EP0741402A2 - Tubes à décharge électrique ou lampes à décharge électrique, écran plat d'affichage, cathode à basse température et leur procédé de fabrication - Google Patents
Tubes à décharge électrique ou lampes à décharge électrique, écran plat d'affichage, cathode à basse température et leur procédé de fabrication Download PDFInfo
- Publication number
- EP0741402A2 EP0741402A2 EP96201180A EP96201180A EP0741402A2 EP 0741402 A2 EP0741402 A2 EP 0741402A2 EP 96201180 A EP96201180 A EP 96201180A EP 96201180 A EP96201180 A EP 96201180A EP 0741402 A2 EP0741402 A2 EP 0741402A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- low
- temperature
- cover layer
- holder
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/04—Electrodes; Screens; Shields
- H01J61/06—Main electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/30—Cold cathodes, e.g. field-emissive cathode
- H01J1/304—Field-emissive cathodes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/902—Specified use of nanostructure
- Y10S977/932—Specified use of nanostructure for electronic or optoelectronic application
- Y10S977/939—Electron emitter, e.g. spindt emitter tip coated with nanoparticles
Definitions
- the invention relates to an electric discharge tube or discharge lamp with one or more low-temperature cathodes, a flat screen with one or more low-temperature cathodes, a low-temperature cathode and a method for producing the low-temperature cathode.
- the present invention relates, inter alia, to flat screens with active systems in which the screen does not work with the light of the surroundings like the liquid crystal screens, but rather lights up itself. These include the plasma screen and the flat tube.
- Flat screens were developed for the three market segments of office automation, audio / video technology as well as navigation and entertainment.
- the mobile applications are particularly noteworthy, from notebook computers, personal digital assistants, fax machines to mobiles phone.
- the flat screens should not only be used in camcorders, but also in television sets and monitors.
- the third area includes flat screens as monitors for navigation systems in cars and planes, but also the displays of game consoles.
- the large space requirement of the Braun tube is a disadvantage. It is caused by the fact that all electrons are provided from a single cathode and are brought to the desired position on the luminescent screen via deflection units and are thus responsible for all the pixels.
- the cathodes of these conventional cathode ray tubes are hot cathodes ("thermionic cathodes"). Electron beam generation is based on glow emission.
- the conventional heatable cathode is e.g. made of a nickel tube, on the front side of which a particularly light electron-emitting oxide layer, e.g. made of barium oxide.
- the insulated heating wire embedded in the nickel tube brings the cathode to about 1200 Kelvin (900 ° C) so that electrons are "evaporated" from the oxide layer into the vacuum of the tube.
- the electrons are generated in several wire cathodes, flat ribbon cathodes or in flat field emitters. Each cathode is therefore only responsible for a few pixels.
- cathodes are a key technology for all types of flat screens. Considerable efforts have already been made to adapt cathodes adapted to flat screen technology and new cathodes; to develop materials.
- the extended wire cathodes, flat ribbon cathodes or flat cathodes that are used in flat screens can be operated with significantly lower emissions than the conventional point cathode. Since it is a disadvantage of conventional hot cathodes that the high cathode temperature has to be kept constant and the heating system also consumes energy, one of these developments relates to the production of cold cathodes.
- Another aspect of the invention relates to a flat screen with an improved cathode and an improved cathode.
- an electrical discharge tube or discharge lamp with one or more low-temperature cathodes which have a holder, optionally with heating or cooling, a conductive lower layer applied to the holder, optionally a substrate with dispensing material and a cover layer with a nanostructure made of ultrafine particles , wherein the cover layer has a surface layer composed of an emitter complex formed from an emission material with several components.
- Discharge tubes or discharge lamps of this type are distinguished by high reliability and a long service life under normal load.
- the emission is stable, this favors a constant image quality over the entire life of the discharge lamp or discharge tube.
- the discharge tubes or discharge lamps according to the invention have short switching times and offer the advantage that their construction is simplified and their energy consumption is low.
- a preferred embodiment of the discharge tubes or discharge lamps according to the invention is characterized in that it comprises a grid control electrode.
- a flat screen according to the invention contains one or more low-temperature cathodes which have a holder, optionally with heating or cooling, a conductive lower layer applied to the holder, optionally a substrate with dispensing material and a cover layer with a nanostructure made of ultrafine particles, the cover layer being a surface layer made of an emitter complex formed from an emission material with several components.
- a flat panel display according to the invention is easy to manufacture since no submicron lithography is required for the production. It has a low energy consumption, it is brighter and can be operated within a wide temperature range from -30 ° C to 100 ° C. It has a very good resolution and is suitable for black and white screens and color screens.
- a low-temperature cathode according to the invention is composed of a holder, optionally with heating or cooling, a conductive lower layer applied to the holder, optionally a substrate with dispensing material and a cover layer with a nanostructure made of ultrafine particles, the cover layer consisting of a surface layer Has emission material with multiple components formed emitter complex.
- the low-temperature cathode is characterized in that it is prepared for an operating temperature between 20 ° C and 500 ° C.
- the low-temperature cathode according to the invention can be used on the one hand as a real cold cathode and is particularly well suited as a cold controllable electron emitter for flat displays.
- the threshold field strength can be reduced to almost zero.
- the current density of 0.1 A / cm 2 required for line cathodes is already achieved.
- the emission material contains a first component which contains metals, in particular refractory metals and their alloys, a second component which contains scandium, yttrium, lathan, the lanthanides or actinides, and / or their compounds, in particular their oxides and / or a third component which contains alkaline earths and / or their compounds.
- An emitter complex with a particularly low work function arises from these components during the formation.
- the emission material comprises tungsten as the first component, oxidic compounds of scandium as the second component and oxidic compounds of barium as the third component.
- the components of the emission material are contained individually or together in the underlayer and / or the substrate and / or the top layer. In this way, a reservoir of emission material can be made available to form the emitter complex.
- the formed emitter complex have a work function ⁇ 2.8 eV.
- a low-temperature cathode shows particular advantages, which is characterized in that the ultrafine particles have a grain size of 1 to 100 nm. They are particularly well suited as field emitters because they have surface structures and surface modulations made of particles in the diameter range from 1 to 100 nm, that is to say they have relatively small radii of curvature in dense particle and tip distribution on the macroscopic surface.
- the nanostructure of the cover layer is nanocrystalline or nanoamorphic and possibly nanoporous, and the structure size is 1 to 1000 nm.
- Another object of the invention is to provide a production method for the low-temperature cathodes according to the invention.
- this object is achieved by a method in which, in a first step, a preform with a holder, with a conductive lower layer applied to the holder, optionally with a substrate with dispensing material and with a cover layer with a nanostructure made of ultrafine particles, and which Contains components of the emission material individually or together in the underlayer and / or the substrate and / or the top layer, is produced and in a second step the emitter complex is formed as a surface layer on the top layer.
- This method gives very uniformly emitting low-temperature cathodes, the emission properties of which, in particular the cold emission, scatters little.
- the formation is carried out at a temperature 800 800 ° C. in an ultra-high vacuum or high vacuum with a residual gas pressure and with the application of an electric field.
- the residual gas pressure is 10 10 -4 mbar and the residual gas contains noble gases, nitrogen, hydrogen and / or oxygen, each with a partial pressure of 10 10 -5 mbar.
- a method is also preferred in which the formation is carried out by a sintering treatment at a temperature> 500 ° C. and under vacuum or in a gas atmosphere which contains noble gases, nitrogen, hydrogen and / or oxygen.
- the top layer with a nanostructure be made from ultrafine particles by laser ablation deposition.
- the laser ablation deposition be carried out under negative pressure. This results in a particularly thin and even top layer.
- Fig. 1 shows the current-voltage characteristics of a low-temperature cathode according to the invention at 300 ° C, 200 ° C and room temperature.
- An electric discharge tube or discharge lamp consists of four functional groups, electron beam generation, beam focusing, beam deflection and the fluorescent screen.
- the electron beam generation system of the discharge tubes or discharge lamps according to the invention contains an arrangement of one or more low-temperature cathodes.
- the electron steel production system can be a point cathode or a system made up of one or more wire cathodes, flat ribbon cathodes or surface cathodes. Wire cathodes, ribbon cathodes and surface cathodes do not have to be activated over their entire surface, they can also contain the active cover layer only in individual surface segments.
- the electron gun can also contain a grid control electrode, via which one of several of the low-temperature cathodes according to the invention or one or more surface segments of a low-temperature cathode can be controlled.
- An electric field strength E with values of 5 V / ⁇ ⁇ E ⁇ 15 V / ⁇ m is applied via this grid control electrode and the emission of these segments or individual cathodes is controlled by changing the field strength.
- a flat panel display according to the invention can be a modified cathode ray tube, a flat panel tube, or a modification thereof, the field emitter display.
- the invention particularly relates to a field emitter display.
- Field emitter displays are a modification of the cathode ray tubes. Both use a high-energy electron beam to activate light-emitting phosphors and create an image.
- a single electron beam from each of the three rather large electron guns - one for each color - scans each of the many picture elements (pixels) one after the other.
- the electron generation system of a field emitter display provides countless small electron sources, one for each pixel.
- the field emitter display according to the invention can thus have the following structure: Two glass plates, an anode plate and a cathode plate are separated by spacers.
- the cathode plate has metallic conductive strips which are covered with a thin layer of cold cathode material according to the invention.
- the anode plate has similar strips which have a transparent conductor, for example made of doped tin oxide, as the base layer and a layer with a phosphor as the cover layer.
- the anode plate and the cathode plate are connected to one another with spacers, the cathode and anode strips being rotated through 90 ° relative to one another and facing one another.
- the two plates are connected in a vacuum-tight manner.
- An electronic circuit is attached on the outside, which allows each strip to be controlled independently.
- the principle of this embodiment is that of a matrix-controlled diode.
- the flat screen according to the invention can be a flat tube which contains a series of linear wire cathodes from which a beam of rays is generated, each individual beam being assigned to a small rectangular area of the screen.
- the low-temperature cathodes according to the invention can be point cathodes or wire cathodes according to their design. Particularly advantageous properties are achieved, however, if the cathodes according to the invention are designed as surface cathodes. For this purpose, they can be applied to a flat tape substrate or to a plate in which emitting cathode strips or segments are separated by insulating strips. A design with a large "emitter lawn" is also possible.
- the holder can be a silicon wafer or a glass plate, e.g. for a field emitter display.
- the holder can also be a wire, e.g. for flat display tubes with multiple cathode wires.
- the holder can also be made from the known metal tubes made of nickel, molybdenum or the like. exist, which is equipped with a heating coil that allows the cathode to operate at temperatures up to 500 ° C, especially at 200 ° C to 300 ° C.
- the conductive underlayer is usually made of a metal, e.g. Tungsten. It can also consist of several layers of metal, e.g. from a tungsten layer and a tungsten / rhenium layer.
- the substrate in the sense of the invention can be a porous tungsten layer, as is known from conventional I-cathodes.
- Such porous tungsten layers can contain rhenium, iridium, osmium, ruthenium, tantalum, molybdenum or scandium oxide in the laminate.
- These porous layers with a percolation structure are produced by powder metallurgy. They contain a barium compound in the pores of the layer as a source of barium.
- the top layer is covered with an active surface layer that has a very low work function. This layer is very thin, on the order of a monolayer, and contains an emitter complex that contains barium, scandium and oxygen.
- the compact, flat underlayer consists of tungsten, which contains rhenium, iridium, osmium, ruthenium, tantalum, molybdenum or scandium oxide.
- the substrate layer is omitted.
- the cover layer contains tungsten, which is alloyed with rhenium, osmium, optionally also with iridium, ruthenium, tantalum, and / or molybdenum. It also contains scandium oxide or scandium oxide mixed with the oxides of other rare earth metals such as europium, samarium and cerium. It is also possible that it consists of scandium tungstates such as Sc 6 WO 12 or Sc 2 W 3 O 12 .
- the cover layer can also be constructed in multiple layers, in particular as a double layer, from the above-mentioned layer compositions, the best results being achieved when a layer containing scandium is the outer layer.
- barium-containing compounds can be mixed with calcium or strontium oxide.
- This cover layer is preferably 100 to 500 nm thick.
- the tungsten portion of the top layer consists of ultrafine particles with a diameter of 1 to 50 nm, which were deposited in a nanostructured layer.
- the other two components are also deposited as ultrafine particles and are partly between, partly on the tungsten particles.
- the emitting surface complex is formed from the three components and lies as a surface layer on the cover layer.
- the low-temperature cathodes according to the invention are produced in a two-stage process.
- cathodes such as L-cathodes, I-cathodes, B-cathodes or M-cathodes
- gas or silicon disks which are coated with an underlayer made of conductive material according to the invention.
- These documents are brought into the deposition chamber of a laser ablation deposition system.
- an excimer laser as the laser, which, in contrast to CO 2 lasers, can also ablate tungsten without any problems.
- the tungsten-containing component is deposited first, the scandium-containing component second, and the barium-containing component third.
- the emission properties of the finished low-temperature cathode are influenced favorably if the gas atmosphere in the ablation deposition process consists of high-purity argon or argon / hydrogen. Furthermore, it is advantageous if the underlays for the cover layer are heated in the process.
- the emitter complex is formed in the surface layer.
- This activation step can be a thermal, voltage-based activation, a simple sintering or a surface sintering in a laser beam.
- the thermal, voltage-based activation should take place under vacuum.
- a simple possibility is to activate the low-temperature cathode in the finished discharge tube. To do this, the cathode is heated to approx. 800 ° C and voltage is applied.
- the associated current-voltage diagram also represents a quality control.
- the activation can also consist of a simple sintering at 800 ° C.
- the activation step can consist of a pulsed laser treatment at 1000 ° C to 1100 ° C.
- the low-temperature cathodes according to the invention are distinguished by excellent emission at low temperatures because they have a very low work function.
- the total emission consists of glow emission and field emission.
- the contribution of the glow emission according to the Richardson equation i 0 A R T 2nd exp (- ⁇ / kT) falls below 1nA at 200 ° C.
- field emission starts at a threshold of 1.2 kV, which very quickly delivers emission currents> 3 ⁇ A when the field is further increased.
- diode spacing d 160 ⁇ m, as can be determined from the Child-Langmuir equation, there follows a field emission threshold field strength of 7.5 V / ⁇ m, which represents a very good value for cold emission and is only reached as a peak value by a few other cathodes .
Landscapes
- Cold Cathode And The Manufacture (AREA)
- Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
- Electrodes For Cathode-Ray Tubes (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19515596A DE19515596A1 (de) | 1995-05-02 | 1995-05-02 | Elektrische Entladungsröhre oder Entladungslampe, Flachbildschirm, Niedertemperaturkathode und Verfahren zu deren Herstellung |
DE19515596 | 1995-05-02 |
Publications (3)
Publication Number | Publication Date |
---|---|
EP0741402A2 true EP0741402A2 (fr) | 1996-11-06 |
EP0741402A3 EP0741402A3 (fr) | 1997-11-26 |
EP0741402B1 EP0741402B1 (fr) | 2003-08-27 |
Family
ID=7760557
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP96201180A Expired - Lifetime EP0741402B1 (fr) | 1995-05-02 | 1996-04-29 | Tubes à décharge électrique ou lampes à décharge électrique, écran plat d'affichage, cathode à basse température et leur procédé de fabrication |
Country Status (4)
Country | Link |
---|---|
US (1) | US5866975A (fr) |
EP (1) | EP0741402B1 (fr) |
JP (1) | JPH08306301A (fr) |
DE (2) | DE19515596A1 (fr) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5695802A (en) * | 1994-06-16 | 1997-12-09 | Firmenich Sa | Flavoring composition and process |
EP0878829A2 (fr) * | 1997-05-16 | 1998-11-18 | Osram Sylvania Inc. | Lampe pour lampe à décharge |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6344271B1 (en) * | 1998-11-06 | 2002-02-05 | Nanoenergy Corporation | Materials and products using nanostructured non-stoichiometric substances |
JP3902883B2 (ja) | 1998-03-27 | 2007-04-11 | キヤノン株式会社 | ナノ構造体及びその製造方法 |
US6120857A (en) * | 1998-05-18 | 2000-09-19 | The Regents Of The University Of California | Low work function surface layers produced by laser ablation using short-wavelength photons |
US6965199B2 (en) * | 2001-03-27 | 2005-11-15 | The University Of North Carolina At Chapel Hill | Coated electrode with enhanced electron emission and ignition characteristics |
EA003573B1 (ru) * | 2001-06-29 | 2003-06-26 | Александр Михайлович Ильянок | Плоский дисплей с самосканирующей разверткой |
KR100530765B1 (ko) * | 2002-10-04 | 2005-11-23 | 이규왕 | 나노 다공성 유전체를 이용한 플라즈마 발생장치 |
WO2005106913A1 (fr) * | 2004-04-28 | 2005-11-10 | Kye-Seung Lee | Lampe fluorescente du type plat |
DE102004043247B4 (de) * | 2004-09-07 | 2010-04-15 | Osram Gesellschaft mit beschränkter Haftung | Elektrode für Hochdruckentladungslampen sowie Hochdruckentladungslampe mit derartigen Elektroden |
CN103713420A (zh) * | 2013-12-30 | 2014-04-09 | 京东方科技集团股份有限公司 | 一种阵列基板及显示装置 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1410641A (fr) * | 1963-10-04 | 1965-09-10 | Philips Nv | Corps métallique poreux et son procédé de fabrication |
JPH01225040A (ja) * | 1988-03-02 | 1989-09-07 | Hitachi Ltd | 電子放出用電極及び表示装置 |
JPH06203742A (ja) * | 1992-12-29 | 1994-07-22 | Canon Inc | 電子放出素子、電子線発生装置及び画像形成装置 |
WO1994028571A1 (fr) * | 1993-06-02 | 1994-12-08 | Microelectronics And Computer Technology Corporation | Cathode plate a emission de champ pourvue d'une pellicule de diamant amorphe |
EP0709870A1 (fr) * | 1994-10-31 | 1996-05-01 | AT&T Corp. | Procédé et appareil pour la fabrication d'émetteurs à effet de champ améliorés formés de particules, et produits ainsi obtenus |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4160191A (en) * | 1977-12-27 | 1979-07-03 | Hausfeld David A | Self-sustaining plasma discharge display device |
US4810926A (en) * | 1987-07-13 | 1989-03-07 | Syracuse University | Impregnated thermionic cathode |
EP0651419B1 (fr) * | 1993-10-28 | 1998-06-24 | Koninklijke Philips Electronics N.V. | Cathode à réserve et méthode de fabrication |
-
1995
- 1995-05-02 DE DE19515596A patent/DE19515596A1/de not_active Withdrawn
-
1996
- 1996-04-29 EP EP96201180A patent/EP0741402B1/fr not_active Expired - Lifetime
- 1996-04-29 DE DE59610682T patent/DE59610682D1/de not_active Expired - Lifetime
- 1996-04-30 US US08/643,089 patent/US5866975A/en not_active Expired - Lifetime
- 1996-05-02 JP JP11158496A patent/JPH08306301A/ja active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1410641A (fr) * | 1963-10-04 | 1965-09-10 | Philips Nv | Corps métallique poreux et son procédé de fabrication |
JPH01225040A (ja) * | 1988-03-02 | 1989-09-07 | Hitachi Ltd | 電子放出用電極及び表示装置 |
JPH06203742A (ja) * | 1992-12-29 | 1994-07-22 | Canon Inc | 電子放出素子、電子線発生装置及び画像形成装置 |
WO1994028571A1 (fr) * | 1993-06-02 | 1994-12-08 | Microelectronics And Computer Technology Corporation | Cathode plate a emission de champ pourvue d'une pellicule de diamant amorphe |
EP0709870A1 (fr) * | 1994-10-31 | 1996-05-01 | AT&T Corp. | Procédé et appareil pour la fabrication d'émetteurs à effet de champ améliorés formés de particules, et produits ainsi obtenus |
Non-Patent Citations (3)
Title |
---|
NISTOR L C ET AL: "DIRECT OBSERVATION OF LASER-INDUCED CRYSTALLIZATION OF A-C: H FILMS" Januar 1994 , APPLIED PHYSICS A. SOLIDS AND SURFACES, VOL. A58, PAGE(S) 137 - 144 XP000608573 * Seite 138, Absatz 1 * * |
PATENT ABSTRACTS OF JAPAN vol. 013, no. 544 (E-855), 6.Dezember 1989 & JP 01 225040 A (HITACHI LTD), 7.September 1989, * |
PATENT ABSTRACTS OF JAPAN vol. 018, no. 551 (E-1619), 20.Oktober 1994 & JP 06 203742 A (CANON INC), 22.Juli 1994, * |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5695802A (en) * | 1994-06-16 | 1997-12-09 | Firmenich Sa | Flavoring composition and process |
EP0878829A2 (fr) * | 1997-05-16 | 1998-11-18 | Osram Sylvania Inc. | Lampe pour lampe à décharge |
EP0878829A3 (fr) * | 1997-05-16 | 1999-03-17 | Osram Sylvania Inc. | Lampe pour lampe à décharge |
Also Published As
Publication number | Publication date |
---|---|
JPH08306301A (ja) | 1996-11-22 |
DE19515596A1 (de) | 1996-11-07 |
US5866975A (en) | 1999-02-02 |
DE59610682D1 (de) | 2003-10-02 |
EP0741402B1 (fr) | 2003-08-27 |
EP0741402A3 (fr) | 1997-11-26 |
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