EP0394738A3 - Système photoréserve à couches multiples - Google Patents

Système photoréserve à couches multiples Download PDF

Info

Publication number
EP0394738A3
EP0394738A3 EP19900106829 EP90106829A EP0394738A3 EP 0394738 A3 EP0394738 A3 EP 0394738A3 EP 19900106829 EP19900106829 EP 19900106829 EP 90106829 A EP90106829 A EP 90106829A EP 0394738 A3 EP0394738 A3 EP 0394738A3
Authority
EP
European Patent Office
Prior art keywords
exposure
treatment
photoresist
resolution photoresist
resolution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP19900106829
Other languages
German (de)
English (en)
Other versions
EP0394738A2 (fr
Inventor
Recai Dr.-Ing. Sezi
Rainer Dr. Rer. Nat. Leuschner
Michael Dr. Rer. Nat. Sebald
Siegfried Dr. Rer. Nat. Birkle
Hellmut Dr. Ahne
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Publication of EP0394738A2 publication Critical patent/EP0394738A2/fr
Publication of EP0394738A3 publication Critical patent/EP0394738A3/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/265—Selective reaction with inorganic or organometallic reagents after image-wise exposure, e.g. silylation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
EP19900106829 1989-04-24 1990-04-10 Système photoréserve à couches multiples Withdrawn EP0394738A3 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3913467 1989-04-24
DE3913467 1989-04-24

Publications (2)

Publication Number Publication Date
EP0394738A2 EP0394738A2 (fr) 1990-10-31
EP0394738A3 true EP0394738A3 (fr) 1991-03-27

Family

ID=6379343

Family Applications (1)

Application Number Title Priority Date Filing Date
EP19900106829 Withdrawn EP0394738A3 (fr) 1989-04-24 1990-04-10 Système photoréserve à couches multiples

Country Status (1)

Country Link
EP (1) EP0394738A3 (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2062479A1 (fr) * 1991-03-20 1992-09-21 Mark Lelental Methode de formation de configurations au moyen d'une resine photosensible pour la fabrication des circuits integres
EP0559934A1 (fr) * 1992-03-11 1993-09-15 International Business Machines Corporation Méthode et appareil pour création de structures avec image inversée dans l'UV lointain
WO2000013916A1 (fr) * 1998-09-08 2000-03-16 Commonwealth Scientific And Industrial Research Organisation Microstructure en trois dimensions
DE10238825A1 (de) 2002-08-23 2004-03-11 Roche Diagnostics Gmbh Mikrofluidische Systeme mit hohem Aspektverhältnis
CN111487845A (zh) * 2019-01-29 2020-08-04 山东浪潮华光光电子股份有限公司 一种可以直接剥离的led管芯电极掩模图形的制作方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3264104A (en) * 1961-07-28 1966-08-02 Azoplate Corp Reversal-development process for reproduction coatings containing diazo compounds
EP0251241A2 (fr) * 1986-06-30 1988-01-07 International Business Machines Corporation Réserve imagée en surface
EP0282201A2 (fr) * 1987-03-09 1988-09-14 Matsushita Electric Industrial Co., Ltd. Procédé pour réaliser des patrons

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3264104A (en) * 1961-07-28 1966-08-02 Azoplate Corp Reversal-development process for reproduction coatings containing diazo compounds
EP0251241A2 (fr) * 1986-06-30 1988-01-07 International Business Machines Corporation Réserve imagée en surface
EP0282201A2 (fr) * 1987-03-09 1988-09-14 Matsushita Electric Industrial Co., Ltd. Procédé pour réaliser des patrons

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
SOLID STATE TECHNOLOGY. vol. 31, no. 6, Juni 1988, WASHINGTON US & C. Stauffer: "Image Reversal Photoresist" *

Also Published As

Publication number Publication date
EP0394738A2 (fr) 1990-10-31

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