, where the first substance has a (micro-) grain structure.
- the cathode could be a flat plate structure, e.g., achieved through pyrography.
- steps of preparing, adding (for example by bombarding) and modifying, respectively may be used independently or in a different order to arrive at a field emission cathode with an improved function. It is to be understood that these steps may also be performed in various combinations, sequentially, simultaneously, or repeatedly.
- More than one of the cathodes may be combined on a substrate into a compound cathode suited for the geometry of a specific illuminating device.
- the invention is directed not only toward use in lamps, fluorescent tubes, cathode-ray tubes, but to any other devices it where electron field emission is desired. It would even be possible to apply the invention using only one single tip (irregularity).
Landscapes
- Cold Cathode And The Manufacture (AREA)
- Discharge Lamp (AREA)
- Electrodes For Cathode-Ray Tubes (AREA)
- Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
- Battery Electrode And Active Subsutance (AREA)
Claims (21)
- Verfahren zur Herstellung einer Feldemissionskathode (1), die aus wenigstem einem Körper (3) besteht, der eine erste elektrische leitende Substanz enthält, wobei der wenigstens eine Körper wenigstens eine Emissionsfläche (2) mit wenigsten einer Irregularität (8) aufweist und das Verfahren folgende Stufe umfaßt:Modifizieren der Emissionsfläche (2), indem an dem wenigstens einen Körper (3) ein variables elektrisches Feld angelegt wird, um von der Emissionsfläche (2) Elektronenfeldemission zu induzieren, und Erhöhen des variablen elektrischen Feldes in solcher Weise, daß eine scharfe Spitze oder scharfe Spitzen (8) der wenigstens Irregularität (8) verschlechtert wird (werden), um die wenigstens eine Irregularität (11) zu bewahren und die scharfe Spitze oder die scharfen Spitzen (11) durch Erhitzen abzurunden, welches aus der induzierten Elektronenfeldemission folgt.
- Verfahren nach Anspruch 1, welches weiter die Stufe umfaßt, die Emissionsfläche (2) zu präparieren, so daß die wenigstens eine Irregularität (8) verbessert wird, um die Elektronenfeldemission zu erleichtern, indem wenigstens einer der folgenden Schritte durchgeführt wird:eine mechanische Behandlung des wenigstens einen Körpers (3);eine Erosionsbehandlung des wenigstens einen Körpers (3);eine Bestrahlungsbehandlung des wenigstens einen Körpers (3);Tempern durch Erhitzen, vorzugsweise an offener Luft.
- Verfahren nach einem der Ansprüche 1 bis 2, worin das variable elektrische Feld in der Stufe des Modifizierens der Emissionsfläche (2) in Stufen mit vorbestimmten Größen und Zeitdauern von einer niedrigen Feldstärke zu einer Feldstärke in der Größenordnung einer Betriebsspannung der Feldemissionskathode gesteigert wird.
- Verfahren nach einem der Ansprüche 1 bis 3, welches in Kombination die folgenden Stufen umfaßt:Präparieren der Emissionsfläche (2), um die wenigstens eine Irregularität (8) zu verbessern, um die Elektronenfeldemission zu erleichtern;Modifizieren der Emissionsfläche (2) in der angegebenen Weise.
- Verfahren nach einem der Ansprüche 1 bis 3, welches nacheinander die folgenden Stufen aufweist:Präparieren der Emissionsfläche, um die wenigstens eine Irregularität (8) zu verbessern, um die Elektronenfeldemission zu erleichtern:Modifizieren der Emissionsfläche (2) in der angegebenen Weise.
- Verfahren nach einem der Ansprüche 1 bis 5, wobei die Stufen des Modifizierens und des Präparierens durch Bestrahlungsbehandlung zusammen in einer Vakuumumgebung, die Restgas enthält, durchgeführt werden, wobei das variable elektrische Feld stark genug ist, um die Emissionsfläche (2) mit Ionen des Restgases zu bestrahlen.
- Verfahren nach einem der Ansprüche 1 bis 6, worin die Feldemissionskathode aus einem die erste Substanz enthaltenen Material hergestellt ist, wobei das Verfahren weiterhin die Stufe umfaßt, das Material bei einer erhöhten Temperatur zu tempern, um wenigstens eines der folgenden Ergebnisse zu erhalten:Entfernen von anderen Substanzen als der ersten Substanz von dem Material;Normalisierung der Innenstruktur des Materials;Normalisierung der Oberflächenstruktur des Materials.
- Verfahren nach einem der Ansprüche 1 bis 7, wobei das Verfahren weiterhin folgende Stufe umfaßt:Zugabe einer zweiten Substanz mit einer niedrigeren Austrittsarbeit als die der ersten Substanz zur Emissionsfläche (2), um die elektrische Feldstärke zu verringern, die erforderlich ist, um Elektronenfeldemission von der Emissionsfläche (2) zu induzieren.
- Verfahren nach Anspruch 8 und einem der Ansprüche 2 bis 6, worin die Stufe der Zugabe und die Stufe des Präparierens durch Bestrahlungsbehandlung kombiniert sind zur Stufe der Bestrahlung der Emissionsfläche (2) mit Teilchen der zweiten Substanz.
- Verfahren nach einem der Ansprüche 1 bis 9, worin der wenigstens eine Körper ein Fasersegment (3) und die Emissionsfläche eine Endfläche (2) des Fasersegments (3) ist.
- Verfahren nach Anspruch 10, worin die Kathoden als Bündel (1) aus einer Mehrzahl der Fasersegmente (3) gebildet sind und worin irgendeine der Stufen des Verfahrens so angepaßt wird, daß sie eine Divergieren der Emissionsenden (2) der gebündelten Fasersegmente (1) bewirkt.
- Feldemissionskathode mit wenigstens einem Körper (3) aus einer elektrisch leitenden ersten Substanz mit wenigstens einer Emissionsfläche (2) mit wenigstens einer Irregularität (8), die für kontinuierliche Elektronenfeldemission geeignet ist, wobei die wenigstens eine Irregularität (8) abgerundet ist durch Erhitzen, so daß sie keine scharfe Spitze (11) zeigt.
- Feldemissionskathode nach Anspruch 12, worin die Emissionsfläche (2) eine zweite Substanz mit einer niedrigeren Austrittsarbeit als die der ersten Substanz enthält.
- Feldemissionskathode nach einem der Ansprüche 12 bis 13, worin die erste Substanz Kohlenstoff ist.
- Feldemissionskathode nach einem der Ansprüche 13 bis 14, worin die zweite Substanz Cäsium ist.
- Feldemissionsvorrichtung, welche aufweist:wenigstens eine Feldemissionskathode mit wenigstens einem Körper (3) aus einer elektrisch leitenden ersten Substanz mit wenigstens einer Emissionsfläche (2), wobei die Emissionsfläche (2) wenigstens eine Irregularität (8) hat, die für kontinuierliche Elektronenfeldemission geeignet ist und wobei die wenigstens eine Irregularität (8) durch Erhitzen abgerundet ist, so daß sie keine scharfe Spitze (11) zeigt,;eine Steuervorrichtung (12), die getrennt von der wenigstens einen Feldemissionskathode angeordnet ist;eine Anodenvorrichtung (13);eine Targetvorrichtung (14);eine evakuierte Kammer;wobei die Feldemissionskathode, die Steuervorrichtung (12); die Anodenvorrichtung (13) und die Targetvorrichtung (14) im wesentlichen in der evakuierten Kammer eingeschlossen sind;wobei die Feldemissionskathode, die Steuervorrichtung (12) und die Anode (13) jeweils mit einem ersten (C), einem zweiten (B) und einem dritten (A) Spannungspotential verbunden und geometrisch so angeordnet sind, daß Feldemission von Elektronen von der Feldemissionskathode auf die Targetvorrichtung (14) induziert wird.
- Feldemissionsvorrichtung nach Anspruch 16, worindie Targetvorrichtung (14) lumineszierend ist;die evakuierte Kammer lichtdurchlässig ist;Elektronen auf die lumineszierende Targetvorrichtung (14) emittiert werden, wodurch diese Licht aus der evakuierten Kammer nach außen emittiert.
- Feldemissionsvorrichtung nach einem der Ansprüche 16 bis 17, worin die Emissionsfläche (2) eine zweite Substanz mit einer niedrigeren Austrittsarbeit als die der ersten Substanz enthält.
- Verfahren nach einem der Ansprüche 1 bis 11, welches folgende Stufe aufweist:Durchführen der Modifizierungsstufe, um wenigstens eine Emissionsfläche (2) mit wenigstens einer Irregularität (8) so zu modifizieren, daß letzere einen Kurvenradius im Bereich von 0,1 bis 100 nm hat.
- Feldemissionskathode nach einem der Ansprüche 12 bis 15, worin die wenigstens eine Irregularität (8) einen Kurvenradius im Bereich von 0,1 bis 100 nm hat.
- Vorrichtung nach einem der Ansprüche 16 bis 18, worin die wenigstens eine Irregularität (8) einen Kurvenradius im Bereich von 0,1 bis 100 nm hat.
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US467825 | 1990-01-19 | ||
SE9500554 | 1995-02-15 | ||
SE9500554A SE504603C2 (sv) | 1995-02-15 | 1995-02-15 | Metod vid tillverkning av en fältemissionskatod samt fältemissionskatod |
US08/467,825 US5588893A (en) | 1995-06-06 | 1995-06-06 | Field emission cathode and methods in the production thereof |
PCT/SE1996/000209 WO1996025753A1 (en) | 1995-02-15 | 1996-02-15 | A field emission cathode and methods in the production thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0809854A1 EP0809854A1 (de) | 1997-12-03 |
EP0809854B1 true EP0809854B1 (de) | 2000-11-08 |
Family
ID=26662227
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP96903328A Expired - Lifetime EP0809854B1 (de) | 1995-02-15 | 1996-02-15 | Feldemissionskathode und herstellungsverfahren derselben |
Country Status (10)
Country | Link |
---|---|
EP (1) | EP0809854B1 (de) |
JP (1) | JP3299544B2 (de) |
CN (1) | CN1097836C (de) |
AT (1) | ATE197515T1 (de) |
AU (1) | AU689702B2 (de) |
CA (1) | CA2212681C (de) |
DE (1) | DE69610902T2 (de) |
ES (1) | ES2152513T3 (de) |
MX (1) | MX9706141A (de) |
WO (1) | WO1996025753A1 (de) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SE510413C2 (sv) * | 1997-06-13 | 1999-05-25 | Lightlab Ab | En fältemissionskatod och en ljuskälla innefattande en fältemissionskatod |
SE510412C2 (sv) * | 1997-06-13 | 1999-05-25 | Lightlab Ab | En ljuskälla innefattande en fältemissionskatod och en fältemissionskatod för användning i en ljuskälla |
US6054801A (en) * | 1998-02-27 | 2000-04-25 | Regents, University Of California | Field emission cathode fabricated from porous carbon foam material |
JP4131306B2 (ja) * | 1998-12-10 | 2008-08-13 | 昭和電工株式会社 | 電子放出素材 |
TW459260B (en) * | 1999-03-17 | 2001-10-11 | Matsushita Electric Ind Co Ltd | Electron emission element and image display apparatus utilizing the same |
AU5720900A (en) * | 1999-06-10 | 2001-01-02 | Lightlab Ab | Method of producing a field emission cathode, a field emission cathode and a light source |
JP2001185019A (ja) | 1999-12-27 | 2001-07-06 | Hitachi Powdered Metals Co Ltd | 電界放出型カソード、電子放出装置、及び電子放出装置の製造方法 |
FR2803944B1 (fr) * | 2000-01-14 | 2002-06-14 | Thomson Tubes Electroniques | Cathode generatrice d'electrons et son procede de fabrication |
JP3636154B2 (ja) * | 2002-03-27 | 2005-04-06 | ソニー株式会社 | 冷陰極電界電子放出素子及びその製造方法、並びに、冷陰極電界電子放出表示装置及びその製造方法 |
JP3907626B2 (ja) | 2003-01-28 | 2007-04-18 | キヤノン株式会社 | 電子源の製造方法、画像表示装置の製造方法、電子放出素子の製造方法、画像表示装置、特性調整方法、及び画像表示装置の特性調整方法 |
JP2007265639A (ja) * | 2006-03-27 | 2007-10-11 | Osaka Univ | 電子波干渉電子源とその製造方法およびそれを用いた素子 |
RU2598857C2 (ru) * | 2014-08-07 | 2016-09-27 | Публичное акционерное общество "Автоэмиссионные технологии" | Малогабаритная автоэмиссионная электронная пушка |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2810736A1 (de) * | 1978-03-13 | 1979-09-27 | Max Planck Gesellschaft | Feldemissionskathode sowie herstellungsverfahren und verwendung hierfuer |
US4728851A (en) * | 1982-01-08 | 1988-03-01 | Ford Motor Company | Field emitter device with gated memory |
-
1996
- 1996-02-15 CA CA002212681A patent/CA2212681C/en not_active Expired - Lifetime
- 1996-02-15 AT AT96903328T patent/ATE197515T1/de not_active IP Right Cessation
- 1996-02-15 ES ES96903328T patent/ES2152513T3/es not_active Expired - Lifetime
- 1996-02-15 EP EP96903328A patent/EP0809854B1/de not_active Expired - Lifetime
- 1996-02-15 JP JP52490096A patent/JP3299544B2/ja not_active Expired - Fee Related
- 1996-02-15 CN CN96191941A patent/CN1097836C/zh not_active Expired - Fee Related
- 1996-02-15 DE DE69610902T patent/DE69610902T2/de not_active Expired - Fee Related
- 1996-02-15 AU AU47372/96A patent/AU689702B2/en not_active Ceased
- 1996-02-15 WO PCT/SE1996/000209 patent/WO1996025753A1/en active IP Right Grant
-
1997
- 1997-08-12 MX MX9706141A patent/MX9706141A/es unknown
Also Published As
Publication number | Publication date |
---|---|
MX9706141A (es) | 1998-08-30 |
JPH11500259A (ja) | 1999-01-06 |
EP0809854A1 (de) | 1997-12-03 |
AU689702B2 (en) | 1998-04-02 |
DE69610902T2 (de) | 2001-04-19 |
JP3299544B2 (ja) | 2002-07-08 |
WO1996025753A1 (en) | 1996-08-22 |
AU4737296A (en) | 1996-09-04 |
CA2212681C (en) | 2001-12-11 |
CN1097836C (zh) | 2003-01-01 |
ATE197515T1 (de) | 2000-11-11 |
CN1174629A (zh) | 1998-02-25 |
DE69610902D1 (de) | 2000-12-14 |
CA2212681A1 (en) | 1996-08-22 |
ES2152513T3 (es) | 2001-02-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5973446A (en) | Field emission cathode and methods in the production thereof | |
EP0809854B1 (de) | Feldemissionskathode und herstellungsverfahren derselben | |
US6020677A (en) | Carbon cone and carbon whisker field emitters | |
US6780075B2 (en) | Method of fabricating nano-tube, method of manufacturing field-emission type cold cathode, and method of manufacturing display device | |
US5709577A (en) | Method of making field emission devices employing ultra-fine diamond particle emitters | |
US20020006489A1 (en) | Electron emitter, manufacturing method thereof and electron beam device | |
Zhao et al. | Field emission from screen-printed carbon nanotubes irradiated by tunable ultraviolet laser in different atmospheres | |
US8143774B2 (en) | Carbon based field emission cathode and method of manufacturing the same | |
AU747658B2 (en) | Field emission cathode fabricated from porous carbon foam material | |
RU2159478C2 (ru) | Способ изготовления катода с автоэлектронной эмиссией, катод с автоэлектронной эмиссией и устройство автоэлектронной эмиссии | |
JP4707336B2 (ja) | カーボンナノファイバーを用いた電子源の製造方法 | |
JP2002501284A (ja) | 電子放出材の製造のためのプラズマ処理法 | |
KR100550486B1 (ko) | 코팅된 와이어 형태의 이온 충격된 흑연 전자 방출체 | |
Zhao et al. | Researches on new photocathode for RF electron gun | |
JP2002022899A (ja) | 電子線照射装置 | |
Curren et al. | An effective secondary electron emission suppression treatment for copper MDC electrodes | |
JPH11106208A (ja) | カーボンナノチューブの回収方法 | |
Reynolds et al. | Electron field emission from Ar+ ion-treated thick-film carbon paste | |
Kwon | Effects on field emission characteristics of Ar ion bombardment for screen-printed carbon nanotube emitters | |
KR20200076641A (ko) | 그래핀 필름을 포함하는 냉음극 및 이를 이용한 전자총 | |
MXPA00008413A (es) | Catodo de emision por efecto de campo fabricado de material de espuma de carbon poroso |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 19970813 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT BE CH DE DK ES FR GB GR IE IT LI LU MC NL PT SE |
|
17Q | First examination report despatched |
Effective date: 19990127 |
|
GRAG | Despatch of communication of intention to grant |
Free format text: ORIGINAL CODE: EPIDOS AGRA |
|
17Q | First examination report despatched |
Effective date: 19990127 |
|
GRAG | Despatch of communication of intention to grant |
Free format text: ORIGINAL CODE: EPIDOS AGRA |
|
GRAH | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOS IGRA |
|
GRAH | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOS IGRA |
|
GRAG | Despatch of communication of intention to grant |
Free format text: ORIGINAL CODE: EPIDOS AGRA |
|
GRAH | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOS IGRA |
|
GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): AT BE CH DE DK ES FR GB GR IE IT LI LU MC NL PT SE |
|
REF | Corresponds to: |
Ref document number: 197515 Country of ref document: AT Date of ref document: 20001111 Kind code of ref document: T |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: EP |
|
ET | Fr: translation filed | ||
REG | Reference to a national code |
Ref country code: IE Ref legal event code: FG4D |
|
REF | Corresponds to: |
Ref document number: 69610902 Country of ref document: DE Date of ref document: 20001214 |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: NV Representative=s name: E. BLUM & CO. PATENTANWAELTE |
|
REG | Reference to a national code |
Ref country code: ES Ref legal event code: FG2A Ref document number: 2152513 Country of ref document: ES Kind code of ref document: T3 |
|
ITF | It: translation for a ep patent filed | ||
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: PT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20010208 Ref country code: DK Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20010208 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: GR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20010209 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LU Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20010215 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: MC Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20010228 |
|
PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
26N | No opposition filed | ||
REG | Reference to a national code |
Ref country code: GB Ref legal event code: IF02 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: CH Payment date: 20030212 Year of fee payment: 8 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: IE Payment date: 20030221 Year of fee payment: 8 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: BE Payment date: 20030224 Year of fee payment: 8 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: AT Payment date: 20030225 Year of fee payment: 8 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: GB Payment date: 20040123 Year of fee payment: 9 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: FR Payment date: 20040130 Year of fee payment: 9 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: AT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20040215 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20040216 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: BE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20040228 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LI Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20040229 Ref country code: CH Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20040229 |
|
BERE | Be: lapsed |
Owner name: *LIGHTLAB A.B. Effective date: 20040228 |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: PL |
|
REG | Reference to a national code |
Ref country code: IE Ref legal event code: MM4A |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: GB Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20050215 |
|
GBPC | Gb: european patent ceased through non-payment of renewal fee |
Effective date: 20050215 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: FR Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20051031 |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: ST Effective date: 20051031 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: NL Payment date: 20090220 Year of fee payment: 14 Ref country code: DE Payment date: 20090226 Year of fee payment: 14 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: IT Payment date: 20090221 Year of fee payment: 14 |
|
REG | Reference to a national code |
Ref country code: NL Ref legal event code: V1 Effective date: 20100901 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: NL Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20100901 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: DE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20100901 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20100215 |
|
REG | Reference to a national code |
Ref country code: ES Ref legal event code: PC2A Owner name: LIGHTLAB SWEDEN AB Effective date: 20110525 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: ES Payment date: 20150224 Year of fee payment: 20 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: SE Payment date: 20150223 Year of fee payment: 20 |
|
REG | Reference to a national code |
Ref country code: SE Ref legal event code: EUG |
|
REG | Reference to a national code |
Ref country code: ES Ref legal event code: FD2A Effective date: 20160526 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: ES Free format text: LAPSE BECAUSE OF EXPIRATION OF PROTECTION Effective date: 20160216 |