EP0698910A2 - Verfahren und Detektoreinrichtung zur elektronischen positionsbezogenen Erfassung von Strahlung - Google Patents
Verfahren und Detektoreinrichtung zur elektronischen positionsbezogenen Erfassung von Strahlung Download PDFInfo
- Publication number
- EP0698910A2 EP0698910A2 EP95113181A EP95113181A EP0698910A2 EP 0698910 A2 EP0698910 A2 EP 0698910A2 EP 95113181 A EP95113181 A EP 95113181A EP 95113181 A EP95113181 A EP 95113181A EP 0698910 A2 EP0698910 A2 EP 0698910A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- layer
- anode
- resistance
- vacuum
- detector device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 230000005855 radiation Effects 0.000 title claims abstract description 23
- 238000000034 method Methods 0.000 title claims abstract description 6
- 238000001514 detection method Methods 0.000 title description 4
- 239000010410 layer Substances 0.000 claims abstract description 58
- 239000000758 substrate Substances 0.000 claims abstract description 26
- 239000002245 particle Substances 0.000 claims abstract description 16
- 230000005670 electromagnetic radiation Effects 0.000 claims abstract description 8
- 239000002356 single layer Substances 0.000 claims abstract description 3
- 239000004065 semiconductor Substances 0.000 claims abstract 2
- 229910052732 germanium Inorganic materials 0.000 claims 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims 1
- 239000011521 glass Substances 0.000 abstract description 6
- 230000008878 coupling Effects 0.000 abstract description 4
- 238000010168 coupling process Methods 0.000 abstract description 4
- 238000005859 coupling reaction Methods 0.000 abstract description 4
- 238000005259 measurement Methods 0.000 description 7
- 230000006978 adaptation Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005192 partition Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000002285 radioactive effect Effects 0.000 description 1
- 230000004304 visual acuity Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J31/00—Cathode ray tubes; Electron beam tubes
- H01J31/08—Cathode ray tubes; Electron beam tubes having a screen on or from which an image or pattern is formed, picked up, converted, or stored
- H01J31/49—Pick-up adapted for an input of electromagnetic radiation other than visible light and having an electric output, e.g. for an input of X-rays, for an input of infrared radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2231/00—Cathode ray tubes or electron beam tubes
- H01J2231/50—Imaging and conversion tubes
- H01J2231/50005—Imaging and conversion tubes characterised by form of illumination
- H01J2231/5001—Photons
- H01J2231/50015—Light
- H01J2231/50021—Ultraviolet
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2231/00—Cathode ray tubes or electron beam tubes
- H01J2231/50—Imaging and conversion tubes
- H01J2231/50005—Imaging and conversion tubes characterised by form of illumination
- H01J2231/5001—Photons
- H01J2231/50031—High energy photons
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2231/00—Cathode ray tubes or electron beam tubes
- H01J2231/50—Imaging and conversion tubes
- H01J2231/50057—Imaging and conversion tubes characterised by form of output stage
- H01J2231/50068—Electrical
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2231/00—Cathode ray tubes or electron beam tubes
- H01J2231/50—Imaging and conversion tubes
- H01J2231/501—Imaging and conversion tubes including multiplication stage
- H01J2231/5013—Imaging and conversion tubes including multiplication stage with secondary emission electrodes
- H01J2231/5016—Michrochannel plates [MCP]
Definitions
- the invention relates to a method for decoupling image signals in position-providing high-vacuum detector devices for quantum or particle radiation according to the preamble of claim 1 and a detector device which operates according to the method and is based on the features according to the preamble of claim 2.
- the assembly and application of the complex anode structure 1 in the evacuated Glass body 6 with the necessary wire feedthroughs for high-frequency signals not only means great technical difficulties for the manufacture of the detector, but also precludes the possibility of later being able to adapt the anode structure 1 individually in an optimized manner to a changed measurement task.
- the individual detector components form a unit that can no longer be separated or changed.
- an electron converter layer 4 (UV quantum electron converter layer) is applied on the inside of a radiation-permeable cover substrate 10, a chevron plate system 3 as a charge multiplier with high-voltage leads 9 led out, and the resistive anode structure 1 applied to the vacuum-side inner surface of the counter substrate 11.
- a local charge avalanche generated by a UV quantum on the anode structure 1 is indicated with reference note 8.
- the invention has for its object to provide a technically much simpler and more reliable electronic positioning in detector devices of the type described for quantum or particle radiation, i.e. location-specific image signal decoupling without direct electrical contacts through the vacuum partition with the possibility of adapting to changing measurement tasks.
- the invention is characterized in a method for decoupling image signals in position-providing high-vacuum detector devices for quantum or particle radiation, which impinge on a spatially resolving anode structure as an electron avalanche via an electron multiplier device, characterized in that the electron avalanche within the vacuum on the anode side of the detector device is characterized by a high-resistance, conductive thin film remains locally collected for a short time and the collected charge is capacitively read out as an image charge by a low-impedance anode layer arranged opposite the high-resistance thin film outside the vacuum and suitably structured for location determination.
- the invention is based on the idea that the radiation quantum-induced charge avalanches briefly collect the inner surface of the counter substrate opposite the radiation entrance through a uniform, high-resistance conductive layer and then capacitively couple it through the vacuum wall (substrate layer) to a low-resistance, structured anode layer outside the vacuum.
- a position-giving detector device for electromagnetic radiation or particle radiation in which a plate-like electron multiplier arrangement is arranged in a layer-like manner in succession on the radiation incidence side within a space that is delimited by a flat, radiation-permeable cover substrate and a counter-substrate that is kept at a distance from it, and one at a distance from one another Surface anode are present is according to the invention characterized in that the anode for capacitive, position-related image signal readout is designed as a layer arrangement such that a high-resistance charge-collecting layer is arranged on the vacuum-side inner surface of the counter-substrate and this is arranged on the outer surface of the counter-substrate, that is to say opposite one another, suitably structured for location determination outside the vacuum , low-resistance anode layer are present.
- the invention offers the advantage that comparatively simple, uniform detector elements or assemblies can be used, whose electronic position reading can be individually and optimized adapted to different measurement tasks by different structuring of the low-resistance anode layer lying outside the vacuum can. Another important advantage is that no electrical feedthroughs for high-frequency current pulses are necessary in the vacuum. In addition, there is the possibility of combining the amplifier and digitizing electronics in conjunction with the low-resistance anode structure as a highly integrated circuit (e.g. B. in SMD technology, as a hybrid or ASIC).
- a highly integrated circuit e.g. B. in SMD technology, as a hybrid or ASIC.
- the charge collecting areas or busbars for reading in proportion to the image charge on at least two, preferably on three edge sides of the anode layer are arranged at right angles to each other.
- any other suitable structures can also be used, such as. B. a Vernier anode, a spiral structure, a delay line layer or a pixel system that is read digitally by means of a CCD.
- the image intensifier system namely the photoelectron converter layer 4, the underlying chevron plate system 3 of a multi-channel electron multiplier and the high-resistance anode layer 1 according to the invention are installed in a high vacuum 7 as before.
- the complex anode structure 2 for electronic position reading outside the vacuum 7 is applied or arranged on the back of the detector, ie for example on the back of the counter-substrate 6.
- the exact location information of the position of an incident radiation quantum (UV quant) or particle is transferred capacitively after corresponding charge multiplication by the counter-substrate 6 of the image intensifier system, which is preferably made of glass, to the low-resistance anode structure 2 located outside the vacuum.
- This capacitive transmission is possible because the charge collection layer formed on the inside of the bottom or counter substrate 6, i.e. in a vacuum, is applied as a high-resistance (anode) layer, on which the electron avalanche 8 induced by a single radiation quantum or particle is collected and there the high sheet resistance (mega-ohm range), as required, remains for a few 10ns, as shown in FIG. 2.
- This local charge avalanche 8 capacitively couples through the glass layer of the counter substrate 6 and generates an image charge on or in the opposite, low-resistance anode structure 2.
- the low-resistance anode structure 2 can be designed, for example, as a wedge & strip anode with three contact areas a, b and c.
- the structure of this anode can be adapted in a comparatively simple manner to the position resolution required in each case.
- the anode structure 2 is located on the outside of the counter substrate 6, ie in a normal air atmosphere.
- the exact position of the image charge can then be determined using appropriately adapted, fast charge-sensitive preamplifiers and an evaluation logic, not shown, which is known in principle.
- the capacitive coupling enables a high spatial resolution if the internal resistances of the two anode layers 1, 2 are optimal are adapted to one another and the anode structure 2 is structured geometrically in accordance with high resolution.
- the principle of capacitive, location-based signal extraction for digital position reading can be briefly described with reference to FIG. 2:
- the local charge cloud 8 generated in the chevron plate 3 in a vacuum strikes the high-resistance anode layer 1, which, for example, Layer with a thickness of some 100nm can be and remains there for some 10ns.
- an image charge is built up on the low-resistance anode structure 2 by capacitive coupling on the other side of the counter-substrate 6 lying outside the vacuum.
- this low-resistance anode structure 2 for example as a three-part wedge-strip anode (cf. FIG. 3)
- each location is uniquely determined by a specific image charge ratio.
- this image charge distribution can be determined by fast electronic components.
- the position X, Y in the image plane can in turn be determined precisely from the relationships of the image charges Q1, Q2 and Q3 according to the following relationships:
- An image charge cloud 20 which forms on the anode structure 2 is indicated in FIG. 3 by a hatched area.
- individual events can be recorded with a very high location-related time resolution.
- the local resolution in the case of the detectors currently being tested is approximately 1/250 of the detector width or, if suitable lens systems are used, 0.5 °. Fig.
- FIG. 4 shows a measurement setup (top) and results (bottom) for determining the position of a falling radiation.
- An alpha particle was used as the radiation source 22 radiating radioactive preparation used. With this arrangement, the radiation-transmissive cover substrate and the photoelectron converter layer are dispensed with, since the alpha particles can release 3 electrons directly at the entry into the chevron plate. Between the radiation source 22 and the chevron plate 3, a shadow mask 21 made of 0.2 mm thick wires is attached, the image of which is to be captured electronically.
- the lower picture in FIG. 4 shows the silhouette of the wires of the shadow mask 2, which are recorded perpendicularly to one another via the wedge & strip structure of the low-resistance anode 2 and the subsequent electronics.
- the resolving power determined in these measurements was less than 0.2 mm, due to the choice the anode structure.
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Measurement Of Radiation (AREA)
- Conversion Of X-Rays Into Visible Images (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4429925 | 1994-08-23 | ||
| DE4429925A DE4429925C1 (de) | 1994-08-23 | 1994-08-23 | Verfahren und Detektoreinrichtung zur elektronischen positionsbezogenen Erfassung von Strahlung |
| US08/517,774 US5686721A (en) | 1994-08-23 | 1995-08-22 | Position-transmitting electromagnetic quanta and particle radiation detector |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP0698910A2 true EP0698910A2 (de) | 1996-02-28 |
| EP0698910A3 EP0698910A3 (enrdf_load_stackoverflow) | 1996-03-13 |
Family
ID=25939460
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP95113181A Withdrawn EP0698910A2 (de) | 1994-08-23 | 1995-08-22 | Verfahren und Detektoreinrichtung zur elektronischen positionsbezogenen Erfassung von Strahlung |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US5686721A (enrdf_load_stackoverflow) |
| EP (1) | EP0698910A2 (enrdf_load_stackoverflow) |
| JP (1) | JP2643915B2 (enrdf_load_stackoverflow) |
| AU (1) | AU2500195A (enrdf_load_stackoverflow) |
| DE (1) | DE4429925C1 (enrdf_load_stackoverflow) |
| IL (1) | IL114856A (enrdf_load_stackoverflow) |
| ZA (1) | ZA957006B (enrdf_load_stackoverflow) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2754068B1 (fr) * | 1996-10-02 | 1998-11-27 | Charpak Georges | Detecteur a gaz de rayonnements ionisants a tres grand taux de comptage |
| US6326654B1 (en) | 1999-02-05 | 2001-12-04 | The United States Of America As Represented By The Secretary Of The Air Force | Hybrid ultraviolet detector |
| DE10014311C2 (de) * | 2000-03-23 | 2003-08-14 | Siemens Ag | Strahlungswandler |
| DE10144435B4 (de) * | 2001-09-06 | 2005-03-24 | EuroPhoton GmbH Gesellschaft für optische Sensorik | Verfahren zur Charakterisierung der Eigenschaften von fluoreszierenden Proben, insbesondere lebenden Zellen und Geweben, in multi-well, in in-vitro Fluoreszenz-Assays, in DNA-Chips, Vorrichtungen zur Durchführung des Verfahrens und deren Verwendung |
| TWI342395B (en) * | 2002-12-20 | 2011-05-21 | Ibm | Method for producing a monolayer of molecules on a surface and biosensor with such a monolayer |
| JP4708117B2 (ja) * | 2005-08-10 | 2011-06-22 | 浜松ホトニクス株式会社 | 光電子増倍管 |
| US7375345B2 (en) * | 2005-10-26 | 2008-05-20 | Tetra Laval Holdings & Finance S.A. | Exposed conductor system and method for sensing an electron beam |
| US7368739B2 (en) | 2005-10-26 | 2008-05-06 | Tetra Laval Holdings & Finance S.A. | Multilayer detector and method for sensing an electron beam |
| US7687759B2 (en) * | 2007-11-27 | 2010-03-30 | Itt Manufacturing Enterprises, Inc. | Slotted microchannel plate (MCP) |
| EP2202777A1 (en) | 2008-12-19 | 2010-06-30 | Leibniz-Institut für Neurobiologie | A time resolved measurement apparatus and a time sensitive detector with improved time measurement |
| EP2199830B1 (en) | 2008-12-19 | 2014-07-02 | Leibniz-Institut für Neurobiologie | A position resolved measurement apparatus and a method for acquiring space coordinates of a quantum beam incident thereon |
| GB2475063A (en) | 2009-11-04 | 2011-05-11 | Univ Leicester | Charge detector for photons or particles. |
| EP2496965A1 (en) | 2009-11-05 | 2012-09-12 | CERN - European Organization For Nuclear Research | Capacitive spreading readout board |
| EP2562563A1 (en) * | 2011-08-26 | 2013-02-27 | CERN - European Organization For Nuclear Research | Detector-readout interface for an avalanche particle detector |
| GB201203561D0 (en) | 2012-02-29 | 2012-04-11 | Photek Ltd | Electron multiplying apparatus |
| JP2013254584A (ja) * | 2012-06-05 | 2013-12-19 | Hoya Corp | 電子増幅用ガラス基板およびその製造方法 |
| DE102013104355A1 (de) * | 2013-04-29 | 2014-10-30 | Ketek Gmbh | Strahlungsdetektor und Verwendung des Strahlungsdetektors |
| DE102013008193A1 (de) | 2013-05-14 | 2014-11-20 | Audi Ag | Vorrichtung und elektrische Baugruppe zum Wandeln einer Gleichspannung in eine Wechselspannung |
| US9425030B2 (en) * | 2013-06-06 | 2016-08-23 | Burle Technologies, Inc. | Electrostatic suppression of ion feedback in a microchannel plate photomultiplier |
| DE102013109416B4 (de) | 2013-08-29 | 2021-06-17 | Roentdek-Handels Gmbh | Teilchendetektor |
| DE102014117682B4 (de) | 2014-12-02 | 2016-07-07 | Roentdek-Handels Gmbh | Detektorsystem und Streifenanode |
| GB2539506A (en) * | 2015-06-19 | 2016-12-21 | Photek Ltd | Detector |
| CN105070629B (zh) * | 2015-08-19 | 2017-06-13 | 长春理工大学 | 用于空间光通信具有复合波导阳极的微通道光电倍增管 |
| US10265545B2 (en) | 2016-05-06 | 2019-04-23 | Radiation Detection and Imaging Technologies, LLC | Ionizing particle beam fluence and position detector array using Micromegas technology with multi-coordinate readout |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4395636A (en) * | 1980-12-24 | 1983-07-26 | Regents Of The University Of California | Radiation imaging apparatus |
| US4703168A (en) * | 1985-07-22 | 1987-10-27 | Princeton Applied Research Corporation | Multiplexed wedge anode detector |
| DE3638893A1 (de) * | 1986-11-14 | 1988-05-26 | Max Planck Gesellschaft | Positionsempfindlicher strahlungsdetektor |
| DE3704716A1 (de) * | 1987-02-14 | 1988-08-25 | Kernforschungsanlage Juelich | Ortsempfindlicher detektor |
| GB2237142B (en) * | 1989-09-08 | 1994-07-06 | Univ London | Position detecting element |
| FR2689684B1 (fr) * | 1992-04-01 | 1994-05-13 | Commissariat A Energie Atomique | Dispositif de micro-imagerie de rayonnements ionisants. |
| US5493111A (en) * | 1993-07-30 | 1996-02-20 | Litton Systems, Inc. | Photomultiplier having cascaded microchannel plates, and method for fabrication |
-
1994
- 1994-08-23 DE DE4429925A patent/DE4429925C1/de not_active Expired - Lifetime
-
1995
- 1995-07-14 AU AU25001/95A patent/AU2500195A/en not_active Abandoned
- 1995-08-07 IL IL11485695A patent/IL114856A/en not_active IP Right Cessation
- 1995-08-22 EP EP95113181A patent/EP0698910A2/de not_active Withdrawn
- 1995-08-22 US US08/517,774 patent/US5686721A/en not_active Expired - Lifetime
- 1995-08-22 ZA ZA957006A patent/ZA957006B/xx unknown
- 1995-08-23 JP JP7214839A patent/JP2643915B2/ja not_active Expired - Fee Related
Non-Patent Citations (1)
| Title |
|---|
| None |
Also Published As
| Publication number | Publication date |
|---|---|
| AU2500195A (en) | 1996-03-07 |
| EP0698910A3 (enrdf_load_stackoverflow) | 1996-03-13 |
| DE4429925C1 (de) | 1995-11-23 |
| JPH08189972A (ja) | 1996-07-23 |
| IL114856A (en) | 1998-10-30 |
| JP2643915B2 (ja) | 1997-08-25 |
| ZA957006B (en) | 1996-04-09 |
| US5686721A (en) | 1997-11-11 |
| IL114856A0 (en) | 1995-12-08 |
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| STAA | Information on the status of an ep patent application or granted ep patent |
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| 18W | Application withdrawn |
Withdrawal date: 19980415 |