EP0371894A1 - Dampf- und Ionenquelle - Google Patents

Dampf- und Ionenquelle Download PDF

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Publication number
EP0371894A1
EP0371894A1 EP89420467A EP89420467A EP0371894A1 EP 0371894 A1 EP0371894 A1 EP 0371894A1 EP 89420467 A EP89420467 A EP 89420467A EP 89420467 A EP89420467 A EP 89420467A EP 0371894 A1 EP0371894 A1 EP 0371894A1
Authority
EP
European Patent Office
Prior art keywords
cathode
cavity
ion source
opening
magnetic field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP89420467A
Other languages
English (en)
French (fr)
Other versions
EP0371894B1 (de
Inventor
Jacques Menet
Olivier De Gabrielli
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National de la Recherche Scientifique CNRS
Original Assignee
Centre National de la Recherche Scientifique CNRS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre National de la Recherche Scientifique CNRS filed Critical Centre National de la Recherche Scientifique CNRS
Priority to AT89420467T priority Critical patent/ATE103106T1/de
Publication of EP0371894A1 publication Critical patent/EP0371894A1/de
Application granted granted Critical
Publication of EP0371894B1 publication Critical patent/EP0371894B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H3/00—Production or acceleration of neutral particle beams, e.g. molecular or atomic beams
    • H05H3/02—Molecular or atomic beam generation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H01J27/14—Other arc discharge ion sources using an applied magnetic field

Definitions

  • the present invention relates to a source of vapors and ions, and in particular a source of vapors and metal ions.
  • an object of the present invention is to provide another type of vapor and ion source of particularly simple structure and with a long service life.
  • the present invention provides a source of vapors and ions comprising, in a low-pressure enclosure, an anode (ground), a cathode and means for applying a magnetic field, the cathode being constituted an equipotential cavity provided with an opening, a magnetic field being applied orthogonally to the plane of the opening and the material to be ionized being placed in the cathode cavity.
  • the present invention provides for using a cathode 10 provided with an internal cavity and an outlet opening 11.
  • This cathode is enclosed in an enclosure, for example a conductive enclosure M to ground that hereinafter sometimes called mass sometimes anode since it constitutes an anode with respect to the cathode 10.
  • This enclosure is provided with pumping means 13 and means 14 for introducing a gas, this gas being for example helium, argon, etc.
  • a magnet or other means for applying a magnetic field A is provided for applying a magnetic field B at the opening 11 of the cathode orthogonally to the plane of the latter.
  • a material to be ionized for example a metal 15 in the form of powder, bars, chips, etc.
  • the enclosure M is evacuated and a carrier gas is introduced therein under a pressure of the order of a few tenths to a few tens of pascals.
  • a carrier gas is introduced therein under a pressure of the order of a few tenths to a few tens of pascals.
  • the plasma potential is not the potential of the cathode 10 but that, if the potential of this cathode is for example -500 volts, the plasma potential may be a few tens of volts.
  • the plasma potential may be brought to a variable potential between a hundred and a thousand volts approximately.
  • the vapor pressure of the material in the cavity reaches a pressure of the order of Pascal, one can interrupt the arrival of the gases 14 which cause the initial creation of the plasma while continuing the pumping by the pump 13.
  • the discharge is maintained since, under these conditions, it is the vapors of the material 15 which play the role of the initial gas. There is therefore a self-maintained plasma inside the cavity.
  • the material 15 will be for example a metal.
  • the cathode is at a potential of -500 volts and the plate 20 at a potential of the order of -1200 volts, we obtained with copper 3 amperes of Cu + ions accelerated to 1200 volts on a surface of 50 cm2.
  • the deposition rate of the copper atoms on the plate 20 was 20 micrometers / min, from which it can be deduced that 25 percent of the evaporated copper atoms were ionized.
  • the process according to the present invention has many advantages, among which we can mention: - a high deposition rate equivalent to that achieved by vacuum evaporation, - a high ionization rate of metallic vapors (up to 25% while conventional ion deposition techniques reach ionization rates of the order of 1 to 2%), - the possibility of operating in the absence of carrier gas for 60% of the metals, which reduces the pollution rate.
  • the device according to the present invention can have a long service life.
  • no fundamental consideration limits the dimensions of the device and it is conceivable to bombard the target 20 over a great length if the opening 12 is a slot of great extent.
  • the present invention is susceptible of numerous variants.
  • the material constituting the cathode and the mass enclosure will be chosen to be non-reactive at operating temperatures, which is for example the case of tungsten.
  • the enclosure may take various forms and may for example be associated with a ground grid disposed opposite the opening 11 to promote the initial formation of the plasma.
  • Various systems of grids or openings brought to different potentials may be provided to accelerate and / or focus the ions projected onto the target.

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Vapour Deposition (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Particle Accelerators (AREA)
EP89420467A 1988-11-30 1989-11-27 Dampf- und Ionenquelle Expired - Lifetime EP0371894B1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AT89420467T ATE103106T1 (de) 1988-11-30 1989-11-27 Dampf- und ionenquelle.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR8816012 1988-11-30
FR8816012A FR2639756B1 (fr) 1988-11-30 1988-11-30 Source de vapeurs et d'ions

Publications (2)

Publication Number Publication Date
EP0371894A1 true EP0371894A1 (de) 1990-06-06
EP0371894B1 EP0371894B1 (de) 1994-03-16

Family

ID=9372645

Family Applications (1)

Application Number Title Priority Date Filing Date
EP89420467A Expired - Lifetime EP0371894B1 (de) 1988-11-30 1989-11-27 Dampf- und Ionenquelle

Country Status (6)

Country Link
US (1) US5025194A (de)
EP (1) EP0371894B1 (de)
JP (1) JPH03114122A (de)
AT (1) ATE103106T1 (de)
DE (1) DE68913920T2 (de)
FR (1) FR2639756B1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE20122909U1 (de) 2000-12-15 2009-11-26 BSH Bosch und Siemens Hausgeräte GmbH Magnetventil für einen Kältemittelkreislauf

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6271529B1 (en) 1997-12-01 2001-08-07 Ebara Corporation Ion implantation with charge neutralization

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0282467A1 (de) * 1987-03-11 1988-09-14 Nihon Shinku Gijutsu Kabushiki Kaisha Hohlkathoden-Ionenquellen

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1209092A (fr) * 1958-05-03 1960-02-29 Commissariat Energie Atomique Nouvelle source d'ions
US3223885A (en) * 1963-04-29 1965-12-14 Gen Electric Stabilization circuit for electron beam apparatus
US3414702A (en) * 1965-05-28 1968-12-03 Gen Electric Nonthermionic electron beam apparatus
US3411035A (en) * 1966-05-31 1968-11-12 Gen Electric Multi-chamber hollow cathode low voltage electron beam apparatus
FR2595868B1 (fr) * 1986-03-13 1988-05-13 Commissariat Energie Atomique Source d'ions a resonance cyclotronique electronique a injection coaxiale d'ondes electromagnetiques
FR2618602B1 (fr) * 1987-07-22 1990-01-05 Centre Nat Rech Scient Source d'electrons

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0282467A1 (de) * 1987-03-11 1988-09-14 Nihon Shinku Gijutsu Kabushiki Kaisha Hohlkathoden-Ionenquellen

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
INSTRUMENTS & EXPERIMENTAL TECHNIQUES, vol. 30, no. 1, partie 2, janvier-février 1987, pages 168-170, Plenum Publishing Corp., New York, US; V.A. SAENKO et al.: "Metal-ion source with hot hollow cathode" *
INSTRUMENTS AND EXPERIMENTAL TECHNIQUES, vol. 26, no. 4, partie 2, juillet-août 1983, pages 926-928, Plenum Publishing Corp., New York, US; V.A. SAENKO et al.: "Plasma evaporator" *
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH/SECTION B, vol. B21, nos. 2-4, 22 mars 1987, pages 182-185, North-Holland Publishing, Amsterdam, NL; M. MINGXIU et al.: "A hollow cold cathode multipurnose ion source" *
NUCLEAR INSTRUMENTS AND METHODS, vol. 107, no. 3, 15 mars 1973, pages 477-492, North-Holland Publishing Co., Amsterdam, NL; J.H. FREEMAN et al.: "The technology and chemistry of heavy ion sources" *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE20122909U1 (de) 2000-12-15 2009-11-26 BSH Bosch und Siemens Hausgeräte GmbH Magnetventil für einen Kältemittelkreislauf

Also Published As

Publication number Publication date
EP0371894B1 (de) 1994-03-16
FR2639756A1 (fr) 1990-06-01
JPH03114122A (ja) 1991-05-15
DE68913920T2 (de) 1994-11-03
US5025194A (en) 1991-06-18
ATE103106T1 (de) 1994-04-15
DE68913920D1 (de) 1994-04-21
FR2639756B1 (fr) 1994-05-13

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