EP0338113B1 - Procédé pour adapter une cryopompe à deux étages à un gaz défini - Google Patents

Procédé pour adapter une cryopompe à deux étages à un gaz défini Download PDF

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Publication number
EP0338113B1
EP0338113B1 EP88106497A EP88106497A EP0338113B1 EP 0338113 B1 EP0338113 B1 EP 0338113B1 EP 88106497 A EP88106497 A EP 88106497A EP 88106497 A EP88106497 A EP 88106497A EP 0338113 B1 EP0338113 B1 EP 0338113B1
Authority
EP
European Patent Office
Prior art keywords
pump
cooling stage
temperature
stage
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP88106497A
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German (de)
English (en)
Other versions
EP0338113A1 (fr
Inventor
Hans-Ulrich Dr. Häfner
Hans-Joachim Dr. Forth
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Balzers und Leybold Deutschland Holding AG
Original Assignee
Leybold AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold AG filed Critical Leybold AG
Priority to AT88106497T priority Critical patent/ATE72301T1/de
Priority to DE8888106497T priority patent/DE3868264D1/de
Priority to EP88106497A priority patent/EP0338113B1/fr
Priority to US07/338,606 priority patent/US4953359A/en
Priority to JP1097712A priority patent/JP2668261B2/ja
Publication of EP0338113A1 publication Critical patent/EP0338113A1/fr
Application granted granted Critical
Publication of EP0338113B1 publication Critical patent/EP0338113B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/06—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means
    • F04B37/08—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means by condensing or freezing, e.g. cryogenic pumps
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S417/00—Pumps
    • Y10S417/901—Cryogenic pumps

Definitions

  • the invention relates to a method for adapting a two-stage refrigerator cryopump to a specific gas; the cryopump has a first cooling stage, to which pumping surfaces are attached and which is equipped with a heating device; in addition, the cryopump has a second cooling stage, to which the pumping surfaces are attached and which takes on a temperature between approx. 10 and 20 K during operation. Furthermore, the invention relates to cryopumps suitable for carrying out this method.
  • the first stage can vary depending on the pump size, type, process and external load in a wide range from approx. 50 K to 150 k.
  • Gases the vapor pressure curves of which lie between the previously mentioned condensable first gases and the condensable second gases, can therefore condense at sufficiently high process pressures at sufficiently cold points in the first stage. If you subsequently want to pump down to lower pressures, this is sometimes not possible because the first stage is not cold enough for this.
  • the gas previously frozen on the first stage slowly migrates over to the second stage at a pressure between 10 ⁇ 3 and 10 utilise mbar. H. the pressure remains at an intermediate pressure; the pump no longer seems to be pumping.
  • Another disadvantage of the passive load is that it is always present and thus extends the cold running time of the cryopump.
  • the present invention is based on the object of specifying a method of the type mentioned at the outset and a cryopump for carrying out this method, which enable optimum pump behavior in the case of gases with different vapor pressures and in which the cold driving time is not impaired.
  • this object is achieved in that the heating device of the first stage is controlled in such a way that the coldest point of the first cold stage or its pumping surfaces assumes a temperature which is approximately 5 to 10 K higher than the temperature at which the vapor pressure of the respective gas is just equal to the highest occurring process pressure.
  • the temperature of the first stage can also be kept constant regardless of varying external loads, since less heating power is used when the external load increases.
  • the temperature control according to the invention can be used to observe the load condition of the pump. The higher the load, the less often the heater switches on. Generally speaking, the state of the pump is also stabilized against changing external loads by the actively controlled heating load.
  • the cryopumps 1 with the housing 2 each shown in the figures each comprise the only partially illustrated two-stage refrigerator cold head 3, the cooling stages of which are designated 4 (first stage) and 5 (second stage).
  • the cup-shaped pump surface or shield 6 is fastened in a heat-conducting manner, so that it encloses the interior 8 of the pump together with the baffle 7 carried and cooled by the shield 6.
  • the pumping surfaces 10 of the second stage which are connected to the second cold head stage with good thermal conductivity.
  • the inlet opening 9 of the pump equipped with the baffle 7 is preceded by a valve 11 only shown in FIG. It comprises a fixed disk 12 and a rotatable disk 13, each of which has essentially radial slot openings. The valve can be actuated by rotating the disk 13.
  • the housing 2 of the cryopump 1 has a connecting piece 14 at approximately the level of the stage 4 of the first refrigerator stage, which supports a monitoring device denoted by 15.
  • a monitoring device denoted by 15.
  • this device there is a circuit for supplying heating devices 16 and 17 with which the cold heads 4 and 5 of the two-stage cold head 3 are equipped.
  • a vacuum-tight bushing 23 is provided for the connecting lines 18 and 19 between the supply unit 15 and the heating devices 16, 17 in the region of flanges 21, 22 on the supply unit 15 and on the connecting piece 14.
  • the cryopump there is also a temperature sensor 24, which is provided at the cold stage 4 and whose measuring line 26 also leads to the monitoring device 15.
  • a supply unit 27, shown as a block, is connected to this monitoring device 15.
  • the monitoring device In addition to its function as overtemperature protection when regenerating with electric heaters, the monitoring device also serves 15 to ensure the setting of the desired temperature of the cold stage 4 and the pumping surfaces or shields 6, 7 carried by it.
  • the temperature of the cold stage 4 is measured using the sensor 24.
  • This measured value is fed to the monitoring device 15. There, this measured value is compared with a target value, which depends on the gas to be pumped. If the temperature of the cold head is below this target value, the heating device 16 switches on until the target temperature has been reached, and then off again, etc.
  • the vapor pressure curves of various gases are shown in FIG. Since, according to the teaching of the invention, the heating device is to be controlled in such a way that the coldest point of the first cooling stage or its pumping surfaces has a temperature which is 5 to 10 K higher than the vapor pressure temperature of the gas to be pumped, which corresponds to the highest process pressure, the target temperature to be set can be read from the family of curves shown.
  • the process gases usually occur (e.g. in sputtering processes) initially with a pressure of a few 10 ⁇ 3 mbar. The 10 ⁇ 3 mbar line intersects the vapor pressure curves shown.
  • the temperature to be set is therefore a value that is 5 to 10 K to the right of the intersection of the 10 ⁇ 3 mbar line with the associated vapor pressure curve.
  • the temperature of the first stage or its pumping surfaces to a value of about 55 to 60 K.
  • a temperature should be selected which is about 130 to 135 K. With such a choice of temperature, it is ensured that the gas considered in each case does not accumulate on the first pump stage, but is pumped directly by the pump surfaces of the second stage. Rearrangements that interfere with a pressure reduction during later pumping to ⁇ 10 ⁇ 3 mbar no longer occur.
  • both pump stages are equipped with a heating device 16, 17.
  • they serve to regenerate the pump surfaces of both stages by heating these pump surfaces to room temperature.
  • the first stage is counter-heated by heat radiation onto a section of the shield 6.
  • the housing 2 of the cryopump 1 is equipped with a further connecting piece 31.
  • a radiation source 32 which, for. B. can be a high-energy light source or the like.
  • suitable optics 35 the holder of which simultaneously forms the vacuum-tight seal of the interior 8 of the housing 2, the radiation emanating from the radiation source is concentrated on the outer surface of the pump surface 6, which is expediently blackened at this point.
  • a temperature sensor 24 is again provided on the cold stage 4, which supplies its measured values to the control unit 27. This is where the comparison with the set target temperature value takes place. Accordingly, the radiation source 32 is switched on and off or its luminosity is regulated. It is useful with this solution that live lines do not have to be laid inside the cryopump.
  • FIG. 4 shows an embodiment in which the cold stage 4 is equipped with a heat exchanger, here in the form of a pipe coil 41. Through this coil, 4 warm gas, for. B. from the helium circuit of the refrigerator. An external heat exchanger 42 with an electric heater 43, which is supplied by the control unit 15, serves to heat the gas. This heat exchanger is located together with the valve 44 in the gas supply line.
  • This arrangement enables two methods of adjusting the temperature of the cold stage 4. Either the gas flow can be controlled if the valve 44 is designed as a metering control valve. Another option is to get one supply a constant gas flow and heat the temperature of the gas in a controlled manner with the help of the heat exchanger.
  • a component 51 is fastened to the cold stage 4 and has a downwardly directed threaded bore 52.
  • a rod 53 can be screwed into this threaded bore 52, the free end of which has room temperature or is heated.
  • the screw thread forms a heat exchange surface, the size of which can be regulated by changing the screw-in length.
  • the screw-in depth can be regulated with the aid of a gearwheel system 54 and a motor 55.
  • the motor is again controlled via the control unit 15, to which the values supplied by the temperature sensor 24 are fed.
  • the screw thread is expediently encapsulated in relation to the rest of the vacuum space in order to avoid contamination, or is protected against inert gas.
  • FIG. 6 shows a solution in which a plate system 61 is connected both to the cold head 4 and to a warm place.
  • the plates 62 are alternately connected to the cold head 4 and to the warm point 63.
  • the variation of the heat transfer for the purpose of keeping the target temperature constant takes place by a variation of the gas filling pressure by increasing the filling pressure in the plate system 61 if the temperature is too low.
  • the filling pressure can be applied with the aid of a bellows 64 and a motor 65, the motor 65 again being controlled as a function of the values supplied by the sensor 24.
  • a heat flow switch 71 is provided. It comprises the hollow rod 72, which is connected to the cold stage 4 and contains gas. Depending on the temperature, the gas expands or contracts the bellows attached to the lower end of the rod, the stamp 73 of which is assigned to the rod 74 connected to a hot spot. The contact of the heat flow switch is actuated by expansion or contraction of the gas in the rod 72.
  • a suitable bimetallic element or a suitable magneto- or electrostrictive element can also be present.
  • a hollow rod 81 is arranged between the cold stage 4 and a warm place, which is filled with a suitably selected gas.
  • a suitably selected gas which is expediently the gas which is preferably to be pumped under an increased pressure. It condenses in the area of cold level 4, then flows downwards and evaporates again in the area of the warm place.
  • a load on the cold stage 4 is achieved via this circuit. This load can be set via the pressure or preferably by selecting suitable gases.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)

Claims (7)

  1. Procédé pour adapter une cryopompe de réfrigérateur (1) à deux étages à un gaz déterminé dans lequel la cryopompe présente un premier étage frigorifique (4) sur lequel sont fixées des surfaces de pompage (6, 7) et qui est muni d'un dispositif de chauffage, la cryopompe (1) présentant en outre un second étage frigorifique (5) sur lequel sont fixées des surfaces de pompage (10) et qui, pendant le fonctionnement, atteint une température atteignant 20°K, caractérisé en ce que le dispositif de chauffage est commandé de telle manière que l'endroit le plus froid du premier étage frigorifique (4) ou de ses surfaces de pompage (6, 7) atteint une température qui est supérieure de 5 à 10°K a la température de tension de vapeur du gaz en question correspondant à la pression de procédé maximale.
  2. Cryopompe pour la mise en oeuvre du procédé selon la revendication 1, comprenant un premier étage frigorifique (4) sur lequel sont fixées des surfaces de pompage (6, 7) et qui est muni d'un dispositif de chauffage, la cryopompe (1) comportant en outre un second étage frigorifique (5) sur lequel sont fixées des surfaces de pompage (10) et qui atteint pendant le fonctionnement une température atteignant 20°K, caractérisée en ce que l'étage frigorifique (4) est muni d'un élément structural (51) présentant un alésage fileté (52) dans lequel une tige (53) chaude à son extrémité libre peut être vissée à des profondeurs différentes, de sorte que l'élément structural (51) et la tige (53) constituent un pont thermique réglable entre l'extrémité chaude de la tige et le premier étage (4).
  3. Cryopompe pour la mise en oeuvre du procédé selon la revendication 1, qui présente un premier étage frigorifique (4) sur lequel sont fixées des surfaces de pompage (6, 7) et qui est muni d'un dispositif de chauffage, la cryopompe (1) comportant en outre un second étage frigorifique (5) sur lequel sont fixées des surfaces de pompage (10) et qui atteint pendant le fonctionnement une température atteignant 20°K, caractérisée en ce qu'à l'étage frigorifique (4) est associé un système de plaques (61) dont les plaques (62) sont reliées tour a tour à la tête frigorifique (4) et à une section chaude, et en ce qu'il est prévu un dispositif pour régler la pression de remplissage du gaz dans le système de plaques.
  4. Cryopompe pour la mise en oeuvre du procédé selon la revendication 1, présentant un premier étage frigorifique (4) sur lequel sont fixées des surfaces de pompage (6, 7) et qui est muni d'un dispositif de chauffage, la cryopompe (1) comportant en outre un second étage frigorifique (5) sur lequel sont fixées des surfaces de pompage (10) et qui, pendant le fonctionnement, atteint une température atteignant 20°K, caractérisée en ce qu'à l'étage frigorifique est associé un interrupteur mécanique de flux thermique qui, selon l'état de brancherment, relie le premier étage frigorifique (4) à un endroit chaud ou interrompt cette liaison.
  5. Cryopompe selon la revendication 4, caractérisée en ce que l'interrupteur de flux thermique est actionné par un gaz approprié enfermé dans un cylindre ou soufflet, qui actionne le contact de l'interrupteur thermique du fait de sa contraction lors d'un refroidissement.
  6. Cryopompe pour la mise en oeuvre du procédé selon la revendication 1, présentant un premier étage frigorifique (4) sur lequel sont fixées des surfaces de pompage (6, 7) et qui est muni d'un dispositif de chauffage, la cryopompe (1) comportant en outre un second étage frigorifique (5) sur lequel sont fixées des surfaces de pompage (10) et qui, pendant le fonctionnement, atteint une température atteignant 20°K, caractérisée en ce que le transport de chaleur vers l'étage frigorifique a lieu grâce à une tige de transport de chaleur ("Heat pipe") remplie de gaz et fermée, dans laquelle se trouve un gaz choisi de manière appropriée qui circule dans le tube de telle manière qu'il se condense en liquide à l'endroit froid et circule de là en sens inverse jusqu'à l'endroit chaud en réalisant par ce circuit une charge de l'étage frigorifique (4).
  7. Cryopompe selon la revendication 6, caractérisée en ce que le gaz contenu dans la tige de transport de chaleur est de préférence le gaz à pomper.
EP88106497A 1988-04-22 1988-04-22 Procédé pour adapter une cryopompe à deux étages à un gaz défini Expired - Lifetime EP0338113B1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
AT88106497T ATE72301T1 (de) 1988-04-22 1988-04-22 Verfahren zur adaption einer zweistufigen refrigerator-kryopumpe auf ein betimmtes gas.
DE8888106497T DE3868264D1 (de) 1988-04-22 1988-04-22 Verfahren zur adaption einer zweistufigen refrigerator-kryopumpe auf ein betimmtes gas.
EP88106497A EP0338113B1 (fr) 1988-04-22 1988-04-22 Procédé pour adapter une cryopompe à deux étages à un gaz défini
US07/338,606 US4953359A (en) 1988-04-22 1989-04-14 Method of adapting a two-stage refrigerator cryopump to a specific gas
JP1097712A JP2668261B2 (ja) 1988-04-22 1989-04-19 ２段冷凍機クライオポンプを所定の気体に適合させる方法及びこの方法を実施するために適したクライオポンプ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP88106497A EP0338113B1 (fr) 1988-04-22 1988-04-22 Procédé pour adapter une cryopompe à deux étages à un gaz défini

Publications (2)

Publication Number Publication Date
EP0338113A1 EP0338113A1 (fr) 1989-10-25
EP0338113B1 true EP0338113B1 (fr) 1992-01-29

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EP88106497A Expired - Lifetime EP0338113B1 (fr) 1988-04-22 1988-04-22 Procédé pour adapter une cryopompe à deux étages à un gaz défini

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US (1) US4953359A (fr)
EP (1) EP0338113B1 (fr)
JP (1) JP2668261B2 (fr)
AT (1) ATE72301T1 (fr)
DE (1) DE3868264D1 (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4918930A (en) * 1988-09-13 1990-04-24 Helix Technology Corporation Electronically controlled cryopump
US5157928A (en) * 1988-09-13 1992-10-27 Helix Technology Corporation Electronically controlled cryopump
US6022195A (en) * 1988-09-13 2000-02-08 Helix Technology Corporation Electronically controlled vacuum pump with control module
US6318093B2 (en) 1988-09-13 2001-11-20 Helix Technology Corporation Electronically controlled cryopump
US5305612A (en) * 1992-07-06 1994-04-26 Ebara Technologies Incorporated Cryopump method and apparatus
US6902378B2 (en) 1993-07-16 2005-06-07 Helix Technology Corporation Electronically controlled vacuum pump
JP4927642B2 (ja) * 2007-05-28 2012-05-09 キヤノンアネルバ株式会社 二段式冷凍機の運転制御方法、二段式冷凍機を用いたクライオポンプの運転制御方法、二段式冷凍機及びクライオポンプ
JP4686572B2 (ja) * 2008-05-14 2011-05-25 住友重機械工業株式会社 クライオポンプ、真空排気システム、及びその診断方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3338063A (en) * 1966-01-17 1967-08-29 500 Inc Cryopanels for cryopumps and cryopumps incorporating them
FR1553094A (fr) * 1967-11-30 1969-01-10
US4356701A (en) * 1981-05-22 1982-11-02 Helix Technology Corporation Cryopump
US4438632A (en) * 1982-07-06 1984-03-27 Helix Technology Corporation Means for periodic desorption of a cryopump
IL71403A (en) * 1983-04-04 1991-01-31 Helix Tech Corp Cryopump with rapid cooldown and increased pressure stability
FR2572794B1 (fr) * 1984-11-06 1987-06-12 Commissariat Energie Atomique Procede pour augmenter la capacite d'absorption d'une pompe de cryopompage et pompe de cryopompage associee
US4667477A (en) * 1985-03-28 1987-05-26 Hitachi, Ltd. Cryopump and method of operating same
DE3512614A1 (de) * 1985-04-06 1986-10-16 Leybold-Heraeus GmbH, 5000 Köln Verfahren zur inbetriebnahme und/oder regenerierung einer kryopumpe und fuer dieses verfahren geeignete kryopumpe
US4679401A (en) * 1985-07-03 1987-07-14 Helix Technology Corporation Temperature control of cryogenic systems
EP0250613B1 (fr) * 1986-06-23 1991-07-17 Leybold Aktiengesellschaft Pompe cryogénique et procédé de cryopompage

Also Published As

Publication number Publication date
JP2668261B2 (ja) 1997-10-27
ATE72301T1 (de) 1992-02-15
DE3868264D1 (de) 1992-03-12
JPH01305173A (ja) 1989-12-08
US4953359A (en) 1990-09-04
EP0338113A1 (fr) 1989-10-25

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