Classifications

• • C—CHEMISTRY; METALLURGY
  • C07—ORGANIC CHEMISTRY
  • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
  • C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
  • C07C271/06—Esters of carbamic acids
  • C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
  • C07C271/10—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms
  • C07C271/20—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms to carbon atoms of hydrocarbon radicals substituted by nitrogen atoms not being part of nitro or nitroso groups
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/004—Photosensitive materials
  • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
  • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
  • Y10S430/1055—Radiation sensitive composition or product or process of making
  • Y10S430/114—Initiator containing
  • Y10S430/124—Carbonyl compound containing
  • Y10S430/125—Carbonyl in heterocyclic compound
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
  • Y10S430/148—Light sensitive titanium compound containing

Definitions

• the present invention relates to a novel urethane compound having polymerizable unsaturated groups, a photopolymerizable composition containing it and photosensitive lithographic printing plate. More particularly, it relates to a urethane compound which, when incorporated in a photopolymerizable composition as an unsaturated group-containing monomer component, is capable of improving the properties of the composition such as the sensitivity, adhesion to a substrate and storage stability, a photopolymerizable composition employing it and a photosensitive lithographic printing plate.
• the present invention is intended to provide a polymerizable compound which is capable of presenting a photopolymerizable composition excellent in all of the sensitivity, adhesion to a substrate and a developability, when used as a polymerizable monomer contained in the photopolymerizable composition, and a photopolymerizable composition and a photosensitive lithographic printing plate employing it.
• Another object of the present invention is to provide a photopolymerizable monomer consisting of the novel urethane compound.
• a further object of the present invention is to provide a photopolymerizable monomer and a photopolymerizable composition which is highly sensitive to visible light and which is excellent in the storage stability.
• Another object of the present invention is to provide a photopolymerizable composition which is highly sensitive to visible light and which is excellent in the storage stability and adhesion to a substrate.
• Another object of the present invention is to provide a photosensitive lithographic printing plate which is excellent in the balance of the sensitivity and the developability.
• Still another object of the present invention is to provide a photosensitive lithographic printing plate which is excellent in all of the sensitivity, storage stability, printing resistance and developability.
• X is a C 1-20 alkylene group which may be branched
• R 1 is a group of
• the unsaturated group-containing urethane compound of the present invention is represented by the above formula (I).
• X is a C 1-20 alkylene group which may be branched, preferably a C 2-12 alkylene group, more preferably a C 4-10 alkylene group.
• Y is a C 1-6 alkylene group which may be branched, preferably a C 1-2 alkylene group.
• the unsaturated group-containing urethane compound of the formula (I) can be prepared in accordance with a known method by a reaction of an organic diisocyanate with a reaction product of the corresponding alicyclic epoxy group-containing acrylate or methacrylate with acrylic acid or methacrylic acid, as shown by the following reaction scheme.
• R 2 , R 3 and Y are as defined above.
• the reaction of the above first stage can be carried out at a temperature of from 70 to 100°C in the presence or absence of a solvent using as a catalyst a quaternary ammonium salt such as a tetramethylammonium chloride or benzyltriethylammonium chloride.
• the reaction of the second stage can be carried out at a temperature of from 60 to 80°C in an organic solvent such as toluene, benzene or butanone, using as a catalyst an organic metal such as di-butyltin dilaurate.
• the compound of the present invention is usually obtainable as a mixture of a compound of the formula (I) wherein R 1 is a group of the formula (A) and a compound of the formula (I) wherein R 1 is a group of the formula (B). These compounds may be used in the form of the mixture or after being separated.
• organic diisocyanate to be used in the present invention various diisocyanates may be mentioned, such as hexamethylene diisocyanate and trimethylhexamethylene diisocyanate.
• the compound of the formula (I) of the present invention is useful as a polymerizable monomer for a photopolymerizable composition. Now, the photopolymerizable composition of the present invention will be described.
• the photopolymerizable composition of the present invention is characterized in that it contains an urethane compound of the formula (I) as a polymerizable unsaturated group-containing compound (c).
• an urethane compound of the formula (I) as a polymerizable unsaturated group-containing compound (c).
• the reason why the urethane compound of the present invention exhibits excellent effects, is not clearly understood.
• use of the urethane compound of the present invention is advantageous over the use of other urethane compounds at least with respect to the sensitivity. Further, printing resistance and storage stability will be thereby improved.
• the content is not particularly limited, but is usually preferably within a range of from 20 to 80 wt%, more preferably from 30 to 70 wt%, based in the total weight of the polymerizable unsaturated group-containing compounds.
• the polymerizable unsaturated group-containing compounds other than the compound of the formula (I) of the present invention may, for example, be an unsaturated carboxylic acid; an ester of an aliphatic polyhydroxy compound with an unsaturated carboxylic acid; an ester of an aromatic polyhydroxy compound with an unsaturated carboxylic acid; an ester obtainable by an esterification reaction of an unsaturated carboxylic acid and a polybasic carboxylic acid with a polyhydric hydroxy compound such as the above-mentioned aliphatic polyhydroxy compound or an aromatic polyhydroxy compound; or an ester obtainable by an esterification reaction of an unsaturated carboxylic acid with an aliphatic polyhydroxy compound and an aromatic polyhydroxy compound.
• the unsaturated caboxylic acid may, for example, be acrylic acid or methacrylic acid.
• ester of an aliphatic polyhydroxy compound with an unsaturated carboxylic acid is not particularly limited, and may, for example, be an acrylic acid ester such as ethylene glycol diacrylate, triethylene glycol diacrylate, trimethylol propane triacrylate, trimethylol ethane triacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate or glycerol acrylate, a methacrylic acid ester having "acrylate" in these illustrated compounds substituted by "methacrylate”, an itaconic acid ester likewise substituted by "itaconate”, a crotonic acid ester likewise substituted by "crotonate”, or a maleic acid ester
• the ester of an aromatic polyhydroxy compound with an unsaturated carboxylic acid may, for example, be hydroquinone diacrylate, hydroquinone dimethacrylate, resorcinol diacrylate, resorcinol dimethacrylate or pyrogallol triacrylate.
• the ester obtainable by the esterification reaction of an unsaturated carboxylic acid and a polybasic carboxylic acid with a polyhydric hydroxy compound may not necessarily be a single substance.
• Typical examples include a condensation product of acrylic acid, phthalic acid and ethylene glycol, a condensation product of acrylic acid, maleic acid and diethylene glycol, a condensation product of methacrylic acid, terephthalic acid and pentaerythritol, and a condensation product of acrylic acid, adipic acid, butane diol and glycerol.
• the ester obtainable by the esterification reaction of an unsaturated caboxylic acid with an aliphatic polyhydroxy compound and an aromatic polyhydroxy compound may be an ester compound obtained by reacting two molecules of (meth)acrylic acid to a diol compound, preferably an ester compound obtained by reacting a bisphenol compound or its derivative and two molecules of an aromatic polyhydroxy compound with (meth)acrylic acid.
• each of R 4 and R 5 is an alkylene group which may be branched
• each of R 6 and R 7 is a hydrogen atom, an alkyl group which may be substituted, a cycloalkyl group which may be substituted, or a phenyl group which may be substituted
• More preferred is the one wherein p+q 2 to 4 .
• Specific examples include 2,2-bis[4-(acryloxydiethoxy)phenyl]propane (A-BPE-4, tradename, manufactured by Shin Nakamura Kagaku Kogyo K.K.), 2,2-bis[4-(methacryloxyethoxy)phenyl]propane (BPE-100, tradename, manufactured by Shin Nakamura Kagaku Kogyo K.K.), and 2,2-bis[4-(methacryloxydiethoxy)phenyl]propane (BPE-200, tradename, manufactured by Shin Nakamura Kagaku Kogyo K.K.).
• the photopolymerization initiator (b) as an essential component of the photopolymerizable composition of the present invention will be described.
• any initiator may be employed so long as it is capable of initiating polymerization of the above-mentioned polymerizable unsaturated group-containing compounds.
• the one having a photosensitivity to visible rays can suitably be employed.
• an active agent which forms active radicals by some action with a sensitizer excited by light a hexaarylbiimidazole, a titanocene compound, a halogenated hydrocarbon derivative, a diaryliodonium salt, or an organic peroxide may, for example, be mentioned.
• a system employing a hexaarylbiimidazole or a titanocene compound is preferred, since the sensitivity, storage stability, adhesion of the coating film to a substrate, etc. are thereby good.
• hexaarylbiimidazole various types may be employed, including, for example, 2,2'-bis(o-chlorophenyl)-4,4',5,5'-tetra(p-carboethoxyphenyl)biimidazole, 2,2'-bis(o-chlorophenyl)-4,4',5,5'-tetra(p-carbomethoxyphenyl)biimidazole, 2,2'-bis(o-chlorophenyl)-4,4',5,5'-tetra(p-carbofluorophenyl)biimidazole, 2,2'-bis(o-bromophenyl)-4,4',5,5'-tetra(p-iodophenyl)biimidazole, 2,2'-bis(o-chlorophenyl)-4,4',5,5'-tetra(p-chloronaphthyl)biimid
• hexaarylbiimidazoles may be used with other biimidazoles, as the case requires.
• Biimidazoles can easily be prepared, for example, by the methods disclosed in Bull. Chem. Soc. Japan, 33, 565 (1960) and J. Org. Chem, 36[16]2262 (1971).
• titanocene compound various types may be employed. For example, it may be suitably selected for use among various titanocene compounds disclosed in Japanese Unexamined Patent Publications No. 152396/1984 and No. 151197/1986. More specifically, it may, for example, be dicyclopentadienyl-Ti-dichloride, dicyclopentadienyl-Ti-bisphenyl, dicyclopentadienyl-Ti-bis-2,3,4,5,6-pentafluorophen-1-yl, dicyclopentadienyl-Ti-bis-2,3,5,6-tetrafluorophen-1-yl, dicylcopentadienyl-Ti-bis-2,4,6-trifluorophen-1-yl, dicyclopentadienyl-Ti-bis-2,6-difluorophen-1-yl, dicyclopentadienyl-Ti-bis-2,4-difluorophen
• the sensitizer in the photopolymerization initiator is a compound which is capable of effectively generating active radicals under irradiation with visible light rays when it is coexistent with the above described active agent.
• Typical examples of such a sensitizer include a triphenylmethane-type leuco dye such as leuco crystal violet or leuco malachite green, and a photo-reducible dye such as erythrocin or eosine Y, as disclosed in e.g. U.S. Patent 3,479,185, an aminophenylketone such as Michler's ketone or aminostyrylketone as disclosed in e.g. U.S. Patents 3,549,367 and 3,652,275, ⁇ -diketones as disclosed in U.S. Patent 3,844,790, indanones as disclosed in U.S. Patent 4,162,162, ketocumarins as disclosed in Japanese Unexamined Patent Publication No.
• a triphenylmethane-type leuco dye such as leuco crystal violet or leuco malachite green
• a photo-reducible dye such as erythrocin or eosine Y
• a coumarin compound of the following formula (III) can suitably be used: wherein each of R 8 , R 9 and R 12 is a hydrogen atom, a halogen atom, an alkyl group or an alkoxy group, each of R 10 and R 11 is an alkyl group. Otherwise, at least one set of R 10 and R 9 , and R 11 and R 12 , or R 10 and R 11 , may link to each other to form a substituted or unsubstituted alkylene group.
• R 13 is a hydrogen atom, an alkyl group, an acyl group, a cyano group, a carboxyl group or a group of an ester derivative or amide derivative thereof, and R 14 is a heterocyclic residue having a total number of carbon atoms of from 3 to 17.
• Such a coumarin compound can be prepared by a conventional method, for example, by a condensation reaction of an acetic acid ester having a heterocyclic residue with a p-substituted aminosalicyl aldehyde.
• each of R 8 , R 9 and R 12 is a hydrogen atom, a halogen atom, an alkyl group or an alkoxy group, preferably a chorine atom, a bromine atom, an iodine atom, a lower alkyl group or a lower alkoxy group, more preferably a hydrogen atom or a C 1-4 alkyl group.
• Each of R 10 and R 11 is an alkyl group, preferably a C 1-16 alkyl group which may be branched. Otherwise, at least one set of R 10 and R 9 , and R 11 and R 12 , or R 10 and R 11 , may link to each other to form a substituted or unsubstituted alkylene group.
• R 10 and R 9 , or R 11 and R 12 link to each other to form an alkylene group
• such an alkylene group preferably has a carbon number of from 1 to 5.
• R 10 and R 11 link to each other to form an alkylene group such an alkylene group preferably has a carbon number of from 3 to 7.
• the substituent may, for example, be an alkyl group, an alkoxy group, a halogen atom, an aryl group, an acyl group or a carboxyl group.
• R 13 is a hydrogen atom, an alkyl group, an acyl group, a cyano group, a carboxyl group or an ester derivative or amide derivative thereof.
• R 14 is a heterocyclic residue having a total number of carbon atoms of from 3 to 17, preferably a nitrogen-containing aromatic heterocyclic residue, more preferably a condensed ring type nitrogen-containing aromatic heterocyclic residue having a total number of carbon atoms of from 3 to 11.
• a coumarin compound of the following formula (IV) is used. wherein each of R 10 and R 11 which are independent of each other, is a C 1-16 alkyl group which may be branched, or they link to each other to form a C 3-7 alkylene group, and R 14 is a heterocyclic residue having a total number of carbon atoms of from 3 to 17.
• substituent represented by R 10 and R 11 include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a s-butyl group, an isobutyl group, a t-butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a methylpentyl group, a methylhexyl group, an ethylhexyl group and an ethyloxyl group.
• substituent represented by R 14 include a thiazolyl group, an oxazolyl group, an imidazolyl group, a benzthiazolyl group, a benzoxazolyl group, and a benzimidazolyl group.
• a photopolymerization initiator preferably employed in the present invention is a combination of the above-mentioned titanocene compound and the coumarin compound. Use of such a combination is particularly advantageous from the viewpoint of the storage stability. Further, such a combination is highly sensitive particularly to visible light.
• it may, for example, be a homopolymer or copolymer of (meth)acrylic acid, an ester thereof, maleic acid, acrylonitrile, styrene, vinyl acetate or vinylidene chloride, or polyethylene oxide, polyvinylpyrrolidone, polyamide, polyurethane, polyethylene terephthalate, acetylcellulose or polyvinyl butyral.
• a copolymer containing (meth)acrylic acid and a C 1-6 alkyl ester of (meth)acrylic acid as copolymer components may be mentioned.
• the weight average molecular weight of the polymer binder is usually from 10,000 to 500,000.
• a copolymer having the following compound (V) and/or (VI) further incorporated as a copolymer component to such a copolymer: wherein R 15 is a hydrogen atom or a methyl group, and n is an integer of from 3 to 10. wherein R 16 is a hydrogen atom or a methyl group, and Ar is a phenyl group which may have a substituent.
• the sensitizer is preferably from 0.01 to 20 parts by weight, more preferably from 0.05 to 10 parts by weight
• the active agent is preferably from 0.1 to 80 parts by weight, more preferably from 0.5 to 50 parts by weight
• the polymer binder is preferably from 10 to 400 parts by weight, more preferably from 20 to 200 parts by weight.
• the photopolymerizable composition of the present invention may contain, in addition to the above-described constituting components, other materials depending upon the particular purpose.
• a heat polymerization preventing agent such as hydroquinone, p-methoxyphenol or 2,6-di-t-butyl-p-cresol
• a coloring agent composed of an organic or inorganic dye or pigment
• a plasticizer such as dioctyl phthalate, didodecyl phthalate or tricresyl phosphate
• a sensitivity-improving agent such as a tertiary amine or thiol
• other additives such as a colorant precursor
• Preferred amounts of the above-mentioned various additives are such that relative to 100 parts by weight of the polymerizable unsaturated group-containing compounds, the heat polymerization preventing agent is at most 2 parts by weight, the coloring agent is at most 20 parts by weight, the plasticizer is at most 40 parts by weight, and the colorant precursor is at most 30 parts by weight.
• the above-described photopolymerizable composition will be coated, without any solvent or as diluted with a suitable solvent, on a support of e.g. plastic, paper or metal, followed by drying to form a photosensitive layer.
• a support e.g. plastic, paper or metal
• an aluminum support having surface roughening and then anodizing treatment applied, may suitably be employed.
• a mechanical method or an electrolytic etching method may, for example, be mentioned.
• the mechanical method may, for example, be a ball polishing method, a brush polishing method, a liquid horning polishing method, or a buff polishing method.
• the above-mentioned various methods may be used alone or in combination.
• the electrolytic etching is carried out in a bath containing one or more of inorganic acids such as phosphoric acid, sulfuric acid, hydrochloric acid and nitric acid.
• desmatte treatment is carried out by means of an aqueous alkaline or acidic solution for neutralization, as the case requires, followed by washing with water.
• the anodizing treatment is carried out by electrolysis using an aluminum plate as an anode and a solution containing one or more acids such as sulfuric acid, chromic acid, oxalic acid, phosphoric acid and malonic acid, as an electrolyte.
• the amount of the formed anodized film is usually from 1 to 50 mg/dm 2 .
• the pore-sealing treatment may, for example, be boiling water treatment, steam treatment, sodium silicate treatment or treatment with an aqueous dichromate solution.
• a conventional method such as dip coating, rod coating, spin coating, spray coating or roll coating, may be employed.
• an oxygen-shielding layer may be formed on the photosensitive layer to prevent the polymerization inhibition action by oxygen.
• a layer may, for example, be made of a water-soluble polymer such as polyvinyl alcohol, polyvinyl pyrrolidone, polyethylene oxide or cellulose. Among them, polyvinyl alcohol having an oxygen gas barrier property is particularly preferred.
• the light source for exposure applicable to the composition of the present invention is not particularly limited.
• carbon arc, a high pressure mercury lamp, a xenon lamp, a metal halide lamp, a fluorescent lamp, a tungsten lamp, a halogen lamp, a helium cadmium laser, an argon ion layer, a YAG laser or a helium neon layer may, for example, be particularly suitably used.
• the photopolymerizable composition of the present invention is capable of forming an image on the support, if image exposure is carried out with such a light source, followed by development by means of, for example, an aqueous solution containing a surfactant and an alkali.
• an aqueous solution may further contain an organic solvent, a buffering agent, a dye or a pigment.
• a suitable alkali agent may, for example, be an inorganic alkali agent such as sodium silicate, potassium silicate, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium tertiary phosphate, sodium secondary phosphate, sodium carbonate, potassium carbonate or sodium hydrogencarbonate, or an organic amine compound such as trimethylamine, diethylamine, monoisopropylamine, n-butylamine, monoethanolamine, diethanolamine or triethanolamine. These compounds may be used alone or in a proper combination.
• an inorganic alkali agent such as sodium silicate, potassium silicate, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium tertiary phosphate, sodium secondary phosphate, sodium carbonate, potassium carbonate or sodium hydrogencarbonate
• an organic amine compound such as trimethylamine, diethylamine, monoisopropylamine, n-butylamine, monoethanolamine, diethanolamine or triethanolamine.
• the surfactant may, for example, be a nonionic surfactant such as polyoxyethylenealkylethers, polyoxyethylenealkylallylethers, polyoxyethylenealkylesters, sorbitanalkylesters or monoglyceridealkylesters, an anionic surfactant such as alkylbenzene sulfonates, alkylnaphthalene sulfonates, alkyl sulfates, alkyl sulfonates or sulfosuccinates, or an amphoteric surfactant such as alkylbetaines or amines.
• a nonionic surfactant such as polyoxyethylenealkylethers, polyoxyethylenealkylallylethers, polyoxyethylenealkylesters, sorbitanalkylesters or monoglyceridealkylesters
• an anionic surfactant such as alkylbenzene sulfonates, alkylnaphthalene sulfonates, alkyl
• organic solvent isopropyl alcohol, benzyl alcohol, ethyl cellosolve, butyl cellosolve, phenyl cellosolve, propylene glycol or diacetone alcohol, may, for example, be incorporated, as the case requires.
• a mixture comprising 8.4 g of hexamethylene diisocyanate, 15 g of toluene, 10 mg of di-n-butyltin dilaurate and 0.1 g of p-methoxyphenol, was heated to 65°C, and then 30 g of the slightly yellow oil obtained as described above, was dropwise added thereto over a period of about 2 hours. The mixture was stirred under heating for one hour, and then 0.7 ml of methanol was added. The mixture was further stirred under heating for one hour to obtain a mixture of compounds of the following structures. The obtained solution of urethane compounds was used by itself for preparation of a coating liquid of a photopolymerizable composition.
• An aluminum plate was decreased with 3% sodium hydroxide and then subjected to electrolytic etching treatment in a 11.5 g/l hydrochloric acid bath at 25°C at a current density of 80 A/dm 2 for 11 seconds. Then, it was washed with water and then anodized in a 30% sulfuric acid bath at 30°C at a current density of 11.5 A/dm 2 for 15 seconds. Then, it was treated with a 1% sodium orthosilicate aqueous solution at 85°C for 30 seconds, then washed with water and dried, to obtain an aluminum plate for a lithographic printing plate.
• the following photopolymerizable composition coating liquid was coated on the aluminum plate by means of a bar coater so that the dried film thickness would be 2 g/m 2 and dried. Further, an aqueous polyvinyl alcohol solution was coated thereon by means of a bar coater so that the dried film thickness would be 3 g/m 2 , and dried to obtain a photosensitive lithographic printing plate.
• the photosensitive lithographic printing plate was evaluated with respect of the following evaluation items. The results are shown in Table 1.
• the photosensitive lithographic printing plate was exposed by means of a diffraction spectral irradiation apparatus (RM-23, manufactured by Narumi K.K.) and then developed with a developing solution prepared by diluting a developer stock solution comprising 20 wt% of potassium hydroxide, 75 wt% of potassium silicate and 5 wt% of sodium alkylnaphthalene sulfonate (Perex NBL, tradename, manufactured by Kao Corporation), five times with water (i.e. the plate was dipped in the developing solution at 25°C for 30 seconds and then rubbed 5 times with sponge). From the height of the cured image thereby obtained, the light energy required for the photocuring by light rays with a wavelength of 488 nm, was determined.
• a developing solution prepared by diluting a developer stock solution comprising 20 wt% of potassium hydroxide, 75 wt% of potassium silicate and 5 wt% of sodium alkylnaphthalene sulf
• Symbol ⁇ indicates that the ink did not attach at all to the non-image portion
• symbol ⁇ indicates that the ink slightly attached along the fringe of the dropped methylcellosolve
• symbol X indicates that the ink attached to the entire area of the non-image portion.
• the adhesion was evaluated by printing resistance of a photosensitive lithographic printing plate. Specifically, scanning exposure was carried out with an exposure of 100 ⁇ j/cm 2 by an air-cooled argon ion laser of 75 mW, followed by development with the above-mentioned developing solution. The obtained printing plate was subjected to printing by a "Heidelberger GTO" printing machine, whereby the number of printed sheets until the image-portion (120 lines, 4% of small dots) started to scatter, was counted.
• a photopolymerizable composition coating liquid was prepared and evaluated in the same manner as in Example 2 except that "urethane compounds of Example 1" in photopolymerizable composition coating liquid-1 was changed to a urethane compound UA-306H (manufactured by Shin Nakamura Kagaku Kogyo K.K.) having a structure as identified below.
• a photopolymerizable composition coating liquid was prepared and evaluated in the same manner as in Example 1 except that "urethane compounds of Example 1" in photopolymerizable composition coating liquid-1 was changed to a urethane compound U-4HA (manufactured by Shin Nakamura Kagaku Kogyo K.K.) having a structure as identified below. The results are shown in Table 1.
• Example 3 Sensitivity ( ⁇ j/cm 2 ) 100 200 100 80 Storage stability ⁇ ⁇ X ⁇ Printing resistance ( ⁇ 10,000 sheets) 5.0 1.0 3.0 5.0
• the unsaturated group-containing urethane compound of the present invention is useful as a polymerizable monomer for a photopolymerizable composition, and a photopolymerizable composition of the present invention is excellent, when it is used for a photosensitive lithographic printing plate, in all of the sensitivity, storage stability and printing resistance (adhesion to the support), and thus is very useful.

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• Spectroscopy & Molecular Physics (AREA)
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• Photosensitive Polymer And Photoresist Processing (AREA)
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• 1996
  • 1996-09-12 EP EP96114650A patent/EP0763779A3/de not_active Ceased
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