EP0659119B1 - Druckplatte und verfahren zur herstellung - Google Patents
Druckplatte und verfahren zur herstellung Download PDFInfo
- Publication number
- EP0659119B1 EP0659119B1 EP94908815A EP94908815A EP0659119B1 EP 0659119 B1 EP0659119 B1 EP 0659119B1 EP 94908815 A EP94908815 A EP 94908815A EP 94908815 A EP94908815 A EP 94908815A EP 0659119 B1 EP0659119 B1 EP 0659119B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- surface layer
- substrate
- base material
- layer
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 13
- 239000000463 material Substances 0.000 claims abstract description 114
- 239000000758 substrate Substances 0.000 claims abstract description 79
- 238000000034 method Methods 0.000 claims abstract description 78
- 239000002344 surface layer Substances 0.000 claims abstract description 56
- 239000002245 particle Substances 0.000 claims abstract description 45
- 239000010410 layer Substances 0.000 claims abstract description 32
- 239000011248 coating agent Substances 0.000 claims abstract description 21
- 238000000576 coating method Methods 0.000 claims abstract description 21
- 238000000151 deposition Methods 0.000 claims abstract description 11
- 230000008569 process Effects 0.000 claims description 26
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 21
- 239000004411 aluminium Substances 0.000 claims description 17
- 229910052782 aluminium Inorganic materials 0.000 claims description 17
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 17
- 238000007751 thermal spraying Methods 0.000 claims description 11
- 229910052593 corundum Inorganic materials 0.000 claims description 9
- 229910001845 yogo sapphire Inorganic materials 0.000 claims description 9
- 238000007750 plasma spraying Methods 0.000 claims description 7
- 239000007769 metal material Substances 0.000 claims description 6
- 230000015572 biosynthetic process Effects 0.000 claims description 5
- 238000005755 formation reaction Methods 0.000 claims description 5
- 230000001747 exhibiting effect Effects 0.000 claims description 3
- 230000008859 change Effects 0.000 claims description 2
- 239000000919 ceramic Substances 0.000 claims 2
- 238000009736 wetting Methods 0.000 claims 1
- 238000001459 lithography Methods 0.000 abstract description 4
- 238000000469 dry deposition Methods 0.000 abstract description 3
- 239000002585 base Substances 0.000 description 32
- 239000000843 powder Substances 0.000 description 17
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 10
- 238000005507 spraying Methods 0.000 description 10
- 239000007789 gas Substances 0.000 description 9
- 229910000838 Al alloy Inorganic materials 0.000 description 8
- 229910045601 alloy Inorganic materials 0.000 description 8
- 239000000956 alloy Substances 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 238000012360 testing method Methods 0.000 description 7
- 230000008901 benefit Effects 0.000 description 6
- 241001481710 Cerambycidae Species 0.000 description 5
- 229910000831 Steel Inorganic materials 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 5
- 239000010959 steel Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 238000011161 development Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 229920000728 polyester Polymers 0.000 description 4
- -1 silver halide Chemical class 0.000 description 4
- 239000002253 acid Substances 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 238000005137 deposition process Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 150000004760 silicates Chemical class 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 108010010803 Gelatin Proteins 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 230000000712 assembly Effects 0.000 description 2
- 238000000429 assembly Methods 0.000 description 2
- 239000011538 cleaning material Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 description 2
- 239000012954 diazonium Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-O diazynium Chemical compound [NH+]#N IJGRMHOSHXDMSA-UHFFFAOYSA-O 0.000 description 2
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 2
- 230000008034 disappearance Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000010891 electric arc Methods 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 229920000159 gelatin Polymers 0.000 description 2
- 239000008273 gelatin Substances 0.000 description 2
- 235000019322 gelatine Nutrition 0.000 description 2
- 235000011852 gelatine desserts Nutrition 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 206010073306 Exposure to radiation Diseases 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 230000003467 diminishing effect Effects 0.000 description 1
- 238000010285 flame spraying Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910000403 monosodium phosphate Inorganic materials 0.000 description 1
- 235000019799 monosodium phosphate Nutrition 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000007712 rapid solidification Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- AJPJDKMHJJGVTQ-UHFFFAOYSA-M sodium dihydrogen phosphate Chemical compound [Na+].OP(O)([O-])=O AJPJDKMHJJGVTQ-UHFFFAOYSA-M 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/03—Chemical or electrical pretreatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/006—Printing plates or foils; Materials therefor made entirely of inorganic materials other than natural stone or metals, e.g. ceramics, carbide materials, ferroelectric materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/04—Printing plates or foils; Materials therefor metallic
- B41N1/08—Printing plates or foils; Materials therefor metallic for lithographic printing
- B41N1/083—Printing plates or foils; Materials therefor metallic for lithographic printing made of aluminium or aluminium alloys or having such surface layers
Definitions
- This invention relates to a light sensitive printing plate and to a method of making a printing plate.
- Such plates might be used, for example, in lithographic printing processes.
- Lithographic processes involve establishing image (printing) and non-image (non-printing) areas on a substrate, substantially on a common plane.
- non-image areas are generally hydrophilic
- image areas are generally oleophilic. Consequently, oil based inks are repelled from the non-image areas after water has been applied to the substrate.
- Image and non-image areas can be created by processes which include a step of exposing a layer of image material on the surface of the substrate to radiation. The exposure to radiation creates solubility differences in the image material corresponding to image and non-image areas. Following development, the soluble areas are removed, leaving a pattern on the substrate corresponding to the image.
- Preparation of the substrate for receiving a layer of the image material must ensure that the material bonds to the substrate, at least prior to image formation. However, it must allow release of the soluble image material after development.
- Suitable image materials for use in lithographic processes can include those based on diazonium/diazide materials, polymers which undergo depolymerisation or addition photo-polymerisation, and silver halide gelatin assemblies. Examples of suitable materials are disclosed in GB-1592281, GB-A-2031442, GB-A-2069164, GB-A-2080964, GB-A-2109573 and EP-A-377589.
- Substrates used in the printing industry commonly comprise an aluminium base layer, which has a layer of aluminium oxide on its surface, intermediate the base material and a subsequently applied image layer, resulting from a controlled oxidation reaction conducted electrochemically.
- a cleaning treatment for example involving washing with alkali.
- the base layer is then subjected to a texture control treatment, for example involving an etching process, which increases the surface area of the substrate, which in turn controls the strength of the bond between the substrate and the image material and increases the ability of the substrate to hold water.
- This treatment can involve treatment with water, a solution of a phosphate or silicate salt, or a polycarboxylic acid.
- GB-1238701 published in 1971, discloses a process according to the pre-characterizing part of claim 1 for preparing a lithographic printing plate in which a surface of a foil such as of aluminium is subjected to a uniform treatment with a plasma arc jet. Finely dispersed silica introduced into the jet causes a layer of silicate to be formed on the surface of the foil.
- the process disclosed in the document does not appear to have been used commercially to produce plates.
- Substrates used in lithography can also be formed from materials other than aluminium, such as for example, another metal such as steel, a polymeric material such as a polyester, or a paper based material. Processes used to prepare such substrates for coating with light sensitive material vary widely from that used to prepare an aluminium substrate.
- the present invention provides a technique for making light sensitive printing plates such as might be used in lithographic processes, in which a surface coating is provided on a substrate by a thermal spraying technique.
- the invention provides a method of making a light sensitive printing plate for use in lithography, which comprises
- a plate can be formed in which performance is at least as good in many respects as that provided by traditional manufacturing methods which are used now and have been developed by parties across the lithographic products industry continuously over a period of many years.
- the technique of the invention has the advantage over traditional methods that the surface layer can be provided, of materials and having a structure which are dependent on the process by which it is applied to the substrate.
- This can be contrasted with existing processes in which a surface layer is created by modification of the base material of the substrate to create a surface layer with different properties, in which the material and structure of the surface layer of the substrate are dependent on the material and surface of the base material, in addition to the process used to create the surface layer.
- the invention therefore allows the steps in a process for preparing a substrate, of base material preparation and creation of a surface layer, effectively to be decoupled.
- thermal spraying technique has the additional advantage over traditional methods of making lithographic printing plates that the number of steps in the manufacturing process can be reduced.
- the path length i.e. the size of the active process area acting on the web of substrate material is considerably shorter when a thermal spraying technique is used, compared with traditional methods using electrochemical processing techniques. Consequently, the amount of substrate material that is wasted when equipment used to operate the method of the invention is started can be reduced considerably.
- the reduced number of process steps, or the reduced path length or both can reduce capital outlay, both in terms of manufacturing equipment and of space in which that equipment is operated.
- a process involving fewer steps is also easier to control to produce products with a consistent quality. It can also be arranged for the process to be operated more quickly than conventional processes.
- Thermal spraying techniques used for providing the surface layer of a substrate can produce a layer with a topology appropriate for bonding to it of a layer of image material, without separate etching or other texture control steps as are required in known aluminium substrate preparation processes.
- the topology of the surface of the substrate can be controlled relatively easily by adapting the parameters of the deposition process, giving the process of the invention greater flexibility and control than could be achieved in the conventional processes for producing printing plates.
- the creation of the surface layer from deposited material, rather than from the base material of the substrate makes less critical the selection of the base material of the substrate.
- the base material comprises a metal such as one based on aluminium
- a less pure grade of aluminium can be used than would be required if a surface layer of aluminium oxide were to be formed on the base material by oxidation of the base material.
- the requirement for thorough cleaning of the base material of a substrate can also be relaxed at least partially, removing or reducing the need for cleaning materials and reducing processing time, and removing or diminishing the problem of disposal of used cleaning materials. In this way, the costs of producing printing plates can be reduced by the method of the present invention.
- a further advantage of the use of a deposition technique for the manufacture of a plate, at least for certain combinations of substrate base material and coating material (such as an aluminium oxide based coating material deposited on aluminium base material) is that the lightness of the resulting plate can be higher than that of a plate made using the same material for the surface layer but by traditional techniques. This has the advantage that it can increase the contrast between the plate and an image on the plate, which can be important when assessing the image visually and when the image on the plate is to be optically scanned.
- Suitable dry deposition techniques include thermal spraying and sputtering.
- An example of thermal spraying techniques which might be applied includes flame spraying. It is particularly preferred that the process uses a plasma spraying technique.
- the spray When the deposition process employs a plasma spraying technique, it will generally be preferred for the spray to be applied in an atmosphere of an inert gas, for example of hydrogen, nitrogen or argon, or mixtures of these or other gases.
- the gas is heated in an electric arc to elevated temperature, for example of at least 10 4 °C, generally at least 2 x 10 4 °C. Notwithstanding the energy requirement of the electric arc, it has been found that the power required to operate the deposition process using a gas plasma spraying technique is significantly less than that required to operate the electrochemical technique in the conventional process for producing plates for use in the printing industry.
- the substrate base material in contact with a heat sink.
- the deposition technique and the heat sink properties are such that the temperature of the base material does not increase to the extent that the base material becomes annealed.
- the substrate base material might be maintained in close contact with a block of material with a high thermal mass, such as a relatively large block of a metallic material.
- the surface layer is formed from particles whose size is less than about 12 ⁇ m, more preferably less than about 8 ⁇ m, especially less than about 5 ⁇ m, for example from about 2 ⁇ m to about 3 ⁇ m.
- the roughness of the deposited surface layer can be maintained low.
- the size of the particles is measured using a Coulter counter, calibrated to U S Sedimentometer.
- the size is the average of the particles across the size distribution, taken as the 50% cumulative point of the distribution curve.
- a further advantage of plates made using the technique of the present invention is that the resulting plates have a better run length, compared with plates made using traditional techniques with the same surface layer material and comparable image resolution. (Run length is a measure of the number of impressions that can be taken from a plate when in use in printing process.)
- the surface layer that is formed from the small particles will be generally uniform over the coated area of the base material, as viewed for example under an electron microscope at about 1000x magnification and 45° tilt.
- the coating material used to form the surface layer will in some situations include particles whose size is bigger than that of the particles from which the surface layer is formed.
- the coating material might include impurities. It might also include particles which are bigger than the particles of the surface layer, to form regions of local roughness on the substrate base material so that formations are formed on the surface of the image layer.
- Such particles might be, for example, at least about 1.3 times that of the particles from which the surface layer is formed, preferably at least about 1.8 times that of those particles.
- the height of the bigger particles above the surface layer might be at least about 3 ⁇ m, preferably at least about 5 ⁇ m, more preferably at least about 7 ⁇ m, especially at least about 10 ⁇ m.
- the height of the bigger particles above the surface layer might be less than about 40 ⁇ m, preferably less than about 30 ⁇ m, especially less than about 20 ⁇ m.
- the size of the bigger particles (which will be a diameter in the case of particles with a circular cross-section) is greater than about 5 ⁇ m, more preferably greater than about 7 ⁇ m, especially greater than about 10 ⁇ m.
- the size is less than about 75 ⁇ m, more preferably less than about 50 ⁇ m, especially less than about 35 ⁇ m.
- the density of bigger particles on the surface layer can be at least about 50 cm -2 , preferably at least about 10 3 cm -2 , for example at least about 5 x 10 4 cm -2 .
- the density of particles can be less than about 5 x 10 6 cm -2 , and preferably less than about 10 6 cm -2 for many applications.
- the deposited surface layer is formed from a material which is capable of exhibiting ceramic-type properties.
- Desirable properties can include hardness, chemical resistance, and resistance to abrasion. Such properties can arise from rapid solidification of the deposited material on contact with the base material of the substrate.
- the provision of a surface with ceramic-type properties has the advantage of enabling the substrate prepared from the deposited material to withstand harsh physical conditions during use. Examples of materials capable of forming surface layers on a substrate, with ceramic-type properties include certain silicates, Al 2 O 3 , Cr 2 O 3 , TiO 2 , ZrO 2 , WC and blends of these materials, such as blends of Al 2 O 3 and TiO 2 .
- Other materials which can be applied to a substrate base material by deposition techniques, to form a substrate for use in lithography include metals such as aluminium, molybdenum, nickel, tantalum, zinc and chromium, alloys such as NiCr and NiCrAlY alloys, steels and bronzes, pseudo-alloys such as CrW and AlMo alloys, polymeric materials such as polyethylene and certain polyesters.
- the material of bigger particles included in the coating material to provide formations on the surface of the image layer can be the same as the material of the particles from which the surface layer is formed, or different.
- More than one material might be applied to the base material by deposition, in a single layer or in separate layers provided one on top of another.
- the base material of the substrate may comprise a metal, which might be a substantially pure elemental metal or an alloy.
- Suitable metals include, for example, iron based materials such as certain steels, copper and copper based alloys, nickel and cobalt alloys, and aluminium, magnesium and titanium and alloys based on these metals.
- Non-metallic materials might be used, such as ceramic materials, polymeric materials (such as certain polyesters) and paper based materials.
- the method of the invention will include appropriate steps to prepare the base material for the creation of the surface by deposition. These might include, for example, cleaning, etching, texturing, anodising, grinding or polishing of the surface.
- Especially preferred materials for the base material of the substrate include aluminium and aluminium based alloys, certain steels and certain polyesters.
- the substrate produced by the method will generally be in the form of a sheet.
- the sheet might be in discrete pieces, or in the form of a continuous web, perhaps provided on a roll.
- the substrate will generally be produced continuously on a sheet of moving substrate base material, by moving a sheet through production equipment.
- the sheet has a width measured in a direction perpendicular to the machine direction of at least about 0.2 m, more preferably at least about 0.3 m, especially at least about 0.5 m.
- the size and shape of particles supplied to the substrate in a thermal spraying process will be selected according to the desired surface topology of the finished coated substrate.
- the surface roughness R a of the substrate can be measured using a perthometer sold by Perthen under the designation CSD, using a PMK drive unit and a FTK 3/50e mechanical stylus head.
- the surface roughness is preferably less than about 3.0 ⁇ m, more preferably less than about 1.5 ⁇ m, for example about 0.7 ⁇ m.
- the surface may be provided with selected regions with a greater roughness, for example as a result of use of bigger particles, for example giving a peak to valley distance on the surface of the substrate greater than about 3 ⁇ m, especially greater than about 5 ⁇ m, perhaps in the range of 10 to 20 ⁇ m, and that any such regions are not to be considered in the context of measuring surface roughness.
- the thickness of the surface layer which is deposited on the base material will generally be less than about 100 ⁇ m, preferably less than about 40 ⁇ m, more preferably less than about 20 ⁇ m, especially less than about 10 ⁇ m, frequently less than about 5 ⁇ m.
- the thickness will generally be greater than about 0.1 ⁇ m, preferably greater than about 0.5 ⁇ m, and may be greater than about 10 ⁇ m.
- the layer of image material provided on the substrate may be provided over the entire surface of the layer of deposited material.
- the image layer might be exposed to a treatment which makes it relatively easier to remove in selected regions of the substrate than in other regions, in a subsequent removal step.
- the image material will generally form a bond initially to the surface layer of deposited material, at least in certain regions of the substrate, and will be capable of being modified to alter its susceptibility to a subsequent removal step.
- suitable developable materials of this kind include those based on diazonium/diazide materials, polymers which undergo depolymerisation or addition photo-polymerisation, and silver halide gelatin assemblies. Examples of suitable materials are disclosed in GB-1592281, GB-A-2031442, GB-A-2069164, GB-A-2080964, GB-A-2109573 and EP-A-377589.
- Image material may be applied to a substrate in selected regions only, so as to define directly the image and non-image areas of the substrate directly. This might be achieved, for example, using suitably driven fluid jets.
- the process of the invention can include steps by which the surface of the substrate is treated to change the nature of the interactions between it and a subsequently applied layer of image material.
- the steps can involve, for example, chemical, physical or electrochemical treatment.
- the steps might involve treatment with a material, grinding and polishing and so on.
- the treatment can be physical or chemical (including electrochemical) in nature.
- the deposited surface layer of material might be treated with water, a polyphosphonic acid, a solution of a phosphate or silicate salt, or with a polycarboxylic acid.
- a material for treating the surface of the substrate might be applied by a deposition technique.
- a substrate for use as a lithographic printing plate was made by plasma spraying Al 2 O 3 powder on a 0.3 mm gauge aluminium alloy sheet of designation AA1050.
- the Al 2 O 3 powder had a particle size of 3 ⁇ m, and was supplied by Abralap Limited under the trade name Abralox C3.
- An arrangement was used where the sheet was mounted vertically using a steel vacuum plate which also acted as a suitable heat sink. Spraying was carried out using a translational unit which allowed raster scanning of the plasma spraying torch about the plate at a fixed torch-plate distance.
- the spraying system comprised units supplied by Plasma-Technik, including a control unit designated M1100C, a torch designated F400MB, and a powder feed unit designated Twin 10, which had been modified by introducing a pipe into the unit to allow a further flow of 10 l.min -1 of argon above the powder (in addition to the standard carrier gas flow of 9 l.min -1 of argon associated with the unmodified unit). It was necessary to dehydrate the powder prior to its introduction into the feed unit.
- the substrate was used to produce a printing plate by (i) treatment with a solution of sodium dihydrogen phosphate, and (ii) bar coating in the laboratory with a light sensitive material of the type which is applied by Horsell Graphic Industries Limited to light sensitive lithographic printing plates sold by them under the trade mark CAPRICORN, at a coating weight of 2 g.m -2 .
- Substrates for use as printing plates were made by plasma spraying the following range of aluminium alloy sheets with Al 2 O 3 powder having a particle size of 5 ⁇ m, supplied by Abralap Limited under the trade name Abralox C5:
- the sheets were secured around a 200 mm diameter roller which acted as a heat sink. Spraying was performed by movement of the torch along the axis of the roller, as the roller rotated.
- the spraying system was the same as that described above in Example 1 (with some variations in the operating conditions), but for the powder feed unit being one without the additional flow of argon gas.
- Printing plates were made from the substrates by the technique described above in Example 1, and were exposed through an UGRA test pattern. Each of the plates was found to provide satisfactory resolution performance, with no detectable differences between the plates.
- a substrate was created using the apparatus and method described above in Example 2 (with some variations in the operating parameters of the spraying system), by spraying an AA1050 aluminium alloy sheet with SiO 2 powder having a particle size of 8 ⁇ m, sold by W R Grace Limited under the trade name Syloid Al-1.
- a printing plate was made from the substrate by the technique described above in Example 1, and was exposed through a UGRA test pattern. The plate was found to provide satisfactory resolution performance.
- Substrates were created using the apparatus and method described above in Example 1 (with some variations in the operating parameters of the spraying system), by spraying an AA1050 aluminium alloy sheet with Al 2 O 3 powders having a range of particle sizes from 3 to 20 ⁇ m.
- the substrates were used to produce printing plates as described above in Example 1, which were exposed through UGRA and STOUFFER test patterns, to create a clear 3 on the STOUFFER test pattern following development of the plates.
- the minimum "intact" positive mircolines on the UGRA test pattern were examined at the clear 3 expose level as a measure of printing plate resolution.
- Table 1 The results are summarised in Table 1, and compared favourably with the resolution of a plate that is produced by bar coating in the laboratory a conventional electrochemically produced substrate with a CAPRICORN type coating referred to above in Example 1, and which gave a resolution at "clear 3" of 20.
- the conventional electrochemically produced substrate used for the comparison was the same as is used on commercial production lines of CAPRICORN plates.
- a substrate was created using the apparatus and method described above in Example 2 (with some variations in the operating parameters of the spraying system), by spraying an AA1050 aluminium alloy sheet with 1:1 mixture by weight of Al 2 O 3 powders having particle sizes of 5 ⁇ m and 9 ⁇ m, sold by Abralap Limited under the trade names Abralox C5 and Abralox C9.
- a printing plate was made from the substrate by the technique described above in Example 1, and was exposed through a STOUFFER test pattern and a 2% dot screen. Following development to produce a "clear 3", the press performance was compared with that of a plate produced by bar coating in the laboratory of a CAPRICORN type coating as referred to above, exposed and developed to the same level. Run length was assessed by the disappearance of the 2% dot screen. A summary of the results is shown in Table 2. TABLE 2 Test Plasma produced plate Traditional plate Roll-up Comparable performance Clean-up Comparable performance Ink-water balance Comparable performance 2% dot disappearance 270000 impressions 168000 impressions
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Printing Plates And Materials Therefor (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
Claims (24)
- Verfahren zum Herstellen einer lichtempfindlichen Druckplatte, das umfaßt:(a) Herstellen einer Oberflächenschicht auf einem Substratträgermaterial durch Auftragen von teilchenförmigem Beschichtungsmaterial auf das Trägermaterial unter Verwendung eines thermischen Spritzverfahrens; und(b) Herstellen einer Bildschicht auf der aufgetragenen Oberflächenschicht, so daß sich die Oberflächenschicht zwischen dem Trägermaterial und der Bildschicht befindet;
dadurch gekennzeichnet, daß die Oberflächenschicht aus Teilchen besteht, deren Größe unter 15 µm liegt. - Verfahren nach Anspruch 1, wobei die Oberflächenschicht mit einem Plasmaspritzverfahren auf das Substratträgermaterial aufgetragen wird.
- Verfahren nach Anspruch 1 oder Anspruch 2, wobei die Oberflächenschicht aus Teilchen besteht, deren Größe unter 12 µm liegt.
- Verfahren nach einem der vorangehenden Ansprüche, wobei die Oberflächenschicht aus Teilchen besteht, deren Größe unter 8 µm liegt.
- Verfahren nach einem der vorangehenden Ansprüche, wobei die Oberflächenschicht aus Teilchen besteht, deren Größe unter 5 µm liegt.
- Verfahren nach einem der vorangehenden Ansprüche, wobei die Oberflächendchicht aus Teilchen besteht, deren Größe zwischen 2 µm und 3 µm liegt.
- Verfahren nach einem der Ansprüche 1 bis 6, wobei das Beschichtungsmaterial Teilchen enthält, deren Größe über der der Teilchen liegt, auf denen die Oberflächenschicht besteht, so daß Bereiche örtlich begrenzter Rauheit auf dem Substratträgermaterial entstehen und Formationen auf der Oberfläche der Bildschicht entstehen.
- Verfahren nach Anspruch 7, wobei die Größe der größeren Teilchen wenigstens das 1,3-fache der Teilchen beträgt, aus denen die Oberflächenschicht besteht.
- Verfahren nach Anspruch 7, wobei die Größe der größeren Teilchen wenigstens das 1,8-fache der Teilchen beträgt, aus denen die Oberflächenschicht besteht.
- Verfahren nach einem dar Ansprüche 1 bis 9, wobei das Substrat die Form einer Platte hat.
- Verfahren nach Anspruch 10, das kontinuierlich auf einer Bahn von sich bewegendem Substratträgermaterial ausgeführt wird, wobei die Breite der Bahn, in einer Richtung senkrecht zu der Maschinenrichtung gemessen, wenigstens 0,2 m beträgt.
- Verfahren nach einem der Ansprüche 1 bis 11, wobei das Substratträgermaterial ein Metallmaterial umfaßt.
- Verfahren nach Anspruch 12, wobei das Metallmaterial Aluminium umfaßt.
- Verfahren nach einem der Ansprüche 1 bis 13, wobei das Material der Oberflächenschicht ein Material umfaßt, das keramische Eigenschaften aufweisen kann.
- Verfahren nach Anspruch 14, wobei das Oberflächenschichtmaterial Al2O3 umfaßt.
- Verfahren nach einem der Ansprüche 1 bis 15, das den Schritt des Behandelns der Oberfläche das Oberflächenschichtmaterials vor dem Auftragen der Bildschicht zur Veränderung seiner Binde- oder Benetzungseigenschaften oder beider gegenüber der Bildschicht einschließt.
- Lichtempfindliche Druckplatte, die umfaßt:a) ein Substrat, das eine Oberflächenschicht enthält, die durch Auftragen von teilchenförmigem Beschichtungsmaterial auf ein Trägermaterial unter Verwendung eines thermischen Spritzverfahrens entsteht; undb) eine Schicht aus Bildmaterial auf der Oberfläche der aufgetragenen Schicht, auf der durch selektive Belichtung der Platte Bild- und Nichtbildbereiche hergestellt werden können;
dadurch gekennzeichnet, daß die Oberflächenschicht aus Teilchen besteht, deren Größe unter 15 µm liegt. - Druckplatte nach Anspruch 17, wobei das Beschichtungsmaterial Teilchen enthält, deren Größe über der der Teilchen liegt, die die Oberflächenschicht bilden, die Bereiche örtlich begrenzter Rauheit auf dem Substratträgermaterial bilden, so daß Formationen auf der Oberfläche der Bildschicht entstehen.
- Druckplatte nach Anspruch 17 oder Anspruch 18, wobei das Substrat die Form einer Bahn hat.
- Druckplatte nach Anspruch 19, deren kürzeste Querabmessung wenigstens 0,2 m beträgt.
- Druckplatte nach einem der Ansprüche 17 bis 20, wobei das Substrat ein Trägermaterial enthält, das ein Metallmaterial umfaßt.
- Druckplatte nach Anspruch 21, wobei das Metallmaterial Aluminium umfaßt.
- Druckplatte nach einem der Ansprüche 17 bis 21, wobei die aufgetragene Oberflächenschicht aus einem Material besteht, das keramische Eigenschaften aufweisen kann.
- Druckplatte nach Anspruch 23, wobei die aufgetragene Oberflächenschicht Al2O3 umfaßt.
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9219214 | 1992-09-10 | ||
GB929219214A GB9219214D0 (en) | 1992-09-10 | 1992-09-10 | Lithographic substrate preparation |
GB9308182A GB2277383A (en) | 1993-04-21 | 1993-04-21 | A light sensitive printing plate |
GB9308182 | 1993-04-21 | ||
PCT/GB1993/001910 WO1994005507A1 (en) | 1992-09-10 | 1993-09-09 | Printing plate |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0659119A1 EP0659119A1 (de) | 1995-06-28 |
EP0659119B1 true EP0659119B1 (de) | 1997-03-12 |
Family
ID=26301596
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP94908815A Expired - Lifetime EP0659119B1 (de) | 1992-09-10 | 1993-09-09 | Druckplatte und verfahren zur herstellung |
Country Status (8)
Country | Link |
---|---|
EP (1) | EP0659119B1 (de) |
JP (1) | JPH08501505A (de) |
AU (1) | AU4977693A (de) |
BR (1) | BR9307032A (de) |
DE (1) | DE69308861T2 (de) |
DK (1) | DK0659119T3 (de) |
ES (1) | ES2102209T3 (de) |
WO (1) | WO1994005507A1 (de) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5881645A (en) * | 1992-09-10 | 1999-03-16 | Lenney; John Richard | Method of thermally spraying a lithographic substrate with a particulate material |
WO1995007496A1 (en) * | 1993-09-09 | 1995-03-16 | Horsell Graphic Industries Ltd. | A light sensitive printing plate |
WO1996006200A1 (en) * | 1994-08-18 | 1996-02-29 | Horsell Graphic Industries Limited | Improvements in and relating to the manufacture of printing plates |
US6779449B1 (en) | 1994-09-15 | 2004-08-24 | Man Roland Druckmaschinen Ag | Carrying sleeve for printing and transfer forms and a process for production of such a carrying sleeve |
DE4432814A1 (de) * | 1994-09-15 | 1996-03-28 | Roland Man Druckmasch | Trägerhülse für Druck- und Übertragungsformen |
ES2135884T3 (es) * | 1995-03-17 | 1999-11-01 | Hoechst Ag | Procedimiento de aplicacion termica de finas capas ceramicas y dispositivo de aplicacion. |
DE19610015C2 (de) * | 1996-03-14 | 1999-12-02 | Hoechst Ag | Thermisches Auftragsverfahren für dünne keramische Schichten und Vorrichtung zum Auftragen |
US5711991A (en) * | 1995-11-20 | 1998-01-27 | Aluminum Company Of America | Process for making lithographic sheet material having a thermoplastic adhesive layer |
DE69612867T3 (de) * | 1995-11-24 | 2006-11-23 | Kodak Polychrome Graphics Co. Ltd., Norwalk | Hydrophilierter träger für flachdruckplatten und verfahren zu seiner herstellung |
US5795647A (en) * | 1996-09-11 | 1998-08-18 | Aluminum Company Of America | Printing plate having improved wear resistance |
GB9624224D0 (en) | 1996-11-21 | 1997-01-08 | Horsell Graphic Ind Ltd | Planographic printing |
GB9702568D0 (en) * | 1997-02-07 | 1997-03-26 | Horsell Graphic Ind Ltd | Planographic printing |
GB9710552D0 (en) | 1997-05-23 | 1997-07-16 | Horsell Graphic Ind Ltd | Planographic printing |
US6357351B1 (en) | 1997-05-23 | 2002-03-19 | Kodak Polychrome Graphics Llc | Substrate for planographic printing |
DE19839454A1 (de) | 1998-08-29 | 2000-03-02 | Agfa Gevaert Ag | Aufzeichnungsmaterial aus einem Träger und einer auf einer Oberfläche des Trägers aufgebrachten Keramikschicht |
US6293197B1 (en) | 1999-08-17 | 2001-09-25 | Kodak Polychrome Graphics | Hydrophilized substrate for planographic printing |
DE102004051262A1 (de) * | 2004-10-21 | 2006-04-27 | Man Roland Druckmaschinen Ag | Offsetdruckmaschine |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH126412A (de) * | 1927-05-26 | 1928-06-16 | Polygraphische Ges | Verfahren zum Körnen von Flachdruckplatten. |
US2032770A (en) * | 1934-01-26 | 1936-03-03 | Multigraph Co | Planographic printing plate |
US2032779A (en) * | 1934-01-26 | 1936-03-03 | Multigraph Co | Flexible composite planographic plate |
CH208963A (de) * | 1938-01-11 | 1940-03-15 | Walther Georg | Verfahren zur Herstellung von Druckplatten für den Hoch-, Tief- und Flachdruck. |
US3871881A (en) * | 1973-02-12 | 1975-03-18 | Minnesota Mining & Mfg | Coated aluminum substrates having a binder of aluminum hydroxyoxide |
DE3046757C2 (de) * | 1980-12-12 | 1985-09-12 | W.C. Heraeus Gmbh, 6450 Hanau | Tiefdruckzylinder |
DE3237775A1 (de) * | 1981-10-12 | 1983-04-28 | Daishin Kagaku Kogyo K.K., Niiza, Saitama | Material fuer eine plandruckplatte und verfahren zu dessen herstellung |
US4596189A (en) * | 1984-03-01 | 1986-06-24 | Surface Science Corp. | Lithographic printing plate |
US4526839A (en) * | 1984-03-01 | 1985-07-02 | Surface Science Corp. | Process for thermally spraying porous metal coatings on substrates |
-
1993
- 1993-09-09 AU AU49776/93A patent/AU4977693A/en not_active Abandoned
- 1993-09-09 ES ES94908815T patent/ES2102209T3/es not_active Expired - Lifetime
- 1993-09-09 EP EP94908815A patent/EP0659119B1/de not_active Expired - Lifetime
- 1993-09-09 DK DK94908815.7T patent/DK0659119T3/da active
- 1993-09-09 WO PCT/GB1993/001910 patent/WO1994005507A1/en active IP Right Grant
- 1993-09-09 JP JP6507029A patent/JPH08501505A/ja active Pending
- 1993-09-09 BR BR9307032A patent/BR9307032A/pt not_active IP Right Cessation
- 1993-09-09 DE DE69308861T patent/DE69308861T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DK0659119T3 (da) | 1997-07-28 |
AU4977693A (en) | 1994-03-29 |
WO1994005507A1 (en) | 1994-03-17 |
DE69308861D1 (de) | 1997-04-17 |
DE69308861T2 (de) | 1997-10-02 |
EP0659119A1 (de) | 1995-06-28 |
BR9307032A (pt) | 1999-06-29 |
ES2102209T3 (es) | 1997-07-16 |
JPH08501505A (ja) | 1996-02-20 |
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