EP0697716A3 - Gleichzeitiges Herstellungsverfahren von obersten Oxydschichten unter Verwendung von heroxydiertem Silizium - Google Patents
Gleichzeitiges Herstellungsverfahren von obersten Oxydschichten unter Verwendung von heroxydiertem Silizium Download PDFInfo
- Publication number
- EP0697716A3 EP0697716A3 EP95111165A EP95111165A EP0697716A3 EP 0697716 A3 EP0697716 A3 EP 0697716A3 EP 95111165 A EP95111165 A EP 95111165A EP 95111165 A EP95111165 A EP 95111165A EP 0697716 A3 EP0697716 A3 EP 0697716A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- silicon
- oxide
- deposited
- silicon nitride
- nitride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 229910052710 silicon Inorganic materials 0.000 title abstract 6
- 239000010703 silicon Substances 0.000 title abstract 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 5
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 abstract 5
- 229910052581 Si3N4 Inorganic materials 0.000 abstract 4
- 238000005530 etching Methods 0.000 abstract 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 1
- 229910021417 amorphous silicon Inorganic materials 0.000 abstract 1
- 239000003990 capacitor Substances 0.000 abstract 1
- 238000004140 cleaning Methods 0.000 abstract 1
- 150000004767 nitrides Chemical class 0.000 abstract 1
- 229920005591 polysilicon Polymers 0.000 abstract 1
- 230000001681 protective effect Effects 0.000 abstract 1
- 229910052814 silicon oxide Inorganic materials 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 230000001131 transforming effect Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66568—Lateral single gate silicon transistors
- H01L29/66575—Lateral single gate silicon transistors where the source and drain or source and drain extensions are self-aligned to the sides of the gate
- H01L29/6659—Lateral single gate silicon transistors where the source and drain or source and drain extensions are self-aligned to the sides of the gate with both lightly doped source and drain extensions and source and drain self-aligned to the sides of the gate, e.g. lightly doped drain [LDD] MOSFET, double diffused drain [DDD] MOSFET
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/401—Multistep manufacturing processes
- H01L29/4011—Multistep manufacturing processes for data storage electrodes
- H01L29/40114—Multistep manufacturing processes for data storage electrodes the electrodes comprising a conductor-insulator-conductor-insulator-semiconductor structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/6656—Unipolar field-effect transistors with an insulated gate, i.e. MISFET using multiple spacer layers, e.g. multiple sidewall spacers
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Non-Volatile Memory (AREA)
- Semiconductor Memories (AREA)
- Semiconductor Integrated Circuits (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US283364 | 1994-08-01 | ||
US08/283,364 US5665620A (en) | 1994-08-01 | 1994-08-01 | Method for forming concurrent top oxides using reoxidized silicon in an EPROM |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0697716A2 EP0697716A2 (de) | 1996-02-21 |
EP0697716A3 true EP0697716A3 (de) | 1998-06-24 |
Family
ID=23085692
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP95111165A Withdrawn EP0697716A3 (de) | 1994-08-01 | 1995-07-17 | Gleichzeitiges Herstellungsverfahren von obersten Oxydschichten unter Verwendung von heroxydiertem Silizium |
Country Status (3)
Country | Link |
---|---|
US (1) | US5665620A (de) |
EP (1) | EP0697716A3 (de) |
JP (1) | JPH0864592A (de) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5677867A (en) * | 1991-06-12 | 1997-10-14 | Hazani; Emanuel | Memory with isolatable expandable bit lines |
KR100278647B1 (ko) * | 1996-10-05 | 2001-02-01 | 윤종용 | 불휘발성 메모리소자 및 그 제조방법 |
US5780342A (en) * | 1996-12-05 | 1998-07-14 | Winbond Electronics Corporation | Method for fabricating dielectric films for non-volatile electrically erasable memories |
US5783473A (en) * | 1997-01-06 | 1998-07-21 | Mosel Vitelic, Inc. | Structure and manufacturing process of a split gate flash memory unit |
US5793089A (en) * | 1997-01-10 | 1998-08-11 | Advanced Micro Devices, Inc. | Graded MOS transistor junction formed by aligning a sequence of implants to a selectively removable polysilicon sidewall space and oxide thermally grown thereon |
EP0881669B1 (de) | 1997-05-30 | 2005-12-14 | STMicroelectronics S.r.l. | Verfahren zur Herstellung eines Germanium-implantierten bipolaren Heteroübergangtransistors |
AU750612B2 (en) * | 1997-10-22 | 2002-07-25 | Texas Instruments Incorporated | Integrated circuit having both low voltage and high voltage mos transistors and method of making |
US6071817A (en) * | 1998-03-23 | 2000-06-06 | Lsi Logic Corporation | Isolation method utilizing a high pressure oxidation |
US6346725B1 (en) * | 1998-05-22 | 2002-02-12 | Winbond Electronics Corporation | Contact-less array of fully self-aligned, triple polysilicon, source-side injection, nonvolatile memory cells with metal-overlaid wordlines |
US6239003B1 (en) * | 1998-06-16 | 2001-05-29 | Texas Instruments Incorporated | Method of simultaneous fabrication of isolation and gate regions in a semiconductor device |
US6187633B1 (en) | 1998-10-09 | 2001-02-13 | Chartered Semiconductor Manufacturing, Ltd. | Method of manufacturing a gate structure for a semiconductor memory device with improved breakdown voltage and leakage rate |
US6265267B1 (en) * | 1999-11-04 | 2001-07-24 | United Microelectronics Corp. | Fabricating method for a semiconductor device comprising gate oxide layers of various thicknesses |
WO2002043127A1 (en) * | 2000-11-21 | 2002-05-30 | Koninklijke Philips Electronics N.V. | Method of forming a semiconductor structure |
DE10148491B4 (de) * | 2001-10-01 | 2006-09-07 | Infineon Technologies Ag | Verfahren zum Herstellen einer integrierten Halbleiteranordnung mit Hilfe einer thermischen Oxidation und Halbleiteranordnung |
US20050215074A1 (en) * | 2004-03-26 | 2005-09-29 | Fuja Shone | ONO formation method |
JP2007066944A (ja) | 2005-08-29 | 2007-03-15 | Nissan Motor Co Ltd | 炭化珪素半導体装置及びその製造方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3340583A1 (de) * | 1982-11-12 | 1984-05-17 | Rca Corp., New York, N.Y. | Verfahren zum herstellen einer isolierschicht und halbleiterbauelement |
EP0366423A2 (de) * | 1988-10-25 | 1990-05-02 | Matsushita Electronics Corporation | Verfahren zur Herstellung einer nicht-flüchtigen Speicheranordnung |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4179311A (en) * | 1977-01-17 | 1979-12-18 | Mostek Corporation | Method of stabilizing semiconductor device by converting doped poly-Si to polyoxides |
US4722909A (en) * | 1985-09-26 | 1988-02-02 | Motorola, Inc. | Removable sidewall spacer for lightly doped drain formation using two mask levels |
US4745086A (en) * | 1985-09-26 | 1988-05-17 | Motorola, Inc. | Removable sidewall spacer for lightly doped drain formation using one mask level and differential oxidation |
US4814291A (en) * | 1986-02-25 | 1989-03-21 | American Telephone And Telegraph Company, At&T Bell Laboratories | Method of making devices having thin dielectric layers |
US4748133A (en) * | 1987-06-26 | 1988-05-31 | Motorola Inc. | Deposition of amorphous silicon for the formation of interlevel dielectrics in semiconductor memory devices |
JPH0668073B2 (ja) * | 1988-07-15 | 1994-08-31 | チタン工業株式会社 | ポリアミド系樹脂組成物 |
US5104819A (en) * | 1989-08-07 | 1992-04-14 | Intel Corporation | Fabrication of interpoly dielctric for EPROM-related technologies |
-
1994
- 1994-08-01 US US08/283,364 patent/US5665620A/en not_active Expired - Fee Related
-
1995
- 1995-07-17 EP EP95111165A patent/EP0697716A3/de not_active Withdrawn
- 1995-07-28 JP JP7212598A patent/JPH0864592A/ja active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3340583A1 (de) * | 1982-11-12 | 1984-05-17 | Rca Corp., New York, N.Y. | Verfahren zum herstellen einer isolierschicht und halbleiterbauelement |
EP0366423A2 (de) * | 1988-10-25 | 1990-05-02 | Matsushita Electronics Corporation | Verfahren zur Herstellung einer nicht-flüchtigen Speicheranordnung |
Non-Patent Citations (1)
Title |
---|
VOLLERTSEN R P ET AL: "RELIABILITY OF 10 NM STACKED INSULATOR ON POLYCRYSTALLINE SILICON IN PLANAR AND TRENCH CAPACITORS", JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 137, no. 12, pages 3942 - 3947, XP000168103 * |
Also Published As
Publication number | Publication date |
---|---|
EP0697716A2 (de) | 1996-02-21 |
US5665620A (en) | 1997-09-09 |
JPH0864592A (ja) | 1996-03-08 |
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18D | Application deemed to be withdrawn |
Effective date: 19981228 |