CA2074265A1 - Device for treating the surfaces of workpieces with light beams - Google Patents
Device for treating the surfaces of workpieces with light beamsInfo
- Publication number
- CA2074265A1 CA2074265A1 CA002074265A CA2074265A CA2074265A1 CA 2074265 A1 CA2074265 A1 CA 2074265A1 CA 002074265 A CA002074265 A CA 002074265A CA 2074265 A CA2074265 A CA 2074265A CA 2074265 A1 CA2074265 A1 CA 2074265A1
- Authority
- CA
- Canada
- Prior art keywords
- reflector
- workpiece
- arc lamp
- order
- cooling
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 230000005855 radiation Effects 0.000 claims abstract description 14
- 238000001816 cooling Methods 0.000 claims description 12
- 238000010438 heat treatment Methods 0.000 claims description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 8
- 239000011248 coating agent Substances 0.000 claims description 7
- 238000000576 coating method Methods 0.000 claims description 7
- 238000005275 alloying Methods 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 150000002739 metals Chemical class 0.000 claims description 3
- 238000011282 treatment Methods 0.000 abstract description 15
- 238000004381 surface treatment Methods 0.000 description 9
- 238000010791 quenching Methods 0.000 description 8
- 230000000171 quenching effect Effects 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 238000001354 calcination Methods 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 230000007547 defect Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000013021 overheating Methods 0.000 description 2
- SUBDBMMJDZJVOS-UHFFFAOYSA-N 5-methoxy-2-{[(4-methoxy-3,5-dimethylpyridin-2-yl)methyl]sulfinyl}-1H-benzimidazole Chemical compound N=1C2=CC(OC)=CC=C2NC=1S(=O)CC1=NC=C(C)C(OC)=C1C SUBDBMMJDZJVOS-UHFFFAOYSA-N 0.000 description 1
- 229910001018 Cast iron Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000001174 ascending effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000035876 healing Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
- C21D1/34—Methods of heating
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
- C21D1/06—Surface hardening
- C21D1/09—Surface hardening by direct application of electrical or wave energy; by particle radiation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Heat Treatment Of Articles (AREA)
- Optical Elements Other Than Lenses (AREA)
- Control Of Resistance Heating (AREA)
Abstract
A device for treating the surfaces of workpieces with light beams, comprising a reflector and an arc lamp, can treat large areas of workpieces. To this end, the reflector (1) has an elliptical cylindrical surface (11). A powerful long-arc lamp (2) is arranged at or near the focus of said surface nearer the reflector. The workpiece (3) to be treated is arranged on or near the line focus (4) remote from the reflector, on which the surface (11) focuses the light. The reflector can be tilted in several directions in relation to the surface of the workpiece so that the treatment track width can be adjusted and the heat in the radiation focus controlled. In addition, diaphragms and mirrors for reducing the irradiated surface are provided.
Description
7 ~
T~E: DE~CEFORTREATINGTHESURFACES OFWORKPECES WITHLIGHT
BFAMS
This invention concerns a device for hardening, remelting, coating, alloying and dispersing large areas of workpieces, especially metals, by means of beams of light. For reasons o~
simplicity, hardening, remelting, coating, alloying and dispersing workpieces are referred to below as surface treatment of workpieces.
For surface treatment (hardening, remelting, alloying, coating, etc.) of metals, methods using radiation have already been employed in isolated cases. Electron beam installations have been used and to an increasing extent, lasers are also used. The high cost is a disadvantage and the limited beam power is a special problem o~ lasers.
British Patent 2;083,728 describes a calcining oven with a long-arc lamp which is mounted in a closed space. Static operation is intended. The known device operates at relatively low , temperatures, namely calcination temperatures, in order to heal lattice defects and thus dissipate internal stresses. An aspherical reflector is used and the lamp is operated in pulsed operation in order to achieve a high energy for healing the lattice defects. A uniform energy distribution is provided and the irradiated surface should not excee~ 12 times the light emitting area of the lamp. The lamp and/or workpiece is mounted outside the beam center of the reflector in this prior art document in order to obtain uniform lighting of the workpiece. The ind vidual beams are imaged in individual points so there is no bundling, i.e., no focusing of the rays from the lamp.
German Patent (ALS) 2,257,739 describes a device for welding, remelting or heating a workpiece with light eneryy. This device includes an elliptical mirror with an arc lamp mounted as a practically point-shaped radiation source for high temperature radiation in or near the focal point that is close to the mirror . . . . .
, ~t~7 ~ ; ,J
and the workpiece is mounted in or near the other focal point that is remote from the mirror. Due to such an arrangement, practically only a point treatment of the surface of the workpiece can be achieved, so large area treatments are tedious to perform and ` cannot be complete.
Japanese Patent A 59/181,528 and Japanese Patent A 56/80,138 describe the usP of a long-arc lamp of a low power for calcination of single crystals of silicon. The lamp and silicon single crystal are designed so they can be moved in two dimensions relative to each other. Such silicon single crystals have a wall thickness of less than 1 mm and have a relatively poor thermal conductivity.
This calcination treatment should eliminate lattice defects but the lattice structure should be completely preserved. In order to accomplish this goal, the temperature must be low and the treatment time must be short. These known devices and this known equipment for treatment of silicon single crystals are not suitable for hardening and remelting, i.e., for solid and liquid phase conversion, nor are they suitable for coating workpieces by means of rays of light.
- The problem on which the present invention is based is to develop a device of the type describecl~initially that permits large-area surface treatment of workpieces easily with a high beam power.
This problem is solved by the embodiment according to Claim 1.
With the help of the solution to the problem according to this invention, it is possible to perform a large-area surface treatment with high power lamps.
Advantageous and expedient embodiments of the solution to the problem according to this invention are characterized in the subclaims.
This invention will be illustrated in greater ~etail below on ~;; the basis of the accompanying figures which show the ~ollowing:
Figure 1 shows a schematic perspective view of a device according to this invention with a reflector and a long-arc lamp for surface treatment of a workpiece.
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' . ' . ' ' ' ' 2'~ ~L3)J~
Figure 2 shows a schematic diagram of the device according to this invention according to Figure 1 in an inclined position for adjusting the working track width.
Figures 3 and 4 show the device according to Figure 1 or 2 with additional use of apertures for limiting the radiation.
Figures 5 to 9 show the device according to Figures 1 or 2 with additional use of mirrors for limiting irradiation.
Figure 10 shows the device according to this invention in an angular position where the reflector normal is at an angle between the workpiece and the device, where the slope is to the longitudinal axis of the long-arc lamp.
Figure 11 shows a device according to this invention with the reflector inclined to the [longitudinal axis~1 between the reflector and workpiece, where the slope is across the longitudinal axis.
Figures 12 and 13 show the device according to this invention with the additional use of a water spray for cooling and for shielding the radiation with a relative movement in the direction of and across the longitudinal axis of the line focus.
Figures 14 to 16 show the device according to this invention with a device for supplying a processing gas stream.
In the figures shown here, the same parts are provided with the same reference numbers.
The figure shows a device for surface treatment of workpieces.
The device includes a reflector 1 with an elliptical cylindrical surface 11 and side walls 12 that hold a high power arc lamp 2 arranged in the focus near the reflector whose beams of light 30 are focused on a line focus 4 that is remote from the reflector (see Figure 1).
The surface of a workpiece 3 to be treated is in or near this line focus 4. Workpiece 3 is arranged so it can be moved in three dimensions with the help of a device (not shown3 as indicated by 1Translator's Note: The term in brackets has been added to correct an apparent omission in the original text.
~ 3 the coordinate intersection XYZ and the arrows 5. Instead of the workpiece or in addition to the workpiece, the reflector 1 may also be arranged so it can be moved in three dimensions. The relative movement between the workpiece and reflector 1 or the lamp beam of the reflector can be controlled by means of a CNC control system whereby either the workpiece or the reflector or both are moved.
Reflector 1 with the high power long-arc lamp 2 is adjustable at the side at an angle ~ between O and 90 orthogonally to the relative movement indicated by arrows S in order to be able to adjust the working track width 6 (see Figure 2).
In order to reduce the irradiation area on the surface of workpiece 3, coolable apertures 7, 7' arranged in the path of the beam 30 are provided to limit the beam (see Figures 3 and 4), whereby the apertures 7 serve to limit the width of the radiation area (Figure 3) and the apertures 7' serve to limit the length of the radiation area (Figure 4) of workpiece 3.
The width of the radiation area can also be limited by mirror 8 (Figure 5) and mirror 18 (Figure 7) and mirror 28 (Figure 9) and the length of the radiation surface can be limited by mirror 8' (Figure 6) and 18' (Figure 8).
In order to improve the heating ancl cooling processes in the edge layer of the workpiece, reflector 1 can be pivoted about the longitudinal axis of long-arc lamp 2 in such a way that the workpiece surface normal and the reflector normal are at an angle B about the longitudinal axis of the long-arc lamp to each other as illustrated in Figure 10. Furthermore, reflector 1 can be inclined with the longitudinal axis of the long-arc lamp 2 approximately in the focus near the reflector at an angle J across the longitudinal axis of the long-arc lamp (see Figure 11).
In this way a controlled influence on heating in the radiation line focus is possible, especially to avoid overheating of workpiece areas with a reduced thermal conduction, e.g., edges and corners.
A cooling device 25, e.g., in the form of a tube or a plate-shaped hollow body with nozzles 26 pointing toward workpiece 3 can -~
, .
2 ~
~e moved into the path of the beam 30 between the reflector 1 a workpiece 3 in order to cool the heated edge layer or the heat~
surface as rapidly as possible (see Figures 12, 13). At the san time, this device can serve as an aperture to limit the path of t~
beam. Cooling device 25 can be arranged in such a way tha quenching of the workpiece is achieved with a relative movement i the direction of the line focus longitudinal axis (see Figure 13 or quenching of the workpiece is achieved with a relative movemen across the line focus longitudinal axis (see Figure 12). It may b~
advantageous for the cooling device to be a type of water sprinkle in order to be able to better quench the edge layer of th~
workpiece with water especially with long beam treatment times.
In order to prevent soiling of the reflector due to the gasec and vapors ascending from the workpiece surface, a processing gac stream 31 may be directed across or especially against the direction of forward movement between the reflector and the workpiece when the workpiece is moved or in the direction of movement when the reflector is moved. ~or this purpose, a device 27 with a processing gas nozzle 2g may be arranged beneath or to the side of the reflected beam bundle 30 (see Figures 14 and 15).
The processing nozzle 29 may also be integrated into the reflector as illustrated in Figure 16, mainly at locations in the reflector that make little or no contribution to the beam intensity in the line focus. These locations include, for example, the zenith of the reflector or the side walls of the reflector. This arrangement of the processing nozzles has the advantage that when using water for quenching, the resulting water vapor is blown away from the reflector.
In order to eliminate a warmup area where the thermal conductivity conditions are not steady state at the start of the surface treatment or when starting up the treatment over a workpiece edge for a short period of time, especially more than 3 seconds, the relative movement between the workpiece and reflector is omitted and the workpiece surface is exposed to the radiation under stationary conditions.
~ , ', " ' ~
, ' ', h ~ J " ~
To avoid overheating o~ the workpiece edge area when passing over the edge of the workpiece or an area of the workpiece where dissipation of heat is reduced, the lamp power may be reduced in accordance with the thermal conductivity conditions or the preheating of the workpiece.
The device described above may be used for large area surface treatment of workpieces. For this surface treatment, the light of the high power long-arc lamp ~ is focused on the surface of workpiece 3 with the help of reflector 1 whereby there is either a relative movement between the workpiece and the reflector for heating over the surface or there is stationary heating of the edge layer in order to heat the edge layer and melt it at a high intensity in the focus and/or with a long beam treatment time and then cool it by self-quenching or by quenching with a medium such as water. In the case of rapid heating, i.e., high intensities in the line focus and short beam trea-tment times, cooling of workpieces with a large wall thickness mainly greater than 20 mm can be accomplished by means of self-quenching. With long beam treatment times, the quenching is preferably performed with water as mentioned above. In order to harden the surface of a workpiece, the intensity in the line focus, i.e., the lamp power and/or the beam treatment time selected will be so small that the melting temperature of the workpiece edge layer is not reached.
For remelting, coating, dispersing and alloying with lamps, it is preferable to work with high intensities in the line focus of the reflector, i.e., with high lamp powers and/or long beam treatment times in order in this way to reach the melting point of the workpiece and also that of the second material in coating and alloying.
It should be pointed out that no absorption increasing agents need be applied to the surface of the workpiece for eneryy input of the radiation of the device according to this invention into the workpiece surface of steel and cast iron or a number of other materials.
The workpSece can also be subjected to another heat treatment , , .
"': ' ' ' , ~,J~,;., before the lamp treatment or after the lamp treatment.
,,`
"
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:
, ' '' ' . , . . . : . ~ ~
.
. -. : . . : ~ :
' . . . ..
, ' , . . , , '' ' .' ~ ~
. .
: ' ' ~ ' '' ' ':
T~E: DE~CEFORTREATINGTHESURFACES OFWORKPECES WITHLIGHT
BFAMS
This invention concerns a device for hardening, remelting, coating, alloying and dispersing large areas of workpieces, especially metals, by means of beams of light. For reasons o~
simplicity, hardening, remelting, coating, alloying and dispersing workpieces are referred to below as surface treatment of workpieces.
For surface treatment (hardening, remelting, alloying, coating, etc.) of metals, methods using radiation have already been employed in isolated cases. Electron beam installations have been used and to an increasing extent, lasers are also used. The high cost is a disadvantage and the limited beam power is a special problem o~ lasers.
British Patent 2;083,728 describes a calcining oven with a long-arc lamp which is mounted in a closed space. Static operation is intended. The known device operates at relatively low , temperatures, namely calcination temperatures, in order to heal lattice defects and thus dissipate internal stresses. An aspherical reflector is used and the lamp is operated in pulsed operation in order to achieve a high energy for healing the lattice defects. A uniform energy distribution is provided and the irradiated surface should not excee~ 12 times the light emitting area of the lamp. The lamp and/or workpiece is mounted outside the beam center of the reflector in this prior art document in order to obtain uniform lighting of the workpiece. The ind vidual beams are imaged in individual points so there is no bundling, i.e., no focusing of the rays from the lamp.
German Patent (ALS) 2,257,739 describes a device for welding, remelting or heating a workpiece with light eneryy. This device includes an elliptical mirror with an arc lamp mounted as a practically point-shaped radiation source for high temperature radiation in or near the focal point that is close to the mirror . . . . .
, ~t~7 ~ ; ,J
and the workpiece is mounted in or near the other focal point that is remote from the mirror. Due to such an arrangement, practically only a point treatment of the surface of the workpiece can be achieved, so large area treatments are tedious to perform and ` cannot be complete.
Japanese Patent A 59/181,528 and Japanese Patent A 56/80,138 describe the usP of a long-arc lamp of a low power for calcination of single crystals of silicon. The lamp and silicon single crystal are designed so they can be moved in two dimensions relative to each other. Such silicon single crystals have a wall thickness of less than 1 mm and have a relatively poor thermal conductivity.
This calcination treatment should eliminate lattice defects but the lattice structure should be completely preserved. In order to accomplish this goal, the temperature must be low and the treatment time must be short. These known devices and this known equipment for treatment of silicon single crystals are not suitable for hardening and remelting, i.e., for solid and liquid phase conversion, nor are they suitable for coating workpieces by means of rays of light.
- The problem on which the present invention is based is to develop a device of the type describecl~initially that permits large-area surface treatment of workpieces easily with a high beam power.
This problem is solved by the embodiment according to Claim 1.
With the help of the solution to the problem according to this invention, it is possible to perform a large-area surface treatment with high power lamps.
Advantageous and expedient embodiments of the solution to the problem according to this invention are characterized in the subclaims.
This invention will be illustrated in greater ~etail below on ~;; the basis of the accompanying figures which show the ~ollowing:
Figure 1 shows a schematic perspective view of a device according to this invention with a reflector and a long-arc lamp for surface treatment of a workpiece.
', ,: .,'.:, :
- , , ~ ' ,: ' ' . ' ., - ~ .
' . ' . ' ' ' ' 2'~ ~L3)J~
Figure 2 shows a schematic diagram of the device according to this invention according to Figure 1 in an inclined position for adjusting the working track width.
Figures 3 and 4 show the device according to Figure 1 or 2 with additional use of apertures for limiting the radiation.
Figures 5 to 9 show the device according to Figures 1 or 2 with additional use of mirrors for limiting irradiation.
Figure 10 shows the device according to this invention in an angular position where the reflector normal is at an angle between the workpiece and the device, where the slope is to the longitudinal axis of the long-arc lamp.
Figure 11 shows a device according to this invention with the reflector inclined to the [longitudinal axis~1 between the reflector and workpiece, where the slope is across the longitudinal axis.
Figures 12 and 13 show the device according to this invention with the additional use of a water spray for cooling and for shielding the radiation with a relative movement in the direction of and across the longitudinal axis of the line focus.
Figures 14 to 16 show the device according to this invention with a device for supplying a processing gas stream.
In the figures shown here, the same parts are provided with the same reference numbers.
The figure shows a device for surface treatment of workpieces.
The device includes a reflector 1 with an elliptical cylindrical surface 11 and side walls 12 that hold a high power arc lamp 2 arranged in the focus near the reflector whose beams of light 30 are focused on a line focus 4 that is remote from the reflector (see Figure 1).
The surface of a workpiece 3 to be treated is in or near this line focus 4. Workpiece 3 is arranged so it can be moved in three dimensions with the help of a device (not shown3 as indicated by 1Translator's Note: The term in brackets has been added to correct an apparent omission in the original text.
~ 3 the coordinate intersection XYZ and the arrows 5. Instead of the workpiece or in addition to the workpiece, the reflector 1 may also be arranged so it can be moved in three dimensions. The relative movement between the workpiece and reflector 1 or the lamp beam of the reflector can be controlled by means of a CNC control system whereby either the workpiece or the reflector or both are moved.
Reflector 1 with the high power long-arc lamp 2 is adjustable at the side at an angle ~ between O and 90 orthogonally to the relative movement indicated by arrows S in order to be able to adjust the working track width 6 (see Figure 2).
In order to reduce the irradiation area on the surface of workpiece 3, coolable apertures 7, 7' arranged in the path of the beam 30 are provided to limit the beam (see Figures 3 and 4), whereby the apertures 7 serve to limit the width of the radiation area (Figure 3) and the apertures 7' serve to limit the length of the radiation area (Figure 4) of workpiece 3.
The width of the radiation area can also be limited by mirror 8 (Figure 5) and mirror 18 (Figure 7) and mirror 28 (Figure 9) and the length of the radiation surface can be limited by mirror 8' (Figure 6) and 18' (Figure 8).
In order to improve the heating ancl cooling processes in the edge layer of the workpiece, reflector 1 can be pivoted about the longitudinal axis of long-arc lamp 2 in such a way that the workpiece surface normal and the reflector normal are at an angle B about the longitudinal axis of the long-arc lamp to each other as illustrated in Figure 10. Furthermore, reflector 1 can be inclined with the longitudinal axis of the long-arc lamp 2 approximately in the focus near the reflector at an angle J across the longitudinal axis of the long-arc lamp (see Figure 11).
In this way a controlled influence on heating in the radiation line focus is possible, especially to avoid overheating of workpiece areas with a reduced thermal conduction, e.g., edges and corners.
A cooling device 25, e.g., in the form of a tube or a plate-shaped hollow body with nozzles 26 pointing toward workpiece 3 can -~
, .
2 ~
~e moved into the path of the beam 30 between the reflector 1 a workpiece 3 in order to cool the heated edge layer or the heat~
surface as rapidly as possible (see Figures 12, 13). At the san time, this device can serve as an aperture to limit the path of t~
beam. Cooling device 25 can be arranged in such a way tha quenching of the workpiece is achieved with a relative movement i the direction of the line focus longitudinal axis (see Figure 13 or quenching of the workpiece is achieved with a relative movemen across the line focus longitudinal axis (see Figure 12). It may b~
advantageous for the cooling device to be a type of water sprinkle in order to be able to better quench the edge layer of th~
workpiece with water especially with long beam treatment times.
In order to prevent soiling of the reflector due to the gasec and vapors ascending from the workpiece surface, a processing gac stream 31 may be directed across or especially against the direction of forward movement between the reflector and the workpiece when the workpiece is moved or in the direction of movement when the reflector is moved. ~or this purpose, a device 27 with a processing gas nozzle 2g may be arranged beneath or to the side of the reflected beam bundle 30 (see Figures 14 and 15).
The processing nozzle 29 may also be integrated into the reflector as illustrated in Figure 16, mainly at locations in the reflector that make little or no contribution to the beam intensity in the line focus. These locations include, for example, the zenith of the reflector or the side walls of the reflector. This arrangement of the processing nozzles has the advantage that when using water for quenching, the resulting water vapor is blown away from the reflector.
In order to eliminate a warmup area where the thermal conductivity conditions are not steady state at the start of the surface treatment or when starting up the treatment over a workpiece edge for a short period of time, especially more than 3 seconds, the relative movement between the workpiece and reflector is omitted and the workpiece surface is exposed to the radiation under stationary conditions.
~ , ', " ' ~
, ' ', h ~ J " ~
To avoid overheating o~ the workpiece edge area when passing over the edge of the workpiece or an area of the workpiece where dissipation of heat is reduced, the lamp power may be reduced in accordance with the thermal conductivity conditions or the preheating of the workpiece.
The device described above may be used for large area surface treatment of workpieces. For this surface treatment, the light of the high power long-arc lamp ~ is focused on the surface of workpiece 3 with the help of reflector 1 whereby there is either a relative movement between the workpiece and the reflector for heating over the surface or there is stationary heating of the edge layer in order to heat the edge layer and melt it at a high intensity in the focus and/or with a long beam treatment time and then cool it by self-quenching or by quenching with a medium such as water. In the case of rapid heating, i.e., high intensities in the line focus and short beam trea-tment times, cooling of workpieces with a large wall thickness mainly greater than 20 mm can be accomplished by means of self-quenching. With long beam treatment times, the quenching is preferably performed with water as mentioned above. In order to harden the surface of a workpiece, the intensity in the line focus, i.e., the lamp power and/or the beam treatment time selected will be so small that the melting temperature of the workpiece edge layer is not reached.
For remelting, coating, dispersing and alloying with lamps, it is preferable to work with high intensities in the line focus of the reflector, i.e., with high lamp powers and/or long beam treatment times in order in this way to reach the melting point of the workpiece and also that of the second material in coating and alloying.
It should be pointed out that no absorption increasing agents need be applied to the surface of the workpiece for eneryy input of the radiation of the device according to this invention into the workpiece surface of steel and cast iron or a number of other materials.
The workpSece can also be subjected to another heat treatment , , .
"': ' ' ' , ~,J~,;., before the lamp treatment or after the lamp treatment.
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:
, ' '' ' . , . . . : . ~ ~
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Claims (13)
1. Device for hardening, remelting, coating, alloying and dispersing large areas of workpieces, especially metals, by means of rays of light with a reflector formed by a cylindrical surface or an elliptical cylindrical surface (11) and with a continuously operated high power long-arc lamp (2) that is arranged in the reflector and is essentially in the focus of the reflector (1) and focuses the light of the high power long-arc lamp on a line focus (4) that is remote from the reflector in or near which the workpiece (3) that is to be treated is located, whereby reflector (1) and workpiece (3) are designed so they can be moved in three dimensions relative to each other.
2. Device according to Claim 1, characterized in that reflector (1) can be pivoted in order to adjust the width of the heating track in such a way that the longitudinal axis of line focus (4) can be adjusted between 0° and 90° at an angle orthogonal to the relative movement (5).
3. Device according to Claims 1 or 2, characterized in that in order to improve the heating and cooling of the edge layer of the workpiece, the reflector is adjustable in such a way that the workpiece surface normal and the reflector normal are at an angle to each other such that the tilt is about the longitudinal axis of the long-arc lamp.
4. Device according to one of the preceding claims, characterized in that the reflector (1) can be inclined relative to the workpiece across the longitudinal axis in order to permit a controlled influence on the heating and cooling of workpiece (3).
5. Device according to one of the preceding claims, characterized in that apertures (7, 7') and mirrors (8, 8', 18, 18', 28) are provided for limiting the beam in order to reduce the radiation surface.
6. Device according to Claim 5, characterized in that the mirrors are designed so they are wedge shaped or conical.
7. Device according to Claims 5 or 6, characterized in that the apertures and/or mirrors are designed so they can be cooled.
8. Device according to one of the preceding claims, characterized in that cooling devices (25) are provided for rapid cooling of the heated edge area of workpiece (3).
9. Device according to Claim 8, characterized in that the cooling devices are water sprinklers.
10. Device according to Claims 8 or 9, characterized in that the cooling devices are also designed as apertures for limiting the beam path.
11. Device according to one of the preceding claims, characterized in that processing gas nozzles (29) are provided so that their effective area is between the reflector (1) and workpiece (3) and a processing gas stream can be supplied through these nozzles and can be directed across or against the direction of advance (5) between the reflector and workpiece when the workpiece is moved or in the direction of advance when the reflector is moved.
12. Device according to Claim 11, characterized in that the processing gas nozzles (29) are integrated into the reflector surface of the reflector.
13. Device according to Claim 12, characterized in that the processing gas nozzles (29) are arranged in the zenith of the reflector or in the side walls of the reflector.
//insert the figures//
//insert the figures//
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4001280A DE4001280A1 (en) | 1990-01-18 | 1990-01-18 | DEVICE FOR THE TREATMENT OF WORKPIECES BY LIGHT BEAMS |
| DEP4001280.0 | 1990-01-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2074265A1 true CA2074265A1 (en) | 1991-07-19 |
Family
ID=6398281
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002074265A Abandoned CA2074265A1 (en) | 1990-01-18 | 1991-01-15 | Device for treating the surfaces of workpieces with light beams |
Country Status (7)
| Country | Link |
|---|---|
| EP (1) | EP0511274B1 (en) |
| JP (1) | JPH05505213A (en) |
| AT (1) | ATE109210T1 (en) |
| CA (1) | CA2074265A1 (en) |
| DE (1) | DE4001280A1 (en) |
| ES (1) | ES2061233T3 (en) |
| WO (1) | WO1991010751A1 (en) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5444814A (en) * | 1993-11-01 | 1995-08-22 | Hofius, Sr.; David V. | Method of infrared welding on thermoplastic parts utilizing contoured energy reflecting shields |
| AT407261B (en) * | 1997-04-23 | 2001-02-26 | Boehler Uddeholm Ag | Process for forming a layer on substrates by applying thermal energy |
| DE10108926C1 (en) * | 2001-02-23 | 2003-01-02 | Advanced Photonics Tech Ag | Heat treatment process used for changing the properties of a metal object comprises irradiating metal object e.g. a steel spring in a predetermined surface section with electromagnetic radiation produced by an emitter |
| DE10125467C2 (en) * | 2001-05-25 | 2003-04-10 | Arccure Technologies Gmbh | Irradiation device with an arrangement of optical waveguides |
| DE10157554B4 (en) * | 2001-11-23 | 2006-06-29 | Air Liquide Deutschland Gmbh | System for radiation hardening |
| US6947665B2 (en) * | 2003-02-10 | 2005-09-20 | Axcelis Technologies, Inc. | Radiant heating source with reflective cavity spanning at least two heating elements |
| US7544256B2 (en) | 2003-07-17 | 2009-06-09 | Queen City Forging Co. | Process of preparing metal parts to be heated by means of infrared radiance |
| DE102005035626A1 (en) * | 2005-07-29 | 2007-02-01 | Zf Friedrichshafen Ag | Tempering hardened steel components, especially automotive synchronizing rings, uses bundled rays of infra red light to heat them partially |
| DE112018004200T5 (en) * | 2017-08-16 | 2020-07-09 | Beijing E-Town Semiconductor Technology, Co., Ltd | THERMAL PROCESSING OF CLOSED WORKPIECES |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2156352A (en) * | 1937-12-09 | 1939-05-02 | Thomas F Peterson | Heating device |
| CA968855A (en) * | 1971-11-26 | 1975-06-03 | Matsushita Electric Industrial Co., Ltd. | Apparatus for welding, fusing or heating workpiece utilizing energy of a light beam |
| GB2083728B (en) * | 1980-09-04 | 1984-06-20 | Ushio Electric Inc | Annealing furnace |
| EP0372850A1 (en) * | 1988-12-02 | 1990-06-13 | Vickers Shipbuilding & Engineering Limited | Improvements in or relating to the heating of substances |
-
1990
- 1990-01-18 DE DE4001280A patent/DE4001280A1/en active Granted
-
1991
- 1991-01-15 CA CA002074265A patent/CA2074265A1/en not_active Abandoned
- 1991-01-15 AT AT91902949T patent/ATE109210T1/en not_active IP Right Cessation
- 1991-01-15 WO PCT/EP1991/000055 patent/WO1991010751A1/en active IP Right Grant
- 1991-01-15 JP JP3503055A patent/JPH05505213A/en active Pending
- 1991-01-15 EP EP91902949A patent/EP0511274B1/en not_active Expired - Lifetime
- 1991-01-15 ES ES91902949T patent/ES2061233T3/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| EP0511274B1 (en) | 1994-07-27 |
| DE4001280A1 (en) | 1991-07-25 |
| ES2061233T3 (en) | 1994-12-01 |
| DE4001280C2 (en) | 1992-09-17 |
| JPH05505213A (en) | 1993-08-05 |
| ATE109210T1 (en) | 1994-08-15 |
| WO1991010751A1 (en) | 1991-07-25 |
| EP0511274A1 (en) | 1992-11-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FZDE | Discontinued |