EP0511274B1 - Vorrichtung zur oberflächenbehandlung von werkstücken mittels lichtstrahlen - Google Patents

Vorrichtung zur oberflächenbehandlung von werkstücken mittels lichtstrahlen Download PDF

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Publication number
EP0511274B1
EP0511274B1 EP91902949A EP91902949A EP0511274B1 EP 0511274 B1 EP0511274 B1 EP 0511274B1 EP 91902949 A EP91902949 A EP 91902949A EP 91902949 A EP91902949 A EP 91902949A EP 0511274 B1 EP0511274 B1 EP 0511274B1
Authority
EP
European Patent Office
Prior art keywords
reflector
workpiece
arc lamp
cooling
lamp
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP91902949A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP0511274A1 (de
Inventor
Clemens Meyer-Kobbe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MEYER KOBBE CLEMENS
Original Assignee
MEYER KOBBE CLEMENS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MEYER KOBBE CLEMENS filed Critical MEYER KOBBE CLEMENS
Publication of EP0511274A1 publication Critical patent/EP0511274A1/de
Application granted granted Critical
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
    • C21D1/34—Methods of heating
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
    • C21D1/06—Surface hardening
    • C21D1/09—Surface hardening by direct application of electrical or wave energy; by particle radiation

Definitions

  • the invention relates to a device for large surface treatment, e.g. Hardening, remelting, coating, alloying, workpieces, especially metals, by means of light rays.
  • a device for large surface treatment e.g. Hardening, remelting, coating, alloying, workpieces, especially metals, by means of light rays.
  • surface treatment of workpieces e.g. Hardening, remelting, coating, alloying, workpieces, especially metals.
  • an annealing furnace with a long arc lamp is known.
  • the longbow lamp is in a closed room. Static operation is planned.
  • the known device works at relatively low temperatures, namely annealing temperatures, to heal lattice dislocations and thus relieve internal stresses.
  • An aspherical reflector is used and the lamp is operated in pulsed mode in order to achieve high energy for a short time to heal the lattice dislocations.
  • An even distribution of energy is provided, the irradiated area should not exceed twelve times the light-emitting area of the lamp.
  • the lamp and / or the workpiece are arranged outside the beam center of the reflector in order to maintain uniform illumination of the workpiece.
  • the individual beams are imaged at different points so that there is no bundling, that is to say no focusing of the lamp beams.
  • the device comprises an elliptical mirror, in or near which a near-mirror focal point an arc lamp is arranged as a practically punctiform radiation source for high-temperature radiation and in or near whose other focal point away from the mirror the workpiece is arranged.
  • a punctiform treatment of the surface of the workpiece can be achieved, so that large-area treatments can only be carried out with difficulty and incompletely.
  • JP-A-59 181 528 and JP-A-56 80 138 disclose the use of a low-power long-arc lamp for the annealing treatment of silicon single crystals.
  • the lamp and silicon single crystal are designed to be 2-dimensionally movable relative to one another.
  • Such silicon single crystals have wall thicknesses of less than 1 mm and relatively poor temperature control conditions.
  • the annealing treatment is intended to eliminate grid defects, but the grid structure is to be retained in full. To achieve this, the temperature used must be low and the duration of the treatment short.
  • the object of the present invention is in designing a device of the type mentioned at the outset in such a way that large-area treatment of workpiece surfaces is effortlessly possible even with high beam power.
  • the drawing shows a device for the surface treatment of workpieces.
  • the device comprises a reflector 1 with an elliptical cylindrical surface 11 and side end walls 12 which support a high-power arc lamp 2 arranged approximately in the reflector-near focus, the light rays 30 of which are focused on a line focus 4 remote from the reflector, cf. Fig. 1.
  • the surface of a workpiece 3 to be treated is located in or near this line focus 4.
  • the workpiece 3 is arranged to be movable three-dimensionally with the aid of a device (not shown), which is indicated by the coordinate cross XYZ and the movement arrows 5.
  • the reflector 1 can be arranged to be three-dimensionally movable. The relative movement between the workpiece and the reflector 1 or the lamp beam of the reflector can be controlled by a CNC control, with either the workpiece or the reflector or both parts being moved.
  • the reflector 1 with the high-power long-arc lamp 2 can be adjusted to the side at an angle ⁇ between zero and 90 ° orthogonal to the relative movement 5, so that the machining track width 6 can be set, cf. Fig. 2.
  • coolable screens 7, 7 'arranged in the beam path 30 are provided for beam limitation, cf. 3 and 4, the diaphragms 7 serving to limit the width of the irradiation area (FIG. 3) and the diaphragms 7 'serving to limit the length of the irradiation area (FIG. 4) of the workpiece 3.
  • the limitation of the width of the irradiation area can also by mirrors 8 (Fig. 5) and 18 (Fig. 7) and 28 (Fig. 9) and the limitation of the length of the irradiation area by mirrors 8 '(Fig. 6) and 18' ( Fig. 8) take place.
  • the reflector 1 can be pivoted about the longitudinal axis of the long-arc lamp 2 such that the workpiece surface normal and the reflector normal are at an angle ⁇ about the longitudinal axis of the long-arc lamp, as shown in FIG. 10 is shown. Furthermore, the reflector 1 with the longitudinal axis of the long-arc lamp 2 lying approximately in the reflector-near focus can be inclined at an angle ⁇ transverse to the longitudinal axis of the long-arc lamp, cf. Fig. 11.
  • a cooling device 25 for example in the form of a tube or a plate-shaped hollow body with nozzles 26 pointing towards the workpiece 3, can be moved into the beam path 30 between the reflector 1 and the workpiece 3 in order to move the heated peripheral layer or the heated surface as quickly as possible cool down, cf. Fig. 12, 13. At the same time, this device can serve as an aperture to limit the beam path.
  • the cooling device 25 can be arranged in such a way that workpiece quenching during relative movement in the direction of the longitudinal axis of the line focus, cf. Fig. 13, or that a workpiece quenching with relative movement transverse to the longitudinal axis of the line focus, cf. Fig. 12 is reached.
  • the cooling device can advantageously be a type of water shower, in order to be able to better quench the workpiece edge layer with water, particularly in the case of long exposure times to the beam.
  • a processing gas flow 31 can be provided transversely, primarily against the feed direction when the workpiece is moving or in the feed direction when the reflector is moving between the workpiece and the reflector.
  • a device 27 with a processing gas nozzle 29 can be arranged below or to the side of the reflected beam 30, cf. 14 and 15.
  • the processing nozzles 29 can also be integrated into the reflector, as shown in FIG. 16, primarily at locations in the reflector which do not or only to a small extent contribute to the radiation intensity in the line focus; these locations are, for example, the zenith of the reflector or the side walls 12 of the reflector.
  • This arrangement of the machining gas nozzles has the advantage that the water vapor generated is blown away from the reflector when water is quenched.
  • the lamp power can be reduced in accordance with the heat conduction conditions or the workpiece preheating.
  • the device described above can be used excellently for large surface treatment of workpieces.
  • the light of the high-power long-arc lamp 2 is focused on the surface of the workpiece 3 with the aid of the reflector 1, either providing a relative movement between the workpiece and the reflector for heating across the area or stationary heating of the surface layer in order to heat the surface layer and at high levels
  • a quenching medium for example water.
  • cooling of the workpieces with greater wall thickness can be achieved by self-quenching.
  • the quenching is advantageously carried out with water, as has already been mentioned above.
  • the intensity in the line focus i. H. the lamp power and / or the beam exposure time are chosen so small that the melting temperature of the workpiece surface layer is not reached.
  • the workpiece can also be subjected to a further heat treatment before the lamp beam treatment or after the lamp beam treatment.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Heat Treatment Of Articles (AREA)
  • Control Of Resistance Heating (AREA)
  • Optical Elements Other Than Lenses (AREA)
EP91902949A 1990-01-18 1991-01-15 Vorrichtung zur oberflächenbehandlung von werkstücken mittels lichtstrahlen Expired - Lifetime EP0511274B1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE4001280A DE4001280A1 (de) 1990-01-18 1990-01-18 Vorrichtung zur oberflaechenbehandlung von werkstuecken mittels lichtstrahlen
DE4001280 1990-01-18
PCT/EP1991/000055 WO1991010751A1 (de) 1990-01-18 1991-01-15 Vorrichtung zur oberflächenbehandlung von werkstücken mittels lichtstrahlen

Publications (2)

Publication Number Publication Date
EP0511274A1 EP0511274A1 (de) 1992-11-04
EP0511274B1 true EP0511274B1 (de) 1994-07-27

Family

ID=6398281

Family Applications (1)

Application Number Title Priority Date Filing Date
EP91902949A Expired - Lifetime EP0511274B1 (de) 1990-01-18 1991-01-15 Vorrichtung zur oberflächenbehandlung von werkstücken mittels lichtstrahlen

Country Status (7)

Country Link
EP (1) EP0511274B1 (enrdf_load_stackoverflow)
JP (1) JPH05505213A (enrdf_load_stackoverflow)
AT (1) ATE109210T1 (enrdf_load_stackoverflow)
CA (1) CA2074265A1 (enrdf_load_stackoverflow)
DE (1) DE4001280A1 (enrdf_load_stackoverflow)
ES (1) ES2061233T3 (enrdf_load_stackoverflow)
WO (1) WO1991010751A1 (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019036269A1 (en) * 2017-08-16 2019-02-21 Mattson Technology, Inc. THERMAL TREATMENT OF CLOSED SHAPE WORKPIECES

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5444814A (en) * 1993-11-01 1995-08-22 Hofius, Sr.; David V. Method of infrared welding on thermoplastic parts utilizing contoured energy reflecting shields
AT407261B (de) * 1997-04-23 2001-02-26 Boehler Uddeholm Ag Verfahren zur ausbildung einer schicht auf substrate durch aufbringen von thermischer energie
DE10108926C1 (de) * 2001-02-23 2003-01-02 Advanced Photonics Tech Ag Wärmebehandlungsverfahren und -anordnung für Metallgegenstände
DE10125467C2 (de) * 2001-05-25 2003-04-10 Arccure Technologies Gmbh Bestrahlungsvorrichtung mit einer Anordnung von optischen Wellenleitern
DE10157554B4 (de) * 2001-11-23 2006-06-29 Air Liquide Deutschland Gmbh Anlage zum Strahlungshärten
US6947665B2 (en) * 2003-02-10 2005-09-20 Axcelis Technologies, Inc. Radiant heating source with reflective cavity spanning at least two heating elements
WO2005014869A2 (en) * 2003-07-17 2005-02-17 Queen City Forging Co. Process of preparing metal parts to be heated by means of infrared radiance
DE102005035626A1 (de) * 2005-07-29 2007-02-01 Zf Friedrichshafen Ag Verfahren zum Anlassen von Bauteilen

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2156352A (en) * 1937-12-09 1939-05-02 Thomas F Peterson Heating device
CA968855A (en) * 1971-11-26 1975-06-03 Matsushita Electric Industrial Co., Ltd. Apparatus for welding, fusing or heating workpiece utilizing energy of a light beam
GB2083728B (en) * 1980-09-04 1984-06-20 Ushio Electric Inc Annealing furnace
EP0372850A1 (en) * 1988-12-02 1990-06-13 Vickers Shipbuilding & Engineering Limited Improvements in or relating to the heating of substances

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019036269A1 (en) * 2017-08-16 2019-02-21 Mattson Technology, Inc. THERMAL TREATMENT OF CLOSED SHAPE WORKPIECES
TWI794267B (zh) * 2017-08-16 2023-03-01 美商得昇科技股份有限公司 封閉形工件之熱處理

Also Published As

Publication number Publication date
JPH05505213A (ja) 1993-08-05
DE4001280A1 (de) 1991-07-25
EP0511274A1 (de) 1992-11-04
DE4001280C2 (enrdf_load_stackoverflow) 1992-09-17
CA2074265A1 (en) 1991-07-19
ES2061233T3 (es) 1994-12-01
ATE109210T1 (de) 1994-08-15
WO1991010751A1 (de) 1991-07-25

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