EP0252545B1 - Verfahren und Vorrichtung zur Herstellung von Metallsieben sowie nach dem Verfahren hergestellte Siebe - Google Patents

Verfahren und Vorrichtung zur Herstellung von Metallsieben sowie nach dem Verfahren hergestellte Siebe Download PDF

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Publication number
EP0252545B1
EP0252545B1 EP87201143A EP87201143A EP0252545B1 EP 0252545 B1 EP0252545 B1 EP 0252545B1 EP 87201143 A EP87201143 A EP 87201143A EP 87201143 A EP87201143 A EP 87201143A EP 0252545 B1 EP0252545 B1 EP 0252545B1
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European Patent Office
Prior art keywords
sieve material
metal layer
base
metal
electroplating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP87201143A
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English (en)
French (fr)
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EP0252545A1 (de
Inventor
Johannes Tonnis Snakenborg
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Stork Screens BV
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Stork Screens BV
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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/08—Perforated or foraminous objects, e.g. sieves

Definitions

  • the invention relates to a method for forming a metal sieve material, in which a metal layer is deposited by electroplating on a separately formed base sieve material which is provided with a separating layer and the deposited metal layer is removed, a liquid flow through the perforations of the base sieve material being maintained during at least a part of the electroplating treatment and a compound being present in the electroplating bath which possesses at least properties of a second class brightener.
  • Said Patent Application describes a method for manufacturing a sieve material by forming a metal precipitate on a base sieve material by electroplating, a liquid being allowed to flow through the openings of the base sieve material during the precipitation of the metal to ensure that the metal growth takes place essentially perpendicularly to the outside surface of the base sieve material, as a result of which the openings of the final sieve material are essentially equally as large as the openings of the base sieve material.
  • an organic compound which possesses the properties of a second class brightener is included in the bath liquid while said method is being carried out, in wich connection butynediol and/or ethylene cyanohydrin may be mentioned as examples: in general an organic compound which contains at least one unsatured bond which does not belong to group.
  • the object of the present invention is to provide a solution for said disadvantages.
  • the method according to the invention therefore offers the possibility of removing a metal layer deposited on the base sieve material while the latter is still very thin and to subject said removed sieve material, whose perforations are essentially equally as large as the perforations in the base material, and to subject it to a further electroplating treatment, metal being deposited on the material until the desired final thickness has been achieved.
  • the metal layer removed is connected as cathode in an electroplating bath and a liquid flow is maintained through the perforations of the metal removed in order to ensure in this step that the perforations of the sieve material keep essenially the same cross-section as the cross-seetion which was present in the base sieve material.
  • Said publication describes the formation of a thin metal skeleton on a matrix such as a nickel base matrix, which skeleton is subsequently stripped from said matrix and thickened in subsequent baths to obtain the desired end thickness.
  • the matrix used is in this case a so called filled matrix, i.e. the matrix is a material with recesses whereby the recesses have been filled with a dielectric material.
  • the matrix is a material with recesses whereby the recesses have been filled with a dielectric material.
  • a pulsating current may be used.
  • a wear-resistant and/or corrosion-resistant coating is expediently applied thereto.
  • Such a coating may, for example, consist of an eletrophoretically deposited plastic-material layer, an inorganic layer, such as quartz or titanium nitride, deposited by cathode sputtering, or of a chromium or tin/nickel layer deposited by electroplating.
  • the mechanical properties of the sieve material formed may be still further improved by subjecting the sieve material to a heat treatment at a temperature of up to 300°C for 0.5 to 5 hours; such a treatment may ensure the removal of in-built stress and the prevention of brittleness.
  • a protective gas such as nitrogen is used during the treatment.
  • the method according to the invention is carried out continuously.
  • the thin metal deposit formed on a suitable base sieve material may be removed continuously and may be passed as a web through the various subsequent electroplating baths which, for example, may be formed by a bath of the same composition as the bath with which the first deposit was formed on the base sieve material and a bath from which, for example, a corrosion- and/or wear-resistant chromium layer is deposited.
  • a corrosion- and/or wear-resistant chromium layer is deposited.
  • Many kinds of metals or metal alloys may be considered for forming the metal deposit on the base sieve material, such as nickel, copper and iron; however, nickel is very suitable for many types of applications.
  • the base sieve material is very advantageously embodied in the form of a cylinder, a part of which is immersed in an electroplating bath and in which case an anode material is present in said bath which is arranged in a manner such that a gap is present between the surface of the base sieve material and the surface of the anode material.
  • liquid flow will take place through the perforations of the cylinder-shaped base sieve material, flowing from the interior of the cylinder in the direction of the anode.
  • the base sieve material may be manufactured in a classical manner by forming a metal deposit on a mandrel consisting of a network-like pattern of electrically conducting bars and electrically insulating areas included between the latter and removing said metal deposit to act as the base sieve material.
  • the base sieve material may, however, also be manufactured in another manner, consideration being given to starting from a completely continuous material in which a pattern of perforations of the desired form and size is provided by means of mechanical, radiation beam or etching techniques.
  • the initial material may consist of metal, plastic material or glass; in the case of plastic material or glass, an electrically conducting layer has additionally to be formed after the formation of the perforation pattern so that it is possible to connect the base sieve material formed as a cathode in an electroplating bath.
  • electrically conducting layers on insulating materials many techniques are known to those skilled in the art, such as evaporation, electroless metallization etc.
  • the starting material is formed by a thin-wall, seamless nickel cylinder in which a pattern of perforations of desired size, form and distribution is provided by means of the above-named techniques.
  • such a cylinder-shaped base sieve material is exceptionally suitable for carrying out the method according to the invention in a continuous manner.
  • separating layer To remove a metal deposit formed on the base sieve material the application of a separating layer is of exceptional importance.
  • Such separating layers are known per se; to form a separating layer to be used once, use is often made of agents such as beeswax.
  • the method according to the invention proceeds with good results if the base sieve material is covered with a separating layer with permanent releasae properties.
  • a separating layer with permanent releasae properties is formed, for example, by chromium.
  • an excellent separating layer is also obtained if, after it has been formed, the base sieve material is subjected to an oxidation treatment to form an oxidized surface layer of a nature such that the current distribution is not, or virtually not, influenced thereby, while a strong adhesion between the metal deposit and the base sieve material is nevertheless prevented.
  • an oxidation may be carried out with an acid potassium dichromate or a potassium permanganate solution.
  • the oxidation film is sufficiently stable to make it possible to form a large number of removable deposits without renewal or replenishment.
  • a device for carrying out the method according to the invention as is described above is characterized in that it comprises the baths needed for the various electroplating treatments, means for connecting the base sieve material as cathode, means for connecting the removed metal deposit as cathode, liquid flow regulating means and/or current-pulsing ⁇ means, as well as means for detaching the deposit formed on the base sieve material and the guiding thereof through the various electroplating baths.
  • a formed metal sieve material obtained by using the method of the invention is characterized in that the dimensions of the perforations in the sieve material essentially correspond to the dimensions of the perforations in the base sieve material.
  • Figure 1a to d diagrammatically shows the steps needed to carry out the method of the invention.
  • Figure 2 represents a section through a bar of a sieve material according to the invention in one of the possible final forms.
  • Figure 3a to i incl. provides a representation of same of the possible end farms of the sieve material according to the invention
  • Figure 4 provides a diagrammatic representation in section of a device far carrying out the method according to the invention continuously.
  • the reference numeral 1 shows a base sieve material which, for example, consists of nickel material having a thickness of approx. 50 mu in which a perforation pattern with perforations 4 has been provided by means of the laser beam technique.
  • Figure 1b indicates that a deposit 2 is formed on the base sieve material 1, a liquid flow as indicated by the arrows being maintained through the openings 4 during at least a part of the growth process; the metal deposit 2 having approximately the same thickness as the base sieve material.
  • Figure 1c indicates that the metal deposit 2 is removed from the base sieve material
  • Figure 1d indicates that a metal deposit 3 is formed on the removed metal deposit 2, a liquid flow also being maintained through the perforations of the removed metal deposit 2 during at least a part of the growth process.
  • Deposit 3 in this case is about equal in thickness to deposit 2.
  • the ratio between the thicknesses of the deposits 2 and 3 to the thickness of the base material may be chosen at will.
  • the bath liquid will advantageously contain an organic compound which promotes the growth of metal perpendicularly on the outside surface of the sieve material, examples of such compounds which may be named being ethylene cyanohydrin and butynediol.
  • reference numeral 2 again indicates the metal deposit which has been removed from the base sieve material 1.
  • a fresh metal layer 3 has been deposited on said metal deposit 2, care being taken, through bath composition and growth conditions, that the cross-section of the metal grown is not larger, or virtually not larger, than the original cross-section of the bars of the base sieve material.
  • a corrosion- and/or wear-resistant layer 4 has been applied over the assembly of metal layer 2 and metal layer 3 and this may, for example, consist of chromium or tin/nickel, but may also be formed from other wear-resistant and/or corrosion-resistant materials known in the art.
  • Figure 4 shows diagrammatically an equipment for carrying out the method according to the invention continuously.
  • a nickel bath in which is present a suitable quantity of butynediol, in which a base sieve material is rotatably mounted in the form of a cylinder 7 and a stationary anode 6 is present, and in which a liquid flow is maintained during at least a part of the growth process with flow from the cathode to the anode and indicated by the arrows.
  • the removed material 8 will be passed by means of guide rollers 13 to subsequent baths such as a co-called thickening bath 9 in which there is an anode 10 and in which liquid flow through the material connected as cathode also takes place in the direction of the anode 10 (indicated by arrows).
  • a co-called thickening bath 9 in which there is an anode 10 and in which liquid flow through the material connected as cathode also takes place in the direction of the anode 10 (indicated by arrows).
  • the material can be further passed, for final treatment, through a bath 11 in which a wear-resistant and/or corrosion-resistant layer is applied by electroplating, after which the completely formed metal sieve material at 14 is finally reeled up.
  • bath 9 subsequent to bath 9 and prior to bath 11 yet one or more baths identical with bath 9 can be inserted if, because of electroplating considerations, it is attractive to distribute the growth path in such a bath over several baths.
  • a station may, of course, also be chosen in which a wear-resistant and/or corrosion- resistant layer is applied in another manner.
  • consideration may be given to the electrophoretic deposition of material, deposition by means of electrostatic spraying methods, deposition by means of vacuum techniques such as evaporation and cathode sputtering etc.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Catalysts (AREA)
  • Powder Metallurgy (AREA)

Claims (12)

  1. Verfahren zum Herstellen eines Metallsiebmaterials, bei dem eine Metallschicht (2) durch Elektroplattieren auf ein getrennt hergestelltes Basissiebmaterial (1), das mit einer Trennschicht versehen ist, abgeschieden wird und bei dem die abgeschiedene Metallschicht (2) entfernt wird, wobei ein Flüssigkeitsfluß durch die Perforationen des Basissiebmaterials (1) während wenigstens eines Teils der Elektroplattierungsbehandlung aufrecht erhalten wird und eine Verbindung in dem Elektroplattierungsbad vorhanden ist, die die Eigenschaften eines Aufhellers der zweiten Klasse besitzt, dadurch gekennzeichnet, daß die entfernte Metallschicht (2) einer weiteren Elektroplattierungsbearbeitung unter den im wesentlichen gleichen Bedingungen wie während ihrer Herstellung unterworfen wird und daß Metall abgeschieden wird, um eine Metallschicht (3) zu bilden, bis die gewünschte Dicke erreicht ist.
  2. Verfahren nach Anspruch 1, dadurch gekennzeichnet, daß ein pulsierender Strom verwendet wird, um die Metallschicht (2) auf dem Basissiebmaterial (1) und die Metallschicht (3) auf der entfernten Metallschicht (2) abzuscheiden.
  3. Verfahren nach den Ansprüchen 1-2, dadurch gekennzeichnet, daß nach Erreichen der endgültigen Dicke des hergestellten Siebmaterials eine abnutzungs- und/oder korrosionsbeständige Schicht (4) darauf aufgebracht wird.
  4. Verfahren nach Anspruch 3, dadurch gekennzeichnet, daß die Beschichtung (4) durch ein Elektroplattierungsverfahren aufgebracht wird und aus Chrom oder Zinn/Nickel ausgewählt wird.
  5. Verfahren nach einem oder mehreren der Ansprüche 1-4, dadurch gekennzeichnet, daß das endgültige Siebmaterial einer Wärmebehandlung bei einer Temperatur von 300°C für 0,5-5 Stunden, wenn gewünscht unter Verwendung eines inerten Schutzgases, unterworfen wird.
  6. Verfahren nach den Ansprüchen 1-5, dadurch gekennzeichnet, daß das Verfahren kontinuierlich durchgeführt wird.
  7. Verfahren nach einem oder mehreren der vorhergehenden Ansprüche, dadurch gekennzeichnet, daß das Basissiebmaterial (1) hergestellt wird durch Bereitstellen eines Ausgangsmaterials mit Perforationen der gewünschten Größe und im gewünschten Muster mittels mechanischer, Strahlungs- oder Ätztechniken und wobei, falls erwünscht, das auf diese Weise perforierte Material mit einer elektrisch leitenden Beschichtung versehen ist.
  8. Verfahren nach Anspruch 7, dadurch gekennzeichnet, daß das Ausgangsmaterial aus Metall, Plastik oder Glas ausgewählt wurde.
  9. Verfahren nach den Ansprüchen 7-8, dadurch gekennzeichnet, daß das Ausgangsmaterial aus einem dünnwandigen, nahtlosen Nickelzylinder geformt ist.
  10. Verfahren nach einem oder mehreren der vorhergehenden Ansprüche, dadurch gekennzeichnet, daß die Trennschicht auf dem Basissiebmaterial aus einem Material mit permanenten Lösungseigenschaften besteht.
  11. Verfahren nach Anspruch 10, dadurch gekennzeichnet, daß die Trennschicht auf dem Basissiebmaterial durch Oxidation des Basissiebmaterials zum Beispiel durch eine saure Kaliumdichromat- oder Kaliumpermanganatlösung gebildet wird.
  12. Verfahren nach einem oder mehreren der Ansprüche 1-6, dadurch gekennzeichnet, daß die entfernte Metallschicht (2) einer weiteren Elektroplattierungsbehandlung in einem Elektroplattierungsbad mit derselben Zusammensetzung wie das Bad, von dem die Metallschicht (2) abgeschieden wurde, unterworfen wird.
EP87201143A 1986-07-08 1987-06-16 Verfahren und Vorrichtung zur Herstellung von Metallsieben sowie nach dem Verfahren hergestellte Siebe Expired - Lifetime EP0252545B1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AT87201143T ATE63762T1 (de) 1986-07-08 1987-06-16 Verfahren und vorrichtung zur herstellung von metallsieben sowie nach dem verfahren hergestellte siebe.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL8601786A NL8601786A (nl) 1986-07-08 1986-07-08 Werkwijze voor het vormen van een metalen zeefmateriaal, inrichting voor het uitvoeren van deze werkwijze en gevormde metalen zeefmateriaal.
NL8601786 1986-07-08

Publications (2)

Publication Number Publication Date
EP0252545A1 EP0252545A1 (de) 1988-01-13
EP0252545B1 true EP0252545B1 (de) 1991-05-22

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EP87201143A Expired - Lifetime EP0252545B1 (de) 1986-07-08 1987-06-16 Verfahren und Vorrichtung zur Herstellung von Metallsieben sowie nach dem Verfahren hergestellte Siebe

Country Status (6)

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EP (1) EP0252545B1 (de)
JP (1) JP2707082B2 (de)
AT (1) ATE63762T1 (de)
DE (1) DE3770203D1 (de)
NL (1) NL8601786A (de)
SG (1) SG36692G (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10037521C2 (de) * 1999-11-18 2002-04-25 Saxon Screens Rotationsschablo Verfahren zur elektrolytischen Herstellung von Rotationssiebdruckformen
US7713397B2 (en) 2001-12-31 2010-05-11 Gesellschaft Fuer Schwerionen Forschung Mbh Method for the production of a metal membrane filter

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2786953B2 (ja) * 1991-04-18 1998-08-13 片山特殊工業株式会社 金属多孔体及び金属多孔体の製造方法
NL9202259A (nl) * 1992-12-24 1994-07-18 Stork Screens Bv Slijtbestendig zeefprodukt en werkwijze voor de vervaardiging daarvan.
EP0707788A1 (de) * 1994-10-19 1996-04-24 Tebel-Mkt B.V. Dränagerohr mit Perforation zum Dränieren von Molke aus einer Molke/Bruch Masse; Vorrichtung mit zumindest einem solchen Rohr und Verfahren zur Herstellung von solchen Rohren
GB2354459B (en) * 1999-09-22 2001-11-28 Viostyle Ltd Filtering element for treating liquids, dusts and exhaust gases of internal combustion engines
NL1021095C2 (nl) * 2002-07-17 2004-01-20 Stork Veco Bv Werkwijze voor het vervaardigen van metalen zeefmateriaal, metalen zeefmateriaal en toepassing daarvan.
NL1021096C2 (nl) * 2002-07-17 2004-01-20 Stork Veco Bv Werkwijze voor het vervaardigen van metalen zeefmateriaal, metalen zeefmateriaal en toepassing daarvan.
WO2004028673A1 (en) * 2002-09-25 2004-04-08 Gesellschaft Fuer Schwerionenforschung Mbh Nanodevice for controlled charged particle flow and method for producing same
FR2885915B1 (fr) † 2005-05-20 2007-08-03 Rieter Perfojet Sa Tambour pour machine de fabrication d'un non tisse a motifs et non tisse obtenu
WO2024068552A1 (en) * 2022-09-26 2024-04-04 Veco B.V. Porous metal plate material

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1160258B (de) * 1961-06-13 1963-12-27 Richard Steding Verfahren zur Herstellung von Metallfolien auf galvanoplastischem Wege
NL8005427A (nl) * 1980-09-30 1982-04-16 Veco Beheer Bv Werkwijze voor het vervaardigen van zeefmateriaal, verkregen zeefmateriaal alsmede inrichting voor het uitvoeren van de werkwijze.
NL8204381A (nl) * 1982-11-12 1984-06-01 Stork Screens Bv Werkwijze voor het electrolytisch vervaardigen van een metalen voortbrengsel alsmede electrolytisch vervaardigd metalen voortbrengsel.

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10037521C2 (de) * 1999-11-18 2002-04-25 Saxon Screens Rotationsschablo Verfahren zur elektrolytischen Herstellung von Rotationssiebdruckformen
US7713397B2 (en) 2001-12-31 2010-05-11 Gesellschaft Fuer Schwerionen Forschung Mbh Method for the production of a metal membrane filter

Also Published As

Publication number Publication date
EP0252545A1 (de) 1988-01-13
NL8601786A (nl) 1988-02-01
JP2707082B2 (ja) 1998-01-28
JPS6326395A (ja) 1988-02-03
ATE63762T1 (de) 1991-06-15
SG36692G (en) 1992-05-22
DE3770203D1 (de) 1991-06-27

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